[go: up one dir, main page]

Piskin et al., 2023 - Google Patents

E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions

Piskin et al., 2023

View HTML
Document ID
4446665040799872635
Author
Piskin T
Qian Y
Pribyl P
Gekelman W
Kushner M
Publication year
Publication venue
Journal of Applied Physics

External Links

Snippet

Electronegative inductively coupled plasmas (ICPs) are used for conductor etching in the microelectronics industry for semiconductor fabrication. Pulsing of the antenna power and bias voltages provides additional control for optimizing plasma–surface interactions …
Continue reading at pubs.aip.org (HTML) (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR

Similar Documents

Publication Publication Date Title
Chabert et al. Foundations of capacitive and inductive radio-frequency discharges
Qu et al. Power matching to pulsed inductively coupled plasmas
Piskin et al. E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions
Lafleur et al. Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring
Collison et al. Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe
Bora et al. Measurements of time average series resonance effect in capacitively coupled radio frequency discharge plasma
Lee et al. On the multistep ionizations in an argon inductively coupled plasma
Deepak et al. Model analysis and electrical characterization of atmospheric pressure cold plasma jet in pin electrode configuration
Bera et al. Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
Sun et al. The effects of electron surface interactions in geometrically symmetric capacitive rf plasmas in the presence of different electrode surface materials
Han et al. Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
Zhao et al. Experimental investigations of the plasma radial uniformity in single and dual frequency capacitively coupled argon discharges
Sirse et al. Temporal evolution of electron density in a low pressure pulsed two-frequency (60 MHz/2 MHz) capacitively coupled plasma discharge
Zhang et al. Fluid simulation of the bias effect in inductive/capacitive discharges
Mishra et al. An investigation of the temporal evolution of plasma potential in a 60 MHz/2 MHz pulsed dual-frequency capacitively coupled discharge
Binwal et al. Transverse magnetic field effects on spatial electron temperature distribution in a 13.56 MHz parallel plate capacitive discharge
Song et al. Role of the blocking capacitor in control of ion energy distributions in pulsed capacitively coupled plasmas sustained in Ar/CF4/O2
Wang et al. Experimental study on the ignition process of a pulsed capacitively coupled RF discharge: Effects of gas pressure and voltage amplitude
Bogdanova et al. Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation
Lee et al. Measurements and modeling of radio frequency field structures in a helicon plasma
Liu et al. Fluid modeling of plasma dynamics in pulsed RF capacitive glow discharges in low pressure argon
Shafir et al. Characterization of inductively coupled plasma generated by a quadruple antenna
Wang et al. Hysteresis in radio frequency capacitively coupled CF4 plasmas
Agarwal et al. On the scaling of rf and dc self-bias voltages with pressure in electronegative capacitively coupled plasmas
Liu et al. Experimental and numerical investigations of the characteristics of electron density in O2/Ar pulsed planar-coil-driven inductively coupled plasmas