Galiev et al., 2015 - Google Patents
Metamorphic nanoheterostructures for millimeter-wave electronicsGaliev et al., 2015
View PDF- Document ID
- 4946355254977428096
- Author
- Galiev G
- Khabibullin R
- Ponomarev D
- Yachmenev A
- Bugaev A
- Maltsev P
- Publication year
- Publication venue
- Nanotechnologies in Russia
External Links
Snippet
Electrical parameters and root-mean-square surface roughness of the metamorphic InAlAs/InGaAs/InAlAs nanoheterostructures with different indium contents (0.30–0.55) have been investigated. Field-effect transistors with the gate length L g= 140− 265 nm fabricated …
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium 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 [In] 0 abstract description 31
Classifications
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66446—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
- H01L29/66462—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
- H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/2003—Nitride compounds
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
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