Chiu et al., 2014 - Google Patents
SU-8 for microsystem fabricationChiu et al., 2014
- Document ID
- 5814491967174206596
- Author
- Chiu Y
- Cheng Y
- Publication year
External Links
Snippet
SU-8 is a negative-tone photoresist that can be used to fabricate thick, high aspect ratio structures. The thickness of SU-8 structures ranges from several micrometers to several hundred micrometers or up to millimeters by direct spin coating or stacking of multiple layers …
- 229920001486 SU-8 photoresist 0 title abstract description 260
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/10—Light guides of the optical waveguide type
- G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
- G02B6/122—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths
- G02B6/1221—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B3/00—Simple or compound lenses
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