Jeong et al., 2021 - Google Patents
Automated crystal orientation mapping by precession electron diffraction-assisted four-dimensional scanning transmission electron microscopy using a scintillator …Jeong et al., 2021
View HTML- Document ID
- 5875634698614516080
- Author
- Jeong J
- Cautaerts N
- Dehm G
- Liebscher C
- Publication year
- Publication venue
- Microscopy and Microanalysis
External Links
Snippet
The recent development of electron-sensitive and pixelated detectors has attracted the use of four-dimensional scanning transmission electron microscopy (4D-STEM). Here, we present a precession electron diffraction-assisted 4D-STEM technique for automated …
- 238000001350 scanning transmission electron microscopy 0 title abstract description 5
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by transmitting the radiation through the material and forming a picture
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2802—Transmission microscopes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam with incident electron beam
- G01N23/2252—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam with incident electron beam and measuring excited X-rays
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24475—Scattered electron detectors
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24495—Signal processing, e.g. mixing of two or more signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Jeong et al. | Automated crystal orientation mapping by precession electron diffraction-assisted four-dimensional scanning transmission electron microscopy using a scintillator-based CMOS detector | |
| EP2708875B1 (en) | Method of performing tomographic imaging of a sample in a charged-particle microscope | |
| Ishikawa et al. | Quantitative annular dark field electron microscopy using single electron signals | |
| JP3867524B2 (en) | Observation apparatus and observation method using electron beam | |
| Jones | Quantitative ADF STEM: acquisition, analysis and interpretation | |
| TW200947497A (en) | Sample observation method and apparatus, and inspection method and apparatus using the same | |
| Niessen et al. | A systematic comparison of on-axis and off-axis transmission Kikuchi diffraction | |
| US10139356B2 (en) | Devices and systems for spatial aggregation of spectral analysis from electron microscopes | |
| JP7577341B2 (en) | Systems, Apparatus, and Methods for Determining Elemental Composition Using 4D STEM - Patent application | |
| Verbeeck et al. | Energy-filtered transmission electron microscopy: an overview | |
| Brodusch et al. | Acquisition parameters optimization of a transmission electron forward scatter diffraction system in a cold‐field emission scanning electron microscope for nanomaterials characterization | |
| KR100620452B1 (en) | Image processing method | |
| Ercius et al. | The 4D Camera: an 87 kHz direct electron detector for scanning/transmission electron microscopy | |
| US20190035597A1 (en) | Scanning electron microscope and image processing apparatus | |
| CN112394076A (en) | Method for examining a sample using a charged particle microscope | |
| CN111344830A (en) | Improved system for electron diffraction analysis | |
| US10890545B2 (en) | Apparatus for combined stem and EDS tomography | |
| de Jonge et al. | The influence of beam broadening on the spatial resolution of annular dark field scanning transmission electron microscopy | |
| CN113538329A (en) | Method implemented by a data processing device and charged particle beam apparatus for inspecting a sample using such a method | |
| EP4067886A1 (en) | Method and system to determine crystal structure | |
| JP2020194691A (en) | Sample observation method in electron microscope, image analyzer for electron microscope, electron microscope and image analysis method for electron microscope | |
| Adams et al. | Electron-based imaging techniques | |
| Zhang et al. | Multi-exposure diffraction pattern fusion applied to enable wider-angle transmission Kikuchi diffraction with direct electron detectors | |
| Busch et al. | Large-Angle Rocking Beam Electron Diffraction of Large Unit Cell Crystals Using Direct Electron Detector | |
| DE112019006527T5 (en) | Defect inspection device and defect inspection method |