[go: up one dir, main page]

Underwood et al., 1996 - Google Patents

Calibration and standards beamline 6.3. 2 at the Advanced Light Source

Underwood et al., 1996

View PDF
Document ID
64358661221752490
Author
Underwood J
Gullikson E
Koike M
Batson P
Denham P
Franck K
Tackaberry R
Steele W
Publication year
Publication venue
Review of Scientific Instruments

External Links

Snippet

This bending magnet beamline has been in operation since February 1995 for the characterization of optical elements (mirrors, gratings, multilayers, detectors, etc.) in the energy range 50–1000 eV. Although it was designed primarily for precision reflectometry of …
Continue reading at pubs.aip.org (PDF) (other versions)

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7095Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colour
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B21/00Microscopes
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes

Similar Documents

Publication Publication Date Title
Underwood et al. Calibration and standards beamline 6.3. 2 at the Advanced Light Source
Underwood et al. High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50–1300 eV energy region
Gullikson et al. A soft x-ray/EUV reflectometer based on a laser produced plasma source
Kunze Introduction to plasma spectroscopy
Schäfers et al. The at-wavelength metrology facility for UV-and XUV-reflection and diffraction optics at BESSY-II
Nahon et al. Very high spectral resolution obtained with SU5: A vacuum ultraviolet undulator-based beamline at Super-ACO
Dietrich et al. A grazing incidence vacuum ultraviolet monochromator with fixed exit slit
Garakhin et al. High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength ranges
Vašina et al. Mechanical design aspects of a soft X-ray plane grating monochromator
Fonseca et al. Vacuum ultraviolet beam lines at Laboratório Nacional de Luz Síncrotron, the Brazilian synchrotron source
Underwood et al. Beamline for metrology of X-ray/EUV optics at the Advanced Light Source
Peatman et al. The exactly focusing spherical grating monochromator for undulator radiation at BESSY
Madden et al. Instrumental aspects of synchrotron xuv spectroscopy
Underwood et al. Beamline for measurement and characterization of multilayer optics for EUV lithography
Yu et al. Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30-to 200-nm wavelength range
Voss et al. Grazing incidence optics for soft x‐ray microscopy
Nachimuthu et al. Performance characteristics of beamline 6.3. 1 from 200 eV to 2000 eV at the Advanced Light Source
Rubloff et al. Far ultraviolet spectroscopy of solids in the range 6–36 eV using synchrotron radiation from an electron storage ring
Susini et al. Adaptive x‐ray mirror prototype: First results
Jaeglé et al. Versatile grazing incidence spectromonochromator for the xuv region
Sansone et al. Performance tests of the ERG monochromator at NSLS-U1
Tarrio et al. Towards high accuracy reflectometry for extreme-ultraviolet lithography
Warwick et al. New implementation of an SX700 undulator beamline at the Advanced Light Source
Kirkland et al. The naval research laboratory materials analysis beam line at the national synchrotron light source
Trela et al. An X-ray beam line for the energy range 5–20 keV