[go: up one dir, main page]

Sauneuf et al., 1997 - Google Patents

Large-field high-resolution x-ray microscope for studying laser plasmas

Sauneuf et al., 1997

View PDF
Document ID
6819310072222874116
Author
Sauneuf R
Dalmasso J
Jalinaud T
Le Breton J
Schirmann D
Marioge J
Bridou F
Tissot G
Clotaire J
Publication year
Publication venue
Review of scientific instruments

External Links

Snippet

In 1948, P. Kirkpatrick and AV Baez developed an x-ray microscope (energy range about 100 eV–10 keV) composed of two concave spherical mirrors working at grazing incidence. That device, named KB microscope, presents a 3–5 μm resolution within a field having a …
Continue reading at pubs.aip.org (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00—Optical elements other than lenses

Similar Documents

Publication Publication Date Title
Sauneuf et al. Large-field high-resolution x-ray microscope for studying laser plasmas
Underwood et al. X-ray microprobe using multilayer mirrors
Rarback et al. Scanning x‐ray microscope with 75‐nm resolution
Koch et al. 4.5-and 8-keV emission and absorption x-ray imaging using spherically bent quartz 203 and 211 crystals
US6389101B1 (en) Parallel x-ray nanotomography
Seward et al. Calibrated’’four‐color’’x‐ray microscope for laser plasma diagnostics
Cerrina et al. Maximum: A scanning photoelectron microscope at Aladdin
Yi et al. High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility
Rosch et al. X-ray imaging with grazing-incidence microscopes developed for the LIL program
Landen High‐resolution time‐and two‐dimensional space‐resolved x‐ray imaging of plasmas at NOVA
Gotchev et al. Large-grazing-angle, multi-image Kirkpatrick–Baez microscope as the front end to a high-resolution streak camera for OMEGA
Underwood High‐energy x‐ray microscopy with multilayer reflectors
Yaakobi et al. Crystal diffraction systems for x-ray spectroscopy, imaging, and interferometry of laser fusion targets
US20050226372A1 (en) X-ray image magnifying device
Gotchev et al. KB–PJX—A streaked imager based on a versatile x-ray microscope coupled to a high-current streak tube
Cauchon et al. Imaging of laser produced plasma at 1.43 keV using Fresnel zone plate and Bragg–Fresnel lens
Pantojas et al. A polycapillary-based X-ray optical system for diffraction applications
Hudec et al. Czech contribution to AHEAD2020: novel/alternative X-ray optics
Sinars et al. 1-to 10-keV x-ray backlighting of annular wire arrays on the Sandia Z-machine using bent-crystal imaging techniques
Workman et al. One-dimensional X-ray microscope for shock measurements in high-density aluminum plasmas
Niemann et al. X-ray microscopy: recent developments and practical applications
Brunton MCP optics
Vikhlyaev et al. Four-channel X-ray microscope for plasma investigations on the Sokol-P laser facility
Ragozin et al. Spectroscopic characterization of soft x-ray multilayer optics using a broadband laser-plasma radiation source
Turcu et al. Microchannel plate (MCP) focusing optics for a repetitive laser-plasma source