Kasih et al., 2007 - Google Patents
A Nonequilibrium, Atmospheric‐Pressure Argon Plasma Torch for Deposition of Thin Silicon Dioxide FilmsKasih et al., 2007
- Document ID
- 7649725912015707819
- Author
- Kasih T
- Kuroda S
- Kubota H
- Publication year
- Publication venue
- Chemical Vapor Deposition
External Links
Snippet
A nonequilibrium, atmospheric‐pressure plasma torch that can be generated either in He or Ar gas by using a pulsed high‐voltage power supply with the discharge temperature in the range 22–35° C has been developed. This system is used to deposit silicon dioxide films …
- 210000002381 Plasma 0 title abstract description 101
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Foest et al. | RF capillary jet‐a tool for localized surface treatment | |
| Babayan et al. | Deposition of silicon dioxide films with a non-equilibriumatmospheric-pressure plasma jet | |
| Kasih et al. | A Nonequilibrium, Atmospheric‐Pressure Argon Plasma Torch for Deposition of Thin Silicon Dioxide Films | |
| Benedikt et al. | Thin film deposition by means of atmospheric pressure microplasma jet | |
| Alexandrov et al. | Remote AP‐PECVD of Silicon Dioxide Films from Hexamethyldisiloxane (HMDSO) | |
| KR100775789B1 (en) | Surface coating method for hydrophobic and superhydrophobic treatment in atmospheric prreure plasma | |
| EP1472387B1 (en) | Corona-generated chemical vapor deposition on a substrate | |
| Alexandrov et al. | Chemical vapor deposition enhanced by atmospheric pressure non‐thermal non‐equilibrium plasmas | |
| EP2052097B1 (en) | Plasma surface treatment using dielectric barrier discharges | |
| Fendrych et al. | Growth and characterization of nanodiamond layers prepared using the plasma-enhanced linear antennas microwave CVD system | |
| US10800092B1 (en) | Low temperature atmospheric pressure plasma for cleaning and activating metals | |
| JP2001295051A (en) | Material surface treatment or coating method | |
| Wrobel et al. | Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films | |
| Barranco et al. | Synthesis of SiO2 and SiOxCyHz thin films by microwave plasma CVD | |
| Hnilica et al. | Surface treatment by atmospheric-pressure surfatron jet | |
| Theirich et al. | Intermediate gas phase precursors during plasma CVD of HMDSO | |
| Paulussen et al. | Physical and chemical properties of hybrid barrier coatings obtained in an atmospheric pressure dielectric barrier discharge | |
| Keller et al. | Comparative study of plasma-induced and wet-chemical cleaning of synthetic fibers | |
| JP2001329083A (en) | Materials subjected to plasma treatment | |
| Mitschker et al. | Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET | |
| Wolter et al. | Atmospheric pressure plasma jet for treatment of polymers | |
| WO2003017737A2 (en) | Cascade arc plasma and abrasion resistant coatings made therefrom | |
| Ji et al. | Water-repellent improvement of polyester fiber via radio frequency plasma treatment with argon/hexamethyldisiloxane (HMDSO) at atmospheric pressure | |
| Dorier et al. | Mechanisms of films and coatings formation from gaseous and liquid precursors with low pressure plasma spray equipment | |
| Menshakov et al. | Investigation of the conditions for the formation of SiCN-based coatings in arc discharge with self-heated hollow cathode |