[go: up one dir, main page]

Liu et al., 2017 - Google Patents

Uniform coating of TiO 2 on high aspect ratio substrates with complex morphology by vertical forced-flow atomic layer deposition

Liu et al., 2017

View HTML
Document ID
926934067372797884
Author
Liu K
Kei C
Mishra M
Chen P
Liu W
Perng T
Publication year
Publication venue
RSC Advances

External Links

Snippet

This study reports a novel forced-flow atomic layer deposition (ALD) process in which the precursors are forced to flow vertically through the highly porous substrate. The uniform coating in the interior of the hollow fiber membrane (length: 10 cm) indicates that the …
Continue reading at pubs.rsc.org (HTML) (other versions)

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks

Similar Documents

Publication Publication Date Title
Rooth et al. Atomic layer deposition of iron oxide thin films and nanotubes using ferrocene and oxygen as precursors
Pakdel et al. Nonwetting “white graphene” films
Barick et al. Tin oxide nanostructure fabrication via sequential infiltration synthesis in block copolymer thin films
Kim et al. Mechanistic understanding of tungsten oxide in-plane nanostructure growth via sequential infiltration synthesis
US20120034410A1 (en) Multiple walled nested coaxial nanostructures
Guerra-Nuñez et al. Morphology and crystallinity control of ultrathin TiO 2 layers deposited on carbon nanotubes by temperature-step atomic layer deposition
Liu et al. Uniform coating of TiO 2 on high aspect ratio substrates with complex morphology by vertical forced-flow atomic layer deposition
Huang et al. Preparation and characterization of molybdenum disulfide films obtained by one-step atomic layer deposition method
KR101528664B1 (en) Preparation method of single layer hexagonal boron nitride using low-pressure chemical vapor deposition method
Wang et al. Atomic layer deposition of ruthenium thin films from an amidinate precursor
Min et al. Al2O3 coating of ZnO nanorods by atomic layer deposition
Bae et al. Template-directed gas-phase fabrication of oxide nanotubes
Selvaraj et al. Iron oxide grown by low-temperature atomic layer deposition
Haider et al. Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
Qin et al. Preparation and elastic properties of helical nanotubes obtained by atomic layer deposition with carbon nanocoils as templates
Triani et al. Nanostructured TiO 2 membranes by atomic layer deposition
Deng et al. Porous nanostructured metal oxides synthesized through atomic layer deposition on a carbonaceous template followed by calcination
Kvalvik et al. Area-selective atomic layer deposition of molybdenum oxide
Karaman et al. Chemical and physical modification of surfaces
Karumuri et al. Tuning the surface wettability of carbon nanotube carpets in multiscale hierarchical solids
Gu et al. Atomic layer deposition of ZrO2 and HfO2 nanotubes by template replication
Wang et al. Deposition of diamond/β-SiC composite gradient films by HFCVD: A competitive growth process
TW201420499A (en) Carbon nanotubes conformally coated with diamond nanocrystals or silicon carbide, methods of making the same and methods of their use
Sempel et al. Ultrathin ZrO2 thickness control on TiO2/ZrO2 core/shell nanoparticles using ZrO2 atomic layer deposition and etching
CN104174860B (en) Preparation method for alloy nano-particles adopting core-shell structures