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Rao et al., 2023 - Google Patents

Convex optical freeforms using fringe Zernike overlay approach for two-mirror and three-mirror telescopes for space applications

Rao et al., 2023

Document ID
9919322003150979584
Author
Rao B
Kiran M
Sriram K
Narayanamurthy C
et al.
Publication year
Publication venue
Optics Communications

External Links

Snippet

The challenge in manufacturing and testing of convex optical parts is well known in comparison to its concave counterpart and an optimized imaging system invariably features a combination of both. Of late, freeform mirrors find lot of interest in space applications as the …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02034—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70258—Projection system adjustment, alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02055—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques
    • G01B9/02056—Passive error reduction, i.e. not varying during measurement, e.g. by constructional details of optics
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing of optical properties of lenses
    • G01M11/0242—Testing of optical properties of lenses by measuring geometrical properties or aberrations
    • G01M11/0257—Testing of optical properties of lenses by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical means
    • G01B11/24—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing of optical properties of lenses
    • G01M11/0242—Testing of optical properties of lenses by measuring geometrical properties or aberrations
    • G01M11/0271—Testing of optical properties of lenses by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02049—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by particular mechanical design details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02015—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
    • G01B9/02022—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02015—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
    • G01B9/02017—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object several times
    • G01B9/02021—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object several times contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing of optical properties of lenses
    • G01M11/0242—Testing of optical properties of lenses by measuring geometrical properties or aberrations
    • G01M11/025—Testing of optical properties of lenses by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00—Other optical systems; Other optical apparatus
    • G02B27/0025—Other optical systems; Other optical apparatus for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Other optical systems; Other optical apparatus for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B26/00—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
    • G02B26/06—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors

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