Cai et al., 1997 - Google Patents
Effect of post-PECVD photo-assisted anneal on multicrystalline silicon solar cellsCai et al., 1997
- Document ID
- 11483453775564761596
- Author
- Cai L
- Rohatgi A
- Publication year
- Publication venue
- IEEE Transactions on Electron Devices
External Links
Snippet
Silicon nitride (SiN/sub x/) films deposited by plasma enhanced chemical vapor deposition (PECVD) contain large amount of atomic hydrogen which can be driven into bulk silicon by post-PECVD anneal. The objective of this paper is to understand and quantify the effects of …
- 238000000623 plasma-assisted chemical vapour deposition 0 title abstract description 80
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GASES [GHG] EMISSION, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/54—Material technologies
- Y02E10/547—Monocrystalline silicon PV cells
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- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/54—Material technologies
- Y02E10/543—Solar cells from Group II-VI materials
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- H01L31/04—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
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