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Orji et al., 2016 - Google Patents

Contour metrology using critical dimension atomic force microscopy

Orji et al., 2016

Document ID
11609991669438778884
Author
Orji N
Dixson R
Ng B
Vladár A
Postek M
Publication year
Publication venue
Journal of Micro/Nanolithography, MEMS, and MOEMS

External Links

Snippet

The critical dimension atomic force microscopy (CD-AFM) has been proposed as an instrument for contour measurement and verification since its capabilities are complementary to the widely used scanning electron microscopy (SEM). Although data from …
Continue reading at www.spiedigitallibrary.org (other versions)

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical means
    • G01B11/24—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular type of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof

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