[go: up one dir, main page]

Jeyachandran et al., 2015 - Google Patents

Maskless ultraviolet projection lithography with a biorepelling monomolecular resist

Jeyachandran et al., 2015

Document ID
12192421282610571631
Author
Jeyachandran Y
Meyerbröker N
Terfort A
Zharnikov M
Publication year
Publication venue
The Journal of Physical Chemistry C

External Links

Snippet

Here, we describe a universal photolithography setup for the patterning of biorepulsive self- assembled monolayers (SAMs) as well as other monomolecular films. The setup is based on commercial equipment consisting of a computer-controlled digital micromirror device chip …
Continue reading at pubs.acs.org (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70283—Masks or their effects on the imaging process, e.g. Fourier masks, greyscale masks, holographic masks, phase shift masks, phasemasks, lenticular masks, multiple masks, tilted masks, tandem masks
    • G03F7/70291—Addressable masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70375—Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y40/00—Manufacture or treatment of nano-structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic

Similar Documents

Publication Publication Date Title
Sun et al. Nanoscale molecular patterns fabricated by using scanning near-field optical lithography
Garno et al. Precise positioning of nanoparticles on surfaces using scanning probe lithography
Montague et al. Fabrication of biomolecular nanostructures by scanning near-field photolithography of oligo (ethylene glycol)-terminated self-assembled monolayers
Sun et al. Matching the resolution of electron beam lithography by scanning near-field photolithography
Jeyachandran et al. Maskless ultraviolet projection lithography with a biorepelling monomolecular resist
Sun et al. Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers
Stokes et al. Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications
Blättler et al. Nanopatterns with biological functions
Hoff et al. Nanoscale protein patterning by imprint lithography
Harnett et al. Bioactive templates fabricated by low-energy electron beam lithography of self-assembled monolayers
Haq et al. Parallel scanning near-field photolithography: the snomipede
Adams et al. Large-area nanopatterning of self-assembled monolayers of alkanethiolates by interferometric lithography
US8841239B2 (en) Patterned nanosubstrates made by directed self assembly of amphiphilic molecules
Jeyachandran et al. Application of long wavelength ultraviolet radiation for modification and patterning of protein-repelling monolayers
Rundqvist et al. Directed immobilization of protein-coated nanospheres to nanometer-scale patterns fabricated by electron beam lithography of poly (ethylene glycol) self-assembled monolayers
Yogesh et al. Organoiodine functionality bearing resists for electron-beam and helium ion beam lithography: complex and sub-16 nm patterning
Ducker et al. One-step photochemical introduction of nanopatterned protein-binding functionalities to oligo (ethylene glycol)-terminated self-assembled monolayers
Salaita et al. Spontaneous “phase separation” of patterned binary alkanethiol mixtures
Jeyachandran et al. Controlled modification of protein-repelling self-assembled monolayers by ultraviolet light: The effect of the wavelength
Ul-Haq et al. Photocatalytic nanolithography of self-assembled monolayers and proteins
Reynolds et al. Site-specific immobilization and micrometer and nanometer scale photopatterning of yellow fluorescent protein on glass surfaces
Jang et al. Arrays of nanoscale lenses for subwavelength optical lithography
Moxey et al. Fabrication of self-cleaning, reusable titania templates for nanometer and micrometer scale protein patterning
Alang Ahmad et al. Protein micro-and nanopatterning using aminosilanes with protein-resistant photolabile protecting groups
El Zubir et al. Generic methods for micrometer-and nanometer-scale surface derivatization based on photochemical coupling of primary amines to monolayers of aryl azides on gold and aluminum oxide surfaces