Goncharov et al., 2007 - Google Patents
Plasma devices based on the plasma lens—A review of results and applicationsGoncharov et al., 2007
- Document ID
- 13010097009043724041
- Author
- Goncharov A
- Brown I
- Publication year
- Publication venue
- IEEE transactions on plasma science
External Links
Snippet
We review some novel developments of the electrostatic plasma lens and some new plasma devices based on the plasma-optical idea of magnetic insulation of electrons and equipotentialization along magnetic field lines. The plasma lens configuration of crossed …
- 210000002381 Plasma 0 title abstract description 81
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/34—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
- H01J27/143—Hall-effect ion sources with closed electron drift
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/34—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3452—Magnet distribution
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Anders et al. | Macroparticle‐free thin films produced by an efficient vacuum arc deposition technique | |
| US9793098B2 (en) | Low pressure arc plasma immersion coating vapor deposition and ion treatment | |
| JP3652702B2 (en) | Linear arc discharge generator for plasma processing | |
| CA2326202C (en) | Method and apparatus for deposition of biaxially textured coatings | |
| US20090200158A1 (en) | High power impulse magnetron sputtering vapour deposition | |
| US7312579B2 (en) | Hall-current ion source for ion beams of low and high energy for technological applications | |
| US9653253B2 (en) | Plasma-based material modification using a plasma source with magnetic confinement | |
| US5266146A (en) | Microwave-powered plasma-generating apparatus and method | |
| US6238526B1 (en) | Ion-beam source with channeling sputterable targets and a method for channeled sputtering | |
| JP2012162803A (en) | Filter for arc source | |
| US20090159441A1 (en) | Plasma Film Deposition System | |
| Goncharov et al. | Plasma devices based on the plasma lens—A review of results and applications | |
| Aksenov et al. | Transformation of axial vacuum-arc plasma flows into radial streams and their use in coating deposition | |
| JP7038366B2 (en) | Single beam plasma source | |
| JPH04235276A (en) | Device for coating substrate | |
| JP3246800B2 (en) | Plasma equipment | |
| EP3355338A1 (en) | Apparatus and method for surface processing | |
| US11942311B2 (en) | Magnet arrangement for a plasma source for performing plasma treatments | |
| Ryabchikov et al. | Features of the formation of ultralow energy high-intensity metal and gaseous ion beams | |
| Goncharov et al. | Plasma Devices Based on the Plasma Lens Configuration-Basic Results and Application | |
| Aksenov et al. | Two-cathode filtered vacuum-arc plasma source | |
| Rawat et al. | Effects of axial magnetic field in a magnetic multipole line cusp ion source | |
| KR102873662B1 (en) | Magnet array for plasma source for performing plasma treatments | |
| Tereshin et al. | Thin films deposition with ECR planar plasma source | |
| JP4997596B2 (en) | Ion plating method |