Han et al., 1996 - Google Patents
Jet Vapor Deposition of Transparent Conductive ZnO: Al Thin Films for Photovoltaic ApplicationsHan et al., 1996
- Document ID
- 15368159615260770095
- Author
- Han H
- Zhang J
- Halpern B
- Schmitt J
- Del Cueto J
- Publication year
- Publication venue
- MRS Online Proceedings Library (OPL)
External Links
Snippet
A novel, proprietary, and general approach to depositing thin films and coatings, The novel Jet Vapor Deposition TM (JVDTM) process is described, in which single or multiple “jets in low vacuum” are coupled with “mobile substrates” to generate a wide range of …
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc monoxide 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[Zn]=O 0 title abstract description 48
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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