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Yonekawa et al., 2007 - Google Patents

A short-pulsed laser cleaning system for EUVL tool

Yonekawa et al., 2007

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Document ID
227754352731434019
Author
Yonekawa M
Namba H
Hayashi T
Watanabe Y
Publication year
Publication venue
Emerging Lithographic Technologies XI

External Links

Snippet

ABSTRACT A traditional method of reticle protection, using a pellicle, is thought to be difficult to apply to EUVL tool. There is a possibility that some particles adhere to the surface of a reticle. In order to resolve this reticle issue, we are investigating in-situ short-pulsed laser …
Continue reading at euvlsymposium.lbl.gov (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants

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