[go: up one dir, main page]

Jones et al., 1999 - Google Patents

Optical properties of AlN determined by vacuum ultraviolet spectroscopy and spectroscopic ellipsometry data

Jones et al., 1999

View PDF
Document ID
355704537640324501
Author
Jones D
French R
Müllejans H
Loughin S
Dorneich A
Carcia P
Publication year
Publication venue
Journal of materials research

External Links

Snippet

Precise and accurate knowledge of the optical properties of aluminum nitride (AlN) in the ultraviolet (UV) and visible (VIS) regions is important because of the increasing application of AlN in optical and electro-optical devices, including compact disks, phase shift lithography …
Continue reading at www.researchgate.net (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infra-red light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical means
    • G01B11/02—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating using interferometry

Similar Documents

Publication Publication Date Title
Jones et al. Optical properties of AlN determined by vacuum ultraviolet spectroscopy and spectroscopic ellipsometry data
Vedam Spectroscopic ellipsometry: a historical overview
Lindau et al. Experimental verification of optically excited longitudinal plasmons
Wong et al. Intriguing absorption band behavior of IR reflectance spectra of silicon dioxide on silicon
Márquez et al. Spectroscopic ellipsometry study of non-hydrogenated fully amorphous silicon films deposited by room-temperature radio-frequency magnetron sputtering on glass: Influence of the argon pressure
Prachachet et al. Investigation of optical characteristics of the evaporated Ta2O5 thin films based on ellipsometry and spectroscopy
Pribil et al. Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurements
Yan et al. Oxygen plasma effects on optical properties of ZnSe films
Bouizem et al. Optical and structural properties of hydrogenated silicon films prepared by rf-magnetron sputtering at low growth temperatures: Study as function of argon gas dilution
Yeh et al. Practical antireflection coatings for metal‐semiconductor solar cells
Tarasov et al. Quick ellipsometric technique for determining the thicknesses and optical constant profiles of Fe/SiO2/Si (100) nanostructures during growth
Davazoglou Determination of optical dispersion and film thickness of semiconducting disordered layers by transmission measurements: Application for chemically vapor deposited Si and SnO 2 film
Orgassa et al. Optical constants of Cu (ln, Ga) Se/sub 2/thin films from normal incidence transmittance and reflectance
Pinard et al. Optical losses of multilayer stacks synthesized with silicon oxynitride by rf magnetron sputtering
US7167241B1 (en) Dielectric function of thin metal films determined by combined transmission spectroscopic ellipsometry and intensity measurements
Nečas et al. Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry
Khoshman et al. Vacuum ultra-violet spectroscopic ellipsometry study of sputtered BeZnO thin films
Moghaddam et al. Thin-film optical function acquisition from experimental measurements of the reflectance and transmittance spectra: a case study
Ashton et al. Optical properties of lead in the vacuum ultraviolet
Mistrik et al. Spectroscopic ellipsometry of TaNx and VN films
Wilson Determining optical properties of thin films by modified attenuated total reflection with a charge coupled device
Burcklen et al. Optical constants of magnetron sputtered aluminum in the range 17–1300 eV with improved accuracy and ultrahigh resolution in the L absorption edge region
Song et al. Tantalum oxide and silica mixture coatings deposited using microwave plasma assisted co-sputtering for optical mirror coatings in gravitational wave detectors
Cho et al. Ellipsometric examination of optical property of the Si–SiO 2 interface using the s-wave antireflection
O'Handley et al. Optical studies of chemisorption on metals