Marquardt et al., 2022 - Google Patents
Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parametersMarquardt et al., 2022
View HTML- Document ID
- 372774075178157203
- Author
- Marquardt R
- Cipo J
- Schlichting F
- Kolhatkar G
- Kohlstedt H
- Kersten H
- Publication year
- Publication venue
- Thin Solid Films
External Links
Snippet
Superconducting thin films of NbN on SiO 2 are prepared at ambient temperature by direct current magnetron sputtering with varying external deposition parameters, ie pressure, target-substrate distance, and power. Internal deposition parameters such as the plasma …
- 210000002381 Plasma 0 title abstract description 86
Classifications
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L39/00—Devices using superconductivity; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
- H01L39/22—Devices comprising a junction of dissimilar materials, e.g. Josephson-effect devices
- H01L39/223—Josephson-effect devices
- H01L39/225—Josephson-effect devices comprising high Tc ceramic materials
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L39/00—Devices using superconductivity; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
- H01L39/24—Processes or apparatus peculiar to the manufacture or treatment of devices provided for in H01L39/00 or of parts thereof
- H01L39/2419—Processes or apparatus peculiar to the manufacture or treatment of devices provided for in H01L39/00 or of parts thereof the superconducting material comprising copper oxide
- H01L39/2464—After-treatment, e.g. patterning
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