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Marquardt et al., 2022 - Google Patents

Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters

Marquardt et al., 2022

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Document ID
372774075178157203
Author
Marquardt R
Cipo J
Schlichting F
Kolhatkar G
Kohlstedt H
Kersten H
Publication year
Publication venue
Thin Solid Films

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Superconducting thin films of NbN on SiO 2 are prepared at ambient temperature by direct current magnetron sputtering with varying external deposition parameters, ie pressure, target-substrate distance, and power. Internal deposition parameters such as the plasma …
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Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L39/00Devices using superconductivity; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
    • H01L39/22Devices comprising a junction of dissimilar materials, e.g. Josephson-effect devices
    • H01L39/223Josephson-effect devices
    • H01L39/225Josephson-effect devices comprising high Tc ceramic materials
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L39/00Devices using superconductivity; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
    • H01L39/24Processes or apparatus peculiar to the manufacture or treatment of devices provided for in H01L39/00 or of parts thereof
    • H01L39/2419Processes or apparatus peculiar to the manufacture or treatment of devices provided for in H01L39/00 or of parts thereof the superconducting material comprising copper oxide
    • H01L39/2464After-treatment, e.g. patterning

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