[go: up one dir, main page]

Jafari et al., 2016 - Google Patents

The hydrogen plasma effect on the tungsten oxide nano-sheets in Tokamak

Jafari et al., 2016

Document ID
3746693237825336206
Author
Jafari A
Ghoranneviss M
Meshkani S
Publication year
Publication venue
Journal of Fusion Energy

External Links

Snippet

In this research, the IR-T1 Tokamak plasma effect on tungsten oxide (WO3) nano-sheets has been investigated. For this purpose we deposited WO3 on stainless steel 316L (SS 316L) via hot filament chemical vapor deposition method with hot tungsten filament in temperature …
Continue reading at link.springer.com (other versions)

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Similar Documents

Publication Publication Date Title
Mishra et al. Synthesis of elongated Au nanoparticles in silica matrix by ion irradiation
De Temmerman et al. Nanostructuring of molybdenum and tungsten surfaces by low-energy helium ions
Zhang et al. Direct-current cathodic vacuum arc system with magnetic-field mechanism for plasma stabilization
Nie et al. Formation of metal nanoparticles by short-distance sputter deposition in a reactive ion etching chamber
Filipič et al. Growth dynamics of copper oxide nanowires in plasma at low pressures
Filipič et al. Uniform surface growth of copper oxide nanowires in radiofrequency plasma discharge and limiting factors
Mondal et al. Performance of a size-selected nanocluster deposition facility and in situ characterization of grown films by x-ray photoelectron spectroscopy
Fujita et al. Graphene layer growth on silicon substrates with nickel film by pulse arc plasma deposition
Li et al. Laser ablation in liquids of germanium in externally applied electric fields
Dhar et al. Enhanced photoemission from glancing angle deposited SiOx-TiO2 axial heterostructure nanowire arrays
Patino et al. Material migration in W and Mo during bubble growth and fuzz formation
Priya et al. Substrate-dependent fractal growth and wettability of N+ ion implanted V2O5 thin films
Arnas et al. Thermal balance of tungsten monocrystalline nanoparticles in high pressure magnetron discharges
Parajuli et al. RHEED analysis of the oxidized M′ 2M ″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
Benzo et al. Controlled synthesis of buried delta-layers of Ag nanocrystals for near-field plasmonic effects on free surfaces
Khasanah et al. Large-area suspended graphene as a laser target to produce an energetic ion beam
Jafari et al. The hydrogen plasma effect on the tungsten oxide nano-sheets in Tokamak
Thøgersen et al. Composition and structure of Pd nanoclusters in SiOx thin film
Rai et al. Pulsed laser annealing of amorphous two-dimensional transition metal dichalcogenides
He et al. Thermal evaporated hyperbranched Ag nanostructure as an effective secondary-electron trapping surface coating
Lorusso et al. Y thin films grown by pulsed laser ablation
Sorge et al. Metal oxide morphology in argon-assisted glancing angle deposition
Pandey et al. Surface nanostructuring of laser ablated copper in ambient gas atmosphere and a magnetic field
Baranov et al. Magnetic control of breakdown: Toward energy-efficient hollow-cathode magnetron discharges
Samykano et al. Morphology and crystallographic characterization of nickel nanowires—influence of magnetic field and current density during synthesis