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AU2001266673A1 - System of fabricating plane parallel substrates with uniform optical paths - Google Patents

System of fabricating plane parallel substrates with uniform optical paths

Info

Publication number
AU2001266673A1
AU2001266673A1 AU2001266673A AU6667301A AU2001266673A1 AU 2001266673 A1 AU2001266673 A1 AU 2001266673A1 AU 2001266673 A AU2001266673 A AU 2001266673A AU 6667301 A AU6667301 A AU 6667301A AU 2001266673 A1 AU2001266673 A1 AU 2001266673A1
Authority
AU
Australia
Prior art keywords
fabricating
plane parallel
optical paths
uniform optical
parallel substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001266673A
Inventor
William Mccreath
Richard Neily
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GSI Lumonics Inc Canada
Novanta Inc
Original Assignee
GSI LUMONICS Inc
GSI Lumonics Inc Canada
GSI Lumonics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GSI LUMONICS Inc, GSI Lumonics Inc Canada, GSI Lumonics Inc filed Critical GSI LUMONICS Inc
Publication of AU2001266673A1 publication Critical patent/AU2001266673A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU2001266673A 2000-06-02 2001-06-01 System of fabricating plane parallel substrates with uniform optical paths Abandoned AU2001266673A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20886300P 2000-06-02 2000-06-02
US60208863 2000-06-02
PCT/US2001/017955 WO2001094881A1 (en) 2000-06-02 2001-06-01 System of fabricating plane parallel substrates with uniform optical paths

Publications (1)

Publication Number Publication Date
AU2001266673A1 true AU2001266673A1 (en) 2001-12-17

Family

ID=22776338

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001266673A Abandoned AU2001266673A1 (en) 2000-06-02 2001-06-01 System of fabricating plane parallel substrates with uniform optical paths

Country Status (3)

Country Link
US (1) US6639682B2 (en)
AU (1) AU2001266673A1 (en)
WO (1) WO2001094881A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6819438B2 (en) * 2000-06-02 2004-11-16 Gsi Lumonics Corporation Technique for fabricating high quality optical components
JP4304904B2 (en) * 2002-02-07 2009-07-29 株式会社島津製作所 Etalon manufacturing method
US20040046969A1 (en) * 2002-09-10 2004-03-11 Honeywell International Inc. System and method for monitoring thin film deposition on optical substrates
JP3811150B2 (en) * 2003-09-05 2006-08-16 株式会社東芝 Film thickness measuring method, film thickness measuring system, semiconductor device manufacturing method, and film thickness measuring system control program
JP2005291859A (en) * 2004-03-31 2005-10-20 Nec Compound Semiconductor Devices Ltd Fine structure measurement method, fine structure measurement apparatus, and fine structure analysis system
US20080297808A1 (en) * 2005-12-06 2008-12-04 Nabeel Agha Riza Optical Sensor For Extreme Environments
ATE503164T1 (en) * 2007-01-17 2011-04-15 Dow Corning WEAR-RESISTANT MATERIALS USED BY DIRECT PROCESS
US8053256B2 (en) * 2008-12-31 2011-11-08 Texas Instruments Incorporated Variable thickness single mask etch process
US8992286B2 (en) * 2013-02-26 2015-03-31 Applied Materials, Inc. Weighted regression of thickness maps from spectral data
US9500468B2 (en) 2014-08-25 2016-11-22 Board Of Trustees Of Michigan State University Scanning interferometry technique for through-thickness evaluation in multi-layered transparent structures
US9601904B1 (en) 2015-12-07 2017-03-21 Raytheon Company Laser diode driver with variable input voltage and variable diode string voltage

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5327220A (en) 1992-06-26 1994-07-05 O.C.A. Applied Optics, Inc. IR interferometric apparatus and method for determining the thickness variation of an optical part wherein said optical part defines Newton interference fringe patterns
US5396332A (en) * 1993-02-08 1995-03-07 Ciszek; Theodoer F. Apparatus and method for measuring the thickness of a semiconductor wafer
US5528370A (en) 1993-06-09 1996-06-18 The Perkin-Elmer Corporation Apparatus and method for measuring variations in thickness of an optical interference element
JPH07285069A (en) 1994-04-18 1995-10-31 Shin Etsu Handotai Co Ltd Automatic taper removal polishing method and device of wafer in sheet type polishing
US5671050A (en) * 1994-11-07 1997-09-23 Zygo Corporation Method and apparatus for profiling surfaces using diffracative optics
CN1131741A (en) 1995-03-22 1996-09-25 载歌公司 Optical gap measuring apparatus and method
US5724137A (en) 1996-06-27 1998-03-03 Tropel Corporation Fringe pattern discriminator for interferometer using diffraction gratings
US5923425A (en) 1997-11-20 1999-07-13 Tropel Corporation Grazing incidence interferometry for measuring transparent plane-parallel plates
US6301009B1 (en) * 1997-12-01 2001-10-09 Zygo Corporation In-situ metrology system and method
US6048742A (en) 1998-02-26 2000-04-11 The United States Of America As Represented By The Secretary Of The Air Force Process for measuring the thickness and composition of thin semiconductor films deposited on semiconductor wafers
US6198293B1 (en) 1998-03-26 2001-03-06 Massachusetts Institute Of Technology Method and apparatus for thickness measurement using microwaves

Also Published As

Publication number Publication date
US20010053588A1 (en) 2001-12-20
US6639682B2 (en) 2003-10-28
WO2001094881A1 (en) 2001-12-13

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