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AU3135202A - Physical vapor deposition targets, and methods of fabricating metallic materials - Google Patents

Physical vapor deposition targets, and methods of fabricating metallic materials

Info

Publication number
AU3135202A
AU3135202A AU3135202A AU3135202A AU3135202A AU 3135202 A AU3135202 A AU 3135202A AU 3135202 A AU3135202 A AU 3135202A AU 3135202 A AU3135202 A AU 3135202A AU 3135202 A AU3135202 A AU 3135202A
Authority
AU
Australia
Prior art keywords
methods
vapor deposition
physical vapor
metallic materials
deposition targets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
AU3135202A
Other languages
English (en)
Inventor
Vladimir Segal
Stephane Ferrasse
Frank Alford
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of AU3135202A publication Critical patent/AU3135202A/xx
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21C—MANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES, PROFILES OR LIKE SEMI-MANUFACTURED PRODUCTS OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
    • B21C23/00—Extruding metal; Impact extrusion
    • B21C23/001—Extruding metal; Impact extrusion to improve the material properties, e.g. lateral extrusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J1/00—Preparing metal stock or similar ancillary operations prior, during or post forging, e.g. heating or cooling
    • B21J1/02—Preliminary treatment of metal stock without particular shaping, e.g. salvaging segregated zones, forging or pressing in the rough
    • B21J1/025—Preliminary treatment of metal stock without particular shaping, e.g. salvaging segregated zones, forging or pressing in the rough affecting grain orientation
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Forging (AREA)
  • Electrodes Of Semiconductors (AREA)
AU3135202A 2000-11-02 2001-10-26 Physical vapor deposition targets, and methods of fabricating metallic materials Pending AU3135202A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/705,101 US6946039B1 (en) 2000-11-02 2000-11-02 Physical vapor deposition targets, and methods of fabricating metallic materials
PCT/US2001/051010 WO2002036847A2 (en) 2000-11-02 2001-10-25 Sputtering target

Publications (1)

Publication Number Publication Date
AU3135202A true AU3135202A (en) 2002-05-15

Family

ID=24832037

Family Applications (2)

Application Number Title Priority Date Filing Date
AU2002231352A Abandoned AU2002231352A1 (en) 2000-11-02 2001-10-25 Sputtering target
AU3135202A Pending AU3135202A (en) 2000-11-02 2001-10-26 Physical vapor deposition targets, and methods of fabricating metallic materials

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AU2002231352A Abandoned AU2002231352A1 (en) 2000-11-02 2001-10-25 Sputtering target

Country Status (8)

Country Link
US (2) US6946039B1 (xx)
EP (1) EP1337682A2 (xx)
JP (1) JP2004513228A (xx)
KR (1) KR20030063372A (xx)
CN (1) CN1266304C (xx)
AU (2) AU2002231352A1 (xx)
TW (1) TWI247819B (xx)
WO (1) WO2002036847A2 (xx)

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US20010047838A1 (en) * 2000-03-28 2001-12-06 Segal Vladimir M. Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions
US6946039B1 (en) 2000-11-02 2005-09-20 Honeywell International Inc. Physical vapor deposition targets, and methods of fabricating metallic materials
US20040221929A1 (en) 2003-05-09 2004-11-11 Hebda John J. Processing of titanium-aluminum-vanadium alloys and products made thereby
US7228722B2 (en) * 2003-06-09 2007-06-12 Cabot Corporation Method of forming sputtering articles by multidirectional deformation
US7293445B2 (en) * 2003-06-13 2007-11-13 General Motors Corporation Sheet processing apparatus, method of use, and plastically deformed sheet
KR20060029622A (ko) * 2003-06-20 2006-04-06 캐보트 코포레이션 백킹 플레이트에 스퍼터 타겟 부착을 위한 방법 및 디자인
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US20050236270A1 (en) * 2004-04-23 2005-10-27 Heraeus, Inc. Controlled cooling of sputter targets
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US7998287B2 (en) * 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
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JP5046890B2 (ja) * 2007-11-29 2012-10-10 株式会社コベルコ科研 Ａｇ系スパッタリングターゲット
JP5379010B2 (ja) * 2008-02-08 2013-12-25 Ｊｘ日鉱日石金属株式会社 イッテルビウム製スパッタリングターゲット及び同ターゲットの製造方法。
US7958764B2 (en) * 2008-02-15 2011-06-14 Indimet Inc. Method for providing an armature housing
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KR101290856B1 (ko) 2008-09-30 2013-07-29 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 고순도 구리 또는 고순도 구리 합금 스퍼터링 타겟 및 동 스퍼터링 타겟의 제조 방법
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JP5696051B2 (ja) * 2008-11-03 2015-04-08 トーソー エスエムディー，インク． スパッターターゲットを製造する方法
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US10513755B2 (en) 2010-09-23 2019-12-24 Ati Properties Llc High strength alpha/beta titanium alloy fasteners and fastener stock
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CN108465700B (zh) * 2018-03-13 2020-09-08 重庆大学 一种获得均匀组织和织构的溅射靶材用钽板轧制方法
CN110735060A (zh) * 2019-11-25 2020-01-31 兰州理工大学 一种改善铝合金性能的连续正交轧制方法
CN111304608B (zh) * 2020-03-17 2021-10-15 贵研铂业股份有限公司 一种晶粒高定向取向的镍铂合金溅射靶材及其制备方法
CN112063976B (zh) * 2020-09-11 2022-08-30 宁波江丰电子材料股份有限公司 一种超高纯铜靶材及其晶粒控制方法
CN112921287B (zh) * 2021-01-22 2022-10-28 宁波江丰电子材料股份有限公司 一种超高纯铜靶材及其晶粒取向控制方法
CN113046705B (zh) * 2021-03-16 2022-08-16 宁波江丰电子材料股份有限公司 一种铜靶材及其制备方法和用途
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Also Published As

Publication number Publication date
TWI247819B (en) 2006-01-21
WO2002036847A2 (en) 2002-05-10
KR20030063372A (ko) 2003-07-28
WO2002036847A3 (en) 2003-02-13
CN1484711A (zh) 2004-03-24
EP1337682A2 (en) 2003-08-27
US6946039B1 (en) 2005-09-20
US20020153071A1 (en) 2002-10-24
JP2004513228A (ja) 2004-04-30
AU2002231352A1 (en) 2002-05-15
CN1266304C (zh) 2006-07-26
US6908517B2 (en) 2005-06-21

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