CN104035228B - Liquid crystal display and method of manufacturing the same - Google Patents
Liquid crystal display and method of manufacturing the same Download PDFInfo
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- CN104035228B CN104035228B CN201410076914.6A CN201410076914A CN104035228B CN 104035228 B CN104035228 B CN 104035228B CN 201410076914 A CN201410076914 A CN 201410076914A CN 104035228 B CN104035228 B CN 104035228B
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Abstract
Description
技术领域technical field
本公开涉及液晶显示器及其制造方法。The present disclosure relates to a liquid crystal display and a method of manufacturing the same.
背景技术Background technique
液晶显示器是当前使用的最普通类型的平板显示器之一,其是通过施加电压到电极来重排列液晶层的液晶分子以控制透射光量的显示器件。A liquid crystal display, which is one of the most common types of flat panel displays currently in use, is a display device that rearranges liquid crystal molecules of a liquid crystal layer by applying a voltage to electrodes to control the amount of transmitted light.
液晶显示器可以容易地形成为薄膜,但是与正面可视性相比较具有不良的侧面可视性。已经发展了各种类型的液晶配向和驱动方法以提高侧面可视性。用于实现宽视角的一种方法涉及在一个基板上形成像素电极和公共电极。Liquid crystal displays can be easily formed as thin films, but have poor side visibility compared to front visibility. Various types of liquid crystal alignment and driving methods have been developed to improve side visibility. One method for achieving wide viewing angles involves forming pixel electrodes and common electrodes on one substrate.
对于液晶显示器,两个场产生电极(即,像素电极和公共电极)中的至少一个具有多个切口并且具有由多个切口限定的多个分支电极。For a liquid crystal display, at least one of the two field generating electrodes (ie, the pixel electrode and the common electrode) has a plurality of cutouts and has a plurality of branch electrodes defined by the plurality of cutouts.
这样,在一个显示面板上形成两个场产生电极的情况中,为了形成每个场产生电极,需要不同的光掩模,这增加了制造成本。As such, in the case of forming two field generating electrodes on one display panel, in order to form each field generating electrode, a different photomask is required, which increases the manufacturing cost.
此外,在其上施加预定电压值的公共电极彼此连接的情况中,施加到公共电极的信号会被延迟。Furthermore, in the case where the common electrodes to which a predetermined voltage value is applied are connected to each other, the signal applied to the common electrodes may be delayed.
发明内容SUMMARY OF THE INVENTION
示范实施方式提供液晶显示器及其制造方法,其具有低的制造成本并且当两个场产生电极形成在一个显示面板上时可以防止公共电极中的信号延迟。Exemplary embodiments provide a liquid crystal display and a method of manufacturing the same, which have low manufacturing costs and can prevent signal delay in a common electrode when two field generating electrodes are formed on one display panel.
本公开的示范实施方式提供一种液晶显示器,包括:多个像素电极和多个公共电极,设置在第一基板上并且彼此交叠,钝化层插置在像素电极和公共电极之间;和连接部分,设置在公共电压施加单元和公共电极之间。公共电极具有多个第一切口、钝化层具有多个第二切口,第一切口和第二切口具有基本相同的平面形状。连接部分包括由与公共电极相同的层形成的下连接部分,和设置在下连接部分上并包括低电阻金属的上连接部分。Exemplary embodiments of the present disclosure provide a liquid crystal display including: a plurality of pixel electrodes and a plurality of common electrodes disposed on a first substrate and overlapping each other, with a passivation layer interposed between the pixel electrodes and the common electrodes; and The connection part is provided between the common voltage applying unit and the common electrode. The common electrode has a plurality of first slits, the passivation layer has a plurality of second slits, and the first slits and the second slits have substantially the same planar shape. The connection portion includes a lower connection portion formed of the same layer as the common electrode, and an upper connection portion provided on the lower connection portion and including a low-resistance metal.
公共电压施加单元设置在显示区周围的外围区中,该显示区包括多个像素电极。液晶显示器可还包括设置在一部分的公共电极上的公共电压线。The common voltage applying unit is disposed in a peripheral area around the display area, and the display area includes a plurality of pixel electrodes. The liquid crystal display may further include a common voltage line disposed on a portion of the common electrodes.
公共电压线可以由与上连接部分相同的层形成。The common voltage line may be formed of the same layer as the upper connection portion.
公共电压线可平行于栅线延伸。The common voltage lines may extend parallel to the gate lines.
公共电压线可以设置在两个相邻的数据线之间并且平行于数据线延伸。The common voltage line may be disposed between two adjacent data lines and extend parallel to the data lines.
第一基板可包括:绝缘基板;多条栅线和多条数据线,设置在绝缘基板上;多个薄膜晶体管,分别连接到多条栅线和多条数据线;和有机层,设置在多个薄膜晶体管上,多个像素电极和公共电极设置在该有机层上。The first substrate may include: an insulating substrate; a plurality of gate lines and a plurality of data lines disposed on the insulating substrate; a plurality of thin film transistors respectively connected to the plurality of gate lines and the plurality of data lines; and an organic layer disposed on the plurality of On each thin film transistor, a plurality of pixel electrodes and common electrodes are arranged on the organic layer.
有机层可以是滤色器。The organic layer may be a color filter.
液晶显示器可还包括设置在第一基板上的光阻挡件。The liquid crystal display may further include a light blocking member disposed on the first substrate.
液晶显示器可还包括:第二基板,面对第一基板;和补偿电极,设置在第二基板的外表面上。The liquid crystal display may further include: a second substrate facing the first substrate; and a compensation electrode disposed on an outer surface of the second substrate.
在第一基板上的公共电极可交叠数据线以形成第一电容器,在第二基板上的补偿电极可与公共电极一起形成第二电容器。The common electrode on the first substrate may overlap the data line to form a first capacitor, and the compensation electrode on the second substrate may form a second capacitor together with the common electrode.
补偿电极可以配置为接收与施加到数据线的数据电压的极性相反的电压以补偿数据线和公共电极之间的耦合。The compensation electrode may be configured to receive a voltage opposite in polarity to the data voltage applied to the data line to compensate for coupling between the data line and the common electrode.
本公开另一示范实施方式提供一种液晶显示器的制造方法,包括:在第一基板上形成多条栅线和多条数据线;在多条栅线和多条数据线上形成有机层;在有机层上形成多个像素电极;在多个像素电极上沉积包括绝缘材料的第一层;在第一层上沉积包括透明导体的第二层;在第二层上形成光敏膜图案;和利用第一光敏膜图案作为蚀刻掩模蚀刻第二层和第一层以同时形成包括多个第一切口的公共电极和包括多个第二切口的钝化层。Another exemplary embodiment of the present disclosure provides a method for manufacturing a liquid crystal display, including: forming a plurality of gate lines and a plurality of data lines on a first substrate; forming an organic layer on the plurality of gate lines and the plurality of data lines; forming a plurality of pixel electrodes on the organic layer; depositing a first layer including an insulating material on the plurality of pixel electrodes; depositing a second layer including a transparent conductor on the first layer; forming a photosensitive film pattern on the second layer; and utilizing The first photosensitive film pattern is used as an etching mask to etch the second layer and the first layer to simultaneously form a common electrode including a plurality of first cutouts and a passivation layer including a plurality of second cutouts.
液晶显示器的制造方法可还包括:形成设置在显示区周围的外围区中的公共电压施加单元,该显示区包括多个像素电极;和形成设置在公共电压施加单元和公共电极之间的连接部分。The method of manufacturing a liquid crystal display may further include: forming a common voltage applying unit disposed in a peripheral area around a display area, the display area including a plurality of pixel electrodes; and forming a connection portion disposed between the common voltage applying unit and the common electrode .
连接部分可以与公共电极和钝化层一起形成。The connection part may be formed together with the common electrode and the passivation layer.
有机层可以包括滤色器。The organic layer may include color filters.
液晶显示器的制造方法可还包括在第一基板上形成光阻挡件。The manufacturing method of the liquid crystal display may further include forming a light blocking member on the first substrate.
液晶显示器的制造方法可还包括在面对第一基板的第二基板的外表面上形成补偿电极。The manufacturing method of the liquid crystal display may further include forming a compensation electrode on an outer surface of the second substrate facing the first substrate.
本公开的另一示范实施方式提供一种液晶显示器的制造方法,包括:在第一基板上形成多条栅线和多条数据线;在多条栅线和多条数据线上形成有机层;在有机层上形成多个像素电极;在多个像素电极上沉积包括绝缘材料的第一层;在第一层上沉积包括透明导体的第二层;在第二层上沉积包括低电阻金属的第三层;在第三层上形成光敏膜图案,其具有根据位置而改变的厚度;通过利用第二光敏膜图案作为蚀刻掩模蚀刻第三层、第二层和第一层,由第一层形成第一绝缘层和由第二层形成公共电极;通过去除一部分的第二光敏膜图案形成第三光敏膜图案;和通过利用该第三光敏膜图案作为蚀刻掩模蚀刻第三层,在一部分的公共电极上形成公共电压线。Another exemplary embodiment of the present disclosure provides a method for manufacturing a liquid crystal display, including: forming a plurality of gate lines and a plurality of data lines on a first substrate; forming an organic layer on the plurality of gate lines and the plurality of data lines; forming a plurality of pixel electrodes on the organic layer; depositing a first layer including an insulating material on the plurality of pixel electrodes; depositing a second layer including a transparent conductor on the first layer; depositing a low-resistance metal on the second layer the third layer; forming a photosensitive film pattern on the third layer, which has a thickness that varies according to the position; by etching the third layer, the second layer and the first layer by using the second photosensitive film pattern as an etching mask, the forming a first insulating layer and forming a common electrode from the second layer; forming a third photosensitive film pattern by removing a part of the second photosensitive film pattern; and etching the third layer by using the third photosensitive film pattern as an etching mask, at A common voltage line is formed on a part of the common electrodes.
液晶显示器的制造方法可还包括在形成第三光敏膜图案之前或之后,通过退火第一基板使第二层结晶。The manufacturing method of the liquid crystal display may further include crystallizing the second layer by annealing the first substrate before or after forming the third photosensitive film pattern.
液晶显示器的制造方法可还包括:在显示区周围的外围区中形成公共电压施加单元,该显示区包括多个像素电极;和在公共电压施加单元和公共电极之间形成连接部分,其中连接部分可以与公共电极和第一绝缘层同时形成。The method of manufacturing a liquid crystal display may further include: forming a common voltage applying unit in a peripheral area around a display area including a plurality of pixel electrodes; and forming a connection portion between the common voltage applying unit and the common electrode, wherein the connection portion It may be formed simultaneously with the common electrode and the first insulating layer.
形成连接部分可包括:当形成公共电极时由与公共电极相同的层形成下连接部分;和当形成公共电压线时由与公共电压线相同的层形成上连接部分。The forming of the connection part may include: forming the lower connection part from the same layer as the common electrode when forming the common electrode; and forming the upper connection part from the same layer as the common voltage line when forming the common voltage line.
根据本公开示范实施方式,能够防止制造成本增加和防止公共电极的信号延迟,同时两个场产生电极形成在一个显示面板上。According to an exemplary embodiment of the present disclosure, it is possible to prevent an increase in manufacturing cost and prevent a signal delay of a common electrode while two field generating electrodes are formed on one display panel.
附图说明Description of drawings
图1是布局图,示出根据本公开示范实施方式的液晶显示器。FIG. 1 is a layout diagram illustrating a liquid crystal display according to an exemplary embodiment of the present disclosure.
图2是沿图1的II-II线截取的液晶显示器的截面图。FIG. 2 is a cross-sectional view of the liquid crystal display taken along line II-II of FIG. 1 .
图3是沿图1的III-III线截取的液晶显示器的截面图。FIG. 3 is a cross-sectional view of the liquid crystal display taken along line III-III of FIG. 1 .
图4是沿图1的IV-IV线截取的液晶显示器的截面图。FIG. 4 is a cross-sectional view of the liquid crystal display taken along line IV-IV of FIG. 1 .
图5A至5C是示出根据本公开另一示范实施方式的液晶显示器的截面图,其是沿图1的V-V线截取的液晶显示器的截面图。5A to 5C are cross-sectional views illustrating a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line V-V of FIG. 1 .
图6是布局图,示出根据本公开示范实施方式的液晶显示器的一部分。FIG. 6 is a layout diagram illustrating a part of a liquid crystal display according to an exemplary embodiment of the present disclosure.
图7是布局图,示出根据本公开另一示范实施方式的液晶显示器的一部分。FIG. 7 is a layout diagram illustrating a part of a liquid crystal display according to another exemplary embodiment of the present disclosure.
图8是沿图7的VIII-VIII线截取的液晶显示器的截面图。FIG. 8 is a cross-sectional view of the liquid crystal display taken along line VIII-VIII of FIG. 7 .
图9是布局图,示出根据本公开另一示范实施方式的液晶显示器。FIG. 9 is a layout diagram illustrating a liquid crystal display according to another exemplary embodiment of the present disclosure.
图10是沿图9的X-X线截取的液晶显示器的截面图。FIG. 10 is a cross-sectional view of the liquid crystal display taken along line X-X of FIG. 9 .
图11是示出根据本公开另一示范实施方式的液晶显示器的一部分的截面图,其是沿图1的II-II线截取的液晶显示器的截面图。11 is a cross-sectional view illustrating a portion of a liquid crystal display according to another exemplary embodiment of the present disclosure, which is a cross-sectional view of the liquid crystal display taken along line II-II of FIG. 1 .
图12是施加到图11的液晶显示器的一些信号的波形图。FIG. 12 is a waveform diagram of some signals applied to the liquid crystal display of FIG. 11 .
图13是布局图,示出根据本公开示范实施方式的液晶显示器的制造方法的一部分。13 is a layout diagram illustrating a part of a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure.
图14是沿图13的XIV-XIV线截取的液晶显示器的截面图。FIG. 14 is a cross-sectional view of the liquid crystal display taken along line XIV-XIV of FIG. 13 .
图15是沿图13的XV-XV线截取的液晶显示器的截面图。FIG. 15 is a cross-sectional view of the liquid crystal display taken along line XV-XV of FIG. 13 .
图16是沿图13的XVI-XVI线截取的液晶显示器的截面图。FIG. 16 is a cross-sectional view of the liquid crystal display taken along line XVI-XVI of FIG. 13 .
图17、20和23是顺序地示出根据本公开示范实施方式的液晶显示器的制造方法的截面图,其是沿图1的II-II线截取的液晶显示器的截面图。17 , 20 and 23 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line II-II of FIG. 1 .
图18、21和24是顺序地示出根据本公开示范实施方式的液晶显示器的制造方法的截面图,其是沿图1的III-III线截取的液晶显示器的截面图。18 , 21 and 24 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line III-III of FIG. 1 .
图19、22和25是顺序地示出根据本公开示范实施方式的液晶显示器的制造方法的截面图,其是沿图1的IV-IV线截取的液晶显示器的截面图。19 , 22 and 25 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line IV-IV of FIG. 1 .
图26、31、36、41、46和51是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图13的XIV-XIV线截取的液晶显示器的截面图。26 , 31 , 36 , 41 , 46 and 51 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along the line XIV-XIV of FIG. 13 . Sectional view.
图27、32、37、42、47和52是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图13的XV-XV线截取的液晶显示器的截面图。FIGS. 27 , 32 , 37 , 42 , 47 and 52 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, taken along the line XV-XV of FIG. 13 . Sectional view.
图28、33、38、43、48和53是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图13的XVI-XVI线截取的液晶显示器的截面图。28 , 33 , 38 , 43 , 48 and 53 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along the line XVI-XVI of FIG. 13 . Sectional view.
图29、34、39、44、49和54是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图9的X-X线截取的液晶显示器的截面图。29 , 34 , 39 , 44 , 49 and 54 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line X-X of FIG. 9 .
图30、35、40、45、50和55是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图7的VIII-VIII线截取的液晶显示器的截面图。30 , 35 , 40 , 45 , 50 and 55 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line VIII-VIII of FIG. 7 . Sectional view.
具体实施方式Detailed ways
现将参考其中显示本公开的示范实施例的附图在其后更加全面地描述本公开。本领域的技术人员将理解,描述的实施例可以以各种不同的形式实现,而没有背离本公开的精神或范围。The present disclosure will now be described more fully hereinafter with reference to the accompanying drawings in which exemplary embodiments of the disclosure are shown. As those skilled in the art would realize, the described embodiments may be embodied in various different forms, all without departing from the spirit or scope of the present disclosure.
在附图中,为了清晰夸大了层、膜、面板、区域等的厚度。通篇相似的附图标记指示相似的元件。可以理解当元件诸如层、膜、区域或基板被称为在另一元件“上”时,它可以直接在另一元件上或可以存在中间的元件。In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like reference numerals refer to like elements throughout. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" another element, it can be directly on the other element or intervening elements may be present.
将参考附图描述根据本公开示范实施方式的液晶显示器。A liquid crystal display according to an exemplary embodiment of the present disclosure will be described with reference to the accompanying drawings.
首先,将参考图1至24描述根据本公开示范实施方式的液晶显示器。图1是布局图,示出根据本公开示范实施方式的液晶显示器。图2是沿图1的II-II线截取的液晶显示器的截面图,图3是沿图1的III-III线截取的液晶显示器的截面图,图4是沿图1的IV-IV线截取的液晶显示器的截面图。First, a liquid crystal display according to an exemplary embodiment of the present disclosure will be described with reference to FIGS. 1 to 24 . FIG. 1 is a layout diagram illustrating a liquid crystal display according to an exemplary embodiment of the present disclosure. 2 is a cross-sectional view of the liquid crystal display taken along line II-II of FIG. 1 , FIG. 3 is a cross-sectional view of the liquid crystal display taken along line III-III of FIG. 1 , and FIG. 4 is a cross-sectional view taken along line IV-IV of FIG. 1 A cross-sectional view of a liquid crystal display.
参考图1至4,根据本公开示范实施方式的液晶显示器包括彼此面对的下面板100和上面板200、以及插置在两个面板100和200之间的液晶层3。1 to 4 , a liquid crystal display according to an exemplary embodiment of the present disclosure includes a
首先,将描述下面板100。First, the
包括栅线121的栅极导体形成在包括透明玻璃或塑料的第一绝缘基板110上。Gate conductors including
栅线121包括栅电极124和用于与另一层或外部驱动电路连接的宽栅极垫部分129。栅线121可包括诸如铝(Al)或铝合金的铝基金属、诸如银(Ag)或银合金的银基金属、诸如铜(Cu)或铜合金的铜基金属、诸如钼(Mo)或钼合金的钼基金属、铬(Cr)、钽(Ta)和钛(Ti)。然而,栅线121可具有包括至少两个导电层的多层结构,该至少两个导电层具有不同的物理性质。The
包括硅氮化物(SiNx)或硅氧化物(SiOx)的栅绝缘层140形成在栅极导体121、124和129上。栅绝缘层140可具有包括至少两个绝缘层的多层结构,该至少两个绝缘层具有不同的物理性质。A
包括非晶硅或多晶硅的半导体154形成在栅绝缘层140上。半导体154可包括氧化物半导体。A
欧姆接触163和165形成在半导体154上。欧姆接触163和165可包括硅化物或诸如n+氢化非晶硅的材料,在该n+氢化非晶硅中诸如磷的n型杂质以高浓度掺杂。欧姆接触163和165可以设置在半导体154上以成对。如果半导体154是氧化物半导体,则可以省略欧姆接触163和165。
包括数据线171、源电极173和漏电极175的数据导体设置在欧姆接触163和165以及栅绝缘层140上。Data conductors including
数据线171包括用于与另一层或外部驱动电路连接的数据垫部分179。数据线171传输数据信号并且主要在垂直方向上延伸以交叉栅线121。The
在此情况下,数据线171可具有曲线形状的第一弯曲部分以最大化液晶显示器的透射率,从上方看时,该弯曲部分可具有字母V形状,其顶点在像素区的中间区域。与第一弯曲部分形成预定角度的第二弯曲部分可以进一步被包括在像素区的中间区域中。In this case, the
数据线171的第一弯曲部分相对于垂直于栅线121的延伸方向的垂直参考线可以形成大约7°的角。设置在像素区的中间区域中的第二弯曲部分相对于第一弯曲部分可进一步形成大约7°至大约15°的角。The first bent portion of the
源电极173是数据线171的一部分并且设置在与数据线171相同的线上。漏电极175平行于源电极173延伸。因此,漏电极175平行于一部分数据线171。The
漏电极175包括第一杆形端部分和面对设置在栅电极124上的源电极173的第二宽端部分。The
第一半导体159和第一接触辅助物169设置在数据垫部分179下面。第一半导体159和第一接触辅助物169可以被省略。The
栅电极124、源电极173和漏电极175与半导体154一起形成薄膜晶体管(TFT),沟道形成在源电极173和漏电极175之间的半导体154中。The
根据本公开示范实施方式的液晶显示器包括设置在数据线171上的源电极173同时漏电极175平行于数据线171延伸,这可增大薄膜晶体管的宽度同时没有增大数据导体的面积,从而增大液晶显示器的开口率。The liquid crystal display according to the exemplary embodiment of the present disclosure includes the
然而,在根据本公开另一示范实施方式的液晶显示器的情况下,源电极173和漏电极175可具有不同的形状。However, in the case of the liquid crystal display according to another exemplary embodiment of the present disclosure, the
数据线171和漏电极175可包括难熔金属,诸如,钼、铬、钽和钛或者其合金,并且可具有包括难熔金属层(未示出)和低电阻导电层(未示出)的多层结构。多层结构的实例包括:包含铬或钼(合金)下层和铝(合金)上层的双层;和包含钼(合金)下层、铝(合金)中间层、以及钼(合金)上层的三层。然而,数据线171和漏电极175可包括除列出的那些之外的各种其他的金属或导体。The
第一钝化层180x设置在数据导体171、173、175和179、栅绝缘层140、以及半导体154的暴露部分上。第一钝化层180x可包括有机绝缘材料或无机绝缘材料。The
有机层80设置在第一钝化层180x上。有机层80具有比第一钝化层180x大的厚度并且可具有平坦的上表面。The
设置在显示区中的有机层80的第一厚度H1可以大于设置在外围区中的有机层80的第二厚度H2,在该显示区中设置多个像素,在该外围区中形成栅极垫部分129和数据垫部分179。The first thickness H1 of the
替换地,有机层80可以设置在其中设置多个像素的显示区中,但是可以不设置在其中形成栅极垫部分和数据垫部分的外围区中。Alternatively, the
在根据本公开另一示范实施方式的液晶显示器中,可以省略有机层80。In the liquid crystal display according to another exemplary embodiment of the present disclosure, the
有机层80被从与漏电极175、栅极垫部分129和数据垫部分179相应的区域去除。The
在有机层80被去除并且与栅极垫部分129相应的区域中的第一钝化层180x和栅绝缘层140中,形成暴露出栅极垫部分129的第一接触孔186。In the
在设置于有机层80被去除并且与数据垫部分179相应的区域中的第一钝化层180x中,形成暴露出数据垫部分179的第二接触孔187。In the
在设置于有机层80被去除并且与漏电极175相应的区域中的第一钝化层180x中,形成第三接触孔185。In the
像素电极191形成在有机层80上。像素电极191包括基本平行于数据线171的第一弯曲部分和第二弯曲部分的弯曲边缘。The
像素电极191可包括透明导电层,诸如ITO或IZO。The
像素电极191通过第三接触孔185与漏电极175物理连接且电连接,以从漏电极175接收电压。The
第一接触辅助物96形成在通过第一接触孔186暴露的栅极垫部分129上,第二接触辅助物97形成在通过第二接触孔187暴露的数据垫部分179上。The
像素电极191、第一接触辅助物96和第二接触辅助物97可以同时形成在相同层上。The
第二钝化层180y形成在像素电极191上,公共电极270形成在第二钝化层180y上。公共电极270可包括透明导电层,诸如ITO或IZO。The
第二钝化层180y和公共电极270具有基本相同的平面形状。The
第二钝化层180y和公共电极270设置在其中设置多个像素的显示区中,而没有设置在其中形成栅极垫部分129和数据垫部分179的外围区中。The
公共电极270具有多个第一切口271,第二钝化层180y具有多个第二切口181。公共电极270的第一切口271和钝化层180y的第二切口181具有相同的平面形状。更具体地,第一切口271的边缘交叠第二切口181的边缘。The
虽然未示出,配向层涂覆在像素电极191和公共电极270的通过第二切口181被暴露的部分上,配向层可以是在预定方向上被摩擦的垂直配向层。然而,根据本公开另一示范实施方式的液晶显示器,配向层可包括光反应材料以被光配向。Although not shown, an alignment layer is coated on portions of the
然后,将描述上面板200。Then, the
光阻挡件220形成在由透明玻璃或塑料制成的第二绝缘基板210上。光阻挡件220也称作黑矩阵并且阻挡光泄漏。The
此外,多个滤色器230形成在第二基板210上。Also, a plurality of
保护层250形成在滤色器230和光阻挡件220上。保护层250可包括有机绝缘体,提供平坦表面,以及可以防止滤色器230被暴露。保护层250可以被省略。The
配向层可以设置在保护层250上。An alignment layer may be disposed on the
液晶层3包括具有正介电各向异性的液晶材料。液晶层3的液晶分子被配向,使得其长轴的方向平行于面板100和200的表面,该方向具有从配向层的摩擦方向直到上面板200的90°扭曲螺旋结构。The
像素电极191从漏电极175接收数据电压,公共电极270从设置在显示区之外的公共电压施加单元接收具有预定大小的公共电压。The
作为场产生电极的像素电极191和公共电极270产生电场,设置在两个电极191和270上的液晶分子在平行于电场方向的方向上旋转。因而,穿过液晶层的光的偏振根据液晶分子的旋转方向而改变。The
在根据本公开示范实施方式的液晶显示器中,设置在像素电极191上的第二钝化层180y和设置在第二钝化层180y上的公共电极270具有基本相同的平面形状。更详细地,公共电极270具有多个第一切口271,第二钝化层180y具有多个第二切口181,第一切口271和第二切口181具有基本相同的平面形状。更具体地,第一切口271的边缘交叠第二切口181的边缘。In the liquid crystal display according to an exemplary embodiment of the present disclosure, the
因此,第二钝化层180y和公共电极270可以通过利用一个光掩模而一起形成。Therefore, the
因此,可以防止液晶显示器的制造成本增加。Therefore, the manufacturing cost of the liquid crystal display can be prevented from increasing.
对于根据图1至4示出的示范实施方式的液晶显示器,有机层80设置在下面板100的第一钝化层180x上,滤色器230和光阻挡件220设置在上面板200上。然而,对于根据本公开另一示范实施方式的液晶显示器,滤色器230,代替有机层80,可以设置在下面板100上,而不在上面板200上。在此情况下,光阻挡件220也可设置在下面板100而不是上面板200上。For the liquid crystal display according to the exemplary embodiment shown in FIGS. 1 to 4 , the
这将参考图5A至5C描述。图5A至5C是示出根据本公开另一示范实施方式的液晶显示器的截面图,其是沿图1的V-V线截取的液晶显示器的截面图。This will be described with reference to FIGS. 5A to 5C. 5A to 5C are cross-sectional views illustrating a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line V-V of FIG. 1 .
参考图5A,光阻挡件220设置在下面板100的第一钝化层180x上。光阻挡件220设置在与栅线121和数据线171相应的区域中。滤色器230设置在部分地交叠光阻挡件220的第一钝化层180x上。盖层180设置在光阻挡件220和滤色器230上。盖层180防止光阻挡件220和滤色器230的颜料渗入液晶层3中。Referring to FIG. 5A , the
像素电极191设置在盖层180上,第二钝化层180y和公共电极270设置在像素电极191上。公共电极270和第二钝化层180y具有第一切口271和第二切口181,该第一切口271和第二切口181具有基本相同的平面形状。更具体地,第一切口271的边缘交叠第二切口181的边缘。The
不存在设置在上面板200上的光阻挡件220或滤色器230。There is no
参考图5B,滤色器230设置在下面板100的第一钝化层180x上。滤色器230设置在与像素电极191相应的区域中。光阻挡件220设置在滤色器230上并且部分地交叠第一钝化层180x。光阻挡件220设置在与栅线121和数据线171相应的区域中。盖层180设置在滤色器230和光阻挡件220上。盖层180防止光阻挡件220和滤色器230的颜料渗入液晶层3中。Referring to FIG. 5B , the
像素电极191设置在盖层180上,第二钝化层180y和公共电极270设置在像素电极191上。公共电极270和第二钝化层180y具有第一切口271和第二切口181,该第一切口271和第二切口181具有基本相同的平面形状。更具体地,第一切口271的边缘交叠第二切口181的边缘。The
不存在设置在上面板200上的光阻挡件220或滤色器230。There is no
参考图5C,根据示范实施方式的液晶显示器与根据图5B中示出的示范实施方式的液晶显示器相似。Referring to FIG. 5C , the liquid crystal display according to the exemplary embodiment is similar to the liquid crystal display according to the exemplary embodiment shown in FIG. 5B .
光阻挡件220设置在下面板100的第一钝化层180x上。光阻挡件220设置在与栅线121和数据线171相应的区域中。滤色器230设置在光阻挡件220上并且部分地交叠第一钝化层180x。The
像素电极191设置在滤色器230上,第二钝化层180y和公共电极270设置在像素电极191上。公共电极270和第二钝化层180y具有第一切口271和第二切口181,该第一切口271和第二切口181具有基本相同的平面形状。更具体地,第一切口271的边缘交叠第二切口181的边缘。The
不存在设置在上面板200上的光阻挡件220或滤色器230。There is no
在根据示范实施方式的液晶显示器中,没有设置在光阻挡件220和滤色器230上的盖层180,不同于根据图5B中示出的液晶显示器。In the liquid crystal display according to the exemplary embodiment, the cover layer 180 provided on the
将参考图6描述根据本公开示范实施方式的公共电极270的平面形状。图6是布局图,示出根据本公开示范实施方式的液晶显示器的一部分。The planar shape of the
参考图6,根据本公开示范实施方式的液晶显示器包括在其中形成多个像素的显示区DA和围绕显示区DA的外围区PA,诸如参考图1至4描述的液晶显示器。6 , a liquid crystal display according to an exemplary embodiment of the present disclosure includes a display area DA in which a plurality of pixels are formed and a peripheral area PA surrounding the display area DA, such as the liquid crystal display described with reference to FIGS. 1 to 4 .
公共电极270形成在显示区DA中并且具有设置在每个像素区中的多个第一切口271。多个第一切口271形成在与在每个像素区中设置的像素电极191相应的位置。The
在外围区PA中,设置了施加公共电压到公共电极270的公共电压施加单元50,连接部分27设置在公共电压施加单元50和公共电极270之间。公共电极270和连接部分27可以同时形成在相同层上。In the peripheral area PA, the common
将参考图7和8更详细地描述根据本公开示范实施方式的公共电极270。图7是示出根据本公开另一示范实施方式的液晶显示器的一部分的布局图,图8是沿图7的VIII-VIII线截取的液晶显示器的截面图。The
参考图7和8,根据本公开示范实施方式的液晶显示器包括在其中形成多个像素的显示区DA和围绕显示区DA的外围区PA,诸如参考图1至4描述的液晶显示器。7 and 8 , a liquid crystal display according to an exemplary embodiment of the present disclosure includes a display area DA in which a plurality of pixels are formed and a peripheral area PA surrounding the display area DA, such as the liquid crystal display described with reference to FIGS. 1 to 4 .
公共电极270形成在显示区DA中并且具有设置在每个像素区中的多个第一切口271。多个第一切口271形成在与在每个像素区中设置的像素电极191相应的位置。The
公共电压施加单元50设置在外围区PA中并且施加公共电压到公共电极270,连接部分27设置在公共电压施加单元50和公共电极270之间。连接部分27包括由与公共电极270相同的层形成的下连接部分27p和设置在下连接部分27p上的上连接部分27q。The common
连接部分27的下连接部分27p包括透明导体,类似于公共电极270,连接部分27的上连接部分27q包括低电阻金属。The
通过由包括下连接部分27p和上连接部分27q的双层形成将公共电压施加单元50连接到公共电极270的连接部分27,从公共电压施加单元50施加的公共电压可以被传输到公共电极270而没有信号延迟。By forming the connecting
第二钝化层180y、公共电极270和连接部分27可以通过利用一个光掩模而形成。The
将参考图9和10描述根据本公开另一示范实施方式的液晶显示器。图9是示出根据本公开另一示范实施方式的液晶显示器的一部分的布局图,图10是沿图9的X-X线截取的液晶显示器的截面图。A liquid crystal display according to another exemplary embodiment of the present disclosure will be described with reference to FIGS. 9 and 10 . FIG. 9 is a layout view illustrating a portion of a liquid crystal display according to another exemplary embodiment of the present disclosure, and FIG. 10 is a cross-sectional view of the liquid crystal display taken along line X-X of FIG. 9 .
参考图9和10,根据示范实施方式的液晶显示器与根据图1至4示出的示范实施方式的液晶显示器相似。Referring to FIGS. 9 and 10 , the liquid crystal display according to the exemplary embodiment is similar to the liquid crystal display according to the exemplary embodiment shown in FIGS. 1 to 4 .
根据本公开另一示范实施方式的液晶显示器包括彼此面对的下面板100和上面板200、以及插置在两个面板100和200之间的液晶层3。A liquid crystal display according to another exemplary embodiment of the present disclosure includes a
首先,将描述下面板100。First, the
包括栅电极124的栅线121设置在第一绝缘基板110上,栅绝缘层140形成在栅线121上。The
半导体层154形成在栅绝缘层140上。欧姆接触(未示出)形成在半导体154上。如果半导体154是氧化物半导体,则可以省略欧姆接触163和165。The
包括源电极173和漏电极175的数据线171设置在欧姆接触和栅绝缘层140上。The
数据线171可具有曲线形状的第一弯曲部分以最大化液晶显示器的透射率,该弯曲部分可具有字母V形状,其顶点在像素区的中间区域。与第一弯曲部分形成预定角度的第二弯曲部分可以进一步被包括在像素区的中间区域中。The
第一钝化层180x设置在数据导体171、173和175、栅绝缘层140、以及半导体154的暴露部分上。第一钝化层180x可包括有机绝缘材料或无机绝缘材料。The
有机层80设置在第一钝化层180x上。有机层80具有比第一钝化层180x大的厚度并且可具有平坦的上表面。The
如参考图5A至5C所描述的,有机层80可以是滤色器230。As described with reference to FIGS. 5A to 5C , the
有机层80和第一钝化层180x具有穿过其形成的第三接触孔185。The
像素电极191形成在有机层80上。像素电极191包括基本平行于数据线171的第一弯曲部分和第二弯曲部分的弯曲边缘。The
像素电极191通过第一接触孔185与漏电极175物理连接且电连接,以从漏电极175接收电压。The
第二钝化层180y形成在像素电极191上,公共电极270形成在第二钝化层180y上。The
第二钝化层180y和公共电极270具有基本相同的平面形状。The
公共电极270具有多个第一切口271,第二钝化层180y具有多个第二切口(未示出)。第一切口271和第二切口具有相同的平面形状。更具体地,第一切口271的边缘交叠第二切口的边缘。The
公共电压线28设置在公共电极270上。公共电压线28可包括低电阻金属以防止公共电极270的信号延迟。The
在根据示范实施方式的液晶显示器中,公共电压线28平行于栅线121延伸,但是在根据本公开另一示范实施方式的液晶显示器中,公共电压线28可平行于数据线171延伸。在此情况下,两个像素电极191可以设置在两个相邻的数据线171之间,公共电压线28可以设置在两个相邻的数据线171之间以及在两个像素电极191之间,以防止两个像素电极191之间的光泄漏。In the liquid crystal display according to the exemplary embodiment, the
在根据示范实施方式的液晶显示器中,类似于根据图7和8中示出的示范实施方式的液晶显示器,公共电压270和公共电压施加单元50之间的连接部分27可包括下连接部分27p和设置在下连接部分27p上的上连接部分27q。In the liquid crystal display according to the exemplary embodiment, similar to the liquid crystal display according to the exemplary embodiment shown in FIGS. 7 and 8 , the
公共电压线28可以由与连接部分27的上连接部分27q相同的层形成。The
即,公共电极270和连接部分27的下连接部分27p可以由相同层形成,公共电压线28和连接部分27的上连接部分27q可以由相同层形成。That is, the
虽然未示出,配向层设置在像素电极191的通过第一切口271和第二切口181被暴露的部分上。Although not shown, an alignment layer is provided on a portion of the
将描述上面板200。The
光阻挡件(图10中未示出)和多个滤色器230形成在第二绝缘基板210上。保护层250形成在滤色器230和光阻挡件上。配向层可以设置在保护层250上。A light blocking member (not shown in FIG. 10 ) and a plurality of
如上所述,如果有机层80是滤色器,则可以省略上面板200的滤色器230。此外,上面板200的光阻挡件也可形成在下面板100上。As described above, if the
液晶层3包括具有正介电各向异性的液晶材料。液晶层3的液晶分子被配向,使得其长轴的方向平行于面板100和200的表面,该方向具有从配向层的摩擦方向直到上面板200的90°扭曲螺旋结构。The
像素电极191从漏电极175接收数据电压,公共电极270从设置在显示区之外的公共电压施加单元接收具有预定大小的公共电压。The
像素电极191和公共电极270是产生电场的场产生电极,因此设置在两个电极191和270上的液晶分子在平行于电场方向的方向上旋转。因而,穿过液晶层的光的偏振根据液晶分子的旋转方向而改变。The
在根据本公开示范实施方式的液晶显示器中,第二钝化层180y和公共电极270具有基本相同的平面形状。更详细地,公共电极270具有多个第一切口271、第二钝化层180y具有多个第二切口,第一切口271和第二切口具有基本相同的平面形状。更具体地,第一切口271的边缘交叠第二切口181的边缘。In the liquid crystal display according to an exemplary embodiment of the present disclosure, the
此外,连接部分27的下连接部分27p由与公共电极270相同的层形成,公共电压线28由与连接部分27的上连接部分27q相同的层形成。此外,第二钝化层180y、公共电极270、连接部分27和公共电压线28可以通过利用一个光掩模同时形成。Further, the
因此,可以防止液晶显示器的制造成本增加,并且可以防止公共电极270的信号延迟。Therefore, the manufacturing cost of the liquid crystal display can be prevented from increasing, and the signal delay of the
根据参考图1至4、5A至5C、6、7和8描述的示范实施方式的液晶显示器的许多特征可以应用于根据示范实施方式的液晶显示器。Many features of the liquid crystal displays according to the exemplary embodiments described with reference to FIGS. 1 to 4 , 5A to 5C, 6, 7 and 8 may be applied to the liquid crystal displays according to the exemplary embodiments.
将参考图11和12描述根据本公开另一示范实施方式的液晶显示器。图11是示出根据本公开另一示范实施方式的液晶显示器的一部分的截面图,图12是施加到图11的液晶显示器的一些信号的波形图。A liquid crystal display according to another exemplary embodiment of the present disclosure will be described with reference to FIGS. 11 and 12 . 11 is a cross-sectional view illustrating a portion of a liquid crystal display according to another exemplary embodiment of the present disclosure, and FIG. 12 is a waveform diagram of some signals applied to the liquid crystal display of FIG. 11 .
参考图11,根据示范实施方式的液晶显示器还包括设置在上面板200的外表面上的补偿电极280。Referring to FIG. 11 , the liquid crystal display according to the exemplary embodiment further includes a
设置在下面板200上的公共电极270交叠数据线171以形成第一电容器C1,公共电极270与补偿电极280一起形成第二电容器C2。The
具有与施加到数据线171的数据电压相反的极性的电压被施加到补偿电极280以补偿数据线171和公共电极270之间的耦合。A voltage having an opposite polarity to the data voltage applied to the
这将参考图12更详细地描述。This will be described in more detail with reference to FIG. 12 .
参考图12,数据线171和公共电极270彼此交叠以形成第一电容器C1。因此,被施加预定电压的公共电极270的公共电压Vcom可通过与施加到数据线171的数据电压D耦合而改变第一数值W1。在此情况下,从补偿电极280施加补偿电压Ccps,该补偿电压Ccps具有与施加到数据线171的数据电压D相反的极性。Referring to FIG. 12, the
补偿电极280和公共电极270彼此交叠以形成第二电容器C2。因此,公共电极270的公共电压Vcom可通过与补偿电极280耦合而改变第二数值W2。即,通过施加与数据电压D极性相反的电压到补偿电极280,因数据电压D导致的公共电压Vcom的第一数值改变W1通过与补偿电压Ccps耦合而被补偿,从而一致地保持公共电压Vcom的数值。The
根据参考图1至4、5A至5C、6、7、8、9和10描述的示范实施方式的液晶显示器的许多特征可以应用于根据示范实施方式的液晶显示器。Many features of the liquid crystal displays according to the exemplary embodiments described with reference to FIGS. 1 to 4, 5A to 5C, 6, 7, 8, 9 and 10 may be applied to the liquid crystal displays according to the exemplary embodiments.
除图1至4之外,还将参考图13至22描述根据本公开示范实施方式的液晶显示器的制造方法。图13是示出根据本公开示范实施方式的液晶显示器的制造方法的一部分的布局图,图14是沿图13的XIV-XIV线截取的液晶显示器的截面图,图15是沿图13的XV-XV线截取的液晶显示器的截面图,图16是沿图13的XVI-XVI线截取的液晶显示器的截面图。图17、20和23是顺序地示出根据本公开示范实施方式的液晶显示器的制造方法的截面图,其是沿图1的II-II线截取的液晶显示器的截面图。图18、21和24是顺序地示出根据本公开示范实施方式的液晶显示器的制造方法的截面图,其是沿图1的III-III线截取的液晶显示器的截面图。图19、22和25是顺序地示出根据本公开示范实施方式的液晶显示器的制造方法的截面图,其是沿图1的IV-IV线截取的液晶显示器的截面图。In addition to FIGS. 1 to 4 , a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure will be described with reference to FIGS. 13 to 22 . 13 is a layout view illustrating a part of a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, FIG. 14 is a cross-sectional view of the liquid crystal display taken along line XIV-XIV of FIG. 13 , and FIG. 15 is a view along XV of FIG. 13 - A cross-sectional view of the liquid crystal display taken along the line XV, and FIG. 16 is a cross-sectional view of the liquid crystal display taken along the line XVI-XVI of FIG. 13 . 17 , 20 and 23 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line II-II of FIG. 1 . 18 , 21 and 24 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line III-III of FIG. 1 . 19 , 22 and 25 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line IV-IV of FIG. 1 .
首先,参考图13至16,包括栅电极124和栅极垫部分129的栅线121形成在第一绝缘基板110上,栅绝缘层140形成在栅线121上。半导体154、欧姆接触163和165、以及数据导体形成在栅绝缘层140上,该数据导体包括数据线171、源电极173、数据垫部分179和漏电极175。第一钝化层180x和有机层80形成在数据线171和漏电极175上。第一接触孔186、第二接触孔187和第三接触孔185穿过第一钝化层180x和有机层80形成以分别暴露出栅极垫部分129、数据垫部分179和漏电极。此外,第一接触辅助物96形成在通过第一接触孔186暴露的栅极垫部分129上,第二接触辅助物97形成在通过第二接触孔187暴露的数据垫部分179上,像素电极191形成为通过第一接触孔185与漏电极175连接。在此情况下,有机层80可以是滤色器并且可以与光阻挡件一起形成。设置在显示区中的有机层80的第一厚度H1可以大于设置在外围区中的有机层80的第二厚度H2,该显示区包括多个像素,该外围区包括栅极垫部分129和数据垫部分179。First, referring to FIGS. 13 to 16 , the
此后,如图1至4所示,第二钝化层180y和公共电极270形成在像素电极191上。这将参考图17至25描述。Thereafter, as shown in FIGS. 1 to 4 , the
首先,如图17至19所示,包括硅氮化物(SiNx)或硅氧化物(SiOx)的第一层10沉积在像素电极191、第一接触辅助物96和第二接触辅助物97上,包括透明导体的第二层20沉积在第一层10上。第一光敏膜400沉积在第二层20上。First, as shown in FIGS. 17 to 19 , the
然后,如图20至22所示,第一光敏膜400利用光掩模被曝光且显影以形成第一光敏膜图案400a。在此情况下,在栅极垫部分129和数据垫部分179周围没有形成第一光敏膜图案400a。Then, as shown in FIGS. 20 to 22, the first
此后,参考图23至25,第二层20和第一层10通过利用第一光敏膜图案400a顺序地被蚀刻,以形成包括多个第一切口271和多个第二切口181的公共电极270和第二钝化层180y。在此情况下,由于在栅极垫部分129和数据垫部分179周围没有形成第一光敏膜图案400a,所以公共电极270和第二钝化层180y没有形成在栅极垫部分129和数据垫部分179周围。Thereafter, referring to FIGS. 23 to 25 , the
因而,在形成下面板100之后,通过形成上面板200并且在两个面板100和200之间注入液晶层3而完成液晶显示器,如图1至4所示。Thus, after the
现在将参考图26至55描述根据本公开另一示范实施方式的液晶显示器的制造方法。图26、31、36、41、46和51是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图13的XIV-XIV线截取的液晶显示器的截面图。图27、32、37、42、47和52是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图13的XV-XV线截取的液晶显示器的截面图。图28、33、38、43、48和53是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图13的XVI-XVI线截取的液晶显示器的截面图。图29、34、39、44、49和54是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图9的X-X线截取的液晶显示器的截面图。图30、35、40、45、50和55是顺序地示出根据本公开另一示范实施方式的液晶显示器的制造方法的截面图,其是沿图7的VIII-VIII线截取的液晶显示器的截面图。A method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure will now be described with reference to FIGS. 26 to 55 . 26 , 31 , 36 , 41 , 46 and 51 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along the line XIV-XIV of FIG. 13 . Sectional view. FIGS. 27 , 32 , 37 , 42 , 47 and 52 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, taken along the line XV-XV of FIG. 13 . Sectional view. 28 , 33 , 38 , 43 , 48 and 53 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along the line XVI-XVI of FIG. 13 . Sectional view. 29 , 34 , 39 , 44 , 49 and 54 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line X-X of FIG. 9 . 30 , 35 , 40 , 45 , 50 and 55 are cross-sectional views sequentially illustrating a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present disclosure, which are cross-sectional views of the liquid crystal display taken along line VIII-VIII of FIG. 7 . Sectional view.
首先,参考图26至30,包括栅电极124和栅极垫部分129的栅线121形成在第一绝缘基板110上,栅绝缘层140形成在栅线121上。半导体154、欧姆接触163和165、以及数据导体形成在栅绝缘层140上,该数据导体包括数据线171、源电极173、数据垫部分179和漏电极175。第一钝化层180x和有机层80形成在数据线171和漏电极175上。第一接触孔186、第二接触孔187和第三接触孔185穿过第一钝化层180x和有机层80形成以分别暴露出栅极垫部分129、数据垫部分179和漏电极。此外,第一接触辅助物96形成在通过第一接触孔186暴露的栅极垫部分129上,第二接触辅助物97形成在通过第二接触孔187暴露的数据垫部分179上,像素电极191形成为通过第三接触孔185与漏电极175连接。在此情况下,有机层80可以是滤色器并且可以与光阻挡件一起形成。设置在显示区中的有机层80的第一厚度H1可以大于设置在外围区中的有机层80的第二厚度H2,该显示区包括多个像素,该外围区包括栅极垫部分129或数据垫部分179。First, referring to FIGS. 26 to 30 , the
然后,包括硅氮化物(SiNx)或硅氧化物(SiOx)的第一层10沉积在像素电极191、第一接触辅助物96和第二接触辅助物97上,包括透明导体的第二层20沉积在第一层10上,包括低电阻金属的第三层30沉积在第二层20上。第二光敏膜500沉积在第三层30上。Then, the
如图31至35所示,第二光敏膜500通过利用光掩模被曝光和显影以形成第二光敏膜图案500a和500b,该光掩模包括半透明区、光透射区和光阻挡区,该第二光敏膜图案500a和500b具有根据位置而改变的厚度。在此情况下,在栅极垫部分129和数据垫部分179周围没有形成第二光敏膜图案500a和500b。As shown in FIGS. 31 to 35, the second
各种方法可以用于根据位置改变光敏膜的厚度。例如,在光掩模中定位半透明区、光透射区和光阻挡区的方法包括在半透明区中提供具有中等透射率和中等厚度的薄膜、格子图案、或缝图案。对于缝图案,缝之间的距离或缝宽度可以小于光刻工艺中使用的曝光器的分辨率。另一实例包括利用能够回流的光敏膜的方法。即,可回流的光敏膜由仅具有光透射区和光阻挡区的曝光掩模形成,光敏膜回流到光敏膜被去除的区域中以形成薄的部分。这样,通过减少一个光刻工艺简化了制造方法。Various methods can be used to vary the thickness of the photosensitive film according to the position. For example, a method of locating the translucent, light-transmitting, and light-blocking regions in a photomask includes providing a thin film, a lattice pattern, or a slit pattern with an intermediate transmittance and an intermediate thickness in the translucent region. For slit patterns, the distance between slits or slit width may be less than the resolution of the exposure device used in the lithography process. Another example includes a method utilizing a photosensitive film capable of reflow. That is, the reflowable photosensitive film is formed of an exposure mask having only a light transmitting region and a light blocking region, and the photosensitive film is reflowed into the region from which the photosensitive film was removed to form a thin portion. In this way, the manufacturing method is simplified by eliminating one lithography process.
然后,如图36至40所示,第三层30、第二层20和第一层10利用第二光敏膜图案500a和500b作为蚀刻掩模被同时或顺序地蚀刻以形成第一绝缘层图案11、第二导电层图案21和第三导电层图案31。在此情况下,由于在栅极垫部分129和数据垫部分179周围没有形成第二光敏膜图案500a和500b,所以在栅极垫部分129和数据垫部分179周围第一层10至第三层30都被去除。Then, as shown in FIGS. 36 to 40 , the
如图41至45所示,第二光敏膜图案500a和500b的高度和厚度通过诸如灰化的方法而减小,同时,薄的光敏膜图案500a被去除以形成第三光敏膜图案500c。As shown in FIGS. 41 to 45, the heights and thicknesses of the second
参考图46至50,在形成第三光敏膜图案500c之后,第一绝缘基板110被退火。形成第二导电层图案21的ITO或IZO通过退火而结晶。在根据示出的示范实施方式的液晶显示器的制造方法中,在形成第三光敏膜图案500c之后,第一绝缘基板110可以被退火。然而,根据本公开另一示范实施方式的液晶显示器的制造方法,在形成第一绝缘层图案11、第二导电层图案21和第三导电层图案31之后并且在形成第三光敏膜图案500c之前,第一绝缘基板110可以被退火以使形成第二导电层图案21的ITO或IZO结晶。46 to 50, after the third
然后,如图51至55所示,第三导电层图案31利用第三光敏膜图案500c作为蚀刻掩模被蚀刻以完成第二钝化层180y、公共电极270、连接部分27的下连接部分27p、连接部分27的上连接部分27q以及公共电极线28。Then, as shown in FIGS. 51 to 55, the third
此后,第三光敏膜图案500c被去除以形成下面板100。Thereafter, the third
因而,在形成下面板100之后,通过形成上面板200并且在两个面板100和200之间注入液晶层3而完成液晶显示器,如图7、8、9以及10所示。Thus, after forming the
如上所述,根据本公开示范实施方式的液晶显示器的制造方法,公共电极270和第二钝化层180y同时形成,公共电压线28和包括下连接部分27p及上连接部分27q的连接部分27同时形成。结果,能够减小液晶显示器的制造成本,同时防止施加到公共电极的公共电压的信号延迟。As described above, according to the method of manufacturing a liquid crystal display according to an exemplary embodiment of the present disclosure, the
虽然已经结合目前认为是实际的示范实施方式来描述此公开,但是将理解的是,本公开不限于公开的实施方式,相反地,而是旨在覆盖被包括在权利要求及其等价物的精神和范围内的各种变型和等效布置。While this disclosure has been described in connection with what are presently considered to be actual exemplary embodiments, it is to be understood that this disclosure is not limited to the disclosed embodiments, but on the contrary, is intended to cover the spirit and scope of the claims included in the claims and their equivalents. Various modifications and equivalent arrangements within the range.
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150023160A (en) | 2013-08-23 | 2015-03-05 | 삼성디스플레이 주식회사 | Thin film transistor array panel and manufacturing method thereof |
| KR102182428B1 (en) | 2014-02-18 | 2020-11-25 | 삼성디스플레이 주식회사 | Display device and manufacturing method thereof |
| KR20160013433A (en) | 2014-07-25 | 2016-02-04 | 삼성디스플레이 주식회사 | Display device and method for fabricating the same |
| CN104298020A (en) * | 2014-10-20 | 2015-01-21 | 京东方科技集团股份有限公司 | Array substrate used in ADS (adaptive damping system) display device |
| CN104536222A (en) * | 2014-12-22 | 2015-04-22 | 深圳市华星光电技术有限公司 | FFS array substrate and liquid crystal display panel |
| CN104503161B (en) | 2014-12-24 | 2017-11-10 | 厦门天马微电子有限公司 | Pixel electrode, array base palte, display panel |
| EP3086170B1 (en) | 2015-04-21 | 2020-12-02 | LG Display Co., Ltd. | Liquid crystal display |
| CN104851404B (en) * | 2015-06-04 | 2018-09-04 | 合肥鑫晟光电科技有限公司 | Array substrate and its restorative procedure, test method, production method, display device |
| CN106847757B (en) * | 2017-03-09 | 2019-11-01 | 京东方科技集团股份有限公司 | A kind of display base plate and preparation method thereof, display device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1369731A (en) * | 2001-01-29 | 2002-09-18 | 株式会社日立制作所 | Liquid crystal display device |
| US6507383B1 (en) * | 2000-03-21 | 2003-01-14 | Hitachi, Ltd. | In-plane switching liquid crystal display apparatus with reduced capacitance between pixel electrodes and common electrodes |
| CN1614742A (en) * | 2003-11-04 | 2005-05-11 | Lg.菲利浦Lcd株式会社 | Thin film transistor substrate with horizontal electric field and its manufacture |
| CN101408698A (en) * | 2007-07-09 | 2009-04-15 | Nec液晶技术株式会社 | Lateral electric-field type liquid crystal display device and method of fabricating the same |
| CN101625491A (en) * | 2008-07-11 | 2010-01-13 | 乐金显示有限公司 | Liquid crystal display device and method for fabricating the same |
| CN101738793A (en) * | 2008-11-07 | 2010-06-16 | 奇美电子股份有限公司 | Liquid crystal display panel capable of compensating common voltage and liquid crystal display |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2643100B2 (en) * | 1994-12-26 | 1997-08-20 | インターナショナル・ビジネス・マシーンズ・コーポレイション | Method and apparatus for driving liquid crystal display device |
| JP3019819B2 (en) * | 1997-10-09 | 2000-03-13 | 日本電気株式会社 | Active matrix type liquid crystal display device and display method thereof |
| KR100604271B1 (en) * | 2000-10-16 | 2006-07-24 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display |
| TW522570B (en) * | 2001-11-06 | 2003-03-01 | Hannstar Display Corp | Manufacturing method of thin film transistor array substrate and its structure |
| KR20040025472A (en) | 2002-09-19 | 2004-03-24 | 엘지.필립스 엘시디 주식회사 | In plane switching mode liquid crystal display device |
| KR101001520B1 (en) * | 2003-10-09 | 2010-12-14 | 엘지디스플레이 주식회사 | Transverse electric field type liquid crystal display device and manufacturing method thereof |
| KR100930920B1 (en) | 2004-06-30 | 2009-12-10 | 엘지디스플레이 주식회사 | CIO structure liquid crystal display device and manufacturing method thereof |
| KR101172048B1 (en) | 2005-06-30 | 2012-08-08 | 엘지디스플레이 주식회사 | Liquid Crystal Display And Method For Fabricating The Same |
| KR101189275B1 (en) * | 2005-08-26 | 2012-10-09 | 삼성디스플레이 주식회사 | Thin film transistor array panel and method for manufacturing the same |
| JP2007212706A (en) * | 2006-02-09 | 2007-08-23 | Epson Imaging Devices Corp | Liquid crystal display device |
| TWI341033B (en) * | 2007-10-31 | 2011-04-21 | Au Optronics Corp | Pixel structure and method for manufacturing the same |
| KR20090054194A (en) | 2007-11-26 | 2009-05-29 | 엘지디스플레이 주식회사 | Transverse electric field type liquid crystal display device and manufacturing method thereof |
| JP5394655B2 (en) * | 2008-04-28 | 2014-01-22 | 株式会社ジャパンディスプレイ | Liquid crystal display |
| JP5348521B2 (en) * | 2008-06-27 | 2013-11-20 | 株式会社ジャパンディスプレイ | LCD panel |
| US8508495B2 (en) * | 2008-07-03 | 2013-08-13 | Apple Inc. | Display with dual-function capacitive elements |
| KR101623188B1 (en) * | 2009-11-20 | 2016-05-20 | 엘지디스플레이 주식회사 | Liquid crystal display device and Method of fabricating the same |
| KR101694151B1 (en) * | 2009-12-11 | 2017-01-10 | 엘지디스플레이 주식회사 | Array substrate for fringe field switching mode liquid crystal display device |
| KR101254561B1 (en) * | 2010-05-04 | 2013-04-19 | 엘지디스플레이 주식회사 | Array substrate for in-plane switching mode liquid crystal display device |
| KR20120044745A (en) | 2010-10-28 | 2012-05-08 | 삼성모바일디스플레이주식회사 | Liquid crystal display device and manufacturing method thereof |
| JP5437971B2 (en) * | 2010-10-29 | 2014-03-12 | 株式会社ジャパンディスプレイ | Liquid crystal display |
| KR101775726B1 (en) | 2010-11-26 | 2017-09-07 | 엘지디스플레이 주식회사 | Method for fabricating Liquid Crystal Display Device |
| KR20120072817A (en) | 2010-12-24 | 2012-07-04 | 엘지디스플레이 주식회사 | Liquid crystal display device |
| KR101881277B1 (en) * | 2011-05-18 | 2018-07-24 | 엘지디스플레이 주식회사 | Liquid Crystal Display Device And Method Of Manufacturing The Same |
| CN102709241A (en) * | 2012-05-11 | 2012-10-03 | 北京京东方光电科技有限公司 | Thin film transistor array substrate and preparation method and display device |
| KR101493128B1 (en) * | 2012-09-27 | 2015-02-23 | 엘지디스플레이 주식회사 | Liquid Crystal Display Panel and Method fo Manufacturing the same |
-
2013
- 2013-03-04 KR KR1020130022959A patent/KR102074424B1/en active Active
-
2014
- 2014-02-05 EP EP14154007.0A patent/EP2775347B1/en active Active
- 2014-02-14 US US14/180,759 patent/US9599845B2/en active Active
- 2014-03-04 CN CN201410076914.6A patent/CN104035228B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6507383B1 (en) * | 2000-03-21 | 2003-01-14 | Hitachi, Ltd. | In-plane switching liquid crystal display apparatus with reduced capacitance between pixel electrodes and common electrodes |
| CN1369731A (en) * | 2001-01-29 | 2002-09-18 | 株式会社日立制作所 | Liquid crystal display device |
| CN1614742A (en) * | 2003-11-04 | 2005-05-11 | Lg.菲利浦Lcd株式会社 | Thin film transistor substrate with horizontal electric field and its manufacture |
| CN101408698A (en) * | 2007-07-09 | 2009-04-15 | Nec液晶技术株式会社 | Lateral electric-field type liquid crystal display device and method of fabricating the same |
| CN101625491A (en) * | 2008-07-11 | 2010-01-13 | 乐金显示有限公司 | Liquid crystal display device and method for fabricating the same |
| CN101738793A (en) * | 2008-11-07 | 2010-06-16 | 奇美电子股份有限公司 | Liquid crystal display panel capable of compensating common voltage and liquid crystal display |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2775347A3 (en) | 2014-12-10 |
| EP2775347A2 (en) | 2014-09-10 |
| CN104035228A (en) | 2014-09-10 |
| EP2775347B1 (en) | 2019-11-06 |
| KR20140108967A (en) | 2014-09-15 |
| US9599845B2 (en) | 2017-03-21 |
| KR102074424B1 (en) | 2020-02-07 |
| US20140247411A1 (en) | 2014-09-04 |
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