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CN104300361A - Semiconductor laser unit cavity surface coating film control wafer and application - Google Patents

Semiconductor laser unit cavity surface coating film control wafer and application Download PDF

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Publication number
CN104300361A
CN104300361A CN201410505751.9A CN201410505751A CN104300361A CN 104300361 A CN104300361 A CN 104300361A CN 201410505751 A CN201410505751 A CN 201410505751A CN 104300361 A CN104300361 A CN 104300361A
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sheet
semiconductor laser
cavity surface
laser unit
accompanying
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CN201410505751.9A
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Chinese (zh)
Inventor
崔碧峰
何新
凌小涵
刘梦涵
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Beijing University of Technology
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Beijing University of Technology
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Publication of CN104300361A publication Critical patent/CN104300361A/en
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Abstract

The invention provides a semiconductor laser unit cavity surface coating film control wafer and belongs to the technical field of semiconductor laser unit technologies. At present, coating film control wafers used at home and abroad are manufactured according to the size of a formal wafer, the semiconductor laser unit cavity surface coating film control wafer is single-sided I-shaped, and the other side of the control wafer is still the same as the formal wafer in size. The semiconductor laser unit cavity surface coating film control wafer is exquisite in design, easy to process, practical, simple and convenient to operate, separation difficulty brought by film layer adhesion after film coating is reduced, the damage degree of a semiconductor laser unit cavity surface film is reduced, and the reliability of a semiconductor laser unit is improved.

Description

一种半导体激光器腔面镀膜陪片及使用A semiconductor laser cavity surface coating companion and its use

技术领域technical field

本发明涉及一种半导体激光器腔面镀膜陪片,本发明涉及一种用于保护半导体激光器腔面膜层的陪片,属于半导体激光器工艺技术领域。The invention relates to a coating companion on the cavity surface of a semiconductor laser. The invention relates to a companion for protecting the cavity film layer of a semiconductor laser, and belongs to the technical field of semiconductor laser technology.

背景技术Background technique

大功率半导体激光器具有全固态,体积小,重量轻,长寿命,高效率,可靠性高,可调制,可稳定低压运转等特点,主要用于固体激光器的泵浦源,并在激光加工,激光焊接,激光打印的等领域有广泛应用。半导体激光器是新一代高新技术的关键元器件,在未来工业发展中占着举足轻重的作用。High-power semiconductor lasers have the characteristics of all solid-state, small size, light weight, long life, high efficiency, high reliability, adjustable, stable low-voltage operation, etc. They are mainly used as pump sources for solid-state lasers, and in laser processing, laser Welding, laser printing and other fields have a wide range of applications. Semiconductor lasers are the key components of a new generation of high-tech, and will play a pivotal role in future industrial development.

作为谐振腔的解理面是半导体激光器的重要组成部分,它对于器件的可靠性有着非常重要的影响。通常的GaAs激光器其自然解理面的反射率约为32%,不是理想值,而且这种自然解理面在空气中容易氧化和遭受周围环境污染,抑制了激光器性能,特别是高功率激光器的使用寿命。而对激光器腔面进行优化镀膜,可以在一定程度上改善激光器的输出特性,提高其输出功率和使用寿命,它已经成为一种广泛应用的改善半导体激光器特性的手段之一。The cleavage plane as the resonator is an important part of the semiconductor laser, and it has a very important influence on the reliability of the device. The reflectivity of the natural cleavage plane of the usual GaAs laser is about 32%, which is not an ideal value, and this natural cleavage plane is easy to oxidize in the air and be polluted by the surrounding environment, which inhibits the performance of the laser, especially for high-power lasers. service life. Optimizing the coating on the cavity surface of the laser can improve the output characteristics of the laser to a certain extent, increase its output power and service life, and it has become one of the widely used means to improve the characteristics of semiconductor lasers.

因为半导体激光器单个管芯尺寸很小,通常长度为500至600微米,宽度(腔长)为1至4毫米,高度为120至130微米,所以一般在腔面镀膜时采取半导体激光器解理条形式(每个半导体激光器解理条可以解理成若干个半导体激光器单个管芯)。解理条(5)如图5所示,解理条的高度为120至130微米,宽度(腔长)为1至4毫米,长度为1至3厘米。半导体激光器镀膜陪片的设计必须解决以下基本问题:陪片结构必须保证镀膜后的正式片和陪片可以有效地分开,并且保证正式片腔面的整齐。因此,我们设计一种新型半导体激光器腔面镀膜陪片,此陪片设计精巧,易于加工,实用简单,操作方便,降低了镀膜后因膜层粘连所带来的分离难度,并且减小了半导体激光器腔面膜层的损伤度,提高了半导体激光器的可靠性。Because the single die size of the semiconductor laser is very small, usually the length is 500 to 600 microns, the width (cavity length) is 1 to 4 mm, and the height is 120 to 130 microns, so it is generally used in the form of semiconductor laser cleavage strips when coating the cavity surface. (Each semiconductor laser cleavage bar can be cleaved into several semiconductor laser single tube cores). The cleavage bar (5) is shown in Figure 5, the height of the cleavage bar is 120 to 130 microns, the width (cavity length) is 1 to 4 mm, and the length is 1 to 3 cm. The design of the semiconductor laser coating companion chip must solve the following basic problems: the companion chip structure must ensure that the coated official chip and the companion chip can be effectively separated, and the regular cavity surface must be kept tidy. Therefore, we design a new type of semiconductor laser cavity surface coating companion, which is exquisite in design, easy to process, practical and simple, easy to operate, reduces the separation difficulty caused by film adhesion after coating, and reduces the semiconductor The damage degree of the film layer of the laser cavity improves the reliability of the semiconductor laser.

发明内容Contents of the invention

本发明的目的在于提供一种新型半导体激光器腔面镀膜陪片,降低了镀膜后因膜层粘连所带来的分离难度,并且减小了半导体激光器腔面膜层的损伤度,提高了半导体激光器的可靠性。The object of the present invention is to provide a new type of semiconductor laser cavity surface coating companion, which reduces the separation difficulty caused by the adhesion of the film layer after coating, and reduces the damage degree of the cavity film layer of the semiconductor laser, and improves the semiconductor laser. reliability.

本发明提供半导体激光器腔面镀膜陪片,其特征在于,陪片的一面的结构为工字形,即在陪片一个面相对的两长边上分别缺失一长方体,从而使此面剩下的部位为一工字形结构,而陪片相对的另一面,仍保留与正式片相同的尺寸。如图1所示。The invention provides a semiconductor laser cavity surface coating companion, which is characterized in that the structure of one side of the companion is I-shaped, that is, a rectangular parallelepiped is missing on two opposite long sides of one side of the companion, so that the remaining part of the surface is It is an I-shaped structure, and the opposite side of the accompanying piece still retains the same size as the official piece. As shown in Figure 1.

这里以一面的宽度(腔长)为4mm长度为12.5mm(1)的陪片为例,在陪片的此面上,在其两个长边处分别刻蚀掉长10.5mm(2),宽和高为10~20um(3)左右的六面体,使其顶部与底部距离陪片的上下两端的长度都为1mm(4),如图2所示。Here, take a companion with a width (cavity length) of 4 mm and a length of 12.5 mm (1) as an example. On this side of the companion, 10.5 mm in length (2) is etched at its two long sides, respectively. A hexahedron with a width and a height of about 10-20um (3), the distance between the top and the bottom of the top and bottom of the upper and lower ends of the accompanying sheet is 1mm (4), as shown in Figure 2.

本发明提供半导体激光器腔面镀膜陪片在使用时,将缺失两长方体的一面称为正面,则与此面相对的一面称为背面,使用时应将两片相同的陪片背面相邻放在一起,使得经过刻蚀的正面朝外,如图3所示。然后将经过刻蚀的正面与正式片的一面相接触,在此正式片的另一面仍摆放相同的两片陪片,逐次摆放下去,直至达到要求为止,如图4所示。The present invention provides that when the semiconductor laser cavity surface coating companion is used, the side missing two cuboids is called the front, and the side opposite to this side is called the back. together, so that the etched front faces outward, as shown in Figure 3. Then the etched front side is in contact with one side of the official sheet, and the same two accompanying sheets are still placed on the other side of the official sheet, and placed one by one until the requirements are met, as shown in Figure 4.

本发明的陪片的材料可以是金属也可以是其他半导体材料。The material of the companion piece of the present invention can be metal or other semiconductor materials.

陪片的整体为长方体,按照正式片尺寸制备,只是在陪片的一面,通过设计光刻板并利用干法刻蚀的方法可以得到这种结构;而陪片的另一面,仍保留其与正式片相同的尺寸,如图1所示。The companion piece is a rectangular parallelepiped as a whole, prepared according to the size of the official piece, but on one side of the companion piece, this structure can be obtained by designing a photolithography plate and using dry etching; while the other side of the companion piece still retains its same structure as the official piece. The same dimensions as the slices, as shown in Figure 1.

本发明的优点在于:利用单面工字型结构可以有效地解决镀膜后的膜层粘连问题,在不影响正常镀膜的同时,减小了半导体激光器腔面膜层的损伤度,提高了半导体激光器的可靠性;本陪片使用金属或者其他半导体材料为制作材料,而金属与半导体材料各有各自的优缺点,这里我们以GaAs为例来简单介绍;本陪片具有设计精巧,易于加工,实用简单,操作方便等优点。The invention has the advantages that: the single-sided I-shaped structure can effectively solve the film layer adhesion problem after coating, while not affecting the normal coating, it reduces the damage degree of the semiconductor laser cavity film layer and improves the semiconductor laser. Reliability; this companion piece is made of metal or other semiconductor materials, and metal and semiconductor materials have their own advantages and disadvantages. Here we take GaAs as an example to briefly introduce; this companion piece has exquisite design, easy processing, practical and simple , Easy operation and so on.

附图说明Description of drawings

图1:陪片总体结构图Figure 1: The overall structure of the accompanying film

图2:陪片结构尺寸分解图Figure 2: Dimensional exploded view of the accompanying chip structure

图3:陪片使用说明图Figure 3: Instructions for the use of accompanying tablets

图4:陪片与正式片摆放图Figure 4: Arrangement of accompanying film and official film

图5:解理片示意图Figure 5: Schematic diagram of the cleavage sheet

图6:粘连在一起的正式片和新型陪片Figure 6: The official piece and the new companion piece glued together

图中:In the picture:

1-陪片长边1-Accompany the long side of the film

2-陪片刻蚀六面体的长边2- Etch the long side of the hexahedron with the slice

3-陪片刻蚀六面体的短边3- Etching the short side of the hexahedron with slices

4-刻蚀处距离陪片上端的长度4- The length from the etching place to the upper end of the companion piece

5-解理好的陪片5- Cleavage good companion film

具体实施方式Detailed ways

下面结合实施例对本发明做进一步说明,但本发明并不限于以下实施例。The present invention will be further described below in conjunction with the examples, but the present invention is not limited to the following examples.

实施例1Example 1

1.这里我们以陪片一面长为12.5mm,宽为4mm的陪片为例,刻蚀部分的宽度为10~20um,长度为10.5mm,使用预先设计好的光刻板在GaAs衬底上光刻出所需的图案,利用干法刻蚀或者湿法刻蚀的方法刻蚀出设计好的结构,要想得到实验所需的陪片,在设计光刻板时应当将曝光处的宽度尽量加宽,以方便在刻蚀时可以得到所需的刻蚀深度。1. Here we take a companion piece with a length of 12.5mm and a width of 4mm as an example. The width of the etched part is 10-20um and the length is 10.5mm. Use a pre-designed photolithography plate to glaze the GaAs substrate. Carve out the required pattern, and use dry etching or wet etching to etch the designed structure. In order to obtain the companion film required for the experiment, the width of the exposure area should be widened as much as possible when designing the photolithography plate , so that the desired etching depth can be obtained during etching.

2.使用划片机将刻蚀好的GaAs实验片解理成条长为12.5mm,条宽为4mm的陪片,这时得到的陪片即为所需的新型半导体激光器腔面镀膜陪片,如图2所示。2. Use a dicing machine to cleavage the etched GaAs test piece into a companion piece with a strip length of 12.5mm and a strip width of 4mm. The companion piece obtained at this time is the required new semiconductor laser cavity surface coating companion piece, such as Figure 2 shows.

3.将两片上述步骤2相同新型半导体激光器腔面镀膜陪片的与刻饰面相对的未被刻蚀面相邻摆放,如图3所示。3. Place the unetched surface opposite to the engraved surface of the two new-type semiconductor laser cavity surface coating companions that are the same as in step 2 above, adjacent to each other, as shown in Figure 3.

4.将两片相同新型半导体激光器腔面镀膜陪片的未被刻蚀面相邻摆放,刻蚀面朝外与正式片相邻摆放,重复依次摆放直到实验所需的数量为止,如图4所示。4. Place the unetched side of two identical new-type semiconductor laser cavity surface coating companions adjacent to each other, and place the etched side outwards adjacent to the official chip, and place them repeatedly until the number required for the experiment is reached. As shown in Figure 4.

5.将安装好的正式片和陪片进行镀膜实验,试验后的实验片与陪片相互粘连,因新型半导体激光器腔面镀膜陪片的特殊工字型结构,在陪片与正式片相邻处有20um左右的缺口,可以用镊子将其较好的剥离而不损伤正式片的腔面薄膜,如图6所示。5. Conduct the coating experiment on the installed official film and the companion film. After the test, the test film and the companion film are adhered to each other. Due to the special I-shaped structure of the new semiconductor laser cavity surface coating companion film, the companion film is adjacent to the official film. There is a gap of about 20um, which can be peeled off with tweezers without damaging the cavity surface film of the formal sheet, as shown in Figure 6.

Claims (4)

1. accompany sheet for the protection of films on cavity surfaces of semiconductor lasers rete for one kind; it is characterized in that; the structure of the one side of sheet is accompanied to be I-shaped; namely a cuboid is lacked respectively accompanying on two relative long limits of sheet face; thus the position making this face remaining is an I-shape construction; and the another side of accompanying sheet relative, still retain the size identical with formal sheet.
2. accompany sheet according to claim 1 a kind of for the protection of films on cavity surfaces of semiconductor lasers rete; it is characterized in that; the width lacking the one side of a cuboid is 4mm, length is 12.5mm; on this face of accompanying sheet; long 10.5mm is etched away respectively in two long edge position; wide and high is the hexahedron of 10 ~ 20um, makes its top and bottom distance accompany the length at the two ends up and down of sheet to be all 1mm.
3. claim 1 or 2 a kind of accompanies sheet for the protection of films on cavity surfaces of semiconductor lasers rete, and it is characterized in that, its material is metal.
4. a kind of application process of accompanying sheet for the protection of films on cavity surfaces of semiconductor lasers rete of claim 1 or 2; it is characterized in that; the one side of disappearance two cuboid is called front; the one side that then face is relative is therewith called the back side; should the sheet back side be adjacent puts together by identical for two panels accompanying during use; make through the front of over etching outwardly; then the one side through the front of over etching with formal sheet is contacted; still put identical two panels at the another side of this formal sheet and accompany sheet; successively put down, till reaching requirement.
CN201410505751.9A 2014-09-26 2014-09-26 Semiconductor laser unit cavity surface coating film control wafer and application Pending CN104300361A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114252397A (en) * 2021-12-27 2022-03-29 中国电子科技集团公司第十三研究所 A kind of anti-reflection coating residual reflectance test companion film

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US6026557A (en) * 1998-04-02 2000-02-22 Lucent Technologies Inc. Method for laser bar facet coating
US6037006A (en) * 1996-05-09 2000-03-14 Lucent Technologies Inc. Method and fixture for laser bar facet coating
JP2001332796A (en) * 2000-05-24 2001-11-30 Furukawa Electric Co Ltd:The Tray for manufacturing semiconductor laser device and method of manufacturing semiconductor laser device using the same
US20050064090A1 (en) * 2003-09-24 2005-03-24 Union Optronics Corporation Method for coating on laser-diode facet
US20050101039A1 (en) * 2002-10-30 2005-05-12 John Chen Apparatus and method for stacking laser bars for uniform facet coating
CN102545041A (en) * 2012-01-17 2012-07-04 苏州纳睿光电有限公司 Coating strip of cavity surface of semiconductor laser and preparation method thereof

Patent Citations (6)

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Publication number Priority date Publication date Assignee Title
US6037006A (en) * 1996-05-09 2000-03-14 Lucent Technologies Inc. Method and fixture for laser bar facet coating
US6026557A (en) * 1998-04-02 2000-02-22 Lucent Technologies Inc. Method for laser bar facet coating
JP2001332796A (en) * 2000-05-24 2001-11-30 Furukawa Electric Co Ltd:The Tray for manufacturing semiconductor laser device and method of manufacturing semiconductor laser device using the same
US20050101039A1 (en) * 2002-10-30 2005-05-12 John Chen Apparatus and method for stacking laser bars for uniform facet coating
US20050064090A1 (en) * 2003-09-24 2005-03-24 Union Optronics Corporation Method for coating on laser-diode facet
CN102545041A (en) * 2012-01-17 2012-07-04 苏州纳睿光电有限公司 Coating strip of cavity surface of semiconductor laser and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114252397A (en) * 2021-12-27 2022-03-29 中国电子科技集团公司第十三研究所 A kind of anti-reflection coating residual reflectance test companion film
CN114252397B (en) * 2021-12-27 2024-06-11 中国电子科技集团公司第十三研究所 Test accompanying sheet for residual reflectivity of antireflection film

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