[go: up one dir, main page]

CN104838022A - Apparatus and method for thermal extraction of metals - Google Patents

Apparatus and method for thermal extraction of metals Download PDF

Info

Publication number
CN104838022A
CN104838022A CN201380003964.5A CN201380003964A CN104838022A CN 104838022 A CN104838022 A CN 104838022A CN 201380003964 A CN201380003964 A CN 201380003964A CN 104838022 A CN104838022 A CN 104838022A
Authority
CN
China
Prior art keywords
opening
room
torch
plasma torch
replaced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380003964.5A
Other languages
Chinese (zh)
Inventor
沃恩·K·博伊曼
约瑟夫·A·迪亚兹
杰拉尔德·恩达尔
托马斯·E·斯蒂芬斯
克里斯多佛·E·戈登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Whole World Metal Technology Co Ltd
Original Assignee
Whole World Metal Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Whole World Metal Technology Co Ltd filed Critical Whole World Metal Technology Co Ltd
Priority claimed from US14/101,540 external-priority patent/US20140191450A1/en
Publication of CN104838022A publication Critical patent/CN104838022A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B02CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02CCRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00Other disintegrating devices or methods
    • B02C19/18Use of auxiliary physical effects, e.g. ultrasonics, irradiation, for disintegrating
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B11/00Obtaining noble metals
    • C22B11/04Obtaining noble metals by wet processes
    • C22B11/042Recovery of noble metals from waste materials
    • C22B11/046Recovery of noble metals from waste materials from manufactured products, e.g. from printed circuit boards, from photographic films, paper or baths
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B4/00Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
    • C22B4/08Apparatus
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B7/00Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
    • C22B7/001Dry processes
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00Crucible or pot furnaces
    • F27B14/06Crucible or pot furnaces heated electrically, e.g. induction crucible furnaces with or without any other source of heat
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D11/00Arrangement of elements for electric heating in or on furnaces
    • F27D11/06Induction heating, i.e. in which the material being heated, or its container or elements embodied therein, form the secondary of a transformer
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00Charging; Discharging; Manipulation of charge
    • F27D3/10Charging directly from hoppers or shoots
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00Charging; Discharging; Manipulation of charge
    • F27D3/15Tapping equipment; Equipment for removing or retaining slag
    • F27D3/1509Tapping equipment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3484Convergent-divergent nozzles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Food Science & Technology (AREA)
  • Power Engineering (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

An apparatus and a method are provided in the invention for removing metal from complex materials in a reactor chamber by using a plasma torch in a first opening of the chamber and a second opening near the first opening for entry of complex material and earner gas, the path of the complex material and carrier gas being along the same axis in relation to the major axis of the plasma torch, and said reactor chamber is surrounded by a secondary heating system. The plasma torch and reactor components are easily accessible as they are subject to wear due to high temperature.

Description

For the apparatus and method that the heat of metal is extracted
The cross reference of related application
The application is the part continuation application of the PCT/US2011/042975 that on July 5th, 2011 submits to, and PCT/US2011/042975 requires the right of priority of the United States Patent (USP) 8/043,400 that on June 10th, 2011 submits to; Each application is incorporated to herein by reference.
About the research of federation's patronage or the statement of exploitation
Inapplicable.
Quoting of the material that CD is submitted to is incorporated to
Inapplicable.
Background of invention
Ore is defined as the mineral that can extract the valuable elements from it or mineral aggregates; In most of the cases, extract is metal.Ore must be processed with by undesired organism and mineral and/or inorganic materials and metal separation.Once ore is processed, so it can by refining to isolate dissimilar metal.Such as, cupellation is the method for refining for being separated with lead by silver.Complex ore is defined as the ore of the ratio of the organic and inorganic material of low metal and gathering, and that is, in complex ore, metal is difficult to and the organic and inorganic material separation of assembling.
Lime and/or prussiate are exposed to ore pulp or other similar leaching process by known comprising for the method extracting metal from complex ore.These methods are inefficient with cost prohibitive.Therefore, untreated complex ore can form unrealized profits.The method of known extraction complex ore is to environmental toxic: toxic gas, chemical and sewage are discharged in environment.
Printed circuit board (PCB) may reside in most electrical equipment and electronics: counter, RCU, computer, panel computer, mobile telephone etc.Usual printed circuit board (PCB) comprise the metal of 40%, the organism of 30% and 30% ceramic.The metal be included in printed circuit board (PCB) comprise gold and silver, palladium and platinum and other.Although federal regulations Hezhou laws and regulations requirement reclaims printed circuit board (PCB) recently, people have extracted precious metal a lot of year from printed circuit board (PCB).The very similar known method extracting metal from complex ore of the known method reclaiming precious metal from printed circuit board (PCB), and suffer same problem.
Causing can being known in the art with the thermal treatment of the matrix material (complexmaterial) (such as complex ore and printed circuit board (PCB)) of the transformation of chemistry of physics of Footwall drift.This type of process can be produced can for product sold such as pure metal or intermediate compound or the alloy being suitable for further refining.Known plasma environment can provide the high temperature of energy finishing metal.Such as, plasma environment has been used to iron blast furnace slag to be transformed into pure iron.High temperature, plasma environment can be used to process matrix material, make it possible to Footwall drift.
In plasma environment, successfully extract metal needs from matrix material want a kind of reactor: (a) can with industrial flow rate process; B () has constant Exposure Temperature; C () has the less trouble of plasma torch and other reactor parts and low thermal breakdown; And (d) has the parts being easy to carry out keeping in repair or maintaining.
Described herein is reactor assemblies (10), and the environment which providing excessive temperature, to make metal and undesired separating substances, namely processes matrix material.In one embodiment, reactor assemblies (10) can there is provided a part for the matrix material treatment system (20) of extra environmental characteristic or processing feature.
Matrix material treatment system (20) shows usually in Fig. 1-2.Although in order to illustrative object, the modification of matrix material treatment system (20) illustrates herein, but it should be noted, matrix material treatment system (20) can embody with multiple different form and should not be understood to be limited to proposed embodiment.
With reference to figure 1, in the first embodiment, matrix material treatment system (20) can comprise reactor assemblies (10), gas treating system (700) and waste gas system (800).Matrix material is entered matrix material treatment system at (1) place and is processed by reactor assemblies (10).In the simplest scheme, the matrix material processed removes from system at (2) place.
When matrix material by reactor assemblies (10) process time, its may discharge gas such as carbon, sulphur and oxygen and other.When gas leaves reactor assemblies (10) at (3) place, there is more low-density composite material microparticles and can be drawn onto gas treating system (700).Gas treating system (700) comprises multiple strainer to catch composite material microparticles.Because some composite material microparticles entering into gas treating system (700) may contain metal, the composite material microparticles of recovery can be chemically treated (50) to allow fully or the close metal fully reclaiming all expectations.In one embodiment, chemical treatment (50) can be acid treatment or alkaline purification.
Gas continues to move to waste gas system (800) from gas treating system (700).Waste gas system (800) is caught and is cleaned the process gas from reactor assemblies (10).Preferably, waste gas system (800), in vacuum or lower than barometric point operation, forces process gas to move from reactor assemblies (10) to waste gas system (800).
With reference to figure 2, in another embodiment, system also comprises second melting system (900).Metal may be so in the composite hidden to such an extent as to they can not be fully processed in reactor assemblies (10).In this case, matrix material can also by second melting system (900) process.Second melting system (900) can be the second reactor assemblies (10), telefault, resistive heating or other known heat transfer system or their combination.When it leaves second melting system (900) at (7) place, desired metal may still crested in undesired organic and inorganic materials.In order to remove remaining undesired organic and inorganic materials, matrix material can stand other chemical treatment (50) at (7) place.
Each and any in embodiment described above is obviously in the embodiment of their modification, and the parts of described system use high-temperature pipe or other similar mechanism can be operationally associated with each other.Regardless of embodiment, described system uses I/O known in the art (" I/O ") Controlling System.Preferably, I/O Controlling System can minimally measurement enter and leave reactor assemblies (10) flow velocity, through the flow velocity of gas treating system (700) and the flow velocity through waste gas system (800).And adjust operation environment while of I/O Controlling System is so that gas and other toxin were appropriately processed before being discharged in environment.
Brief Description Of Drawings
In the detailed description of the following preferred embodiment with reference to accompanying drawing, further feature of the present invention and advantage will become obvious, in accompanying drawing:
Fig. 1 is the schema of the reactor assemblies in display matrix material treatment system;
Fig. 2 is the schema of the reactor assemblies in display matrix material treatment system;
Fig. 3 is the schematic diagram of reactor assemblies;
Fig. 4 is the schematic diagram of reactor assemblies;
Fig. 5 is the schematic diagram of reactor assemblies;
Fig. 6 is the schematic diagram of reactor assemblies;
Fig. 7 is the schematic diagram of reactor assemblies;
Fig. 8 is the schematic diagram of torch segregaion valve;
Fig. 9 is the schematic diagram of ore feed system;
Figure 10 is the schematic diagram of ore feed system;
Figure 11 is the schematic diagram of fourth ventricle segregaion valve;
Figure 12 is the schematic diagram of general plasma torch;
Figure 13 is the schematic diagram of general plasma torch.
Detailed Description Of The Invention
Hereinafter, more fully the present invention is described, shown in the drawings of the preferred embodiments of the invention with reference to accompanying drawing.But the present invention can embody with multiple different form and should not be understood to be limited to proposed embodiment; On the contrary, these embodiments are provided so that present disclosure will be thoroughly with complete and scope of the present invention is fully conveyed to those skilled in the art.
reactor assemblies
With reference to figure 3,4,9,12,13, in one embodiment, reactor assemblies (10) comprises susceptor (200) and plasma torch (300).With reference to figure 5-13, in another embodiment, reactor assemblies (10) comprises susceptor (200), plasma torch (300) and the first Room or feed chamber (100).Preferably, susceptor (200) is surrounded by the 3rd Room (500).3rd Room (500) allows particulate and gas to be discharged in gas treating system (700).
Susceptor (200) is defined by input terminus (210) and output terminal (220).Feed chamber is defined by input terminus (110) and output terminal (120).The output terminal (120) of feed chamber (100) operationally closely cooperates with the input terminus (210) of susceptor (200); Preferred use flange or hinge clip be mouth (130) immediately.
Preferably, feed chamber (100) is coning, and have input terminus (110) and output terminal (120), wherein input terminus (110) has the diameter being greater than output terminal (120).Input terminus (110) has the diameter being enough to dimensionally accept plasma torch (300), and wherein plasma torch has the size being enough to produce and making matrix material produce the required temperature of reaction.
Preferably, feed chamber (100), susceptor (200) and/or the 3rd Room (500) also comprise material feeding system (550).Best, material feeding system (550) is continuous print, and material feeding system can comprise a hopper (555) or multiple hopper (555) and feed screw system (580).Feed screw system comprises worm conveyor (556) and feed chamber valve (557).Best, material feeding system (550) has at least two hoppers (555) so that hopper (555) can load and another is exhausted into room (100) above.
In order to by material delivery to feed chamber (100), oxygen is inhaled into from hopper (555).Hopper (555) is by backfill carrier gas.When feed chamber valve (557) and worm conveyor (556) open or connect.Feed material and gas are delivered to susceptor (200) through feed chamber (100).Preferably, material feeding system (550) is along identical axis delivery of feeds material and carrier gas, and wherein in one embodiment, material is discharged into susceptor (200) along this axis by least one feed-pipe (101).In another embodiment, at least one feed-pipe (101) has the length of extension so that its delivery materials is closer to plasma torch (300).Preferably, the feed-pipe (101) of extension is adjustable and angled.This angle is similar to the angle of feed chamber (100) wall; Angle and length depend on the type of just processed ore.
Preferably, feed chamber (100) and susceptor (200) are surrounded by the 3rd Room (500).3rd Room (500) allows particulate and gas to be discharged into gas treating system (700).Preferably, the 3rd Room (500) has at least one room door (530).Room door (530) allows to enter maintenance.3rd Room (500) can be tubulose in shape and be defined by input terminus (510) and output terminal (520).
Preferably, the output terminal (520) of the 3rd Room (500) comprises at least one quench ring (560).Described at least one quench ring (560) comprises multiple gas jet.When the material processed falls through susceptor (200), it is through quench ring (560), and wherein it is by gas injection.Preferably, directed at least one quench ring (560) of described gas jet center and point to the output terminal (620) of fourth ventricle (600) downwards.Preferably, quench gas is rare gas element.
Fourth ventricle (600) is defined by input terminus (610) and output terminal (620).Preferably, fourth ventricle is coning, and wherein input terminus (610) has the diameter being greater than output terminal (620).The output terminal (520) of the 3rd Room (500) operationally closely cooperates with the input terminus (610) of fourth ventricle.The output terminal (620) of fourth ventricle (600) comprises lower isolation valve (540).Lower isolation valve (540) allows device to maintain low-oxygen environment, allows the material processed to be removed and to collect simultaneously.
Susceptor (200) can by second-heating system (240) around.Preferably, susceptor (200) is made up of graphite.Although susceptor (200) can be any shape, preferably, its normally tubulose.Length and the geometry of susceptor (200) depend on many factors, include but not limited to, the size of plasma torch (300) and the feeding rate of matrix material.Best, susceptor (200) by insulating cell (231) and then insulated liner (235) around.Insulated liner (235) then by second-heating system (240) around.Preferably, second-heating system (240) is induction heating equipment (such as ruhmkorff coil) or resistance heating device.The object of second-heating system (240) is the temperature relative constancy keeping susceptor (200).If second-heating system (240) is induction heating equipment, then electromagnetic field is produced, when matrix material stirs matrix material by electromagnetic field described time susceptor (200).If necessary, graphite is allowed to expand or shrink.
Susceptor (200) is defined by input terminus (210) and output terminal (220).The input terminus (210) of susceptor (200) holds plasma torch (300) and material feeding system (550).Plasma torch (300) has movable end and inactive side, and wherein movable end is positive terminal (with reference to figure 9).Movable end is placed in susceptor (200).The degree of depth embedded is variable and depends on the factor of the size including but not limited to torch and susceptor (200).
Plasma torch (300) enters susceptor (200) through torch segregaion valve (320).Torch segregaion valve (320) produces vacuum-sealing between self and susceptor (200), allows plasma torch (300) to adjust, and maintains the heat-treat condition in susceptor (200).
Preferably, the output terminal (220) of susceptor (200) is given prominence to through fire-resistant substrate (233).Preferably, second-heating system (240) is supported by fire-resistant substrate (233); Fire-resistant substrate (233) is positioned on water-cooling base plate (234).Preferably, fire-resistant substrate (233) can be replaced or keep in repair.
Preferably, susceptor (200), graphite insulating cell (231) and insulated liner (235) can be replaced or keep in repair.Preferably, susceptor (200) is easily removed from reactor (10), for replacing or maintenance.Preferably, the temperature of susceptor (200) at least uses reaction heat galvanic couple (250) and uses exit thermocouple (251) monitoring at output terminal (220) place at input terminus (210) place; Each thermopair (250,251) is monitored by I/O Controlling System.Preferably, thermopair (250,251) can be replaced or keep in repair.
Known method is used to each parts of cooling reactor assembly (10).Preferably, the parts of reactor assemblies (10) are by cooling water and coolant circulating through coolant manifold.Manifold is by I/O Systematical control mentioned above.Known method is used to provide electric power to reactor assemblies (10).
plasma torch
Plasma torch is well known in the art.Plasma torch general shown in Figure 12-13.Combustion gases enter torch at negative electrode and advance to electric arc, form plasma body, and leave away through anode throat.Negative electrode is in the case positively charged and anode is electronegative.Both are isolated from each other in electricity.The conductive gas that will become plasma body is introduced with speed plasma arc being extended beyond anode throat, to return at electric arc and to make to be played thermal response by the ore fed before ending on anode surface.The combustion gases of number of different types use together with plasma torch, comprise air, oxygen, nitrogen, hydrogen, argon gas, CH 4, C 2h 4and C 3h 6.
Preferably, plasma torch (300) has wherein combustion gases and anode and electrode and is tangentially fed to the type in plasma torch (300).Preferably, plasma torch polarity is configured to run with non-transfer mode (non-transfer mode).In transmission plasma torch, electric arc is connected to from the anode loop of torch " workpiece " with negative polarity.The size of electric arc is limited dimensionally by the distance between anode and " workpiece ".Non-transmission plasma torch has negative polarity and straight polarity.In reactor assemblies (10), electric arc is connected to torch nozzle from electrode loop and does not have limitation of size, and therefore matrix material can pass through reactor assemblies (10) and processes continuously.
With reference to Figure 13, plasma torch (300) comprises at least: electrode (310), compression ring (320), dead ring assembly (330) and nozzle (340).Preferably, plasma torch (300) is DC plasma torch.In DC plasma torch, electric arc is formed between nozzle (340) and electrode (310).Carrier gas/working gas produces thermal plasma through the lasting input of compression ring (320).Dead ring assembly (330) protection compression ring (320) affects from thermal plasma.Preferably, the maintenance of plasma torch (300) can by sealing torch segregaion valve (540) and plasma torch (300) being lifted out reactor assemblies (10) to carry out.Preferably, electrode (310), compression ring (320), dead ring assembly (330) and nozzle (340) can be replaced or keep in repair.
the process of post-reactor assembly
Preferably, the particulate from reactor assemblies (10) enters gas treating system (700).Gas treating system (700) attaches to the 3rd Room (500).There is the negative pressure allowing particulate matter to flow to gas treating system (700) from reactor (10).Gas treating system (700) comprises at least one strainer that can filter ore particles before gas enters waste gas system (800).
Preferably, waste gas system (800) runs in vacuum or lower than under barometric point.This causes gas to flow to waste gas system (800) from gas treating system (700).Before rare gas element is discharged into the atmosphere, waste gas system (800) uses known method to filter sulphur and other obnoxious flavour received from the ore processed.
In some cases, even after processing matrix material by reactor assemblies (10), precious metal may still be difficult to extract.In this case, ore processes through second melting system (900).This system can be such as heating system or smelting furnace.
operation
Preferably, feed material is delivered to susceptor (200) and the humidity level had between 0-20% with thin mesh size.The matrix material with high moisture levels can condense.The material of condensation is heavier and land too fast through susceptor (200), and therefore the matrix material hang time reduces.High moisture content also causes running stores such as soldering tip to burn faster.
By removing oxygen from susceptor (200), susceptor (200) is prepared for processing matrix material.This has been come by vacuum pumping system.In a preferred embodiment, once the pressure in susceptor (200) reaches close to 0psia, susceptor (200) is just by backfill combustion gases.Preferably, susceptor (200) is maintained at about 0-2psia.Preferably, susceptor (200) is maintained at about 3000 °F, and wherein plasma torch runs under about 25,000 °F.These parameters can change according to the type of the size of susceptor (200), matrix material and feeding rate.

Claims (25)

1., for the treatment of a device for matrix material, comprising:
Room, it has the first opening entered for adapting to plasma torch, and wherein said plasma torch operates with non-transfer mode;
Wherein said torch has movable end and inactive side;
Wherein said torch to extend in described room with described movable end and is operatively located through described first opening away from the orientation of described first opening, and described inactive side is fixed and is in close proximity to described first opening in the chamber;
Wherein said room also comprises the second opening close to described first opening, and enter into described indoor for the ore and carrier gas making to have affined path, described second opening is in close proximity to described first opening; The described path of described matrix material and described carrier gas is along the identical axis of the main axis relative to described plasma torch;
Wherein said room by second-heating system around.
2. device as claimed in claim 1, comprising: second melting system, gas treating system, waste gas system or its combination.
3. for the treatment of a device for matrix material, wherein said device be suitable for receiving easily frayed, be consumable or both parts, described device comprises:
Room, and there is the first opening entered for adapting to plasma torch, wherein said plasma torch operates with non-transfer mode;
Wherein said torch has movable end and inactive side;
Wherein said torch to extend in described room with described movable end and is operatively located through described first opening away from the orientation of described first opening, and described inactive side is fixed and is in close proximity to described first opening in the chamber;
Wherein said room also comprises the second opening close to described first opening, and enter into described indoor for the matrix material and carrier gas making to have affined path, described second opening is in close proximity to described first opening; The described path of described matrix material and described carrier gas is along the identical axis of the main axis relative to described plasma torch;
Wherein said room by second-heating system around.
4. device as claimed in claim 3, wherein said room is easily frayed parts or consumable part.
5. device as claimed in claim 4, wherein said room is replaced by the second Room.
6. device as claimed in claim 3, wherein temperature of reactor is monitored by least one thermopair; Wherein said thermopair is frayed or consumable part easily.
7. device as claimed in claim 6, at least one thermopair wherein said is replaced by the second thermopair.
8. device as claimed in claim 3, wherein said room is by least graphite insulating cell or refractory lining insulate; Wherein said graphite insulating cell and described refractory lining easily frayed and be consumable part.
9. device as claimed in claim 8, wherein at least the first graphite insulating cell is replaced by the second graphite insulating cell, and/or the first refractory lining is replaced by the second refractory lining.
10. device as claimed in claim 3, wherein said torch comprises at least electrode, compression ring, dead ring or the easy frayed or nozzle of consumable part.
11. devices as claimed in claim 10, wherein at least the first electrode is replaced by the second electrode, and first gas ring is replaced by second gas ring, and the first dead ring is replaced by the second dead ring and/or first jet is replaced by second nozzle.
Replace easily frayed or comprise the method for parts of consumable component for 12. 1 kinds, wherein said device comprises:
Room, it has the first opening entered for adapting to plasma torch, and wherein said plasma torch operates with non-transfer mode;
Wherein said torch has movable end and inactive side;
Wherein said torch to extend in described room with described movable end and is operatively located through described first opening away from the orientation of described first opening, and described inactive side is fixed and is in close proximity to described first opening in the chamber;
Wherein said room also comprises the second opening close to described first opening, and enter into described indoor for the matrix material and carrier gas making to have affined path, described second opening is in close proximity to described first opening; The described path of described matrix material and described carrier gas is along the identical axis of the main axis relative to described plasma torch;
Wherein said room by second-heating system around;
Wherein said room is easily frayed parts or consumable part;
Wherein said room is by least graphite insulating cell or refractory lining insulate;
Wherein said graphite insulating cell and described refractory lining easily frayed and be consumable part;
Wherein said torch comprises at least electrode, compression ring, dead ring or the easy frayed or nozzle of consumable part;
Wherein said method comprises:
The first Room is replaced with the second Room;
At least replace the first graphite insulating cell with the second graphite insulating cell, and/or replace the first refractory lining with the second refractory lining; Or
At least replace the first electrode with the second electrode, replace first gas ring with second gas ring, replace the first dead ring with the second dead ring, and/or replace first jet with second nozzle.
13. 1 kinds, for the treatment of the device of matrix material, comprising:
Room, it has the first opening entered for adapting to plasma torch, and wherein said plasma torch operates with non-transfer mode;
Wherein said torch has movable end and inactive side;
Wherein said torch to extend in described room with described movable end and is operatively located through described first opening away from the orientation of described first opening, and described inactive side is fixed and is in close proximity to described first opening in the chamber;
Wherein said room also comprises the second opening close to described first opening, and enter into described indoor for the ore and carrier gas making to have affined path, described second opening is in close proximity to described first opening; The described path of described matrix material and described carrier gas is along the identical axis of the main axis relative to described plasma torch.
14. devices as claimed in claim 13, wherein said room by second-heating system around.
15. devices as claimed in claim 13, comprising: second melting system, gas treating system, waste gas system or its combination.
16. 1 kinds of devices for the treatment of matrix material, wherein said device is suitable for receiving easily frayed or be included in the part of the consumable component used between the working life of described device, and described device comprises:
Room, it has the first opening entered for adapting to plasma torch, and wherein said plasma torch operates with non-transfer mode;
Wherein said torch has movable end and inactive side;
Wherein said torch to extend in described room with described movable end and is operatively located through described first opening away from the orientation of described first opening, and described inactive side is fixed and is in close proximity to described first opening in the chamber;
Wherein said room also comprises the second opening close to described first opening, and enter into described indoor for the matrix material and carrier gas making to have affined path, described second opening is in close proximity to described first opening; The described path of described matrix material and described carrier gas is along the identical axis of the main axis relative to described plasma torch.
17. devices as claimed in claim 16, wherein said room is easily frayed parts or consumable part.
18. devices as claimed in claim 17, wherein said room is replaced by the second Room.
19. devices as claimed in claim 16, wherein temperature of reactor is monitored by least one thermopair; Wherein said thermopair is frayed or consumable part easily.
20. devices as claimed in claim 19, at least one thermopair wherein said is replaced by the second thermopair.
21. devices as claimed in claim 16, wherein said room is by least graphite insulating cell or refractory lining insulate; Wherein said graphite insulating cell and described refractory lining easily frayed and be consumable part.
22. devices as claimed in claim 21, wherein at least the first graphite insulating cell is replaced by the second graphite insulating cell, and/or the first refractory lining is replaced by the second refractory lining.
23. devices as claimed in claim 16, wherein said torch comprises at least electrode, compression ring, dead ring or the easy frayed or nozzle of consumable part.
24. devices as claimed in claim 23, wherein at least the first electrode is replaced by the second electrode, and first gas ring is replaced by second gas ring, and the first dead ring is replaced by the second dead ring, and/or first jet is replaced by second nozzle.
Replace easily frayed or comprise the method for parts of consumable component for 25. 1 kinds, wherein said device comprises:
Room, it has the first opening entered for adapting to plasma torch, and wherein said plasma torch operates with non-transfer mode;
Wherein said torch has movable end and inactive side;
Wherein said torch to extend in described room with described movable end and is operatively located through described first opening away from the orientation of described first opening, and described inactive side is fixed and is in close proximity to described first opening in the chamber;
Wherein said room also comprises the second opening close to described first opening, and enter into described indoor for the matrix material and carrier gas making to have affined path, described second opening is in close proximity to described first opening; The described path of described matrix material and described carrier gas is along the identical axis of the main axis relative to described plasma torch;
Wherein said room is easily frayed parts or consumable part;
Wherein said room is by least graphite insulating cell or refractory lining insulate;
Wherein said graphite insulating cell and described refractory lining easily frayed and be consumable part;
Wherein said torch comprises at least electrode, compression ring, dead ring or the easy frayed or nozzle of consumable part;
Wherein said method comprises:
The first Room is replaced with the second Room;
At least replace the first graphite insulating cell with the second graphite insulating cell, and/or replace the first refractory lining with the second refractory lining; Or
At least replace the first electrode with the second electrode, replace first gas ring with second gas ring, replace the first dead ring with the second dead ring, and/or replace first jet with second nozzle.
CN201380003964.5A 2013-12-10 2013-12-10 Apparatus and method for thermal extraction of metals Pending CN104838022A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
PCT/US2013/074076 WO2015088494A1 (en) 2013-12-10 2013-12-10 Apparatus and method for thermal extraction of metals
US14/101,540 US20140191450A1 (en) 2011-07-05 2013-12-10 Apparatus and method for the thermal extraction of metals
US14/101,540 2013-12-10

Publications (1)

Publication Number Publication Date
CN104838022A true CN104838022A (en) 2015-08-12

Family

ID=53371603

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380003964.5A Pending CN104838022A (en) 2013-12-10 2013-12-10 Apparatus and method for thermal extraction of metals

Country Status (4)

Country Link
JP (1) JP2016508185A (en)
CN (1) CN104838022A (en)
WO (1) WO2015088494A1 (en)
ZA (1) ZA201401496B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6872606B2 (en) * 2016-06-10 2021-05-19 パリ シアンス エ レットル‐カルティエ ラタン Methods and Systems for Plasma Inductively Selective Extraction and Recovery of Species from Matrix

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4386258A (en) * 1978-08-28 1983-05-31 Nippon Mining Co., Ltd. High frequency magnetic field coupling arc plasma reactor
CN1668771A (en) * 2001-09-14 2005-09-14 亚历山大·贝克曼 Process for extracting cobalt and nickel from ores and concentrates
CN1878879A (en) * 2003-09-29 2006-12-13 尤米科尔公司 Method and device for recovering non-ferrous metals from zinc-containing residues
WO2012170042A1 (en) * 2011-06-10 2012-12-13 Ss Advanced Metal Technologies Llc System and method for the thermal processing of ore bodies

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5017754A (en) * 1989-08-29 1991-05-21 Hydro Quebec Plasma reactor used to treat powder material at very high temperatures
US20080298425A1 (en) * 2007-06-01 2008-12-04 Tinomics, Llc Method and apparatus for melting metals using both alternating current and direct current

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4386258A (en) * 1978-08-28 1983-05-31 Nippon Mining Co., Ltd. High frequency magnetic field coupling arc plasma reactor
CN1668771A (en) * 2001-09-14 2005-09-14 亚历山大·贝克曼 Process for extracting cobalt and nickel from ores and concentrates
CN1878879A (en) * 2003-09-29 2006-12-13 尤米科尔公司 Method and device for recovering non-ferrous metals from zinc-containing residues
WO2012170042A1 (en) * 2011-06-10 2012-12-13 Ss Advanced Metal Technologies Llc System and method for the thermal processing of ore bodies
CN102959101A (en) * 2011-06-10 2013-03-06 Ss先进金属技术有限公司 System and method for the thermal processing of ore bodies

Also Published As

Publication number Publication date
JP2016508185A (en) 2016-03-17
WO2015088494A1 (en) 2015-06-18
ZA201401496B (en) 2014-06-25

Similar Documents

Publication Publication Date Title
US8043400B1 (en) System and method for the thermal processing of ore bodies
CN102441553B (en) Method and device for recovering precious metals from precious metal electronic scraps
US8800775B2 (en) Method for recovering metals from electronic waste containing plastics materials
CN106345794A (en) Waste circuit board microwave anaerobic splitting treatment method
CN207446939U (en) Electronic waste plasma gasification melting processing system
JP6997310B2 (en) Methods for recovering and extracting gold from electronic waste or minerals, ores, and sand containing gold
US20140191450A1 (en) Apparatus and method for the thermal extraction of metals
US10584399B2 (en) Process and system for recycling E-waste material
CN104838022A (en) Apparatus and method for thermal extraction of metals
JP2011046983A (en) Method for recovering valuable metal from portable or small-sized electronic equipment
CN212310397U (en) Quick high-efficient flying dust system of handling of plasma
SK287060B6 (en) A method and an apparatus for recovery of metals
US7459006B2 (en) Electromagnetic pyrolysis metallurgy
KR101494256B1 (en) System for Recovering Valuable Metal
AU2016202867A1 (en) Apparatus and method for thermal extraction of metals
AU2013304615A1 (en) Apparatus and method for thermal extraction of metals
CN105907988A (en) Device for lead and zinc ore smelting
JP2009063286A (en) Waste treatment method, metal manufacturing method and metal
HK1179662A (en) System and method for the thermal processing of ore bodies
CN108456777B (en) Method for preparing rich noble lead from noble antimony
EP4411222A1 (en) Method for operating melting furnace, and melting furnace
NL2026572B1 (en) Process and system for melting agglomerates
CN216558251U (en) Zinc-containing solid waste treatment system
RU2276196C1 (en) Method for noble metal recovery
EP1834000A1 (en) A method and use of an apparatus for recovery of metals or metal compounds

Legal Events

Date Code Title Description
PB01 Publication
EXSB Decision made by sipo to initiate substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20150812