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CN105445201A - Sample analysis system and sample analysis method - Google Patents

Sample analysis system and sample analysis method Download PDF

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Publication number
CN105445201A
CN105445201A CN201510751567.7A CN201510751567A CN105445201A CN 105445201 A CN105445201 A CN 105445201A CN 201510751567 A CN201510751567 A CN 201510751567A CN 105445201 A CN105445201 A CN 105445201A
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sample
mixed gas
gas
temperature
bubbler
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CN105445201B (en
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康斯坦丁·莫吉利尼科夫
许开东
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Jiangsu Leuven Instruments Co Ltd
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Jiangsu Leuven Instruments Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The invention discloses a sample analysis system and a sample analysis method. The sample analysis system comprises a sample platform, a sample temperature regulating and controlling unit, a gas supplying unit and an optical analysis unit, wherein the sample temperature regulating and controlling unit comprises a sample temperature testing device, a sample temperature regulating device and a sample temperature control device; the gas supplying unit comprises a gas storage tank, a decompression device, a mixed gas preparation device, and a gas flow spraying-out device; and the optical analysis unit comprises a polariscope and an analyzer. The sample analysis method provided by the invention comprises the following steps: a step of regulating and controlling a sample temperature: regulating and controlling the temperature of the sample on the sample platform through the sample temperature regulating and controlling unit to a certain constant temperature; a step of preparing mixed gas: after enabling gas from the gas storage tank to pass through the decompression device, forming the mixed gas in the mixed gas preparation device; a step of spraying out the gas: spraying the mixed gas to the surface of a sample at a certain flow by using the gas flow spraying-out device; and a step of optically analyzing: analyzing the sample by the polariscope and the analyzer through adopting an oval polarization method.

Description

Sample analysis system and sample analysis method
Technical field
The present invention relates to a kind of sample analysis system and sample analysis method, specifically, relate to a kind of sample analysis system utilizing elliptical polarizer and the sample analysis method adopting ellipsometry.
Background technology
In porous membrane microelectronics (film having low dielectric constant), cell membrane, catalytic membrane, sensor numerous areas, there is comparatively wide application.One of them very important application evaluates the film having low dielectric constant used in after guide's technique of VLSI (very large scale integrated circuit) (ULSI) device road interconnected (advancedinterconnects) (being called for short low-k film).Meanwhile, the application of the membraneous material in sensor field expands rapidly.The method utilizing ellipsometry (ellipsometry) to evaluate porous low-k film is described in following patent documentation 1 ~ 4 and non-patent literature.
Patent documentation 1:US6,435,008B2
Patent documentation 2:US6,662,631
Patent documentation 3:US2006/0254374A1
Patent documentation 4:US7,568,379B2
Non-patent literature: AdsorptionandDesorptionIsothermsatAmbientTemperatureObta inedbyEllipsometricPorosimetrytoProbeMicroporesinOrdered MesoporousSilicaFilms.BourgeoisA., Brunet-BruneauA., FissonS., RivoriJ.Adsorption11:195-199,2005
In recent years, the research of people to advanced low-k materials (being called for short low-k material) shows huge interest at the numerous areas such as micron, field of nanometer technology.Utilize ellipsometry can study the factor of porosity of material, and can study the thickness of porous layer and parameter in solvent vapour environment.The change of the refractive index of porosint is the function of the relative pressure change of solvent vapour, and this makes it possible to the solvent volume determining to import hole, and can set up an isothermal curve.The factor of porosity of porosint can be measured thus, thus study its mechanical electrology characteristic.Patent documentation 1 describes the method utilizing elliptical polarizer test material factor of porosity.As shown in Figure 8, the proving installation 1a used in patent documentation 1 comprises vacuum test chamber 2, solvent tank 4, pump 6, absorption valve 5, desorb valve 7, pressure transducer 8, elliptical polarizer 9 and digital data recording system 10.Wherein, porosint 3 is placed with in vacuum test chamber 2, absorption valve 5 is for controlling the solvent flux flowing into test chamber 2, pump 6 and desorb valve 7 get solvent vapour for pump, pressure transducer 8, for the solvent vapour pressure in test chamber 2, utilizes the material property of ellipsometry to components and parts 3 to test thus.Patent documentation 4 has done further improvement to solvent vapour Stress control on the basis of patent documentation 1, improves the precision controlled test chamber 2 internal solvent steam pressure, thus improves the accuracy and reliability of measurement result.But the system that these patent documentations are recorded all needs to test vacuum chamber 2, makes the cost of equipment costly.In addition, test needs to carry out under certain atmosphere pressures usually, and forming specific solvent vapour pressure needs certain hour, and in order to set up isothermal curve, need repeatedly to change the solvent vapour pressure as variable, this all compares and expends time in, thus reduces the efficiency of test.Meanwhile, this system needs a large amount of solvent vapour filled vacuum chambers 2, makes the cost of measurement relatively high.
In addition, although the current mass production of system that patent documentation 1 ~ 3 is recorded, and the integrated circuit (IC) manufacturer of most of advanced person utilizes this system to carry out qualitative analysis to deposited porous low-k film, and assesses the improvement in its technological process.But the shortcoming of this system is that elliptical polarizer must configure, complicated high-vacuum chamber.Accurate steam pressure measuring system and control pressurer system make this system very expensive, which has limited the application in its field beyond microelectronics.Another one problem is that its efficiency is lower, and testing a sample needs about more than 1 hour or 1 hour.Meanwhile, this system needs a large amount of solvent vapours.
Summary of the invention
The object of the present invention is to provide a kind of sample analysis system, it can reduce the cost of equipment, can reduce the cost of sample test consumables, and can improve the test speed of sample well porosity.
Another object of the present invention is to provide a kind of sample analysis method using this system to analyze sample.
The feature of sample analysis system involved in the present invention is to possess: sample stage; Sample temperature regulation and control unit, it comprises sample temperature proving installation, sample temperature regulating device and sample temperature control unit; Gas feed unit, it comprises gas reservoir, reliever, mixed gas preparation facilities and air-flow blowoff; And optical analysis unit, it comprises polariscope and analyser.
Be preferably, described mixed gas preparation facilities comprises bubbler, first flow controller, second amount controller, bubbler temperature regulation and control unit and mixed gas temperature regulation unit.
Be preferably, described bubbler temperature regulation and control unit comprises bubbler temperature proving installation, bubbler temperature regulating device and bubbler temperature control device, and described mixed gas temperature regulation unit comprises mixed gas temperature testing device, mixed gas temperature control equipment and mixed gas temperature control equipment.
Be preferably, described mixed gas preparation facilities comprises adsorbate liquid drop ejector, the 3rd flow controller and closed gas mixing chamber.
Be preferably, sample analysis system of the present invention also comprises: computer control unit, and it totally controls described sample temperature regulation and control unit, described gas feed unit and described optical analysis unit.
The sample analysis system that sample analysis method involved in the present invention uses possesses: sample stage; Sample temperature regulation and control unit; Gas feed unit, it comprises gas reservoir, reliever, mixed gas preparation facilities and air-flow blowoff; And optical analysis unit, it comprises polariscope and analyser, the feature of this sample analysis method is have: sample temperature regulation and control step, and regulating and controlling unit by the temperature regulable control of the sample be placed on described sample stage by described sample temperature is a certain steady temperature; Mixed gas preparation process, makes gas from described gas reservoir after reliever, forms mixed gas at described mixed gas preparation facilities; Gas ejection step, utilizes described air-flow blowoff, mixed gas is ejected into sample surfaces with certain flow; Optical analysis step, utilizes described polariscope and described analyser, adopts ellipsometry to analyze described sample.
Be preferably, in described mixed gas preparation process, with the gas and vapor permeation come via second amount controller from described gas reservoir after making the gas from described gas reservoir enter bubbler via first flow controller, regulating and controlling unit by bubbler temperature, is a certain steady temperature by the temperature regulable control of bubbler.
Be preferably, in described mixed gas preparation process, utilize mixed gas temperature regulation unit by the temperature of the mixed gas flowed out from bubbler more subtly regulable control be a certain steady temperature.
Being preferably, in described mixed gas preparation process, by controlling the flow of second amount controller, the solvent vapour dividing potential drop in mixed gas being controlled.
Be preferably, in described mixed gas preparation process, make the gas from gas reservoir enter closed gas mixing chamber via the 3rd flow controller, utilize adsorbate liquid drop ejector to ejection of solvent steam or drop in described closed gas mixing chamber, thus form mixed gas.
Utilize sample test system involved in the present invention and sample test method with cheap cost, mensuration can be carried out to sample inner surface area, permeability and factor of porosity expeditiously and are analyzed.
Accompanying drawing explanation
Fig. 1 is the structural drawing representing sample analysis system of the present invention.
Fig. 2 is the structural drawing of an embodiment of the mixed gas preparation system represented in sample analysis system of the present invention.
Fig. 3 is the structural drawing of another embodiment of the mixed gas preparation system represented in sample analysis system of the present invention.
Fig. 4 is the process flow diagram representing sample analysis method of the present invention.
Fig. 5 is the sub-process figure of the mixed gas preparation process represented in sample analysis method of the present invention.
Fig. 6 A is the change curve of total pore volume along with adsorbing medium dividing potential drop of two kinds of porous low dielectric constant materials (specific inductive capacity is respectively 1.8 and 2.2).
Fig. 6 B is the pore size that two kinds of porosints test out.
Fig. 7 shows and reaches the balance time used for a certain sample A (factor of porosity 45%, thickness 200nm, pore radius 2.2nm, specific inductive capacity 1.8) the sorption and desorption stage.
Fig. 8 is the structural drawing of the analyzing device representing prior art.
Embodiment
Be described below in detail embodiments of the invention, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has element that is identical or similar functions from start to finish.Being exemplary below by the embodiment be described with reference to the drawings, only for explaining the present invention, and can not limitation of the present invention being interpreted as.
Fig. 1 is the structural drawing representing sample analysis system of the present invention.Sample analysis system 1 of the present invention possesses: sample stage 12, temperature regulation unit 13, gas feed unit 14 and optical analysis unit 15.Temperature regulation unit 13 comprises temperature testing device 131, temperature control equipment 132 and temperature control equipment 133.Gas feed unit 14 comprises gas reservoir 141, reliever 142, mixed gas preparation facilities 143 and air-flow blowoff 144.Optical analysis unit 15 comprises elliptical polarizer 151 and analyser 152.Mixed gas preparation facilities 143 comprises bubbler 1431, first flow controller 1432, second amount controller 1433, bubbler temperature regulation and control unit 1434 and mixed gas temperature regulation unit 1435.First flow controller 1432 and second amount controller 1433 can adopt the volume control device of prior art, the absorption valve 7 described in patent documentation 4 and the structure of desorb valve 5.
Although there is no example in fig. 2, described bubbler temperature regulation and control unit 1434 comprises bubbler temperature proving installation, bubbler temperature regulating device and bubbler temperature control device, and described mixed gas temperature regulation unit 1435 comprises mixed gas temperature testing device, mixed gas temperature control equipment and mixed gas temperature control equipment.
In addition, sample analysis system 1 of the present invention also can also possess computer control unit 16, and it totally controls temperature regulation unit 13, gas feed unit 14 and optical analysis unit 15.
Temperature testing device 131 can be thermoelectricity occasionally thermal resistance.Temperature control equipment 133 can be Peltier type temperature controller.
As another embodiment, mixed gas preparation facilities 143 also can comprise adsorbate liquid drop ejector 1436, the 3rd flow controller 1437 and closed gas mixing chamber 1438.In the mixed gas preparation facilities 143 of this embodiment, the drop of specific quantity is imported into carrier gas stream, and allow easily to control adsorption concentration.Because mixed gas preparation facilities 143 only includes a flow controller, adsorbate liquid drop ejector and closed gas mixing chamber, because of the system being employed herein liquid drop ejector makes absorbent concentration can with the fastest velocity variations.
Below, composition graphs 4 is described sample analysis method involved in the present invention.First, sample 10 is positioned over sample stage 12, described sample stage 12 can adjust the incident angle relative to elliptical polarizer 151 and analyser 152.Elliptical polarizer 151 is connected with computing machine 16, and described computing machine 16 can make elliptical polarizer 151 and analyser 152 measure elliptical polarized light angle with required temporal resolution in the process of sorption and desorption.
Next, in temperature adjusting step, be a certain steady temperature (step S1, S2) by temperature regulation unit by the temperature regulable control of the sample be placed on sample stage, such as 20 DEG C.
In the sub-process figure of the mixed gas preparation process (step S3) shown in Fig. 5, make gas from gas reservoir 141 after reliever 142, in mixed gas preparation facilities 143, form mixed gas.First, utilize bubbler temperature to regulate and control unit 1434 temperature of bubbler 1431 is regulated and is fixed as predetermined temperature (step S31, S32).Next, regulate and fix the flow (step S33) of first flow controller 1432, making the gas from gas reservoir 141 enter bubbler 1431 via first flow controller 1432 with certain flow, thus forming mixed gas.Mixed gas temperature regulation unit 1435 is utilized to carry out regulation and control (step S34) further to the temperature of the mixed gas flowed out from bubbler 1431.By regulating the flow of second amount controller 1433, the ratio directly from the gas of gas reservoir 141 in mixed gas is regulated, thus regulate the solvent vapour dividing potential drop (step S35) of mixed gas.Next, judge whether that needs proceed to test (step S36), when being judged as YES, regulating the temperature (step S37) of bubbler 141, and repeating above-mentioned steps S32 ~ S35, until be judged as NO in step S36.
Specifically, inert gas (Ar, He, N2) is filled in gas reservoir 141 inside, make air-flow enter into gas mixing system and bubbler 1431 by reliever 142, this carrier gas be selected as the hypersober (isopropyl alcohol, methyl alcohol, water, toluene etc.) that factor of porosity evaluates and mix.Described gas mixing system must allow the concentration of " hypersober " to transform to 100% (only having hypersober) from zero (only having carrier gas), and the concentration produced also should correspond to measured polarization angle and be stored in computing machine simultaneously.In more detail, inlet air flow be divided into two, one of them air-flow passes through bubbler together with liquid " hypersober ".This air-flow by adsorbent saturation until reach by temperature and carrier gas flux the normal concentration that determines.Utilize second air-flow to by diluting to reduce adsorption concentration from bubbler effluent air.Here, assuming that hold toluene and utilize bubbler temperature regulation and control unit 1434 that bubbler is regulated to fixed temperature in bubbler.Now, the steam pressure of toluene is 25torr (Po).By same toluene dividing potential drop will be had in the carrier gas of bubbler.But, because native system has second air-flow, if therefore same additional supporting gas air-flow is mixed in the steam of toluene by another air-flow, then from the partial vapour pressure of mixed gas preparation system toluene out will be 12.5torr (P).So, the partial vapour pressure of toluene can be controlled in the scope from 0 (P/Po=0) to 25torr (P/Po=1).
Next, return Fig. 4, in gas ejection step (step S4) shown in Fig. 4, utilize air-flow blowoff 145, mixed gas is ejected into sample surfaces with certain flow.
In the optical analysis step (step S5) shown in Fig. 4, utilize elliptical polarizer 151 and analyser 152, based on known elliptical polarized light analytical approach, sample is analyzed.Specifically, the air-flow with particular adsorbent concentration is made after gas mixing system, to enter air-flow blowoff 145 (gas jet formation system) afterwards (step S4), make formed gas jet have the controllable size close with the laser beam spot be incident upon on test surfaces, utilize elliptical polarizer 151 and analyser 152 pairs of samples to carry out testing and analysis (step S5) simultaneously.Judge whether the absorption-desorption isotherm (step S6) obtaining predetermined number, when being judged as NO, regulate the temperature (step S7) changing sample, repeat step S2 ~ S5, until obtain the absorption-desorption isotherm of predetermined number.This with conventional art based on chamber system compared with, the amount of used adsorbent can be reduced significantly.
In addition, as another embodiment of the present invention, in mixed gas preparation process, also the gas from gas reservoir 141 can be made to enter closed gas mixing chamber 1437 via the 3rd flow controller 1438, utilize adsorbate liquid drop ejector 1436 to ejection of solvent steam or drop in closed gas mixing chamber 1437, thus form mixed gas.Here can by controlling the partial vapour pressure of the emitted dose of adsorbate liquid drop ejector 1436 thus the toluene in control mixed gas.
Fig. 6 shows the isothermal example of absorption-desorption of testing for low-k film.The result of the present invention's test: Fig. 6 A is the change of total pore volume along with adsorbing medium dividing potential drop of two kinds of porous low dielectric constant materials (specific inductive capacity is respectively 1.8 and 2.2); Fig. 6 B is the pore size that this two kinds of porosints test out.Sorption and desorption curve has display.Obviously, the material total pore volume that specific inductive capacity is low is large, and this and Clausius-Mossotti equation (Clausius-Mossottiequation) match.The result obtained and standard ellipse polarisation porosimetry obtain obtaining more satisfactory result compared with data.In order to calculate pore radius, Kelvin equation (KelvinEquation) can be utilized to draw the curve (V is pore volume, and R is pore radius) of differential dV/dR relative to pore radius here.In this case, the distribution of accumulation pore radius can just be obtained as shown in Figure 6B.
Fig. 7 shows and reaches the balance time used for a certain sample A (factor of porosity 45%, thickness 200nm, pore radius 2.2nm, specific inductive capacity 1.8) the sorption and desorption stage, thus extrapolates test speed of the present invention.Such as, open valve at 25 seconds these time points, reach capacity at 40 seconds these time points, then need 15 second time to reach balance.If open valve at 70 seconds these time points and reach capacity at 80 seconds these time points, then need 10 seconds.In inside diameter measurement process, it is the condition that test is necessary that sorption and desorption reaches capacity.This time reflects the time required for test 1 point.Suppose to obtain a complete and high-resolution absorption-desorption isotherm to need to measure for 30 times, then this measurement film required time is total up to 300 ~ 450 seconds (< 10 minutes).Experiment proves, is about 5 minutes to this film time of carrying out needed for whole test loop, compared with traditional factor of porosity tester, and the little order of magnitude of required time.
Thus, sample test system of the present invention and sample test method can significantly reduce costs (not needing chamber and vacuum), compatible with any independently elliptical polarizer, faster than conventional holes porosity tester test speed, complete and measure needs 5 ~ 10 minutes, and traditional elliptical polarized light factor of porosity tester needs 1 hour.And there is less adsorbent consumption (only less point but not filling) to whole chamber.
More than describe and just illustrate in order to example and describe the present invention, and be not intended to exhaustive and restriction the present invention.Therefore, the present invention is not limited to described embodiment.The modification obviously known for those skilled in the art or change, all within protection scope of the present invention.

Claims (10)

1. a sample analysis system, is characterized in that,
Possess:
Sample stage;
Sample temperature regulation and control unit, it comprises sample temperature proving installation, sample temperature regulating device and sample temperature control unit;
Gas feed unit, it comprises gas reservoir, reliever, mixed gas preparation facilities and air-flow blowoff; And
Optical analysis unit, it comprises polariscope and analyser.
2. sample analysis system according to claim 1, is characterized in that,
Described mixed gas preparation facilities comprises bubbler, first flow controller, second amount controller, bubbler temperature regulation and control unit and mixed gas temperature regulation unit.
3. sample analysis system according to claim 2, is characterized in that,
Described bubbler temperature regulation and control unit comprises bubbler temperature proving installation, bubbler temperature regulating device and bubbler temperature control device, and described mixed gas temperature regulation unit comprises mixed gas temperature testing device, mixed gas temperature control equipment and mixed gas temperature control equipment.
4. sample analysis system according to claim 1, is characterized in that,
Described mixed gas preparation facilities comprises adsorbate liquid drop ejector, the 3rd flow controller and closed gas mixing chamber.
5. the sample analysis system according to any one of Claims 1 to 4, is characterized in that,
Also comprise: computer control unit, it totally controls described sample temperature regulation and control unit, described gas feed unit and described optical analysis unit.
6. a sample analysis method, the sample analysis system used possesses: sample stage; Sample temperature regulation and control unit; Gas feed unit, it comprises gas reservoir, reliever, mixed gas preparation facilities and air-flow blowoff; And optical analysis unit, it comprises polariscope and analyser, and the feature of this sample analysis method is,
Have:
Sample temperature regulation and control step, regulating and controlling unit by the temperature regulable control of the sample be placed on described sample stage by described sample temperature is a certain steady temperature;
Mixed gas preparation process, makes gas from described gas reservoir after reliever, forms mixed gas at described mixed gas preparation facilities;
Gas ejection step, utilizes described air-flow blowoff, mixed gas is ejected into sample surfaces with certain flow; And
Optical analysis step, utilizes described polariscope and described analyser, adopts ellipsometry to analyze described sample.
7. sample analysis method according to claim 6, is characterized in that,
In described mixed gas preparation process, with the gas and vapor permeation come via second amount controller from described gas reservoir after making the described gas from gas reservoir enter bubbler via first flow controller, regulating and controlling unit by bubbler temperature, is a certain steady temperature by the temperature regulable control of bubbler.
8. sample analysis method according to claim 7, is characterized in that,
In described mixed gas preparation process, mixed gas temperature regulation unit is utilized to be a certain steady temperature by meticulous for the temperature of the mixed gas flowed out from bubbler regulable control further.
9. the sample analysis method according to claim 7 or 8, is characterized in that,
In described mixed gas preparation process, by controlling the flow of second amount controller, the solvent vapour dividing potential drop in mixed gas is controlled.
10. sample analysis method according to claim 6, is characterized in that,
In described mixed gas preparation process, make the gas from gas reservoir enter closed gas mixing chamber via the 3rd flow controller, utilize adsorbate liquid drop ejector to ejection of solvent steam or drop in described closed gas mixing chamber, thus form mixed gas.
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CN105758802A (en) * 2016-04-12 2016-07-13 江苏鲁汶仪器有限公司 Sample analysis system and sample analysis method
CN106990255A (en) * 2017-04-07 2017-07-28 鲁汶仪器有限公司(比利时) Sample analysis system
WO2018000966A1 (en) * 2016-07-01 2018-01-04 江苏鲁汶仪器有限公司 Gas injection device
CN108982778A (en) * 2018-09-11 2018-12-11 上海新奥林汽车传感器有限公司 A kind of gas function detecting instrument automatically working platform
CN113454447A (en) * 2018-11-22 2021-09-28 株式会社理学 Single crystal X-ray structure analysis system

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CN108982778A (en) * 2018-09-11 2018-12-11 上海新奥林汽车传感器有限公司 A kind of gas function detecting instrument automatically working platform
CN113454447A (en) * 2018-11-22 2021-09-28 株式会社理学 Single crystal X-ray structure analysis system

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