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CN106092514A - Optical heterogeneity measurement apparatus and method based on dual wavelength fizeau interferometer - Google Patents

Optical heterogeneity measurement apparatus and method based on dual wavelength fizeau interferometer Download PDF

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CN106092514A
CN106092514A CN201510209977.9A CN201510209977A CN106092514A CN 106092514 A CN106092514 A CN 106092514A CN 201510209977 A CN201510209977 A CN 201510209977A CN 106092514 A CN106092514 A CN 106092514A
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plane mirror
optical axis
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CN106092514B (en
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高志山
王凯亮
成金龙
王伟
王帅
袁群
杨忠明
朱丹
窦建泰
叶井飞
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Nanjing University of Science and Technology
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Abstract

本发明公开了一种基于双波长斐索干涉仪的光学非均匀性测量装置及方法,通过在双波长斐索干涉仪装置中,先后采集参考光波与待测平面镜前表面的反射光波的干涉图,通过第一步移相测量得到波长λ1和λ2对应的波前像差数据ΔW11(x,y)、ΔW21(x,y);采集参考光波与透过待测平面镜并被待测平面镜后表面反射的光波的干涉图,通过移相测量得到波长λ1和λ2对应的波前像差数据ΔW12(x,y)、ΔW22(x,y)。通过两步测量得到的对应波长波前像差数据求差值,获得待测平面镜光学非均匀性。本发明不需要引入标准反射镜,完全消除了标准反射镜的面形对测量结果的影响,测量步骤简单,弥补了传统绝对测量方法步骤繁琐、易受空气扰动的缺点。

The invention discloses an optical non-uniformity measurement device and method based on a dual-wavelength Fizeau interferometer. In the dual-wavelength Fizeau interferometer device, the interference patterns of reference light waves and reflected light waves on the front surface of a plane mirror to be measured are successively collected. , the wavefront aberration data ΔW 11 (x, y) and ΔW 21 (x, y) corresponding to the wavelengths λ 1 and λ 2 are obtained through the first phase shift measurement; Measure the interferogram of the light waves reflected by the rear surface of the plane mirror, and obtain the wavefront aberration data ΔW 12 (x, y) and ΔW 22 (x, y) corresponding to the wavelengths λ 1 and λ 2 through phase shift measurement. The optical non-uniformity of the plane mirror to be tested is obtained by calculating the difference value of the corresponding wavelength wavefront aberration data obtained by the two-step measurement. The invention does not need to introduce a standard reflector, completely eliminates the influence of the surface shape of the standard reflector on the measurement result, has simple measurement steps, and makes up for the shortcomings of the traditional absolute measurement method, which are cumbersome and easily disturbed by air.

Description

基于双波长斐索干涉仪的光学非均匀性测量装置及方法Device and method for measuring optical non-uniformity based on dual-wavelength Fizeau interferometer

技术领域technical field

本发明属于光学测量技术领域,特别是一种基于双波长斐索干涉仪的光学非均匀性测量装置及方法。The invention belongs to the technical field of optical measurement, in particular to an optical non-uniformity measurement device and method based on a dual-wavelength Fizeau interferometer.

背景技术Background technique

光学透射材料是光学材料的重要组成部分,其光学性能对整个光学系统具有重要的作用。通常评价光学透射材料性能的指标有色散、表面面形、光学非均匀性、曲率半径、应力双折射、条纹及气泡等。其中,光学非均匀性反映的是同一块光学材料内部折射率的不一致性。如若光学材料内部折射率不一致,将会引起透射波前的改变,改变光学系统的波像差,进而影响光学系统的性能。量级的光学非均匀性,会带来波长量级的波像差,因而对光学材料的光学非均匀性高精度的检测,是非常迫切且必要的。Optical transmission materials are an important part of optical materials, and their optical properties play an important role in the entire optical system. The indicators used to evaluate the performance of optically transparent materials include dispersion, surface shape, optical non-uniformity, radius of curvature, stress birefringence, stripes and bubbles, etc. Among them, optical non-uniformity reflects the inconsistency of the refractive index inside the same piece of optical material. If the internal refractive index of the optical material is inconsistent, it will cause the change of the transmitted wavefront, change the wave aberration of the optical system, and then affect the performance of the optical system. The optical non-uniformity of the magnitude will bring the wave aberration of the wavelength magnitude, so it is very urgent and necessary to detect the optical non-uniformity of the optical material with high precision.

光学材料的光学非均匀性会直接导致透射波前的变化,因而可通过测量透射波前波像差的改变量,得到光学材料的光学非均匀性分布。在目前的检测手段中,干涉法作为非接触式的高精度检测手段,具有广泛的应用。当前,测量光学元件非均匀性的方法有很多种。2003年,郭培基等人在光学玻璃光学均匀性的绝对测量技术一文中提出了三种用于测量光学玻璃非均匀性的绝对测量方法,并研制了一台高精度的光学玻璃材料光学非均匀性测量仪,对光学玻璃非均匀性实现了高精度测量,但是仪器价格昂贵,不能实现广泛应用。2008年,王军等人在用短相干光源测量平行平板玻璃的光学均匀性一文中提出了一种新的方法,利用短相干光源的相干性,实现了对平行平板的光学非均匀性高精度的检测,但是由于短相干光源的短相干特性,必须使参考光和测试光处于零光程差位置,给实验光路调整带来了很大的难度。The optical inhomogeneity of the optical material will directly lead to the change of the transmitted wavefront, so the optical inhomogeneity distribution of the optical material can be obtained by measuring the change of the wave aberration of the transmitted wavefront. Among the current detection methods, interferometry is widely used as a non-contact high-precision detection method. Currently, there are many methods for measuring non-uniformity in optical components. In 2003, Guo Peiji and others proposed three absolute measurement methods for measuring the non-uniformity of optical glass in the article "Absolute Measurement Technology for Optical Uniformity of Optical Glass", and developed a high-precision optical non-uniformity measurement method for optical glass materials. The measuring instrument realizes high-precision measurement of the non-uniformity of optical glass, but the instrument is expensive and cannot be widely used. In 2008, Wang Jun et al. proposed a new method in the article Measuring the Optical Uniformity of Parallel Flat Glass with a Short Coherent Light Source. Using the coherence of the short coherent light source, the high precision of the optical non-uniformity of the parallel flat plate was realized. However, due to the short-coherence characteristics of the short-coherent light source, the reference light and the test light must be at the position of zero optical path difference, which brings great difficulty to the adjustment of the experimental optical path.

发明内容Contents of the invention

本发明的目的是提供一种基于双波长斐索干涉仪的光学非均匀性测量装置及方法,解决了传统绝对测量方法步骤繁琐、易受空气扰动的问题。The purpose of the present invention is to provide an optical non-uniformity measurement device and method based on a dual-wavelength Fizeau interferometer, which solves the problems of cumbersome steps and susceptibility to air disturbance in the traditional absolute measurement method.

实现本发明目的的技术解决方案为:一种基于双波长斐索干涉仪的光学非均匀性测量装置包括第一激光器、第二激光器、折转反射镜、切换反射镜、扩束镜、分光棱镜、折转反射镜、准直物镜、参考平面镜、孔径光阑、成像透镜组、CCD探测器、待测平面镜;共光轴依次设置折转反射镜、准直物镜、参考平面镜、待测平面镜,且上述部件所处的光轴为第一光轴;共光轴依次设置分光棱镜、孔径光阑、成像透镜组、CCD探测器,且上述部件所处的光轴为第二光轴,第一光轴与第二光轴平行;共光轴依次设置折转反射镜、切换反射镜、扩束镜、分光棱镜、折转反射镜,且上述部件所处的光轴为第三光轴,第三光轴与第一光轴垂直,切换反射镜沿平行于第一光轴方向移动;所有光学元件相对于基底同轴等高,即相对于光学平台或仪器底座同轴等高。The technical solution to realize the object of the present invention is: an optical non-uniformity measuring device based on a dual-wavelength Fizeau interferometer includes a first laser, a second laser, a folding mirror, a switching mirror, a beam expander, and a beam splitting prism , refracting mirror, collimating objective lens, reference plane mirror, aperture stop, imaging lens group, CCD detector, plane mirror to be tested; the common optical axis is set in order to refract mirror, collimating objective lens, reference plane mirror, and plane mirror to be tested, And the optical axis where the above-mentioned components are located is the first optical axis; the common optical axis is sequentially arranged with a dichroic prism, an aperture stop, an imaging lens group, and a CCD detector, and the optical axis where the above-mentioned components are located is the second optical axis, and the first The optical axis is parallel to the second optical axis; the common optical axis is provided with a folding mirror, a switching mirror, a beam expander, a dichroic prism, and a folding mirror in sequence, and the optical axis where the above-mentioned components are located is the third optical axis. The three optical axes are perpendicular to the first optical axis, and the switching mirror moves in a direction parallel to the first optical axis; all optical elements are coaxially equal in height relative to the base, that is, coaxially equal in height relative to the optical platform or the instrument base.

其中,折转反射镜、准直物镜、参考平面镜、待测平面镜沿光路方向依次设置,构成测试光路;折转反射镜、准直物镜、参考平面镜沿光路方向依次设置,构成参考光路;第一激光器的波长为λ1,第二激光器的波长为λ2Wherein, the deflecting mirror, collimating objective lens, reference plane mirror, and the plane mirror to be tested are arranged in sequence along the optical path direction to form a test optical path; The wavelength of the laser is λ 1 and the wavelength of the second laser is λ 2 .

将切换反射镜移出第三光轴,第一激光器出射的激光经过折转反射镜,反射至扩束镜,实现光束的扩束,经分光棱镜透射后,再经过折转反射镜反射至准直物镜,成为准直宽光束,部分准直光束经参考平面镜的后表面反射后成为参考光束,另一部分经参考平面镜透射进入待测平面镜,经待测平面镜反射成为测试光束,并反射到参考平面镜;参考光束和测试光束在参考平面镜后表面合束,沿光路返回折转反射镜,经折转反射镜反射到分光棱镜,经分光棱镜反射聚焦在孔径光阑处,再经过成像透镜组,成像在CCD探测器的靶面上,获得波长λ1对应的干涉图像。Move the switching mirror out of the third optical axis, and the laser emitted by the first laser passes through the deflection mirror and is reflected to the beam expander to realize the expansion of the beam. The objective lens becomes a collimated wide beam, part of the collimated beam is reflected by the back surface of the reference plane mirror and becomes a reference beam, and the other part is transmitted through the reference plane mirror into the plane mirror to be tested, reflected by the plane mirror to be tested to become a test beam, and reflected to the reference plane mirror; The reference beam and the test beam combine on the back surface of the reference plane mirror, return to the folding mirror along the optical path, reflect to the beam splitting prism through the folding mirror, and focus on the aperture stop after being reflected by the beam splitting prism, and then pass through the imaging lens group to form an image on the On the target surface of the CCD detector, the interference image corresponding to the wavelength λ1 is obtained.

将切换反射镜移入第三光轴,第二激光器出射的激光经过切换反射镜,反射至扩束镜,实现光束的扩束,经分光棱镜透射后,再经过折转反射镜反射至准直物镜,成为准直宽光束,部分准直光束经参考平面镜的后表面反射后成为参考光束,另一部分经参考平面镜透射进入待测平面镜,经待测平面镜反射成为测试光束,并反射到参考平面镜;参考光束和测试光束在参考平面镜后表面合束,沿光路返回折转反射镜,经折转反射镜反射到分光棱镜,经分光棱镜反射聚焦在孔径光阑处,再经过成像透镜组,成像在CCD探测器的靶面上,得到波长λ2对应的干涉图像。Move the switching mirror into the third optical axis, and the laser emitted by the second laser passes through the switching mirror and is reflected to the beam expander to realize the expansion of the beam. , becomes a collimated wide beam, part of the collimated beam is reflected by the back surface of the reference plane mirror and becomes the reference beam, and the other part is transmitted through the reference plane mirror into the plane mirror to be tested, and is reflected by the plane mirror to be tested to become a test beam, and reflected to the reference plane mirror; The light beam and the test beam combine on the back surface of the reference plane mirror, return to the folding mirror along the optical path, reflect to the beam splitting prism through the folding mirror, and focus on the aperture stop after being reflected by the beam splitting prism, and then pass through the imaging lens group to be imaged on the CCD On the target surface of the detector, the interference image corresponding to the wavelength λ2 is obtained.

所述的基于双波长斐索干涉仪的光学非均匀性测量装置,参考平面镜与PZT连接,实现移相测量。In the optical non-uniformity measurement device based on the dual-wavelength Fizeau interferometer, the reference plane mirror is connected to the PZT to realize phase shift measurement.

所述的基于双波长斐索干涉仪的光学非均匀性测量装置,第一激光器的中心波长为λ1,第二激光器的中心波长为λ2,且λ1≠λ2。。In the optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer, the center wavelength of the first laser is λ 1 , the center wavelength of the second laser is λ 2 , and λ 1 ≠ λ 2 . .

所述的基于双波长斐索干涉仪的光学非均匀性测量装置的测量方法,步骤如下:The measurement method of the optical non-uniformity measuring device based on the dual-wavelength Fizeau interferometer, the steps are as follows:

步骤1、搭建基于双波长斐索干涉仪的光学非均匀性测量装置:Step 1. Build an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer:

基于双波长斐索干涉仪的光学非均匀性测量装置,包括第一激光器、第二激光器、折转反射镜、切换反射镜、扩束镜、分光棱镜、折转反射镜、准直物镜、参考平面镜、孔径光阑、成像透镜组、CCD探测器、待测平面镜;共光轴依次设置折转反射镜、准直物镜、参考平面镜、待测平面镜,且上述部件所处的光轴为第一光轴;共光轴依次设置分光棱镜、孔径光阑、成像透镜组、CCD探测器,且上述部件所处的光轴为第二光轴,第一光轴与第二光轴平行;共光轴依次设置折转反射镜、切换反射镜、扩束镜、分光棱镜、折转反射镜,且上述部件所处的光轴为第三光轴,第三光轴与第一光轴垂直,切换反射镜沿平行于第一光轴方向移动;所有光学元件相对于基底同轴等高,即相对于光学平台或仪器底座同轴等高。An optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer, including a first laser, a second laser, a folding mirror, a switching mirror, a beam expander, a beam splitting prism, a folding mirror, a collimating objective lens, and a reference Plane mirror, aperture stop, imaging lens group, CCD detector, plane mirror to be tested; the common optical axis is arranged in turn with a folding mirror, a collimating objective lens, a reference plane mirror, and a plane mirror to be tested, and the optical axis of the above-mentioned components is the first Optical axis; the common optical axis is provided with a dichroic prism, an aperture stop, an imaging lens group, and a CCD detector in sequence, and the optical axis where the above components are located is the second optical axis, and the first optical axis is parallel to the second optical axis; the common optical axis The axes are arranged in turn with a folding mirror, a switching mirror, a beam expander, a dichroic prism, and a folding mirror, and the optical axis where the above components are located is the third optical axis, the third optical axis is perpendicular to the first optical axis, and the switching The reflector moves along a direction parallel to the first optical axis; all optical elements are coaxially and equally high relative to the base, that is, coaxially and equally high relative to the optical platform or the instrument base.

调整待测平面镜位置,使待测平面镜的前表面与第一光轴垂直,实现待测平面镜前表面反射光波与参考平面镜反射光波的干涉。The position of the plane mirror to be tested is adjusted so that the front surface of the plane mirror to be tested is perpendicular to the first optical axis, so as to realize the interference of the reflected light wave from the front surface of the plane mirror to be tested and the reflected light wave from the reference plane mirror.

步骤2、分别获取波长λ1和λ2对应的第一次移相干涉图像:Step 2, obtain the first phase-shifting interference image corresponding to wavelength λ 1 and λ 2 respectively:

将切换反射镜移出第三光轴,第一激光器出射的激光经过折转反射镜,反射至扩束镜,实现光束的扩束,经分光棱镜透射后,再经过折转反射镜反射至准直物镜,成为准直宽光束,部分准直光束经参考平面镜的后表面反射后成为参考光束,另一部分经参考平面镜透射进入待测平面镜,经待测平面镜前表面反射成为测试光束,并反射到参考平面镜;参考光束和测试光束在参考平面镜后表面合束,沿光路返回折转反射镜,经折转反射镜反射到分光棱镜,经分光棱镜反射聚焦在孔径光阑处,再经过成像透镜组,成像在CCD探测器的靶面上,获得波长λ1对应的干涉图像,PZT驱动参考平面镜进行移相,获得波长λ1下待测平面镜前表面与参考平面镜后表面干涉形成的移相干涉图。Move the switching mirror out of the third optical axis, and the laser emitted by the first laser passes through the deflection mirror and is reflected to the beam expander to realize the expansion of the beam. The objective lens becomes a collimated wide beam, part of the collimated beam is reflected by the back surface of the reference plane mirror and becomes the reference beam, and the other part is transmitted through the reference plane mirror into the plane mirror to be tested, reflected by the front surface of the plane mirror to be tested to become a test beam, and reflected to the reference plane mirror Plane mirror; the reference beam and the test beam combine on the back surface of the reference plane mirror, return to the folding mirror along the optical path, reflect to the beam splitting prism through the folding mirror, and focus on the aperture stop after being reflected by the beam splitting prism, and then pass through the imaging lens group, Imaging on the target surface of the CCD detector to obtain the interference image corresponding to the wavelength λ1, the PZT drives the reference plane mirror for phase shifting, and obtains the phase shifting interferogram formed by the interference between the front surface of the plane mirror to be measured and the rear surface of the reference plane mirror at the wavelength λ1.

将切换反射镜移入第三光轴,第二激光器出射的激光经过切换反射镜,反射至扩束镜,实现光束的扩束,经分光棱镜透射后,再经过折转反射镜反射至准直物镜,成为准直宽光束,部分准直光束经参考平面镜的后表面反射后成为参考光束,另一部分经参考平面镜透射进入待测平面镜,经待测平面镜前表面反射成为测试光束,并反射到参考平面镜;参考光束和测试光束在参考平面镜后表面合束,沿光路返回折转反射镜,经折转反射镜反射到分光棱镜,经分光棱镜反射聚焦在孔径光阑处,再经过成像透镜组,成像在CCD探测器的靶面上,得到波长λ2对应的干涉图像,PZT驱动参考平面镜进行移相,获得波长λ2下待测平面镜前表面与参考平面镜后表面干涉形成的移相干涉图。Move the switching mirror into the third optical axis, and the laser emitted by the second laser passes through the switching mirror and is reflected to the beam expander to realize the expansion of the beam. , to become a collimated wide beam, part of the collimated beam is reflected by the back surface of the reference plane mirror and becomes the reference beam, and the other part is transmitted through the reference plane mirror into the plane mirror to be tested, reflected by the front surface of the plane mirror to be tested to become a test beam, and reflected to the reference plane mirror The reference beam and the test beam combine on the rear surface of the reference plane mirror, return to the folding reflector along the optical path, reflect to the beam splitting prism through the bending mirror, reflect and focus on the aperture diaphragm through the beam splitting prism, and then pass through the imaging lens group to form an image On the target surface of the CCD detector, the interference image corresponding to the wavelength λ2 is obtained, and the PZT drives the reference plane mirror for phase shifting to obtain the phase - shifting interferogram formed by interference between the front surface of the plane mirror to be measured and the rear surface of the reference plane mirror at the wavelength λ2.

步骤3、根据波长λ1和λ2对应的第一次相移干涉图5采用相应的移相算法,得到波长λ1和λ2分别对应的相位信息,并对两波长下的相位信息进行消常数项、消倾斜项处理,得到波长λ1和λ2对应的待测平面镜前表面任意一点处的波前像差Step 3, adopt corresponding phase-shifting algorithm according to the phase shift interferogram 5 corresponding to wavelength λ 1 and λ 2 for the first time, obtain the phase information corresponding to wavelength λ 1 and λ 2 respectively, and eliminate the phase information under the two wavelengths The constant term and the de-tilt term are processed to obtain the wavefront aberration at any point on the front surface of the plane mirror to be measured corresponding to the wavelengths λ 1 and λ 2

ΔW11(x,y)=2naA(x,y)+2S(x,y)ΔW 11 (x, y)=2n a A(x, y)+2S(x, y)

ΔW21(x,y)=2naA(x,y)+2S(x,y)ΔW 21 (x, y)=2n a A(x, y)+2S(x, y)

式中ΔW11(x,y)为第一次测量波长λ1对应的波前像差,ΔW21(x,y)为第一次测量波长λ2对应的波前像差、A(x,y)为待测平面镜前表面的面形偏差、S(x,y)为干涉测量系统的系统误差、na为空气折射率。In the formula, ΔW 11 (x, y) is the wavefront aberration corresponding to the first measurement wavelength λ 1 , ΔW 21 (x, y) is the wavefront aberration corresponding to the first measurement wavelength λ 2 , A(x, y) is the surface deviation of the front surface of the plane mirror to be measured, S(x, y) is the systematic error of the interferometric system, and n a is the air refractive index.

步骤4、分别获取波长λ1和λ2对应的第二次移相干涉图像:Step 4, obtain the phase-shifting interference image corresponding to wavelength λ 1 and λ 2 for the second time respectively:

调整待测平面镜的俯仰与倾斜,使待测平面镜的后表面与第一光轴垂直,实现透过待测平面镜并被待测平面镜后表面反射的光波与参考平面镜反射光波相干涉;Adjusting the pitch and inclination of the plane mirror to be measured, so that the rear surface of the plane mirror to be measured is perpendicular to the first optical axis, so that the light wave transmitted through the plane mirror to be measured and reflected by the back surface of the plane mirror to be measured interferes with the light wave reflected by the reference plane mirror;

将切换反射镜移出第三光轴,第一激光器出射的激光经过折转反射镜,反射至扩束镜,实现光束的扩束,经分光棱镜透射后,再经过折转反射镜反射至准直物镜,成为准直宽光束,部分准直光束经参考平面镜的后表面反射后成为参考光束,另一部分经参考平面镜透射进入待测平面镜,经待测平面镜后表面反射成为测试光束,并反射到参考平面镜;参考光束和测试光束在参考平面镜后表面合束,沿光路返回折转反射镜,经折转反射镜反射到分光棱镜,经分光棱镜反射聚焦在孔径光阑处,再经过成像透镜组,成像在CCD探测器的靶面上,获得波长λ1对应的干涉图像,PZT驱动参考平面镜进行移相,获得波长λ1下待测平面镜后表面与参考平面镜后表面干涉形成的移相干涉图。Move the switching mirror out of the third optical axis, and the laser emitted by the first laser passes through the deflection mirror and is reflected to the beam expander to realize the expansion of the beam. The objective lens becomes a collimated wide beam, part of the collimated beam is reflected by the back surface of the reference plane mirror and becomes the reference beam, and the other part is transmitted through the reference plane mirror into the plane mirror to be tested, reflected by the back surface of the plane mirror to be tested to become a test beam, and reflected to the reference plane mirror Plane mirror; the reference beam and the test beam combine on the back surface of the reference plane mirror, return to the folding mirror along the optical path, reflect to the beam splitting prism through the folding mirror, and focus on the aperture stop after being reflected by the beam splitting prism, and then pass through the imaging lens group, Imaging on the target surface of the CCD detector to obtain the interference image corresponding to the wavelength λ1, the PZT drives the reference plane mirror for phase shifting, and obtains the phase shifting interferogram formed by the interference between the back surface of the plane mirror to be measured and the back surface of the reference plane mirror at the wavelength λ1.

将切换反射镜移入第三光轴,第二激光器出射的激光经过切换反射镜,反射至扩束镜,实现光束的扩束,经分光棱镜透射后,再经过折转反射镜反射至准直物镜,成为准直宽光束,部分准直光束经参考平面镜的后表面反射后成为参考光束,另一部分经参考平面透射进入待测平面镜,经待测平面镜后表面反射成为测试光束,并反射到参考平面镜;参考光束和测试光束在参考平面镜后表面合束,沿光路返回折转反射镜,经折转反射镜反射到分光棱镜,经分光棱镜反射聚焦在孔径光阑处,再经过成像透镜组,成像在CCD探测器的靶面上,得到波长λ2对应的干涉图像,PZT驱动参考平面镜进行移相,获得波长λ2下待测平面镜后表面与参考平面镜后表面干涉形成的移相干涉图。Move the switching mirror into the third optical axis, and the laser emitted by the second laser passes through the switching mirror and is reflected to the beam expander to realize the expansion of the beam. , to become a collimated wide beam, part of the collimated beam is reflected by the back surface of the reference plane mirror and becomes the reference beam, and the other part is transmitted through the reference plane into the plane mirror to be tested, reflected by the back surface of the plane mirror to be tested to become a test beam, and reflected to the reference plane mirror The reference beam and the test beam combine on the rear surface of the reference plane mirror, return to the folding reflector along the optical path, reflect to the beam splitting prism through the bending mirror, reflect and focus on the aperture diaphragm through the beam splitting prism, and then pass through the imaging lens group to form an image On the target surface of the CCD detector, the interference image corresponding to the wavelength λ2 is obtained, and the PZT drives the reference plane mirror for phase shifting to obtain the phase - shifting interferogram formed by interference between the back surface of the plane mirror to be measured and the back surface of the reference plane mirror at the wavelength λ2.

步骤5、根据波长λ1和λ2对应的第二次相移干涉图,采用相应的移相算法,得到波长λ1和λ2分别对应的相位信息,并对两波长的相位信息进行消常数项、消倾斜项处理,得到波长λ1对应的待测平面镜前表面任意一点处的波前像差ΔW12(x,y)、和λ2对应的待测平面镜前表面任意一点处的波前像差ΔW22(x,y):Step 5, according to the second phase shift interferogram corresponding to wavelength λ 1 and λ 2 , adopt corresponding phase shifting algorithm, obtain the phase information corresponding to wavelength λ 1 and λ 2 respectively, and carry out elimination constant to the phase information of two wavelengths Term, de-tilt term processing, obtain the wavefront aberration ΔW 12 (x, y) at any point on the front surface of the plane mirror to be measured corresponding to the wavelength λ 1 , and the wavefront at any point on the front surface of the plane mirror to be measured corresponding to λ 2 Aberration ΔW 22 (x, y):

ΔW12(x,y)=2(na-n10)A(x,y)+2n10B(x,y)+2Δ(x,y)+2S(x,y)ΔW 12 (x,y)=2(n a -n 10 )A(x,y)+2n 10 B(x,y)+2Δ(x,y)+2S(x,y)

ΔW22(x,y)=2(na-n20)A(x,y)+2n20B(x,y)+2Δ(x,y)+2S(x,y)ΔW 22 (x,y)=2(n a -n 20 )A(x,y)+2n 20 B(x,y)+2Δ(x,y)+2S(x,y)

式中,ΔW12(x,y)为第二步测量波长λ1对应的波前像差,ΔW22(x,y)为第二步测量波长λ2对应的波前像差,B(x,y)为待测平面镜后表面的面形偏差,n10和n20分别为待测平面镜在波长λ1和λ2下的平均折射率,Δ(x,y)为由于待测平面镜的光学非均匀性所引入的波前偏差。In the formula, ΔW 12 (x, y) is the wavefront aberration corresponding to the wavelength λ 1 measured in the second step, ΔW 22 (x, y) is the wavefront aberration corresponding to the wavelength λ 2 measured in the second step, B(x , y) is the surface deviation of the rear surface of the plane mirror to be tested, n 10 and n 20 are the average refractive index of the plane mirror to be tested at wavelengths λ 1 and λ 2 respectively, and Δ(x, y) is due to the optical Wavefront deviation introduced by non-uniformity.

其中,in,

Δ(x,y)=d0·Δn(x,y)Δ(x,y)=d 0 ·Δn(x,y)

式中,d0为待测平面镜的平均厚度,Δn(x,y)为所要测量的光学非均匀性。In the formula, d 0 is the average thickness of the plane mirror to be tested, and Δn(x, y) is the optical non-uniformity to be measured.

步骤6、得到待测平面镜的光学非均匀性分布Step 6. Obtain the optical non-uniformity distribution of the plane mirror to be tested

6-1)求解第一次与第二次测量波长λ1对应波前像差差值ΔW1(x,y)6-1) Solve the wavefront aberration difference ΔW 1 (x, y) corresponding to the wavelength λ 1 of the first and second measurement

ΔΔ WW 11 (( xx ,, ythe y )) == (( ΔΔ WW 1212 (( xx ,, ythe y )) -- ΔΔ WW 1111 (( xx ,, ythe y )) )) 22 == nno 1010 [[ BB (( xx ,, ythe y )) -- AA (( xx ,, ythe y )) ]] ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y )) == nno 1010 ΔdΔd (( xx ,, ythe y )) ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y ))

6-2)求解第一次与第二次测量波长λ2对应波前像差差值ΔW2(x,y)6-2) Solve the wavefront aberration difference ΔW 2 (x, y) corresponding to the first and second measurement wavelength λ 2

ΔΔ WW 22 (( xx ,, ythe y )) == (( ΔΔ WW 22twenty two (( xx ,, ythe y )) -- ΔΔ WW 21twenty one (( xx ,, ythe y )) )) 22 == nno 2020 [[ BB (( xx ,, ythe y )) -- AA (( xx ,, ythe y )) ]] ++ dd 00 ·· ΔnΔ n (( xx ,, ythe y )) == nno 2020 ΔdΔd (( xx ,, ythe y )) ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y ))

其中,in,

Δd(x,y)=B(x,y)-A(x,y)Δd(x,y)=B(x,y)-A(x,y)

待测平面镜的厚度d(x,y)可表示为:The thickness d(x, y) of the plane mirror to be tested can be expressed as:

d(x,y)=d0+Δd(x,y)d(x,y)=d 0 +Δd(x,y)

式中,d0为待测平面镜的平均厚度,Δd(x,y)为由待测平面镜面形变化引起的厚度变化量。In the formula, d0 is the average thickness of the plane mirror to be tested, and Δd( x , y) is the thickness variation caused by the shape change of the plane mirror to be tested.

待测平面镜对于波长λ1的折射率n1(x,y)和对于波长λ2的折射率n2(x,y)可以表示为:The refractive index n 1 (x, y) of the plane mirror to be measured for the wavelength λ 1 and the refractive index n 2 (x, y) for the wavelength λ 2 can be expressed as:

n1(x,y)=n10+Δn1(x,y)=n10+Δn(x,y)n 1 (x, y)=n 10 +Δn 1 (x,y)=n 10 +Δn(x,y)

n2(x,y)=n20+Δn2(x,y)=n20+Δn(x,y)n 2 (x,y)=n 20 +Δn 2 (x,y)=n 20 +Δn(x,y)

式中,Δn1(x,y)表示待测平面镜在波长λ1下的光学非均匀性、Δn2(x,y)待测平面镜在波长λ2下的光学非均匀性。In the formula, Δn 1 (x, y) represents the optical non-uniformity of the plane mirror under test at wavelength λ 1 , and Δn 2 (x, y) represents the optical non-uniformity of the plane mirror under test at wavelength λ 2 .

按照洛伦兹的色散模型得到洛伦兹-洛伦茨方程:According to Lorentz's dispersion model, the Lorentz-Lorentz equation is obtained:

nno 22 -- 11 nno 22 ++ 22 == 44 ππ 33 NαNα

式中,n是材料折射率;N是材料内部分子或原子数密度;α是平均极化率,它与入射光波的角频率有关。In the formula, n is the refractive index of the material; N is the molecular or atomic number density inside the material; α is the average polarizability, which is related to the angular frequency of the incident light wave.

由上式可以分析整理得材料折射率n及其非均匀性Δn与N之间的关系:From the above formula, the relationship between the material refractive index n and its non-uniformity Δn and N can be analyzed and sorted out:

nno 22 == 88 NαπNαπ ++ 33 33 -- 44 NαπNαπ

求导后可得:After derivation, we can get:

ΔnΔn == 3636 NαπNαπ ++ 33 22 nno (( 33 -- 44 NαπNαπ )) 22 ΔNΔN NN

进一步整理可得:Further sorting can be obtained:

ΔnΔn == (( nno 22 -- 11 )) (( nno 22 ++ 22 )) 66 nno ΔNΔN NN

所以:so:

ΔΔ nno 11 ΔΔ nno 22 == (( nno 11 22 -- 11 )) (( nno 11 22 ++ 22 )) (( nno 22 22 -- 11 )) (( nno 22 22 ++ 22 )) nno 22 nno 11

由此可得,在一定波长范围内的光学非均匀性之差远小于光学非均匀性本身,在一定波长范围内采用不同波长的光波测量光学材料或元件的光学非均匀性时可近似认为Δn=Δn1=Δn2It can be concluded that the difference of optical non-uniformity in a certain wavelength range is much smaller than the optical non-uniformity itself, and the optical non-uniformity of optical materials or components can be approximately considered as Δn in a certain wavelength range using light waves of different wavelengths. =Δn 1 =Δn 2 .

所以Δn(x,y)即为所要测量的待测平面镜的光学非均匀性。Therefore, Δn(x, y) is the optical non-uniformity of the plane mirror to be measured.

6-3)确定待测平面镜的光学非均匀性Δn(x,y):6-3) Determine the optical non-uniformity Δn(x, y) of the plane mirror to be tested:

ΔnΔn (( xx ,, ythe y )) == nno 2020 ·&Center Dot; ΔΔ WW 11 (( xx ,, ythe y )) -- nno 1010 ·&Center Dot; ΔΔ WW 22 (( xx ,, ythe y )) dd 00 (( nno 1010 -- nno 2020 )) ..

与现有技术相比,本发明的优点在于:(1)采用双波长移相干涉仪两步测量法检测待测平面镜的光学非均匀性,不需要引入标准反射镜,完全消除了标准反射镜的面形对测量结果的影响;(2)测量步骤简单,弥补了传统绝对测量方法步骤繁琐、易受空气扰动的缺点;同时也具有传统绝对测量的优点,从而降低了对被测待测平面镜和干涉仪系统面形的精度要求。Compared with the prior art, the present invention has the advantages of: (1) the optical non-uniformity of the plane mirror to be tested is detected by the two-step measurement method of the dual-wavelength phase-shifting interferometer, and the standard reflector is not required to be introduced, and the standard reflector is completely eliminated. (2) The measurement steps are simple, which makes up for the shortcomings of the traditional absolute measurement method, which is cumbersome and susceptible to air disturbance; at the same time, it also has the advantages of the traditional absolute measurement, thereby reducing the impact on the measured plane mirror. And the accuracy requirements of the surface shape of the interferometer system.

附图说明Description of drawings

图1是基于双波长斐索干涉仪的光学非均匀性测量装置示意图。Fig. 1 is a schematic diagram of an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer.

图2是基于双波长斐索干涉仪的光学非均匀性测量装置的测量方法流程图。Fig. 2 is a flow chart of a measurement method of an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer.

图3是本发明实施例中测得的待测平面镜前表面两个波长下对应的波前像差图,其中(a)为波长λ1下对应的待测平面镜前表面的波前像差图,(b)为波长λ2下对应的待测平面镜前表面的波前像差图。Fig. 3 is the corresponding wavefront aberration diagram under two wavelengths of the plane mirror front surface to be measured measured in the embodiment of the present invention, wherein (a) is the wavefront aberration diagram of the plane mirror front surface corresponding to be measured under the wavelength λ 1 , (b) is the wavefront aberration diagram of the front surface of the plane mirror to be measured corresponding to the wavelength λ 2 .

图4是本发明实施例中测得的待测平面镜后表面两个波长下对应的波前像差图,其中(a)为波长λ1下对应的待测平面镜后表面的波前像差图,(b)为波长λ2下对应的待测平面镜后表面的波前像差图。Fig. 4 is the corresponding wavefront aberration figure under two wavelengths of the plane mirror back surface to be measured measured in the embodiment of the present invention, wherein (a) is the wavefront aberration figure of the plane mirror back surface corresponding under the wavelength λ 1 , (b) is the wavefront aberration figure of the corresponding plane mirror back surface to be measured under wavelength λ 2 .

图5是本发明实施例中测得的待测平面镜的光学非均匀性分布。Fig. 5 is the optical non-uniformity distribution of the plane mirror to be tested measured in the embodiment of the present invention.

图6是本发明实施例中待测平面镜使用ZYGO干涉仪测得的光学非均匀性分布。Fig. 6 is the optical non-uniformity distribution measured by the ZYGO interferometer of the plane mirror to be tested in the embodiment of the present invention.

具体实施方式detailed description

下面结合附图对本发明作进一步详细描述。The present invention will be described in further detail below in conjunction with the accompanying drawings.

结合图1,一种基于双波长斐索干涉仪的光学非均匀性测量装置包括第一激光器1、第二激光器2、折转反射镜3、切换反射镜4、扩束镜5、分光棱镜6、折转反射镜7、准直物镜8、参考平面镜9、孔径光阑10、成像透镜组11、CCD探测器12、待测平面镜13;共光轴依次设置折转反射镜7、准直物镜8、参考平面镜9、待测平面镜13,且上述部件所处的光轴为第一光轴;共光轴依次设置分光棱镜6、孔径光阑10、成像透镜组11、CCD探测器12,且上述部件所处的光轴为第二光轴,第一光轴与第二光轴平行;共光轴依次设置折转反射镜3、切换反射镜4、扩束镜5、分光棱镜6、折转反射镜7,且上述部件所处的光轴为第三光轴,第三光轴与第一光轴垂直,切换反射镜4沿平行于第一光轴方向移动;所有光学元件相对于基底同轴等高,即相对于光学平台或仪器底座同轴等高。1, an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer includes a first laser 1, a second laser 2, a folding mirror 3, a switching mirror 4, a beam expander 5, and a beam splitting prism 6 , refracting mirror 7, collimating objective lens 8, reference plane mirror 9, aperture stop 10, imaging lens group 11, CCD detector 12, plane mirror 13 to be measured; common optical axis arranges refracting mirror 7, collimating objective lens in sequence 8. Reference plane mirror 9, plane mirror 13 to be measured, and the optical axis where the above-mentioned parts are located is the first optical axis; the common optical axis is provided with a dichroic prism 6, an aperture stop 10, an imaging lens group 11, and a CCD detector 12 in sequence, and The optical axis where the above-mentioned components are located is the second optical axis, and the first optical axis is parallel to the second optical axis; the common optical axis is sequentially provided with a folding mirror 3, a switching mirror 4, a beam expander mirror 5, a beam splitting prism 6, and a refracting mirror. Turn the mirror 7, and the optical axis where the above-mentioned components are located is the third optical axis, the third optical axis is perpendicular to the first optical axis, and the switching mirror 4 moves along a direction parallel to the first optical axis; all optical elements are relative to the base Coaxial contour, that is, the coaxial contour relative to the optical table or instrument base.

其中,折转反射镜7、准直物镜8、参考平面镜9、待测平面镜13沿光路方向依次设置,构成测试光路;折转反射镜7、准直物镜8、参考平面镜9沿光路方向依次设置,构成参考光路;第一激光器1的波长为λ1,第二激光器2的波长为λ2Wherein, deflection reflector 7, collimating objective lens 8, reference plane mirror 9, plane mirror 13 to be tested are arranged successively along the optical path direction, constitute the test optical path; , forming a reference optical path; the wavelength of the first laser 1 is λ 1 , and the wavelength of the second laser 2 is λ 2 .

将切换反射镜4移出第三光轴,第一激光器1出射的激光经过折转反射镜3,反射至扩束镜5,实现光束的扩束,经分光棱镜6透射后,再经过折转反射镜7反射至准直物镜8,成为准直宽光束,部分准直光束经参考平面镜9的后表面反射后成为参考光束,另一部分经参考平面镜9透射进入待测平面镜13,经待测平面镜13反射成为测试光束,并反射到参考平面镜9;参考光束和测试光束在参考平面镜9后表面合束,沿光路返回折转反射镜7,经折转反射镜7反射到分光棱镜6,经分光棱镜6反射聚焦在孔径光阑10处,再经过成像透镜组11,成像在CCD探测器12的靶面上,获得波长λ1对应的干涉图像。Move the switching mirror 4 out of the third optical axis, and the laser light emitted by the first laser 1 passes through the deflection mirror 3 and is reflected to the beam expander mirror 5 to realize beam expansion. The mirror 7 is reflected to the collimating objective lens 8 to become a collimated wide beam, part of the collimated beam becomes a reference beam after being reflected by the rear surface of the reference plane mirror 9, and the other part is transmitted through the reference plane mirror 9 into the plane mirror 13 to be measured, and passed through the plane mirror 13 to be measured The reflection becomes the test beam, and is reflected to the reference plane mirror 9; the reference beam and the test beam combine on the rear surface of the reference plane mirror 9, return to the folding mirror 7 along the optical path, reflect to the beam splitting prism 6 through the folding mirror 7, and pass through the beam splitting prism 6 is reflected and focused at the aperture stop 10, then passes through the imaging lens group 11, and is imaged on the target surface of the CCD detector 12 to obtain an interference image corresponding to the wavelength λ1.

将切换反射镜4移入第三光轴,第二激光器2出射的激光经过切换反射镜4,反射至扩束镜5,实现光束的扩束,经分光棱镜6透射后,再经过折转反射镜7反射至准直物镜8,成为准直宽光束,部分准直光束经参考平面镜9的后表面反射后成为参考光束,另一部分经参考平面镜9透射进入待测平面镜13,经待测平面镜13反射成为测试光束,并反射到参考平面镜9;参考光束和测试光束在参考平面镜9后表面合束,沿光路返回折转反射镜7,经折转反射镜7反射到分光棱镜6,经分光棱镜6反射聚焦在孔径光阑10处,再经过成像透镜组11,成像在CCD探测器12的靶面上,得到波长λ2对应的干涉图像。Move the switching mirror 4 into the third optical axis, and the laser light emitted by the second laser 2 passes through the switching mirror 4 and is reflected to the beam expander 5 to realize beam expansion. 7 is reflected to the collimating objective lens 8 to become a collimated wide beam, part of the collimated beam becomes a reference beam after being reflected by the rear surface of the reference plane mirror 9, and the other part is transmitted through the reference plane mirror 9 into the plane mirror 13 to be measured, and reflected by the plane mirror 13 to be measured Become the test beam, and reflect to the reference flat mirror 9; The reflection is focused at the aperture stop 10, then passes through the imaging lens group 11, and is imaged on the target surface of the CCD detector 12 to obtain an interference image corresponding to the wavelength λ2.

基于双波长斐索干涉仪的光学非均匀性测量装置,参考平面镜9与PZT连接,实现移相测量。The optical non-uniformity measurement device based on the dual-wavelength Fizeau interferometer, the reference plane mirror 9 is connected with the PZT to realize the phase shift measurement.

基于双波长斐索干涉仪的光学非均匀性测量装置,第一激光器1的中心波长为λ1,第二激光器2的中心波长为λ2,且λ1≠λ2In the optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer, the center wavelength of the first laser 1 is λ 1 , the center wavelength of the second laser 2 is λ 2 , and λ 1 ≠ λ 2 .

一种基于双波长斐索干涉仪的光学非均匀性测量装置的测量方法,步骤如下:A method for measuring an optical non-uniformity measuring device based on a dual-wavelength Fizeau interferometer, the steps are as follows:

步骤1、搭建基于双波长斐索干涉仪的光学非均匀性测量装置:Step 1. Build an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer:

基于双波长斐索干涉仪的光学非均匀性测量装置,包括第一激光器1、第二激光器2、折转反射镜3、切换反射镜4、扩束镜5、分光棱镜6、折转反射镜7、准直物镜8、参考平面镜9、孔径光阑10、成像透镜组11、CCD探测器12、待测平面镜13;共光轴依次设置折转反射镜7)、准直物镜8、参考平面镜9、待测平面镜13,且上述部件所处的光轴为第一光轴;共光轴依次设置分光棱镜6、孔径光阑10、成像透镜组11、CCD探测器12,且上述部件所处的光轴为第二光轴,第一光轴与第二光轴平行;共光轴依次设置折转反射镜3、切换反射镜4、扩束镜5、分光棱镜6、折转反射镜7,且上述部件所处的光轴为第三光轴,第三光轴与第一光轴垂直,切换反射镜4沿平行于第一光轴方向移动;所有光学元件相对于基底同轴等高,即相对于光学平台或仪器底座同轴等高;An optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer, including a first laser 1, a second laser 2, a folding mirror 3, a switching mirror 4, a beam expander 5, a beam splitting prism 6, and a folding mirror 7. Collimating objective lens 8, reference plane mirror 9, aperture stop 10, imaging lens group 11, CCD detector 12, plane mirror 13 to be measured; common optical axis is provided with folding reflector 7), collimating objective lens 8, reference plane mirror in sequence 9. The plane mirror 13 to be tested, and the optical axis where the above-mentioned components are located is the first optical axis; the common optical axis is sequentially arranged with a dichroic prism 6, an aperture stop 10, an imaging lens group 11, and a CCD detector 12, and the above-mentioned components are located The optical axis of the optical axis is the second optical axis, and the first optical axis is parallel to the second optical axis; the common optical axis is provided with a folding mirror 3, a switching mirror 4, a beam expander 5, a dichroic prism 6, and a folding mirror 7 in sequence , and the optical axis where the above-mentioned components are located is the third optical axis, the third optical axis is perpendicular to the first optical axis, and the switching mirror 4 moves in a direction parallel to the first optical axis; all optical elements are of the same height relative to the base , that is, the coaxial height relative to the optical table or the instrument base;

调整待测平面镜13位置,使待测平面镜13的前表面与第一光轴垂直,实现待测平面镜13前表面反射光波与参考平面镜9反射光波的干涉;Adjusting the position of the plane mirror 13 to be measured so that the front surface of the plane mirror 13 to be measured is perpendicular to the first optical axis, so as to realize the interference of the reflected light waves from the front surface of the plane mirror 13 to be measured and the reflected light waves from the reference plane mirror 9;

步骤2、分别获取波长λ1和λ2对应的第一次移相干涉图像:Step 2, obtain the first phase-shifting interference image corresponding to wavelength λ 1 and λ 2 respectively:

将切换反射镜4移出第三光轴,第一激光器1出射的激光经过折转反射镜3,反射至扩束镜5,实现光束的扩束,经分光棱镜6透射后,再经过折转反射镜7反射至准直物镜8,成为准直宽光束,部分准直光束经参考平面镜9的后表面反射后成为参考光束,另一部分经参考平面镜9透射进入待测平面镜13,经待测平面镜13前表面反射成为测试光束,并反射到参考平面镜9;参考光束和测试光束在参考平面镜9后表面合束,沿光路返回折转反射镜7,经折转反射镜7反射到分光棱镜6,经分光棱镜6反射聚焦在孔径光阑10处,再经过成像透镜组11,成像在CCD探测器12的靶面上,获得波长λ1对应的干涉图像,PZT驱动参考平面镜9进行移相,获得波长λ1下待测平面镜13前表面与参考平面镜9后表面干涉形成的移相干涉图;Move the switching mirror 4 out of the third optical axis, and the laser light emitted by the first laser 1 passes through the deflection mirror 3 and is reflected to the beam expander mirror 5 to realize beam expansion. The mirror 7 is reflected to the collimating objective lens 8 to become a collimated wide beam, part of the collimated beam becomes a reference beam after being reflected by the rear surface of the reference plane mirror 9, and the other part is transmitted through the reference plane mirror 9 into the plane mirror 13 to be measured, and passed through the plane mirror 13 to be measured The front surface is reflected to become the test beam, and is reflected to the reference plane mirror 9; the reference beam and the test beam combine at the rear surface of the reference plane mirror 9, return to the folding reflector 7 along the optical path, reflect to the dichroic prism 6 through the folding mirror 7, and pass through The dichroic prism 6 is reflectively focused at the aperture stop 10, passes through the imaging lens group 11, and is imaged on the target surface of the CCD detector 12 to obtain an interference image corresponding to the wavelength λ1, and the PZT drives the reference plane mirror 9 to shift phase to obtain the wavelength The phase-shifting interferogram formed by the interference of the front surface of the flat mirror 13 to be measured and the rear surface of the reference flat mirror 9 under λ 1 ;

将切换反射镜4移入第三光轴,第二激光器2出射的激光经过切换反射镜4,反射至扩束镜5,实现光束的扩束,经分光棱镜6透射后,再经过折转反射镜7反射至准直物镜8,成为准直宽光束,部分准直光束经参考平面镜9的后表面反射后成为参考光束,另一部分经参考平面镜9透射进入待测平面镜13,经待测平面镜13前表面反射成为测试光束,并反射到参考平面镜9;参考光束和测试光束在参考平面镜9后表面合束,沿光路返回折转反射镜7,经折转反射镜7反射到分光棱镜6,经分光棱镜6反射聚焦在孔径光阑10处,再经过成像透镜组11,成像在CCD探测器12的靶面上,得到波长λ2对应的干涉图像,PZT驱动参考平面镜9进行移相,获得波长λ2下待测平面镜13前表面与参考平面镜9后表面干涉形成的移相干涉图;Move the switching mirror 4 into the third optical axis, and the laser light emitted by the second laser 2 passes through the switching mirror 4 and is reflected to the beam expander 5 to realize beam expansion. 7 is reflected to the collimating objective lens 8 to become a collimated wide beam, part of the collimated beam becomes a reference beam after being reflected by the back surface of the reference plane mirror 9, and the other part is transmitted through the reference plane mirror 9 and enters the plane mirror 13 to be measured, and passes through the front of the plane mirror 13 to be measured The surface reflection becomes the test beam, and is reflected to the reference plane mirror 9; the reference beam and the test beam combine on the rear surface of the reference plane mirror 9, return to the folding mirror 7 along the optical path, reflect to the beam splitting prism 6 through the folding mirror 7, and pass through the beam splitting The prism 6 is reflected and focused at the aperture stop 10, then passes through the imaging lens group 11, and is imaged on the target surface of the CCD detector 12 to obtain the interference image corresponding to the wavelength λ2, and the PZT drives the reference plane mirror 9 to shift phase to obtain the wavelength λ 2. A phase-shifting interferogram formed by interference between the front surface of the plane mirror 13 to be measured and the rear surface of the reference plane mirror 9;

步骤3、根据波长λ1和λ2对应的第一次相移干涉图,采用相应的移相算法,得到波长λ1和λ2分别对应的相位信息,并对两波长下的相位信息进行消常数项、消倾斜项处理,得到波长λ1和λ2对应的待测平面镜13前表面任意一点处的波前像差Step 3, according to the first phase shift interferogram corresponding to the wavelength λ 1 and λ 2 , adopt the corresponding phase shift algorithm to obtain the phase information corresponding to the wavelength λ 1 and λ 2 respectively, and eliminate the phase information under the two wavelengths Constant term, de-tilt term processing, obtain the wavefront aberration at any point on the front surface of the plane mirror 13 to be measured corresponding to wavelength λ 1 and λ 2

ΔW11(x,y)=2naA(x,y)+2S(x,y)ΔW 11 (x, y)=2n a A(x, y)+2S(x, y)

ΔW21(x,y)=2naA(x,y)+2S(x,y)ΔW 21 (x, y)=2n a A(x, y)+2S(x, y)

式中ΔW11(x,y)为第一次测量波长λ1对应的波前像差,ΔW21(x,y)为第一次测量波长λ2对应的波前像差、A(x,y)为待测平面镜13前表面的面形偏差、S(x,y)为干涉测量系统的系统误差、na为空气折射率;In the formula, ΔW 11 (x, y) is the wavefront aberration corresponding to the first measurement wavelength λ 1 , ΔW 21 (x, y) is the wavefront aberration corresponding to the first measurement wavelength λ 2 , A(x, y) is the surface deviation of the front surface of the plane mirror 13 to be measured, S (x, y) is the systematic error of the interferometric system, n a is the air refractive index;

步骤4、分别获取波长λ1和λ2对应的第二次移相干涉图像:Step 4, obtain the phase-shifting interference image corresponding to wavelength λ 1 and λ 2 for the second time respectively:

调整待测平面镜13的角度,使待测平面镜13的后表面与第一光轴垂直,实现透过待测平面镜13并被待测平面镜13后表面反射的光波与参考平面镜9反射光波相干涉;Adjust the angle of the plane mirror 13 to be measured so that the back surface of the plane mirror 13 to be measured is perpendicular to the first optical axis, so that the light wave reflected by the plane mirror 13 to be measured and reflected by the plane mirror 13 back surface to be measured interferes with the light wave reflected by the plane mirror 9 to be measured;

将切换反射镜4移出第三光轴,第一激光器1出射的激光经过折转反射镜3,反射至扩束镜5,实现光束的扩束,经分光棱镜6透射后,再经过折转反射镜7反射至准直物镜8,成为准直宽光束,部分准直光束经参考平面镜9的后表面反射后成为参考光束,另一部分经参考平面镜9透射进入待测平面镜13,经待测平面镜13后表面反射成为测试光束,并反射到参考平面镜9;参考光束和测试光束在参考平面镜9后表面合束,沿光路返回折转反射镜7,经折转反射镜7反射到分光棱镜6,经分光棱镜6反射聚焦在孔径光阑10处,再经过成像透镜组11,成像在CCD探测器12的靶面上,获得波长λ1对应的干涉图像,PZT驱动参考平面镜9进行移相,获得波长λ1下待测平面镜13后表面与参考平面镜9后表面干涉形成的移相干涉图;Move the switching mirror 4 out of the third optical axis, and the laser light emitted by the first laser 1 passes through the deflection mirror 3 and is reflected to the beam expander mirror 5 to realize beam expansion. The mirror 7 is reflected to the collimating objective lens 8 to become a collimated wide beam, part of the collimated beam becomes a reference beam after being reflected by the rear surface of the reference plane mirror 9, and the other part is transmitted through the reference plane mirror 9 into the plane mirror 13 to be measured, and passed through the plane mirror 13 to be measured The back surface is reflected to become the test beam, and is reflected to the reference flat mirror 9; the reference beam and the test beam combine at the back surface of the reference flat mirror 9, return to the folding reflector 7 along the optical path, and are reflected to the dichroic prism 6 through the folding reflector 7, and pass through The dichroic prism 6 is reflectively focused at the aperture stop 10, passes through the imaging lens group 11, and is imaged on the target surface of the CCD detector 12 to obtain an interference image corresponding to the wavelength λ1, and the PZT drives the reference plane mirror 9 to shift phase to obtain the wavelength The phase-shifting interferogram formed by the interference of the back surface of the flat mirror 13 to be measured and the back surface of the reference flat mirror 9 at λ 1 ;

将切换反射镜4移入第三光轴,第二激光器2出射的激光经过切换反射镜4,反射至扩束镜5,实现光束的扩束,经分光棱镜6透射后,再经过折转反射镜7反射至准直物镜8,成为准直宽光束,部分准直光束经参考平面镜9的后表面反射后成为参考光束,另一部分经参考平面镜9透射进入待测平面镜13,经待测平面镜13后表面反射成为测试光束,并反射到参考平面镜9;参考光束和测试光束在参考平面镜9后表面合束,沿光路返回折转反射镜7,经折转反射镜7反射到分光棱镜6,经分光棱镜6反射聚焦在孔径光阑10处,再经过成像透镜组11,成像在CCD探测器12的靶面上,得到波长λ2对应的干涉图像,PZT驱动参考平面镜9进行移相,获得波长λ2下待测平面镜13后表面与参考平面镜9后表面干涉形成的移相干涉图;Move the switching mirror 4 into the third optical axis, and the laser light emitted by the second laser 2 passes through the switching mirror 4 and is reflected to the beam expander 5 to realize beam expansion. 7 is reflected to the collimating objective lens 8 to become a collimated wide beam, part of the collimated beam becomes a reference beam after being reflected by the rear surface of the reference plane mirror 9, and the other part is transmitted through the reference plane mirror 9 into the plane mirror 13 to be measured, and after passing through the plane mirror 13 to be measured The surface reflection becomes the test beam, and is reflected to the reference plane mirror 9; the reference beam and the test beam combine on the rear surface of the reference plane mirror 9, return to the folding mirror 7 along the optical path, reflect to the beam splitting prism 6 through the folding mirror 7, and pass through the beam splitting The prism 6 is reflected and focused at the aperture stop 10, then passes through the imaging lens group 11, and is imaged on the target surface of the CCD detector 12 to obtain the interference image corresponding to the wavelength λ2, and the PZT drives the reference plane mirror 9 to shift phase to obtain the wavelength λ 2. A phase-shifting interferogram formed by interference between the back surface of the plane mirror 13 to be measured and the back surface of the reference plane mirror 9;

步骤5、根据波长λ1和λ2对应的第二次相移干涉图,采用相应的移相算法,得到波长λ1和λ2分别对应的相位信息,并对两波长的相位信息进行消常数项、消倾斜项处理,得到波长λ1和λ2对应的待测平面镜13前表面任意一点处的波前像差:Step 5, according to the second phase shift interferogram corresponding to wavelength λ 1 and λ 2 , adopt corresponding phase shifting algorithm, obtain the phase information corresponding to wavelength λ 1 and λ 2 respectively, and carry out elimination constant to the phase information of two wavelengths Term, de-tilt term processing, obtain wavelength λ 1 and λ 2 corresponding to the wavefront aberration at any point on the front surface of the plane mirror 13 to be measured:

ΔW12(x,y)=2(na-n10)A(x,y)+2n10B(x,y)+2Δ(x,y)+2S(x,y)ΔW 12 (x,y)=2(n a -n 10 )A(x,y)+2n 10 B(x,y)+2Δ(x,y)+2S(x,y)

ΔW22(x,y)=2(na-n20)A(x,y)+2n20B(x,y)+2Δ(x,y)+2S(x,y)ΔW 22 (x,y)=2(n a -n 20 )A(x,y)+2n 20 B(x,y)+2Δ(x,y)+2S(x,y)

式中,ΔW12(x,y)为第二步测量波长λ1对应的波前像差,ΔW22(x,y)为第二步测量波长λ2对应的波前像差,B(x,y)为待测平面镜13后表面的面形偏差,n10和n20分别为待测平面镜13在波长λ1和λ2下的平均折射率,Δ(x,y)为由于待测平面镜13的光学非均匀性所引入的波前偏差。In the formula, ΔW 12 (x, y) is the wavefront aberration corresponding to the wavelength λ 1 measured in the second step, ΔW 22 (x, y) is the wavefront aberration corresponding to the wavelength λ 2 measured in the second step, B(x , y) is the surface deviation of the rear surface of the plane mirror 13 to be measured, n 10 and n 20 are respectively the average refractive index of the plane mirror 13 to be measured at wavelengths λ 1 and λ 2 , and Δ(x, y) is due to the plane mirror to be measured The wavefront deviation introduced by the optical inhomogeneity of 13.

其中,in,

Δ(x,y)=d0·Δn(x,y)Δ(x,y)=d 0 ·Δn(x,y)

式中,d0为待测平面镜13的平均厚度,Δn(x,y)为所要测量的光学非均匀性。In the formula, d 0 is the average thickness of the plane mirror 13 to be measured, and Δn(x, y) is the optical non-uniformity to be measured.

步骤6、得到待测平面镜13的光学非均匀性分布:Step 6, obtain the optical non-uniformity distribution of the plane mirror 13 to be tested:

6-1)求解第一次与第二次测量波长λ1对应波前像差差值ΔW1(x,y)6-1) Solve the wavefront aberration difference ΔW 1 (x, y) corresponding to the wavelength λ 1 of the first and second measurement

ΔΔ WW 11 (( xx ,, ythe y )) == (( ΔΔ WW 1212 (( xx ,, ythe y )) -- ΔΔ WW 1111 (( xx ,, ythe y )) )) 22 == nno 1010 [[ BB (( xx ,, ythe y )) -- AA (( xx ,, ythe y )) ]] ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y ))

== nno 1010 ΔdΔd (( xx ,, ythe y )) ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y ))

6-2)求解第一次与第二次测量波长λ2对应波前像差差值ΔW2(x,y)6-2) Solve the wavefront aberration difference ΔW 2 (x, y) corresponding to the first and second measurement wavelength λ 2

ΔΔ WW 22 (( xx ,, ythe y )) == (( ΔΔ WW 22twenty two (( xx ,, ythe y )) -- ΔΔ WW 21twenty one (( xx ,, ythe y )) )) 22 == nno 2020 [[ BB (( xx ,, ythe y )) -- AA (( xx ,, ythe y )) ]] ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y )) == nno 2020 ΔdΔd (( xx ,, ythe y )) ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y ))

其中,in,

Δd(x,y)=B(x,y)-A(x,y)Δd(x,y)=B(x,y)-A(x,y)

待测平面镜13的厚度d(x,y)可表示为:The thickness d(x, y) of the plane mirror 13 to be measured can be expressed as:

d(x,y)=d0+Δd(x,y)d(x,y)=d 0 +Δd(x,y)

式中,d0为待测平面镜13的平均厚度,Δd(x,y)为由待测平面镜13面形变化引起的厚度变化量。In the formula, d 0 is the average thickness of the plane mirror 13 to be tested, and Δd(x, y) is the thickness variation caused by the surface shape change of the plane mirror 13 to be tested.

待测平面镜13对于波长λ1的折射率n1(x,y)和对于波长λ2的折射率n2(x,y)分别表示为:The refractive index n 1 (x, y) of the plane mirror 13 to be measured for the wavelength λ 1 and the refractive index n 2 (x, y) for the wavelength λ 2 are respectively expressed as:

n1(x,y)=n10+Δn1(x,y)=n10+Δn(x,y)n 1 (x, y)=n 10 +Δn 1 (x,y)=n 10 +Δn(x,y)

n2(x,y)=n20+Δn2(x,y)=n20+Δn(x,y)n 2 (x,y)=n 20 +Δn 2 (x,y)=n 20 +Δn(x,y)

式中,Δn1(x,y)表示待测平面镜13在波长λ1下的光学非均匀性、Δn2(x,y)待测平面镜13在波长λ2下的光学非均匀性。In the formula, Δn 1 (x, y) represents the optical non-uniformity of the plane mirror 13 to be tested at the wavelength λ 1 , and Δn 2 (x, y) represents the optical non-uniformity of the plane mirror 13 to be tested at the wavelength λ 2 .

按照洛伦兹的色散模型得到洛伦兹-洛伦茨方程:According to Lorentz's dispersion model, the Lorentz-Lorentz equation is obtained:

nno 22 -- 11 nno 22 ++ 22 == 44 ππ 33 NαNα

式中,n是材料折射率;N是材料内部分子或原子数密度;α是平均极化率,它与入射光波的角频率有关;In the formula, n is the refractive index of the material; N is the molecular or atomic number density inside the material; α is the average polarizability, which is related to the angular frequency of the incident light wave;

由上式可以分析整理得材料折射率n及其非均匀性Δn与N之间的关系:From the above formula, the relationship between the material refractive index n and its non-uniformity Δn and N can be analyzed and sorted out:

nno 22 == 88 NαπNαπ ++ 33 33 -- 44 NαπNαπ

求导后可得:After derivation, we can get:

ΔnΔ n == 3636 NαπNαπ ++ 33 22 nno (( 33 -- 44 NαπNαπ )) 22 ΔNΔN NN

进一步整理可得:Further sorting can be obtained:

ΔnΔ n == (( nno 22 -- 11 )) (( nno 22 ++ 22 )) 66 nno ΔNΔN NN

所以:so:

ΔΔ nno 11 ΔΔ nno 22 == (( nno 11 22 -- 11 )) (( nno 11 22 ++ 22 )) (( nno 22 22 -- 11 )) (( nno 22 22 ++ 22 )) nno 22 nno 11

由此可得,在一定波长范围内的光学非均匀性之差远小于光学非均匀性本身,在一定波长范围内采用不同波长的光波测量光学材料或元件的光学非均匀性时可近似认为Δn=Δn1=Δn2;所以Δn(x,y)即为所要测量的待测平面镜13的光学非均匀性。It can be concluded that the difference of optical non-uniformity in a certain wavelength range is much smaller than the optical non-uniformity itself, and the optical non-uniformity of optical materials or components can be approximately considered as Δn in a certain wavelength range using light waves of different wavelengths. =Δn 1 =Δn 2 ; therefore Δn(x,y) is the optical non-uniformity of the plane mirror 13 to be measured.

6-3)确定待测平面镜13的光学非均匀性Δn(x,y):6-3) Determine the optical non-uniformity Δn(x, y) of the plane mirror 13 to be tested:

ΔnΔ n (( xx ,, ythe y )) == nno 2020 ·&Center Dot; ΔΔ WW 11 (( xx ,, ythe y )) -- nno 1010 ·&Center Dot; ΔΔ WW 22 (( xx ,, ythe y )) dd 00 (( nno 1010 -- nno 2020 )) ..

实施例一Embodiment one

一种基于双波长斐索干涉仪的光学非均匀性测量装置,采用第一激光器1的中心波长为λ1=632.8nm的稳频偏振氦氖激光器,输出功率1.5mw,输出光斑口径为φ1mm;第二激光器2的中心波长为λ2=532nm稳频偏振半导体激光器,功率1.5mw,输出光斑口径为φ1mm。待测平面镜13为石英晶体,石英晶体的口径为D=110mm,厚度d=21.70mm,楔角为11‘49’‘。该待测平面镜13在波长λ1=632.8nm下的折射率为n1=1.4570,在波长λ2=532nm下的折射率为n2=1.4607。光束经折转反射镜3的反射,经激光扩束镜5后光斑口径为φ8mm,再经折转反射镜7的反射,通过准直物镜8准直后形成一束平行光,经过参考平面镜9反射得到参考平面波前;参考光波分别由测试待测平面镜13的前后表面反射得到测试波前数据。参考光束与测试光束发生干涉后,经过折转反射镜7反射后再由半透半反镜6反射会聚于针孔10处,经由成像物镜11成像在CCD探测器12上,得到干涉图。An optical non-uniformity measuring device based on a dual-wavelength Fizeau interferometer, using a frequency-stabilized polarized helium-neon laser with a central wavelength of the first laser 1 of λ 1 =632.8nm, an output power of 1.5mw, and an output spot diameter of φ1mm; The second laser 2 has a central wavelength of λ 2 =532nm, a frequency-stabilized polarization semiconductor laser, a power of 1.5mw, and an output spot diameter of φ1mm. The plane mirror 13 to be tested is a quartz crystal, the diameter of the quartz crystal is D=110mm, the thickness d=21.70mm, and the wedge angle is 11'49''. The refractive index of the plane mirror 13 to be tested is n 1 =1.4570 at the wavelength λ 1 =632.8nm, and the refractive index at the wavelength λ 2 =532nm is n 2 =1.4607. The light beam is reflected by the deflection mirror 3, and the beam spot diameter is φ8mm after the laser beam expander 5, and then reflected by the deflection mirror 7, collimated by the collimating objective lens 8 to form a beam of parallel light, and passes through the reference plane mirror 9 The reference plane wavefront is obtained by reflection; the reference light wave is respectively reflected by the front and rear surfaces of the plane mirror 13 to be tested to obtain test wavefront data. After the reference beam interferes with the test beam, it is reflected by the folding mirror 7 and then reflected by the half-mirror 6 to converge at the pinhole 10, and is imaged on the CCD detector 12 through the imaging objective lens 11 to obtain an interference pattern.

共光轴依次设置折转反射镜7、准直物镜8、参考平面镜9、待测平面镜13,且上述部件所处的光轴为第一光轴;共光轴依次设置分光棱镜6、孔径光阑10、成像透镜组11、CCD探测器12,且上述部件所处的光轴为第二光轴,第一光轴与第二光轴平行;共光轴依次设置折转反射镜3、切换反射镜4、扩束镜5、分光棱镜6、折转反射镜7,且上述部件所处的光轴为第三光轴,第三光轴与第一光轴垂直,切换反射镜4沿平行于第一光轴方向移动;所有光学元件相对于基底同轴等高,即相对于光学平台或仪器底座同轴等高。The common optical axis is sequentially provided with a refracting mirror 7, a collimating objective lens 8, a reference plane mirror 9, and a plane mirror to be measured 13, and the optical axis where the above-mentioned components are located is the first optical axis; Diaphragm 10, imaging lens group 11, CCD detector 12, and the optical axis where the above-mentioned parts are located is the second optical axis, and the first optical axis is parallel to the second optical axis; Reflector 4, beam expander 5, dichroic prism 6, folding reflector 7, and the optical axis where the above-mentioned components are located is the third optical axis, the third optical axis is perpendicular to the first optical axis, and the switching reflector 4 is parallel to Move in the direction of the first optical axis; all optical components are coaxially and equally high relative to the base, that is, coaxially and equiheightly relative to the optical platform or the instrument base.

其中,折转反射镜7、准直物镜8、参考平面镜9、待测平面镜13沿光路方向依次设置,构成测试光路;折转反射镜7、准直物镜8、参考平面镜9沿光路方向依次设置,构成参考光路;第一激光器1的波长为λ1,第二激光器2的波长为λ2Wherein, deflection reflector 7, collimating objective lens 8, reference plane mirror 9, plane mirror 13 to be tested are arranged successively along the optical path direction, constitute the test optical path; , forming a reference optical path; the wavelength of the first laser 1 is λ 1 , and the wavelength of the second laser 2 is λ 2 .

结合图2,一种基于双波长斐索干涉仪的光学非均匀性测量装置的测量方法,步骤如下:In conjunction with Figure 2, a measurement method for an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer, the steps are as follows:

步骤1、搭建基于双波长斐索干涉仪的光学非均匀性测量装置。Step 1. Build an optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer.

步骤2、分别获取波长λ1和λ2对应的第一次移相干涉图像:Step 2, obtain the first phase-shifting interference image corresponding to wavelength λ 1 and λ 2 respectively:

放入待测平面镜13,调整待测平面镜13,使待测平面镜13的前表面与第一光轴垂直,实现待测平面镜13前表面反射光波与参考平面反射光波的干涉。将切换反射镜4移入第三光轴,通过控制PZT驱动参考平面位移实现八步移相测量,测得波长λ2=532nm对应的相移干涉图;将切换反射镜4移出第三光轴,通过控制PZT驱动参考平面位移实现八步移相测量,测得波长λ1=632.8nm对应的移相干涉图。Put the plane mirror 13 to be tested, adjust the plane mirror 13 to be tested so that the front surface of the plane mirror 13 to be tested is perpendicular to the first optical axis, and realize the interference of the reflected light waves from the front surface of the plane mirror 13 to be tested and the reflected light waves from the reference plane. Move the switching mirror 4 into the third optical axis, realize eight-step phase shift measurement by controlling the displacement of the PZT driving reference plane, and measure the phase shift interferogram corresponding to the wavelength λ 2 =532nm; move the switching mirror 4 out of the third optical axis, Eight-step phase-shift measurement is realized by controlling the displacement of the reference plane driven by the PZT, and the phase-shift interferogram corresponding to the wavelength λ 1 =632.8nm is measured.

步骤3、采取八步移相算法以及相位展开技术,并对相位信息进行消常数项、消倾斜项处理,从而得到波长λ1对应的波面信息ΔW11(x,y)和波长λ2对应的波面信息ΔW21(x,y)。该波面信息包含待测平面镜13前表面的面形信息以及系统误差。其中λ1所对应的波面信息ΔW11(x,y)、λ2所对应的波面信息ΔW21(x,y)如图3所示。Step 3, adopt eight-step phase-shifting algorithm and phase unwrapping technique, and carry out elimination constant term, elimination oblique term processing to phase information, thereby obtain the wave surface information ΔW 11 (x, y) corresponding to wavelength λ 1 and wavelength λ 2 corresponding Wavefront information ΔW 21 (x, y). The wavefront information includes surface shape information and systematic errors of the front surface of the plane mirror 13 to be measured. The wavefront information ΔW 11 (x, y) corresponding to λ 1 and the wavefront information ΔW 21 (x, y) corresponding to λ 2 are shown in FIG. 3 .

步骤4、分别获取波长λ1和λ2对应的第二次移相干涉图像:Step 4, obtain the phase-shifting interference image corresponding to wavelength λ 1 and λ 2 for the second time respectively:

调整待测平面镜13,使待测平面镜13的后表面与第一光轴垂直,实现待测平面镜13后表面反射光波与参考平面反射光波的干涉。将切换反射镜4移入第三光轴,通过控制PZT驱动参考平面位移实现八步移相测量,测得波长λ2=532nm对应的相移干涉图;将切换反射镜4移出第三光轴,通过控制PZT驱动参考平面位移实现八步移相测量,测得波长λ1=632.8nm对应的相移干涉图。The plane mirror 13 to be tested is adjusted so that the back surface of the plane mirror 13 to be tested is perpendicular to the first optical axis, so as to realize the interference of the reflected light waves from the back surface of the plane mirror 13 to be tested and the reflected light waves from the reference plane. Move the switching mirror 4 into the third optical axis, realize eight-step phase shift measurement by controlling the displacement of the PZT driving reference plane, and measure the phase shift interferogram corresponding to the wavelength λ 2 =532nm; move the switching mirror 4 out of the third optical axis, The eight-step phase-shift measurement is realized by controlling the displacement of the reference plane driven by the PZT, and the phase-shift interferogram corresponding to the wavelength λ 1 =632.8nm is measured.

步骤5、采取八步移相算法以及相位展开技术,并对相位信息进行消常数项、消倾斜项处理,从而得到波长λ1对应的波面信息ΔW12(x,y)和波长λ2对应的波面信息ΔW22(x,y)。该波面信息包含待测平面镜13后表面的面形信息,内部非均匀性分布以及系统误差。其中λ1所对应的波面信息ΔW12(x,y)、λ2所对应的波面信息ΔW22(x,y)如图4所示。Step 5, adopt eight-step phase-shifting algorithm and phase unwrapping technology, and carry out elimination constant term, elimination oblique term processing to phase information, thereby obtain the wavefront information ΔW 12 (x, y) corresponding to wavelength λ 1 and wavelength λ 2 corresponding Wavefront information ΔW 22 (x, y). The wavefront information includes the surface shape information of the rear surface of the plane mirror 13 to be measured, internal non-uniformity distribution and systematic error. The wavefront information ΔW 12 (x, y) corresponding to λ 1 and the wavefront information ΔW 22 (x, y) corresponding to λ 2 are shown in FIG. 4 .

步骤6:获得待测平面镜的光学非均匀性分布:Step 6: Obtain the optical non-uniformity distribution of the plane mirror to be tested:

6-1)由第一次测量与第二次测量波长λ1对应波前像差求差值可得:6-1) Calculate the difference between the wavefront aberration corresponding to the wavelength λ 1 of the first measurement and the second measurement:

ΔW1(x,y)=(ΔW12(x,y)-ΔW11(x,y))÷2ΔW 1 (x, y) = (ΔW 12 (x, y) - ΔW 11 (x, y)) ÷ 2

=n10[B(x,y)-A(x,y)]+d0·Δn(x,y)=n 10 [B(x,y)-A(x,y)]+d 0 ·Δn(x,y)

=n10Δd(x,y)+d0·Δn(x,y)=n 10 Δd(x,y)+d 0 ·Δn(x,y)

6-2)由第一次测量与第二次测量波长λ2对应波前像差求差值可得:6-2) Calculate the difference between the wavefront aberration corresponding to the wavelength λ2 of the first measurement and the second measurement:

ΔΔ WW 22 (( xx ,, ythe y )) == (( ΔΔ WW 22twenty two (( xx ,, ythe y )) -- ΔΔ WW 21twenty one (( xx ,, ythe y )) )) 22 == nno 2020 [[ BB (( xx ,, ythe y )) -- AA (( xx ,, ythe y )) ]] ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y )) == nno 2020 ΔdΔd (( xx ,, ythe y )) ++ dd 00 ·&Center Dot; ΔnΔn (( xx ,, ythe y ))

其中,in,

Δd(x,y)=B(x,y)-A(x,y)Δd(x,y)=B(x,y)-A(x,y)

则待测平面镜13的厚度d(x,y)可表示为:Then the thickness d(x, y) of the plane mirror 13 to be measured can be expressed as:

d(x,y)=d0+Δd(x,y)d(x,y)=d 0 +Δd(x,y)

式中,d0为待测平面镜13的平均厚度,Δd(x,y)为由待测平面镜13面形变化引起的厚度变化。In the formula, d 0 is the average thickness of the plane mirror 13 to be tested, and Δd(x, y) is the thickness change caused by the change of the surface shape of the plane mirror 13 to be tested.

按照洛伦兹的色散模型得到洛伦兹-洛伦茨方程:According to Lorentz's dispersion model, the Lorentz-Lorentz equation is obtained:

nno 22 -- 11 nno 22 ++ 22 == 44 ππ 33 NαNα

式中,n是材料折射率;N是材料内部分子或原子数密度;α是平均极化率,它与入射光波的角频率有关;In the formula, n is the refractive index of the material; N is the molecular or atomic number density inside the material; α is the average polarizability, which is related to the angular frequency of the incident light wave;

由上式可以分析整理得材料折射率n及其非均匀性Δn与N之间的关系:From the above formula, the relationship between the material refractive index n and its non-uniformity Δn and N can be analyzed and sorted out:

nno 22 == 88 NαπNαπ ++ 33 33 -- 44 NαπNαπ

求导后可得:After derivation, we can get:

ΔnΔ n == 3636 NαπNαπ ++ 33 22 nno (( 33 -- 44 NαπNαπ )) 22 ΔNΔN NN

进一步整理可得:Further sorting can be obtained:

ΔnΔ n == (( nno 22 -- 11 )) (( nno 22 ++ 22 )) 66 nno ΔNΔN NN

所以:so:

ΔΔ nno 11 ΔΔ nno 22 == (( nno 11 22 -- 11 )) (( nno 11 22 ++ 22 )) (( nno 22 22 -- 11 )) (( nno 22 22 ++ 22 )) nno 22 nno 11

由此可得,在一定波长范围内的光学非均匀性之差远小于光学非均匀性本身,在一定波长范围内采用不同波长的光波测量光学材料或元件的光学非均匀性时可近似认为Δn=Δn1=Δn2;所以Δn(x,y)即为所要测量的待测平面镜13的光学非均匀性。It can be concluded that the difference of optical non-uniformity in a certain wavelength range is much smaller than the optical non-uniformity itself, and the optical non-uniformity of optical materials or components can be approximately considered as Δn in a certain wavelength range using light waves of different wavelengths. =Δn 1 =Δn 2 ; therefore Δn(x,y) is the optical non-uniformity of the plane mirror 13 to be measured.

6-3)由第一次测量与第二次测量波长λ1、λ2对应波前像差差值可计算求得待测平面镜13的光学非均匀性Δn(x,y)为:6-3) The optical non-uniformity Δn(x, y) of the plane mirror 13 to be measured can be calculated and obtained from the first measurement and the second measurement wavelength λ 1 , λ 2 corresponding to the wavefront aberration difference:

ΔnΔ n (( xx ,, ythe y )) == nno 2020 ·&Center Dot; ΔΔ WW 11 (( xx ,, ythe y )) -- nno 1010 ·· ΔΔ WW 22 (( xx ,, ythe y )) dd 00 (( nno 1010 -- nno 2020 ))

恢复的待测平面镜13的光学非均匀性分布如图5。The optical non-uniformity distribution of the recovered flat mirror 13 to be tested is shown in FIG. 5 .

该方法测得的该石英晶体的光学非均匀性的结果与ZYGO干涉仪恢复的该石英晶体的光学非均匀性结果(如图6)对比,光学非均匀性分布基本一致,验证了算法的正确性与可行性。The results of the optical non-uniformity of the quartz crystal measured by this method are compared with the results of the optical non-uniformity of the quartz crystal recovered by the ZYGO interferometer (as shown in Figure 6), and the distribution of optical non-uniformity is basically the same, which verifies the correctness of the algorithm performance and feasibility.

本发明采用双波长移相干涉仪两步测量法检测待测平面镜的光学非均匀性,不需要引入标准反射镜,完全消除了标准反射镜的面形对测量结果的影响;测量步骤简单,弥补了传统绝对测量方法步骤繁琐、易受空气扰动的缺点;同时也具有传统绝对测量的优点,从而降低了对被测待测平面镜和干涉仪系统面形的精度要求。The invention adopts a two-step measurement method of a dual-wavelength phase-shifting interferometer to detect the optical non-uniformity of the plane mirror to be measured, without introducing a standard reflector, and completely eliminates the influence of the surface shape of the standard reflector on the measurement result; It overcomes the shortcomings of the traditional absolute measurement method, which are cumbersome and susceptible to air disturbance; at the same time, it also has the advantages of traditional absolute measurement, thereby reducing the accuracy requirements for the surface shape of the measured plane mirror and interferometer system.

Claims (4)

1. An optical non-uniformity measuring device based on a dual-wavelength Fizeau interferometer is characterized by comprising a first laser (1), a second laser (2), a turning reflector (3), a switching reflector (4), a beam expander (5), a beam splitter prism (6), a turning reflector (7), a collimating objective lens (8), a reference plane mirror (9), an aperture diaphragm (10), an imaging lens group (11), a CCD detector (12) and a plane mirror (13) to be measured; a deflection reflector (7), a collimating objective (8), a reference plane mirror (9) and a plane mirror (13) to be measured are sequentially arranged on a common optical axis, and the optical axis of the components is a first optical axis; a beam splitter prism (6), an aperture diaphragm (10), an imaging lens group (11) and a CCD detector (12) are sequentially arranged on a common optical axis, the optical axis of the components is a second optical axis, and the first optical axis is parallel to the second optical axis; the common optical axis is sequentially provided with a turning reflector (3), a switching reflector (4), a beam expander (5), a beam splitter prism (6) and a turning reflector (7), the optical axis of the components is a third optical axis, the third optical axis is vertical to the first optical axis, and the switching reflector (4) moves along the direction parallel to the first optical axis; all optical elements are coaxial and equal in height relative to the substrate, namely relative to the optical platform or the instrument base;
wherein, the turning reflector (7), the collimating objective (8), the reference plane mirror (9) and the plane mirror (13) to be tested are arranged in sequence along the direction of the light path to form a testing light path; the turning reflector (7), the collimating objective (8) and the reference plane mirror (9) are sequentially arranged along the direction of the light path to form a reference light path;
moving the switching reflector (4) out of a third optical axis, reflecting laser emitted by the first laser (1) to a beam expander (5) through a turning reflector (3) to expand beams, transmitting the laser through a beam splitter prism (6), reflecting the laser to a collimating objective lens (8) through a turning reflector (7) to form a collimated wide beam, reflecting part of the collimated beam to the rear surface of a reference plane mirror (9) to form a reference beam, transmitting the other part of the collimated beam to a plane mirror (13) to be tested through the reference plane mirror (9), reflecting the other part of the collimated beam to the reference plane mirror (9) to form a test beam, and reflecting the test beam to the reference plane mirror (9); the reference beam and the test beam are combined on the rear surface of a reference plane mirror (9), return to a turning reflector (7) along a light path, are reflected to a beam splitter prism (6) through the turning reflector (7), are reflected and focused at an aperture diaphragm (10) through the beam splitter prism (6), pass through an imaging lens group (11), and are imaged on a target surface of a CCD detector (12) to obtain a wavelength lambda1A corresponding interference image;
the switching reflector (4) is shifted into a third optical axis, laser emitted by the second laser (2) is reflected to the beam expander (5) through the switching reflector (4) to realize beam expansion of the light beam, the light beam is transmitted by the beam splitter prism (6) and then reflected to the collimating objective lens (8) through the turning reflector (7) to form a collimated wide light beam, a part of the collimated light beam is reflected by the rear surface of the reference plane mirror (9) to form a reference light beam, and the other part of the collimated light beam is transmitted into the collimating objective lens (8) through the reference plane mirror (9)Entering a plane mirror (13) to be tested, reflecting the plane mirror (13) to be tested into a test beam and reflecting the test beam to a reference plane mirror (9); the reference beam and the test beam are combined on the rear surface of a reference plane mirror (9), return to a turning reflector (7) along a light path, are reflected to a beam splitter prism (6) through the turning reflector (7), are reflected and focused at an aperture diaphragm (10) through the beam splitter prism (6), pass through an imaging lens group (11), and are imaged on a target surface of a CCD detector (12) to obtain a wavelength lambda2The corresponding interference image.
2. The dual wavelength fizeau interferometer based optical non-uniformity measurement device of claim 1, wherein: the reference plane mirror (9) is connected with PZT to realize phase shift measurement.
3. The dual wavelength fizeau interferometer based optical non-uniformity measurement device of claim 1 wherein: the first laser (1) has a central wavelength of λ1The central wavelength of the second laser (2) is lambda2And λ1≠λ2
4. The method of claim 1 for measuring a dual wavelength fizeau interferometer based optical non-uniformity measurement, comprising the steps of:
step 1, building an optical non-uniformity measuring device based on a dual-wavelength Fizeau interferometer:
the optical non-uniformity measuring device based on the dual-wavelength Fizeau interferometer comprises a first laser (1), a second laser (2), a turning reflector (3), a switching reflector (4), a beam expander (5), a beam splitter prism (6), a turning reflector (7), a collimating objective (8), a reference plane mirror (9), an aperture diaphragm (10), an imaging lens group (11), a CCD detector (12) and a plane mirror (13) to be measured; a deflection reflector (7), a collimating objective (8), a reference plane mirror (9) and a plane mirror (13) to be measured are sequentially arranged on a common optical axis, and the optical axis of the components is a first optical axis; a beam splitter prism (6), an aperture diaphragm (10), an imaging lens group (11) and a CCD detector (12) are sequentially arranged on a common optical axis, the optical axis of the components is a second optical axis, and the first optical axis is parallel to the second optical axis; the common optical axis is sequentially provided with a turning reflector (3), a switching reflector (4), a beam expander (5), a beam splitter prism (6) and a turning reflector (7), the optical axis of the components is a third optical axis, the third optical axis is vertical to the first optical axis, and the switching reflector (4) moves along the direction parallel to the first optical axis; all optical elements are coaxial and equal in height relative to the substrate, namely relative to the optical platform or the instrument base;
adjusting the position of the plane mirror (13) to be measured to ensure that the front surface of the plane mirror (13) to be measured is vertical to the first optical axis, so as to realize the interference of the reflected light wave of the front surface of the plane mirror (13) to be measured and the reflected light wave of the reference plane mirror (9);
step 2, respectively obtaining the wavelength lambda1And λ2Corresponding first dephasing interference image:
moving the switching reflector (4) out of a third optical axis, reflecting laser emitted by the first laser (1) to a beam expander (5) through a turning reflector (3) to expand beams, transmitting the laser through a beam splitter prism (6), reflecting the laser to a collimating objective lens (8) through a turning reflector (7) to form a collimated wide beam, reflecting part of the collimated beam to the rear surface of a reference plane mirror (9) to form a reference beam, transmitting the other part of the collimated beam to a plane mirror (13) to be tested through the reference plane mirror (9), reflecting the other part of the collimated beam to the front surface of the plane mirror (13) to be tested to form a test beam, and reflecting the test beam to the reference plane mirror (9); the reference beam and the test beam are combined on the rear surface of a reference plane mirror (9), return to a turning reflector (7) along a light path, are reflected to a beam splitter prism (6) through the turning reflector (7), are reflected and focused at an aperture diaphragm (10) through the beam splitter prism (6), pass through an imaging lens group (11), and are imaged on a target surface of a CCD detector (12) to obtain a wavelength lambda1Corresponding interference image, PZT drives the reference plane mirror (9) to shift the phase to obtain the wavelength lambda1The front surface of the lower plane mirror (13) to be measured interferes with the back surface of the reference plane mirror (9) to form a phase-shifting interference pattern;
the switching reflector (4) is shifted into a third optical axis, laser emitted by the second laser (2) is reflected to the beam expander (5) through the switching reflector (4) to realize beam expansion of the light beam, and the light beam is transmitted by the beam splitter prism (6) and then reflected to the collimating objective lens (8) through the turning reflector (7)The collimated wide beam is formed, part of the collimated beam is reflected by the rear surface of the reference plane mirror (9) to form a reference beam, the other part of the collimated beam is transmitted into the plane mirror (13) to be tested through the reference plane mirror (9), and is reflected by the front surface of the plane mirror (13) to be tested to form a test beam and is reflected to the reference plane mirror (9); the reference beam and the test beam are combined on the rear surface of a reference plane mirror (9), return to a turning reflector (7) along a light path, are reflected to a beam splitter prism (6) through the turning reflector (7), are reflected and focused at an aperture diaphragm (10) through the beam splitter prism (6), pass through an imaging lens group (11), and are imaged on a target surface of a CCD detector (12) to obtain a wavelength lambda2Corresponding interference image, PZT drives the reference plane mirror (9) to shift the phase to obtain the wavelength lambda2The front surface of the lower plane mirror (13) to be measured interferes with the back surface of the reference plane mirror (9) to form a phase-shifting interference pattern;
step 3, according to the wavelength lambda1And λ2The corresponding first phase shift interferogram adopts the corresponding phase shift algorithm to obtain the wavelength lambda1And λ2Respectively corresponding phase information, and respectively performing constant term elimination and tilt term elimination on the phase information under two wavelengths to obtain wavelength lambda1And λ2Wave front aberration at any point of the front surface of the corresponding plane mirror (13) to be measured
ΔW11(x,y)=2naA(x,y)+2S(x,y)
ΔW21(x,y)=2naA(x,y)+2S(x,y)
In the formula,. DELTA.W11(x, y) is the first measurement wavelength λ1Corresponding wave front aberration, AW21(x, y) is the first measurement wavelength λ2Corresponding wavefront aberration, A (x, y) is the surface shape deviation of the front surface of the plane mirror (13) to be measured, S (x, y) is the system error of the interference measurement system, naThe refractive index of air is shown, and (x, y) are coordinates of any point on the front surface of the plane mirror (13) to be measured;
step 4, respectively obtaining the wavelength lambda1And λ2Corresponding second phase-shifting interference image:
adjusting the angle of the plane mirror (13) to be measured to ensure that the rear surface of the plane mirror (13) to be measured is perpendicular to the first optical axis, so that the light wave which penetrates through the plane mirror (13) to be measured and is reflected by the rear surface of the plane mirror (13) to be measured is interfered with the light wave reflected by the reference plane mirror (9);
moving the switching reflector (4) out of a third optical axis, reflecting laser emitted by the first laser (1) to a beam expander (5) through a turning reflector (3) to expand beams, transmitting the laser through a beam splitter prism (6), reflecting the laser to a collimating objective lens (8) through a turning reflector (7) to form a collimated wide beam, reflecting part of the collimated beam to the rear surface of a reference plane mirror (9) to form a reference beam, transmitting the other part of the collimated beam to a plane mirror (13) to be tested through the reference plane mirror (9), reflecting the other part of the collimated beam to the rear surface of the plane mirror (13) to be tested to form a test beam, and reflecting the test beam to the reference plane mirror (9); the reference beam and the test beam are combined on the rear surface of a reference plane mirror (9), return to a turning reflector (7) along a light path, are reflected to a beam splitter prism (6) through the turning reflector (7), are reflected and focused at an aperture diaphragm (10) through the beam splitter prism (6), pass through an imaging lens group (11), and are imaged on a target surface of a CCD detector (12) to obtain a wavelength lambda1Corresponding interference image, PZT drives the reference plane mirror (9) to shift the phase to obtain the wavelength lambda1The back surface of the lower plane mirror (13) to be measured interferes with the back surface of the reference plane mirror (9) to form a phase-shifting interference pattern;
the switching reflector (4) is moved into a third optical axis, laser emitted by the second laser (2) is reflected to a beam expanding mirror (5) through the switching reflector (4) to realize beam expanding of the light beam, the laser is transmitted by a light splitting prism (6) and then reflected to a collimating objective lens (8) through a turning reflector (7) to form a collimated wide light beam, a part of the collimated light beam is reflected by the rear surface of a reference plane mirror (9) to form a reference light beam, the other part of the collimated light beam is transmitted by the reference plane mirror (9) to enter a plane mirror (13) to be tested, is reflected by the rear surface of the plane mirror (13) to be tested to form a test light beam, and is reflected to the reference plane mirror (; the reference beam and the test beam are combined on the rear surface of a reference plane mirror (9), return to a turning reflector (7) along a light path, are reflected to a beam splitter prism (6) through the turning reflector (7), are reflected and focused at an aperture diaphragm (10) through the beam splitter prism (6), pass through an imaging lens group (11), and are imaged on a target surface of a CCD detector (12) to obtain a wavelength lambda2Corresponding interference image, PZT drives the reference plane mirror (9) to shift the phase to obtain the wavelength lambda2The back surface of the lower plane mirror (13) to be measured and the referenceA phase-shifting interference pattern formed by the interference of the rear surface of the plane mirror (9);
step 5, according to the wavelength lambda1And λ2The corresponding second phase shift interferogram adopts the corresponding phase shift algorithm to obtain the wavelength lambda1And λ2Respectively corresponding phase information, and performing constant term eliminating and tilt term eliminating treatment on the phase information of the two wavelengths to obtain wavelength lambda1And λ2Wave front aberration at any point of the front surface of the corresponding plane mirror (13) to be measured:
ΔW12(x,y)=2(na-n10)A(x,y)+2n10B(x,y)+2Δ(x,y)+2S(x,y)
ΔW22(x,y)=2(na-n20)A(x,y)+2n20B(x,y)+2Δ(x,y)+2S(x,y)
in the formula,. DELTA.W12(x, y) is the second measurement wavelength λ1Corresponding wave front aberration, AW22(x, y) is the second measurement wavelength λ2Corresponding wave front aberration, B (x, y) is the surface shape deviation of the back surface of the plane mirror (13) to be measured, n10For the plane mirror (13) to be measured at the wavelength lambda1Average refractive index of20For the plane mirror (13) to be measured at the wavelength lambda2The lower average refractive index, delta (x, y), is the wavefront deviation introduced by the optical non-uniformity of the plane mirror (13) to be measured;
wherein,
Δ(x,y)=d0·Δn(x,y)
in the formula (d)0The average thickness of the plane mirror (13) to be measured, and the delta n (x, y) is the optical nonuniformity to be measured;
step 6, obtaining the optical non-uniformity distribution of the plane mirror (13) to be measured:
6-1) determining the first and second measurement wavelengths lambda1Corresponding wave front aberration difference value DeltaW1(x,y)
ΔW 1 ( x , y ) = ( ΔW 12 ( x , y ) - ΔW 11 ( x , y ) ) 2 = n 10 [ B ( x , y ) - A ( x , y ) ] + d 0 · Δn ( x , y ) = n 10 Δd ( x , y ) + d 0 · Δn ( x , y )
6-2) determining the first and second measurement wavelengths lambda2Corresponding wave front aberration difference value DeltaW2(x,y)
ΔW 2 ( x , y ) = ΔW 22 ( x , y ) - ΔW 21 ( x , y ) 2 = n 20 [ B ( x , y ) - A ( x , y ) ] + d 0 · Δn ( x , y ) = n 20 Δd ( x , y ) + d 0 · Δn ( x , y )
Wherein,
Δd(x,y)=B(x,y)-A(x,y)
delta d (x, y) is the thickness variation caused by the deformation of the plane mirror surface (13) to be measured;
6-3) determining the optical nonuniformity delta n (x, y) of the plane mirror (13) to be measured:
Δn ( x , y ) = n 20 · ΔW 1 ( x , y ) - n 10 · ΔW 2 ( x , y ) d 0 ( n 10 - n 20 ) .
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