CN107144898A - Optics regulation and control electromagnetic shielding glass and preparation method thereof - Google Patents
Optics regulation and control electromagnetic shielding glass and preparation method thereof Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 148
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 78
- 239000002184 metal Substances 0.000 claims abstract description 78
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 67
- 239000002131 composite material Substances 0.000 claims abstract description 60
- 230000007704 transition Effects 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 39
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 30
- 239000011651 chromium Substances 0.000 claims abstract description 30
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 28
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052709 silver Inorganic materials 0.000 claims abstract description 25
- 239000004332 silver Substances 0.000 claims abstract description 25
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 23
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052737 gold Inorganic materials 0.000 claims abstract description 23
- 239000010931 gold Substances 0.000 claims abstract description 23
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 22
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052802 copper Inorganic materials 0.000 claims abstract description 22
- 239000010949 copper Substances 0.000 claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 238000000576 coating method Methods 0.000 claims abstract description 20
- 229910052742 iron Inorganic materials 0.000 claims abstract description 14
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 14
- 230000001105 regulatory effect Effects 0.000 claims description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 206010052128 Glare Diseases 0.000 claims description 15
- 238000005488 sandblasting Methods 0.000 claims description 15
- 238000009826 distribution Methods 0.000 claims description 11
- 230000001788 irregular Effects 0.000 claims description 11
- 238000001771 vacuum deposition Methods 0.000 claims description 9
- 239000004576 sand Substances 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 7
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 7
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052593 corundum Inorganic materials 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- 239000010431 corundum Substances 0.000 claims description 4
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- 230000001276 controlling effect Effects 0.000 claims 2
- 238000000227 grinding Methods 0.000 claims 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 1
- 238000002310 reflectometry Methods 0.000 claims 1
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 29
- 238000002834 transmittance Methods 0.000 abstract description 17
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000002905 metal composite material Substances 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000003292 glue Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- RIKSBPAXKLQKOR-UHFFFAOYSA-M [O-2].O[Ta+4].[O-2] Chemical compound [O-2].O[Ta+4].[O-2] RIKSBPAXKLQKOR-UHFFFAOYSA-M 0.000 description 2
- 238000007688 edging Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005422 blasting Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0094—Shielding materials being light-transmitting, e.g. transparent, translucent
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
本发明是关于一种光学调控电磁屏蔽玻璃及其制备方法，该方法为:在结构支撑玻璃的表面涂覆光刻胶涂层；根据泰森多边形法计算无规则网格图形，将无规则网格的图形输入激光器中，在光刻胶涂层上进行激光直写刻蚀，除去结构支撑玻璃上多余的光刻胶，得到光刻胶掩膜；在光刻胶掩膜上镀制复合金属膜层；复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在光刻胶掩膜上；过渡膜层的材料为氧化铝、铝和铬中的至少一种；屏蔽金属膜层的材料为金、银、铜、镍或铁；去除玻璃上的光刻胶。本发明的电磁屏蔽玻璃无莫尔干涉条纹现象，结构简单，耐候性强，同时具有高光学透过率和高屏蔽效能，其透光率大于80％，电磁屏蔽效能为大于等于20dB。
The present invention relates to an optical control electromagnetic shielding glass and a preparation method thereof. The method comprises the following steps: coating a photoresist coating on the surface of the structurally supported glass; The grid pattern is input into the laser, and the photoresist coating is etched by laser direct writing, and the excess photoresist on the structural support glass is removed to obtain a photoresist mask; the composite metal is plated on the photoresist mask film layer; the composite metal film layer comprises a transition film layer and a shielding metal film layer, and the transition film layer is attached on the photoresist mask; the material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the shielding metal film The material of the layer is gold, silver, copper, nickel or iron; the photoresist on the glass is removed. The electromagnetic shielding glass of the present invention has no moiré interference fringe phenomenon, simple structure, strong weather resistance, high optical transmittance and high shielding efficiency, the light transmittance is greater than 80%, and the electromagnetic shielding efficiency is greater than or equal to 20dB.
Description
技术领域technical field
本发明涉及一种电磁屏蔽玻璃，特别是涉及一种光学调控电磁屏蔽玻璃及其制备方法。The invention relates to an electromagnetic shielding glass, in particular to an optically regulated electromagnetic shielding glass and a preparation method thereof.
背景技术Background technique
电磁屏蔽玻璃是一类具有衰减电磁辐射功率功能的透光观察视窗器件，应用于特种显示领域时，能够起到防止电磁信息泄露、抵抗外来电磁干扰的作用。传统电磁屏蔽玻璃通常是在高温高压条件下利用有机胶片材料将“防眩/减反玻璃”、“电磁屏蔽材料”和“结构支撑玻璃”粘接在一起制成的，其工艺过程较为复杂，成品率相对较低。常用的电磁屏蔽材料主要包括ITO导电膜、刻蚀丝网及金属网栅。其中，ITO导电膜具有较高的透光率，但其电导率相对较低，屏蔽效能差，仅能满足屏效要求较低的应用要求；刻蚀丝网和金属网栅具有相对较高的屏蔽效能，但其透光率会随屏蔽效能的增强而迅速衰减，且存在由于光学干涉而产生的莫尔条纹现象，极大的限制了其应用途径。Electromagnetic shielding glass is a kind of light-transmitting observation window device with the function of attenuating electromagnetic radiation power. When used in the field of special display, it can prevent the leakage of electromagnetic information and resist external electromagnetic interference. Traditional electromagnetic shielding glass is usually made by bonding "anti-glare/anti-reflection glass", "electromagnetic shielding material" and "structural support glass" together with organic film materials under high temperature and high pressure conditions. The process is relatively complicated. Yield is relatively low. Commonly used electromagnetic shielding materials mainly include ITO conductive film, etched screen and metal grid. Among them, the ITO conductive film has high light transmittance, but its electrical conductivity is relatively low, and the shielding efficiency is poor, which can only meet the application requirements of low screen efficiency; etched screen and metal grid have relatively high Shielding efficiency, but its light transmittance will rapidly decay with the increase of shielding efficiency, and there is a phenomenon of Moire fringes due to optical interference, which greatly limits its application.
发明内容Contents of the invention
本发明的主要目的在于，提供一种新型光学调控电磁屏蔽玻璃及其制备方法，所要解决的技术问题是使其同时具有高光学透过率和高屏蔽效能，从而更加适于实用。The main purpose of the present invention is to provide a new type of optical control electromagnetic shielding glass and its preparation method. The technical problem to be solved is to make it have high optical transmittance and high shielding efficiency at the same time, so that it is more suitable for practical use.
本发明的目的及解决其技术问题是采用以下技术方案来实现的。依据本发明提出的一种光学调控电磁屏蔽玻璃的制备方法，其包括以下步骤:The purpose of the present invention and the solution to its technical problems are achieved by adopting the following technical solutions. A kind of preparation method of optical regulation electromagnetic shielding glass proposed according to the present invention, it comprises the following steps:
在结构支撑玻璃的表面涂覆光刻胶涂层；Applying a photoresist coating to the surface of the structural support glass;
根据泰森多边形法计算无规则网格图形，将所述无规则网格的图形输入激光器中，在所述光刻胶涂层上进行激光直写刻蚀，除去结构支撑玻璃上无规则网格图形外围的光刻胶，得到具有无规则网格图形的光刻胶掩膜；Calculate the random grid pattern according to the Thiessen polygon method, input the random grid pattern into the laser, perform laser direct writing etching on the photoresist coating, and remove the random grid on the structural support glass Photoresist on the periphery of the pattern to obtain a photoresist mask with an irregular grid pattern;
在所述光刻胶掩膜上镀制复合金属膜层；所述的复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述光刻胶掩膜上；所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁；Plating a composite metal film layer on the photoresist mask; the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached on the photoresist mask; the described The material of the transition film layer is at least one of alumina, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron;
去除镀制完复合金属膜层的玻璃上的光刻胶，得到光学调控电磁屏蔽玻璃。The photoresist on the glass coated with the composite metal film layer is removed to obtain the optically regulated electromagnetic shielding glass.
本发明的目的及解决其技术问题还可采用以下技术措施进一步实现。The purpose of the present invention and its technical problems can also be further realized by adopting the following technical measures.
优选的，前述的光学调控电磁屏蔽玻璃的制备方法，其中所述的光刻胶的材料为正性光刻胶，所述光刻胶的厚度为12-20μm；Preferably, the aforementioned method for preparing an optically regulated electromagnetic shielding glass, wherein the material of the photoresist is a positive photoresist, and the thickness of the photoresist is 12-20 μm;
所述的复合金属膜层为：Described composite metal film layer is:
铬膜层和铜膜层，铬膜层的厚度为50-80nm，铜膜层的厚度为300-700nm；A chromium film layer and a copper film layer, the thickness of the chromium film layer is 50-80nm, and the thickness of the copper film layer is 300-700nm;
氧化铝膜层、铝膜层、和银膜层，氧化铝膜层的厚度为10-20nm，铝膜层的厚度为50-80nm，银膜层的厚度为300-700nm；An aluminum oxide film layer, an aluminum film layer, and a silver film layer, the thickness of the aluminum oxide film layer is 10-20nm, the thickness of the aluminum film layer is 50-80nm, and the thickness of the silver film layer is 300-700nm;
或铬膜层和金膜层，铬膜层的厚度为50-80nm，金膜层的厚度为300-700nm。Or a chromium film layer and a gold film layer, the thickness of the chromium film layer is 50-80nm, and the thickness of the gold film layer is 300-700nm.
优选的，前述的光学调控电磁屏蔽玻璃的制备方法，其中根据泰森多边形法计算无规则网格图形时，以单位面积上随机点分布密度和无规则网格图形的网格边线线径为变量；所述网格边线的线径为8-15μm。Preferably, in the aforementioned preparation method of optically regulated electromagnetic shielding glass, when calculating the random grid pattern according to the Thiessen polygon method, the distribution density of random points per unit area and the grid sideline diameter of the random grid pattern are used as variables ; The wire diameter of the grid edge is 8-15 μm.
优选的，前述的光学调控电磁屏蔽玻璃的制备方法，其中利用真空镀膜法镀制所述的复合金属膜层，镀膜时，本底真空度为3.0×10-4-5.0×10-4Pa，烘烤温度50-80℃，保温时间为25-35min。Preferably, in the aforementioned method for preparing optically regulated electromagnetic shielding glass, the composite metal film layer is plated by a vacuum coating method, and the background vacuum degree is 3.0×10 -4 -5.0×10 -4 Pa during film coating, The baking temperature is 50-80°C, and the holding time is 25-35min.
优选的，前述的光学调控电磁屏蔽玻璃的制备方法，其中对所述的结构支撑玻璃的另一表面进行防眩处理或镀制复合减反射膜。Preferably, in the aforementioned method for preparing an optically regulated electromagnetic shielding glass, the other surface of the structural support glass is subjected to anti-glare treatment or coated with a composite anti-reflection film.
优选的，前述的光学调控电磁屏蔽玻璃的制备方法，其中采用喷砂法对结构支撑玻璃进行防眩处理，防眩处理包括：研磨砂为粒径为250-400目的刚玉砂，喷砂机空气压力设定为4-12MPa，单点喷砂时间为5-12s；Preferably, the aforementioned method for preparing optically regulated electromagnetic shielding glass, wherein the structural support glass is subjected to anti-glare treatment by sandblasting, the anti-glare treatment includes: the abrasive sand is corundum sand with a particle size of 250-400 mesh, and the air of the sandblasting machine is The pressure is set at 4-12MPa, and the single-point sandblasting time is 5-12s;
其中，喷砂结束后得到雾都为2％-20％，光泽度为110-35的单面防眩玻璃。Among them, after the sandblasting, the single-sided anti-glare glass with a fog of 2%-20% and a gloss of 110-35 can be obtained.
优选的，前述的光学调控电磁屏蔽玻璃的制备方法，其中所述的复合减反射膜的单面反射率为0.5％-1.0％，其包括：Preferably, the aforementioned method for preparing optically regulated electromagnetic shielding glass, wherein the single-sided reflectance of the composite anti-reflection film is 0.5%-1.0%, which includes:
二氧化硅膜，附着在结构支撑玻璃的另一表面，厚度为60-100nm；Silicon dioxide film, attached to the other surface of the structural support glass, with a thickness of 60-100nm;
三氧化铝膜，附着在所述二氧化硅膜上，厚度为50-200nm；An aluminum oxide film, attached to the silicon dioxide film, has a thickness of 50-200nm;
钛酸镧膜、钛酸锶膜、三氧化二钽膜或二氧化钛膜，附着在所述三氧化铝膜上，厚度为80-260nm；Lanthanum titanate film, strontium titanate film, tantalum trioxide film or titanium dioxide film, attached to the aluminum oxide film, with a thickness of 80-260nm;
氟化镁膜，附着在所述氟化镁膜上，厚度为70-110nm。The magnesium fluoride film, attached to the magnesium fluoride film, has a thickness of 70-110nm.
本发明的目的及解决其技术问题还采用以下的技术方案来实现。依据本发明提出的一种光学调控电磁屏蔽玻璃，由本发明所述的方法制备而成；其包括：The purpose of the present invention and the solution to its technical problems are also achieved by the following technical solutions. An optical control electromagnetic shielding glass proposed according to the present invention is prepared by the method of the present invention; it includes:
结构支撑玻璃；Structural support glass;
无规则网格图形的复合金属膜层，附着在所述的结构支撑玻璃表面，复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述结构支撑玻璃表面；其中，A composite metal film layer of random grid pattern is attached to the surface of the structural support glass, the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached to the surface of the structural support glass; wherein,
所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁。The material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron.
发明的目的及解决其技术问题还可采用以下技术措施进一步实现。The purpose of the invention and the solution to its technical problems can also be further realized by adopting the following technical measures.
优选的，前述的光学调控电磁屏蔽玻璃，其包括：Preferably, the aforementioned optically adjustable electromagnetic shielding glass includes:
结构支撑玻璃；Structural support glass;
复合减反射膜，附着在所述结构支撑玻璃表面；A composite anti-reflection film attached to the surface of the structural support glass;
无规则网格图形的复合金属膜层，附着在所述的结构支撑玻璃另一表面，复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述结构支撑玻璃表面；其中，A composite metal film layer with a random grid pattern is attached to the other surface of the structural support glass, the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached to the surface of the structural support glass; wherein ,
所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁。The material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron.
优选的，前述的光学调控电磁屏蔽玻璃，其包括：Preferably, the aforementioned optically adjustable electromagnetic shielding glass includes:
结构支撑玻璃，一表面为经防眩处理的亚光面；Structural support glass, one surface is a matte surface with anti-glare treatment;
无规则网格图形的复合金属膜层，附着在所述的结构支撑玻璃另一表面，复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述结构支撑玻璃表面；其中，A composite metal film layer with a random grid pattern is attached to the other surface of the structural support glass, the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached to the surface of the structural support glass; wherein ,
所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁。The material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron.
借由上述技术方案，本发明光学调控电磁屏蔽玻璃及其制备方法至少具有下列优点：By virtue of the above technical solutions, the optically regulated electromagnetic shielding glass and its preparation method of the present invention have at least the following advantages:
本发明中制备光学调控电磁屏蔽玻璃是将电磁屏蔽材料直接制作在结构支撑玻璃上实现的，使用的电磁屏蔽材料为一层具有无规则二维网格形态的高电导率复合金属膜，该形态的电磁屏蔽材料通过随机无序网格状结构对光学干涉效应的调控来消除莫尔条纹现象；本发明的光学调控电磁屏蔽玻璃无莫尔干涉条纹现象，结构简单，耐候性强，且同时具有高光学透过率和高屏蔽效能，其透光率大于80％，电磁屏蔽效能大于等于20dB。本发明的制备方法包括过涂胶、激光直写刻蚀、真空镀膜、去胶，制备方法简单，成品率高。The preparation of optically regulated electromagnetic shielding glass in the present invention is achieved by directly making the electromagnetic shielding material on the structural support glass. The electromagnetic shielding material used is a layer of high-conductivity composite metal film with an irregular two-dimensional grid shape. The electromagnetic shielding material of the present invention eliminates moiré fringes by regulating the optical interference effect of a random disordered grid structure; the optically regulated electromagnetic shielding glass of the present invention has no moiré interference fringes, has a simple structure, strong weather resistance, and has High optical transmittance and high shielding effectiveness, the light transmittance is greater than 80%, and the electromagnetic shielding effectiveness is greater than or equal to 20dB. The preparation method of the invention includes overcoating glue, laser direct writing etching, vacuum coating, and glue removal, and the preparation method is simple and the yield is high.
上述说明仅是本发明技术方案的概述，为了能够更清楚了解本发明的技术手段，并可依照说明书的内容予以实施，以下以本发明的较佳实施例并配合附图详细说明如后。The above description is only an overview of the technical solutions of the present invention. In order to understand the technical means of the present invention more clearly and implement them according to the contents of the description, the preferred embodiments of the present invention and accompanying drawings are described in detail below.
附图说明Description of drawings
图1是光学调控电磁屏蔽玻璃的结构示意图。Fig. 1 is a schematic diagram of the structure of an optically regulated electromagnetic shielding glass.
图2是实施例1光学调控电磁屏蔽玻璃的结构示意图。FIG. 2 is a schematic structural view of the optically regulated electromagnetic shielding glass in Embodiment 1. FIG.
图3是实施例2光学调控电磁屏蔽玻璃的结构示意图。FIG. 3 is a schematic structural view of the optically regulated electromagnetic shielding glass in Embodiment 2. FIG.
图4是实施例3光学调控电磁屏蔽玻璃的结构示意图。Fig. 4 is a schematic structural view of the optically regulated electromagnetic shielding glass in Embodiment 3.
具体实施方式detailed description
为更进一步阐述本发明为达成预定发明目的所采取的技术手段及功效,以下结合附图及较佳实施例，对依据本发明提出的光学调控电磁屏蔽玻璃及其制备方法其具体实施方式、结构、特征及其功效，详细说明如后。在下述说明中，不同的“一实施例”或“实施例”指的不一定是同一实施例。此外，一或多个实施例中的特定特征、结构、或特点可由任何合适形式组合。In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation and structure of the optically regulated electromagnetic shielding glass and its preparation method according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. , features and their effects are described in detail below. In the following description, different "one embodiment" or "embodiment" do not necessarily refer to the same embodiment. Furthermore, the particular features, structures, or characteristics of one or more embodiments may be combined in any suitable manner.
本发明的一个实施例提出的一种光学调控电磁屏蔽玻璃的制备方法，其包括以下步骤:A kind of preparation method of optical control electromagnetic shielding glass that one embodiment of the present invention proposes, it comprises the following steps:
在结构支撑玻璃的表面涂覆光刻胶涂层；Applying a photoresist coating to the surface of the structural support glass;
根据泰森多边形法计算无规则网格图形，将所述无规则网格的图形输入激光器中，由计算机控制振镜在所述光刻胶涂层上进行激光直写刻蚀，除去结构支撑玻璃上无规则网格图形外围的光刻胶，得到具有无规则网格图形的光刻胶掩膜；Calculate the random grid pattern according to the Thiessen polygon method, input the random grid pattern into the laser, and perform laser direct writing etching on the photoresist coating by the computer-controlled vibrating mirror to remove the structural support glass On the photoresist on the periphery of the irregular grid pattern, a photoresist mask with an irregular grid pattern is obtained;
在所述光刻胶掩膜上镀制复合金属膜层；所述的复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述光刻胶掩膜上；所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁；Plating a composite metal film layer on the photoresist mask; the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached on the photoresist mask; the described The material of the transition film layer is at least one of alumina, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron;
去除镀制完复合金属膜层的玻璃上的光刻胶，得到光学调控电磁屏蔽玻璃。The photoresist on the glass coated with the composite metal film layer is removed to obtain the optically regulated electromagnetic shielding glass.
金、银、铜、镍和铁作为屏蔽材料具有很好的电磁屏蔽效果，但其与玻璃的粘结性较差，因此在玻璃上镀制这些屏蔽材料时需要先镀制与玻璃粘结性良好的过渡膜，氧化铝、铝和铬与玻璃具有良好的粘结性。Gold, silver, copper, nickel and iron have good electromagnetic shielding effects as shielding materials, but their adhesion to glass is poor. Therefore, when plating these shielding materials on glass, it is necessary to first plate the adhesion to glass. Good transition film, good adhesion to glass on alumina, aluminum and chrome.
较佳的，本发明的实施例所述的光刻胶的材料为正性光刻胶，所述光刻胶的厚度为12-20μm。Preferably, the material of the photoresist described in the embodiment of the present invention is a positive photoresist, and the thickness of the photoresist is 12-20 μm.
较佳的，本发明的实施例所述的光刻胶的材料为PMMA单组份正性光刻胶。Preferably, the material of the photoresist described in the embodiment of the present invention is PMMA single-component positive photoresist.
较佳的，本发明的实施例所述的过渡膜层的厚度为50-80nm；所述的屏蔽金属膜层厚度为300-700nm。Preferably, the thickness of the transition film layer in the embodiment of the present invention is 50-80 nm; the thickness of the shielding metal film layer is 300-700 nm.
较佳的，本发明的实施例所述的复合金属膜层为：Preferably, the composite metal film layer described in the embodiments of the present invention is:
铬膜层和铜膜层，铬膜层的厚度为50-80nm，铜膜层的厚度为300-700nm，铬作为过渡层与玻璃和铜的粘结性均很强；Chromium film layer and copper film layer, the thickness of the chromium film layer is 50-80nm, the thickness of the copper film layer is 300-700nm, and the bonding property of chromium as a transition layer to glass and copper is very strong;
氧化铝膜层、铝膜层、和银膜层，氧化铝膜层的厚度为10-20nm，铝膜层的厚度为50-80nm，银膜层的厚度为300-700nm，氧化铝膜层和铝膜层作为过渡层与玻璃和银的粘结性均很强；Aluminum oxide film layer, aluminum film layer, and silver film layer, the thickness of aluminum oxide film layer is 10-20nm, the thickness of aluminum film layer is 50-80nm, the thickness of silver film layer is 300-700nm, aluminum oxide film layer and The aluminum film layer as a transition layer has strong adhesion to glass and silver;
或铬膜层和金膜层，铬膜层的厚度为50-80nm，金膜层的厚度为300-700nm，铬作为过渡层与玻璃和金的粘结性均很强。Or a chromium film layer and a gold film layer, the thickness of the chromium film layer is 50-80nm, the thickness of the gold film layer is 300-700nm, and the chromium as a transition layer has strong adhesion to glass and gold.
较佳的，本发明的实施例根据泰森多边形法计算无规则网格图形时，以单位面积上随机点分布密度和无规则网格图形的网格边线线径为变量；所述网格边线的线径为8-15μm。其中，单位面积上随机点分布密度等效为100目Preferably, when the embodiments of the present invention calculate the random grid graphics according to the Thiessen polygon method, the random point distribution density per unit area and the grid sideline diameter of the random grid graphics are variables; the grid sidelines The wire diameter is 8-15μm. Among them, the distribution density of random points per unit area is equivalent to 100 mesh
根据泰森多边形法计算无规则网格图形时，“单位面积上随机点分布密度”和“网格边线线径”为变量，得出无规则网格图形后，利用该图形的单位面积占空比和预备镀制的复合金属膜的电导率计算出预备镀制无规则网格图形复合金属膜的玻璃的透光率和等效方块电阻，若算出的预备镀制复合金属膜的玻璃的透光率和等效方块电阻不符合实际应用，则新进行计算无规则网格图形过程，直到得出的图形的透光率及等效方块电阻满足设计要求。When calculating irregular grid graphics according to the Thiessen polygon method, the "random point distribution density per unit area" and "grid sideline diameter" are variables. After obtaining the irregular grid graphics, use the unit area of the graphics to occupy Calculate the light transmittance and equivalent sheet resistance of the glass that is prepared to be coated with a composite metal film with a random grid pattern by comparing with the electrical conductivity of the prepared composite metal film, if the calculated transmittance of the glass prepared to be coated with a composite metal film If the light rate and equivalent square resistance do not meet the actual application, the process of calculating the irregular grid graphics will be newly carried out until the light transmittance and equivalent square resistance of the obtained graphics meet the design requirements.
较佳的，本发明的实施例利用真空镀膜法镀制所述的复合金属膜层，镀膜时，本底真空度为3.0×10-4-5.0×10-4Pa，烘烤温度50-80℃，保温时间为25-35min。真空镀膜法镀制复合金属膜对玻璃没有污染，制备的电磁屏蔽玻璃非常干净。Preferably, the embodiments of the present invention use the vacuum coating method to coat the composite metal film layer. During coating, the background vacuum degree is 3.0×10 -4 -5.0×10 -4 Pa, and the baking temperature is 50-80 ℃, the holding time is 25-35min. The composite metal film deposited by the vacuum coating method has no pollution to the glass, and the prepared electromagnetic shielding glass is very clean.
较佳的，本发明的实施例对所述的结构支撑玻璃的另一表面进行防眩处理或镀制复合减反射膜。Preferably, in the embodiments of the present invention, the other surface of the structural support glass is treated with anti-glare treatment or coated with a composite anti-reflection film.
较佳的，本发明的实施例采用喷砂法对结构支撑玻璃进行防眩处理，防眩处理包括：研磨砂为粒径为250-400目的刚玉砂，喷砂机空气压力设定为4-12MPa，单点喷砂时间为5-12s；Preferably, the embodiment of the present invention uses the sandblasting method to carry out anti-glare treatment on the structural support glass. The anti-glare treatment includes: the abrasive sand is corundum sand with a particle size of 250-400 mesh, and the air pressure of the sandblasting machine is set to 4-400 mesh. 12MPa, single point blasting time is 5-12s;
其中，喷砂结束后得到雾都为2％-20％，光泽度为110-35的单面防眩玻璃。Among them, after the sandblasting, the single-sided anti-glare glass with a fog of 2%-20% and a gloss of 110-35 can be obtained.
较佳的，本发明的实施例所述的复合减反射膜的单面反射率为0.5％-1.0％，其包括：Preferably, the single-sided reflectance of the composite anti-reflection film described in the embodiments of the present invention is 0.5%-1.0%, which includes:
二氧化硅膜，附着在结构支撑玻璃的另一表面，厚度为60-100nm；Silicon dioxide film, attached to the other surface of the structural support glass, with a thickness of 60-100nm;
三氧化铝膜，附着在所述二氧化硅膜上，厚度为50-200nm；An aluminum oxide film, attached to the silicon dioxide film, has a thickness of 50-200nm;
钛酸镧膜、钛酸锶膜、三氧化二钽膜或二氧化钛膜，附着在所述三氧化铝膜上，厚度为80-260nm；Lanthanum titanate film, strontium titanate film, tantalum trioxide film or titanium dioxide film, attached to the aluminum oxide film, with a thickness of 80-260nm;
氟化镁膜，附着在所述氟化镁膜上，厚度为70-110nm。The magnesium fluoride film, attached to the magnesium fluoride film, has a thickness of 70-110nm.
较佳的，本发明的实施例所述的结构支撑玻璃的厚度为0.7-4mm，光学透过率为89％-92％。Preferably, the structural support glass described in the embodiments of the present invention has a thickness of 0.7-4mm and an optical transmittance of 89%-92%.
较佳的，本发明的实施例中所述的去除镀制完复合金属膜层的玻璃上的光刻胶包括以下步骤：将质量浓度为50％-70％的NaOH溶液均匀喷涂于已镀制金属复合膜层的光刻胶面，浸润0.5-5min，待光刻胶溶解后用去离子水进行冲洗，用丙酮浸泡去除残留光刻胶，并将玻璃浸泡于95％-98％的无水乙醇中超声清洗15-30min，得到的光学调控电磁屏蔽玻璃没有光刻胶。Preferably, the removal of the photoresist on the glass that has finished plating the composite metal film layer described in the embodiments of the present invention includes the following steps: uniformly spraying NaOH solution with a mass concentration of 50%-70% on the plated glass The photoresist surface of the metal composite film layer is soaked for 0.5-5min, rinsed with deionized water after the photoresist is dissolved, soaked in acetone to remove the residual photoresist, and soaked in 95%-98% anhydrous Ultrasonic cleaning in ethanol for 15-30 minutes, the obtained optically regulated electromagnetic shielding glass has no photoresist.
较佳的，本发明另一个实施例提出一种光学调控电磁屏蔽玻璃制品的制备方法，根据贴合屏幕的大小将本发明制备的光学调控电磁屏蔽玻璃切割至适宜尺寸，并进行磨边处理，然后进行U形电极制备，U型电极制作完成后得到光学调控电磁屏蔽玻璃制品。Preferably, another embodiment of the present invention proposes a method for preparing an optically regulated electromagnetic shielding glass product. According to the size of the attached screen, the optically regulated electromagnetic shielding glass prepared in the present invention is cut to a suitable size, and then edged. Then the U-shaped electrode is prepared, and after the U-shaped electrode is fabricated, an optically regulated electromagnetic shielding glass product is obtained.
较佳的，本发明的实施例所述的U形电极制包括：在玻璃边缘电极采用铜箔包边方式制作，或通过160-260℃烘烤U形银浆bus bar方式制作。Preferably, the manufacturing of the U-shaped electrode described in the embodiment of the present invention includes: making the electrode at the edge of the glass by wrapping copper foil, or making it by baking U-shaped silver paste bus bar at 160-260°C.
如图1所示，本发明的另一个实施例提出一种光学调控电磁屏蔽玻璃，由本发明的制备方法制备而成；其包括：As shown in Figure 1, another embodiment of the present invention proposes an optically regulated electromagnetic shielding glass prepared by the preparation method of the present invention; it includes:
结构支撑玻璃1；Structural Support Glass 1;
无规则网格图形的复合金属膜层，附着在所述的结构支撑玻璃表面，复合金属膜层包括过渡膜层2和屏蔽金属膜层3，过渡膜层附着在所述结构支撑玻璃表面；其中，A composite metal film layer of random grid pattern is attached to the surface of the structural support glass, the composite metal film layer includes a transition film layer 2 and a shielding metal film layer 3, and the transition film layer is attached to the structure support glass surface; wherein ,
所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁。The material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron.
较佳的本发明的另一个实施例提出的一种光学调控电磁屏蔽玻璃包括：Another preferred embodiment of the present invention proposes an optically adjustable electromagnetic shielding glass comprising:
结构支撑玻璃；Structural support glass;
复合减反射膜，附着在所述结构支撑玻璃表面；A composite anti-reflection film attached to the surface of the structural support glass;
无规则网格图形的复合金属膜层，附着在所述的结构支撑玻璃另一表面，复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述结构支撑玻璃表面；其中，A composite metal film layer with a random grid pattern is attached to the other surface of the structural support glass, the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached to the surface of the structural support glass; wherein ,
所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁。The material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron.
较佳的，本发明的另一个实施例提出的一种光学调控电磁屏蔽玻璃包括：Preferably, an optically adjustable electromagnetic shielding glass proposed in another embodiment of the present invention includes:
结构支撑玻璃，一表面为经防眩处理的亚表面；Structural support glass, one surface is a sub-surface with anti-glare treatment;
无规则网格图形的复合金属膜层，附着在所述的结构支撑玻璃另一表面，复合金属膜层包括过渡膜层和屏蔽金属膜层，过渡膜层附着在所述结构支撑玻璃表面；其中，A composite metal film layer with a random grid pattern is attached to the other surface of the structural support glass, the composite metal film layer includes a transition film layer and a shielding metal film layer, and the transition film layer is attached to the surface of the structural support glass; wherein ,
所述的过渡膜层的材料为氧化铝、铝和铬中的至少一种；所述的屏蔽金属膜层的材料为金、银、铜、镍或铁。The material of the transition film layer is at least one of aluminum oxide, aluminum and chromium; the material of the shielding metal film layer is gold, silver, copper, nickel or iron.
以下实施例中镀制的膜层后括号中的数据为所镀制膜层的厚度。The data in brackets after the plated film layer in the following examples is the thickness of the plated film layer.
实施例1Example 1
本实施例的调控电磁屏蔽玻璃的结构图如图2所示。The structural diagram of the control electromagnetic shielding glass of this embodiment is shown in FIG. 2 .
取厚度为3mm，光学透过率为91％的浮法平板玻璃作为结构支撑玻璃4，在该结构支撑玻璃的表面涂覆厚度为15μm的PMMA单组份正性光刻胶涂层；根据泰森多边形法计算无规则网格图形，以单位面积上随机点分布密度和网格边线线径为变量，网格边线线径为10μm，单位面积上随机点分布密度等效为100目，将得到的无规则网格的图形输入激光器中，由计算机控制振镜在所述光刻胶涂层上进行激光直写刻蚀，除去结构支撑玻璃上无规则网格图形外围的光刻胶，得到具有无规则网格图形的光刻胶掩膜；利用真空镀膜的方法在所述光刻胶掩膜上镀制复合金属膜层，镀膜本底真空度为5.0×10-4Pa，烘烤温度80℃，保温时间30min，其中镀制的复合金属膜层为铬(80nm)/铜(700nm)复合金属膜层，先镀制铬膜层5，后镀制铜膜层6；将质量浓度为50％的NaOH溶液均匀喷涂于已镀制金属复合膜层的光刻胶面，浸润1min，待光刻胶溶解后快速用去离子水进行冲洗去除NaOH溶液，利用丙酮浸泡去除残留光刻胶，并将玻璃浸泡于95％的无水乙醇中超生清洗20min，得到光学调控电磁屏蔽玻璃。Getting thickness is 3mm, and the float glass of optical transmittance 91% is used as structural support glass 4, and the PMMA single-component positive photoresist coating that thickness is 15 μ m is coated on the surface of this structural support glass; The Mori polygon method is used to calculate irregular grid graphics, and the random point distribution density per unit area and the grid edge diameter are used as variables. The grid edge line diameter is 10 μm, and the random point distribution density per unit area is equivalent to 100 meshes. The pattern of the random grid is input into the laser, and the computer-controlled vibrating mirror is used to perform laser direct writing etching on the photoresist coating, and the photoresist on the periphery of the random grid pattern on the structural support glass is removed to obtain a A photoresist mask with a random grid pattern; a composite metal film layer is plated on the photoresist mask by vacuum coating, the vacuum degree of the coating background is 5.0×10 -4 Pa, and the baking temperature is 80 ℃, holding time 30min, wherein the plated composite metal film layer is chromium (80nm)/copper (700nm) composite metal film layer, the chromium film layer 5 is plated first, and the copper film layer 6 is plated after; the mass concentration is 50 % NaOH solution was evenly sprayed on the photoresist surface of the plated metal composite film layer, soaked for 1min, and after the photoresist was dissolved, it was quickly rinsed with deionized water to remove the NaOH solution, soaked in acetone to remove the residual photoresist, and Soak the glass in 95% anhydrous ethanol for 20 minutes to obtain an optically regulated electromagnetic shielding glass.
本实施例的光学调控电磁屏蔽玻璃的透光率为82％，电磁屏蔽效能为23dB。The light transmittance of the optical control electromagnetic shielding glass of this embodiment is 82%, and the electromagnetic shielding efficiency is 23dB.
实施例2Example 2
本实施例的调控电磁屏蔽玻璃的结构图如图3所示。The structural diagram of the control electromagnetic shielding glass of this embodiment is shown in FIG. 3 .
取厚度为1.5mm，光学透过率为89％的浮法平板玻璃作为结构支撑玻璃，利用真空镀膜方式在该结构支撑玻璃一侧镀制复合减反射膜，镀制完复合减反射膜后的玻璃膜系结构为：结构支撑玻璃7/二氧化硅层8(95nm)/三氧化二铝层9(75nm)/钛酸锶层10(105nm)/氟化镁层11(95nm)；利用涂胶机在该结构支撑玻璃的另一表面涂覆厚度为12μm的PMMA单组份正性光刻胶涂层；根据泰森多边形法计算无规则网格图形，以单位面积上随机点分布密度和网格边线线径为变量，网格边线线径为12μm，单位面积上随机点分布密度等效为100目，将得到的无规则网格的图形输入激光器中，由计算机控制振镜在所述光刻胶涂层上进行激光直写刻蚀，除去结构支撑玻璃上无规则网格图形外围的光刻胶，得到具有无规则网格图形的光刻胶掩膜；利用真空镀膜的方法在所述光刻胶掩膜上镀制复合金属膜层，镀膜本底真空度为4.2×10-4Pa，烘烤温度50℃，保温时间28min，其中镀制的复合金属膜层为三氧化二铝12(10nm)/铝13(80nm)/银14(700nm)复合金属膜层，先镀制三氧化二铝膜层；将质量浓度为70％的NaOH溶液均匀喷涂于已镀制金属复合膜层的光刻胶面，浸润5min，待光刻胶溶解后快速用去离子水进行冲洗去除NaOH溶液，利用丙酮浸泡去除残留光刻胶，并将玻璃浸泡于95％的无水乙醇中超生清洗15min，得到光学调控电磁屏蔽玻璃。Take the float flat glass with a thickness of 1.5mm and an optical transmittance of 89% as the structural support glass, and use the vacuum coating method to coat a composite anti-reflection film on one side of the structural support glass. After the composite anti-reflection film is coated, the The glass film structure is: structural support glass 7/silicon dioxide layer 8 (95nm)/aluminum oxide layer 9 (75nm)/strontium titanate layer 10 (105nm)/magnesium fluoride layer 11 (95nm); The glue machine coated the PMMA single-component positive photoresist coating with a thickness of 12 μm on the other surface of the glass supported by the structure; the random grid pattern was calculated according to the Thiessen polygon method, and the distribution density of random points per unit area and The diameter of the grid sideline is a variable, the diameter of the grid sideline is 12 μm, and the distribution density of random points per unit area is equivalent to 100 meshes. The obtained random grid pattern is input into the laser, and the vibrating mirror is controlled by the computer in the Laser direct writing etching is carried out on the photoresist coating, and the photoresist around the irregular grid pattern on the structural support glass is removed to obtain a photoresist mask with a random grid pattern; the method of vacuum coating is used in the A composite metal film layer is plated on the photoresist mask, the background vacuum degree of the coating film is 4.2×10 -4 Pa, the baking temperature is 50°C, and the holding time is 28 minutes. The composite metal film layer is Al2O3 12 (10nm)/aluminum 13 (80nm)/silver 14 (700nm) composite metal film layer, the aluminum oxide film layer is plated first; the NaOH solution with a mass concentration of 70% is evenly sprayed on the plated metal composite film layer soak the photoresist surface for 5 minutes, rinse the NaOH solution quickly with deionized water after the photoresist dissolves, remove the residual photoresist by soaking in acetone, and soak the glass in 95% absolute ethanol for 15 minutes , to obtain optically adjustable electromagnetic shielding glass.
本实施例的光学调控电磁屏蔽玻璃的透光率为87％，电磁屏蔽效能为25dB。The light transmittance of the optical control electromagnetic shielding glass of this embodiment is 87%, and the electromagnetic shielding efficiency is 25dB.
实施例3Example 3
本实施例的调控电磁屏蔽玻璃的结构图如图4所示。The structural diagram of the control electromagnetic shielding glass of this embodiment is shown in FIG. 4 .
取厚度为0.7mm，光学透过率为92％的浮法平板玻璃作为结构支撑玻璃15，采用喷砂法对结构支撑玻璃的一侧16进行防眩处理，防眩处理的过程中，研磨砂选取粒径为250目的刚玉砂，喷砂机空气压力设定为6MPa,单点喷砂时间5s，喷砂工艺完成后得到雾都2％，光泽度110的单面防眩玻璃；利用涂胶机在该结构支撑玻璃的另一表面涂覆厚度为20μm的PMMA单组份正性光刻胶涂层；根据泰森多边形法计算无规则网格图形，以单位面积上随机点分布密度和网格边线线径为变量，网格边线线径为20μm，单位面积上随机点分布密度等效为100目，将得到的无规则网格的图形输入激光器中，由计算机控制振镜在所述光刻胶涂层上进行激光直写刻蚀，除去结构支撑玻璃上无规则网格图形外围的光刻胶，得到具有无规则网格图形的光刻胶掩膜；利用真空镀膜的方法在所述光刻胶掩膜上镀制复合金属膜层，镀膜本底真空度为4.5×10-4Pa，烘烤温度70℃，保温时间35min，其中镀制的复合金属膜层为铬(70nm)/金(600nm)复合金属膜层，先镀制铬膜层17，后镀制金膜层18；将质量浓度为60％的NaOH溶液均匀喷涂于已镀制金属复合膜层的光刻胶面，浸润5min，待光刻胶溶解后快速用去离子水进行冲洗去除NaOH溶液，利用丙酮浸泡去除残留光刻胶，并将玻璃浸泡于95％的无水乙醇中超生清洗20min，得到光学调控电磁屏蔽玻璃；根据需贴合屏幕的大小将制备的光学调控电磁屏蔽玻璃切割至331.5mm×432mm，并进行磨边处理，将磨边处理后的该玻璃通过在240℃烘烤U型银浆bus bar方式制作U型电极，银浆bus bar宽度为3mm，U型电极制作完成后得到光学调控电磁屏蔽玻璃制品。Float flat glass with a thickness of 0.7 mm and an optical transmittance of 92% is used as the structural support glass 15, and one side 16 of the structural support glass is subjected to anti-glare treatment by sandblasting. During the anti-glare treatment, abrasive sand Select corundum sand with a particle size of 250 mesh, set the air pressure of the sandblasting machine to 6MPa, and the single-point sandblasting time is 5s. After the sandblasting process is completed, a single-sided anti-glare glass with a fog of 2% and a glossiness of 110 is obtained; On the other surface of the supporting glass of the structure, a PMMA single-component positive photoresist coating with a thickness of 20 μm is coated by a machine; the random grid pattern is calculated according to the Thiessen polygon method, and the random point distribution density and network The grid edge diameter is a variable, the grid edge diameter is 20 μm, and the distribution density of random points per unit area is equivalent to 100 meshes. The obtained random grid pattern is input into the laser, and the vibrating mirror is controlled by the computer to operate on the laser beam. Carry out laser direct writing etching on the resist coating, remove the photoresist on the periphery of the random grid pattern on the structural support glass, and obtain a photoresist mask with a random grid pattern; use the method of vacuum coating in the described A composite metal film is plated on the photoresist mask, the background vacuum degree of the coating film is 4.5×10 -4 Pa, the baking temperature is 70°C, and the holding time is 35 minutes. The composite metal film layer is chromium (70nm)/ Gold (600nm) composite metal film layer, first plated chromium film layer 17, and then plated gold film layer 18; The NaOH solution that mass concentration is 60% is evenly sprayed on the photoresist surface that has plated metal composite film layer, Immerse for 5 minutes, and after the photoresist is dissolved, quickly rinse with deionized water to remove the NaOH solution, soak in acetone to remove the residual photoresist, and soak the glass in 95% absolute ethanol for 20 minutes to obtain optically regulated electromagnetic shielding Glass: According to the size of the screen to be fitted, the prepared optically regulated electromagnetic shielding glass is cut to 331.5mm×432mm, and subjected to edging treatment, and the glass after edging treatment is baked at 240°C with U-shaped silver paste bus bar The U-shaped electrode is produced by the method, and the width of the silver paste bus bar is 3 mm. After the U-shaped electrode is fabricated, an optically regulated electromagnetic shielding glass product is obtained.
本实施例的光学调控电磁屏蔽玻璃的透光率为81％，电磁屏蔽效能为29dB。The light transmittance of the optical control electromagnetic shielding glass of this embodiment is 81%, and the electromagnetic shielding efficiency is 29dB.
以上所述，仅是本发明的较佳实施例而已，并非对本发明作任何形式上的限制，依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与修饰，均仍属于本发明技术方案的范围内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention still belong to the present invention. within the scope of the technical solution of the invention.
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