CN107731952B - radar sensor - Google Patents
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Abstract
本发明涉及半导体集成电路技术领域,尤其涉及一种具有共用结构的半导体雷达传感器,包括多个在垂直与水平方向上排列成为二维行列分布的光电传感器;其中,光电传感器包括两个三极管、五个N晶体管与二个P晶体管。优点:该雷达传感器解决了电子标签、无人车、无人机等基于电磁介质传播领域的易干扰、功耗大的问题。
The present invention relates to the technical field of semiconductor integrated circuits, in particular to a semiconductor radar sensor with a common structure, including a plurality of photoelectric sensors arranged in two-dimensional rows and columns in the vertical and horizontal directions; wherein, the photoelectric sensor includes two triodes, five N transistors and two P transistors. Advantages: The radar sensor solves the problems of easy interference and high power consumption in the field of electromagnetic medium propagation such as electronic tags, unmanned vehicles, and drones.
Description
技术领域technical field
本发明涉及半导体集成电路技术领域,尤其涉及一种具有共用结构的半导体雷达传感器。The invention relates to the technical field of semiconductor integrated circuits, in particular to a semiconductor radar sensor with a common structure.
背景技术Background technique
射频识别RFID系统能够在单个标签识别单元检测出来,所述每个识别单元在很大范围内可以令人满意地读取各种参数,但例如温度与湿度、电磁干扰EMI、读取器灵敏度、材料性质,以及其他因此影响,降低了传感器的可靠性。好的射频识别RFID集成电路是对制造工艺与电路设计的挑战,因为射频识别RFID集成电路需要极低的功耗、较大的动态范围等。射频识别RFID的远距离读写需要大幅提高读写器的发射功率,导致电磁干扰增大,成本增加,可靠性降低。Radio frequency identification RFID systems are able to detect on a single tag identification unit, each of which can satisfactorily read various parameters over a wide range, but such as temperature and humidity, electromagnetic interference EMI, reader sensitivity, Material properties, and other consequent effects, reduce the reliability of the sensor. A good radio frequency identification RFID integrated circuit is a challenge to the manufacturing process and circuit design, because the radio frequency identification RFID integrated circuit requires extremely low power consumption, large dynamic range, etc. The long-distance reading and writing of radio frequency identification RFID needs to greatly increase the transmission power of the reader, resulting in increased electromagnetic interference, increased cost, and reduced reliability.
传统的无人车、无人机等无人控制自动化智能物联网设备应用雷达声波传感器,用以确定与周围物体的间距,一种方法是雷达自身全方位实现扫描,另一种方法是采用相控阵雷达,这两种方案需要增加复杂的电机设备从而产生额外的负载。基于所确定的间距可以控制无人车、无人机的不同的舒适功能。例如可以将无人车、无人机的速度自动地控制到一预先确定的值上,其中,经由一借助于雷达传感器的向前的间距测量保证,不低于与一在前行驶的无人车、无人机的预设的安全间距。雷达传感器的其它应用包括一在迅速靠近一物体的情况下的紧急制动功能,一间距报警器,用以使得无人车、无人机的驾驶员容易维持与一在前行驶的无人车、无人机的所需的安全间距。Traditional unmanned vehicles, drones and other unmanned automated intelligent IoT devices use radar acoustic sensors to determine the distance from surrounding objects. One method is to scan the radar itself in all directions, and the other method is to use relative For control array radar, these two solutions need to add complex motor equipment to generate additional load. Based on the determined distance, various comfort functions of the unmanned vehicle or drone can be controlled. For example, the speed of unmanned vehicles and unmanned aerial vehicles can be automatically controlled to a predetermined value, wherein it is ensured via a forward distance measurement with the aid of a radar sensor that the speed is not lower than that of a preceding unmanned vehicle. The preset safe distance between vehicles and drones. Other applications of radar sensors include an emergency braking function in the case of rapidly approaching an object, a distance alarm to make it easier for the driver of an unmanned vehicle or drone to maintain contact with a preceding unmanned vehicle , The required safety distance of the UAV.
综上所述,需要设计一种抗干扰、低功耗的,应用于电子标签、无人车、无人机等具有共用结构的半导体雷达传感器。To sum up, it is necessary to design an anti-jamming, low-power semiconductor radar sensor with a common structure that can be applied to electronic tags, unmanned vehicles, and drones.
发明内容Contents of the invention
本发明针对现有技术的不足,提出一种具有共用结构的半导体雷达传感器,解决了电子标签、无人车、无人机等基于电磁介质传播领域的易干扰、功耗大的问题。Aiming at the deficiencies of the prior art, the present invention proposes a semiconductor radar sensor with a shared structure, which solves the problems of easy interference and high power consumption in the field of electromagnetic medium propagation such as electronic tags, unmanned vehicles, and drones.
为实现上述目的,本发明采用如下的技术方案:To achieve the above object, the present invention adopts the following technical solutions:
本发明提出一种具有共用结构的半导体雷达传感器,所述雷达传感器包括多个在垂直与水平方向上排列成为二维行列分布的光电传感器,其特征在于,所述光电传感器包括:两个三极管、六个N晶体管与二个P晶体管;The present invention proposes a semiconductor radar sensor with a common structure. The radar sensor includes a plurality of photoelectric sensors arranged in two-dimensional rows and columns in the vertical and horizontal directions. It is characterized in that the photoelectric sensor includes: two triodes, Six N transistors and two P transistors;
第一三极管(T1)的集电极与发射极同时连接至第一N晶体管(N1)的漏极与第四N晶体管(N4)的栅极;The collector and the emitter of the first triode (T1) are simultaneously connected to the drain of the first N transistor (N1) and the gate of the fourth N transistor (N4);
所述第一三极管(T1)的基极与所述第四N晶体管(N4)的漏极同时与电源电压VDD连接;The base of the first triode (T1) and the drain of the fourth N transistor (N4) are simultaneously connected to the power supply voltage VDD;
第五N晶体管(N5)的漏极与第一N晶体管(N1)的源极连接,栅极与第六N晶体管(N6)的栅极连接,源极接地;The drain of the fifth N transistor (N5) is connected to the source of the first N transistor (N1), the gate is connected to the gate of the sixth N transistor (N6), and the source is grounded;
所述第六N晶体管(N6)的漏极与第二N晶体管(N2)的源极连接,栅极与第五N晶体管(N5)的栅极、第四N晶体管(N4)的源接连接,源极接地;The drain of the sixth N transistor (N6) is connected to the source of the second N transistor (N2), the gate is connected to the gate of the fifth N transistor (N5), and the source of the fourth N transistor (N4) , the source is grounded;
第二三极管(T2)的基极与第二P晶体管(P2)的栅极、漏极及第一P晶体管(P1)的栅极连接,集电极与发射极同时接地;The base of the second triode (T2) is connected to the gate and drain of the second P transistor (P2) and the gate of the first P transistor (P1), and the collector and emitter are grounded simultaneously;
所述第一P晶体管(P1)的漏极与所述第二N晶体管(N2)的漏极连接,源极与所述第二P晶体管(P2)的源极同时与电源电压VDD连接;The drain of the first P transistor (P1) is connected to the drain of the second N transistor (N2), and the source and the source of the second P transistor (P2) are simultaneously connected to the power supply voltage VDD;
所述第一三极管(T1)和第二三极管(T2)均是光敏三极管。Both the first transistor (T1) and the second transistor (T2) are photosensitive transistors.
优选地,还至少包括一反相电路,所述反相电路包括第三P晶体管(P3)、第三N晶体管(N3),所述第三P晶体管(P3)与第三N晶体管(N3)在电源端与地之间串联连接,所述第三P晶体管(P3)的源极接到电源端,所述第三N晶体管(N3)的栅极与第三P晶体管(P3)的栅极同时接到第二N晶体管(N2)的源极,源极接地,漏极接到第三P晶体管(P3)的漏极,并输出感应电信号。Preferably, at least one inverting circuit is included, the inverting circuit includes a third P transistor (P3), a third N transistor (N3), and the third P transistor (P3) and the third N transistor (N3) It is connected in series between the power supply terminal and the ground, the source of the third P transistor (P3) is connected to the power supply terminal, the gate of the third N transistor (N3) is connected to the gate of the third P transistor (P3) At the same time, it is connected to the source of the second N transistor (N2), the source is grounded, and the drain is connected to the drain of the third P transistor (P3), and an induction electrical signal is output.
优选地,所述第一三极管(T1)的光敏区全部面积接收光照射,所述第二三极管(T2)的发射区面积按预设比例值接收光照射。Preferably, the entire area of the photosensitive region of the first triode (T1) receives light irradiation, and the area of the emission region of the second triode (T2) receives light irradiation according to a preset ratio.
优选地,所述预设比例值取决于第一P晶体管(P1)的宽度与第二P晶体管(P2)的宽度之比。Preferably, the preset ratio value depends on the ratio of the width of the first P transistor (P1) to the width of the second P transistor (P2).
优选地,所述第一三极管(T1)的导通电平与第二三极管(T2)的导通电平相一致。Preferably, the conduction level of the first triode (T1) is consistent with the conduction level of the second triode (T2).
优选地,所述第一N晶体管(N1)与第二N晶体管(N2)的长度相等。Preferably, the lengths of the first N transistor (N1) and the second N transistor (N2) are equal.
优选地,所述第一P晶体管(P1)或第二N晶体管(N2)的宽度是第二P晶体管(P2)的宽度1-20倍。Preferably, the width of the first P transistor (P1) or the second N transistor (N2) is 1-20 times the width of the second P transistor (P2).
优选地,所述晶体管采用场效应管、双极晶体管中的一种或多种。Preferably, the transistor is one or more of a field effect transistor and a bipolar transistor.
优选地,所述第一P晶体管(P1)、第二P晶体管(P2)及第三P晶体管(P3)为PMOS管,第一N晶体管(N1)、第二N晶体管(N2)、第三N晶体管(N3)、第四N晶体管(N4)、第五N晶体管(N5)及第六N晶体管(N6)为NMOS管。Preferably, the first P transistor (P1), the second P transistor (P2) and the third P transistor (P3) are PMOS transistors, the first N transistor (N1), the second N transistor (N2), the third The N transistor (N3), the fourth N transistor (N4), the fifth N transistor (N5) and the sixth N transistor (N6) are NMOS transistors.
优选地,所述光电传感器设置在相邻两行或两列的栅线之间。Preferably, the photoelectric sensor is arranged between grid lines in two adjacent rows or columns.
本发明的有益效果:本发明的具有共用结构的半导体雷达传感器,解决了电子标签、无人车、无人机等基于电磁介质传播领域的易干扰、功耗大的问题。Beneficial effects of the present invention: The semiconductor radar sensor with a common structure of the present invention solves the problems of easy interference and high power consumption in the field of electromagnetic medium propagation such as electronic tags, unmanned vehicles, and drones.
附图说明Description of drawings
为用附图对本发明作进一步说明,但附图中的实施例不构成对本发明的任何限制。In order to further illustrate the present invention with the accompanying drawings, the embodiments in the accompanying drawings do not constitute any limitation to the present invention.
图1是本发明具有共用结构的半导体雷达传感器一实施例结构示意图。FIG. 1 is a structural schematic diagram of an embodiment of a semiconductor radar sensor with a common structure according to the present invention.
具体实施方式Detailed ways
下面结合附图与实施例对本发明技术方案作进一步的说明,这是本发明的较佳实施例。本发明实施例提供的一种具有共用结构的半导体雷达传感器可以应用于物联网智能识别技术领域中的各个场景,包括但不局限于2G GSM、3G CDMA、4G LTE/LTE-A、5G eMBB的移动通信、集群通信、卫星通信、激光通信、光纤通信、数字电视、射频识别、电力载波、无人车、无人机、物联网、雷达等系统,本发明实施例对此不作特别限制。The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and embodiments, which are preferred embodiments of the present invention. A semiconductor radar sensor with a common structure provided by the embodiment of the present invention can be applied to various scenarios in the field of intelligent identification technology of the Internet of Things, including but not limited to 2G GSM, 3G CDMA, 4G LTE/LTE-A, 5G eMBB Systems such as mobile communication, trunking communication, satellite communication, laser communication, optical fiber communication, digital TV, radio frequency identification, power carrier, unmanned vehicle, unmanned aerial vehicle, Internet of Things, radar, etc., are not particularly limited in the embodiments of the present invention.
如图1所示,本发明提出一种具有共用结构的半导体雷达传感器,雷达传感器包括多个在垂直与水平方向上排列成为二维行列分布的光电传感器,其特征在于,光电传感器包括:两个三极管、六个N晶体管与二个P晶体管;光电传感器设置在相邻两行或两列的栅线之间,对于其它同等作用的设置本发明不做特别限定。As shown in Fig. 1, the present invention proposes a kind of semiconductor radar sensor with common structure, and radar sensor comprises a plurality of photoelectric sensors arranged in vertical and horizontal directions into two-dimensional row and column distribution, it is characterized in that, photoelectric sensor comprises: two The triode, six N transistors and two P transistors; the photoelectric sensor is arranged between the gate lines of two adjacent rows or columns, and the present invention does not specifically limit other arrangements with equivalent functions.
第一三极管(T1)的集电极与发射极同时连接至第一N晶体管(N1)的漏极与第四N晶体管(N4)的栅极;The collector and the emitter of the first triode (T1) are simultaneously connected to the drain of the first N transistor (N1) and the gate of the fourth N transistor (N4);
第一三极管(T1)的基极与第四N晶体管(N4)的漏极同时与电源电压VDD连接;The base of the first triode (T1) and the drain of the fourth N transistor (N4) are simultaneously connected to the power supply voltage VDD;
第五N晶体管(N5)的漏极与第一N晶体管(N1)的源极连接,栅极与第六N晶体管(N6)的栅极连接,源极接地;The drain of the fifth N transistor (N5) is connected to the source of the first N transistor (N1), the gate is connected to the gate of the sixth N transistor (N6), and the source is grounded;
第六N晶体管(N6)的漏极与第二N晶体管(N2)的源极连接,栅极与第五N晶体管(N5)的栅极、第四N晶体管(N4)的源接连接,源极接地;The drain of the sixth N transistor (N6) is connected to the source of the second N transistor (N2), the gate is connected to the gate of the fifth N transistor (N5), and the source of the fourth N transistor (N4), and the source pole grounding;
第二三极管(T2)的基极与第二P晶体管(P2)的栅极、漏极及第一P晶体管(P1)的栅极连接,集电极与发射极同时接地;The base of the second triode (T2) is connected to the gate and drain of the second P transistor (P2) and the gate of the first P transistor (P1), and the collector and emitter are grounded simultaneously;
第一P晶体管(P1)的漏极与第二N晶体管(N2)的漏极连接,源极与第二P晶体管(P2)的源极同时与电源电压VDD连接;The drain of the first P transistor (P1) is connected to the drain of the second N transistor (N2), and the source and the source of the second P transistor (P2) are simultaneously connected to the power supply voltage VDD;
所述第一三极管(T1)和第二三极管(T2)均是光敏三极管。Both the first transistor (T1) and the second transistor (T2) are photosensitive transistors.
本实施例中,还至少包括一反相电路,反相电路包括第三P晶体管(P3)、第三N晶体管(N3),第三P晶体管(P3)与第三N晶体管(N3)在电源端与地之间串联连接,第三P晶体管(P3)的源极接到电源端,第三N晶体管(N3)的栅极与第三P晶体管(P3)的栅极同时接到第二N晶体管(N2)的源极,源极接地,漏极接到第三P晶体管(P3)的漏极,并输出感应电信号。In this embodiment, at least one inverter circuit is included, the inverter circuit includes a third P transistor (P3), a third N transistor (N3), and the third P transistor (P3) and the third N transistor (N3) are connected to the power supply Terminal and ground are connected in series, the source of the third P transistor (P3) is connected to the power supply terminal, the gate of the third N transistor (N3) and the gate of the third P transistor (P3) are connected to the second N The source of the transistor (N2), the source is grounded, and the drain is connected to the drain of the third P transistor (P3), and outputs an induction electrical signal.
第一三极管(T1)的光敏区全部面积接收光照射,第二三极管(T2)的发射区面积按预设比例值接收光照射。本实施例中,预设比例值取决于第一P晶体管(P1)的宽度与第二P晶体管(P2)的宽度之比。The entire area of the photosensitive area of the first triode (T1) receives light irradiation, and the area of the emission area of the second triode (T2) receives light irradiation according to a preset ratio. In this embodiment, the preset ratio depends on the ratio of the width of the first P transistor ( P1 ) to the width of the second P transistor ( P2 ).
第一三极管(T1)的导通电平与第二三极管(T2)的导通电平相一致。The conduction level of the first triode (T1) is consistent with the conduction level of the second triode (T2).
本实施例中,第一P晶体管(P1)、第二P晶体管(P2)及第三P晶体管(P3)为PMOS管,第一N晶体管(N1)、第二N晶体管(N2)、第三N晶体管(N3)、第四N晶体管(N4)、第五N晶体管(N5)及第六N晶体管(N6)为NMOS管。In this embodiment, the first P transistor (P1), the second P transistor (P2) and the third P transistor (P3) are PMOS transistors, the first N transistor (N1), the second N transistor (N2), the third The N transistor (N3), the fourth N transistor (N4), the fifth N transistor (N5) and the sixth N transistor (N6) are NMOS transistors.
需要说明的是,晶体管可以是采用场效应管、双极晶体管中的一种或多种。晶体管也可以是耗尽型N沟道MOS晶体管的栅极与源极连接的结构,虽未作图示,不过当然也可以是将耗尽型P沟道MOS晶体管的栅极与源极连接的结构。It should be noted that the transistor may be one or more of a field effect transistor and a bipolar transistor. The transistor may also be a structure in which the gate of a depletion-type N-channel MOS transistor is connected to the source. Although not shown in the figure, it may of course also be a structure in which the gate of a depletion-type P-channel MOS transistor is connected to the source. structure.
光敏三极管T1、T2受到光照时输出的电流总和称为光电流,光电流的大小与光信号的强度成正比。作为传感器使用的光敏三极管T1、T2,在受到何种程度的光照时会输出何种大小的光电流,这是已知的,甚至可以以很小的步进幅度列出一幅表格显示两者的具体数值与对应关系。The sum of the output currents of the phototransistors T1 and T2 when they are illuminated is called photocurrent, and the magnitude of the photocurrent is proportional to the intensity of the light signal. The phototransistors T1 and T2 used as sensors, what kind of photocurrent will be output when they are exposed to what degree of light, this is known, and a table can even be listed in a small step to show the two The specific value and corresponding relationship.
该光电流经过第一P晶体管(P1)与第二P晶体管(P2)的传递及放大到达第一P晶体管(P1)、第二P晶体管(P2)的漏端电流。其中第一P晶体管(P1)与第二P晶体管(P2)的宽度之比决定了光电流的放大倍数。本实施例中,第一P晶体管(P1)或第二N晶体管(N2)的宽度是第二P晶体管(P2)的宽度1-20倍。并且,第一N晶体管(N1)与第二N晶体管(N2)的长度相等。The photocurrent reaches the drain terminal current of the first P transistor (P1) and the second P transistor (P2) through the transmission and amplification of the first P transistor (P1) and the second P transistor (P2). The ratio of the widths of the first P transistor (P1) to the second P transistor (P2) determines the magnification of the photocurrent. In this embodiment, the width of the first P transistor (P1) or the second N transistor (N2) is 1-20 times the width of the second P transistor (P2). Moreover, the lengths of the first N transistor (N1) and the second N transistor (N2) are equal.
本实施例中的传感器电路可以实现光照度从300-30000lux的检测,并且具有面积小、功耗低、反应灵敏等特点。该传感器电路中的所有器件都可由标准CMOS工艺实现,可用于在半导体芯片中。The sensor circuit in this embodiment can realize the detection of illuminance from 300-30000 lux, and has the characteristics of small area, low power consumption, and sensitive response. All devices in the sensor circuit can be implemented by standard CMOS technology, which can be used in semiconductor chips.
最后应说明的是:以上各实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述各实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention, rather than limiting them; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: It is still possible to modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the technical solutions of the various embodiments of the present invention. scope.
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