CN108152251A - A kind of blacker-than-black material reflection ratio measuring device and method - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及激光测量技术领域，具体涉及一种超黑材料反射比测量装置及方法。The invention relates to the technical field of laser measurement, in particular to a device and method for measuring the reflectance of ultra-black materials.
背景技术Background technique
材料反射比特性是材料的基础特性，反映了材料对光的调制能力。材料反射比的测量装置和方法虽然经过近百年的发展，但是其结构几乎一直是以溴钨灯(或者钨丝灯)为光源，光栅为分光器件，积分球为光收集部件的测量模式。其缺点在于，溴钨灯虽然光谱较宽，但是发光强度弱，分光后，单色辐射较弱，故测量下限受限，对于超黑材料的反射比测量无能为力。少数采用激光器为光源的设备，虽然光源较强，可以测量超低反射比，但是存在波段范围过窄，环境杂光干扰大等问题，测量结果准确度难以保证。The material reflectance characteristic is the basic characteristic of the material, which reflects the ability of the material to modulate light. Although the measurement device and method of material reflectance have been developed for nearly a hundred years, its structure almost always uses bromine tungsten lamp (or tungsten filament lamp) as the light source, the grating as the spectroscopic device, and the integrating sphere as the light collection component. The disadvantage is that although the bromine tungsten lamp has a wide spectrum, its luminous intensity is weak. After splitting, the monochromatic radiation is weak, so the lower limit of measurement is limited, and it is powerless for the reflectance measurement of ultra-black materials. A few devices that use lasers as light sources, although the light source is strong, can measure ultra-low reflectance, but there are problems such as too narrow band range and large environmental stray light interference, which makes it difficult to guarantee the accuracy of measurement results.
因此，如何提出一种方法，能够实现超低反射比的准确测量，成为亟待解决的问题。Therefore, how to propose a method to achieve accurate measurement of ultra-low reflectance has become an urgent problem to be solved.
发明内容Contents of the invention
针对现有技术中的缺陷，本发明提供了一种超黑材料反射比测量装置及方法。Aiming at the defects in the prior art, the present invention provides a device and method for measuring the reflectance of ultra-black materials.
第一方面，本发明提供一种超黑材料反射比测量装置，包括：光源、声光调制器、透镜、U型光陷阱、积分球、探测器、宽动态范围信号采集器和计算机，其中：所述U型光陷阱放置于所述透镜和所述积分球之间，由一个反射镜和一个反向的U型吸光筒组成，用于吸收所述光源发出的光。In the first aspect, the present invention provides a device for measuring the reflectance of ultra-black materials, including: a light source, an acousto-optic modulator, a lens, a U-shaped light trap, an integrating sphere, a detector, a wide dynamic range signal collector and a computer, wherein: The U-shaped light trap is placed between the lens and the integrating sphere, and is composed of a reflecting mirror and a reversed U-shaped light-absorbing tube for absorbing the light emitted by the light source.
第二方面，本发明提供一种超黑材料反射比测量方法，包括：In a second aspect, the present invention provides a method for measuring the reflectance of an ultra-black material, comprising:
获取标准白板的系统信号S1、待测样品的系统信号S2和加入U型光陷阱的系统信号S3；Obtain the system signal S1 of the standard whiteboard, the system signal S2 of the sample to be tested, and the system signal S3 of the U-shaped optical trap;
计算所述待测样品的反射比为x＝(S2-S3)*R/(S1-S3)，其中R为所述标准白板的反射比值。Calculate the reflectance of the sample to be tested as x=(S2-S3)*R/(S1-S3), wherein R is the reflectance value of the standard whiteboard.
本发明提供的超黑材料反射比测量装置及方法，以超连续谱光源作为宽光谱超低反射比测量装置的光源，用声光调制器作为系统分光器件，以超低发射比的光阑作为系统零点，高漫射比白板作为系统的量值基准点，实现超低反射比的准确测量。The ultra-black material reflectance measuring device and method provided by the present invention use a supercontinuum light source as the light source of the wide-spectrum ultra-low reflectance measuring device, use an acousto-optic modulator as a system spectroscopic device, and use an ultra-low emissivity stop as the light source. The zero point of the system and the high-diffusion ratio whiteboard are used as the system's measurement reference point to achieve accurate measurement of ultra-low reflectance.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作一简单地介绍，显而易见地，下面描述中的附图是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1为本发明实施例提供的超黑材料反射比测量装置的结构示意图；Fig. 1 is the structural representation of the ultra-black material reflectance measuring device provided by the embodiment of the present invention;
图2为本发明又一实施例提供的超黑材料反射比测量装置的结构示意图；Fig. 2 is the structural representation of the ultra-black material reflectance measuring device that another embodiment of the present invention provides;
图3为本发明实施例提供的U型光陷阱的结构示意图；3 is a schematic structural diagram of a U-shaped optical trap provided by an embodiment of the present invention;
图4为本发明实施例提供的超黑材料反射比测量方法的流程示意图。Fig. 4 is a schematic flowchart of a method for measuring reflectance of an ultra-black material provided by an embodiment of the present invention.
附图标记说明：Explanation of reference signs:
01—光源； 02—声光调制器； 03—透镜；01—light source; 02—acousto-optic modulator; 03—lens;
04—U型光陷阱； 05—积分球； 06—被测样品；04—U-shaped light trap; 05—integrating sphere; 06—measured sample;
07—探测器； 08—宽动态范围信号采集器；09—计算机；07—detector; 08—wide dynamic range signal collector; 09—computer;
10—积分球开口； 11—透镜平移台； 12—挡光光阑；10—integrating sphere opening; 11—lens translation stage; 12—light blocking diaphragm;
13—杂光屏蔽罩； 14—参比样品； 15—光阑；13—shielding cover for stray light; 14—reference sample; 15—diaphragm;
31—光陷阱开口； 32—平面反射镜； 33—吸光筒开口；31—light trap opening; 32—plane reflector; 33—light absorbing tube opening;
34—吸光筒。34—light-absorbing cylinder.
具体实施方式Detailed ways
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
图1为本发明实施例提供的超黑材料反射比测量装置的结构示意图，如图1所示，所述装置包括：光源01、声光调制器02、透镜03、U型光陷阱04、积分球05、探测器07、宽动态范围信号采集器08和计算机09，其中：所述U型光陷阱04放置于所述透镜03和所述积分球04之间，由一个反射镜32和一个反向的U型吸光筒34组成，用于吸收所述光源发出的光。Fig. 1 is a schematic structural diagram of the ultra-black material reflectance measurement device provided by the embodiment of the present invention. As shown in Fig. 1, the device includes: light source 01, acousto-optic modulator 02, lens 03, U-shaped optical trap 04, integrating sphere 05, detector 07, wide dynamic range signal collector 08 and computer 09, wherein: the U-shaped light trap 04 is placed between the lens 03 and the integrating sphere 04, and a reflector 32 and a reflector The U-shaped light-absorbing cylinder 34 is formed to absorb the light emitted by the light source.
具体地，图2为本发明又一实施例提供的超黑材料反射比测量装置的结构示意图，如图2所示，所述装置包括：光源01、声光调制器02、透镜03、U型光陷阱04、积分球05、探测器07、宽动态范围信号采集器08和计算机09，还包括光阑15，杂光屏蔽罩13，其中透镜03为高纯石英透镜；Specifically, Fig. 2 is a schematic structural diagram of an ultra-black material reflectance measurement device provided by another embodiment of the present invention. As shown in Fig. 2, the device includes: a light source 01, an acousto-optic modulator 02, a lens 03, a U-shaped Optical trap 04, integrating sphere 05, detector 07, wide dynamic range signal collector 08 and computer 09, also includes diaphragm 15, stray light shielding cover 13, wherein lens 03 is a high-purity quartz lens;
光源01发出的光入射到声光调制器22中，声光调制器02调整到合适的频率，使得输出为某波长的单色光，该单色光经过光阑15整形后，经过杂光屏蔽罩13的开口，入射到杂光屏蔽罩13的内部，经过透镜03进一步整形，入射到积分球05内部。The light emitted by the light source 01 is incident on the acousto-optic modulator 22, and the acousto-optic modulator 02 is adjusted to a suitable frequency so that the output is a monochromatic light of a certain wavelength. The monochromatic light is shaped by the diaphragm 15 and shielded from stray light. The opening of the cover 13 is incident to the inside of the stray light shielding cover 13 , further shaped by the lens 03 , and incident to the inside of the integrating sphere 05 .
经过调制的单色光经过积分球05内部的漫反射，由探测器07检测到积分球05中的光信号，从而传输到宽动态范围信号采集器08，将光信号转化成系统信号即电信号，进而传输到计算机09，由计算机09进行计算。The modulated monochromatic light passes through the diffuse reflection inside the integrating sphere 05, and the optical signal in the integrating sphere 05 is detected by the detector 07, and then transmitted to the wide dynamic range signal collector 08, which converts the optical signal into a system signal, that is, an electrical signal , and then transmitted to the computer 09 for calculation by the computer 09.
其中，探测器07检测的光信号包括被测样品06的反射信号、参比样品14的反射信号和系统中增加U型光陷阱的光信号。Wherein, the optical signal detected by the detector 07 includes the reflection signal of the measured sample 06, the reflection signal of the reference sample 14, and the optical signal of the U-shaped optical trap added in the system.
图3为本发明实施例提供的U型光陷阱的结构示意图，如图3所示，在检测增加U型光陷阱04的时候，U型光陷阱04必须安置在透镜03和积分球05之间。U型光陷阱04由一个反射镜32和一个反向的U型吸光筒34组成。Figure 3 is a schematic structural diagram of the U-shaped optical trap provided by the embodiment of the present invention. As shown in Figure 3, when the U-shaped optical trap 04 is added for detection, the U-shaped optical trap 04 must be placed between the lens 03 and the integrating sphere 05 . The U-shaped light trap 04 is composed of a reflector 32 and a reversed U-shaped light-absorbing cylinder 34 .
入射光线通过开口入射到U型光陷阱04内部，经过一个平面反射镜32反射到一端封闭的U型吸光筒中34，且必须保证入射光束的直径约等于U型吸光筒开口33的直径的一半，且全部入射到U型吸光筒34中。The incident light enters the inside of the U-shaped optical trap 04 through the opening, and is reflected by a flat reflector 32 into the U-shaped light-absorbing cylinder 34 with one end closed, and it must be ensured that the diameter of the incident beam is approximately equal to half the diameter of the opening 33 of the U-shaped light-absorbing cylinder. And all of them are incident into the U-shaped light-absorbing cylinder 34 .
U型光陷阱的总反射比原则上应当比被测样品的反射比低2个数量级，以使得系统有足够高测量动态范围，保障测量的准确度。In principle, the total reflectance of the U-shaped optical trap should be 2 orders of magnitude lower than the reflectance of the sample to be measured, so that the system has a sufficiently high measurement dynamic range to ensure the accuracy of the measurement.
本发明提供的超黑材料反射比测量装置，实现了宽波段范围内，超黑材料超低反射比的量值准确测量，利用该装置可以实现400nm-2500nm波段范围内的超黑材料反射比的高精度测量，量值测量下限可以达到0.001％的水平。The ultra-black material reflectance measurement device provided by the present invention realizes the accurate measurement of the ultra-low reflectance of ultra-black materials within a wide band range, and the device can realize the measurement of the ultra-black material reflectance within the range of 400nm-2500nm High-precision measurement, the lower limit of value measurement can reach the level of 0.001%.
可选地，所述光源为超连续谱光源。Optionally, the light source is a supercontinuum light source.
在上述实施例的基础上，所述光源为超连续谱光源，本发明实施例将超连续谱光源作为宽光谱超低反射比测量装置的光源，可以根据不用的需求，对超连续谱光源进行分光，适合用于各种不同波长的单色光。On the basis of the above embodiments, the light source is a supercontinuum light source. In the embodiment of the present invention, the supercontinuum light source is used as the light source of the wide-spectrum ultra-low reflectance measurement device, and the supercontinuum light source can be used according to different needs. Spectroscopic, suitable for monochromatic light of various wavelengths.
本发明提供的超黑材料反射比测量装置，以超连续谱光源作为宽光谱超低反射比测量装置的光源，用声光调制器作为系统分光器件，以超低发射比的光阑作为系统零点，高漫射比白板作为系统的量值基准点，实现超低反射比的准确测量。The ultra-black material reflectance measurement device provided by the present invention uses a supercontinuum light source as the light source of the wide-spectrum ultra-low reflectance measurement device, uses an acousto-optic modulator as a system spectroscopic device, and uses an ultra-low emission ratio diaphragm as the system zero point , the high-diffusion ratio whiteboard is used as the system's measurement reference point to achieve accurate measurement of ultra-low reflectance.
可选地，所述装置还包括透镜平移台，用于承载所述透镜，使得光束在所述积分球的开口处的光斑最小。Optionally, the device further includes a lens translation stage for carrying the lens so that the light spot of the light beam at the opening of the integrating sphere is minimized.
在上述实施例的基础上，所述装置还包括透镜位移台6，使得透镜03可以左右移动，直至光束在积分球05开口处光斑最小，且在积分球出口10处，光斑直径小于出口直径，且光束中心和积分球入射，积分球出口的中心同心。On the basis of the above-described embodiments, the device also includes a lens displacement stage 6, so that the lens 03 can move left and right until the light beam has the smallest spot at the opening of the integrating sphere 05, and at the exit 10 of the integrating sphere, the spot diameter is smaller than the exit diameter. And the beam center is incident on the integrating sphere, and the center of the integrating sphere exit is concentric.
可选地，所述装置还包括挡光光阑，安装与所述积分球内部，用于避免样品的反射光没有经过积分球匀化直接入射到所述探测器上。Optionally, the device further includes a light-blocking diaphragm installed inside the integrating sphere for preventing the reflected light from the sample from being directly incident on the detector without being homogenized by the integrating sphere.
在上述实施例的基础上，所述装置还包括挡光光阑12，放置于所述积分球05内部，避免样品的反射光没有经过积分球匀化就直接入射到探测器07上，造成测量误差。挡光光阑12需要和积分球05内壁喷涂空间反射分布函数(Bidirectional ReflectanceDistribution Function，BRDF)一致的聚四氟乙烯PTFE材料。On the basis of the above embodiments, the device also includes a light-blocking diaphragm 12, which is placed inside the integrating sphere 05 to prevent the reflected light of the sample from directly incident on the detector 07 without being homogenized by the integrating sphere, resulting in measurement error. The light-blocking diaphragm 12 needs a polytetrafluoroethylene PTFE material consistent with the spatial reflection distribution function (Bidirectional Reflectance Distribution Function, BRDF) sprayed on the inner wall of the integrating sphere 05 .
可选地，所述积分球还包括：积分球出口，用于放置样品，所述样品法线方向与入射光束成一定角度。Optionally, the integrating sphere further includes: an outlet of the integrating sphere for placing a sample, and the normal direction of the sample forms a certain angle with the incident light beam.
可选地，所述样品法线方向与入射光束成8°夹角。Optionally, the normal direction of the sample forms an included angle of 8° with the incident light beam.
在上述实施例的基础上，所述积分球还包括积分球出口10，为一斜向切平面，用于放置被测样品06和参比样品14，保证平面样品安装后，样品法线方向与入射光束的成8度夹角。其目的在于，大部分样品(假设为镜面样品)的反射光的最大光强位于其样品镜面反射处，如果样品法线和入射光重合，则会有不可忽略的一部分能量由于反射从积分球入口处泄露，造成测量误差。On the basis of the foregoing embodiments, the integrating sphere also includes an integrating sphere outlet 10, which is an oblique tangent plane for placing the measured sample 06 and the reference sample 14, so that after the plane sample is installed, the normal direction of the sample is the same as that of the reference sample 14. The angle of the incident beam is 8 degrees. The purpose is that the maximum light intensity of the reflected light of most samples (assumed to be specular samples) is located at the specular reflection of the sample. If the sample normal coincides with the incident light, there will be a non-negligible part of the energy from the entrance of the integrating sphere due to reflection. leakage, causing measurement errors.
本发明提供的超黑材料反射比测量装置，以超连续谱光源作为宽光谱超低反射比测量装置的光源，用声光调制器作为系统分光器件，以超低发射比的光阑作为系统零点，高漫射比白板作为系统的量值基准点，实现超低反射比的准确测量。The ultra-black material reflectance measurement device provided by the present invention uses a supercontinuum light source as the light source of the wide-spectrum ultra-low reflectance measurement device, uses an acousto-optic modulator as a system spectroscopic device, and uses an ultra-low emission ratio diaphragm as the system zero point , The high-diffusivity whiteboard is used as the system's measurement reference point to achieve accurate measurement of ultra-low reflectance.
可选地，所述U型光陷阱内壁喷涂高吸光材料，其中所述U型吸光筒为多壁碳纳米管。Optionally, the inner wall of the U-shaped light trap is sprayed with a high light-absorbing material, wherein the U-shaped light-absorbing cylinder is a multi-walled carbon nanotube.
在上述实施例的基础上，所述U型吸光筒内壁喷涂高吸光材料，多壁碳纳米管。光线经过透镜03入射到U型光陷阱内后，在其内部被多次反复吸收，使得无法泄露出来。U型光陷阱内壁也需喷涂常规的高吸收涂层，避免光线的外泄。U型光陷阱用于排除测量过程中杂散光对测量的影响。On the basis of the above embodiments, the inner wall of the U-shaped light-absorbing cylinder is sprayed with high-light-absorbing materials, multi-walled carbon nanotubes. After the light is incident into the U-shaped light trap through the lens 03, it is repeatedly absorbed inside it so that it cannot leak out. The inner wall of the U-shaped light trap also needs to be sprayed with a conventional high-absorption coating to avoid light leakage. The U-shaped optical trap is used to eliminate the influence of stray light on the measurement during the measurement process.
本发明提供的超黑材料反射比测量装置，以超连续谱光源作为宽光谱超低反射比测量装置的光源，用声光调制器作为系统分光器件，以超低发射比的光阑作为系统零点，高漫射比白板作为系统的量值基准点，实现超低反射比的准确测量。The ultra-black material reflectance measurement device provided by the present invention uses a supercontinuum light source as the light source of the wide-spectrum ultra-low reflectance measurement device, uses an acousto-optic modulator as a system spectroscopic device, and uses an ultra-low emission ratio diaphragm as the system zero point , The high-diffusivity whiteboard is used as the system's measurement reference point to achieve accurate measurement of ultra-low reflectance.
图4为本发明实施例提供的超黑材料反射比测量方法的流程示意图，如图4所示，所述方法包括：Fig. 4 is a schematic flow chart of a method for measuring the reflectance of an ultra-black material provided by an embodiment of the present invention. As shown in Fig. 4, the method includes:
S101、获取标准白板的系统信号S1、待测样品的系统信号S2和加入U型光陷阱的系统信号S3；S101. Obtain the system signal S1 of the standard whiteboard, the system signal S2 of the sample to be tested, and the system signal S3 of the U-shaped optical trap;
S102、计算所述待测样品的反射比为x＝(S2-S3)*R/(S1-S3)，其中R为所述标准白板的反射比值。S102. Calculate the reflectance of the sample to be tested as x=(S2-S3)*R/(S1-S3), wherein R is the reflectance of the standard whiteboard.
本发明实施例提供的超黑材料反射比测量方法，基于本发明实施例提供的测量装置，在测量之前，需要将参比样品即标准白板的反射比值R测量出来，可以采用现有技术来进行测量，并对宽动态信号范围采集器进行标定，例如标定采集器的电压值和/或电流值；The ultra-black material reflectance measurement method provided by the embodiment of the present invention is based on the measuring device provided by the embodiment of the present invention. Before the measurement, it is necessary to measure the reflectance R of the reference sample, that is, the standard whiteboard, which can be carried out by using the existing technology Measure and calibrate the wide dynamic signal range collector, such as calibrating the voltage value and/or current value of the collector;
通过对装置中的声光调制器进行调节，确定要测量的波长，待系统稳定后，将已知反射比值R的标准白板安装在积分球出口处，记录此时宽动态信号范围采集器采集到的系统信号S1；By adjusting the acousto-optic modulator in the device, the wavelength to be measured is determined. After the system is stable, a standard whiteboard with a known reflectance R is installed at the exit of the integrating sphere, and the wide dynamic signal range collected by the collector at this time is recorded. The system signal S1 of
移除标准白板，将待测量样品即超黑材料放入到积分球出口处，记录此时宽动态信号范围采集器采集到的系统信号S2；Remove the standard whiteboard, put the sample to be measured, that is, the ultra-black material, into the outlet of the integrating sphere, and record the system signal S2 collected by the wide dynamic signal range collector at this time;
将U型光陷阱放入到透镜和积分球之间，记录此时宽动态信号范围采集器采集到的系统信号S3；Put the U-shaped optical trap between the lens and the integrating sphere, and record the system signal S3 collected by the wide dynamic signal range collector at this time;
将上述数据上传给计算机，计算被测样品的反射比x＝(S2-S3)*R/(S1-S3)，其中R为所述标准白板的反射比值。Upload the above data to the computer to calculate the reflectance x=(S2-S3)*R/(S1-S3) of the tested sample, where R is the reflectance value of the standard whiteboard.
本发明提供的超黑材料反射比测量方法，以超连续谱光源作为宽光谱超低反射比测量装置的光源，用声光调制器作为系统分光器件，以超低发射比的光阑作为系统零点，高漫射比白板作为系统的量值基准点，实现超低反射比的准确测量。The method for measuring the reflectance of ultra-black materials provided by the present invention uses a supercontinuum light source as the light source of a wide-spectrum ultra-low reflectance measuring device, uses an acousto-optic modulator as a system spectroscopic device, and uses a diaphragm with an ultra-low emission ratio as the zero point of the system , The high-diffusivity whiteboard is used as the system's measurement reference point to achieve accurate measurement of ultra-low reflectance.
以上所描述的装置以及系统实施例仅仅是示意性的，其中所述作为分离部件说明的单元可以是或者也可以不是物理上分开的，作为单元显示的部件可以是或者也可以不是物理单元，即可以位于一个地方，或者也可以分布到多个网络单元上。可以根据实际的需要选择其中的部分或者全部模块来实现本实施例方案的目的。本领域普通技术人员在不付出创造性的劳动的情况下，即可以理解并实施。The device and system embodiments described above are only illustrative, and the units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, It can be located in one place, or it can be distributed to multiple network elements. Part or all of the modules can be selected according to actual needs to achieve the purpose of the solution of this embodiment. It can be understood and implemented by those skilled in the art without any creative effort.
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