CN108380569A - High concentration OH free radical generating means - Google Patents
High concentration OH free radical generating means Download PDFInfo
- Publication number
- CN108380569A CN108380569A CN201810175587.8A CN201810175587A CN108380569A CN 108380569 A CN108380569 A CN 108380569A CN 201810175587 A CN201810175587 A CN 201810175587A CN 108380569 A CN108380569 A CN 108380569A
- Authority
- CN
- China
- Prior art keywords
- generating means
- ultraviolet light
- free radical
- high concentration
- radical generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000003254 radicals Chemical class 0.000 title claims abstract description 28
- 239000012530 fluid Substances 0.000 claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000004891 communication Methods 0.000 claims abstract description 4
- 239000010453 quartz Substances 0.000 claims description 37
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 37
- 239000003708 ampul Substances 0.000 claims description 28
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract description 35
- 238000004140 cleaning Methods 0.000 abstract description 11
- 208000002925 dental caries Diseases 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 229960002163 hydrogen peroxide Drugs 0.000 description 16
- 239000003814 drug Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000007921 spray Substances 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 208000017983 photosensitivity disease Diseases 0.000 description 1
- 231100000434 photosensitization Toxicity 0.000 description 1
- 239000012048 reactive intermediate Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Water Treatments (AREA)
Abstract
The present invention relates to a kind of high concentration OH free radical generating means, including water inlet pipe, tetrafluoro set, ultraviolet light emitting module and guide fluid grating, tetrafluoro set bottom has opening, the ultraviolet light emitting module is two sets, it is fixed in tetrafluoro set, it is separated by guide fluid grating between two ultraviolet light emitting modules, several cavitys are formed between two ultraviolet light emitting modules and guide fluid grating, guide fluid grating bottom end offers several through-holes, described through-hole one end is connected to the cavity respectively, the open communication of the through-hole other end and tetrafluoro set bottom, the water inlet pipe are connected to cavity.The generating means of special designing can not only be by hydrogen peroxide " flattening ", to improve the contact area of ultraviolet light and hydrogen peroxide, it is sprayed onto on object to be cleaned after irradiation reaction and is irradiated cleaning, also constantly irradiate object to be cleaned simultaneously, the generation for considerably increasing OH free radicals, it is simple and reliable for structure to which the efficiency and quality of cleaning greatly improved, it is easy to use, there are preferable market prospects.
Description
Technical field：
The present invention relates to ultraviolet rays cleaning technical field more particularly to a kind of high concentrations for capableing of large-area ultraviolet irradiation
OH free radical generating means.
Background technology：
Ultraviolet rays cleaning technology is to reach removal using the photosensitized oxidation effect of organic compound to be attached on material surface
Organic substance, the material surface after light cleans can reach " atomic cleanliness degree ".UV light source launch wavelengths be 185nm and
The light wave of 254nm has very high energy, when these photons are applied to cleaned body surface, due to most of hydrocarbonization
Close object has stronger absorbability to the ultraviolet light of 185nm wavelength, and divides after absorbing the energy of ultraviolet light of 185nm wavelength
Solution is at ion, free state atom, excited molecule and neutron, and here it is so-called " photosensitizations ".Oxygen molecule in air is being inhaled
Ozone and elemental oxygen are also will produce after having received the ultraviolet light of 185nm wavelength.Ozone equally has the ultraviolet light of 254nm wavelength strong
Strong absorption, ozone are decomposed into elemental oxygen and oxygen again.Wherein elemental oxygen is as lively as a cricket, in the case where it is acted on, object table
The decomposition product of carbon and hydrocarbon on face can be combined to volatilizable gas：Carbon dioxide and vapor etc. escape surface,
To thoroughly remove the carbon and organic pollution that stick on a surface of an.
In addition, if with ultraviolet light oxydol H2O2Equal medicaments, hydrogen peroxide generate OH free radicals etc. under ultraviolet irradiation
Reactive intermediate can greatly improve the efficiency of light cleaning.Being cleaned in the prior art with ultraviolet light hydrogen peroxide medicament mainly has 2
Kind method：First, medicament (hydrogen peroxide) spray is had a ultraviolet lamp above the surface of cleaned material, cleaned material, to clear
Washing carries out ultraviolet irradiation；Second is that by medicament (hydrogen peroxide) spray on ultraviolet lampshade, drop is spread across clear after ultraviolet irradiation
The surface of washing.
Problem of the existing technology：Since medicament (hydrogen peroxide) is to continue spray, so medicament (hydrogen peroxide) is flowing
, under the prior art, the medicament (hydrogen peroxide) of unit volume is smaller by the area of ultraviolet irradiation, and irradiation time is also short, irradiation
Intensity is had a greatly reduced quality, and the efficiency and efficiency of ultraviolet rays cleaning are also had a greatly reduced quality.
Invention content：
The purpose of the present invention is in view of the drawbacks of the prior art, provide a kind of area that can increase ultraviolet irradiation, improve
The intensity of irradiation, the high concentration OH free radical generating means for improving cleaning performance.
The present invention is achieved through the following technical solutions：A kind of high concentration OH free radical generating means, including water inlet pipe,
Tetrafluoro set, ultraviolet light emitting module and guide fluid grating, it is two that tetrafluoro set bottom, which has opening, the ultraviolet light emitting module,
Set is fixed in tetrafluoro set, is separated by guide fluid grating between two ultraviolet light emitting modules, two ultraviolet light emitting modules and water conservancy diversion
Several cavitys are formed between screen, guide fluid grating bottom end offers several through-holes, and described through-hole one end connects with the cavity respectively
Logical, the open communication of the through-hole other end and tetrafluoro set bottom, the water inlet pipe is connected to cavity.
For the ease of ultraviolet light emitting module to be effectively secured in tetrafluoro set, tetrafluoro set bottom end is provided with crotch
Portion.
Since if UV lamp pipe can cause to aoxidize and corrode often in contact with hydrogen peroxide, radiation response and service life are influenced,
Therefore closed quartz ampoule is arranged outside UV lamp pipe, hydrogen peroxide is not contacted with UV lamp pipe, to increase the use longevity of UV lamp pipe
Life.
In a preferred embodiment of the present invention, two quartz ampoule is rectangular, one of two rectangular quartz tubes level
The corresponding setting in face.In order to improve radiation response, inner wall of the quartz ampoule far from guide fluid grating is provided with reflector, quartz ampoule
Inner wall far from tetrafluoro set bottom is provided with reflector.
In another preferred embodiment of the present invention, the two quartz ampoules semicircular in shape, the horizontal plane of two halves circle quartz ampoule
Corresponding setting.In order to improve radiation response, inner wall of the quartz ampoule far from guide fluid grating is provided with reflector.
In another preferred embodiment of the present invention, two quartz ampoule is triangular in shape, and wherein the one of two triangle quartz ampoule
A corresponding setting of horizontal plane.In order to improve radiation response, inner wall of the quartz ampoule far from guide fluid grating is provided with reflector.
Certainly the quartz ampoule of the present invention is not limited only to these above-mentioned shapes.
Preferably, the guide fluid grating of the present invention is made using etch-proof material, the thickness of guide fluid grating is preferred
For 2-4mm.
The advantageous effect of high concentration OH free radical generating means of the present invention is：The generating means of special designing can not only will be double
Oxygen water " flattening " is sprayed onto on object to be cleaned after irradiation reaction and is irradiated clearly to improve the contact area of ultraviolet light and hydrogen peroxide
Wash, while also constantly irradiating object to be cleaned, considerably increase the generation of OH free radicals, to greatly improved cleaning efficiency and
Quality, it is simple and reliable for structure, it is easy to use, there are preferable market prospects.
Description of the drawings
Fig. 1 is the front view of a preferred embodiment of high concentration OH free radical generating means of the present invention；
Fig. 2 is the side view of a preferred embodiment of high concentration OH free radical generating means of the present invention；
Fig. 3 is the vertical view of a preferred embodiment of high concentration OH free radical generating means of the present invention；
Fig. 4 is the side view of another preferred embodiment of high concentration OH free radical generating means of the present invention；
Fig. 5 is the side view of another preferred embodiment of high concentration OH free radical generating means of the present invention；
In figure：1. water inlet pipe, 2. connectors, 3. tetrafluoro sets, 4.UV fluorescent tubes, 5. quartz ampoules, 6. guide fluid gratings, 7. reflectors,
8. through-hole.
Specific implementation mode：
In conjunction with the accompanying drawings, the present invention is further explained in detail.
Embodiment 1：
As shown in Figs. 1-3, a kind of high concentration OH free radical generating means, including water inlet pipe 1, tetrafluoro set 3, ultraviolet light transmitting
Component and guide fluid grating 6, it is two sets that the tetrafluoro, which covers 3 bottoms to have opening, the ultraviolet light emitting module, is fixed on tetrafluoro set
It in 3, is separated by guide fluid grating 6 between two ultraviolet light emitting modules, is formed between two ultraviolet light emitting modules and guide fluid grating 6
Several cavitys, 6 bottom end of guide fluid grating offer several through-holes 8, and 8 one end of the through-hole is connected to the cavity respectively, and through-hole 8 is another
One end covers the open communication of 3 bottoms with tetrafluoro, and the water inlet pipe 1 is connected to cavity, and water inlet pipe 1 is fixed on tetrafluoro by connector 2
Cover 3 tops.
Tetrafluoro set is 3 generally rectangular, and top is closed, and bottom, which has, can allow the opening that ultraviolet light emission is gone out,
Bottom end is provided with hook part, and hook part can prevent ultraviolet light emitting module from being dropped out out of tetrafluoro set 3.
It is arranged closed rectangular quartz tube 5 outside UV lamp pipe 4 and forms ultraviolet light emitting module, rectangular quartz tube 5 is connected to
In tetrafluoro set 3.In order to improve radiation response, inner wall of the rectangular quartz tube 5 far from guide fluid grating 6 is provided with reflector 7, stone
The inner wall that English pipe 5 covers 3 bottoms far from tetrafluoro is provided with reflector 7.Certainly, ultraviolet light emitting module is also not limited to setting two
Set, by three sets, four sets or more some special shapes for being composed of ultraviolet light emitting module are equally applicable to the present invention.
The guide fluid grating 6 of the present invention is made using etch-proof material, and the thickness of guide fluid grating 6 is preferably 2-4mm,
Five cavitys are formed between guide fluid grating 6 and quartz ampoule 5, each cavity bottom offers through-hole 8.
In use, hydrogen peroxide is entered by water inlet pipe 1 in the cavity between guide fluid grating 6 and quartz ampoule 5, UV lamp pipe 4 is logical
The booster action pair five for crossing reflector 7 is irradiated in the hydrogen peroxide of " sheet ", and the hydrogen peroxide after irradiation forms a large amount of OH
Free radical via through holes 8 spray on object to be cleaned, and at the same time, UV lamp pipe 4 constantly irradiates object to be cleaned by the opening of bottom,
To complete to treat the cleaning of cleaning materials.
Embodiment 2：
Difference from Example 1 is, as shown in figure 4, two quartz ampoules, 5 semicircular in shape, two halves circle quartz ampoule 5
The corresponding setting of horizontal plane, formed a generally rounded structure, quartz ampoule 5 far from guide fluid grating 6 inner wall setting
There are reflector 7, reflector 7 to be arranged on the arcwall face of quartz ampoule 5, and covers 3 openings close to tetrafluoro and be not provided with reflector 7.
Embodiment 3：
Difference from Example 1 is, as shown in figure 5, two quartz ampoule 5 is triangular in shape, two triangle quartz ampoule 5
One of the corresponding setting of horizontal plane, formed a generally rectangular structure, quartz ampoule 5 is far from guide fluid grating 6
Inner wall is provided with reflector 7, and covers 3 openings close to tetrafluoro and be not provided with reflector 7.
Certainly, it is more beautiful to may be designed as the moulding such as trapezoidal, triangle for the shape of high concentration OH free radical generating means
The shape of sight, to meet the market demand.
Compared with prior art, the generating means of special designing can not only by hydrogen peroxide " flattening ", with improve ultraviolet light with
The contact area of hydrogen peroxide is sprayed onto on object to be cleaned after irradiation reaction and is irradiated cleaning, while also constantly irradiating object to be cleaned,
The generation for considerably increasing OH free radicals, to which the efficiency and quality of cleaning, simple and reliable for structure, user greatly improved
Just, there are preferable market prospects.
Several embodiments of the invention above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Range.
Claims (9)
1. a kind of high concentration OH free radical generating means, it is characterised in that：Including water inlet pipe, tetrafluoro set, ultraviolet light emitting module
And guide fluid grating, it is two sets that tetrafluoro set bottom, which has opening, the ultraviolet light emitting module, is fixed in tetrafluoro set, two
It is separated by guide fluid grating between ultraviolet light emitting module, several skies is formed between two ultraviolet light emitting modules and guide fluid grating
Chamber, guide fluid grating bottom end offer several through-holes, and described through-hole one end is connected to the cavity respectively, the through-hole other end and tetrafluoro
The open communication of bottom is covered, the water inlet pipe is connected to cavity.
2. high concentration OH free radical generating means according to claim 1, it is characterised in that：Tetrafluoro set bottom end setting
There is the hook part that ultraviolet light emitting module can be fixed in tetrafluoro set.
3. high concentration OH free radical generating means according to claim 1 or 2, it is characterised in that：The luminescence-utraviolet
Component includes UV lamp pipe and quartz ampoule, and the quartz pipe sleeve is located at outside UV lamp pipe.
4. high concentration OH free radical generating means according to claim 3, it is characterised in that：Two quartz ampoule is in square
Shape, the corresponding setting of one of two rectangular quartz tubes horizontal plane.
5. high concentration OH free radical generating means according to claim 4, it is characterised in that：The quartz ampoule is far from water conservancy diversion
The inner wall of screen is provided with reflector, and the inner wall that quartz ampoule covers bottom far from tetrafluoro is provided with reflector.
6. high concentration OH free radical generating means according to claim 3, it is characterised in that：Two quartz ampoule is in semicircle
Shape, the corresponding setting of horizontal plane of two halves circle quartz ampoule.
7. high concentration OH free radical generating means according to claim 6, it is characterised in that：The quartz ampoule is far from water conservancy diversion
The inner wall of screen is provided with reflector.
8. high concentration OH free radical generating means according to claim 3, it is characterised in that：Two quartz ampoule is in triangle
Shape, the corresponding setting of one of two triangle quartz ampoule horizontal plane.
9. high concentration OH free radical generating means according to claim 8, it is characterised in that：The quartz ampoule is far from water conservancy diversion
The inner wall of screen is provided with reflector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810175587.8A CN108380569A (en) | 2018-03-02 | 2018-03-02 | High concentration OH free radical generating means |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810175587.8A CN108380569A (en) | 2018-03-02 | 2018-03-02 | High concentration OH free radical generating means |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108380569A true CN108380569A (en) | 2018-08-10 |
Family
ID=63070253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810175587.8A Pending CN108380569A (en) | 2018-03-02 | 2018-03-02 | High concentration OH free radical generating means |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108380569A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111906093A (en) * | 2020-07-15 | 2020-11-10 | 常州瑞择微电子科技有限公司 | Large-area photon generation spray head |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5698039A (en) * | 1995-02-04 | 1997-12-16 | Leybold Ag | Process for cleaning a substrate using a barrier discharge |
| JP2000070885A (en) * | 1998-09-01 | 2000-03-07 | Ultla Clean Technology Kaihatsu Kenkyusho:Kk | Device and method for cleaning substrate |
| JP2007105621A (en) * | 2005-10-13 | 2007-04-26 | Koichi Ogikubo | Ultraviolet irradiation device for gas and dry surface treatment device |
| CN102167464A (en) * | 2011-03-24 | 2011-08-31 | 同济大学 | Water treatment sterilization method by ultraviolet catalysis hydrogen peroxide matched with chlorine/chloramine |
| CN102791391A (en) * | 2009-11-03 | 2012-11-21 | 哈马技术Ape两合公司 | Method and apparatus for treating substrates |
| US8398816B1 (en) * | 2006-03-28 | 2013-03-19 | Novellus Systems, Inc. | Method and apparatuses for reducing porogen accumulation from a UV-cure chamber |
| CN107180774A (en) * | 2016-03-09 | 2017-09-19 | 东京毅力科创株式会社 | The system and method that gas phase hydroxyl radical free radical for substrate is processed |
-
2018
- 2018-03-02 CN CN201810175587.8A patent/CN108380569A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5698039A (en) * | 1995-02-04 | 1997-12-16 | Leybold Ag | Process for cleaning a substrate using a barrier discharge |
| JP2000070885A (en) * | 1998-09-01 | 2000-03-07 | Ultla Clean Technology Kaihatsu Kenkyusho:Kk | Device and method for cleaning substrate |
| JP2007105621A (en) * | 2005-10-13 | 2007-04-26 | Koichi Ogikubo | Ultraviolet irradiation device for gas and dry surface treatment device |
| US8398816B1 (en) * | 2006-03-28 | 2013-03-19 | Novellus Systems, Inc. | Method and apparatuses for reducing porogen accumulation from a UV-cure chamber |
| CN102791391A (en) * | 2009-11-03 | 2012-11-21 | 哈马技术Ape两合公司 | Method and apparatus for treating substrates |
| CN102167464A (en) * | 2011-03-24 | 2011-08-31 | 同济大学 | Water treatment sterilization method by ultraviolet catalysis hydrogen peroxide matched with chlorine/chloramine |
| CN107180774A (en) * | 2016-03-09 | 2017-09-19 | 东京毅力科创株式会社 | The system and method that gas phase hydroxyl radical free radical for substrate is processed |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111906093A (en) * | 2020-07-15 | 2020-11-10 | 常州瑞择微电子科技有限公司 | Large-area photon generation spray head |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180810 |
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| RJ01 | Rejection of invention patent application after publication |