CN108505001A - A kind of composite wear-resistant layer and preparation method thereof - Google Patents
A kind of composite wear-resistant layer and preparation method thereof Download PDFInfo
- Publication number
- CN108505001A CN108505001A CN201810308825.8A CN201810308825A CN108505001A CN 108505001 A CN108505001 A CN 108505001A CN 201810308825 A CN201810308825 A CN 201810308825A CN 108505001 A CN108505001 A CN 108505001A
- Authority
- CN
- China
- Prior art keywords
- film layer
- composite wear
- magnetron sputtering
- resistant layer
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 43
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 239000010408 film Substances 0.000 claims abstract description 44
- 239000010409 thin film Substances 0.000 claims abstract description 36
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 28
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 58
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 43
- 239000007789 gas Substances 0.000 claims description 37
- 229910052786 argon Inorganic materials 0.000 claims description 29
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 16
- 229910052719 titanium Inorganic materials 0.000 claims description 16
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 11
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 238000010849 ion bombardment Methods 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000010935 stainless steel Substances 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- 229910000975 Carbon steel Inorganic materials 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 239000010962 carbon steel Substances 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 238000005086 pumping Methods 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- 238000004062 sedimentation Methods 0.000 claims 2
- 240000007594 Oryza sativa Species 0.000 claims 1
- 235000007164 Oryza sativa Nutrition 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 239000004411 aluminium Substances 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 235000009566 rice Nutrition 0.000 claims 1
- 238000005260 corrosion Methods 0.000 abstract description 4
- 230000007797 corrosion Effects 0.000 abstract description 4
- 238000003763 carbonization Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 230000036544 posture Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of composite wear-resistant layer and preparation method thereof, wherein the composite wear-resistant layer includes：Titanium carbide nanometer thin film layer and zirconia nanopowder film layer；The titanium carbide nanometer thin film layer is set to the surface of the metal base, and the zirconia nanopowder film layer is set to the surface of the titanium carbide nanometer thin film layer.The composite wear-resistant layer of the present invention can be compound in the surface of tableware, can not only play the role of beautifying tableware, while improve the scratch resistance of tableware, wearability, corrosion resistance, full of the use demand for meeting modernized society people.
Description
Technical field
The present invention relates to technology of thin film material preparation field more particularly to a kind of surfaces for being compound in metal base
Composite wear-resistant layer and preparation method thereof.
Background technology
Tableware is the daily necessities often needed to use in people's daily life.With the development of society, people are for height
The demand of shelves tableware is higher and higher.However, current top grade tableware is limited to the property of material itself, wearability and corrosion-resistant
Property is poor, is unable to fully meet the use demand of people.Therefore, in view of the above-mentioned problems, it is necessary to propose further solution party
Case.
Invention content
The purpose of the present invention is to provide a kind of composite wear-resistant layers and preparation method thereof, existing in the prior art to overcome
It is insufficient.
For achieving the above object, the present invention provides a kind of composite wear-resistant layer, is used to be compound in the table of metal base
Face, the composite wear-resistant layer include：Titanium carbide nanometer thin film layer and zirconia nanopowder film layer；The titanium carbide nano thin-film
Layer is set to the surface of the metal base, and the zirconia nanopowder film layer is set to the table of the titanium carbide nanometer thin film layer
Face.
The improvement of composite wear-resistant layer as the present invention, the titanium carbide nanometer thin film layer are deposited using medium frequency magnetron sputtering
It forms.
As the improvement of composite wear-resistant layer of the invention, the gas being passed through in the medium frequency magnetron sputtering is acetylene.
The improvement of composite wear-resistant layer as the present invention, the zirconia nanopowder film layer are deposited using medium frequency reactive sputtering
It forms.
As the present invention composite wear-resistant layer improvement, the metal base in stainless steel, carbon steel, aluminium alloy one
Kind.
For achieving the above object, the present invention provides a kind of composite wear-resistant layer, is used to be compound in the table of metal base
Face, the composite wear-resistant layer include at least two layers unit film layer being cascading, and any unit film layer includes carbonization
Titanium nanometer thin film layer and zirconia nanopowder film layer, wherein the zirconia nanopowder film layer is set to the titanium carbide nanometer
In film layer, the titanium carbide nanometer thin film layer is set to the surface of substrate layer or the zirconium oxide of unit film layer adjacent thereto
In nanometer thin film layer.
For achieving the above object, the present invention provides a kind of preparation method of composite wear-resistant layer comprising following steps：
S1, metal base is placed in magnetron sputtering space, closing is placed with the magnetron sputtering space of metal base；
S2, closed magnetron sputtering space is vacuumized, it is made to meet the needs of magnetron sputtering；
S3, it is passed through argon gas into magnetron sputtering space, and is powered to titanium target, while high pressure is applied to target surface, under high pressure effect,
The surface of the argon ion bombardment metal base of ionization；
S4, under vacuum conditions is passed through the mixed gas of argon gas and acetylene into magnetron sputtering space and is powered to titanium target, in institute
It states deposition on metal base and forms titanium carbide nanometer thin film layer；
S5, stopping are passed through the mixed gas of argon gas and acetylene, while being powered to titanium target, be passed through into magnetron sputtering space argon gas and
The mixed gas of oxygen simultaneously applies high pressure to zirconium target, deposits to form zirconia nanopowder on the surface of the titanium carbide nanometer thin film layer
Film layer.
The improvement of the preparation method of composite wear-resistant layer as the present invention, in the step S2, to closed magnetron sputtering
When space is vacuumized：
First time pumping is carried out to closed sputtering chamber using aspiration pump, the vacuum degree in magnetron sputtering space is made to reach 2Pa-5Pa,
It is evacuated carrying out second to closed sputtering chamber using aspiration pump, the vacuum degree in magnetron sputtering space is made to reach 1 × 10-4Pa-2
×10-4Pa。
The improvement of the preparation method of composite wear-resistant layer as the present invention, in the step S4, the volume of argon gas and acetylene
Than being 5:2, the time that deposition forms titanium carbide nanometer thin film layer is 15 ~ 180 minutes.
The improvement of the preparation method of composite wear-resistant layer as the present invention, in the step S5, the volume of argon gas and oxygen
Than being 5:1, the time that deposition forms zirconia nanopowder film layer is 2 ~ 20 minutes.
Compared with prior art, the beneficial effects of the invention are as follows：The composite wear-resistant layer of the present invention can be compound in the table of tableware
Face can not only play the role of beautifying tableware, while improve the scratch resistance of tableware, wearability, corrosion resistance, be full of
Meet the use demand of modernized society people.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments described in invention, for those of ordinary skill in the art, without creative efforts,
Other drawings may also be obtained based on these drawings.
Fig. 1 is the schematic diagram of a layer structure of one technical solution of composite wear-resistant layer of the present invention；
Fig. 2 is the schematic diagram of a layer structure of another technical solution of composite wear-resistant layer of the present invention, wherein the quantity of unit film layer is two
Layer.
Specific implementation mode
The present invention is described in detail for each embodiment shown in below in conjunction with the accompanying drawings, but it should explanation, these
Embodiment is not limitation of the present invention, those of ordinary skill in the art according to function, method made by these embodiments,
Or the equivalent transformation in structure or replacement, all belong to the scope of protection of the present invention within.
As shown in Figure 1, the composite wear-resistant layer of the present invention includes：Titanium carbide nanometer thin film layer 1 and zirconia nanopowder film
Layer 2.Wherein, the titanium carbide nanometer thin film layer 1 is set to the surface of the metal base, the zirconia nanopowder film layer 2
It is set to the surface of the titanium carbide nanometer thin film layer 1.
Wherein, the titanium carbide nanometer thin film layer 1 is deposited using medium frequency magnetron sputtering, it is preferable that the intermediate frequency magnetic
The gas being passed through in control sputtering is acetylene.The zirconia nanopowder film layer 2 is deposited using medium frequency reactive sputtering.The gold
Belonging to base material can be selected from one kind in stainless steel, carbon steel, aluminium alloy etc..
As shown in Fig. 2, based on the same technical idea, the present invention also provides a kind of composite wear-resistant layer, being used to be compound in
The surface of metal base, the composite wear-resistant layer include at least two layers unit film layer being cascading.Any unit
Film layer includes titanium carbide nanometer thin film layer 1 and zirconia nanopowder film layer 2, wherein the zirconia nanopowder film layer 2 is arranged
In in the titanium carbide nanometer thin film layer 1, the titanium carbide nanometer thin film layer 1 is set to the surface or adjacent thereto of substrate layer
Unit film layer zirconia nanopowder film layer 2 on.To, in the technical program, it can be achieved that tableware surface recombination multilayer
Wearing layer.
The present invention also provides a kind of preparation methods of composite wear-resistant layer comprising following steps：
S1, metal base is placed in magnetron sputtering space, closing is placed with the magnetron sputtering space of metal base；
S2, closed magnetron sputtering space is vacuumized, it is made to meet the needs of magnetron sputtering；
S3, it is passed through argon gas into magnetron sputtering space, and is powered to titanium target, while high pressure is applied to target surface, under high pressure effect,
The surface of the argon ion bombardment metal base of ionization；
S4, under vacuum conditions is passed through the mixed gas of argon gas and acetylene into magnetron sputtering space and is powered to titanium target, in institute
It states deposition on metal base and forms titanium carbide nanometer thin film layer；
S5, stopping are passed through the mixed gas of argon gas and acetylene, while being powered to titanium target, be passed through into magnetron sputtering space argon gas and
The mixed gas of oxygen simultaneously applies high pressure to zirconium target, deposits to form zirconia nanopowder on the surface of the titanium carbide nanometer thin film layer
Film layer.
With reference to several specific embodiments, above-mentioned preparation method is illustrated.
Embodiment 1
In the present embodiment on the substrate of stainless steel the compound present invention composite wear-resistant layer.Metal base is set by the movements and postures of actors
In magnetron sputtering space, closing is placed with the magnetron sputtering space of metal base.Closed magnetron sputtering space is taken out
Vacuum is to 3 × 10-3Pa.It is passed through argon gas into magnetron sputtering space, and is powered to titanium target, while high pressure is applied to target surface, in height
Under pressure effect, the surface of the argon ion bombardment metal base of ionization.3 × 10-3Under the vacuum environment of Pa, filled using carbonization titanium target
Enter argon gas, until air pressure is 0.5Pa, adjusts bias 100V, duty ratio 20%% sputters 40min with the power of 400W.X-ray
Film thickness gauge measures titanium carbide nano thin-film thickness 1.2um.Using zirconium target, vacuum cavity is evacuated down to 4 × 10-3Pa, is filled with
The volume flow of argon gas is 300sccm, adjusts bias 100V, and duty ratio 20% sputters 10min with the power of 400W.X-ray
Film thickness gauge measures zirconia nanopowder film thickness 0.6um.
Embodiment 2
In the present embodiment on the substrate of stainless steel the compound present invention composite wear-resistant layer.Metal base is set by the movements and postures of actors
In magnetron sputtering space, closing is placed with the magnetron sputtering space of metal base.Closed magnetron sputtering space is taken out
Vacuum is to 1 × 10-3Pa.It is passed through argon gas into magnetron sputtering space, and is powered to titanium target, while high pressure is applied to target surface, in height
Under pressure effect, the surface of the argon ion bombardment metal base of ionization.1 × 10-3Under the vacuum environment of Pa, filled using carbonization titanium target
Enter argon gas, until air pressure is 3Pa, adjusts bias 200V, duty ratio 50% sputters 100min with the power of 1000W.X-ray film
Thick instrument measures titanium carbide nano thin-film thickness 3.6um.Vacuum cavity is evacuated down to 3 × 10-3Pa is filled with the volume flow of argon gas
For 400sccm, reaction gas O2, until air pressure is 0.5Pa, bias 200V is adjusted, duty ratio 50% is splashed with the power of 1000W
Penetrate 20min.X-ray film thickness gauge measures zirconia nanopowder film thickness 1.8um.
Embodiment 3
In the present embodiment on the substrate of carbon steel material the compound present invention composite wear-resistant layer.Metal base is placed in by the movements and postures of actors
In magnetron sputtering space, closing is placed with the magnetron sputtering space of metal base.Closed magnetron sputtering space take out true
Sky is to 2 × 10-3Pa.It is passed through argon gas into magnetron sputtering space, and is powered to titanium target, while high pressure is applied to target surface, in high pressure
Under effect, the surface of the argon ion bombardment metal base of ionization.2 × 10-3Under the vacuum environment of Pa, it is filled with using carbonization titanium target
Ar gas adjusts bias 550V until air pressure is 2Pa, and duty ratio 85% sputters 180min.X ray film thickness with the power of 800W
Instrument measures titanium carbide nano thin-film thickness 1.2um.Vacuum cavity is evacuated down to 2 × 10-3Pa is filled with the volume flow of Ar gases
For 200sccm, it is re-filled with reaction gas CF4, until air pressure is 0.5Pa, adjusts bias 550V, duty ratio 50%, with 400W's
Power sputters 20min.X ray film thickness gauges and measures zirconia nanopowder film thickness 0.6um.
In conclusion the composite wear-resistant layer of the present invention can be compound in the surface of tableware, beautification tableware can be not only played
Effect, while the scratch resistance of tableware, wearability, corrosion resistance are improved, full of meeting making for modernized society people
Use demand.
It is obvious to a person skilled in the art that invention is not limited to the details of the above exemplary embodiments, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, the present embodiments are to be considered as illustrative and not restrictive, and the scope of the present invention is by appended power
Profit requires rather than above description limits, it is intended that all by what is fallen within the meaning and scope of the equivalent requirements of the claims
Variation is included within the present invention.Any reference signs in the claims should not be construed as limiting the involved claims.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiment being appreciated that.
Claims (10)
1. a kind of composite wear-resistant layer is used to be compound in the surface of metal base, which is characterized in that the composite wear-resistant layer packet
It includes：Titanium carbide nanometer thin film layer and zirconia nanopowder film layer；The titanium carbide nanometer thin film layer is set to the Metal Substrate
The surface of material, the zirconia nanopowder film layer are set to the surface of the titanium carbide nanometer thin film layer.
2. composite wear-resistant layer according to claim 1, which is characterized in that the titanium carbide nanometer thin film layer uses intermediate frequency magnetic
Control sputtering sedimentation forms.
3. composite wear-resistant layer according to claim 2, which is characterized in that the gas being passed through in the medium frequency magnetron sputtering is
Acetylene.
4. composite wear-resistant layer according to claim 1, which is characterized in that the zirconia nanopowder film layer is anti-using intermediate frequency
Sputtering sedimentation is answered to form.
5. composite wear-resistant layer according to claim 1, which is characterized in that the metal base is selected from stainless steel, carbon steel, aluminium
One kind in alloy.
6. a kind of composite wear-resistant layer is used to be compound in the surface of metal base, which is characterized in that the composite wear-resistant layer includes
At least two layers unit film layer being cascading, any unit film layer includes titanium carbide nanometer thin film layer and zirconium oxide
Nanometer thin film layer, wherein the zirconia nanopowder film layer is set in the titanium carbide nanometer thin film layer, the titanium carbide is received
Rice film layer is set in the surface of substrate layer or the zirconia nanopowder film layer of unit film layer adjacent thereto.
7. a kind of preparation method of composite wear-resistant layer, which is characterized in that the preparation method of the composite wear-resistant layer includes following step
Suddenly：
S1, metal base is placed in magnetron sputtering space, closing is placed with the magnetron sputtering space of metal base；
S2, closed magnetron sputtering space is vacuumized, it is made to meet the needs of magnetron sputtering；
S3, it is passed through argon gas into magnetron sputtering space, and is powered to titanium target, while high pressure is applied to target surface, under high pressure effect,
The surface of the argon ion bombardment metal base of ionization；
S4, under vacuum conditions is passed through the mixed gas of argon gas and acetylene into magnetron sputtering space and is powered to titanium target, in institute
It states deposition on metal base and forms titanium carbide nanometer thin film layer；
S5, stopping are passed through the mixed gas of argon gas and acetylene, while being powered to titanium target, be passed through into magnetron sputtering space argon gas and
The mixed gas of oxygen simultaneously applies high pressure to zirconium target, deposits to form zirconia nanopowder on the surface of the titanium carbide nanometer thin film layer
Film layer.
8. the improvement of the preparation method of the composite wear-resistant layer as the present invention, in the step S2, to closed magnetron sputtering sky
Between when being vacuumized：
First time pumping is carried out to closed sputtering chamber using aspiration pump, the vacuum degree in magnetron sputtering space is made to reach 2Pa-5Pa,
It is evacuated carrying out second to closed sputtering chamber using aspiration pump, the vacuum degree in magnetron sputtering space is made to reach 1 × 10-4Pa-2
×10-4Pa。
9. the improvement of the preparation method of the composite wear-resistant layer as the present invention, in the step S4, the volume ratio of argon gas and acetylene
It is 5:2, the time that deposition forms titanium carbide nanometer thin film layer is 15 ~ 180 minutes.
10. the improvement of the preparation method of the composite wear-resistant layer as the present invention, in the step S5, the volume ratio of argon gas and oxygen
It is 5:1, the time that deposition forms zirconia nanopowder film layer is 2 ~ 20 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810308825.8A CN108505001A (en) | 2018-04-09 | 2018-04-09 | A kind of composite wear-resistant layer and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810308825.8A CN108505001A (en) | 2018-04-09 | 2018-04-09 | A kind of composite wear-resistant layer and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108505001A true CN108505001A (en) | 2018-09-07 |
Family
ID=63381291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810308825.8A Pending CN108505001A (en) | 2018-04-09 | 2018-04-09 | A kind of composite wear-resistant layer and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108505001A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2163456A (en) * | 1984-07-13 | 1986-02-26 | Katsuhiro Okubo | Method of forming a coloured hard coating |
| CN101462386A (en) * | 2007-12-21 | 2009-06-24 | 山特维克知识产权股份有限公司 | Coated cutting tool and a method of making a coated cutting tool |
| CN102899622A (en) * | 2011-07-29 | 2013-01-30 | 鸿富锦精密工业（深圳）有限公司 | Film-coated component and preparation method thereof |
| CN103436843A (en) * | 2013-09-18 | 2013-12-11 | 佛山市伟盛利得镀膜有限公司 | PVD (physical vapor deposition) composite membrane layer as well as preparation method thereof |
-
2018
- 2018-04-09 CN CN201810308825.8A patent/CN108505001A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2163456A (en) * | 1984-07-13 | 1986-02-26 | Katsuhiro Okubo | Method of forming a coloured hard coating |
| CN101462386A (en) * | 2007-12-21 | 2009-06-24 | 山特维克知识产权股份有限公司 | Coated cutting tool and a method of making a coated cutting tool |
| CN102899622A (en) * | 2011-07-29 | 2013-01-30 | 鸿富锦精密工业（深圳）有限公司 | Film-coated component and preparation method thereof |
| CN103436843A (en) * | 2013-09-18 | 2013-12-11 | 佛山市伟盛利得镀膜有限公司 | PVD (physical vapor deposition) composite membrane layer as well as preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101554790B (en) | Ultra-hard carbon film and preparation method thereof | |
| CN107587133B (en) | A kind of tungsten tipped probe composite diamond coating and preparation method thereof | |
| CN111500982B (en) | Tetrahedral amorphous carbon composite coating and preparation method thereof | |
| CN207313693U (en) | Composite thick film based on DLC film | |
| CN104141109B (en) | Method for in-situ synthesis of composite TiC-DLC coating on surface of titanium | |
| CN106544631A (en) | A kind of chromium carbide multi-gradient composite coating of matrix surface and preparation method thereof | |
| CN108754450A (en) | A kind of low stress diamond-like multi-layer film and preparation method thereof | |
| CN102776481A (en) | Method for preparing gradient transition layer between hard film and substrate | |
| TW201300578A (en) | Housing and method for manufacturing the housing | |
| CN105551579A (en) | Electrochromic multi-layered transparent conductive thin film and preparation method therefor | |
| CN101307424B (en) | Process for preparing zirconia coating | |
| CN107858684A (en) | Metal diamond-like composite coating and preparation method thereof and purposes and coated tool | |
| CN117305761A (en) | A process for enhancing the bonding strength, corrosion resistance and wear resistance of diamond-like coatings | |
| CN110670040A (en) | Water-resistant and hydrogen-resistant Al/Al on surface of uranium metal2O3Composite coating and preparation method thereof | |
| CN104294230A (en) | High-hardness and low-stress multi-element composite diamond-like coating and preparation method thereof | |
| CN117187747A (en) | A gradient-structured dispersion-strengthened high-entropy alloy nitride ceramic coating and its preparation method | |
| CN107513690A (en) | A kind of DLC/cubic boron nitride multi-layer composite coatings and preparation method thereof | |
| CN114807846B (en) | A gradient multi-layer protective coating resistant to solid particle erosion and its preparation method | |
| CN112080723A (en) | Nano-multilayer composite anti-scratch film on the surface of gold products and preparation method thereof | |
| CN112359319B (en) | A kind of preparation method of double-cycle wear-resistant antibacterial and high toughness composite film | |
| CN102905495A (en) | Shell and its preparation method | |
| CN108505001A (en) | A kind of composite wear-resistant layer and preparation method thereof | |
| CN105463372B (en) | A kind of preparation method of MULTILAYER COMPOSITE super thick self-lubricating hard coating | |
| CN114959575B (en) | Insulating wear-resistant protective coating for film sensor, preparation method and application thereof | |
| CN107881469A (en) | Diamond-like composite coating and preparation method thereof and purposes and coated tool |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: 215000 Xiangcheng District Beiqiao, Suzhou, Jiangsu Hope Industrial Park B1 Applicant after: Suzhou Cai Yi Vacuum Technology Co., Ltd. Address before: 215000 Xiangcheng District Beiqiao, Suzhou, Jiangsu Hope Industrial Park B1 Applicant before: Suzhou color coating vacuum coating Co., Ltd. |
|
| CB02 | Change of applicant information | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180907 |
|
| RJ01 | Rejection of invention patent application after publication |