[go: up one dir, main page]

CN108857867B - Diamond grinding pad and preparation process thereof - Google Patents

Diamond grinding pad and preparation process thereof Download PDF

Info

Publication number
CN108857867B
CN108857867B CN201810568850.XA CN201810568850A CN108857867B CN 108857867 B CN108857867 B CN 108857867B CN 201810568850 A CN201810568850 A CN 201810568850A CN 108857867 B CN108857867 B CN 108857867B
Authority
CN
China
Prior art keywords
diamond
abrasive
adhesive
substrate
grinding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201810568850.XA
Other languages
Chinese (zh)
Other versions
CN108857867A (en
Inventor
彭立龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huang Wenkui
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201810568850.XA priority Critical patent/CN108857867B/en
Publication of CN108857867A publication Critical patent/CN108857867A/en
Application granted granted Critical
Publication of CN108857867B publication Critical patent/CN108857867B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/22Lapping pads for working plane surfaces characterised by a multi-layered structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

The invention discloses a diamond grinding pad and a preparation process thereof, wherein the diamond grinding pad comprises a substrate and a grinding material layer arranged on the surface of the substrate, and the grinding material layer comprises the following raw materials in percentage by mass: 5-10% of diamond group abrasive, 70-75% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group; the diamond grinding pad prepared by the formula and the process has the advantages of large removal amount, cutting force guarantee, effective improvement of grinding efficiency, better stability of grinding efficiency, greatly prolonged service life, lower surface roughness of a processed product, great improvement of the surface quality of the processed product and popularization and use worth.

Description

Diamond grinding pad and preparation process thereof
Technical Field
The invention relates to the technical field of grinding pads, in particular to a diamond grinding pad and a preparation process thereof.
Background
With the rapid development of semiconductor chip substrates, the high-speed signal transmission of 5G networks requires the demetalization of communication devices, signal receiving terminals and the like, and superhard materials such as ceramics, high-strength glass, sapphire and the like gradually replace the action of metals in the communication field due to the excellent performance of the superhard materials, and the use of the superhard materials also puts higher requirements on the processing of the superhard materials.
The novel diamond grinding pad is matched with cooling liquid to realize simple and convenient operation, high production efficiency and good stability, can effectively reduce energy consumption, discharge waste, save cost and really realize energy conservation and environmental protection; moreover, the mohs hardness of the superhard materials such as sapphire and ceramic is about 9, and only the diamond material with the mohs hardness of 10 can be ground, so that the demand for developing grinding materials of diamond is more and more increased.
The shape of the artificial single crystal diamond is irregular, and the artificial single crystal diamond is easy to scratch in the grinding process. In addition, in the common grinding process, when the particles are large, the cutting force is large, but the grinding easily causes scratches and scratches, and the surface quality is poor, and when the particles are small, the cutting force is small, but the smoothness is good. This is a contradiction. How to balance cutting force and finish is a goal that high performance abrasives need to achieve.
Disclosure of Invention
In view of the above, the present invention is directed to a diamond polishing pad and a manufacturing process thereof, which can effectively improve the surface quality of the diamond polishing pad while ensuring high polishing efficiency.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides a diamond grinding pad, including the base plate with set up the abrasive material layer on the base plate surface, abrasive material layer 1, a diamond grinding pad, including the base plate with set up the abrasive material layer on the base plate surface, the abrasive material layer is including following mass percent raw materials: 5-10% of diamond group abrasive, 70-75% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
Preferably, the single-particle diamond is single-crystal diamond, which is subjected to a surface modifier and an acid-base treatment.
Preferably, the adhesive is an inorganic or organic adhesive.
Preferably, the adhesive is a ceramic adhesive, a metal bonding agent, a UV adhesive or an epoxy resin.
Preferably, the filler is one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
Preferably, the diamond group abrasive has a particle size of 50 to 80 μm.
Preferably, the abrasive layer is attached and fixed on the surface of the substrate through an adhesive layer.
As a preferable scheme, a back glue layer is adhered to the bottom surface of the substrate.
Preferably, the abrasive layer comprises a base and a plurality of grinding block portions integrally extending from the surface of the base, and the plurality of grinding block portions are arranged at intervals.
A preparation process of a diamond grinding pad comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; then, solidifying and screening the spherical aggregate to obtain diamond group abrasive with proper granularity;
(2) preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1) with an adhesive and a filler, fully dispersing, and vacuumizing to eliminate bubbles to obtain required slurry; adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process to obtain a required abrasive layer;
(3) and (3) taking the substrate, and attaching and fixing the abrasive material layer on the surface of the substrate.
Compared with the prior art, the invention has obvious advantages and beneficial effects, and specifically, the technical scheme includes that:
the diamond grinding pad prepared by the formula and the process has the advantages of large removal amount, cutting force guarantee, effective improvement of grinding efficiency, better stability of grinding efficiency, greatly prolonged service life, lower surface roughness of a processed product, great improvement of the surface quality of the processed product and popularization and use worth.
To more clearly illustrate the structural features and effects of the present invention, the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments:
drawings
Fig. 1 is a schematic structural view of the present invention.
The attached drawings indicate the following:
10. substrate 20, abrasive layer
30. Adhesive layer 40, backing adhesive layer.
Detailed Description
Referring to fig. 1, a specific structure of a diamond polishing pad according to the present invention is shown, which includes a substrate 10 and an abrasive layer 20 disposed on a surface of the substrate 10, wherein the abrasive layer 20 includes the following raw materials by mass: 5-10% of diamond group abrasive, 70-75% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is an inorganic or organic adhesive, or the adhesive is a ceramic adhesive, a metal bonding agent, UV (ultraviolet) glue or epoxy resin, and the filler is one or more of calcium carbonate, limestone, wollastonite and silicon dioxide. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device. Abrasive layer 20 is including basal portion 21 and in the integrative abrasive brick portion 22 that extends in basal portion 21 surface, and abrasive brick portion 22 is a plurality of, and a plurality of abrasive brick portions 22 interval are arranged, and abrasive brick portion 22 can be triangle-shaped, rectangle, square, rhombus, pentagon, hexagon, circular etc. to, in this embodiment, abrasive brick portion 22 is the square, and not for the limit.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
The invention is illustrated in more detail below in the following examples:
example 1:
the specific structure of a diamond grinding pad comprises a substrate 10 and a grinding material layer 20 arranged on the surface of the substrate 10, wherein the grinding material layer 20 comprises the following raw materials in percentage by mass: 8 percent of diamond group abrasive, 72 percent of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is an inorganic adhesive, and the filler is calcium carbonate. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
The diamond polishing pad obtained in this example was subjected to the polishing test, and the test results are shown in the following table:
Figure DEST_PATH_IMAGE002
as can be seen from the above table, the diamond grinding pad prepared by the embodiment has the advantages of large removal amount, grinding efficiency improved by 50%, good stability of grinding efficiency, greatly prolonged service life, lower surface roughness of processed products and better surface smoothness.
Example 2:
the specific structure of a diamond grinding pad comprises a substrate 10 and a grinding material layer 20 arranged on the surface of the substrate 10, wherein the grinding material layer 20 comprises the following raw materials in percentage by mass: 5% of diamond group abrasive, 70% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is an organic adhesive, and the filler is limestone. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
According to tests, the diamond grinding pad prepared by the embodiment has the removal amount of 30 microns, the grinding efficiency of 2.5 microns/60 seconds, the grinding efficiency stability of +/-3.5 seconds, the service life of 250 hours and the surface roughness of a processed product of 0.209 microns.
Example 3:
the specific structure of a diamond grinding pad comprises a substrate 10 and a grinding material layer 20 arranged on the surface of the substrate 10, wherein the grinding material layer 20 comprises the following raw materials in percentage by mass: 10% of diamond group abrasive, 74% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is a ceramic adhesive, and the filler is wollastonite. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
According to tests, the diamond grinding pad prepared by the embodiment has the removal amount of 30 microns, the grinding efficiency of 2.6 microns/60 seconds, the grinding efficiency stability of +/-3.2 seconds, the service life of 252 hours and the surface roughness of a processed product of 0.213 microns.
Example 4:
the specific structure of a diamond grinding pad comprises a substrate 10 and a grinding material layer 20 arranged on the surface of the substrate 10, wherein the grinding material layer 20 comprises the following raw materials in percentage by mass: 6% of diamond group abrasive, 75% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is a metal bonding agent, and the filler is silicon dioxide. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
According to tests, the diamond grinding pad prepared by the embodiment has the removal amount of 30 microns, the grinding efficiency of 2.8 microns/60 seconds, the grinding efficiency stability of +/-3.6 seconds, the service life of 248 hours and the surface roughness of a processed product of 0.223 microns.
Example 5:
the specific structure of a diamond grinding pad comprises a substrate 10 and a grinding material layer 20 arranged on the surface of the substrate 10, wherein the grinding material layer 20 comprises the following raw materials in percentage by mass: 7% of diamond group abrasive, 71% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is UV glue, and the filler is calcium carbonate and limestone. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
According to tests, the diamond grinding pad prepared by the embodiment has the removal amount of 30 microns, the grinding efficiency of 2.6 microns/60 seconds, the grinding efficiency stability of +/-3.3 seconds, the service life of 254 hours and the surface roughness of a processed product of 0.211 microns.
Example 6:
the specific structure of a diamond grinding pad comprises a substrate 10 and a grinding material layer 20 arranged on the surface of the substrate 10, wherein the grinding material layer 20 comprises the following raw materials in percentage by mass: 9 percent of diamond group abrasive, 73 percent of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group.
The diamond group abrasive has a particle size of 50-80 μm. The single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali, the adhesive is epoxy resin, and the filler is wollastonite and silicon dioxide. And the abrasive layer 20 is attached and fixed on the surface of the substrate 10 through an adhesive layer 30, and a back glue layer 40 is attached and covered on the bottom surface of the substrate 10 so as to be fixed with an external device.
The invention also discloses a preparation process of the diamond grinding pad, which comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; the spherical agglomerates are then solidified and sieved to obtain diamond group abrasive material of suitable particle size. The curing mode is photocuring or thermocuring; the adhesive used for preparing the diamond group abrasive is inorganic or organic adhesive, or ceramic adhesive, metal bond, UV adhesive or epoxy resin, and all the fillers are one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
(2) Preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1), an adhesive and a filler; after full dispersion, vacuumizing to eliminate bubbles to obtain the required slurry; and adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process so as to obtain the required abrasive layer.
(3) The substrate is taken out, and the abrasive layer 20 is attached and fixed to the surface of the substrate 10.
According to tests, the diamond grinding pad prepared by the embodiment has the removal amount of 30 microns, the grinding efficiency of 2.8 microns/60 seconds, the grinding efficiency stability of +/-3.3 seconds, the service life of 254 hours and the surface roughness of a processed product of 0.224 microns.
The design of the invention is characterized in that: the diamond grinding pad prepared by the formula and the process has the advantages of large removal amount, guaranteed cutting force, effectively improved grinding efficiency, better stability of grinding efficiency, greatly prolonged service life, lower surface roughness of processed products, greatly improved surface quality of the processed products, and worth popularization and use
The above description is only a preferred embodiment of the present invention, and is not intended to limit the technical scope of the present invention, so that any minor modifications, equivalent changes and modifications made to the above embodiment according to the technical spirit of the present invention are within the technical scope of the present invention.

Claims (9)

1. A preparation process of a diamond grinding pad is characterized by comprising the following steps: the diamond grinding pad comprises a substrate and a grinding material layer arranged on the surface of the substrate, wherein the grinding material layer comprises the following raw materials in percentage by mass: 5-10% of diamond group abrasive, 70-75% of adhesive and the balance of filler; wherein the diamond group abrasive is formed from a single particle diamond group;
the method comprises the following steps:
(1) preparing the diamond group abrasive: firstly, mixing and uniformly dispersing single-particle diamond, an adhesive and a filler; then obtaining spherical aggregate by spray drying, fluidized bed or sol-gel method; then, solidifying and screening the spherical aggregate to obtain diamond group abrasive with proper granularity;
(2) preparation of abrasive layer: uniformly mixing and dispersing the diamond group abrasive prepared in the step (1) with an adhesive and a filler, fully dispersing, and vacuumizing to eliminate bubbles to obtain required slurry; adding the obtained slurry into a charging basket of automatic coating equipment, and attaching the slurry in the concave die cavity onto a PET film substrate in a thermosetting or photocuring demolding molding manner by a gravure coating process to obtain a required abrasive layer;
(3) and (3) taking the substrate, and attaching and fixing the abrasive material layer on the surface of the substrate.
2. The process for producing a diamond polishing pad according to claim 1, wherein: the single-particle diamond is single-crystal diamond which is treated by a surface modifier and acid and alkali.
3. The process for producing a diamond polishing pad according to claim 1, wherein: the adhesive is an inorganic or organic adhesive.
4. The process for producing a diamond polishing pad according to claim 1, wherein: the adhesive is ceramic adhesive, metal bonding agent, UV adhesive or epoxy resin.
5. The process for producing a diamond polishing pad according to claim 1, wherein: the filler is one or more of calcium carbonate, limestone, wollastonite and silicon dioxide.
6. The process for producing a diamond polishing pad according to claim 1, wherein: the diamond group abrasive has a particle size of 50-80 μm.
7. The process for producing a diamond polishing pad according to claim 1, wherein: the abrasive layer is attached and fixed on the surface of the substrate through the bonding layer.
8. The process for producing a diamond polishing pad according to claim 1, wherein: and a back glue layer is adhered to the bottom surface of the substrate.
9. The process for producing a diamond polishing pad according to claim 1, wherein: the abrasive layer comprises a base and a plurality of grinding block parts integrally extending out of the surface of the base, and the grinding block parts are arranged at intervals.
CN201810568850.XA 2018-06-05 2018-06-05 Diamond grinding pad and preparation process thereof Active CN108857867B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810568850.XA CN108857867B (en) 2018-06-05 2018-06-05 Diamond grinding pad and preparation process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810568850.XA CN108857867B (en) 2018-06-05 2018-06-05 Diamond grinding pad and preparation process thereof

Publications (2)

Publication Number Publication Date
CN108857867A CN108857867A (en) 2018-11-23
CN108857867B true CN108857867B (en) 2020-09-25

Family

ID=64336540

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810568850.XA Active CN108857867B (en) 2018-06-05 2018-06-05 Diamond grinding pad and preparation process thereof

Country Status (1)

Country Link
CN (1) CN108857867B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112980391A (en) * 2021-03-02 2021-06-18 河北思瑞恩新材料科技有限公司 Coarse grinding fluid for processing silicon carbide wafer and preparation method thereof
CN114161230B (en) * 2021-11-29 2024-04-12 凯吉斯金刚石(广州)有限公司 Renovating process of marble table top
CN119772797A (en) * 2024-12-31 2025-04-08 东莞金太阳研磨股份有限公司 Diamond abrasive belt and preparation process thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0733436A1 (en) * 1995-03-23 1996-09-25 Honda Giken Kogyo Kabushiki Kaisha Lap structure of a lapping tool
CN1954042A (en) * 2004-09-23 2007-04-25 六号元素(控股)公司 Polycrystalline abrasive materials and method of manufacture
CN101219530A (en) * 2008-02-03 2008-07-16 北京国瑞升科技有限公司 Granulated abrasive paper and its preparation method and application
CN101668825A (en) * 2007-01-23 2010-03-10 圣戈本磨料股份有限公司 Coated abrasive product comprising aggregates
CN103465155A (en) * 2013-09-06 2013-12-25 蓝思科技股份有限公司 Epoxy resin type diamond grinding pad and manufacturing method thereof
US20130344785A1 (en) * 2012-06-21 2013-12-26 Design Technologies Llc Surface treating device
CN104128880A (en) * 2014-07-21 2014-11-05 蓝思科技股份有限公司 Grinding pad special for modified epoxy resin type ceramic and preparation method thereof
CN104786138A (en) * 2015-04-13 2015-07-22 蓝思科技(长沙)有限公司 Resin bonding agent type diamond grinding pad and manufacturing method thereof
CN105234806A (en) * 2015-09-29 2016-01-13 蓝思科技(长沙)有限公司 Resin binder form diamond abrasive pad and preparation method thereof

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0733436A1 (en) * 1995-03-23 1996-09-25 Honda Giken Kogyo Kabushiki Kaisha Lap structure of a lapping tool
CN1954042A (en) * 2004-09-23 2007-04-25 六号元素(控股)公司 Polycrystalline abrasive materials and method of manufacture
CN101668825A (en) * 2007-01-23 2010-03-10 圣戈本磨料股份有限公司 Coated abrasive product comprising aggregates
CN101219530A (en) * 2008-02-03 2008-07-16 北京国瑞升科技有限公司 Granulated abrasive paper and its preparation method and application
US20130344785A1 (en) * 2012-06-21 2013-12-26 Design Technologies Llc Surface treating device
CN103465155A (en) * 2013-09-06 2013-12-25 蓝思科技股份有限公司 Epoxy resin type diamond grinding pad and manufacturing method thereof
CN104128880A (en) * 2014-07-21 2014-11-05 蓝思科技股份有限公司 Grinding pad special for modified epoxy resin type ceramic and preparation method thereof
CN104786138A (en) * 2015-04-13 2015-07-22 蓝思科技(长沙)有限公司 Resin bonding agent type diamond grinding pad and manufacturing method thereof
CN105234806A (en) * 2015-09-29 2016-01-13 蓝思科技(长沙)有限公司 Resin binder form diamond abrasive pad and preparation method thereof

Also Published As

Publication number Publication date
CN108857867A (en) 2018-11-23

Similar Documents

Publication Publication Date Title
CN108857867B (en) Diamond grinding pad and preparation process thereof
CN111216037B (en) Polishing pad and preparation method thereof
CN101704224B (en) Solidified abrasive grinding and polishing pad with transition layer and bonding layer
CN107553312B (en) A kind of three-dimensional abrasive and preparation method thereof
CN108393792B (en) Active filler pore-forming agent, resin grinding tool containing pore-forming agent and manufacturing method of resin grinding tool
CN103709993B (en) Self-sharpening diamond abrasive material and preparation method thereof
CN103465155A (en) Epoxy resin type diamond grinding pad and manufacturing method thereof
CN105856089A (en) Grinding composite body and preparation method thereof
CN104802099B (en) A kind of abrading block, its preparation method and application with big filings-containing cavity
CN108453619B (en) Thinning Wheels for Sapphire Substrates
CN105950114B (en) A kind of outer membrane mixing diamond spherical abrasive material and preparation method thereof
CN107502199A (en) A kind of preparation method of monolayer surface abrasive particle gel ball
CN111251175A (en) Grinding pad and preparation method and application thereof
CN100478137C (en) Abrasive cloth and producing method thereof
CN109571237B (en) Diamond polishing film and preparation method and application thereof
CN105397651A (en) Casting-molded superfine diamond grinding wheel for jewel polishing and manufacturing method for casting-molded superfine diamond grinding wheel
CN109366347A (en) A kind of grinding pad and preparation method thereof suitable for hard brittle material precise finiss
CN104589203A (en) Grinding sheet with fluff structure and preparing method thereof
CN107083192A (en) A kind of preparation method of alumina polishing solution
CN109277955B (en) A kind of grinding wheel, preparation method and application for the grinding of QFN semiconductor sealing material
CN107571166B (en) A kind of sand paper and preparation method thereof
CN102259310A (en) A superhard coated abrasive, its manufacturing method and special napping equipment
Liu et al. Fabrication of ultra-fine diamond abrasive tools by sol-gel
CN112157580A (en) Silicon wafer grinding disc and preparation method and application thereof
CN114633207A (en) Diamond thinning pad and manufacturing method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right

Effective date of registration: 20200513

Address after: The land tax in Hunan province 414000 dormitory town house neighborhood in Yueyang District of Junshan City

Applicant after: Huang Wenkui

Address before: 516000 Guangming Village, tongkai high tech Zone, Huizhou, Guangdong, China.

Applicant before: HUIZHOU CRT NEW MATERIAL Co.,Ltd.

TA01 Transfer of patent application right
GR01 Patent grant
GR01 Patent grant