CN109880434A - Curable composition and use thereof - Google Patents
Curable composition and use thereof Download PDFInfo
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- CN109880434A CN109880434A CN201910135138.5A CN201910135138A CN109880434A CN 109880434 A CN109880434 A CN 109880434A CN 201910135138 A CN201910135138 A CN 201910135138A CN 109880434 A CN109880434 A CN 109880434A
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- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 14
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- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
- Epoxy Resins (AREA)
Abstract
Description
Claims (19)
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| CN109880434B CN109880434B (en) | 2022-04-19 |
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Cited By (3)
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|---|---|---|---|---|
| CN112126275A (en) * | 2020-09-16 | 2020-12-25 | 四川乐凯新材料有限公司 | Photocurable composition for PCB containing alkenyl ether and/or oxetane and radical polymerizable compound |
| CN112143284A (en) * | 2019-06-28 | 2020-12-29 | 常州强力电子新材料股份有限公司 | Radiation-curable ink and use thereof |
| CN114524785A (en) * | 2022-01-22 | 2022-05-24 | 江苏泰特尔新材料科技股份有限公司 | High-purity high-thermal-stability alicyclic epoxy resin monomer and preparation method thereof |
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| CN112143284A (en) * | 2019-06-28 | 2020-12-29 | 常州强力电子新材料股份有限公司 | Radiation-curable ink and use thereof |
| CN112143284B (en) * | 2019-06-28 | 2022-09-27 | 常州强力电子新材料股份有限公司 | Radiation-curable ink and use thereof |
| CN112126275A (en) * | 2020-09-16 | 2020-12-25 | 四川乐凯新材料有限公司 | Photocurable composition for PCB containing alkenyl ether and/or oxetane and radical polymerizable compound |
| CN114524785A (en) * | 2022-01-22 | 2022-05-24 | 江苏泰特尔新材料科技股份有限公司 | High-purity high-thermal-stability alicyclic epoxy resin monomer and preparation method thereof |
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|---|---|
| CN109880434B (en) | 2022-04-19 |
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Effective date of registration: 20210425 Address after: 100070 8th floor, building 2, No.5 Zhonghe Road, Fengtai Science City, Fengtai District, Beijing Applicant after: China Banknote Printing Technology Research Institute Co.,Ltd. Applicant after: CHINA BANKNOTE PRINTING AND MINTING Corp. Address before: 100070 science Road 5, Beijing, Fengtai District Applicant before: SECURITY PRINTING INSTITUTE OF PEOPLE'S BANK OF CHINA Applicant before: CHINA BANKNOTE PRINTING AND MINTING Corp. |
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Address after: 100070 8th floor, building 2, No.5 Zhonghe Road, Fengtai Science City, Fengtai District, Beijing Patentee after: China Banknote Printing Technology Research Institute Co.,Ltd. Patentee after: China Banknote Printing and Minting Group Co.,Ltd. Address before: 100070 8th floor, building 2, No.5 Zhonghe Road, Fengtai Science City, Fengtai District, Beijing Patentee before: China Banknote Printing Technology Research Institute Co.,Ltd. Patentee before: CHINA BANKNOTE PRINTING AND MINTING Corp. |
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