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CN100401048C - A multi-channel microfluidic chip and its preparation method - Google Patents

A multi-channel microfluidic chip and its preparation method Download PDF

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CN100401048C
CN100401048C CNB2005100259568A CN200510025956A CN100401048C CN 100401048 C CN100401048 C CN 100401048C CN B2005100259568 A CNB2005100259568 A CN B2005100259568A CN 200510025956 A CN200510025956 A CN 200510025956A CN 100401048 C CN100401048 C CN 100401048C
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microfluidic chip
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CN1699984A (en
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孔继烈
彭友元
周佳
黄宜平
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Fudan University
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Abstract

微流控芯片具有体积小、分析速度快的特点,可实现高度自动化和集成化,是当前分析化学领域发展的前沿。尽管微流控芯片结合激光诱导荧光检测已可进行384通道的高通量检测,但是多通道电化学检测至今还未见报道。本发明提供了一种多通道微流控芯片,该芯片采用高分子材料聚甲基丙烯酸甲酯为材料,运用光刻和蚀刻等技术制作了单晶硅阳模,微通道采用热压法或原位聚合法制作。将检测电极通道集成于基片上,可在电极内填充功能材料,并且可以有效的精确控制工作电极与分离通道的距离,简化了实验操作。本发明充分的发挥了电化学检测在微流控芯片中的优势,首次研制了应用于电化学检测的多通道微流控芯片,能够高效率、高通量地对样品进行分析。

Figure 200510025956

The microfluidic chip has the characteristics of small size and fast analysis speed, and can realize high automation and integration. It is the frontier of the development of the field of analytical chemistry. Although microfluidic chips combined with laser-induced fluorescence detection have been able to perform high-throughput detection of 384 channels, multi-channel electrochemical detection has not been reported so far. The invention provides a multi-channel microfluidic chip. The chip uses polymer material polymethyl methacrylate as a material, and a single crystal silicon positive mold is made by using technologies such as photolithography and etching. The microchannel adopts hot pressing method or Made by in situ polymerization. The detection electrode channel is integrated on the substrate, the electrode can be filled with functional materials, and the distance between the working electrode and the separation channel can be effectively and precisely controlled, which simplifies the experimental operation. The present invention fully utilizes the advantages of electrochemical detection in microfluidic chips, develops a multi-channel microfluidic chip for electrochemical detection for the first time, and can analyze samples with high efficiency and high throughput.

Figure 200510025956

Description

一种多通道微流控芯片及其制备方法 A multi-channel microfluidic chip and its preparation method

技术领域technical field

本发明涉及微流控芯片领域,研制了一种基于聚甲基丙烯酸甲酯为材料、应用于电化学检测的多通道微流控芯片。本发明还提供了该芯片的制备方法。The invention relates to the field of microfluidic chips, and develops a multi-channel microfluidic chip based on polymethyl methacrylate as a material and applied to electrochemical detection. The invention also provides a preparation method of the chip.

背景技术Background technique

自20世纪90年代初Manz等提出“微全分析系统”的概念以来,分析系统的集成化与便携化成为现代分析仪器的主要发展趋势。与传统的毛细管电泳技术相比,微流控芯片具有样品用量少、分离速度快的优点,但同时对检测的灵敏度和响应速度的要求更高。最常用的检测方式是激光诱导荧光检测(LIF),但是该方法检测所需仪器昂贵,并且庞大笨重。电化学检测(ED)灵敏度高,且所需仪器体积小、易于集成,在尺寸上与芯片实验室的概念匹配。印制的厚膜电极、碳糊、碳纤维作为电极材料也已在微流控芯片电化学检测中得到了广泛的应用。Since the early 1990s when Manz et al. put forward the concept of "micro-total analysis system", the integration and portability of the analysis system has become the main development trend of modern analytical instruments. Compared with traditional capillary electrophoresis technology, microfluidic chip has the advantages of less sample consumption and fast separation speed, but at the same time, it has higher requirements for detection sensitivity and response speed. The most commonly used detection method is laser-induced fluorescence detection (LIF), but the instruments required for detection by this method are expensive, bulky and cumbersome. Electrochemical detection (ED) has high sensitivity, and the required instrument is small in size and easy to integrate, which matches the concept of lab-on-a-chip in size. Printed thick-film electrodes, carbon paste, and carbon fibers have also been widely used in electrochemical detection of microfluidic chips as electrode materials.

最常见的制作芯片的材料是玻璃和石英。玻璃和石英有很好的电渗性质和光学性质,可采用标准的刻蚀技术加工,容易对通道表面进行改性,但难以得到宽深比较大的通道,加工成本高,封接难度大。高分子聚合物作为微流控芯片的材料越来越受到关注。各种类型的高分子聚合物,包括聚二甲基硅氧烷(PDMS)、聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯等都已广泛的用于芯片制作。The most common materials from which chips are made are glass and quartz. Glass and quartz have good electroosmotic and optical properties, and can be processed by standard etching technology, which is easy to modify the surface of the channel, but it is difficult to obtain a channel with a large width and depth, high processing cost, and difficult sealing. High molecular polymers have attracted more and more attention as materials for microfluidic chips. Various types of polymers, including polydimethylsiloxane (PDMS), polymethylmethacrylate (PMMA), polycarbonate, etc., have been widely used in chip fabrication.

与此同时,芯片的集成度也得到了极大的提高,通道的设计形式非常多样。有关微流控芯片的专利申请也日益增多。对2001-2005年的美国专利以microfluidic和chip为关键词组合检索,共有11项专利。其中关于多通道芯片的专利有1项(200401133068,Multi-channel microfluidic chip for electrosprayionization),该专利设计了一种应用于质谱分析的芯片;关于电化学检测的专利为1项(20020079219,Microfluidic chip having integrated electrodes),该专利设计了一种将电极集成于一体的芯片,电极的材料可以金属或导电墨水,在塑料薄膜上将通过电沉积、印刷或其它方式制作电极,该专利主要是侧重于新型电极的制作。At the same time, the integration level of the chip has also been greatly improved, and the design forms of the channels are very diverse. Patent applications related to microfluidic chips are also increasing. The United States patents from 2001 to 2005 were retrieved using microfluidic and chip as keywords, and there were 11 patents in total. Among them, there is one patent on multi-channel chip (200401133068, Multi-channel microfluidic chip for electrosprayionization), which designed a chip for mass spectrometry analysis; one patent on electrochemical detection (20020079219, Microfluidic chip having integrated electrodes), the patent designs a chip that integrates electrodes. The material of the electrodes can be metal or conductive ink, and the electrodes will be made on the plastic film by electrodeposition, printing or other methods. This patent mainly focuses on new Electrode fabrication.

对1985-2005年的中国专利以“多通道”与“芯片”为关键词组合检索有4项专利。其中微流控芯片专利2项,分别是:申请号02256483,发明名称为一种多通道芯片安培检测仪及检测系统,该专利设计了并列的恒电位电流-电压变换器,主要是安培检测仪的设计;申请号:02353129,多通道微流控芯片,为外观设计专利,设计了应用于激光诱导荧光的多通道芯片。以“微流控”与“芯片”为关键词检索共有28项专利,其中应用于电化学检测的专利为1项,申请号03145053,发明名称为电化学检测-微流控芯片及制作方法和再生方法。该专利发明了一种电化学检测-微流控芯片,将含微沟道的硅橡胶聚二甲基硅氧烷基片与载玻片上的电极条对齐,形成微流控通道,微通道出口与检测电极之间距离为20-60微米,电化学检测为柱端检测模式。该发明以商品化的铬板玻璃为材料,通过光刻和湿法腐蚀工艺制作出玻璃硬模板,用于PDMS的模塑成型,制得组成微流控芯片所需的微通道和用于制作电极的软模板。该玻璃硬模板在操作中可反复使用,制作的PDMS微沟道尺寸均一、形状重现性好。周小棉、林炳承等发明了一种微流控芯片(申请号02274236,一种微流控芯片),芯片的宽度为4~6cm,长度为7~9cm,厚度为1~3mm,具有十字构型微通道,该芯片由一块一面集成有十字构型微通道的聚合物平板A和一块聚合物材质的封接平板B叠合而成;两个平板中间形成封闭通道,在其中任意一块平板上设置有通道的进出口,其特征在于:平板B的厚度为100μm~600μm。十字构型微通道可以按一正一反相间排布。Searching Chinese patents from 1985 to 2005 with the combination of keywords "multi-channel" and "chip" yielded 4 patents. Among them, there are 2 microfluidic chip patents, namely: application number 02256483, and the invention name is a multi-channel chip amperometric detector and detection system. This patent designs a parallel constant potential current-voltage converter, mainly an amperometric detector Design; application number: 02353129, multi-channel microfluidic chip, patented for appearance design, designed a multi-channel chip for laser-induced fluorescence. A total of 28 patents were retrieved by using "microfluidics" and "chip" as keywords, of which 1 was applied to electrochemical detection, application number 03145053, and the name of the invention was electrochemical detection-microfluidic chip and its manufacturing method and regeneration method. The patent invented an electrochemical detection-microfluidic chip, which aligns the silicon rubber polydimethylsiloxane sheet containing microchannels with the electrode strips on the glass slide to form a microfluidic channel, and the microchannel outlet The distance between the detection electrode and the detection electrode is 20-60 microns, and the electrochemical detection is the column end detection mode. The invention uses commercial chrome plate glass as the material, and produces a glass hard template through photolithography and wet etching processes, which is used for molding of PDMS, and the microchannels required for the composition of the microfluidic chip are obtained and used for making Soft template for electrodes. The glass hard template can be used repeatedly in operation, and the fabricated PDMS microchannel has uniform size and good shape reproducibility. Zhou Xiaomian, Lin Bingcheng and others invented a microfluidic chip (application number 02274236, a microfluidic chip). The chip has a width of 4-6cm, a length of 7-9cm, a thickness of 1-3mm, and a cross structure. type microchannel, the chip is composed of a polymer plate A with a cross-shaped microchannel integrated on one side and a polymer sealing plate B; a closed channel is formed in the middle of the two plates, and on any one of the plates The entrance and exit of the channel are provided, and the feature is that the thickness of the plate B is 100 μm to 600 μm. The cross-shaped microchannels can be arranged alternately with one forward and one reverse.

从有关微流控芯片的专利检索可以看出,尽管微流控芯片电化学检测所采用的芯片材料与电极材料多种多样,芯片的制作方法较之传统的玻璃芯片也有了长足进展,但仍未突破单通道的局限性,因此,电化学检测在微流控芯片中的优势并未得到真正发挥。From the patent retrieval of microfluidic chips, it can be seen that although the chip materials and electrode materials used in the electrochemical detection of microfluidic chips are various, and the manufacturing method of the chip has made great progress compared with the traditional glass chip, it is still The limitation of single channel has not been broken through, therefore, the advantages of electrochemical detection in microfluidic chips have not been really brought into play.

发明内容Contents of the invention

本发明的一个目的是提供一种应用于电化学检测的多通道微流控芯片。An object of the present invention is to provide a multi-channel microfluidic chip applied to electrochemical detection.

本发明的另一个目的是提供上述多通道微流控芯片的制备方法。Another object of the present invention is to provide a method for preparing the above-mentioned multi-channel microfluidic chip.

本发明提供了一种多通道微流控芯片。该芯片由缓冲液池、样品池、检测池、进样通道、分离通道、工作电极通道和工作电极通道中的电极等组成。该芯片的缓冲液池伸出若干分离通道,每条分离通道上,各有一个样品池、检测池、进样通道和工作电极通道以及工作电极通道中的电极,检测池在分离通道的一端;样品池通过进样通道与分离通道相通;工作电极通道一端与外接电源相通,另一端靠近检测池。不同分离通道、进样通道、样品池、检测池之间互不相通。The invention provides a multi-channel microfluidic chip. The chip is composed of a buffer pool, a sample pool, a detection pool, a sample injection channel, a separation channel, a working electrode channel, electrodes in the working electrode channel, and the like. The buffer pool of the chip protrudes from several separation channels, and each separation channel has a sample pool, a detection pool, a sampling channel, a working electrode channel and an electrode in the working electrode channel, and the detection pool is at one end of the separation channel; The sample pool communicates with the separation channel through the sampling channel; one end of the working electrode channel communicates with the external power supply, and the other end is close to the detection pool. Different separation channels, sampling channels, sample pools, and detection pools are not connected to each other.

本发明的微流控芯片可以以有机玻璃作为材质。例如,采用聚二甲基硅氧烷(PDMS)、聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯等高分子聚合物为材料,在本发明的一个实施例中,以聚甲基丙烯酸甲酯作为微流控芯片的材质。The microfluidic chip of the present invention can be made of organic glass. For example, high molecular polymers such as polydimethylsiloxane (PDMS), polymethyl methacrylate (PMMA), and polycarbonate are used as materials. In one embodiment of the present invention, polymethyl methacrylate Esters are used as materials for microfluidic chips.

本发明的微流控芯片中,该微流控芯片的分离通道、进样通道、工作电极通道的高度为25~100微米,宽度为25~100微米,分离通道的长度为40~80毫米;进样通道长度1~5毫米,进样通道与分离通道的交点到分离通道检测池侧端点的距离为35~75毫米。In the microfluidic chip of the present invention, the height of the separation channel, sampling channel and working electrode channel of the microfluidic chip is 25-100 microns, the width is 25-100 microns, and the length of the separation channel is 40-80 mm; The length of the sampling channel is 1-5 mm, and the distance from the intersection point of the sampling channel and the separation channel to the end point of the detection pool of the separation channel is 35-75 mm.

本发明的微流控芯片中,工作电极通道与检测池边缘的距离为25-50微米。In the microfluidic chip of the present invention, the distance between the working electrode channel and the edge of the detection pool is 25-50 microns.

本发明的微流控芯片中,样品池的直径为1~3毫米,检测池的直径为3~6毫米,各检测池圆心之间的距离为8~15毫米。In the microfluidic chip of the present invention, the diameter of the sample pool is 1-3 mm, the diameter of the detection pool is 3-6 mm, and the distance between the centers of the detection pools is 8-15 mm.

本发明的微流控芯片中,各分离通道之间平行,相邻两分离通道之间距离为7~20毫米;该微流控芯片的各工作电极通道之间平行,相邻两工作电极通道之间距离为7~20毫米。In the microfluidic chip of the present invention, the separation channels are parallel, and the distance between two adjacent separation channels is 7 to 20 millimeters; the working electrode channels of the microfluidic chip are parallel, and the distance between two adjacent working electrode channels The distance between them is 7-20mm.

本发明的微流控芯片中,进样通道与分离通道夹角为30~90度。In the microfluidic chip of the present invention, the angle between the sampling channel and the separation channel is 30-90 degrees.

本发明的微流控芯片中,每条检测通道(即分离通道)上还可以增加一个废液池,废液池通过另一段进样通道与分离通道相通,废液池的直径为1~3毫米。In the microfluidic chip of the present invention, a waste liquid pool can also be added on each detection channel (i.e. separation channel), and the waste liquid pool communicates with the separation channel through another section of sampling channel, and the diameter of the waste liquid pool is 1 to 3 mm.

本发明的微流控芯片中,缓冲液池的横截面可以为平行四边形,宽为4~10毫米,长为24~49毫米,长与宽之间的夹角为30~90度。In the microfluidic chip of the present invention, the cross section of the buffer pool can be a parallelogram with a width of 4-10 mm, a length of 24-49 mm, and an angle between the length and width of 30-90 degrees.

本发明的微流控芯片中,缓冲液池、样品池、检测池、废液池的高度为1~3mm。In the microfluidic chip of the present invention, the heights of the buffer pool, the sample pool, the detection pool and the waste liquid pool are 1-3 mm.

本发明的微流控芯片的通道数可根据实际情况确定,如所用材质的性质,待测样品的数量及其中各成分的性质差别,外接电压控制仪器的接线,等等。在本发明的一个实施例中,制备了一个4通道的多通道微流控芯片。The number of channels of the microfluidic chip of the present invention can be determined according to the actual situation, such as the nature of the material used, the number of samples to be tested and the difference in properties of each component, the wiring of an external voltage control instrument, and so on. In an embodiment of the present invention, a 4-channel multi-channel microfluidic chip is prepared.

另一方面,本发明提供了上述多通道微流控芯片的制备方法,包括以下几个步骤:In another aspect, the present invention provides a method for preparing the above-mentioned multi-channel microfluidic chip, comprising the following steps:

(1)用热压法或原位聚合法在基片上制作分离通道、进样通道和电极通道,并在电极通道内填充功能碳糊材料作为工作电极;(1) Make separation channels, sample injection channels and electrode channels on the substrate by hot pressing or in-situ polymerization, and fill the electrode channels with functional carbon paste materials as working electrodes;

(2)在盖片上采用金刚钻打孔制作缓冲液池,通过激光打孔制作样品池、检测池和废液池;(2) Use diamond drilling to make buffer pools on the cover slip, and make sample pools, detection pools and waste liquid pools by laser drilling;

(3)封合基片与盖片。(3) Seal the substrate and the cover.

上述制备方法可按如下步骤具体操作:The above-mentioned preparation method can be specifically operated as follows:

(1)单晶硅阳模的制作(1) Manufacture of monocrystalline silicon positive mold

将芯片设计图形用CAD软件绘制,图形线宽均为25~100μm,采用高清晰激光照排系统输出在透明的胶片上(背景透明,所需图像为黑色),即得光刻掩模。The chip design graphics are drawn with CAD software, the line width of the graphics is 25-100 μm, and the high-definition laser phototypesetting system is used to output it on a transparent film (the background is transparent, the required image is black), and the photolithography mask is obtained.

通过化学气相沉积(CVD)在基片上沉积一层氮化硅薄膜作为牺牲层,在此基片上通过旋转覆膜技术覆一层SU-8光敏胶(正光胶),于烘箱中60℃处理10~15min;将光刻掩膜覆盖在基片上,通过曝光成像的原理将光刻掩膜上的图形转移到基片表面的光胶层上;再通过干法腐蚀的方法将光胶层上的平面二维图形加工成具有一定深度的立体结构。即可得到具有凸起的通道的单晶硅阳模。制作好的阳模依次用H2O2∶H2SO4溶液(体积比为1∶4),丙酮和二次蒸馏水清洗,以除去表面的氧化物。Deposit a layer of silicon nitride film on the substrate by chemical vapor deposition (CVD) as a sacrificial layer, and coat a layer of SU-8 photosensitive adhesive (positive photoresist) on the substrate by spin coating technology, and treat it in an oven at 60 ° C for 10 ~15min; cover the photoresist mask on the substrate, and transfer the pattern on the photoresist mask to the photoresist layer on the surface of the substrate through the principle of exposure imaging; The plane two-dimensional graphics are processed into a three-dimensional structure with a certain depth. A male monocrystalline silicon mold with raised channels can be obtained. The fabricated positive mold is washed with H 2 O 2 :H 2 SO 4 solution (volume ratio 1:4), acetone and double distilled water in order to remove oxides on the surface.

(2)通过热压法或原位聚合法复制通道(2) Replicate channels by hot pressing or in situ polymerization

将PMMA有机玻璃片切割成一定尺寸,超声清洗,自然晾干,在热压装置中将PMMA基片加热到软化温度(106℃),通过在单晶硅阳模上施加一定的压力(4英寸面积上加力20~30kN),并保持30~60s,即可在PMMA基片上压制出与阳模互补的微通道,然后在加压的条件下,将阳模和刻有微通道的PMMA基片一起冷却后脱模,就得到所需的微通道。Cut the PMMA plexiglass sheet to a certain size, ultrasonically clean it, and dry it naturally. The PMMA substrate is heated to the softening temperature (106 ° C) in a hot press device, and a certain pressure (4 inches) is applied on the single crystal silicon positive mold. 20~30kN on the area), and keep it for 30~60s, the microchannel complementary to the male mold can be pressed on the PMMA substrate, and then under the condition of pressurization, the male mold and the PMMA substrate engraved with the microchannel After the sheets are cooled together, they are released from the mold to obtain the desired microchannels.

热压法所需仪器简单,操作方便,但是通道容易变形。我们尝试了采用紫外光引发原位聚合甲基丙烯酸甲酯制备微流控芯片,将聚合物单体甲基丙烯酸甲酯与引发剂混合,并添加一定量的功能性单体(甲基丙烯酸或4-乙烯基吡啶等)。将该混合物中注入模具中,采用紫外光引发聚合,芯片脱模后,即得到刻有微通道的PMMA基片,该法能够有效的消除通道变形的问题。The instrument required by the hot pressing method is simple and easy to operate, but the channel is easily deformed. We tried to use ultraviolet light to initiate in situ polymerization of methyl methacrylate to prepare microfluidic chip, mix polymer monomer methyl methacrylate with initiator, and add a certain amount of functional monomer (methacrylic acid or 4-vinylpyridine, etc.). The mixture is poured into a mold, and ultraviolet light is used to initiate polymerization. After the chip is released from the mold, a PMMA substrate engraved with microchannels is obtained. This method can effectively eliminate the problem of channel deformation.

在电极通道内小心地填充碳糊(或其它功能材料)作为工作电极,刮去多余的碳糊,在红外灯下固化12~16小时。Carefully fill the electrode channel with carbon paste (or other functional materials) as a working electrode, scrape off excess carbon paste, and cure under infrared light for 12 to 16 hours.

(3)在盖片上制作储液池(3) Make a liquid reservoir on the cover slip

常规的芯片制作大都采用金刚钻打孔,本发明中的缓冲液池采用金刚钻打孔。由于本发明研制的是多通道芯片,对样品池、废液池、检测池之间的相对位置要求非常精确,因此样品池、废液池、检测池的制作采用激光打孔。PMMA在紫外激光作用下可降解成易挥发的小分子。用铜箔制备光刻掩膜以确定打孔位置,用紫外激光通过显微物镜和光刻掩膜,将激光能量聚焦在可光解的PMMA盖片上,使光刻掩膜在PMMA盖片上所界定区域内发生激光溅射。调整激光强度和盖片表面所接受的脉冲数,可控制激光烧蚀的深度。通过本发明所提供的方法可得到精确大小和位置的储液池孔。Conventional chips are mostly drilled with diamond drills, and the buffer pool in the present invention is drilled with diamond drills. Since the invention develops a multi-channel chip, the relative positions of the sample pool, the waste liquid pool and the detection pool are required to be very precise, so laser drilling is used for the production of the sample pool, the waste liquid pool, and the detection pool. PMMA can be degraded into volatile small molecules under the action of ultraviolet laser. Prepare a photolithographic mask with copper foil to determine the hole position, use an ultraviolet laser to pass through a microscope objective lens and a photolithographic mask, and focus the laser energy on the photolyzable PMMA cover sheet, so that the photolithographic mask is placed on the PMMA cover sheet. Laser sputtering occurs in a defined area. The depth of laser ablation can be controlled by adjusting the laser intensity and the number of pulses received by the coverslip surface. Through the method provided by the invention, the liquid reservoir holes with precise size and position can be obtained.

(4)芯片封合(4) Chip sealing

在显微镜下对准PMMA基片与盖片,使电极通道与检测池边缘距离25~50μm左右(电极通道与分离通道末端距离),将此基片与盖片固定用二片盖玻片夹紧,放置在108℃烘箱内保温10~15min,即可得到所需的PMMA多通道微流控芯片。Align the PMMA substrate and the cover under the microscope so that the distance between the electrode channel and the edge of the detection cell is about 25-50 μm (the distance between the electrode channel and the end of the separation channel), and fix the substrate and the cover with two coverslips. , placed in an oven at 108° C. for 10 to 15 minutes, and then the desired PMMA multi-channel microfluidic chip can be obtained.

本发明还提供了上述微芯片的应用,即将该多通道微流控芯片与控制设备相连接,加入缓冲液与样品,控制电压完成待测组分的分离、分析和检测。The present invention also provides the application of the above-mentioned microchip, that is, connecting the multi-channel microfluidic chip with a control device, adding a buffer and a sample, and controlling the voltage to complete the separation, analysis and detection of the components to be tested.

将芯片与控制设备连接,加入分离液和样品,控制电压完成样品的分离、分析和检测。其原理是,在电场的作用下,利用样品中各成分在缓冲液中迁移率的不同而实现分离,分离后的样品中的待测成分依次到达检测池而被检出。由于本发明所设计的多个检测池互相独立,因此可以对样品中的同一物质进行高通量检测,也可对样品中的多种物质采用不同的电化学检测方法进行测定。Connect the chip to the control equipment, add the separation liquid and samples, and control the voltage to complete the separation, analysis and detection of the samples. The principle is that under the action of an electric field, the separation is realized by using the different mobility of each component in the sample in the buffer solution, and the components to be measured in the separated sample arrive at the detection cell in turn and are detected. Since the plurality of detection cells designed in the present invention are mutually independent, high-throughput detection of the same substance in the sample can be carried out, and multiple substances in the sample can also be measured by using different electrochemical detection methods.

具体测定步骤如下:The specific measurement steps are as follows:

首先,根据实际需要对芯片的通道进行改性与修饰。First, modify and modify the channels of the chip according to actual needs.

其次,在图3所示的多通道芯片示意图中,在缓冲液池1中插入铂丝作为高压分离正极,在样品池2中插入铂丝作为高压进样正极,在废液池3中插入铂丝作为进样负极。4为检测池,池内为三电极体系:工作电极、参比电极与对电极。将工作电极用银胶以铜丝引出,参比电极为自制的Ag/AgCl电极,对电极为铂丝。三电极之间的相对位置见图4。铜丝直径为0.5~1mm,长1~2cm,铂丝的直径为0.5~1mm,长1~2cm,参比电极为自制的Ag/AgCl参比电极。Ag长度约为0.5~1mm,长1~2cm,通过电镀使之沉积上一层约100~300nm厚的AgCl,即得Ag/AgCl参比电极。Secondly, in the schematic diagram of the multi-channel chip shown in Figure 3, the platinum wire is inserted into the buffer pool 1 as the positive electrode for high-pressure separation, the platinum wire is inserted into the sample pool 2 as the positive electrode for high-pressure sampling, and the platinum wire is inserted into the waste pool 3. The wire was used as the negative electrode for sampling. 4 is the detection cell, in which there is a three-electrode system: working electrode, reference electrode and counter electrode. The working electrode was led out with silver glue and copper wire, the reference electrode was self-made Ag/AgCl electrode, and the counter electrode was platinum wire. The relative positions among the three electrodes are shown in Fig. 4 . The diameter of the copper wire is 0.5-1 mm, and the length is 1-2 cm. The diameter of the platinum wire is 0.5-1 mm, and the length is 1-2 cm. The reference electrode is a self-made Ag/AgCl reference electrode. The length of Ag is about 0.5-1mm, and the length is 1-2cm, and a layer of AgCl with a thickness of about 100-300nm is deposited on it by electroplating to obtain the Ag/AgCl reference electrode.

再次,将芯片上所有电极的引出线连接到多通道电化学分析仪的相应的工作电极接线、对极接线和参比电极接线端口。Again, connect the lead wires of all electrodes on the chip to the corresponding working electrode wiring, counter electrode wiring and reference electrode wiring ports of the multi-channel electrochemical analyzer.

然后,将微流控芯片高压电源的加电压接线分别连接储液池。Then, connect the voltage-applying wires of the high-voltage power supply of the microfluidic chip to the liquid reservoirs respectively.

随后,将电化学分析仪的方法设置与参数设置按照实际需要进行设定;将微流控芯片高压电源的电压施加方式在程序中进行设定。Subsequently, the method setting and parameter setting of the electrochemical analyzer are set according to actual needs; the voltage application method of the high-voltage power supply of the microfluidic chip is set in the program.

最后,采用真空减压法使多通道芯片的进样通道与分离通道均充满缓冲溶液。在样品池2中加入样品,施加高压,样品溶液即充满进样通道5,当启动储液池1与检测池4之间的高压时,分离通道与进样通道交叉口的样品溶液即被带入分离通道,开启已设定的程序,对样品进行测定。Finally, the sampling channel and separation channel of the multi-channel chip are filled with buffer solution by vacuum decompression method. Add the sample into the sample pool 2, apply high pressure, the sample solution is filled with the sampling channel 5, when the high pressure between the liquid storage pool 1 and the detection pool 4 is started, the sample solution at the intersection of the separation channel and the sampling channel is brought Enter the separation channel, start the set program, and measure the sample.

本发明充分发挥了电化学检测在微流控芯片中的优势,首次将多通道微流控芯片成功应用于电化学检测。本发明的微流控芯片用于鉴定化工、生物、医药等行业的样品,可以同时分离、分析和检测复杂样品中的成分,又避免了现有常规分析方法中由荧光试剂导致的高成本和干扰问题,具有高通量和高灵敏度的优点。此外,本发明的微流控芯片的通道宽深比较大,制备过程简易,成本低廉,因此,本发明在电化学检测领域将有非常广阔的应用前景。The invention fully utilizes the advantages of electrochemical detection in microfluidic chips, and successfully applies multi-channel microfluidic chips to electrochemical detection for the first time. The microfluidic chip of the present invention is used to identify samples in chemical, biological, and pharmaceutical industries, and can simultaneously separate, analyze, and detect components in complex samples, and avoids the high cost and inconvenience caused by fluorescent reagents in existing conventional analysis methods. Interference problems, with the advantages of high throughput and high sensitivity. In addition, the channel width-depth ratio of the microfluidic chip of the present invention is large, the preparation process is simple, and the cost is low. Therefore, the present invention will have very broad application prospects in the field of electrochemical detection.

附图说明Description of drawings

图1为多通道微流控芯片掩膜设计图。其中圆的半径为4英寸(与单晶硅模大小相同);5为进样通道,长度为1~5mm,5下方与之在同一直线上的三条线段均为进样通道,尺寸与5相同;6为分离通道,长度为40~80mm。5与6的夹角为30~60度,进样通道的有效程度为35~75mm(5与6的交点到分离通道右侧端点间的距离),6上方与之平行的三条线段亦为分离通道,尺寸与6相同,相邻两分离通道垂直间距为8~15mm,相邻两分离通道端点之间水平间距为6~10mm。所有通道的线宽均为25~100μm;7为工作电极通道,长度为7~9mm,7右侧有三条与之平行的线段,均为工作电极通道,长度分别为13~15、19~21、25~27mm,相邻两工作电极之间水平距离为6~10mm。Figure 1 is a design diagram of a multi-channel microfluidic chip mask. The radius of the circle is 4 inches (the same size as the monocrystalline silicon mold); 5 is the sampling channel, the length is 1 to 5 mm, and the three line segments below 5 on the same straight line are sampling channels, and the size is the same as 5 ; 6 is a separation channel, the length of which is 40-80mm. The angle between 5 and 6 is 30-60 degrees, the effective degree of the sampling channel is 35-75mm (the distance between the intersection of 5 and 6 and the right end of the separation channel), and the three parallel lines above 6 are also separation The channel has the same size as 6, the vertical distance between two adjacent separation channels is 8-15 mm, and the horizontal distance between the ends of two adjacent separation channels is 6-10 mm. The line width of all channels is 25-100 μm; 7 is the working electrode channel, the length is 7-9 mm, and there are three parallel line segments on the right side of 7, which are all working electrode channels, and the lengths are 13-15, 19-21 , 25 ~ 27mm, the horizontal distance between two adjacent working electrodes is 6 ~ 10mm.

图2是划片后的单晶硅阳模示意图。Fig. 2 is a schematic diagram of a single crystal silicon positive mold after dicing.

图3应用于电化学检测的多通道微流控芯片示意图。其中,1:缓冲液池;2为样品池;3为废液池;4为检测池。5为进样通道;6为分离通道;7为工作电极通道。Figure 3 is a schematic diagram of a multi-channel microfluidic chip applied to electrochemical detection. Among them, 1: buffer pool; 2: sample pool; 3: waste liquid pool; 4: detection pool. 5 is the sampling channel; 6 is the separation channel; 7 is the working electrode channel.

图4是分离通道出口与工作电极相对位置示意图。其中,4为检测池;6为分离通道;8为填充的碳糊作为工作电极;9为Pt丝,作为对电极;10为Ag/AgCl参比电极。Fig. 4 is a schematic diagram of the relative positions of the outlet of the separation channel and the working electrode. Among them, 4 is the detection cell; 6 is the separation channel; 8 is the filled carbon paste as the working electrode; 9 is the Pt wire as the counter electrode; 10 is the Ag/AgCl reference electrode.

具体实施方式Detailed ways

实施例1 A片的制作The making of embodiment 1 A sheet

A片为基片,其制作包括单晶硅阳模、分离进样微通道、工作电极的制作,具体制作过程为:Sheet A is the substrate, and its production includes the production of the monocrystalline silicon positive mold, the separation and injection microchannel, and the working electrode. The specific production process is as follows:

(1)掩膜的制作:采用CAD软件绘制图1所示的设计图,进样通道长度(指样品池与废液池边缘之间的距离)为2.828mm,4条工作电极通道长度分别为7、13、19、25mm,相邻两工作电极之间水平间距为6mm,分离通道长50mm,进样通道与分离通道的交点距分离通道右侧端点为45mm,相邻两分离通道垂直间距为7mm,所有线宽均为50μm。将此设计图采用高清晰激光照排系统输出在透明的胶片上,即得光刻掩膜。(1) Fabrication of the mask: use CAD software to draw the design diagram shown in Figure 1, the length of the sampling channel (referring to the distance between the sample pool and the edge of the waste liquid pool) is 2.828mm, and the lengths of the four working electrode channels are respectively 7, 13, 19, 25mm, the horizontal distance between two adjacent working electrodes is 6mm, the length of the separation channel is 50mm, the distance between the intersection point of the sampling channel and the separation channel is 45mm from the right end of the separation channel, and the vertical distance between two adjacent separation channels is 7mm, all line widths are 50μm. Output this design drawing on a transparent film using a high-definition laser phototypesetting system to obtain a photolithography mask.

(2)单晶硅阳模的制作:在550~700℃通过化学气相沉积(CVD)在基片上沉积一层氮化硅薄膜作为牺牲层,在此基片上通过旋转覆膜技术覆一层SU-8光敏胶(正光胶),于烘箱中60℃处理10min;将光刻掩膜覆盖在基片上,通过曝光成像的原理将光刻掩膜上的图形转移到基片表面的光胶层上;再通过干法腐蚀的方法将光胶层上的平面二维图形加工成具有一定深度的立体结构。即可得到具有凸起的通道的单晶硅阳模,通道的深与宽均为50μm。制作好的阳模依次用H2O2∶H2SO4溶液(体积比为1∶4),丙酮和二次蒸馏水清洗,以除去表面的氧化物。(2) Manufacture of single crystal silicon positive mold: Deposit a layer of silicon nitride film on the substrate as a sacrificial layer by chemical vapor deposition (CVD) at 550-700 ° C, and coat a layer of SU on the substrate by spin coating technology. -8 Photosensitive adhesive (positive photoresist), process it in an oven at 60°C for 10 minutes; cover the photoresist mask on the substrate, and transfer the pattern on the photoresist mask to the photoresist layer on the surface of the substrate through the principle of exposure imaging ; and then process the plane two-dimensional graphics on the photoresist layer into a three-dimensional structure with a certain depth by dry etching. A male monocrystalline silicon mold with raised channels can be obtained, the depth and width of which are both 50 μm. The fabricated positive mold is washed with H 2 O 2 :H 2 SO 4 solution (volume ratio 1:4), acetone and double distilled water in order to remove oxides on the surface.

(3)通过热压法复制微通道(3) Replicating microchannels by hot pressing

基片厚度为0.5~2mm,在本实施例中,选用的基片厚度为1mm。将1mm厚的PMMA有机玻璃片切割成长方形,尺寸为4.0×8.0cm,超声清洗,自然晾干,在热压装置中将PMMA基片加热到106℃,通过在单晶硅阳模上施加一定的压力(4英寸面积上加力20kN),并保持30s,即可在PMMA基片上压制出与阳模互补的微通道,然后在加压的条件下,将阳模和刻有微通道的PMMA基片一起冷却后脱模,就得到所需的微通道。The thickness of the substrate is 0.5-2 mm, and in this embodiment, the thickness of the selected substrate is 1 mm. Cut a 1mm thick PMMA plexiglass sheet into a rectangle with a size of 4.0×8.0cm, ultrasonically clean it, and dry it naturally. Heat the PMMA substrate to 106°C in a hot pressing device, and apply a certain The pressure (20kN on the 4-inch area) is maintained for 30s, and the microchannel complementary to the male mold can be pressed on the PMMA substrate, and then the male mold and the PMMA with the microchannel are engraved The substrates are cooled together and released from the mold to obtain the required microchannels.

(4)工作电极的制作(4) Fabrication of the working electrode

4条工作电极通道长度分别为7、13、19、25mm,电极通道为宽、深度均为50μm的电极沟槽,其轴向与分离通道垂直,向槽内小心地填充碳糊作为工作电极,刮去多余的碳糊,在红外灯下固化12h,即完成基片的制作。The lengths of the four working electrode channels are 7, 13, 19, and 25 mm respectively. The electrode channels are electrode grooves with a width of 50 μm and a depth of 50 μm. Scrape off the excess carbon paste, and cure it under an infrared lamp for 12 hours to complete the production of the substrate.

实施例2B片的制作The making of embodiment 2B sheet

B片为盖片,其结构包括各种储液池孔,包括1个缓冲液池、4个样品池、4个废液池和4个独立的电化学检测池。具体制作过程为:Sheet B is a cover sheet, and its structure includes various reservoir holes, including 1 buffer pool, 4 sample pools, 4 waste liquid pools and 4 independent electrochemical detection pools. The specific production process is:

(1)B片的尺寸为4.0×8.0cm,厚度为1~3mm,在本实施例中选用厚度为2mm的PMMA。用蒸馏水洗涤盖片,并置于0.1mol/L的NaOH溶液中浸泡30min,再用蒸馏水洗涤并用氮气吹干。(1) The size of sheet B is 4.0×8.0 cm, and the thickness is 1-3 mm. In this embodiment, PMMA with a thickness of 2 mm is selected. The coverslip was washed with distilled water, soaked in 0.1mol/L NaOH solution for 30min, washed with distilled water and dried with nitrogen.

(2)缓冲液池的制作:缓冲液池的横截面为平行四边形,宽为5mm,长为34mm,长与宽之间的夹角为45度。由于对缓冲液池大小要求不是特别精确,在本实施例中采用金刚钻打孔即可。缓冲液池的高度为B片的厚度,即2mm。(2) Fabrication of the buffer pool: the cross section of the buffer pool is a parallelogram with a width of 5 mm and a length of 34 mm, and the angle between the length and width is 45 degrees. Since the requirement for the size of the buffer pool is not particularly precise, it is sufficient to use a diamond drill to drill holes in this embodiment. The height of the buffer pool is the thickness of slice B, ie 2mm.

(3)样品池、废液池和电化学检测池的制作:采用LAM66激光烧蚀机进行激光打孔。用铜箔制备光刻掩膜,精确确定所需打孔的位置。用紫外激光通过显微物镜和光刻掩膜,将激光能量聚焦在可光解的PMMA盖片上,选择激光频率为50Hz,对应的单位长度接受激光的脉冲设定为500脉冲/mm,在光刻掩膜所界定的区域内发生激光溅射,样品池与废液池为直径为1mm的圆孔,电化学检测池为直径为3mm的圆孔,储液池的高度均为B片的厚度,即2mm。(3) Fabrication of sample pool, waste liquid pool and electrochemical detection pool: LAM66 laser ablation machine was used for laser drilling. Prepare a photolithography mask with copper foil, and accurately determine the position of the required punching hole. Use an ultraviolet laser to pass through a microscope objective lens and a photolithographic mask to focus the laser energy on the photolyzable PMMA cover sheet, select the laser frequency to be 50Hz, and set the corresponding unit length of the laser pulse to be 500 pulses/mm. Laser sputtering occurs in the area defined by the engraved mask. The sample pool and waste liquid pool are round holes with a diameter of 1mm, the electrochemical detection pool is a round hole with a diameter of 3mm, and the height of the liquid storage pool is the thickness of the B sheet. , ie 2mm.

实施例3A片与B片的封合以及电极的制作Embodiment 3 The sealing of sheet A and sheet B and the making of electrodes

采用热压法对A片与B片进行封合。具体制作过程为:Use hot pressing method to seal A piece and B piece. The specific production process is:

(1)将A片、B片超声清洗,自然晾干。(1) Ultrasonic cleaning of slices A and B, and air-dried.

(2)将A片与B片在显微镜下精确对准,使工作电极与储液池边缘的距离为30μm左右。对准位置后,将基片与盖片用两块玻璃片固定夹紧放入烘箱,程序升温至108℃,保温2分钟,再程序降温至45℃即可。(2) Align slice A and slice B accurately under the microscope so that the distance between the working electrode and the edge of the reservoir is about 30 μm. After aligning the position, fix and clamp the substrate and the cover with two pieces of glass and put them into the oven, program the temperature to 108°C, keep it warm for 2 minutes, and then program to cool down to 45°C.

(3)各电极的制作:缓冲液池1里面的用于提供高压的电极为Pt丝,长10mm,直径为0.5mm;样品池2以及废液池3的电极为长5mm,直径为0.5mm;检测池4为三电极工作体系,工作电极以银胶用铜丝引出,铜丝直径为0.5mm,长1cm,对电极为长5mm,直径为0.5mm,参比电极为自制的Ag/AgCl参比电极。Ag长度约为1.5cm,直径为0.5mm,通过电镀使之沉积上一层约300nm厚的AgCl,即得Ag/AgCl参比电极。(3) Production of each electrode: the electrode used to provide high voltage in the buffer pool 1 is a Pt wire with a length of 10 mm and a diameter of 0.5 mm; the electrodes of the sample pool 2 and the waste liquid pool 3 are 5 mm long and 0.5 mm in diameter The detection cell 4 is a three-electrode working system, and the working electrode is led out with silver glue and copper wire. The diameter of the copper wire is 0.5 mm, and the length is 1 cm. The opposite electrode is 5 mm long, and the diameter is 0.5 mm. The reference electrode is self-made Ag/AgCl Reference electrode. The length of Ag is about 1.5cm, and the diameter is 0.5mm. By electroplating, a layer of AgCl with a thickness of about 300nm is deposited on it to obtain the Ag/AgCl reference electrode.

实施例4多通道微流控芯片制作实例2Embodiment 4 Multi-channel microfluidic chip production example 2

1A片的制作1A production

A片为基片,其制作包括单晶硅阳模、分离进样微通道、工作电极的制作,具体制作过程为:Sheet A is the substrate, and its production includes the production of the monocrystalline silicon positive mold, the separation and injection microchannel, and the working electrode. The specific production process is as follows:

(1)掩膜的制作:采用CAD软件绘制图1所示的设计图,进样通道长度为4mm,4条工作电极通道长度分别为8、15、22、29mm,相邻两工作电极之间水平间距为8mm,分离通道长40mm,进样通道与分离通道的交点距分离通道右侧端点为35mm,进样通道与分离通道之间的夹角为30度。相邻两分离通道垂直间距为7mm,所有线宽均为100μm。将此设计图采用高清晰激光照排系统输出在透明的胶片上,即得光刻掩膜。(1) Fabrication of the mask: use CAD software to draw the design diagram shown in Figure 1, the length of the sampling channel is 4 mm, the lengths of the four working electrode channels are 8, 15, 22, and 29 mm, and the distance between two adjacent working electrodes The horizontal spacing is 8mm, the length of the separation channel is 40mm, the distance between the intersection point of the sampling channel and the separation channel is 35mm from the right end of the separation channel, and the angle between the sampling channel and the separation channel is 30 degrees. The vertical distance between two adjacent separation channels is 7 mm, and all line widths are 100 μm. Output this design drawing on a transparent film using a high-definition laser phototypesetting system to obtain a photolithography mask.

(2)单晶硅阳模的制作:在550~700℃通过化学气相沉积(CVD)在基片上沉积一层氮化硅薄膜作为牺牲层,在此基片上通过旋转覆膜技术覆一层SU-8光敏胶(正光胶),于烘箱中60℃处理10min;将光刻掩膜覆盖在基片上,通过曝光成像的原理将光刻掩膜上的图形转移到基片表面的光胶层上;再通过干法腐蚀的方法将光胶层上的平面二维图形加工成具有一定深度的立体结构。即可得到具有凸起的通道的单晶硅阳模,通道的深与宽均为100μm。制作好的阳模依次用H2O2∶H2SO4溶液(体积比为1∶4),丙酮和二次蒸馏水清洗,以除去表面的氧化物。(2) Manufacture of single crystal silicon positive mold: Deposit a layer of silicon nitride film on the substrate as a sacrificial layer by chemical vapor deposition (CVD) at 550-700 ° C, and coat a layer of SU on the substrate by spin coating technology. -8 Photosensitive adhesive (positive photoresist), process it in an oven at 60°C for 10 minutes; cover the photoresist mask on the substrate, and transfer the pattern on the photoresist mask to the photoresist layer on the surface of the substrate through the principle of exposure imaging ; and then process the plane two-dimensional graphics on the photoresist layer into a three-dimensional structure with a certain depth by dry etching. A male monocrystalline silicon mold with raised channels can be obtained, and the depth and width of the channels are both 100 μm. The fabricated positive mold is washed with H 2 O 2 :H 2 SO 4 solution (volume ratio 1:4), acetone and double distilled water in order to remove oxides on the surface.

(3)采用原位引发聚合法复制PMMA基片上的微通道(3) In situ initiated polymerization to replicate microchannels on PMMA substrates

经过划片后的硅模尺寸为4×8cm,将与硅模同样尺寸的PMMA基片(厚度0.5mm)超声洗净晾干,采用原位引发聚合复制微通道。通过一系列优化实验获得了光引发原位聚合的条件,建立了使用的甲基丙烯酸甲酯紫外光引发原位聚合制备微流控芯片技术。聚合溶液的配方为:单体甲基丙烯酸甲酯100ml,光热混合引发剂偶氮二异丁腈0.2g,光引发剂安息香0.2g和本体修饰剂如甲基丙烯酸1-2g。聚合条件为:热预聚温度80-90℃,预聚时间15-20min。将该混合物注入模具中,采用紫外光引发聚合。注模后光聚合条件为:温度20-35℃,紫外光波长356nm,功率20w,与紫外灯距离5-6cm,聚合时间约30-60min。由偶氮二异丁腈和安息香组成的复合快速光引发系统可以大大缩短光聚合时间,使用传统的光引发剂安息香甲醚需要4-6h,而热聚合需要8-10h,光聚合系统也可以采用日光引发聚合,因为是快速聚合,避免了紫外光过度照射芯片,防止了芯片发黄的问题。After slicing, the size of the silicon mold is 4×8cm. The PMMA substrate (thickness 0.5mm) of the same size as the silicon mold is ultrasonically cleaned and dried, and the microchannel is replicated by in-situ polymerization. The conditions for photo-initiated in-situ polymerization were obtained through a series of optimization experiments, and the microfluidic chip technology was established using methyl methacrylate UV-induced in-situ polymerization. The formula of the polymerization solution is: 100ml of methyl methacrylate monomer, 0.2g of photothermal mixed initiator azobisisobutyronitrile, 0.2g of photoinitiator benzoin and 1-2g of bulk modifier such as methacrylic acid. The polymerization conditions are: thermal prepolymerization temperature 80-90°C, prepolymerization time 15-20min. The mixture was poured into a mold and polymerized using UV light. The photopolymerization conditions after injection molding are: temperature 20-35°C, ultraviolet light wavelength 356nm, power 20w, distance from the ultraviolet lamp 5-6cm, polymerization time about 30-60min. The composite rapid photoinitiation system composed of azobisisobutyronitrile and benzoin can greatly shorten the photopolymerization time. It takes 4-6h to use the traditional photoinitiator benzoin methyl ether, while thermal polymerization takes 8-10h. The photopolymerization system can also Sunlight is used to initiate polymerization, because it is a rapid polymerization, which avoids the excessive irradiation of ultraviolet light on the chip and prevents the problem of yellowing of the chip.

(4)工作电极的制作(4) Fabrication of the working electrode

4条工作电极通道长度分别为8、15、22、29mm,电极通道为宽、深度均为100μm的电极沟槽,其轴向与分离通道垂直,向槽内小心地放入直径为50μm的碳纤维作为工作电极,用导电银胶将碳纤维固定,即完成工作电极的制作。The lengths of the four working electrode channels are 8, 15, 22, and 29 mm respectively. The electrode channels are electrode grooves with a width of 100 μm and a depth of 100 μm. As the working electrode, the carbon fiber is fixed with conductive silver glue, that is, the production of the working electrode is completed.

2B片的制作Production of 2B films

B片为盖片,其结构包括各种储液池孔,包括1个缓冲液池、4个样品池、4个废液池和4个独立的电化学检测池。具体制作过程为:Sheet B is a cover sheet, and its structure includes various reservoir holes, including 1 buffer pool, 4 sample pools, 4 waste liquid pools and 4 independent electrochemical detection pools. The specific production process is:

(1)B片的尺寸为4.0×8.0cm,在本实施例中选用厚度为3mm的PMMA。用蒸馏水洗涤盖片,并置于0.1mol/L的NaOH溶液中浸泡30min,再用蒸馏水洗涤并用氮气吹干。(1) The size of sheet B is 4.0×8.0 cm, and PMMA with a thickness of 3 mm is selected in this embodiment. The coverslip was washed with distilled water, soaked in 0.1mol/L NaOH solution for 30min, washed with distilled water and dried with nitrogen.

(2)缓冲液池的制作:缓冲液池的横截面为平行四边形,宽为5mm,长为46mm,长与宽之间的夹角为30度。由于对缓冲液池大小要求不是特别精确,在本实施例中采用金刚钻打孔即可。缓冲液池的高度为B片的厚度,即3mm。缓冲液池距离盖片上下边缘的距离分别为7mm和10mm。(2) Fabrication of the buffer pool: the cross section of the buffer pool is a parallelogram with a width of 5 mm and a length of 46 mm, and the angle between the length and width is 30 degrees. Since the requirement for the size of the buffer pool is not particularly precise, it is sufficient to use a diamond drill to drill holes in this embodiment. The height of the buffer pool is the thickness of slice B, ie 3mm. The distance between the buffer pool and the upper and lower edges of the coverslip is 7mm and 10mm, respectively.

(3)样品池、废液池和电化学检测池的制作:采用LAM66激光烧蚀机进行激光打孔。用铜箔制备光刻掩膜,精确确定所需打孔的位置。用紫外激光通过显微物镜和光刻掩膜,将激光能量聚焦在可光解的PMMA盖片上,选择激光频率为50Hz,对应的单位长度接受激光的脉冲设定为800脉冲/mm,在光刻掩膜所界定的区域内发生激光溅射,样品池与废液池为直径为2mm的圆孔,电化学检测池为直径为5mm的圆孔。最右侧的电化学检测池圆心距离盖片右侧边缘为4.5mm,距离盖片上侧边缘距离为11mm。储液池的高度均为B片的厚度,即3mm。(3) Fabrication of sample pool, waste liquid pool and electrochemical detection pool: LAM66 laser ablation machine was used for laser drilling. Prepare a photolithography mask with copper foil, and accurately determine the position of the required punching hole. Use an ultraviolet laser to pass through a microscope objective lens and a photolithography mask to focus the laser energy on the photolyzable PMMA cover sheet, select the laser frequency as 50 Hz, and set the corresponding unit length of the received laser pulse to 800 pulses/mm. Laser sputtering occurs in the area defined by the engraving mask, the sample pool and the waste liquid pool are round holes with a diameter of 2mm, and the electrochemical detection pool is a round hole with a diameter of 5mm. The center of the electrochemical detection cell on the far right is 4.5 mm from the right edge of the cover, and 11 mm from the upper edge of the cover. The height of the liquid reservoir is the thickness of the B sheet, that is, 3mm.

3A片与B片的封合以及电极的制作3. Sealing of sheet A and sheet B and fabrication of electrodes

采用热压法对A片与B片进行封合。具体制作过程为:Use hot pressing method to seal A piece and B piece. The specific production process is:

(1)将A片、B片超声清洗,自然晾干。(1) Ultrasonic cleaning of slices A and B, and air-dried.

(2)将A片与B片在显微镜下精确对准,使工作电极与储液池边缘的距离为50μm左右。对准位置后,将基片与盖片用两块玻璃片固定夹紧放入烘箱,程序升温至108℃,保温2分钟,再程序降温至45℃即可。(2) Align slice A and slice B accurately under the microscope so that the distance between the working electrode and the edge of the reservoir is about 50 μm. After aligning the position, fix and clamp the substrate and the cover with two pieces of glass and put them into the oven, program the temperature to 108°C, keep it warm for 2 minutes, and then program to cool down to 45°C.

(3)各电极的制作:缓冲液池1里面的用于提供高压的电极为Pt丝,直径为1mm,长45mm,其中插入缓冲液池部分长度为40mm;样品池2以及废液池3的电极为长2cm,直径为0.5mm;检测池4为三电极工作体系,工作电极以银胶用铜丝引出,铜丝直径为0.5mm,长2cm,对电极为长2cm,直径为0.5mm,参比电极为自制的Ag/AgCl参比电极。Ag长度约为1.5cm,直径为0.5mm,通过电镀使之沉积上一层约100nm厚的AgCl,即得Ag/AgCl参比电极。(3) The making of each electrode: the electrode that is used to provide high voltage in the buffer pool 1 is a Pt wire, with a diameter of 1mm and a length of 45mm, wherein the length of the part inserted into the buffer pool is 40mm; the sample pool 2 and the waste liquid pool 3 The electrode is 2cm long and 0.5mm in diameter; the detection cell 4 is a three-electrode working system, and the working electrode is drawn out with silver glue and copper wire. The diameter of the copper wire is 0.5mm, and the length is 2cm. The reference electrode is a self-made Ag/AgCl reference electrode. The length of Ag is about 1.5cm, and the diameter is 0.5mm. By electroplating, a layer of AgCl with a thickness of about 100nm is deposited on it to obtain the Ag/AgCl reference electrode.

实施例5多通道微流控芯片应用于海水中有机磷农药的高通量检测Example 5 Application of multi-channel microfluidic chip in high-throughput detection of organophosphorus pesticides in seawater

(1)多通道微流控芯片的制作(1) Fabrication of multi-channel microfluidic chip

按照实施例1、2、3的方法制作4通道微流控电化学检测芯片Make 4-channel microfluidic electrochemical detection chip according to the method of embodiment 1, 2, 3

(2)制备模拟磷酸酯水解酶(2) Preparation of simulated phosphoester hydrolase

有机磷水解酶的催化活性中心是两个二价金属离子与四个组胺酸残基所组成的团簇。在天然磷酸酯水解酶中,金属离子是Zn2+,当Zn2+为其它二价金属离子如Co2+、Ni2+、Cd2+所代替时,该团簇仍然对有机磷酸酯的水解具有催化作用。我们采用一系列的二价金属离子作为功能单体,以求得到催化性能最佳的分子印迹模拟磷酸酯水解酶,并将印迹聚合物修饰到通道内部。由于有机磷酸酯农药在模拟磷酸酯水解酶的催化作用下可以生成对硝基苯酚,可以用安培法进行检测。The catalytic active center of organophosphate hydrolase is a cluster composed of two divalent metal ions and four histidine residues. In natural phosphoester hydrolase, the metal ion is Zn 2+ . When Zn 2+ is replaced by other divalent metal ions such as Co 2+ , Ni 2+ , and Cd 2+ , the cluster is still resistant to organophosphates. Hydrolysis is catalytic. We use a series of divalent metal ions as functional monomers in order to obtain molecularly imprinted phosphohydrolase with the best catalytic performance, and modify the imprinted polymer into the channel. Since organophosphate pesticides can generate p-nitrophenol under the catalysis of simulated phosphoester hydrolase, it can be detected by amperometric method.

采用标准方法制备模拟磷酸酯水解酶。即将功能单体在溶液中排列在印迹分子周围,交联干燥后将其研磨、破碎、筛分得到一定粒径的分子印迹介质,最后洗脱除去模板分子。典型的制备过程如下:将1mmol 4(5)乙烯基咪唑,4mmol二乙基(4-硝基苄基)磷酸酯(diethyl(4-nitrobenzyl)phosphonate,D4NP),2mmolCoCl2溶于250ml氯仿中。真空脱气5min后加入0.1mmol偶氮二异丁晴引发聚合,60℃水浴反应24h,得到蓝色聚合物。聚合物经机械研磨后,过筛。取粒径为25μm左右的粒状产物,用甲醇和乙酸抽提,除去D4NP,然后干燥,即得分子印迹模拟磷酸酯水解酶。Mock phosphoesterases were prepared using standard methods. That is, the functional monomers are arranged around the imprinted molecules in the solution, and after cross-linking and drying, they are ground, crushed, and sieved to obtain molecularly imprinted media with a certain particle size, and finally the template molecules are eluted to remove them. A typical preparation process is as follows: 1 mmol 4(5) vinylimidazole, 4 mmol diethyl (4-nitrobenzyl) phosphonate (D4NP), 2 mmol CoCl 2 are dissolved in 250 ml chloroform. After vacuum degassing for 5 minutes, 0.1 mmol of azobisisobutyronitrile was added to initiate polymerization, and reacted in a water bath at 60° C. for 24 hours to obtain a blue polymer. After the polymer is mechanically ground, it is sieved. Take a granular product with a particle size of about 25 μm, extract it with methanol and acetic acid to remove D4NP, and then dry it to obtain the molecularly imprinted simulated phosphoester hydrolase.

以催化活性(反应速度)、选择性等来描述印迹聚合物的催化性能。沿用对传统聚合物的表征方法,如通过吸附实验进行比表面积测定、孔容测定、孔径大小及其分布测定、孔形状测定等对分子印迹聚合物的结构表征。采用元素分析、重量分析、核磁共振等对分子印迹聚合物的化学成分分析。The catalytic performance of imprinted polymers is described in terms of catalytic activity (reaction speed), selectivity, etc. The traditional polymer characterization methods are used, such as the determination of specific surface area, pore volume measurement, pore size and distribution measurement, pore shape measurement and other structural characterization of molecularly imprinted polymers through adsorption experiments. The chemical composition of molecularly imprinted polymers was analyzed by elemental analysis, gravimetric analysis, and nuclear magnetic resonance.

(3)多通道微流控芯片的改性与修饰(3) Modification and modification of multi-channel microfluidic chip

PMMA芯片通道内部为憎水性,需要进行改性后方可将分子印迹模拟磷酸酯水解酶修饰到通道内部。The interior of the PMMA chip channel is hydrophobic, and it needs to be modified before the molecularly imprinted phospholipase can be modified into the channel.

Figure C20051002595600151
Figure C20051002595600151

通过溶胶-凝胶法将模拟磷酸酯水解酶修饰到通道内部,可以大幅度提高催化的比表面积,可以极大的提高催化效率。By modifying the simulated phosphoester hydrolase into the channel through the sol-gel method, the catalytic specific surface area can be greatly increased, and the catalytic efficiency can be greatly improved.

(4)采用电化学法进行检测(4) Detection by electrochemical method

首先,将4通道芯片上三电极的引出线连接到电化学工作站(CHI1030,上海辰华仪器公司)的相应的工作电极,对电极和参比电极连接线端口。First, connect the lead wires of the three electrodes on the 4-channel chip to the corresponding working electrode, counter electrode and reference electrode connecting wire ports of the electrochemical workstation (CHI1030, Shanghai Chenhua Instrument Co., Ltd.).

其次,将微流控芯片高压电源(CDY-500L,山东省化工研究院仪器仪表研究所)的加电压接线分别连接各储液池。Secondly, the voltage-applying wiring of the microfluidic chip high-voltage power supply (CDY-500L, Institute of Instrumentation, Shandong Provincial Research Institute of Chemical Industry) was connected to each liquid storage pool respectively.

再次,将电化学分析仪的方法设置与参数设置按照实际需要进行设定:方法设定为安培检测(amperometric i-t curve),sampling time设定为300s,检测电位设为0.9V(vs.Ag/AgCl),灵敏度设为1×10-6A。将微流控芯片高压电源的电压施加方式在程序中进行设定。进样电压设为300V,进样时间为20s;分离电压设为300V,施加高压时间为240s。Again, set the method setting and parameter setting of the electrochemical analyzer according to actual needs: the method is set to amperometric it curve, the sampling time is set to 300s, and the detection potential is set to 0.9V (vs.Ag/ AgCl), the sensitivity was set to 1×10 -6 A. The voltage application method of the high-voltage power supply of the microfluidic chip is set in the program. The injection voltage was set to 300V, and the injection time was 20s; the separation voltage was set to 300V, and the high voltage application time was 240s.

最后,采用真空泵将各分离、进样微通道充满溶液,将微流控芯片通道依次用0.1MHCl、二次蒸馏水、0.1MNaOH、二次蒸馏水、缓冲液清洗。在缓冲液池1中加入20mmol/L的硼砂-NaOH缓冲液(pH为9.6),在样品池2中加入有机磷农药对氧磷标准溶液(或实际样品,即经0.22μm滤膜过滤的海水),在废液池3中加入20mmol/L的硼砂-NaOH缓冲液(pH为9.6),施加进样高压,标准(样品)溶液即充满进样通道5,当启动缓冲液池1与检测池4之间的高压时,分离通道与进样通道交叉口的标准(样品)溶液即被带入分离通道,开启已设定的电化学工作站程序,通过对有机磷农药水解产物对硝基苯酚的检测,即可对样品中的有机磷农药进行定量测定。在样品池2中加入不同浓度的有机磷农药对氧磷标准溶液,测定对氧磷水解产物对硝基苯酚氧化峰的峰电流,即可建立峰电流与有机磷农药的浓度所对应的线性相关关系。在所设定的条件下,对硝基苯酚的出峰时间为52s左右,测定结果表明,不同通道之间检测结果相对标准偏差小于10%(n=3),同一通道3次测定结果相对标准偏差小于5%。进样1×10-5mmol/L对氧磷,4通道得到的平均浓度为9.6×10-6mmol/L,相对偏差为4%。以上结果表明,本发明所研制的多通道微流控电化学芯片可以成功的应用于实际样品的高效、快速测定。Finally, a vacuum pump is used to fill each separation and sampling microchannel with solution, and the channels of the microfluidic chip are washed with 0.1M HCl, double distilled water, 0.1M NaOH, double distilled water, and buffer solution in sequence. Add 20mmol/L borax-NaOH buffer solution (pH is 9.6) in buffer pool 1, add organophosphorus pesticide paraoxon standard solution (or actual sample, that is, seawater filtered through 0.22 μm filter membrane) in sample pool 2 ), add 20mmol/L borax-NaOH damping solution (pH is 9.6) in the waste liquid pool 3, apply sample injection high pressure, the standard (sample) solution promptly fills the sampling channel 5, when start buffer pool 1 and detection pool When the high pressure between 4 and 4, the standard (sample) solution at the intersection of the separation channel and the sampling channel is brought into the separation channel, the electrochemical workstation program that has been set is opened, and the organophosphorus pesticide hydrolyzate p-nitrophenol Detection can be used for quantitative determination of organophosphorus pesticides in samples. Add different concentrations of organophosphorus pesticide paraoxon standard solutions in the sample cell 2, and measure the peak current of the paraoxon hydrolyzate p-nitrophenol oxidation peak, and then establish a linear correlation between the peak current and the concentration of the organophosphorus pesticide relation. Under the set conditions, the peak time of p-nitrophenol is about 52s. The measurement results show that the relative standard deviation of the detection results between different channels is less than 10% (n=3), and the three measurement results of the same channel are relatively standard. The deviation is less than 5%. Injecting 1×10 -5 mmol/L paraoxon, the average concentration obtained in 4 channels was 9.6×10 -6 mmol/L, with a relative deviation of 4%. The above results show that the multi-channel microfluidic electrochemical chip developed by the present invention can be successfully applied to the efficient and rapid determination of actual samples.

Claims (9)

1.一种多通道微流控芯片,其特征在于,该芯片的缓冲液池伸出若干分离通道,每条分离通道上,各有一个样品池、检测池、进样通道和工作电极通道以及工作电极通道中的电极,检测池在分离通道的一端;样品池通过进样通道与分离通道相通;工作电极通道一端与外接电源相通,另一端靠近检测池。1. A multi-channel microfluidic chip is characterized in that the buffer pool of the chip stretches out some separation channels, and on each separation channel, there are respectively a sample pool, a detection pool, a sampling channel and a working electrode channel and For the electrodes in the working electrode channel, the detection cell is at one end of the separation channel; the sample cell communicates with the separation channel through the sampling channel; one end of the working electrode channel communicates with an external power supply, and the other end is close to the detection cell. 2.如权利要求1所述的微流控芯片,其特征在于,该微流控芯片的分离通道、进样通道、工作电极通道的高度为25~100微米,宽度为25~100微米,分离通道的长度为40~80毫米;进样通道长度1~5毫米,进样通道与分离通道的交点到分离通道的检测池侧端点的距离为35~75毫米。2. The microfluidic chip according to claim 1, characterized in that, the height of the separation channel, sampling channel and working electrode channel of the microfluidic chip is 25-100 microns, and the width is 25-100 microns. The length of the channel is 40-80 mm; the length of the sampling channel is 1-5 mm, and the distance from the intersection of the sampling channel and the separation channel to the detection pool side end of the separation channel is 35-75 mm. 3.如权利要求1所述的微流控芯片,其特征在于,该微流控芯片的工作电极通道与检测池边缘的距离为25-50微米。3. The microfluidic chip according to claim 1, wherein the distance between the channel of the working electrode of the microfluidic chip and the edge of the detection cell is 25-50 microns. 4.如权利要求1所述的微流控芯片,其特征在于,该微流控芯片样品池的直径为1~3毫米,检测池的直径为3~6毫米,各检测池圆心之间的距离为8~15毫米。4. The microfluidic chip according to claim 1, wherein the diameter of the microfluidic chip sample pool is 1 to 3 mm, the diameter of the detection pool is 3 to 6 mm, and the distance between the centers of each detection pool is The distance is 8-15 mm. 5.如权利要求1所述的微流控芯片,其特征在于,该微流控芯片的各分离通道之间平行,相邻两分离通道之间距离为7~20毫米;该微流控芯片的各工作电极通道之间平行,相邻两工作电极通道之间距离为7~20毫米。5. The microfluidic chip according to claim 1, wherein the separation channels of the microfluidic chip are parallel to each other, and the distance between two adjacent separation channels is 7 to 20 millimeters; the microfluidic chip The working electrode channels are parallel to each other, and the distance between two adjacent working electrode channels is 7-20 mm. 6.如权利要求1所述的微流控芯片,其特征在于,该微流控芯片的进样通道与分离通道夹角为30~90度。6. The microfluidic chip according to claim 1, wherein the included angle between the sampling channel and the separation channel of the microfluidic chip is 30-90 degrees. 7.如权利要求1所述的微流控芯片,其特征在于,该微流控芯片的每条分离通道上还有一个废液池,废液池通过另一段进样通道与分离通道相通,废液池的直径为1~3毫米。7. The microfluidic chip according to claim 1, characterized in that, each separation channel of the microfluidic chip also has a waste liquid pool, and the waste liquid pool communicates with the separation channel through another section of the sampling channel, The diameter of the waste liquid pool is 1-3 mm. 8.如权利要求1所述的微流控芯片,其特征在于,它以聚甲基丙烯酸甲酯为材质。8. The microfluidic chip according to claim 1, characterized in that it is made of polymethyl methacrylate. 9.一种如权利要求1所述多通道微流控芯片的制备方法,其特征在于,它包括以下步骤:9. A method for preparing a multi-channel microfluidic chip as claimed in claim 1, characterized in that it comprises the following steps: (1)用热压法或者原位聚合法在基片上制作分离通道、进样通道和工作电极通道,并在电极通道内填充功能碳糊材料作为工作电极;(1) Make separation channels, sample injection channels and working electrode channels on the substrate by hot pressing or in-situ polymerization, and fill the electrode channels with functional carbon paste materials as working electrodes; (2)在盖片上通过金刚钻打孔制作缓冲液池,通过激光打孔制作样品池、检测池、废液池;(2) Make a buffer pool on the cover slip by diamond drilling, and make a sample pool, a detection pool, and a waste liquid pool by laser drilling; (3)封合基片与盖片。(3) Seal the substrate and the cover.
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