CN100454050C - filter device - Google Patents
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- CN100454050C CN100454050C CNB200510036046XA CN200510036046A CN100454050C CN 100454050 C CN100454050 C CN 100454050C CN B200510036046X A CNB200510036046X A CN B200510036046XA CN 200510036046 A CN200510036046 A CN 200510036046A CN 100454050 C CN100454050 C CN 100454050C
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Abstract
本发明涉及一种滤光装置，其包括一基底及一滤光膜，该滤光膜设置于该基底的一侧，该滤光膜包括顺序叠加于基底表面的七个第一滤光腔、七个第二滤光腔、六个第三滤光腔及六个第四滤光腔，且该第一滤光腔、第二滤光腔、第三滤光腔及第四滤光腔分别由一层高折射率材料膜层与一层低折射率材料膜层叠加而成，所述第一滤光腔、第二滤光腔、第三滤光腔及第四滤光腔中高、低折射率材料膜层的厚度以紫外线及红外线波长为基础，经相应基准厚度系数优化所得，且该第一滤光腔、第二滤光腔、第三滤光腔及第四滤光腔中高、低折射率材料膜层的基准厚度系数均依次为3.5、2.5、1及0.76，该第一滤光腔、第二滤光腔、第三滤光腔及第四滤光腔的基准厚度系数均为1。
The invention relates to a filter device, which includes a base and a filter film, the filter film is arranged on one side of the base, and the filter film includes seven first filter cavities sequentially stacked on the surface of the base, Seven second filter cavities, six third filter cavities and six fourth filter cavities, and the first filter cavity, second filter cavity, third filter cavity and fourth filter cavity are respectively It is composed of a layer of high refractive index material film layer and a layer of low refractive index material film layer. Among the first filter cavity, the second filter cavity, the third filter cavity and the fourth filter cavity, the high and low The thickness of the film layer of the refractive index material is based on the ultraviolet and infrared wavelengths, and is obtained by optimizing the corresponding reference thickness coefficients, and the first filter cavity, the second filter cavity, the third filter cavity and the fourth filter cavity are medium high, The reference thickness coefficients of the low-refractive index material film layer are all sequentially 3.5, 2.5, 1 and 0.76, and the reference thickness coefficients of the first filter cavity, the second filter cavity, the third filter cavity and the fourth filter cavity are all is 1.
Description
[technical field]
The present invention is about a kind of filtering apparatus, particularly a kind ofly can filter ultraviolet and infrared light and allows the filtering apparatus of visible light transmissive.
[background technology]
Be applied to the glass of automobile, aircraft, normally make by substrate with filtering functions, or on common substrate, form one deck filter coating, can eliminate unnecessary light, reduce ultraviolet ray and infrared ray energy into the car, thereby avoid ultraviolet ray to damage of elements in human body and the car, prevent infrared radiation and cause vehicle interior temperature to rise and element in burn human body and the car.
For the glass that makes automobile, aircraft can have certain effect that ends to ultraviolet ray, infrared ray, realize by dual mode usually.A kind of mode is to add some absorbing agents to come by unwanted light in glass material, makes visible light transmissive.As United States Patent (USP) the 2nd, 444, disclose a kind of filtering apparatus that aircraft windows is used that is suitable for for No. 976, contain iron oxide, a large amount of cerium oxide (1.5～3%) and titanium dioxide (6～9%) in the light absorber of this filtering apparatus, have utmost point low ultraviolet ray penetrance and higher visible light penetrance.The filtering apparatus of this patent is to come ultraviolet-cutoff by add ultraviolet light absorber in glass material.
Another kind of mode is to form a kind of functional film to come by unwanted light in substrate, makes visible light transmissive.Disclose a kind of windshield 200410000007.X number as Chinese patent application with properties of infrared reflection, be provided with the semiconductor sull between the outer substrate of this glass and the PVB film or between inner substrate and the PVB film, be mixed with the indium oxide film that contains tin oxide in this oxide semiconductor film; Or being mixed with at least a above zinc-oxide film of salic, monox, boron oxide, gallium oxide or dysprosia, the mass percent total amount of institute's doping oxide is 0.1～10%.This windshield is higher than 70% to the transmitance of visible light, greater than 70%, makes glass have heat-proof quality to ultrared reflectivity.But, do not relate in this windshield wiper designs and ending, and mainly utilize reflex to eliminate infrared ray ultraviolet, the infrared ray of each wave band efficiently can not be ended.
Therefore, be necessary to provide a kind of filtering apparatus that the ultraviolet ray and the infrared ray of each wave band are efficiently ended.
[summary of the invention]
Below, will a kind of filtering apparatus that the ultraviolet ray and the infrared ray of each wave band efficiently can be ended be described with embodiment.
For realizing foregoing, a kind of filtering apparatus is provided, it comprises a substrate and a filter coating, this filter coating is arranged at a side of this substrate, this filter coating comprises that order stack is added on seven first optical filtering chambeies of substrate surface, seven second optical filtering chambeies, six the 3rd optical filtering chambeies and six the 4th optical filtering chambeies, and this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber and the 4th optical filtering chamber are formed by stacking by one deck high-index material rete and one deck low-index material rete respectively, the described first optical filtering chamber, the second optical filtering chamber, high in the 3rd optical filtering chamber and the 4th optical filtering chamber, the thickness of low-index material rete is based on ultraviolet ray and Infrared wavelength, optimize gained through corresponding benchmark thickness coefficient, and this first optical filtering chamber, the second optical filtering chamber, high in the 3rd optical filtering chamber and the 4th optical filtering chamber, the root thickness coefficient of low-index material rete all is followed successively by 3.5,2.5,1 and 0.76, this first optical filtering chamber, the second optical filtering chamber, the root thickness coefficient in the 3rd optical filtering chamber and the 4th optical filtering chamber is 1.
The optical thickness of high and low refractive index material is λ/4 wavelength retes of optimizing through corresponding benchmark thickness coefficient in the above-mentioned first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber and the 4th optical filtering chamber.
The rete of high and low refractive index film layer adds up to 52 layers in the above-mentioned first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber and the 4th optical filtering chamber.
Thickness coefficient scope in the above-mentioned first optical filtering chamber after the optimization of high-index material rete is 3.169～3.721, and the thickness coefficient scope after the optimization of low-index material rete is 2.904～3.342.
Thickness coefficient scope in the above-mentioned second optical filtering chamber after the optimization of high-index material rete is 2.519～2.804, and the thickness coefficient scope after the optimization of low-index material rete is 2.472～2.982.
Thickness coefficient scope in above-mentioned the 3rd optical filtering chamber after the optimization of high-index material rete is 0.799～0.998, and the thickness coefficient scope after the optimization of low-index material rete is 0.665～1.185.
Thickness coefficient scope in above-mentioned the 4th optical filtering chamber after the optimization of high-index material rete is 0.246～1.004, and the thickness coefficient scope after the optimization of low-index material rete is 0.594～1.221.
Above-mentioned filtering apparatus also comprises an antireflection membrane stack.
Above-mentioned antireflection membrane stack is arranged in the substrate and a side relative with filter coating.
Above-mentioned antireflection membrane stack is arranged between substrate and the filter coating.
Above-mentioned antireflection membrane stack is arranged on the filter coating and a side relative with substrate.
Above-mentioned antireflection membrane stack is alternately to be formed by stacking by high-index material rete and low-index material rete.
The rete of high-index material and low-index material adds up to four layers in the above-mentioned antireflection membrane stack.
Each rete of above-mentioned antireflection membrane stack the arrange high-index material that is followed successively by 0.301 λ/4 optical thicknesses, the low-index material of 0.421 λ/4 optical thicknesses, the high-index material of 2.546 λ/4 optical thicknesses, the low-index material of 1.137 λ/4 optical thicknesses.
The filtering apparatus that present embodiment provided is provided with filter coating on the medial surface of substrate or lateral surface, its advantage is: at first, this filter coating is ultraviolet ray filtering and infrared ray simultaneously; Secondly, utilize the digital simulation technology, the root thickness coefficient of high and low refractive index material in the filter coating is optimized, the ultraviolet ray of each wave band and infrared ray are filtered as far as possible fully; At last, be preferable over and the antireflection membrane stack is set in the substrate can effectively reduces the volume reflection of visible light, increase transmissivity in substrate surface.
[description of drawings]
Fig. 1 is the structural representation of the technical program first embodiment filter glass.
Fig. 2 is the structural representation of the filter coating of the technical program first embodiment.
Fig. 3 is the structural representation of the technical program second embodiment filter glass.
[embodiment]
Below in conjunction with accompanying drawing and some embodiment a kind of filtering apparatus is described in further detail.
As shown in Figure 1, the filtering apparatus of the technical program first embodiment is one to be used for the filter glass 1 of automobile, it has a substrate 10, this substrate 10 comprises a medial surface 11 and a lateral surface 12, one filter coating 20 is arranged on medial surface 11 or the lateral surface 12, and present embodiment describes to be arranged on the medial surface 11.This filter coating 20 is alternately to be arranged by high-index material rete and low-index material rete to form.This high-index material comprises titania (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5), tantalum oxide (Ta
2O
5) etc., low-index material comprises silicon dioxide (SiO
2), aluminium oxide (Al
2O
3) etc.This substrate 10 is a transparent substrates, and its used material comprises glass, pottery, plastics etc., and substrate of glass is adopted in the substrate 10 of present embodiment.
As shown in Figure 2, this filter coating 20 comprises a plurality of first optical filtering chambeies 21, a plurality of second optical filtering chamber 22, a plurality of the 3rd optical filtering chamber 23 and a plurality of the 4th optical filtering chamber 24.These first optical filtering chamber, 21 order stack are added on the medial surface 11 or lateral surface 12 of substrate 10, present embodiment is added on the medial surface 11 with order stack and describes, these second optical filtering chamber, 22 order stack are added on the surface in this first optical filtering chamber 21, the 3rd optical filtering chamber 23 order stack are added on the surface in this second optical filtering chamber 22, and the 4th optical filtering chamber 24 order stack are added on the surface in the 3rd optical filtering chamber 23.
The thickness of high-index material rete is counted H, H=(λ
1/ 4)/and n1, wherein, λ 1 is a wavelength of light to be filtered, n
1Refractive index for high-index material.The thickness of low-index material rete is counted L, L=(λ
1/ 4)/n
2, n
2Refractive index for low-index material.
The first optical filtering chamber 21 is made up of double-layer films, i.e. the high-index material rete 211 and the low-index material rete 212 of alternately stack.High-index material rete 211 is identical with the root thickness coefficient of low-index material rete 212, is 3.5, so in the first optical filtering chamber 21, the root thickness H=3.5 * (λ of high-index material rete 211
1/ 4)/n
1The root thickness L=3.5 * (λ of low-index material rete 212
1/ 4)/n
2The first optical filtering chamber 21 is provided with seven altogether, and its total rete number is 14 layers.
The second optical filtering chamber 22 is made up of double-layer films, i.e. the high-index material rete 221 and the low-index material rete 222 of alternately stack.High-index material rete 221 is identical with the root thickness coefficient of low-index material rete 222, is 2.5, so in the second optical filtering chamber 22, the root thickness H=2.5 * (λ of high-index material rete 221
1/ 4)/n
1The root thickness L=2.5 * (λ of low-index material rete 222
1/ 4)/n
2The second optical filtering chamber 22 is provided with seven altogether, and its total rete number is 14 layers.
Form the high-index material rete 231 and the low-index material rete 232 of i.e. alternately stack in the 3rd optical filtering chamber 23 by double-layer films.High-index material rete 231 is 1 with the root thickness coefficient of low-index material rete 232, so in the 3rd optical filtering chamber 23, the root thickness H=1 * (λ of high-index material rete 231
1/ 4)/n
1The root thickness L=1 * (λ of low-index material rete 232
1/ 4)/n
2The 3rd optical filtering chamber 23 is provided with six altogether, and its total rete number is a Floor 12.
Form by double-layer films in the 4th optical filtering chamber 24, comprise the high-index material rete 241 and low-index material rete 242 of alternately stack.High-index material rete 241 is 0.76 with the root thickness coefficient of low-index material rete 242, so in the 4th optical filtering chamber 24, the root thickness H=0.76 * (λ of high-index material rete 241
1/ 4)/n
1The root thickness L=0.76 * (λ of low-index material rete 242
1/ 4)/n
2The 4th optical filtering chamber 24 is provided with six altogether, and its total rete number is a Floor 12.
The root thickness coefficient in the above-mentioned first optical filtering chamber 21, the second optical filtering chamber 22, the 3rd optical filtering chamber 23 and the 4th optical filtering chamber 24 is 1, so, the root thickness of filter coating 20 is above-mentioned four optical filtering chamber thickness sums, and the rete of filter coating 20 adds up to above-mentioned four optical filtering chambeies rete sum sum, i.e. five Floor 12s.Selecting high-index material for use is TiO
2, its refractive index is 2.311; Low-index material is SiO
2, its refractive index is 1.473; Then, H=(λ
1/ 4)/2.311, L=(λ/4)/1.473.λ
1Be wavelength of light to be filtered, default ultraviolet ray or the Infrared wavelength that will filter, then the one-tenth-value thickness 1/10 of H, L can be determined, filter coating 20 each rete are specifically arranged and are seen Table 1-1.
The structure of table 1-1 filter coating and the tabulation of each layer thickness
Ultraviolet range is between 200nm～400nm, and wavelength is shorter, and ultraviolet energy is bigger, and is then big to the human injury.Infrared wavelength range is between 747nm～840nm, and the shorter energy of wavelength is bigger, and is bigger to the human injury.Utilize the digital simulation technology, the structure of the filter coating 20 shown in the his-and-hers watches 1-1 is optimized, be specially: the penetrance with visible light is the simulation benchmark, root thickness coefficient to high-index material rete and low-index material rete is optimized, or the root thickness coefficient in each optical filtering chamber is optimized, get the structure of a best filter coating 20, so that the ultraviolet ray of each wave band and infrared ray are filtered fully as far as possible.The digital simulation process of present embodiment, visible light with 95% penetrance is a mock standard, root thickness coefficient to high and low refractive index film layer in the filter coating 20 is optimized, and for example gets ultraviolet wavelength and be 320nm (also can ultrared any wavelength be example), and high-index material is TiO
2, its refractive index is 2.311; Low-index material is SiO
2, its refractive index is 1.473; Then, H=(320/4)/2.311, L=(320/4)/1.473.The structure of optimizing the filter coating 20 of gained sees Table 1-2.
The structure of the filter coating after table 1-2 optimizes and the tabulation of each layer thickness
As can be seen from the above table, in the structure of the filter coating 20 after the optimization, the thickness coefficient scope in the first optical filtering chamber 21 after the optimization of high-index material rete is 3.169～3.721, and the thickness coefficient scope after the optimization of low-index material rete is 2.904～3.342.Thickness coefficient scope in the second optical filtering chamber 22 after the optimization of high-index material rete is 2.519～2.804, and the thickness coefficient scope after the optimization of low-index material rete is 2.472～2.982.Thickness coefficient scope in the 3rd optical filtering chamber 23 after the optimization of high-index material rete is 0.799～0.998, and the thickness coefficient scope after the optimization of low-index material rete is 0.665～1.185.Thickness coefficient scope in the 4th optical filtering chamber 24 after the optimization of high-index material rete is 0.246～1.004, and the thickness coefficient scope after the optimization of low-index material rete is 0.594～1.221.
As shown in Figure 3, the filtering apparatus of the technical program second embodiment is a filter glass 2, and it has a substrate 10, one filter coatings 20 and an antireflection membrane stack 30, and this substrate 10 has a medial surface 11 and a lateral surface 12.This filter coating 20 is arranged on the medial surface 11, and antireflection membrane stack 30 is arranged on the lateral surface 12, and the structure of this filter coating 20 is identical with structure among first embodiment.
Antireflection membrane stack 30 alternately is formed by stacking by high-index material and low-index material.This antireflection membrane stack 30 is divided into four layers: ground floor is that high-index material, the second layer of 0.301 λ/4 optical thicknesses is the low-index material of 0.421 λ/4 optical thicknesses, and the 3rd layer is that the high-index material, the 4th layer of 2.546 λ/4 optical thicknesses is the low-index material of 1.137 λ/4 optical thicknesses.If high-index material is selected Ti for use
3O
5, low-index material is selected SiO for use
2, then this antireflection membrane stack 30 is arranged and is followed successively by: the Ti of 12.579nm
3O
5Rete, the SiO of 29.707nm
2Rete, the Ti of 106.263nm
3O
5Rete, the SiO of 80.262nm
2Rete.
On the lateral surface 12 of substrate 10, antireflection membrane stack 30 is set, can reduces the reflection of visible light, increase its penetrance in substrate surface.
In addition, when filter coating 20 was arranged on the lateral surface 12, antireflection membrane stack 30 was arranged on the medial surface 11; Or antireflection membrane stack 30 is arranged between filter coating 20 and the substrate 10, or antireflection membrane stack 30 is arranged on the filter coating 20 side relative with substrate 10.Above variety of way antireflection membrane stack 30 all can reduce the reflection of visible light in substrate surface, increases its penetrance.
The filtering apparatus that present embodiment provided is provided with filter coating on the medial surface of substrate or lateral surface, its advantage is: at first, this filter coating is ultraviolet ray filtering and infrared ray simultaneously; Secondly, utilize the digital simulation technology, the root thickness coefficient of high and low refractive index film layer in the filter coating is optimized, the ultraviolet ray of each wave band and infrared ray are filtered as far as possible fully; At last, be preferable over and the antireflection membrane stack is set in the substrate can effectively reduces the volume reflection of visible light, increase transmissivity in substrate surface.
Claims (14)
1. filtering apparatus, it comprises a substrate and a filter coating, this filter coating is arranged at a side of this substrate, described filter coating comprises that order stack is added on seven first optical filtering chambeies of substrate surface, seven second optical filtering chambeies, six the 3rd optical filtering chambeies and six the 4th optical filtering chambeies, the described first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber and the 4th optical filtering chamber are formed by stacking by one deck high-index material rete and one deck low-index material rete respectively, it is characterized in that, this first optical filtering chamber, the second optical filtering chamber, high in the 3rd optical filtering chamber and the 4th optical filtering chamber, the thickness of low-index material rete is based on ultraviolet ray and Infrared wavelength, optimize gained through corresponding benchmark thickness coefficient, and this first optical filtering chamber, the second optical filtering chamber, high in the 3rd optical filtering chamber and the 4th optical filtering chamber, the root thickness coefficient of low-index material rete all is followed successively by 3.5,2.5,1 and 0.76, this first optical filtering chamber, the second optical filtering chamber, the root thickness coefficient in the 3rd optical filtering chamber and the 4th optical filtering chamber is 1.
2. filtering apparatus as claimed in claim 1 is characterized in that, the optical thickness of high and low refractive index film layer is λ/4 wavelength of optimizing through corresponding benchmark thickness coefficient in this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber and the 4th optical filtering chamber.
3. filtering apparatus as claimed in claim 1 is characterized in that, the rete of high and low refractive index film layer adds up to 52 layers in this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber and the 4th optical filtering chamber.
4. filtering apparatus as claimed in claim 1 is characterized in that, the thickness coefficient scope in this first optical filtering chamber after the optimization of high-index material rete is 3.169～3.721, and the thickness coefficient scope after the optimization of low-index material rete is 2.904～3.342.
5. filtering apparatus as claimed in claim 1 is characterized in that, the thickness coefficient scope in this second optical filtering chamber after the optimization of high-index material rete is 2.519～2.804, and the thickness coefficient scope after the optimization of low-index material rete is 2.472～2.982.
6. filtering apparatus as claimed in claim 1 is characterized in that, the thickness coefficient scope in the 3rd optical filtering chamber after the optimization of high-index material rete is 0.799～0.998, and the thickness coefficient scope after the optimization of low-index material rete is 0.665～1.185.
7. filtering apparatus as claimed in claim 1 is characterized in that, the thickness coefficient scope in the 4th optical filtering chamber after the optimization of high-index material rete is 0.246～1.004, and the thickness coefficient scope after the optimization of low-index material rete is 0.594～1.221.
8. filtering apparatus as claimed in claim 1 is characterized in that, this filtering apparatus also comprises an antireflection membrane stack.
9. filtering apparatus as claimed in claim 8 is characterized in that, this antireflection membrane stack is arranged in the substrate and a side relative with filter coating.
10. filtering apparatus as claimed in claim 8 is characterized in that, this antireflection membrane stack is arranged between substrate and the filter coating.
11. filtering apparatus as claimed in claim 8 is characterized in that, this antireflection membrane stack is arranged on the filter coating and a side relative with substrate.
12. filtering apparatus as claimed in claim 8 is characterized in that, this antireflection membrane stack is alternately to be formed by stacking by high-index material rete and low-index material rete.
13. filtering apparatus as claimed in claim 8 is characterized in that, the rete of high-index material and low-index material adds up to four layers in this antireflection membrane stack.
14. filtering apparatus as claimed in claim 13, it is characterized in that each rete of this antireflection membrane stack the arrange high-index material that is followed successively by 0.301 λ/4 optical thicknesses, the low-index material of 0.421 λ/4 optical thicknesses, the high-index material of 2.546 λ/4 optical thicknesses, the low-index material of 1.137 λ/4 optical thicknesses.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200510036046XA CN100454050C (en) | 2005-07-15 | 2005-07-15 | filter device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200510036046XA CN100454050C (en) | 2005-07-15 | 2005-07-15 | filter device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1896780A CN1896780A (en) | 2007-01-17 |
| CN100454050C true CN100454050C (en) | 2009-01-21 |
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ID=37609332
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|---|---|---|---|
| CNB200510036046XA Expired - Fee Related CN100454050C (en) | 2005-07-15 | 2005-07-15 | filter device |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103454709A (en) * | 2012-05-30 | 2013-12-18 | 鸿富锦精密工业（深圳）有限公司 | Infrared cut-off filter and lens module |
| CN106886068B (en) * | 2015-12-16 | 2021-04-02 | 张家港康得新石墨烯应用科技有限公司 | Optical filter, preparation method thereof and imaging device with optical filter |
| US10288476B2 (en) | 2015-12-21 | 2019-05-14 | Apple Inc. | Ambient light sensor window coatings for electronic devices |
| CN105589123B (en) * | 2016-03-03 | 2018-09-28 | 舜宇光学(中山)有限公司 | Infrared and ultraviolet cut-off filter film structure for large-curvature lens surface and manufacturing method |
| CN110320583A (en) * | 2019-07-15 | 2019-10-11 | 杭州美迪凯光电科技有限公司 | Three wave crest coating process of visible light |
| CN119380619A (en) * | 2023-07-25 | 2025-01-28 | 北京小米移动软件有限公司 | Display module, cover plate assembly and electronic device |
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|---|---|---|---|---|
| JPH04133004A (en) * | 1990-09-25 | 1992-05-07 | Matsushita Electric Works Ltd | Ultraviolet and infrared cut filter |
| JPH06160622A (en) * | 1992-07-01 | 1994-06-07 | Kokusai Denshin Denwa Co Ltd <Kdd> | Optical filter |
| US5360659A (en) * | 1993-05-24 | 1994-11-01 | The Dow Chemical Company | Two component infrared reflecting film |
| US5926317A (en) * | 1996-11-06 | 1999-07-20 | Jds Fitel Inc. | Multilayer thin film dielectric bandpass filter |
| JP2000314808A (en) * | 1999-04-28 | 2000-11-14 | Kinseki Ltd | Infrared cut filter |
| US6611378B1 (en) * | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
| JP2004177658A (en) * | 2002-11-27 | 2004-06-24 | Sun Tec Kk | Dielectric multilayer band-pass filter |
| JP2005055543A (en) * | 2003-08-07 | 2005-03-03 | Super Technology Innovators Co Ltd | Polymer optical multilayer film and method for producing polymer optical multilayer film |
-
2005
- 2005-07-15 CN CNB200510036046XA patent/CN100454050C/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04133004A (en) * | 1990-09-25 | 1992-05-07 | Matsushita Electric Works Ltd | Ultraviolet and infrared cut filter |
| JPH06160622A (en) * | 1992-07-01 | 1994-06-07 | Kokusai Denshin Denwa Co Ltd <Kdd> | Optical filter |
| US5360659A (en) * | 1993-05-24 | 1994-11-01 | The Dow Chemical Company | Two component infrared reflecting film |
| US5926317A (en) * | 1996-11-06 | 1999-07-20 | Jds Fitel Inc. | Multilayer thin film dielectric bandpass filter |
| JP2000314808A (en) * | 1999-04-28 | 2000-11-14 | Kinseki Ltd | Infrared cut filter |
| US6611378B1 (en) * | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
| JP2004177658A (en) * | 2002-11-27 | 2004-06-24 | Sun Tec Kk | Dielectric multilayer band-pass filter |
| JP2005055543A (en) * | 2003-08-07 | 2005-03-03 | Super Technology Innovators Co Ltd | Polymer optical multilayer film and method for producing polymer optical multilayer film |
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|---|---|
| CN1896780A (en) | 2007-01-17 |
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