CN100460951C - Color filter substrate for liquid crystal display device and manufacturing method thereof - Google Patents

Abstract

A color filter substrate for a liquid crystal display device includes: a substrate including a first sub-pixel area, a second sub-pixel area, a third sub-pixel area and a first boundary area between adjacent sub-pixel areas, The second boundary area and the third boundary area; the first red color filter pattern, the first green color filter pattern and the second color filter pattern at the first sub-pixel area, the second sub-pixel area and the third sub-pixel area respectively a blue color filter pattern; and a second red color filter pattern, a second green color filter pattern and a second color filter pattern at each of the first border region, the second border region and the third border region Blue color filter pattern.

Description

Color filter substrate for liquid crystal display device and manufacturing method thereof

technical field

The present invention relates to a liquid crystal display device, and more particularly, to a color filter substrate for a liquid crystal display device and a manufacturing method thereof.

Background technique

Due to the rapid development of information technology, display devices are also continuously developed to process and display an increasing amount of information. Recently, a flat panel display technology for a thin-thickness, light-weight, and low-power consumption display device has been conceived and developed. Among these technologies, liquid crystal display (LCD) devices have been widely used in notebook computers, desktop monitors, and other applications due to their excellent resolution, color image display, and image quality.

In general, an LCD device includes an upper substrate, a lower substrate, and a liquid crystal layer interposed between the upper and lower substrates. The LCD device utilizes the optical anisotropy of liquid crystal material to change light transmittance corresponding to the alignment of liquid crystal molecules through an electric field to generate images.

A lower substrate, generally called an array substrate, includes thin film transistors and pixel electrodes. The lower substrate is manufactured by repeating the photolithography process to pattern the pre-formed thin film. The upper substrate, generally called a color filter substrate, includes color filter layers for displaying color images. The color filter layer generally includes color filter patterns of red (R), green (G), and blue (B). The color filter layer is formed by various methods including, for example, a dyeing method, a plating method, a pigment dispersion method, and a printing method. Generally, since the pigment dispersion method can form fine patterns with good reproducibility, it is more commonly used.

However, in the color filter substrate manufacturing method using the pigment dispersion method, since the color filter substrate is manufactured by repeating the processes of coating, exposure, development, and color resist (color resist) curing, the manufacturing method is complicated, Therefore, a lot of time and equipment are required.

In order to solve the above problems, a color filter substrate manufacturing method using a thermal imaging method has been proposed. In the thermal imaging method, by adhering a color filter transfer film to a substrate, exposing the color filter transfer film to a light source such as a laser beam, and The layer is transferred onto a substrate to form a color filter layer.

The color filter transfer film includes: a support film, a light-to-heat conversion (LTHC) layer, and a color filter layer. The supporting film supports the LTHC layer and the color filter layer, and transmits the laser beam to the LTHC layer. The support membrane can be formed from a transparent polymeric material such as polyester or polyethylene. The LTHC layer converts light absorbed from a laser beam into thermal energy, and thus the LTHC may be formed of a material that efficiently converts light into heat. The color filter layer may be formed of a material including one of red, green and blue pigments.

1A to 1I illustrate a method of manufacturing a color filter substrate using thermal imaging according to the prior art.

As shown in FIG. 1A , the black matrix 31 is formed by depositing a metal material such as chromium or chromium oxide (CrOx) on a transparent substrate 30 . The photoresist layer 32 is formed by coating a photoresist resin on almost the entire surface of the black matrix 31 . A mask 90 including a light-blocking portion and a light-transmitting portion is disposed over the photoresist layer 32 , and the photoresist layer 32 is exposed through the mask 90 .

Then, as shown in FIG. 1B , the exposed photoresist layer 32 of FIG. 1A is developed, thereby forming a photoresist pattern 33 . Here, the photoresist layer 32 is negative-tone, where exposed portions remain after development. However, the photoresist layer 32 may also use a positive type in which exposed portions are removed after development.

Next, as shown in FIG. 1C , the black matrix 31 of FIG. 1B is selectively removed according to the photoresist pattern 33 , thereby forming a black matrix 35 with openings.

As shown in FIG. 1D , the photoresist pattern 33 of FIG. 1C on the black matrix 35 is removed by a stripping or ashing process.

As shown in FIG. 1E, a first color filter layer transfer film 10 including a support film 10a, a light-to-heat conversion (LTHC) layer 10b, and a color filter layer 10c is provided on a substrate 30 including a black matrix 35, so that the color filter The device layer 10c faces the surface of the substrate 30 on which the black matrix 35 is formed. Then, the color filter layer 10 c of the first color filter transfer film 10 is adhered to the substrate 30 .

Next, as shown in FIG. 1F , the substrate 30 including the adhered first color filter transfer film 10 is loaded into a laser device, and the laser head 50 for generating a laser beam is arranged on the first color filter transfer film 10 . Printed film 10 top. The substrate 30 may be located on a table (not shown). The laser beam is applied to the portion A of the color filter transfer film 10 where the first color filter pattern will be subsequently formed, while the laser head 50 or stage is reciprocated in a straight line. In the first color filter transfer film 10 exposed to the laser beam, the LTHC layer 10b converts light absorbed from the laser beam into heat energy, thereby emitting heat energy to the color filter layer 10c. Then, the color filter layer 10c is transferred onto the substrate 30 due to the emitted thermal energy.

As shown in FIG. 1G, after the color filter transfer film 10 of FIG. 1F is removed, a first color filter pattern 40 is formed in one opening of the black matrix 35 corresponding to the portion A. Referring to FIG. The first color filter pattern 40 partially covers the adjacent portion of the black matrix 35 .

As shown in FIG. 1H, using the second color filter transfer film and the third color filter transfer film, the second color filter pattern 42 and the second color filter pattern 42 are formed on the substrate 30 by the same process as shown in FIGS. 1E to 1G. Three color filter patterns 44 .

Next, the substrate 30 having the color filter patterns 40, 42, and 44 is placed in a hardening furnace such as an oven at about 200 degrees Celsius to about 300 degrees Celsius, so that the color filter patterns 40, 42, and 44 are hardened. .

As shown in FIG. 1I , an overcoat layer 46 is formed on the hardened color filter patterns 40 , 42 and 44 . The overcoat layer 46 protects the color filter patterns 40, 42, and 44, and makes the surface of the substrate 30 flat without steps. The common electrode 48 is formed on the coating layer 46 by depositing a transparent conductive material such as indium tin oxide and/or indium zinc oxide.

In the above-mentioned color filter substrate manufactured using the thermal imaging method, the black matrix 35 is formed between adjacent color filter patterns 40, 42, and 44, and the black matrix 35 is opposite to the color of the color filter patterns 40, 42, and 44. to separate. In addition, the black matrix 35 blocks light from irregularly driven liquid crystal molecules on gate lines and data lines of the array substrate. The black matrix 35 may generally be formed of a metal material having an optical density greater than 4, such as chromium. Incidentally, in order to form the black matrix, a complicated photolithography process is still required. That is, the photolithography process includes the steps of coating, exposing and developing photoresist, and then etching the black matrix material after depositing the black matrix material. In addition, an apparatus for the above steps is required, and there is no advantage in manufacturing cost compared with a color filter substrate manufactured using a pigment dispersion method.

Contents of the invention

By way of example only, as embodied and broadly described, a color filter substrate for a liquid crystal display device includes: a substrate including a first sub-pixel region, a second sub-pixel region and a third sub-pixel region And the first boundary area, the second boundary area and the third boundary area between the adjacent sub-pixel areas; the first red filter color at the first sub-pixel area, the second sub-pixel area and the third sub-pixel area respectively filter pattern, a first green color filter pattern, and a first blue color filter pattern; and a second red color filter pattern, a second Two green color filter patterns and a second blue color filter pattern.

In another aspect of the present invention, there is provided a method of manufacturing a color filter substrate for a liquid crystal display device, the method including: forming a first red color filter pattern and a second red color filter pattern on the substrate , the substrate includes a first sub-pixel area, a second sub-pixel area, and a third sub-pixel area, and a first border area, a second border area, and a third border area between adjacent sub-pixel areas, and the first red filter color The filter pattern is at the first sub-pixel area, the second red color filter pattern is at each of the first border area, the second border area and the third border area; the first green filter is formed at the second sub-pixel area color filter pattern, and form a second green color filter pattern at each of the first border area, the second border area, and the third border area; and form a first blue color filter at the third sub-pixel area pattern, and form a second blue color filter pattern at each of the first border area, the second border area, and the third border area.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed.

Description of drawings

The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principle of the invention.

In the attached picture:

1A to 1I are cross-sectional views illustrating a method of manufacturing a color filter substrate using a thermal imaging method according to the prior art;

2A to 2I are cross-sectional views illustrating a method of manufacturing a color filter substrate using a thermal imaging method according to a first embodiment of the present invention;

3A to 3C are cross-sectional views illustrating a method of manufacturing a color filter substrate according to a second embodiment of the present invention.

Detailed ways

Embodiments of the present invention will be described in detail below and illustrated in the accompanying drawings.

2A to 2I are cross-sectional views illustrating a method of manufacturing a color filter substrate using thermal imaging according to a first embodiment of the present invention.

As shown in FIG. 2A, a first sub-pixel area R, a second sub-pixel area G, and a third sub-pixel area B are defined on a transparent substrate 130, as well as a first border area BA1, a second border area BA2, and a third border area. BA3 , and the red color filter transfer film 110 is disposed on the substrate 130 . The first border area BA1, the second border area BA2, and the third border area BA3 are disposed between adjacent sub-pixel areas R, G, and B in sequence. The red color filter transfer film 110 includes a support film 110a, a light-to-heat conversion (LTHC) layer 110b, and a red color filter layer 110c. The red color filter layer 110c of the red color filter transfer film 110 is adhered to the substrate 130 without air bubbles using a transfer device having a transfer roller.

As shown in FIG. 2B , a laser 170 is disposed at a distance above the red color filter transfer film 110 . When the laser 170 scans the substrate 130, the laser 170 is applied to the portion of the red color filter transfer film 110 corresponding to the first sub-pixel region R and the first boundary region BA1, the second boundary region BA2, and the third boundary region BA3. Laser beam. In the red color filter transfer film 110 exposed to the laser beam, the LTHC layer 110b converts light absorbed from the laser beam into heat energy, thereby emitting heat energy to the red color filter layer 110c. Then, the red color filter layer 110c is separated from the LTHC layer 110b due to the emitted thermal energy, and is transferred onto the substrate 130 to be fixed on the substrate 130 .

As shown in FIG. 2C , the red color filter transfer film 110 of FIG. 2B is removed from the substrate 130 . Thus, the first red color filter pattern 140 is formed in the first sub-pixel region R, and the second red filter pattern is formed in each of the first boundary region BA1, the second boundary region BA2, and the third boundary region BA3. device pattern 141. In the second sub-pixel region G and the third sub-pixel region B, since the laser beam is not applied to the LTHC layer 110b of FIG. superior. Accordingly, the red color filter layer 110c in the second and third sub-pixel regions G and B is removed together with the LTHC layer 110b.

Next, the substrate 130 having the first red color filter pattern 140 and the second red color filter pattern 141 is placed in a hardening (or curing) oven such as an oven so that the first red color filter pattern 140 and the second red color filter pattern The dichroic color filter pattern 141 is hardened (or cured). Preferably, the thickness of the hardened first and second red color filter patterns 140 and 141 ranges from about 1 μm to about 2 μm.

As shown in FIG. 2D , a green color filter transfer film 111 is disposed on the substrate 130 including the first red color filter pattern 140 and the second red color filter pattern 141 . The green color filter transfer film 111 includes a support film 111a, an LTHC layer 111b, and a green color filter layer 111c. Then, the green color filter layer 111c of the green color filter transfer film 111 is bubble-free adhered to the layer having the first red color filter pattern 140 and the second red color filter pattern using a transfer device including a transfer roller. 141 on the substrate 130 .

As shown in FIG. 2E , a laser 170 which may be different from the laser in FIG. 2B is disposed at a distance above the green color filter transfer film 111 . When the laser 170 scans the substrate 130, the laser 170 is applied to the green color filter transfer film 111 corresponding to the second sub-pixel area G and the first boundary area BA1, the second boundary area BA2, and the third boundary area BA3. Laser beam.

As shown in FIG. 2F , after the laser scanning, the green color filter transfer film 111 is removed from the substrate 130 . In the green color filter transfer film 111 exposed to the laser beam, since the green color filter layer 111c is transferred on the substrate 130, the first green color filter pattern 142 is formed in the second sub-pixel region G, And a second green color filter pattern 143 is formed on the second red color filter pattern 141 in each of the first boundary area BA1 , the second boundary area BA2 and the third boundary area BA3 .

Next, the substrate 130 having the first green color filter pattern 142 and the second green color filter pattern 143 is placed in a hardening furnace such as an oven so that the first green color filter pattern 142 and the second green color filter pattern The device pattern 143 is hardened. Preferably, the thickness of the hardened first green color filter pattern 142 and the second green color filter pattern 143 is in a range of about 1 μm to about 2 μm.

As shown in FIG. 2G, using a blue color filter transfer film (not shown), on the substrate 130 including the first green color filter pattern 142 and the second green color filter pattern 143, the red and green filter patterns are combined. The color filter patterns 140, 141, 142, and 143 are processed in the same way, the first blue color filter pattern 144 is formed in the third sub-pixel area B, and the first blue color filter pattern 144 is formed in each of the first boundary area BA1, the second boundary area BA2, and the third sub-pixel area B. The second blue color filter pattern 145 is formed on the second green color filter pattern 143 in the boundary area BA3.

Then, the substrate 130 having the first and second blue color filter patterns 144 and 145 is placed in a hardening oven such as an oven so that the first and second blue color filter patterns 144 and 145 are hardened. Preferably, the hardened first and second blue color filter patterns 144 and 145 have a thickness in a range of about 1 μm to about 2 μm.

As shown in FIG. 2H , by coating a transparent organic material such as photo acryl, a coating layer 146 is formed on a substrate 130 including the first red color in the respective sub-pixel regions R, G, and B. The color filter pattern 140, the first green color filter pattern 142, and the first blue color filter pattern 144, and the first border area BA1, the second border area BA2, and the third border area BA3 are sequentially formed. The second red color filter pattern 141 , the second green color filter pattern 143 and the second blue color filter pattern 145 . The coating layer 146 protects the color filter patterns 140 , 141 , 142 , 143 , 144 and 145 and flattens the surface of the substrate 130 including the color filter patterns 140 , 141 , 142 , 143 , 144 and 145 . The coating layer 146 has a thickness such that the second red color filter pattern 141, the second green color filter pattern 143, and the second blue filter pattern in each of the first boundary area BA1, the second boundary area BA2, and the third boundary area BA3 The shader pattern 145 is completely covered by the coating layer 146 . The coating layer 146 has a thickness in the range of about 3 μm to about 6 μm.

As shown in FIG. 2I, the common electrode 148 is formed on the substrate 130 including the coating layer 146 by depositing a transparent conductive material such as indium tin oxide.

In the first embodiment, hardening (or curing) treatment is performed after forming each color filter pattern. However, hardening treatment may be performed after the red, green, and blue color filter patterns are formed, thereby hardening the red, green, and blue color filter patterns.

Meanwhile, although the red, green, and blue color filter patterns are sequentially formed, other color filter patterns may also be formed, and the formation order may be changed.

In the above color filter substrate, since the ratios of the second red color filter pattern, the second green color filter pattern, and the second blue color filter pattern are formed in the respective boundary regions in the same ratio, the second red color filter pattern filter pattern, the second green color filter pattern, and the second blue color filter pattern are displayed in black. Accordingly, the second red color filter pattern, the second green color filter pattern, and the second blue color filter pattern in each boundary region serve as a black matrix that blocks light.

In order to improve productivity, more specifically, to purify red, green and blue, it is desirable that the thickness of the first red color filter pattern, the first green color filter pattern and the first blue color filter pattern is about 1 μm to in the range of 2 μm. As the thickness of the color filter pattern becomes thicker, the color purity improves. Therefore, the density of color is increased, and good color is produced. This manifests itself as a larger area on NTSC (National Television System Committee) chromaticity coordinates, thereby improving color reproducibility.

Incidentally, the thicker the thickness of the color filter layer of the color filter transfer film, the more thermal energy is required to transfer the color filter layer on the substrate. For this purpose, lasers are required which have a higher density of laser beams per unit area, thereby increasing the number of finished products produced. In addition, if the color filter layer has a thicker thickness, precision, which is necessary to form a good pattern, decreases. This reduces productivity.

Therefore, in the first embodiment, the thickness of the color filter pattern is optimally substantially about 1 μm to about 2 μm in consideration of the above problems.

Meanwhile, the second embodiment of the present invention provides a color filter transfer film having a color filter layer thinner than that of the first embodiment while preventing color purity and color production performance from degrading. A color filter substrate with a color pattern and a manufacturing method thereof.

3A to 3C are cross-sectional views illustrating a method of manufacturing a color filter substrate according to a second embodiment of the present invention.

As shown in FIG. 3A, a first red color filter pattern 240, a first green color filter pattern 240, and a first green color filter pattern are respectively formed in the first sub-pixel region R, the second sub-pixel region G, and the third sub-pixel region B on the substrate 230. 242 and the first blue color filter pattern 244, and the second red color filter pattern 241, the second green color filter pattern 241, the second green color filter pattern 243 and a second blue color filter pattern 245. The first red color filter pattern 240, the first green color filter pattern 242, and the first blue color filter pattern 244, and the second red color filter pattern can be formed by the same process as that described in the first embodiment. filter pattern 241, a second green color filter pattern 243 and a second blue color filter pattern 245. The first red color filter pattern 240, the first green color filter pattern 242, and the first blue color filter pattern 244 may have the same thickness as that in the first embodiment, that is, in the range of about 1 μm to 2 μm. thickness. However, preferably, the thickness of the first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 may be less than 1 μm, so that the second red color filter pattern 241, the second color filter pattern The thickness of the green color filter pattern 243 and the second blue color filter pattern 245 may be less than 3 μm.

Next, after including the first red color filter pattern 240, the first green color filter pattern 242, the first blue color filter pattern 244 and the second red color filter pattern 241, the second green color filter pattern 243 A colorless, transparent dye absorbing layer 259 is formed on almost the entire surface of the substrate 230 of the second blue color filter pattern 245 . The thickness of the dye absorbing layer 259 is greater than 2 μm such that the top surface of the dye absorbing layer 259 is equal to or higher than the top surface of the second blue color filter pattern 245 in the boundary areas BA1 , BA2 and BA3 . The dye absorbing layer 259 is formed by coating a colorless, transparent material that can absorb dye. The dye absorbing layer 259 may be formed of the same material as that of the first red color filter pattern 240, the first green color filter pattern 242, and the first blue color filter pattern 244 without pigment, such as acrylic. or epoxy resin material.

As shown in FIG. 3B, by means of an inkjet device 290, on a substrate 230 comprising the colorless, transparent dye-absorbing layer 259 of FIG. At the respective sub-pixel regions R, G and B, the ejected red, green and blue dyes are absorbed into the dye absorbing layer 259 of FIG. 3A. Therefore, the third red color filter pattern 260a, the third green color filter pattern 260b and the third blue color filter pattern are formed in the first sub-pixel region R, the second sub-pixel region G and the third sub-pixel region B, respectively. device pattern 260c. Here, color filter patterns having the same color are formed in the respective sub-pixel regions. That is, the first red color filter pattern 240 and the third red color filter pattern 260a are formed in the first sub-pixel region R; the first green color filter pattern 242 and the third green color filter pattern are formed in the second sub-pixel region G. The color filter pattern 260b; the first blue color filter pattern 244 and the third blue color filter pattern 260c are formed in the third sub-pixel region B. The dye absorbing layer 259 of FIG. 3A at the border areas BA1, BA2, and BA3 can absorb these dyes. However, the dye absorbing layer 259 of FIG. 3A at the border areas BA1 , BA2 and BA3 may also not absorb these dyes.

The third red color filter pattern, the third green color filter pattern and the third blue color filter pattern 260a, 260b and 260c are added with the first red color filter pattern 240, the first green color filter pattern 242 and the third color filter pattern. The thickness of the color filter layer of the first blue color filter pattern 244 . Therefore, color purity is increased and color reproducibility is improved. In addition, the third red, green, and blue color filter patterns 260a, 260b, and 260c serve as a planarization layer.

Generally, since dyes are finer and more uniform than pigments, a color filter layer including dyes has better color purity than a color filter layer including pigments when the color filter layers have the same thickness. However, dyes are inferior in heat resistance compared to pigments. Therefore, pigments are widely used in color filter substrates of liquid crystal display devices manufactured through high-temperature processing.

In the second embodiment of the present invention, the color filter layer has a double layer structure: an upper color filter pattern including dye and a lower color filter pattern including pigment. Thereby, the lower color filter pattern including the pigment compensates for heat resistance, and the upper color filter pattern having the dye compensates for color reproducibility, thereby providing a color filter substrate with improved color quality.

Next, as shown in FIG. 3C, by depositing a transparent conductive material, almost the entire surface of the third red color filter pattern, the third green color filter pattern and the third blue color filter pattern 260a, 260b and 260c A common electrode 248 is formed thereon. The transparent conductive material may be indium tin oxide or indium tin oxide.

In the present invention, red, green, and blue color filter patterns are sequentially formed in the border area, and serve as the black matrix. Therefore, the manufacturing process is simplified. In addition, since there is no need to provide a photolithography apparatus, production costs are reduced.

In addition, since the color filter pattern is further formed on the color filter pattern including the pigment by using the dye absorbing layer, color reproducibility is improved. A color filter pattern including dye is used as a planarization layer. At this time, by using a color filter transfer film having a thickness of less than about 1 μm to form a color filter pattern including a pigment, a fine pattern can be formed, thereby improving productivity.

It will be apparent to those skilled in the art that various modifications and variations can be made in the making and application of the present invention without departing from the spirit or scope of the inventions. Thus, it is intended that the present invention covers the modifications and variations of this invention that come within the scope of the appended claims and their equivalents.

This application claims the benefit of Korean Patent Application No. 2004-0100817 filed on December 3, 2004 and Korean Patent Application No. 2004-0103428 filed on December 9, 2004, which are hereby incorporated by reference as if herein The same is fully explained in .

Claims (17)

1. filter substrate that is used for liquid crystal indicator comprises:

Substrate, this substrate comprise first borderline region, second borderline region and the 3rd borderline region between first subpixel area, second subpixel area and the 3rd subpixel area and the adjacent subpixels zone;

Respectively at the first red color filter pattern, the first green color filter pattern and the first blue color filter pattern at described first subpixel area, second subpixel area and the 3rd subpixel area place;

The second red color filter pattern at each place in described first borderline region, second borderline region and the 3rd borderline region, the second green color filter pattern and the second blue color filter pattern; And

The 3rd red color filter pattern on the described first red color filter pattern, the first green color filter pattern and the first blue color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern respectively, local its adjacent described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern that cover of each described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern, described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern comprise dyestuff.

2. filter substrate according to claim 1, wherein said the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern are as complanation layer.

3. filter substrate according to claim 1, each in the wherein said first red color filter pattern, the first green color filter pattern and the first blue color filter pattern have the thickness in the scope of 2 μ m at 1 μ m.

4. filter substrate according to claim 3, wherein the combination thickness of the described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern in borderline region at 3 μ m in the scope of 6 μ m.

5. filter substrate according to claim 1 also is included in the public electrode on described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern.

6. filter substrate according to claim 1, each in the wherein said first red color filter pattern, the first green color filter pattern and the first blue color filter pattern has the thickness less than 1 μ m.

7. filter substrate according to claim 6, the wherein said second red color filter pattern, the second green color filter pattern and the second blue color filter pattern have the thickness less than 3 μ m.

8. filter substrate according to claim 6, each in wherein said the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern has the thickness less than 3 μ m.

9. filter substrate according to claim 1, the wherein said first red color filter pattern, the first green color filter pattern and the first blue color filter pattern comprise pigment.

10. a manufacturing is used for the method for the filter substrate of liquid crystal indicator, and described method comprises:

On substrate, form the first red color filter pattern and the second red color filter pattern, this substrate comprises first borderline region, second borderline region and the 3rd borderline region between first subpixel area, second subpixel area and the 3rd subpixel area and the adjacent subpixels zone, the described first red color filter pattern is at the described first subpixel area place, and the described second red color filter pattern is at each described first borderline region, second borderline region and the 3rd borderline region place;

Form the first green color filter pattern at the described second subpixel area place, and form the second green color filter pattern at each described first borderline region, second borderline region and the 3rd borderline region place;

Form the first blue color filter pattern at described the 3rd subpixel area place, and form the second blue color filter pattern at each described first borderline region, second borderline region and the 3rd borderline region place; And

On the described first red color filter pattern, the first green color filter pattern and the first blue color filter pattern, form the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern respectively, local its adjacent described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern that cover of each described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern, described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern comprise dyestuff.

11. method according to claim 10, wherein form the described first and second red color filter patterns, form the described first and second green color filter patterns and form in the described first and second blue color filter patterns each all use thermal imaging method.

12. method according to claim 11, wherein said thermal imaging method comprises:

The color filter transfer film is adhered on the described substrate, make color-filter layer face described substrate;

By with laser beam irradiation on described color filter transfer film, selectively with described color-filter layer transfer printing on described substrate; And

Shining the described laser beam described color filter transfer film of removal later on.

13. method according to claim 10, wherein said the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern are as complanation layer.

14. method according to claim 10, also be included in to have formed and the described first and second red color filter patterns hardened after the described first and second red color filter patterns, after having formed the described first and second green color filter patterns, the described first and second green color filter patterns are hardened, and after having formed the described first and second blue color filter patterns, the described first and second blue color filter patterns are hardened.

15. method according to claim 10 also comprises the described first and second red color filter patterns, the described first and second green color filter patterns and the described first and second blue color filter patterns is hardened.

16. method according to claim 10 wherein forms described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern and comprises:

On the described first red color filter pattern, the first green color filter pattern and the first blue color filter pattern and the described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern, form the dyestuff absorption layer; And

With red, green and blue dyes respectively sputter or ink-jet in the described dyestuff absorption layer at described first subpixel area, second subpixel area and the 3rd subpixel area place, perhaps respectively sputter or ink-jet to described first subpixel area, second subpixel area and the 3rd subpixel area with and the described dyestuff absorption layer at adjacent borderline region place in.

17. method according to claim 10 also is included on described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern and forms public electrode.

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