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CN100485443C - Open hole-based diffractive light modulator - Google Patents

Open hole-based diffractive light modulator Download PDF

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CN100485443C
CN100485443C CNB200510120099XA CN200510120099A CN100485443C CN 100485443 C CN100485443 C CN 100485443C CN B200510120099X A CNB200510120099X A CN B200510120099XA CN 200510120099 A CN200510120099 A CN 200510120099A CN 100485443 C CN100485443 C CN 100485443C
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CN1854796A (en
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尹相璟
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Samsung Electro Mechanics Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0808Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1828Diffraction gratings having means for producing variable diffraction
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/37Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements

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Abstract

本发明涉及衍射光调制器。具体地,本发明涉及基于开孔的衍射光调制器。在该调制器中,在基座构件上设置下部反射部件,穿过从基座构件突起的上部微型反射镜形成开孔,使得使用具有带状上部微型反射镜形的一个单元形成一个像素。

Figure 200510120099

The present invention relates to diffractive light modulators. In particular, the present invention relates to aperture based diffractive light modulators. In this modulator, a lower reflection part is provided on a base member, and an opening is formed through an upper micromirror protruding from the base member, so that one pixel is formed using one unit having a strip-shaped upper micromirror shape.

Figure 200510120099

Description

基于开孔的衍射光调制器 Aperture-based diffractive light modulator

技术领域 technical field

本发明一般地涉及一种衍射光调制器,更具体地说,本发明涉及一种基于开孔的衍射光调制器,其中在基座构件上设置下部反射部件,通过从基座构件突起的上部微型反射镜形成开孔,使得使用具有该上部微型反射镜形的一个单元形成一个像素。The present invention relates generally to a diffractive light modulator, and more particularly to an aperture-based diffractive light modulator in which a lower reflective component is provided on a base member through an upper portion protruding from the base member. The micromirror forms an aperture so that one pixel is formed using one unit having the upper micromirror shape.

背景技术 Background technique

通常,光学信号处理技术的优点在于,与不可能实时处理大量数据的传统数字信息处理技术不同,以并行方式快速处理大量数据。对二元相位滤波器、光学逻辑门、光增强器、图像处理技术、光学器件以及采用空间光调制技术的光调制器的设计和生产过程进行研究。In general, optical signal processing techniques are advantageous in quickly processing large amounts of data in parallel, unlike conventional digital information processing techniques in which it is impossible to process large amounts of data in real time. Research on the design and production process of binary phase filters, optical logic gates, optical intensifiers, image processing techniques, optical devices, and optical modulators using spatial light modulation techniques.

空间光调制器应用于光学存储器、光学显示器件、打印机、光学互连以及全息领域,而且进行研究,以开发采用它的显示器件。Spatial light modulators are used in the fields of optical memory, optical display devices, printers, optical interconnections, and holography, and research is being conducted to develop display devices using it.

图1所示的反射形变衍射光调制器10实现空间光调制器。Bloom等人在第5,311,360号美国专利中公开了该调制器10。调制器10包括多个反射形变带18,反射形变带18基于反射面部分,浮空在硅衬底16的上部之上以及互相分离开规则间隔。绝缘层11沉积在硅衬底16上。然后,沉积二氧化硅保护膜12和低应力氮化硅膜14。The reflective deformation diffractive light modulator 10 shown in FIG. 1 implements a spatial light modulator. The modulator 10 is disclosed in US Patent No. 5,311,360 by Bloom et al. The modulator 10 comprises a plurality of reflective deformable strips 18 based on reflective surface portions, floating above the upper part of the silicon substrate 16 and separated from each other by regular intervals. An insulating layer 11 is deposited on a silicon substrate 16 . Then, a silicon dioxide protective film 12 and a low-stress silicon nitride film 14 are deposited.

利用形变带18图形化氮化物膜14,然后蚀刻部分二氧化硅薄膜12,从而利用氮化物结构20使形变带18保持在氧化物隔离层12上。The nitride film 14 is patterned with the deformed bands 18 and then a portion of the silicon dioxide film 12 is etched such that the deformed bands 18 remain on the oxide isolation layer 12 with the nitride structure 20 .

为了调制单波长λ0的光,设计调制器,以使形变带18和氧化物隔层12的厚度分别为λ0/4。In order to modulate light of a single wavelength λ 0 , the modulator is designed such that the thicknesses of the deformed band 18 and the oxide interlayer 12 are λ 0 /4 respectively.

受每个形变带18的反射面22与衬底16之间的垂直距离(d)的限制,通过在形变带18(用作第一电极的形变带18的反射面)与衬底16(在衬底16的下侧形成的用作第二电极的导电层24)之间施加电压,控制调制器10的光栅振幅。Restricted by the vertical distance (d) between the reflective surface 22 of each deformed band 18 and the substrate 16, by connecting the deformed band 18 (the reflective face of the deformed band 18 used as the first electrode) with the substrate 16 (in The amplitude of the grating of the modulator 10 is controlled by applying a voltage between a conductive layer 24) formed on the underside of the substrate 16 and used as a second electrode.

在光调制器未被施加电压的非变形状态下,光栅振幅是λ0/2,而形变带与衬底反射的光束之间的总往返行程光路差是λ0。因此,增强了反射光的相位。In the non-deformed state of the light modulator with no voltage applied, the grating amplitude is λ 0 /2 and the total round-trip optical path difference between the deformed strip and the beam reflected by the substrate is λ 0 . Therefore, the phase of reflected light is enhanced.

因此,在未变形状态下,在调制器10反射入射光时,调制器10用作平面反射镜。在图2中,参考编号20表示未变形状态下的调制器10反射的入射光。Thus, in the undeformed state, the modulator 10 acts as a flat mirror when the modulator 10 reflects incident light. In Fig. 2, reference numeral 20 denotes incident light reflected by the modulator 10 in the undeformed state.

当在形变带18与衬底16之间施加正确电压时,静电力使形变带18向着衬底16的表面向下移动。此时,光栅振幅变更为λ0/4。总往返行程光路差是波长的一半,而且形变带18反射的光和衬底16反射的光被破坏性干涉。When the correct voltage is applied between the deformable strip 18 and the substrate 16 , the electrostatic force moves the deformable strip 18 downward toward the surface of the substrate 16 . At this time, the grating amplitude is changed to λ 0 /4. The total round-trip optical path difference is half the wavelength, and the light reflected by the deformed strip 18 and the light reflected by the substrate 16 interfere destructively.

利用该干涉,调制器衍射入射光26。在图3中,参考编号28和30分别表示在变形状态下,以+/—衍射模式(D+1,D—1)干涉的光束。Using this interference, the modulator diffracts the incident light 26 . In FIG. 3, reference numerals 28 and 30 respectively denote light beams interfering in +/- diffraction patterns (D+1, D-1) in the deformed state.

然而,Bloom发明的光调制器采用静电方法,控制微型反射镜的位置,其缺点在于,工作电压较高(通常为30V左右),而且所施加的电压与位移之间的关系不是线性的,因此控制光的可靠性糟糕。However, the light modulator invented by Bloom uses an electrostatic method to control the position of the micromirror. Reliability of controlling light is terrible.

Bloom的专利描述的光调制器可以用作用于显示图像的器件。在这种情况下,最少两个相邻单元可以形成一个像素。当然,3个单元可以形成一个像素,或者4个或6个单元可以形成一个像素。The light modulators described in Bloom's patent can be used as devices for displaying images. In this case, a minimum of two adjacent cells can form a pixel. Of course, 3 cells can form a pixel, or 4 or 6 cells can form a pixel.

然而,Bloom的专利描述的光调制器在实现小型化方面受到限制。即,光调制器的局限性在于,所形成的其单元的宽度不低于3μm,而且所形成的单元之间的间隔不低于0.5μm。However, the light modulators described in Bloom's patent are limited in their ability to be miniaturized. That is, the optical modulator is limited in that its cells are formed with a width of not less than 3 μm and that the intervals between formed cells are not lower than 0.5 μm.

此外,最少需要两个单元构成衍射像素,因此在该器件的小型化方面受到限制。In addition, a minimum of two units is required to constitute a diffractive pixel, so there is a limit in miniaturization of the device.

发明内容 Contents of the invention

因此,为了解决现有技术中存在的上述问题,提出本发明,而且本发明的目的是提供一种衍射光调制器,其中使用少至一个形变带单元形成一个像素,由此小型化产品。Therefore, the present invention is proposed in order to solve the above-mentioned problems in the prior art, and an object of the present invention is to provide a diffractive light modulator in which one pixel is formed using as few as one deformed band unit, thereby miniaturizing the product.

为了实现上述目的,本发明提供了一种基于开孔的衍射光调制器,包括:基座构件;第一反射部件,由基座构件支承,并包括与基座构件分开的中间部分,使得限定其间的间隔,朝向基座构件并且与之分离并用作反射面以反射入射光的第一表面,以及通过所形成的第一反射部件以使得穿过其通过入射光的至少一个开孔;第二反射部件,位于第一反射部件和基座构件之间,所述第二反射部件与第一反射部件分开,并包括面向第一反射部件的反射面,以反射通过所述至少一个开孔的入射光;以及致动单元,用于相对第二反射部件移动第一反射部件的中间部分,以改变衍射光的强度,该衍射光使用从第一反射部件和第二反射部件所反射的光形成。In order to achieve the above object, the present invention provides an aperture-based diffractive light modulator, comprising: a base member; a first reflective part supported by the base member, and including a middle portion separated from the base member, so that the defined a space therebetween, a first surface facing and separated from the base member and used as a reflective surface to reflect incident light, and at least one opening through which the incident light passes through the first reflective member formed; the second a reflective part located between the first reflective part and the base member, the second reflective part is separated from the first reflective part and includes a reflective surface facing the first reflective part to reflect incident light passing through the at least one opening light; and an actuating unit for moving the middle portion of the first reflective part relative to the second reflective part to change the intensity of diffracted light formed using light reflected from the first reflective part and the second reflective part.

在本发明的还一方面,第一反射部件横跨形成在基座构件上的凹槽,基座构件的凹槽的侧壁支承第二反射部件,以与第一反射部件成平行间隔关系,第二反射部件朝向或远离第一反射部件可移动,以反射通过开孔的入射光;以及致动单元相对于第一反射部件移动第二反射部件,以改变衍射光的强度,该衍射光使用从第一反射部件和第二反射部件反射的光形成。In yet another aspect of the present invention, the first reflective member spans a recess formed in the base member, the sidewalls of the recess of the base member supporting the second reflective member in parallel spaced relation to the first reflective member, The second reflective part is movable toward or away from the first reflective part to reflect incident light passing through the aperture; and the actuating unit moves the second reflective part relative to the first reflective part to change the intensity of diffracted light using Light reflected from the first reflective member and the second reflective member forms.

此外,本发明提供基于开孔的衍射光调制器,包括基座构件;排列形成阵列的多个第一反射部件,每个第一反射部件在其中间部分从基座构件分离,以使得在其间形成间隔,每个第一反射部件都由基座构件支承,每个第一反射部件都具有离开基座构件朝向的反射表面以反射入射光,以及每个第一反射部件都形成有至少一个开孔以使得穿过其通过入射光;第二反射部件,位于第一反射部件和基座构件之间,以使得相对于第一反射部件限定间隔,并且第二反射部件具有反射面以反射通过开孔的入射光;以及多个致动单元,用于移动相应第一反射部件的中间部分,以改变衍射光的强度,该衍射光使用从第一反射部件和第二反射部件反射的光形成。In addition, the present invention provides an aperture-based diffractive light modulator comprising a base member; a plurality of first reflective members arranged to form an array, each first reflective member being separated from the base member at its middle portion so that Forming a space, each first reflective part is supported by the base member, each first reflective part has a reflective surface facing away from the base member to reflect incident light, and each first reflective part is formed with at least one opening a hole such that incident light passes therethrough; a second reflective part positioned between the first reflective part and the base member such that a space is defined relative to the first reflective part, and the second reflective part has a reflective surface to reflect light passing through the opening; incident light of the holes; and a plurality of actuating units for moving intermediate portions of the corresponding first reflective parts to change the intensity of diffracted light formed using light reflected from the first reflective part and the second reflective part.

在本发明的另一方面中,第一反射部件横跨由基座构件限定的凹槽,所述第二反射部件排列形成阵列,以及由基座构件的凹槽侧壁支承,以与相应的第一反射部件成平行分隔关系,第二反射部件朝向或远离第一反射部件可移动,以反射通过开孔的入射光;所述致动单元相对于第一反射部件移动相应的第二反射部件,以改变衍射光的强度,该衍射光使用从第一反射部件和第二反射部件反射的光形成。In another aspect of the invention, the first reflective members span the recess defined by the base member, and the second reflective members are arranged in an array and supported by the recess sidewalls of the base member to correspond to the corresponding The first reflective parts are in a parallel spaced relationship, and the second reflective parts are movable toward or away from the first reflective parts to reflect incident light passing through the opening; the actuating unit moves the corresponding second reflective parts relative to the first reflective parts , to change the intensity of the diffracted light formed using the light reflected from the first reflective part and the second reflective part.

此外,本发明提供使用基于开孔的衍射光调制器的显示设备,包括发射光的光源;基于开孔的衍射光调制器,调制入射光以生成衍射光;光学部件,用于将从光源发射的入射光施加到基于开孔的衍射光调制器;过滤光学部件,用于从由基于开孔的衍射光调制器所调制的衍射光中选择期望级的衍射光,使得穿过其通过所选择的衍射光;以及投射和扫描光学部件,用于在屏幕上扫描通过过滤光学部件的衍射光。基于开孔的衍射光调制器包括基座构件;排列为形成阵列的多个第一反射部件,每个第一反射部件由基座构件支承,使得在第一反射部件的中部部分和基座构件之间形成间隔,并且每个第一反射部件具有在其中形成的开孔,使得穿过其通过光,以及反射面以反射入射光;第二反射部件,由基座构件支承,所述第二反射部件与第一反射部件分隔,所述第二反射部件包括反射表面,以反射通过第一反射部件的开孔的入射光;以及多个致动单元,用于相对于第二反射部件移动相应的第一反射部件的中间部分,以改变衍射光的强度,该衍射光使用从第一反射部件和第二反射部件反射的光形成。In addition, the present invention provides a display device using an aperture-based diffractive light modulator, including a light source emitting light; an aperture-based diffractive light modulator that modulates incident light to generate diffracted light; The incident light of the aperture is applied to the diffractive light modulator based on the aperture; the filtering optical component is used to select the diffracted light of the desired order from the diffracted light modulated by the diffractive light modulator based on the aperture, so that the diffracted light passing through it passes through the selected and projection and scanning optics for scanning the diffracted light through the filter optics on the screen. The aperture-based diffractive light modulator includes a base member; a plurality of first reflective members arranged to form an array, each first reflective member being supported by the base member such that between a central portion of the first reflective member and the base member A space is formed therebetween, and each first reflective part has an opening formed therein so that light passes therethrough, and a reflective surface to reflect incident light; a second reflective part is supported by a base member, and the second reflective part is supported by a base member. The reflective part is separated from the first reflective part, the second reflective part includes a reflective surface to reflect incident light passing through the opening of the first reflective part; and a plurality of actuating units are used to move corresponding The middle portion of the first reflective part is changed to change the intensity of the diffracted light formed using the light reflected from the first reflective part and the second reflective part.

此外,本发明提供基于开孔的衍射光调制器,包括衬底;在衬底上沉积的绝缘层;在绝缘层上沉积的至少一个牺牲层;在绝缘层上放置的反射部件,放置该反射部件以反射入射光;位于至少一个牺牲层上的支承,通过该支承形成第一开孔;放置在所述支承上的微型反射镜,该微型反射镜具有反射面以反射入射光,在微型反射镜中形成的第二开孔,以对应于第一开孔,穿过其通过入射光;以及至少一个致动单元,以当向其施加电压时,移动支承的中间部分,由此改变衍射光的强度,该衍射光是使用从微型反射镜和反射部件反射的光形成的。In addition, the present invention provides an aperture-based diffractive light modulator comprising a substrate; an insulating layer deposited on the substrate; at least one sacrificial layer deposited on the insulating layer; A component to reflect incident light; a support on at least one sacrificial layer through which a first opening is formed; a micromirror placed on said support, the micromirror has a reflective surface to reflect incident light, and the microreflector a second opening formed in the mirror to correspond to the first opening through which incident light passes; and at least one actuation unit to move the middle portion of the support when a voltage is applied thereto, thereby changing the diffracted light The intensity of the diffracted light is formed using light reflected from micromirrors and reflective parts.

附图说明 Description of drawings

根据以下结合附图所做的详细说明,可以更清楚地理解本发明的上述以及其他目的、特征以及其他优点,附图包括:According to the following detailed description in conjunction with the accompanying drawings, the above-mentioned and other objects, features and other advantages of the present invention can be more clearly understood, and the accompanying drawings include:

图1示出根据传统技术,采用静电方法的光栅光调制器;Figure 1 shows a grating light modulator using an electrostatic approach according to conventional techniques;

图2示出在未变形状态下,根据传统技术采用静电方法的光栅光调制器反射的入射光;Figure 2 shows incident light reflected by a grating light modulator using electrostatic methods according to conventional techniques in an undeformed state;

图3示出在静电力引起的变形状态下,根据传统技术由光栅光调制器衍射的入射光;Figure 3 shows incident light diffracted by a grating light modulator according to conventional techniques in a deformed state induced by electrostatic forces;

图4a是根据本发明的第一实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4a is a perspective view of a partially detached aperture-based diffractive light modulator according to a first embodiment of the present invention;

图4b是根据本发明的第二实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4b is a perspective view of a partially detached aperture-based diffractive light modulator according to a second embodiment of the present invention;

图4c是根据本发明的第三实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4c is a perspective view of a partially detached aperture-based diffractive light modulator according to a third embodiment of the present invention;

图4d是根据本发明的第四实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4d is a perspective view of a partially detached aperture-based diffractive light modulator according to a fourth embodiment of the present invention;

图4e是根据本发明的第五实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4e is a perspective view of a partially detached aperture-based diffractive light modulator according to a fifth embodiment of the present invention;

图4f是根据本发明的第六实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4f is a perspective view of a partially detached aperture-based diffractive light modulator according to a sixth embodiment of the present invention;

图4g是根据本发明的第七实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4g is a perspective view of a partially detached aperture-based diffractive light modulator according to a seventh embodiment of the present invention;

图4h是根据本发明的第八实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4h is a perspective view of an aperture-based diffractive light modulator, partially separated, according to an eighth embodiment of the present invention;

图4i是根据本发明的第九实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4i is a perspective view of a partially detached aperture-based diffractive light modulator according to a ninth embodiment of the present invention;

图4j是根据本发明的第十实施例,部分分离的基于开孔的衍射光调制器的透视图;Figure 4j is a perspective view of a partially detached aperture-based diffractive light modulator according to a tenth embodiment of the present invention;

图5示出根据本发明的第一实施例的基于开孔的衍射光调制器的1—D阵列结构;Fig. 5 shows the 1-D array structure of the diffractive light modulator based on the aperture according to the first embodiment of the present invention;

图6示出根据本发明的第七实施例的基于开孔的衍射光调制器的2—D阵列结构;6 shows a 2-D array structure of an aperture-based diffractive light modulator according to a seventh embodiment of the present invention;

图7示出使用根据本发明的实施例的基于开孔的衍射光调制器的显示系统;Figure 7 illustrates a display system using an aperture-based diffractive light modulator according to an embodiment of the invention;

图8a是根据本发明的实施例的基于开孔的衍射光调制器的透视图,其中入射光斜射单元1-D阵列的上部微型反射镜;以及Figure 8a is a perspective view of an aperture-based diffractive light modulator according to an embodiment of the present invention, wherein incident light obliquely strikes the upper micro-mirror of the cell 1-D array; and

图8b是根据本发明的实施例的基于开孔的衍射光调制器的透视图,其中光垂直入射单元1-D阵列的上部微型反射镜。Figure 8b is a perspective view of an aperture-based diffractive light modulator according to an embodiment of the present invention, where light is incident normally on the upper micromirror of the cell 1-D array.

具体实施方式 Detailed ways

下面将参考图4a至8b详细说明本发明的优选实施例。A preferred embodiment of the present invention will be described in detail below with reference to FIGS. 4a to 8b.

图4a是示出根据本发明第一实施例的基于开孔的衍射光调制器的透视图。Fig. 4a is a perspective view showing an aperture-based diffractive light modulator according to a first embodiment of the present invention.

参考附图,根据本发明第一实施例的基于开孔的衍射光调制器包括:硅衬底501a、绝缘层502a、微型反射镜503a以及单元510a。尽管在该实施例中以单独层构造绝缘层和微型反射镜,但是可以实现该绝缘层以在它具有光反射特性时,用作微型反射镜。此外,在此,绝缘层502a示为在基座构件501a的表面上形成,但是绝缘层并不是必需的,因此可以形成反射部件503a而不形成绝缘层502a。Referring to the drawings, the aperture-based diffractive light modulator according to the first embodiment of the present invention includes: a silicon substrate 501a, an insulating layer 502a, a micromirror 503a, and a unit 510a. Although the insulating layer and the micromirror are constructed as separate layers in this embodiment, the insulating layer may be realized to function as a micromirror when it has light reflection properties. In addition, here, the insulating layer 502a is shown to be formed on the surface of the base member 501a, but the insulating layer is not essential, so the reflective part 503a may be formed without forming the insulating layer 502a.

硅衬底501a包括用于向单元510a提供间隔的凹槽,在硅衬底501a上形成绝缘层502a,在硅衬底501a上沉积下部微型反射镜503a,以及单元510a的底部与位于凹槽外部的硅衬底501a的两侧相连或者由其支承。诸如Si、Al2O3、ZrO2、石英以及SiO2的材料用于构造硅衬底501a,可以利用不同材料来形成硅衬底501a的下层和上层(利用虚线划分)。此外,玻璃衬底可被用作基座构件510a。The silicon substrate 501a includes a groove for providing spacing to the cell 510a, an insulating layer 502a is formed on the silicon substrate 501a, a lower micromirror 503a is deposited on the silicon substrate 501a, and the bottom of the cell 510a is located outside the groove. The two sides of the silicon substrate 501a are connected to or supported by it. Materials such as Si, Al 2 O 3 , ZrO 2 , quartz, and SiO 2 are used to construct the silicon substrate 501a, and different materials may be used to form the lower and upper layers of the silicon substrate 501a (demarcated by dotted lines). In addition, a glass substrate may be used as the base member 510a.

下部微型反射镜503a放置在基座构件501a的上侧,并反射入射光。微型反射镜可用作下部反射部件503a,以及诸如Al、Pt、Cr或Ag的金属可以用于构造下部微型反射镜503a。The lower micro mirror 503a is placed on the upper side of the base member 501a, and reflects incident light. A micromirror can be used as the lower reflective part 503a, and a metal such as Al, Pt, Cr, or Ag can be used to construct the lower micromirror 503a.

单元510a被形成为拉长的薄的带形,然而,可以以其他形状形成该单元,例如长方形、圆形、椭圆形等。单元510a包括下部支承511a,其两侧的底部与位于硅衬底501a的凹槽外部的硅衬底501a的两侧相连或由其支撑,以使单元510a的中心部分与该凹槽分离。命名术语“下部支承”因为它位于压电层520a和520a’的下面。The unit 510a is formed in the shape of an elongated thin strip, however, the unit may be formed in other shapes, such as rectangular, circular, oval, etc. FIG. The unit 510a includes a lower support 511a, the bottoms of which are connected to or supported by the two sides of the silicon substrate 501a located outside the groove of the silicon substrate 501a, so that the central part of the unit 510a is separated from the groove. The term "lower support" is named because it is located below the piezoelectric layers 520a and 520a'.

分别在下部支承511a的两侧设置压电层520a和520a’,而且通过所设置的压电层520a和520a’的收缩和膨胀,提供单元510a的致动力。Piezoelectric layers 520a and 520a' are disposed on both sides of the lower support 511a, respectively, and the actuation force of the unit 510a is provided by contraction and expansion of the disposed piezoelectric layers 520a and 520a'.

硅的氧化物(例如,SiO2等)、硅的氮化物(例如,Si3N4等)、陶瓷衬底(Si、ZrO2和Al2O3等)或硅的碳化物可以用于构造下部支承511a。可以根据需要,省略该下部支承511a。Silicon oxides (e.g., SiO2 , etc.), silicon nitrides (e.g., Si3N4 , etc.), ceramic substrates (Si, ZrO2 , and Al2O3 , etc.), or silicon carbides can be used to construct Lower support 511a. The lower support 511a can be omitted as needed.

左和右压电层520a或520a’包括:下部电极层521a或521a’,适于提供压电电压;压电材料层522a或522a’,形成在下部电极层521a或521a’上,而且当对其两侧施加电压时,适于通过收缩和膨胀,产生垂直致动力;以及上部电极层523a或423a’,形成在压电材料层521a或521a’上,而且适于对压电材料层521a或521a’提供压电电压。当对上部电极层523a和523a’以及下部电极层521a和521a’施加电压时,压电材料层521a和521a’收缩和膨胀,因此导致下部支承511a朝向或远离微型反射镜503a垂直移动。The left and right piezoelectric layers 520a or 520a' include: a lower electrode layer 521a or 521a' adapted to supply a piezoelectric voltage; a piezoelectric material layer 522a or 522a' formed on the lower electrode layer 521a or 521a', and when When a voltage is applied to both sides thereof, it is suitable to generate a vertical actuation force through contraction and expansion; and the upper electrode layer 523a or 423a' is formed on the piezoelectric material layer 521a or 521a', and is suitable for the piezoelectric material layer 521a or 521a' provides piezoelectric voltage. When a voltage is applied to the upper electrode layers 523a and 523a' and the lower electrode layers 521a and 521a', the piezoelectric material layers 521a and 521a' contract and expand, thus causing the lower support 511a to move vertically toward or away from the micromirror 503a.

Pt、Ta/Pt、Ni、Au、Al、Ti/Pt、IrO2和RuO2可以用作电极521a、521a’、523a和523a’的材料,而且利用喷镀或汽化方法,沉积这些材料,以具有0.01至3μm范围内的深度。Pt, Ta/Pt, Ni, Au, Al, Ti/Pt, IrO 2 , and RuO 2 can be used as materials for the electrodes 521a, 521a', 523a, and 523a', and these materials are deposited using a sputtering or vaporization method to Has a depth in the range of 0.01 to 3 μm.

同时,在下部支承511a的中心部分,沉积上部微型反射镜530a。上部微型反射镜530a包括多个开孔531a1至531a3。在这种情况下,优选将开孔531a1至531a3形成为矩形,但是可以形成为诸如圆形或椭圆形的任意封闭形状。此外,下部支承511a和上部微型反射镜530a可被称为上部反射部件540a。如果下部支承由反光材料构成,则不需要沉积单独上部微型反射镜,而且下部支承单独用作反射部件540a。Simultaneously, at the central portion of the lower support 511a, an upper micromirror 530a is deposited. The upper micro mirror 530a includes a plurality of openings 531a 1 to 531a 3 . In this case, the openings 531a 1 to 531a 3 are preferably formed in a rectangle, but may be formed in any closed shape such as a circle or an ellipse. Also, the lower support 511a and the upper micro mirror 530a may be referred to as an upper reflection part 540a. If the lower support is made of reflective material, no separate upper micromirror needs to be deposited, and the lower support alone serves as reflective member 540a.

这种开孔531a1至531a3使光入射到单元510a上,以穿过它,因此光入射到对应于开孔531a1至531a3的部分下部微型反射镜503a上,因此可以使下部微型反射镜503a和上部微型反射镜530a形成像素。Such openings 531a 1 to 531a 3 allow light to be incident on the unit 510a to pass through it, so that the light is incident on the part of the lower micro-mirror 503a corresponding to the openings 531a 1 to 531a 3 , so that the lower micro-mirror 503a can be made to reflect Mirror 503a and upper micromirror 530a form a pixel.

即,例如,在其中形成开孔531a1-531a3的上部微型反射镜530a的一部分(A)和下部微型反射镜503a的一部分(B)可以形成一个像素。That is, for example, a portion (A) of the upper micromirror 530a and a portion (B) of the lower micromirror 503a in which the openings 531a 1 -531a 3 are formed may form one pixel.

换句话说,由于上部微型反射镜530a具有反射面,它反射入射光以形成反射光,同时允许入射光通过开孔到达下部反射部件503a。然后下部反射部件503a反射入射光以形成反射光,因此从上部微型反射镜530a反射的光与从下部微型反射镜530a反射的光互相干涉,由此形成衍射光。衍射光的强度取决于上部微型反射镜530a和下部反射部件503a之间的距离。In other words, since the upper micro-mirror 530a has a reflective surface, it reflects incident light to form reflected light while allowing the incident light to reach the lower reflective part 503a through the opening. The lower reflection part 503a then reflects the incident light to form reflected light, so that the light reflected from the upper micro mirror 530a interferes with the light reflected from the lower micro mirror 530a, thereby forming diffracted light. The intensity of the diffracted light depends on the distance between the upper micro mirror 530a and the lower reflecting part 503a.

在这种情况下,通过上部微型反射镜530a的开孔531a1至531a3的入射光可以入射到下部微型反射镜503a的相应部分上,而且在上部微型反射镜530a与下部微型反射镜503a之间的高度差是λ/4的奇数倍之一时,产生最强衍射光。同样,在此,只示出一个单元510a,但是本发明的基于开孔的衍射光调制器可包括多个彼此平行的单元。换句话说,本发明的基于开孔的衍射光调制器可包括单元阵列,其示于图5和6。In this case, the incident light passing through the openings 531a1 to 531a3 of the upper micromirror 530a can be incident on the corresponding parts of the lower micromirror 503a, and between the upper micromirror 530a and the lower micromirror 503a When the height difference between them is one of the odd multiples of λ/4, the strongest diffracted light is produced. Also, here, only one unit 510a is shown, but the aperture-based diffractive light modulator of the present invention may comprise a plurality of units parallel to each other. In other words, the aperture-based diffractive light modulator of the present invention may comprise a cell array, which is shown in FIGS. 5 and 6 .

当使用根据本发明的单元阵列时,可以使用少于现有技术的单元实现具有期望像素的显示设备。When using a cell array according to the present invention, a display device with desired pixels can be realized using fewer cells than in the prior art.

例如,在现有技术中,可以使用至少两个带状单元形成一个像素。在现有技术中,当两个带状单元构成一个像素时,衍射效率为50%或更低,因此四个或六个单元构成一个像素以使得增加衍射效率。当四个或更多单元构成一个像素时,衍射效率为70%或更高,由此可以通过单元数目的增加而获得期望的最高效率。在本发明的第一实施例中,通过构成一个单元510a的上部部件的上部微型反射镜530a形成三个开孔531a1-531a3,以穿过其通过入射光,以达到下部反射部件503a,由此获得与使用六个单元来形成一个像素的现有技术相同的衍射效率。也就是说,根据本发明的第一实施例,邻近上部微型反射镜530a的第一开孔531a1的反射镜部件反射入射光,以用作现有技术的一个形变带单元。此外,部分下部反射部件503a反射通过第一开孔531a1的入射光,由此用作另一个形变带单元,所述部分下部反射部件503a位于第一开孔531a1之下,以使得在位置上对应于第一开孔。另外,邻近上部微型反射镜530a的第二开孔531a2的反射镜部件反射入射光,以用作现有技术的另一个形变带单元,而且部分下部反射部件503a反射通过第二开孔531a2的入射光,由此用作另一个形变带单元,所述部分下部反射部件503a位于第二开孔531a2之下,以使得在位置上对应于第二开孔。同样,邻近上部微型反射镜530a的第三开孔531a3的反射镜部件反射入射光,以用作现有技术的另一个形变带单元,而且部分下部反射部件503a反射通过第三开孔531a3的入射光,由此用作另一个形变带单元,所述部分下部反射部件503a位于第三开孔531a3之下,以使得在位置上对应于第三开孔。如上所述,如果使用穿过其形成三个开孔531a1-531a3的上部微型反射镜530和下部反射部件503a,可以使用一个形变带单元510a获得在现有技术中使用六个形变带单元形成一个像素时获得的相同衍射效率。For example, in the prior art, at least two strip units may be used to form one pixel. In the prior art, when two strip-shaped units constitute one pixel, the diffraction efficiency is 50% or less, so four or six units constitute one pixel so as to increase the diffraction efficiency. When four or more units constitute one pixel, the diffraction efficiency is 70% or higher, whereby the desired highest efficiency can be obtained by increasing the number of units. In the first embodiment of the present invention, three openings 531a1-531a3 are formed by the upper micromirror 530a constituting the upper part of one unit 510a to pass incident light therethrough to reach the lower reflecting part 503a, thereby The same diffraction efficiency as that of the related art in which six cells are used to form one pixel is obtained. That is, according to the first embodiment of the present invention, the mirror part adjacent to the first opening 531a1 of the upper micro mirror 530a reflects incident light to serve as a deformable band unit of the prior art. In addition, part of the lower reflection part 503a is located under the first opening 531a1 so as to correspond in position to reflect incident light passing through the first opening 531a1, thereby serving as another deformation band unit at the first hole. In addition, the mirror part adjacent to the second opening 531a2 of the upper micromirror 530a reflects incident light to serve as another deformation band unit of the prior art, and part of the lower reflection part 503a reflects the incident light passing through the second opening 531a2. Light, thus serving as another deformable band unit, the part of the lower reflective part 503a is located below the second opening 531a2 so as to correspond in position to the second opening. Likewise, the mirror part adjacent to the third opening 531a3 of the upper micromirror 530a reflects incident light to serve as another deformation band unit of the prior art, and part of the lower reflection part 503a reflects incident light passing through the third opening 531a3. Light, thereby serving as another deformable band unit, the part of the lower reflective member 503a is located below the third opening 531a3 so as to correspond in position to the third opening. As described above, if the upper micromirror 530 and the lower reflective member 503a through which three openings 531a1-531a3 are formed are used, one deformable band unit 510a can be used to obtain a The same diffraction efficiencies obtained for pixels.

如果使用上述衍射光调制器实现对应于1080×1920的数字TVHD格式,垂直排列1080个像素并且每个像素经受1920次光学调制,由此形成一个帧。如果通过现有技术使用四个或六个驱动形变带(driving ribbon)形成一个像素,需要1080×4(或6)个驱动形变带来形成1080个像素。另一方面,如果使用根据本发明的具有两个或三个开孔的带状单元时,可以只使用1080×1个带状单元形成1080个像素。因此,容易地实现制造,产量提高,而且可以制造具有小尺寸的设备。If a digital TVHD format corresponding to 1080×1920 is realized using the above-described diffractive light modulator, 1080 pixels are vertically arranged and each pixel is subjected to 1920 optical modulations, thereby forming one frame. If four or six driving ribbons are used to form one pixel in the prior art, 1080×4 (or 6) driving ribbons are required to form 1080 pixels. On the other hand, if the strip unit with two or three openings according to the present invention is used, only 1080×1 strip unit can be used to form 1080 pixels. Therefore, manufacturing is easily achieved, yield is improved, and a device having a small size can be manufactured.

图4b是根据本发明的第二实施例,部分分离的基于开孔的衍射光调制器的透视图。Figure 4b is a perspective view of a partially isolated aperture-based diffractive light modulator according to a second embodiment of the present invention.

参照附图,根据本发明的第二实施例的基于开孔的衍射光调制器包括基座构件501b、下部反射部件503b和单元510b。Referring to the drawings, an aperture-based diffractive light modulator according to a second embodiment of the present invention includes a base member 501b, a lower reflective part 503b, and a unit 510b.

与第一实施例不同,下部反射部件503b包括多个下部反射图形503b1-503b3,该多个下部反射图形503b1-503b3按间隔设置在绝缘层502a的表面上,使得它们在位置上对应于上部微型反射镜530b的开孔531b1-531b3。其他构造与图4a的相同。Different from the first embodiment, the lower reflective part 503b includes a plurality of lower reflective patterns 503b1-503b3, and the plurality of lower reflective patterns 503b1-503b3 are arranged at intervals on the surface of the insulating layer 502a so that they correspond in position to the upper micro The openings 531b1-531b3 of the mirror 530b. Other configurations are the same as those of Fig. 4a.

图4c是根据本发明的第三实施例,部分分离的基于开孔的衍射光调制器的透视图。Figure 4c is a perspective view of a partially isolated aperture-based diffractive light modulator according to a third embodiment of the present invention.

参照附图,根据本发明的第三实施例的基于开孔的衍射光调制器包括基座构件501c,其包括SIMOX SOI(被注入氧的绝缘体上硅分开)衬底(在下文中,称为“绝缘体上硅衬底”)、下部反射部件503c和单元510c。Referring to the accompanying drawings, an aperture-based diffractive light modulator according to a third embodiment of the present invention includes a base member 501c comprising a SIMOX SOI (silicon-on-insulator separated by oxygen-implanted) substrate (hereinafter, referred to as " silicon-on-insulator substrate"), the lower reflective member 503c, and the unit 510c.

本发明的第三实施例不同于图4a的第一实施例在于绝缘体上硅衬底,而不是硅衬底,被用作基座构件501c。其制造是公知的,因此在此省略其详细描述。The third embodiment of the present invention differs from the first embodiment of Fig. 4a in that a silicon-on-insulator substrate, instead of a silicon substrate, is used as the base member 501c. Its manufacture is well known, so its detailed description is omitted here.

本发明中使用的绝缘体上硅的基座构件501c包括硅衬底501c1、二氧化硅绝缘层501c2,其通过在硅衬底中注入氧离子形成、以及牺牲硅层501c3,其通过在硅衬底中注入高浓度氧形成。牺牲硅层501c3的位于上部微型反射镜530a下面的部分被蚀刻,使得确保移动间隔(空气隙),在其中单元510c可以垂直移动。此外,牺牲硅层501c3的位于压电层520a,520a’下面的部分被部分蚀刻,使得通过压电层520c和520c’的压电材料522c和522c’的收缩和膨胀致动上部微型反射镜530a。同样,二氧化硅绝缘层501c2可被认为是蚀刻阻止层,用于当蚀刻硅牺牲层501c3时防止硅衬底501c1被蚀刻。The silicon-on-insulator base member 501c used in the present invention includes a silicon substrate 501c1, a silicon dioxide insulating layer 501c2 formed by implanting oxygen ions in the silicon substrate, and a sacrificial silicon layer 501c3 formed by implanting oxygen ions in the silicon substrate. It is formed by injecting high-concentration oxygen in the medium. The portion of the sacrificial silicon layer 501c3 under the upper micromirror 530a is etched such that a moving space (air gap) is ensured in which the unit 510c can move vertically. In addition, the portion of the sacrificial silicon layer 501c3 underlying the piezoelectric layers 520a, 520a' is partially etched such that the contraction and expansion of the piezoelectric materials 522c and 522c' of the piezoelectric layers 520c and 520c' actuate the upper micromirror 530a. . Also, the silicon dioxide insulating layer 501c2 can be considered as an etch stop layer for preventing the silicon substrate 501c1 from being etched when the silicon sacrificial layer 501c3 is etched.

此外,本发明的第三实施例还与第一实施例不同,在于下部反射部件503c包括多个彼此分离的下部反射图形503c1-503c3。从这点上看,它与第二实施例相同。In addition, the third embodiment of the present invention is also different from the first embodiment in that the lower reflective part 503c includes a plurality of lower reflective patterns 503c1-503c3 separated from each other. From this point of view, it is the same as the second embodiment.

此外,本发明的第三实施例与第一实施例不同,在于牺牲硅层501c3为单元510c提供移动间隔(空气隙)。也就是说,在本发明的第三实施例中,在硅衬底501c1上没有必要提供单独的凹槽。在这点上看,可认为牺牲硅层501c3是用于支承单元510c的支承构件,以为单元510c提供移动间隔。此外,根据本发明的第三实施例的基于开孔的衍射光调制器与第一实施例的那些相同。In addition, the third embodiment of the present invention is different from the first embodiment in that the sacrificial silicon layer 501c3 provides a moving space (air gap) for the cell 510c. That is, in the third embodiment of the present invention, it is not necessary to provide a separate groove on the silicon substrate 501c1. In this regard, the sacrificial silicon layer 501c3 can be considered as a supporting member for supporting the unit 510c to provide a moving space for the unit 510c. Furthermore, the aperture-based diffractive light modulator according to the third embodiment of the present invention is the same as those of the first embodiment.

图4d是根据本发明的第四实施例,部分分离的基于开孔的衍射光调制器的透视图,该光调制器包括包含有硅衬底的基座构件501d、下部反射部件503d、以及单元510d。4d is a perspective view of a partially isolated aperture-based diffractive light modulator comprising a base member 501d comprising a silicon substrate, a lower reflective member 503d, and a unit according to a fourth embodiment of the present invention. 510d.

图4d的第四实施例与图4a的实施例不同在于没有纵向排列开孔531d1-531d3,而是横向排列。其他构造与图4a相同。The fourth embodiment of FIG. 4d is different from the embodiment of FIG. 4a in that the openings 531d1-531d3 are not arranged vertically, but arranged horizontally. Other configurations are the same as in Fig. 4a.

图4e是根据本发明的第五实施例,部分分离的基于开孔的衍射光调制器的透视图。Figure 4e is a perspective view of a partially isolated aperture-based diffractive light modulator according to a fifth embodiment of the present invention.

参照附图,根据第五实施例的基于开孔的衍射光调制器不同于根据第四实施例的基于开孔的衍射光调制器,在于单元510e的下部支承511e从硅衬底的基座构件501e上突起,以提供间隔。结果是,单元510e可以垂直移动。Referring to the drawings, the aperture-based diffractive light modulator according to the fifth embodiment is different from the aperture-based diffractive light modulator according to the fourth embodiment in that the lower support 511e of the unit 510e is obtained from the base member of the silicon substrate 501e to provide spacing. As a result, unit 510e can move vertically.

即,单元510e具有用于反射入射光的上部微型反射镜530e,并能够垂直移动,同时从基座构件501e上突起。在此情况下,如果下部支承具有光反射特性,可以实现下部支承以用作微型反射镜,而不必形成单独的微型反射镜。That is, the unit 510e has an upper micro mirror 530e for reflecting incident light, and is capable of moving vertically while protruding from the base member 501e. In this case, if the lower support has light reflection properties, the lower support can be realized to function as a micromirror without forming a separate micromirror.

单元510e的下部支承511e突起以向单元510e提供空气隙,其两侧附于基座单元510e上。The lower support 511e of the unit 510e protrudes to provide an air gap to the unit 510e, and its sides are attached to the base unit 510e.

此外,在包括硅衬底的基座构件501e上淀积绝缘层502e和下部反射部件503e,下部反射部件503e反射通过开孔的入射光。在此情况下,如果绝缘层具有光反射特性,绝缘层可以用作下部反射部件,而不必形成单独的下部反射部件。In addition, an insulating layer 502e and a lower reflection part 503e reflecting incident light passing through the opening are deposited on a base member 501e including a silicon substrate. In this case, if the insulating layer has light reflection properties, the insulating layer can be used as the lower reflecting part without forming a separate lower reflecting part.

单元510e可形成为带状,定位其中心部分以从基座构件501e突起并分离,以及其底部的两侧附于基座构件501e上。The unit 510e may be formed in a belt shape, its center portion is positioned to protrude from the base member 501e and separated, and both sides of its bottom are attached to the base member 501e.

压电层520e和520e’分别形成单元510e的上部的左侧和右侧。压电层520e或520e’包括适于提供压电电压的下部电极层521e或521e’、压电材料层522e或522e’,形成在下部电极层521e或521e’上,并适于当电压施加到其两侧时,通过收缩和膨胀生成垂直致动力、以及上部电极层523e或523e’,形成在压电材料层522e或522e’上,并适于向压电材料层522e或522e’提供压电电压。The piezoelectric layers 520e and 520e' form the left and right sides of the upper portion of the unit 510e, respectively. The piezoelectric layer 520e or 520e' includes a lower electrode layer 521e or 521e' adapted to apply a piezoelectric voltage, a piezoelectric material layer 522e or 522e' formed on the lower electrode layer 521e or 521e', and adapted to On both sides thereof, a vertical actuation force is generated by contraction and expansion, and the upper electrode layer 523e or 523e' is formed on the piezoelectric material layer 522e or 522e' and is adapted to provide piezoelectric material layer 522e or 522e'. Voltage.

当电压施加到上部电极层523e和523e’以及下部电极层521e和521e’时,单元510e向上移动并反射入射光以形成反射光。When a voltage is applied to the upper electrode layers 523e and 523e' and the lower electrode layers 521e and 521e', the unit 510e moves upward and reflects incident light to form reflected light.

在其中除去了下部支承511e的压电层520e和520e’的单元510e的中心部分放置上部微型反射镜530e,以及在上部微型反射镜530e上设置开孔531e1至531e3。在这种情况下,开孔531e1_531e3优选地形成为长方形,但也可以形成为任意闭合形状例如圆形或椭圆。An upper micromirror 530e is placed at the center portion of the unit 510e where the piezoelectric layers 520e and 520e' of the lower support 511e are removed, and openings 531e1 to 531e3 are provided on the upper micromirror 530e. In this case, the openings 531e1_531e3 are preferably formed in a rectangle, but may also be formed in any closed shape such as a circle or an ellipse.

这种开孔531e1_531e3允许对应于开孔531e1至531e3的部分下部微型反射镜503e,以及邻近上部微型反射镜530e的开孔531e1至531e3的部分上部微型反射镜530e,形成像素。Such openings 531e1-531e3 allow portions of the lower micromirror 503e corresponding to the openings 531e1 to 531e3, and portions of the upper micromirror 530e adjacent to the openings 531e1 to 531e3 of the upper micromirror 530e, to form pixels.

即,例如,部分上部微型反射镜530e(A),其中形成开孔531e1至531e3,以及部分下部微型反射镜503e(B)形成单个像素。That is, for example, part of the upper micromirror 530e(A) in which the openings 531e1 to 531e3 are formed, and part of the lower micromirror 503e(B) form a single pixel.

在此情况下,穿过上部微型反射镜530的开孔531e1至531e3的入射光可以入射到下部微型反射镜503e的相应部分上,可以理解当上部微型反射镜530e与下部微型反射镜503e之间的高度差是λ/4的奇数倍之一时,生成最强衍射光。In this case, the incident light passing through the openings 531e1 to 531e3 of the upper micro-mirror 530 can be incident on the corresponding part of the lower micro-mirror 503e. When the height difference is one of the odd multiples of λ/4, the strongest diffracted light is generated.

图4f是根据本发明的第六实施例,部分分离的基于开孔的衍射光调制器的透视图。Figure 4f is a perspective view of a partially detached aperture-based diffractive light modulator according to a sixth embodiment of the present invention.

参照附图,根据第六实施例的基于开孔的衍射光调制器不同于根据第五实施例的基于开孔的衍射光调制器,在于开孔在横向方向上排列。其他结构与如图4e的基于开孔的衍射光调制器相同。Referring to the drawings, the aperture-based diffractive light modulator according to the sixth embodiment is different from the aperture-based diffractive light modulator according to the fifth embodiment in that the apertures are arranged in the lateral direction. Other structures are the same as the aperture-based diffractive light modulator shown in Fig. 4e.

图4g是根据本发明的第七实施例,部分分离的基于开孔的衍射光调制器的透视图。参照附图,根据本发明的第七实施例的基于开孔的衍射光调制器包括硅衬底501g、在硅衬底上层叠的下部反射部件503g、以及上部微型反射镜510g。Figure 4g is a perspective view of a partially isolated aperture-based diffractive light modulator according to a seventh embodiment of the present invention. Referring to the drawings, an aperture-based diffractive light modulator according to a seventh embodiment of the present invention includes a silicon substrate 501g, a lower reflection member 503g stacked on the silicon substrate, and an upper micromirror 510g.

下部反射部件503g不仅用作下部电极,还反射光以形成反射光。The lower reflection member 503g not only functions as a lower electrode, but also reflects light to form reflected light.

上部微型反射镜510g具有在其中设置的开孔511g1_511g3。在此情况下,优选地开孔511g1_511g3形成为长方形,但也可以形成为任意闭合形状例如圆形或椭圆。The upper micro mirror 510g has openings 511g1_511g3 provided therein. In this case, the openings 511g1-511g3 are preferably formed in a rectangle, but may also be formed in any closed shape such as a circle or an ellipse.

这种开孔511g1_511g3允许对应于开孔511g1_511g3的部分下部微型反射镜503g,以及邻近上部微型反射镜510g的开孔511g1_511g3的部分上部微型反射镜530e,形成像素。Such apertures 511g1_511g3 allow portions of the lower micromirror 503g corresponding to the apertures 511g1_511g3, and portions of the upper micromirror 530e adjacent to the apertures 511g1_511g3 of the upper micromirror 510g, to form pixels.

即,例如,部分上部微型反射镜510g(A),其中形成开孔,以及部分下部微型反射镜503g(B)形成单个像素。That is, for example, part of the upper micromirror 510g(A) in which an aperture is formed, and part of the lower micromirror 503g(B) forming a single pixel.

在此情况下,穿过上部微型反射镜510g的开孔511g1_511g3的入射光可以入射到下部微型反射镜503g的相应部分上,可以理解当上部微型反射镜510g与下部微型反射镜503g之间的高度差是λ/4的奇数倍之一时,生成最强衍射光。In this case, the incident light passing through the openings 511g1-511g3 of the upper micro-mirror 510g can be incident on the corresponding part of the lower micro-mirror 503g, it can be understood that when the height between the upper micro-mirror 510g and the lower micro-mirror 503g When the difference is one of odd multiples of λ/4, the strongest diffracted light is generated.

图4h是根据本发明的第八实施例,部分分离的基于开孔的衍射光调制器的透视图。Figure 4h is a perspective view of an aperture-based diffractive light modulator, partially isolated, according to an eighth embodiment of the present invention.

参照附图,根据本发明第八实施例的基于开孔的衍射光调制器不同于根据本发明第七实施例的基于开孔的衍射光调制器在于,开孔水平排列。其他的结构与图4g相同。同时,在本发明的第一至第六实施例中,使用压电材料层生成垂直致动力,以及在第七和第八实施例中,使用静电力生成垂直致动力。此外,使用电磁力生成垂直致动力。Referring to the drawings, the aperture-based diffractive light modulator according to the eighth embodiment of the present invention is different from the aperture-based diffractive light modulator according to the seventh embodiment of the present invention in that the apertures are arranged horizontally. Other structures are the same as in Fig. 4g. Meanwhile, in the first to sixth embodiments of the present invention, the piezoelectric material layer is used to generate the vertical actuation force, and in the seventh and eighth embodiments, the electrostatic force is used to generate the vertical actuation force. Additionally, the vertical actuation force is generated using electromagnetic force.

同时,在第四至第八实施力中,一个反射镜层构成下部反射部件,但是,如第二实施例所示,下部反射部件可以按间隔包括多个下部反射图形。也就是说,下部反射部件包括多个下部反射图形,并且按间隔在绝缘层的表面上设置多个下部反射图形,使得它们在位置上对应于下部微型反射镜的开孔。Meanwhile, in the fourth to eighth embodiments, one mirror layer constitutes the lower reflection member, but, as shown in the second embodiment, the lower reflection member may include a plurality of lower reflection patterns at intervals. That is, the lower reflective part includes a plurality of lower reflective patterns, and the plurality of lower reflective patterns are arranged at intervals on the surface of the insulating layer such that they correspond in position to the openings of the lower micro mirrors.

图4i是根据本发明的第九实施例,部分分离的基于开孔的衍射光调制器的透视图。Figure 4i is a perspective view of a partially detached aperture-based diffractive light modulator according to a ninth embodiment of the present invention.

参照附图,根据本发明第九实施例的基于开孔的衍射光调制器包括基座构件501i,包含硅衬底、下部反射部件510i,形成在基座构件501i的凹槽中间、以及上部微型反射镜520i,适于横跨基座部件501i的最上表面。下部反射部件510i不仅反射入射光以形成反射光,还用作上部电极。Referring to the drawings, the aperture-based diffractive light modulator according to the ninth embodiment of the present invention includes a base member 501i including a silicon substrate, a lower reflective part 510i formed in the middle of the groove of the base member 501i, and an upper micro The mirror 520i is adapted to straddle the uppermost surface of the base member 501i. The lower reflection member 510i not only reflects incident light to form reflected light, but also functions as an upper electrode.

在基座构件501i的凹槽底部形成下部电极层503i。下部电极层503i,以及位于凹槽中间的下部反射部件510i(上部电极),向下部反射部件510i提供由静电力导致的垂直致动力。A lower electrode layer 503i is formed at the bottom of the groove of the base member 501i. The lower electrode layer 503i, and the lower reflective member 510i (upper electrode) located in the middle of the groove, provide the lower reflective member 510i with a vertical actuation force caused by electrostatic force.

即,下部电极503i和下部反射部件510i由于静电力彼此吸引,并且如果对其施加电压,生成向下致动力,或者如果不对其施加电压,它们通过复原力(restoring force)产生向下致动力。That is, the lower electrode 503i and the lower reflection member 510i attract each other due to electrostatic force, and generate a downward actuation force if a voltage is applied thereto, or they generate a downward actuation force by restoring force if no voltage is applied thereto.

同时,在上部微型反射镜520i上设置开孔531i1-531i3。开孔531i1-531i3优选地形成为长方形,但是也可形成为任何闭合形状,例如圆形或椭圆形。Meanwhile, openings 531i1-531i3 are provided on the upper micro mirror 520i. The openings 531i1-531i3 are preferably formed in a rectangular shape, but may also be formed in any closed shape, such as circular or oval.

这种开孔531i1-531i3使得对应于开孔531i1-531i3的部分下部反射部件510i,以及临近开口531i1-531i3的部分上部微型反射镜520i,形成像素。Such openings 531i1-531i3 allow portions of the lower reflective member 510i corresponding to the openings 531i1-531i3, and portions of the upper micromirrors 520i adjacent to the openings 531i1-531i3, to form pixels.

即,例如,在其上形成开孔531i1-531i3的上部微型反射镜520i的一部分(A)和下部微型反射镜的一部分(B)可以形成一个像素。That is, for example, a part (A) of the upper micro mirror 520i and a part (B) of the lower micro mirror 520i on which the openings 531i1-531i3 are formed may form one pixel.

在这种情况下,通过上部微型反射镜520i的开孔的入射光可以入射到下部微型反射镜510i的相应部分上,而且可以理解在上部微型反射镜520i与下部微型反射镜510i之间的高度差是λ/4的奇数倍之一时,产生最强衍射光。In this case, the incident light passing through the opening of the upper micromirror 520i can be incident on the corresponding part of the lower micromirror 510i, and it can be understood that the height between the upper micromirror 520i and the lower micromirror 510i When the difference is one of the odd multiples of λ/4, the strongest diffracted light is produced.

图4j示出根据本发明第十实施例的基于开孔的光调制器,其与第九实施例不同在于,横向设置开孔。Fig. 4j shows an aperture-based light modulator according to a tenth embodiment of the present invention, which differs from the ninth embodiment in that the apertures are arranged laterally.

同时,在第四实施例中,以及第七至第十实施例中,硅衬底被用作基座部件,但是,如第三实施例所示,可以使用绝缘体上硅衬底。Meanwhile, in the fourth embodiment, and in the seventh to tenth embodiments, a silicon substrate is used as the base member, but, as shown in the third embodiment, a silicon-on-insulator substrate may be used.

图5是示出根据本发明第一实施例的基于开孔的光调制器的单元1-D阵列的透视图。5 is a perspective view showing a cell 1-D array of an aperture-based light modulator according to a first embodiment of the present invention.

参照附图,在根据本发明第一实施例的基于开孔的光调制器的单元1-D阵列中,具有上部微型反射镜的多个单元610a-610n彼此平行单向排列,因此衍射入射光。同时,在此仅描述根据本发明第一实施例的基于开孔的光调制器的单元1-D阵列,但也可以相同地实现根据本发明第二至第十实施例的基于开孔的光调制器的单元1-D阵列。Referring to the accompanying drawings, in the cell 1-D array of an aperture-based light modulator according to the first embodiment of the present invention, a plurality of cells 610a-610n with upper micro-mirrors are arranged parallel to each other in one direction, thus diffracting the incident light . Meanwhile, only the cell 1-D array of the aperture-based light modulator according to the first embodiment of the present invention is described here, but the aperture-based light modulators according to the second to tenth embodiments of the present invention can also be similarly implemented. Cell 1-D array of modulators.

图6是示出根据本发明第七实施例的基于开孔的光调制器的单元2-D阵列的透视图。6 is a perspective view showing a 2-D array of cells of an aperture-based light modulator according to a seventh embodiment of the present invention.

参照附图,在根据本发明第七实施例的基于开孔的光调制器的单元2-D阵列中,在X-和Y-方向上排列多个单元710a1-710nn。在此仅描述根据本发明第七实施例的基于开孔的光调制器的单元2-D阵列,但也可以相同地实现根据本发明其他实施例的基于开孔的光调制器的单元2-D阵列。Referring to the drawings, in a cell 2-D array of an aperture-based light modulator according to a seventh embodiment of the present invention, a plurality of cells 710a1-710nn are arranged in X- and Y-directions. Only the cell 2-D array of the aperture-based light modulator according to the seventh embodiment of the present invention is described here, but the cell 2-D array of the aperture-based light modulator according to other embodiments of the present invention can also be implemented in the same way. D array.

同时,尽管在此说明书中描述了单个压电材料层的情况,可以实现由多个压电材料层形成的多种压电材料层。Meanwhile, although the case of a single piezoelectric material layer is described in this specification, various piezoelectric material layers formed of a plurality of piezoelectric material layers may be realized.

图7示出使用根据本发明实施例的基于开孔的光调制器的显示设备。如上所述,例如在显示设备中使用的光学系统也可被用在打印机中,以及,在此情况下,可以使用磁鼓(drum)而不是屏幕818,如下文所述。在使用磁鼓的情况下,由于磁鼓转动,单独的扫描光学部件旋转,如在显示设备中,因此并不必须使用扫描光学部件。Fig. 7 illustrates a display device using an aperture-based light modulator according to an embodiment of the present invention. As mentioned above, the optical system used, for example, in a display device can also be used in a printer, and, in this case, a drum can be used instead of the screen 818, as described below. In the case of a magnetic drum, it is not necessary to use scanning optics since the drum rotates and a separate scanning optic rotates, as in a display device.

参照图7,使用根据本发明实施例的基于开孔的光调制器的显示设备包括显示光学系统802以及显示电子系统804。显示光学系统802包括光源806、光学部件(light optical part)808,用于将从光源806发射的光转换为线性光,使得以线性光的形式照射基于开孔的光调制器810,该基于开孔的光调制器810用于调制由光学部件808形成的线性光,以形成衍射光、滤光部件(filtering optical part)812,用于分离由基于开孔的光调制器810调制的衍射光束的级,以穿过其通过衍射光束的不同级中期望的衍射光束级、投射和扫描光学部件816,用于聚光通过滤光部件812的衍射光束,以按2-D图像扫描聚光的点光(point light)、以及显示屏幕818。Referring to FIG. 7 , a display device using an aperture-based light modulator according to an embodiment of the present invention includes a display optical system 802 and a display electronic system 804 . The display optical system 802 includes a light source 806, and an optical part (light optical part) 808 for converting the light emitted from the light source 806 into linear light so that the aperture-based light modulator 810 is illuminated in the form of linear light, which is based on the aperture Aperture-based light modulator 810 is used to modulate the linear light formed by optical part 808 to form diffracted light. Filtering optical part 812 is used to separate the diffracted beam modulated by aperture-based light modulator 810. stage, to pass through it through the diffracted beam desired in different stages of the diffracted beam, projection and scanning optics 816, used to condense the diffracted beam passing through the filter part 812, to scan the condensed point in a 2-D image Light (point light), and display screen 818.

显示电子系统804连接到光源806、基于开孔的衍射光调制器810、以及投射和扫描光学部件816。Display electronics 804 are connected to light source 806 , aperture-based diffractive light modulator 810 , and projection and scanning optics 816 .

此外,如果来自光学部件808的线性光入射到基于开孔的光调制器810上,调制器通过显示电子系统804的控制调制入射光,以生成衍射光,因此发射它。Furthermore, if linear light from the optics 808 is incident on the aperture-based light modulator 810, the modulator modulates the incident light through control of the display electronics 804 to generate diffracted light, thereby emitting it.

图8a是基于开孔的光调制器的透视图,其中线性光斜照射单元811a-811n1-D阵列的多个上部微型反射镜812a-811n。如果多个上部微型反射镜812a-812n垂直移动,由于上部微型反射镜812a-812n和下部反射部件813之间的高度差,调制入射线性光,由此生成衍射光。在此情况下,由于光斜入射,衍射光斜发射。Figure 8a is a perspective view of an aperture-based light modulator in which linear light obliquely illuminates the plurality of upper micromirrors 812a-811n of the array of cells 811a-811n1-D. If the plurality of upper micromirrors 812a-812n is moved vertically, incident linear light is modulated due to a height difference between the upper micromirrors 812a-812n and the lower reflection part 813, thereby generating diffracted light. In this case, due to oblique incidence of light, diffracted light is emitted obliquely.

图8b是基于开孔的衍射光调制器的透视图,其中线性光垂直地照射单元811a-811n1-D阵列的多个上部微型反射镜812a-811n。如果多个上部微型反射镜812a-812n垂直移动,由于上部微型反射镜812a-812n和下部反射部件813之间的高度差,调制入射线性光,由此生成衍射光。在此情况下,垂直地发射0级衍射光束,并斜发射±1级衍射光束,左和右,因为光是垂直入射的。Figure 8b is a perspective view of an aperture-based diffractive light modulator where linear light illuminates vertically the plurality of upper micromirrors 812a-811n of the array of cells 811a-811n1-D. If the plurality of upper micromirrors 812a-812n is moved vertically, incident linear light is modulated due to a height difference between the upper micromirrors 812a-812n and the lower reflection part 813, thereby generating diffracted light. In this case, the 0th-order diffracted beams are emitted vertically, and the ±1st-order diffracted beams are emitted obliquely, left and right, because the light is vertically incident.

同时,当衍射光入射于其上时,滤光系统812从衍射光束的各个级中分离衍射光束的期望级。滤光系统812包括傅立叶透镜(未示出)以及过滤器(未示出),并且选择性地通过0或±1级衍射光束。Meanwhile, the filter system 812 separates a desired order of the diffracted beam from the respective orders of the diffracted beam when the diffracted light is incident thereon. The filter system 812 includes a Fourier lens (not shown) and a filter (not shown), and selectively passes the 0 or ±1 order diffracted light beam.

同样,投射和扫描光学部件816包括聚光透镜(未示出)和扫描反射镜(未示出),并且在屏幕818上扫描衍射光束,同时控制显示电子系统804。Likewise, projection and scanning optics 816 include condenser lenses (not shown) and scanning mirrors (not shown), and scan the diffracted beam on screen 818 while controlling display electronics 804 .

显示电子系统804驱动投射和扫描光学部件816的扫描反射镜(未示出)。投射和扫描光学部件816在屏幕818上投射图像并在显示屏幕818上扫描它,以在显示屏幕818上形成2-D图像。Display electronics 804 drives scanning mirrors (not shown) of projection and scanning optics 816 . Projection and scanning optics 816 project an image on screen 818 and scan it on display screen 818 to form a 2-D image on display screen 818 .

同时,在图7至8b中,仅描述了单色图像的生成,但是可以生成彩色图像。可以通过额外地将两个光源、两个衍射光调制器、以及过滤器施加到显示光学系统802,来实现彩色图像的生成。Meanwhile, in FIGS. 7 to 8b, only the generation of a monochrome image is described, but a color image may be generated. Generation of color images can be achieved by additionally applying two light sources, two diffractive light modulators, and filters to the display optical system 802 .

如上所述,本发明意在使用一个驱动形变带单元形成一个像素。As described above, the present invention intends to form one pixel using one drive deformation band unit.

此外,本发明意在通过形变带单元的上部微型反射镜来形成多个开孔,由此生成具有改进的衍射效率的衍射光。In addition, the present invention intends to form a plurality of apertures by deforming the upper micro-mirror of the belt unit, thereby generating diffracted light with improved diffraction efficiency.

同样,本发明意在用一个驱动单元替换四个或六个传统驱动单元,由此改善制造过程产量并降低制造成本。Also, the present invention intends to replace four or six conventional drive units with one drive unit, thereby improving manufacturing process yield and reducing manufacturing costs.

Claims (24)

1. diffractive light modulator based on perforate comprises:
(a) base component;
(b) first reflection part by the base component supporting, comprising:
The center section that separates with base component is so that limit betwixt at interval;
Back to described base component and separation with it, and be used as reflecting surface first with the reflection incident light;
Passing described first reflection part extends and forms and make and pass it with at least one perforate by incident light;
(c) second reflection part, between first reflection part and base component, described second reflection part: separate with first reflection part; And
Comprise towards the reflecting surface of first reflection part, with the incident light of reflection by described at least one perforate; And
(d) actuating unit is used for moving with respect to second reflection part center section of first reflection part, and to change the diffraction light intensity, this diffraction light uses from the light of first reflection part and the reflection of second reflection part and forms;
Wherein said actuating unit comprises:
Piezoelectric layer, be placed on the primary importance of the position of the center section that is different from first reflection part, the exercisable pucker ﹠ bloat of described piezoelectric layer, thus when the opposite side to piezoelectric layer applies voltage, towards or direction away from second reflection part on actuation force is provided.
2. the diffractive light modulator based on perforate as claimed in claim 1, wherein said base component comprises:
Substrate; And
Supporting member stretches out from substrate, and the mode that described supporting member separates with the center section of first reflection part and substrate supports the disconnected position of first reflection part, to form betwixt at interval;
Wherein, place second reflection part, with the incident light of reflection by the perforate of first reflection part with respect to substrate.
3. the diffractive light modulator based on perforate as claimed in claim 2 also is included in the insulation course that inserts between the substrate and second reflection part.
4. the diffractive light modulator based on perforate as claimed in claim 1, wherein said base component limits groove to provide at interval, in the groove of base component, place second reflection part, and first reflection part across groove, so that the intermediate portion separates with second reflection part, to form at interval betwixt.
5. the diffractive light modulator based on perforate as claimed in claim 4, wherein: first reflection part is across the groove of base component, second reflection part is by the side wall supports of the groove of base component, to separate abreast with first reflection part, second reflection part towards or removable away from first reflection part, with the incident light of reflection by perforate; And
Described actuating unit moves second reflection part with respect to first reflection part, and to change the diffraction light intensity, this diffraction light uses from the light of first reflection part and the reflection of second reflection part and forms.
6. the diffractive light modulator based on perforate as claimed in claim 4 also is included in the insulation course that inserts between the base component and second reflection part.
7. the diffractive light modulator based on perforate as claimed in claim 1, wherein first reflection part comprises:
First supporting course has the center section of placing with respect to base component, so that form betwixt at interval, described supporting course is by the base component supporting and limit formed at least one perforate, passes through incident light so that pass it; And
First minitype reflector, thereby be placed on base component and separation dorsad with it on first supporting course, with the corresponding position of at least one perforate of first supporting course on, described first minitype reflector defines at least one perforate, and form and pass it by incident light, and described first minitype reflector also has surface as reflecting surface with the reflection incident light.
8. the diffractive light modulator based on perforate as claimed in claim 1 is wherein constructed first reflection part so that the intermediate portion separates with second reflection part, to provide betwixt at interval.
9. the diffractive light modulator based on perforate as claimed in claim 1, wherein first reflection part has arrangement a plurality of perforates in one direction, and described direction is identical across the direction of base component with first reflection part.
10. the diffractive light modulator based on perforate as claimed in claim 1, wherein first reflection part has arrangement a plurality of perforates in one direction, and described direction is transverse to the direction of first reflection part across base component.
11. the diffractive light modulator based on perforate as claimed in claim 1 also comprises at least two piezoelectric layer parts that are separated from each other with respect to first reflection part on the position.
12. the diffractive light modulator based on perforate as claimed in claim 11 also comprises the electrode layer that is placed on the piezoelectric layer part, so that piezoelectric voltage to be provided.
13. the diffractive light modulator based on perforate as claimed in claim 1:
Also comprise the electrode layer that is placed on the piezoelectric material layer, so that piezoelectric voltage to be provided, and wherein, first reflection part is as the electrode of piezoelectric layer.
14. the diffractive light modulator based on perforate as claimed in claim 1:
Wherein piezoelectric layer comprises:
A plurality of piezoelectric material layers when when its both sides apply voltage, generate the pucker ﹠ bloat actuation force;
A plurality of first electrode layers insert between a plurality of piezoelectric material layers, so that piezoelectric voltage to be provided;
The second electrode lay is placed on the outermost layer of a plurality of piezoelectric material layers, so that piezoelectric voltage to be provided; And
Wherein first reflection part is as the electrode of piezoelectric layer.
15. the diffractive light modulator based on perforate comprises:
Base component;
A plurality of first reflection parts are arranged and are formed array, and each first reflection part is:
From base component therebetween partly separately, make that formation at interval betwixt;
Each first reflection part is supported by base component, and each first reflection part has the reflecting surface that leaves the base component sensing; And each first reflection part is formed with at least one perforate, makes that passing it passes through incident light;
Second reflection part between first reflection part and base component, makes to limit at interval with respect to first reflection part, and this second reflection part has reflecting surface with the incident light of reflection by perforate; And
A plurality of actuating units are used for the center section that mobile phase is answered first reflection part, and to change the diffraction light intensity, described diffraction light uses from the light of first reflection part and the reflection of second reflection part and forms;
Wherein said actuating unit comprises:
Piezoelectric layer, be placed on the primary importance of the position of the center section that is different from first reflection part, the exercisable pucker ﹠ bloat of described piezoelectric layer when the opposite side to piezoelectric layer applies voltage, provides actuation force thus on the direction perpendicular to first reflection part.
16. the diffractive light modulator based on perforate as claimed in claim 15, wherein said base component comprises:
Substrate; And
At least one supporting member stretches out from substrate, and the mode of separating with the center section and the substrate of each first reflection part supports first reflection part, to form betwixt at interval;
Wherein place second reflection part, with the incident light of reflection by the perforate of a plurality of first reflection parts with respect to substrate.
17. the diffractive light modulator based on perforate as claimed in claim 15, wherein said base component has the surface of relatively flat, the center section of a plurality of first reflection parts separates with second reflection part, make and limit betwixt at interval, and substantially parallel first reflection part of arranging, to form array.
18. the diffractive light modulator based on perforate as claimed in claim 15, wherein said base component has the part of qualification groove to provide at interval, second reflecting part is positioned at the groove of base component, and a plurality of first reflection parts are respectively across groove, make intermediate portion and corresponding second reflection part separate, forming betwixt at interval, and arrange a plurality of first reflection parts to form array.
19. the diffractive light modulator based on perforate as claimed in claim 18, wherein:
Described first reflection part is across the groove of base component;
Described second reflection part is arranged and is formed array and by the recess sidewall supporting of base component, separating abreast with corresponding first reflection part, described second reflection part towards or removable away from first reflection part, with the incident light of reflection by perforate; And
Described actuating unit moves corresponding second reflection part with respect to first reflection part, and to change the diffraction light intensity, this diffraction light uses from the light of first and second reflection parts reflection and forms.
20. a use comprises based on the display device of the diffractive light modulator of perforate:
Radiative light source;
Based on the diffractive light modulator of perforate, modulating the incident light comprises to generate diffraction light:
Base component;
A plurality of first reflection parts are arranged and are formed array, and each is supported by base component, make and between the center section of first reflection part and base component, form at interval, and each first reflection part is formed with perforate, so that pass it by light, and reflecting surface is with the reflection incident light;
By second reflection part of base component supporting, described second reflection part separates with first reflection part, and described second reflection part comprises that reflecting surface is with the incident light of reflection by the perforate of first reflection part; And
A plurality of actuating units are used for moving with respect to second reflection part center section of corresponding first reflection part, and to change the diffraction light intensity, this diffraction light uses from the light of first reflection part and the reflection of second reflection part and forms;
Optics is used for the incident light from light emitted is applied to diffractive light modulator based on perforate;
Filter optics, be used for from selecting the diffraction light of expectation level by the diffraction light of modulating based on the diffractive light modulator of perforate, make to pass it by selected diffraction light; And
Projection and scanning optical parts are used for scanning on screen by filtering the diffraction light of optics;
Wherein said actuating unit comprises:
Piezoelectric layer, be placed on the primary importance of the position of the center section that is different from first reflection part, the exercisable pucker ﹠ bloat of described piezoelectric layer, thus when the opposite side to piezoelectric layer applies voltage, towards or direction away from second reflection part on actuation force is provided.
21. a use comprises based on the printing equipment of the diffractive light modulator of perforate:
Radiative light source;
Based on the diffractive light modulator of perforate, modulating the incident light comprises to generate diffraction light:
Base component;
A plurality of first reflection parts are arranged and are formed array, and each is supported by base component, to form between part and the base component at interval therebetween, and each described first reflection part is formed with perforate, so that pass it by light, and reflecting surface is with the reflection incident light;
By second reflection part of base component supporting, described second reflection part separates with first reflection part, and described second reflection part comprises that reflecting surface is with the incident light of reflection by perforate; And
A plurality of actuating units are used for moving the center section of corresponding first reflection part, and to change the diffraction light intensity, this diffraction light uses from the light of first reflection part and the reflection of second reflection part and forms;
Optics is used for the incident light from light emitted is applied to diffractive light modulator based on perforate;
Filter optics, be used for from selecting the diffraction light of expectation level by the diffraction light of modulating based on the diffractive light modulator of perforate, make to pass it by selected diffraction light; And
The projection optics parts are used for throwing on magnetic drum by filtering the diffraction light of optics;
Wherein said actuating unit comprises:
Piezoelectric layer, be placed on the primary importance of the position of the center section that is different from first reflection part, the exercisable pucker ﹠ bloat of described piezoelectric layer, thus when the opposite side to piezoelectric layer applies voltage, towards or direction away from second reflection part on actuation force is provided.
22. the diffractive light modulator based on perforate comprises:
Substrate;
Insulation course is placed on the substrate;
At least one sacrifice layer is placed on the insulation course, and the part that is positioned under the minitype reflector that will be provided with on the described sacrifice layer is etched;
Reflection part is placed on the insulation course, lays described reflection part with the reflection incident light;
Supporting is arranged at least one sacrifice layer, and forms first perforate by it;
Minitype reflector is placed in the supporting, and described minitype reflector has reflecting surface with the reflection incident light, forms second perforate with corresponding first perforate on catoptron, passes through incident light to pass it; And
At least one actuating unit with when when it applies voltage, moves the center section of supporting, changes the diffraction light intensity thus, and this diffraction light uses from the light of minitype reflector and reflection part reflection and forms;
Wherein said substrate is a silicon substrate, and described actuating unit has piezoelectric, and piezoelectric is set on electrode, makes when to electrode application voltage the actuating unit pucker ﹠ bloat.
23. the diffractive light modulator based on perforate as claimed in claim 1, wherein first reflection part is crooked under the influence of actuating unit, thus towards or move away from second reflection part.
24. the diffractive light modulator based on perforate as claimed in claim 1, wherein first reflection part towards or away from the direction of second reflection part on elongate and flexible.
CNB200510120099XA 2005-04-26 2005-11-02 Open hole-based diffractive light modulator Expired - Fee Related CN100485443C (en)

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US5311360A (en) * 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
US5949570A (en) * 1995-06-20 1999-09-07 Matsushita Electric Industrial Co., Ltd. Diffractive optical modulator and method for producing the same, infrared sensor including such a diffractive optical modulator and method for producing the same, and display device including such a diffractive optical modulator
US6141139A (en) * 1998-11-30 2000-10-31 Eastman Kodak Company Method of making a bistable micromagnetic light modulator
US7027204B2 (en) * 2003-09-26 2006-04-11 Silicon Light Machines Corporation High-density spatial light modulator
DE102005018604A1 (en) * 2004-04-29 2005-11-24 Samsung Electro-Mechanics Co., Ltd., Suwon Open hole-based diffractive light modulator used in e.g. optical memory, has upper micromirror comprising open holes at center, such that it reflects/diffracts incident light based on height difference between upper and lower micromirrors

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