CN101095219A - Carbon nanotube-based filler for integrated circuits - Google Patents
Carbon nanotube-based filler for integrated circuits Download PDFInfo
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- CN101095219A CN101095219A CNA2005800456738A CN200580045673A CN101095219A CN 101095219 A CN101095219 A CN 101095219A CN A2005800456738 A CNA2005800456738 A CN A2005800456738A CN 200580045673 A CN200580045673 A CN 200580045673A CN 101095219 A CN101095219 A CN 101095219A
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Abstract
Description
技术领域technical field
本发明涉及集成电路器件及其方法,更具体地涉及采用纳米管材料的集成电路模塑或附着填料。The present invention relates to integrated circuit devices and methods thereof, and more particularly to integrated circuit molding or attachment fillers employing nanotube materials.
背景技术Background technique
用于集成电路芯片应用的填料如模塑复合物(mold compounds)和底部填充(underfill)在电路的制造和实现中起着重要作用。例如,通常采用包封衬底上电路的模塑材料在衬底上安装集成电路、倒装芯片型电路和其他元件。对于某些应用,填料用作在电路(如芯片)以下、电路连接内部或周围如焊料球型连接器的底部填充。Fillers such as mold compounds and underfills for integrated circuit chip applications play an important role in the fabrication and implementation of circuits. For example, integrated circuits, flip-chip type circuits, and other components are typically mounted on a substrate using a molding material that encapsulates the circuitry on the substrate. For some applications, the filler is used as an underfill under a circuit such as a chip, in or around a circuit connection such as a solder ball connector.
在包封模塑应用或底部填充应用中,填料都起到固定电路和/或芯片就位的作用。此外,填料可用于使得某些电路和连接器电绝缘。In either overmolding or underfill applications, the filler serves to hold the circuit and/or chip in place. Additionally, fillers can be used to electrically insulate certain circuits and connectors.
已采用各种填料实现这些目的。二氧化硅(Silica)是一种用于底部填充和模塑复合物的填料。典型地,二氧化硅与另一种材料如环氧树脂混合,实现应用于集成电路和封装所需的材料特性,如支撑此类电路和封装的强度。另一种填料是银。典型地银也与环氧树脂混合,通常用于将管芯(die)附着于封装。Various fillers have been used to achieve these objectives. Silica is a filler used in underfill and molding compounds. Typically, silica is mixed with another material, such as an epoxy resin, to achieve the material properties required for applications in integrated circuits and packaging, such as the strength to support such circuits and packages. Another filler is silver. Silver is also typically mixed with epoxy, often used to attach the die to the package.
在许多电路应用中,管理电路生成的热量很重要。由于集成电路器件更加小,电路封装更为紧密,因此大量的电流通过小面积。密度加大和/或功耗增加通常导致生成的热量增加,这对电路元件造成潜在的问题。In many circuit applications, it is important to manage the heat generated by the circuit. As integrated circuit devices are smaller and circuit packages are more compact, a large amount of current flows through a small area. Increased density and/or increased power consumption often results in increased heat generation, which poses potential problems for circuit components.
填料和采用模塑复合物、底部填料(在芯片和封装之间)以及采用管芯随着材料的应用的导热性对于从芯片中的电路和封装以及连接二者的电路去除热量有影响。典型地相对于导电材料如金属,二氧化硅的导热性较低。由于这些特性,从采用使用二氧化硅填料的封装材料的电路充分去除热量面临挑战。Filler and thermal conductivity with the mold compound, underfill (between the chip and package) and with the die as the material is applied has an impact on the removal of heat from the circuitry in the chip and the package and the circuitry connecting the two. Silicon dioxide typically has low thermal conductivity relative to conductive materials such as metals. Due to these characteristics, it is challenging to adequately remove heat from circuits employing encapsulation materials using silica fillers.
在一些示例中,没有充分地去除热量会导致集成电路的寿命和性能问题。由于集成电路器件的制造密度较高,这方面的问题更为严重。进一步地,由于要求集成电路具有较高性能,与热量相关的性能波动会导致性能问题。In some examples, insufficient heat removal can lead to lifetime and performance issues with integrated circuits. This problem is exacerbated by the higher manufacturing densities of integrated circuit devices. Further, as higher performance is required from integrated circuits, heat-related performance fluctuations can cause performance problems.
发明内容Contents of the invention
这些因素和其它困难对实现电路衬底的各种应用提出挑战。These factors and other difficulties present challenges for realizing various applications of circuit substrates.
本发明的各方面包含可采用集成电路和其它器件实现的衬底和/或封装。本发明以多个实现和应用作为示例,以下就其中一些进行总结。Aspects of the invention include substrates and/or packages that may be implemented with integrated circuits and other devices. The invention is exemplified by a number of implementations and applications, some of which are summarized below.
本发明的各种应用涉及碳纳米管增强型集成电路芯片封装配置。在多种示例实施方式中,采用碳纳米管增强的材料被实施成有利于支撑衬底和集成电路芯片之间的配和关系。Various applications of the invention relate to carbon nanotube enhanced integrated circuit chip packaging configurations. In various example embodiments, materials reinforced with carbon nanotubes are implemented to facilitate the mating relationship between the support substrate and the integrated circuit chip.
按照一种示例实施方式,集成电路界面材料包括碳纳米管。界面材料有利于在采用支撑衬底的配置中对集成电路芯片提供结构支撑。According to an example implementation, an integrated circuit interface material includes carbon nanotubes. The interface material facilitates providing structural support to the integrated circuit chip in configurations employing a supporting substrate.
按照本发明的另一种示例实施方式,集成电路芯片配置包括碳纳米管增强模塑复合物。集成电路芯片与支撑衬底连接。大体上模塑复合物在集成电路芯片和部分支撑衬底之上。在一些应用中,模塑复合物基本上包封集成电路芯片,以及芯片与支撑衬底或其它元件之间的电连接。模塑复合物中的碳纳米管材料有利于从集成电路芯片和/或其电连接传热。According to another example embodiment of the present invention, an integrated circuit chip arrangement includes a carbon nanotube reinforced molding compound. An integrated circuit chip is attached to a support substrate. Basically the mold compound is over the integrated circuit chip and part of the supporting substrate. In some applications, the molding compound substantially encapsulates the integrated circuit chip, as well as the electrical connections between the chip and a supporting substrate or other components. The carbon nanotube material in the molding compound facilitates heat transfer from the integrated circuit chip and/or its electrical connections.
按照本发明的另一种示例实施方式,集成电路芯片配置包括碳纳米管增强底部填料。集成电路芯片通过集成电路芯片和支撑衬底之间的电导体与支撑衬底连接。碳纳米管增强底部填料在集成电路芯片和衬底之间塑变(flowed),大体上围绕和支撑电导体。底部填料中的碳纳米管材料有利于从导体和/或集成电路芯片和/或支撑衬底传热。According to another example embodiment of the present invention, an integrated circuit chip arrangement includes a carbon nanotube enhanced underfill. The integrated circuit chip is connected to the support substrate through electrical conductors between the integrated circuit chip and the support substrate. The carbon nanotube-reinforced underfill is flowed between the integrated circuit chip and the substrate, substantially surrounding and supporting the electrical conductors. The carbon nanotube material in the underfill facilitates heat transfer from the conductor and/or the integrated circuit chip and/or the supporting substrate.
结合本发明的另一种示例实施方式,碳纳米管增强型结合材料用于将集成电路芯片固定到支撑衬底。结合材料在集成电路芯片与支撑衬底之间形成,并物理连接二者。结合材料中的碳纳米管材料有利于从集成电路芯片、支撑衬底和/或二者之间的连接器传热。在一种实现中,结合材料中的碳纳米管材料浓度足以使结合材料导电。In connection with another example embodiment of the present invention, a carbon nanotube-reinforced bonding material is used to secure an integrated circuit chip to a support substrate. A bonding material is formed between the integrated circuit chip and the supporting substrate and physically connects the two. The carbon nanotube material in the bonding material facilitates heat transfer from the integrated circuit chip, the supporting substrate, and/or the connector between the two. In one implementation, the concentration of carbon nanotube material in the bonding material is sufficient to render the bonding material electrically conductive.
对本发明的以上概述并不是旨在描述每一个举例说明的实施方式或本发明的每一种实现。以下的附图和详细描述更具体地给出这些实施方式的示例。The above summary of the present invention is not intended to describe each illustrated embodiment or every implementation of the present invention. The Figures and Detailed Description that follow more particularly exemplify these implementations.
附图说明Description of drawings
结合附图考虑下文对本发明的各种实施方式的详细描述,可以更全面地理解本发明,其中:The present invention may be more fully understood from the following detailed description of various embodiments of the invention considered in conjunction with the accompanying drawings, in which:
图1A示出按照本发明的一种示例实施方式,采用碳纳米管填料的衬底型材料的断面图;Figure 1A shows a cross-sectional view of a substrate-type material employing carbon nanotube fillers, according to an exemplary embodiment of the present invention;
图1B示出按照本发明的另一种示例实施方式,采用碳纳米管和二氧化硅填料的衬底型材料断面图;Figure 1B shows a cross-sectional view of a substrate-type material employing carbon nanotubes and silica fillers according to another exemplary embodiment of the present invention;
图2示出按照本发明的另一种示例实施,采用碳纳米管底部填料的倒装芯片器件;以及Figure 2 illustrates a flip-chip device employing a carbon nanotube underfill according to another example implementation of the present invention; and
图3示出按照本发明的另一种示例实施,具有BGA型衬底和与之连接的集成电路芯片的集成电路器件。Figure 3 shows an integrated circuit device having a BGA type substrate and an integrated circuit chip attached thereto, according to another example implementation of the present invention.
具体实施方式Detailed ways
尽管本发明可应用于各种修改和替代的形式,但其特性已经在图中以示例的方式示出,并将被详细描述。然而应当理解,本发明并不局限于本文所描述的特定实施方式。相反,本发明涵盖如同附加权利要求中所限定的本发明范围内的所有修改、等价物和替代物。While the present invention is applicable to various modifications and alternative forms, features thereof have been shown by way of example in the drawings and will be described in detail. It should be understood, however, that the invention is not limited to the particular embodiments described herein. On the contrary, the invention is to cover all modifications, equivalents, and alternatives falling within the scope of the invention as defined in the appended claims.
相信本发明可应用于包括封装材料的各种电路和方法,和/或得益于该封装材料,特别得益于使用芯片-封装配置的诸如模塑或填料的封装材料。尽管不必将本发明局限于这些应用,但在这种环境中通过对示例的讨论可全面理解本发明。It is believed that the present invention is applicable to various circuits and methods that include and/or benefit from encapsulation materials, particularly those that use chip-package configurations such as molding or potting. While the invention is not necessarily limited to these applications, a full understanding of the invention can be obtained through a discussion of examples in this context.
按照本发明的一种示例实施方式,对于集成电路芯片封装配置可实现碳纳米管型填料。各种应用包括将集成电路将芯片固定到封装型衬底上。其它应用包括在电路之间形成界面(不需固定),如在芯片和封装衬底之间。还有其它的应用包括将芯片固定到封装型衬底上以及在固定芯片和衬底之间形成界面。According to an example embodiment of the present invention, carbon nanotube type fillers are implemented for integrated circuit chip packaging configurations. Various applications include attaching integrated circuits to die on packaged substrates. Other applications include forming interfaces between circuits (without attachment), such as between chips and packaging substrates. Still other applications include attaching a chip to a packaged substrate and forming an interface between the attached chip and the substrate.
在另一种示例实施方式中,将模塑型碳纳米管复合物用于封装衬底上的集成电路芯片上方和/或包封集成电路芯片。典型地集成电路芯片设置成在封装衬底上,电路连接芯片与封装用以在其间传送信号(即输入和输出)。模塑碳纳米管复合物在集成电路芯片和连接电路(如,结合线、焊料球和/或引线框架)上方形成,并且将芯片和任何连接器电绝缘。模塑材料中的碳纳米管有利于传送热量离开集成电路芯片和/或所安装至的封装衬底。In another example embodiment, a molded carbon nanotube composite is used over and/or encapsulating integrated circuit chips on a packaging substrate. Typically an integrated circuit chip is disposed on a package substrate, and circuitry connects the chip to the package for communicating signals (ie, inputs and outputs) therebetween. The molded carbon nanotube composite is formed over the integrated circuit chip and connecting circuitry (eg, bond wires, solder balls, and/or lead frame) and electrically insulates the chip from any connectors. The carbon nanotubes in the molding material facilitate the transfer of heat away from the integrated circuit chip and/or the packaging substrate to which it is mounted.
在另一种示例实施方式中,集成电路封装界面材料包括碳纳米管填料。当集成电路芯片和封装型衬底连接在一起时,界面材料适用于填充其间的空隙。在一些应用中,界面材料填充集成电路芯片和封装衬底之间的电路连接周围区域,如对于倒装芯片型应用实现的焊料凸点周围。碳-纳米管型材料被实现成传导采用该材料实现的集成电路芯片(或芯片)生成的热量。In another example embodiment, an integrated circuit package interface material includes carbon nanotube fillers. Interface materials are suitable for filling the gap between an integrated circuit chip and a packaging substrate when they are bonded together. In some applications, the interface material fills the area around the circuit connections between the integrated circuit chip and the packaging substrate, such as around solder bumps implemented for flip-chip type applications. Carbon-nanotube-type materials are realized to conduct heat generated by integrated circuit chips (or chips) implemented with the materials.
在一种应用中,界面材料是配置成在集成电路芯片和封装衬底间塑变的底部填料。碳纳米管在整个底部填料中混合,被选择为获得有利于填充芯片和封装之间电路连接器周围的空隙的塑变特性。例如,可利用之前在底部填充应用中使用的材料实现底部填料。纳米管与底部填料塑变进入空隙并有利于传送热量离开电路连接器,并且根据配置,离开芯片和/或封装。In one application, the interface material is an underfill configured to deform between the integrated circuit chip and the packaging substrate. Carbon nanotubes are mixed throughout the underfill, chosen for plastic deformation properties that facilitate filling the voids around circuit connectors between the chip and package. For example, underfill can be achieved using materials previously used in underfill applications. The nanotubes and underfill plastically deform into the void and facilitate the transfer of heat away from the circuit connector and, depending on the configuration, away from the chip and/or package.
在另一种示例实施方式中,碳纳米管用于支撑或硬化上述讨论的用于集成电路芯片的衬底型材料。碳纳米管硬化材料被配置成将集成电路芯片与封装衬底固定,如通过形成集成电路芯片和封装衬底间的固定界面或通过包封封装衬底。In another example embodiment, carbon nanotubes are used to support or stiffen the substrate-type materials discussed above for integrated circuit chips. The carbon nanotube hardened material is configured to secure the integrated circuit chip to the packaging substrate, such as by forming a secure interface between the integrated circuit chip and the packaging substrate or by encapsulating the packaging substrate.
在一些应用中,碳纳米管硬化材料为保持集成电路芯片和封装衬底间的配置提供充分支撑。例如,相对于封装衬底,碳纳米管硬化材料可被配置成为保持集成电路芯片就位提供大部分物理支撑。在其它应用中,碳纳米管硬化材料为保持集成电路芯片就位提供75%以上的物理支撑。在这些应用中,物理支撑可以与碳纳米管硬化材料保持集成电路芯片与封装衬底连结的性能有关(即,没有这种材料,在轻微的压力下,芯片会相对于封装移动)。In some applications, the carbon nanotube hardened material provides sufficient support to maintain the configuration between the integrated circuit chip and the packaging substrate. For example, the carbon nanotube hardened material can be configured to provide most of the physical support for holding the integrated circuit chip in place relative to the packaging substrate. In other applications, carbon nanotube hardened materials provide more than 75 percent of the physical support for holding integrated circuit chips in place. In these applications, physical support can be related to the carbon nanotube hardened material's ability to hold the integrated circuit chip bonded to the package substrate (ie, without the material, the chip would move relative to the package under slight pressure).
在另一种示例实施方式中,采用碳纳米管填料的模塑型材料选择性地布置在热产生元件如电路、电路元件、集成电路芯片和连接电路附近。大体上,模塑型材料可实现成封装模塑复合物、底部填料和管芯着材料中的一个或更多个。模塑型材料传导热产生元件生成的热能。在封装时实现模塑型材料,用于电路衬底,以便包封芯片或填充电路元件之间的空隙,如采用衬底自身和/或采用封装的其它部分,如采用将电路封装元件结合在一起的材料。在一些应用中,模塑材料被配置成传导热量离开特定电路。在其它应用中,模塑型材料被配置成大体均匀地耗散特定层或衬底中的热量。In another example embodiment, a molding type material employing carbon nanotube fillers is selectively disposed near heat generating elements such as circuits, circuit components, integrated circuit chips, and connecting circuits. In general, molding-type materials can be implemented as one or more of packaging molding compounds, underfills, and die attach materials. The molded material conducts the heat energy generated by the heat generating element. Molding-type materials are implemented at the time of packaging for circuit substrates to encapsulate chips or fill gaps between circuit components, such as by using the substrate itself and/or by using other parts of the package, such as by combining circuit package components in materials together. In some applications, the molding material is configured to conduct heat away from a particular circuit. In other applications, molding-type materials are configured to generally uniformly dissipate heat in a particular layer or substrate.
各种类型的碳纳米管材料可应用于上述讨论的各种应用,并且在特定应用中与其它材料混合以适应选定的需求。例如,对于不同的应用,使用碳纳米管粉尘、多壁碳纳米管和单壁碳纳米管和其他碳纳米管基材料。这些碳纳米管材料通常较小,即小于二氧化硅或其它普通的填料。Various types of carbon nanotube materials can be used in the various applications discussed above, and in particular applications mixed with other materials to suit selected needs. For example, for different applications, carbon nanotube dust, multi-walled carbon nanotubes and single-walled carbon nanotubes and other carbon nanotube-based materials are used. These carbon nanotube materials are generally smaller, ie, smaller than silica or other common fillers.
此外,可选择碳纳米管材料的类型以满足特定的应用需求,如硬度、强度、导热性、导电性(或其缺少)以及将该材料与其它材料混合的能力,如环氧树脂或树脂。例如,当碳纳米管材料和混合成需要塑变的材料,如在底部填充应用中,碳纳米管材料的尺寸期望小到有利于塑变。在这方面,小尺寸碳纳米管粉尘容易混合在底部填充型材料中。相应地,碳纳米管材料混合成可实现各种特性如强度、耐久性和可燃性的材料类型。In addition, the type of carbon nanotube material can be selected to meet specific application needs, such as hardness, strength, thermal conductivity, electrical conductivity (or lack thereof), and the ability to mix the material with other materials, such as epoxies or resins. For example, when carbon nanotube materials are mixed into materials that require plastic deformation, such as in underfill applications, the size of the carbon nanotube material is expected to be small enough to facilitate plastic deformation. In this regard, small-sized carbon nanotube dust is easily mixed in the underfill type material. Accordingly, carbon nanotube materials are mixed into material types that can achieve various properties such as strength, durability, and flammability.
在各种支撑和/或热耗散实施方式中,碳纳米管被取向成沿特定的方向有利于满足特定支撑或热耗散需求。在一些应用中,碳纳米管材料随机均匀地在整个模塑复合物型材料如环氧树脂或塑料中混合。在其它应用中,碳纳米管被配置成特定的取向以达到支撑应用所需要的特定硬度和/或强度。In various support and/or heat dissipation embodiments, the carbon nanotubes are oriented in specific directions to facilitate specific support or heat dissipation needs. In some applications, the carbon nanotube material is mixed randomly and uniformly throughout a molding compound type material such as epoxy or plastic. In other applications, carbon nanotubes are configured in specific orientations to achieve specific stiffness and/or strength required for support applications.
现在转至附图,图1A示出按照本发明的另一示例实施方式,采用碳纳米管填料的衬底型材料100的断面图。示出碳纳米管填料是衬底型材料100中的小圆,对于代表性的填料标记为110。尽管以示例的方式示出为圆形,填料可以各种类型的碳纳米管材料实现,如粉尘、单壁碳纳米管和/或多壁碳纳米管。并且,所示配置也是示例方式,各种配置方法和碳纳米管填料的放置可应用于该示例实施方式。在这一方面,图1A中所示出纳米管填料的形状和配置,以及如下文讨论的图1B,是为了举出示例,包括各种形状和配置。Turning now to the drawings, FIG. 1A illustrates a cross-sectional view of a substrate-
图1B示出按照本发明的另一示例实施方式,采用碳纳米管和二氧化硅填料的衬底型材料120。衬底型材料120与图1A中的材料100类似,除碳纳米管填料外还包括二氧化硅填料。与图1A中所示类似,小的清晰的圆用于示出碳纳米管填料的示例代表,对于代表性的碳纳米管填料标记为130。小的加阴影线的圆用于示出二氧化硅填料的示例代表,对于二氧化硅填料标记为132。Figure IB illustrates a substrate-
可在各种应用中实现图1A中的衬底型材料100和图1B中的衬底型材料120,如封装模塑复合物、管芯连接材料和底部填充。在这一方面,可利用在此描述的和以下示图所讨论的各种示例实现材料100和120。Substrate-
选择在图1A和图1B中分别示出的衬底型材料100和120中的碳纳米管填料130和/或二氧化硅填料132的浓度以满足各种条件。例如,对于其中要求高传热量和容许导电性的应用,碳纳米管填料的浓度相对较高。在衬底型材料不能是导电的(如底部填充应用)的应用中,纳米管填料的浓度保持足够低以阻止导电性。与在此讨论的这种和/或其它示例实施方式相关可实现的、有关填料应用的一般信息以及有关导电性与填料浓度相关的具体信息,可参考Patrick Collins和John Hagerstrom,”Creating High Performance ConductiveComposites with Carbon Nanotubes”,通过引用将其全文结合在本文中。The concentrations of
在一种实现中,通过构建碳纳米管填料(图1A中的110,图1B中的130)浓度足够低阻止导电性。这种碳纳米管填料浓度相对于衬底型材料的成分受到控制,在图1B示例中相对于二氧化硅(或其它)填料。例如,当衬底型材料大体上电绝缘时,在保持整体衬底材料在大体非导电配置中,可实现碳纳米管材料的较高浓度。In one implementation, electrical conductivity is prevented by constructing carbon nanotube fillers (110 in Figure 1A, 130 in Figure IB) at sufficiently low concentrations. This carbon nanotube filler concentration is controlled relative to the composition of the substrate-type material, in the example of FIG. 1B relative to silica (or other) filler. For example, higher concentrations of carbon nanotube material can be achieved while maintaining the bulk substrate material in a substantially non-conductive configuration when the substrate-type material is substantially electrically insulating.
可独立于或相对于其它填料如二氧化硅实现碳纳米管材料的浓度。例如,在一些应用中,相对于二氧化硅填料选择碳纳米管填料浓度(如较少的碳纳米管填料意味着较多的二氧化硅填料),可保持特定量的组合填料。相对于二氧化硅填料提高或降低碳纳米管填料浓度,相应地提高或降低其中实现填料的衬底型材料的导电性。The concentration of carbon nanotube material can be achieved independently or relative to other fillers such as silica. For example, in some applications, the concentration of carbon nanotube filler is selected relative to silica filler (eg, less carbon nanotube filler means more silica filler) to maintain a specific amount of combined filler. Increasing or decreasing the carbon nanotube filler concentration relative to the silica filler, correspondingly increases or decreases the electrical conductivity of the substrate-type material in which the filler is implemented.
选择在图1A和1B中分别用作衬底型材料100或120的材料(围绕填料),以满足特定应用的需求。例如,当衬底型材料要求支撑集成电路芯片时,如通过将芯片固定到封装,可选择该材料以便获得粘接型特性。当衬底型材料需要塑变时,选择该材料以便获得塑变性能。对于得益于强连接的应用,可使用环氧型材料。在得益于稍弱连接的应用或松散附着(soft attachment)的应用中,可使用低温热塑材料。The materials (surrounding filler) used as substrate-
图2示出按照本发明的另一示例实施方式,采用碳纳米管填料的倒装芯片器件200。倒装芯片器件200包括倒转的或倒装的、电路面朝下位于封装衬底210上的集成电路芯片220(倒装芯片)。这种方法,相对于电路面朝上的传统朝向芯片,导致倒装芯片220中的电路更接近于封装衬底210,减少了连接电路的长度,并且相应地,有利于提高器件200的运行速度。FIG. 2 illustrates a flip-chip device 200 employing carbon nanotube fillers, according to another example embodiment of the present invention. The flip chip device 200 includes an integrated circuit chip 220 (flip chip) that is turned upside down or flipped, with the circuit side down on a packaging substrate 210 . This method, compared with the traditional orientation chip where the circuit faces upward, causes the circuit in the flip chip 220 to be closer to the packaging substrate 210, reduces the length of the connecting circuit, and accordingly, is conducive to improving the operating speed of the device 200 .
连接倒装芯片220和封装衬底210的器件是一系列连接器,包括在倒装芯片220的相反端部的典型传统焊料球连接器,分别标记为230和232。底部填料240位于倒装芯片220和封装衬底210之间,填充在包括那些标记为230和232的连接器周围的空隙。The means of connecting the flip chip 220 to the packaging substrate 210 is a series of connectors including typically conventional solder ball connectors at opposite ends of the flip chip 220, labeled 230 and 232, respectively. Underfill 240 is located between flip chip 220 and package substrate 210 , filling the voids around the connectors including those labeled 230 and 232 .
底部填料240有助于密封倒装芯片220和封装衬底210之间的连接,还有助于密封倒装芯片上的任何电路界面(例如焊盘)和封装衬底本身。在这一方面,底部填料240不导电达到阻止倒装芯片220和封装衬底210间的导电电路间的导电的程度。Underfill 240 helps to seal the connection between flip chip 220 and packaging substrate 210, and also helps to seal any circuit interfaces on the flip chip (eg, pads) and the packaging substrate itself. In this regard, underfill 240 is not conductive to the extent that it prevents conduction between the conductive circuits between flip chip 220 and package substrate 210 .
底部填料240中的碳纳米管填料以特定浓度实现,采用诸如环氧树脂的材料,其方式使得保持底部填充处于大体上不导电的状态。如图1A和/或1B所示混合碳纳米管填料。利用这种方法,碳纳米管填料在保持底部填充大体上不导电的特性的同时,增强底部填料240的导热性。The carbon nanotube filler in underfill 240 is implemented in a specific concentration, using a material such as epoxy, in such a way as to keep the underfill in a substantially non-conductive state. Mix carbon nanotube fillers as shown in Figures 1A and/or 1B. In this way, the carbon nanotube filler enhances the thermal conductivity of the underfill 240 while maintaining the substantially non-conductive nature of the underfill.
在一种实现中,连接器(包括焊料球230和232)涂敷有诸如氧化物的电绝缘材料,或者另外配置电绝缘材料,将连接器与底部填料240隔开并电绝缘。这样,底部填充240中的碳纳米管材料不大可能从绝缘的电路元件导电。在一些示例中,绝缘材料足以将电路与底部填充绝缘,使得底部填充由使底部填充导电的相对高浓度的碳纳米管材料实现。In one implementation, the connector (including solder balls 230 and 232 ) is coated with, or otherwise configured with, an electrically insulating material, such as an oxide, that separates and electrically insulates the connector from underfill 240 . As such, the carbon nanotube material in underfill 240 is less likely to conduct electricity from insulated circuit components. In some examples, the insulating material is sufficient to insulate the circuit from the underfill such that the underfill is implemented with a relatively high concentration of carbon nanotube material that makes the underfill conductive.
在另一种实现中,底部填料240适应于支撑电路连接器,包括典型的传统焊料球连接器230和232。通过底部填料240的结构支撑(采用碳纳米管填料)抵抗在电路连接器上的应力,有助于防止材料断裂和其它损害。例如,当倒装芯片220和封装衬底210的热膨胀系数不同时,在倒装芯片器件200的操作温度变化时,可在电路连接器上施加应力。在高温运行下,没有底部填料的支撑,热应力会引致电路连接器断裂。在这一方面,使用碳纳米管填料增强底部填料240以减轻(如抵抗或防止)热感应的应力断裂。In another implementation, underfill 240 is adapted to support circuit connectors, including typical conventional solder ball connectors 230 and 232 . Structural support through underfill 240 (using carbon nanotube fillers) resists stress on the circuit connectors, helping to prevent material fracture and other damage. For example, when the coefficients of thermal expansion of flip chip 220 and package substrate 210 are different, stress may be placed on the circuit connectors as the operating temperature of flip chip device 200 varies. At high operating temperatures, without the support of the underfill, thermal stress can cause circuit connectors to fracture. In this regard, underfill 240 is reinforced with carbon nanotube fillers to mitigate (eg, resist or prevent) thermally induced stress cracking.
图3示出按照本发明的另一示例实施方式,采用碳纳米管填充模塑复合物的集成电路器件300。器件300包括在衬底上配置的采用集成电路芯片340的BGA型衬底350。BGA型衬底通过配置360,利用一系列焊料球连接器390依次与外部电路连接。通过碳纳米管填料,模塑复合物330将集成电路芯片340固定在BGA型衬底350,有利于随之从集成电路芯片、衬底和电连接传热。采用以示例的方式示出的典型的连接器380和382,模塑复合物进一步地密封和/或保护集成电路芯片340和BGA型衬底350之间的电连接。FIG. 3 illustrates an integrated circuit device 300 employing a carbon nanotube filled molding compound, according to another example embodiment of the present invention. The device 300 includes a BGA type substrate 350 employing an integrated circuit chip 340 disposed on the substrate. The BGA type substrate is configured 360 to be in turn connected to external circuitry using a series of solder ball connectors 390 . With the carbon nanotube filler, the mold compound 330 secures the integrated circuit chip 340 to the BGA type substrate 350, facilitating subsequent heat transfer from the integrated circuit chip, substrate, and electrical connections. The mold compound further seals and/or protects the electrical connection between the integrated circuit chip 340 and the BGA type substrate 350 with typical connectors 380 and 382 shown by way of example.
在器件300中,可选的碳纳米管填充界面材料被添加在选定的界面上。通过示例的方式示出界面区域372(在集成电路芯片和模塑复合物330之间),374(在集成电路芯片和BGA型衬底350之间)和376(在BGA型衬底和外部电路配置360之间)。这些界面材料有利于在界面材料内部散热,还有利于传导热能离开器件300。对于器件300,可选地实现其它界面型应用,所述其它界面型应用与区域372、374和376相联系或分开,如图1提供的底部填充方法。例如,在BGA型衬底和外部电路配置360之间的区域376可实现底部填充型方法,填充一系列焊料球连接器390周围的空隙。In device 300, optional carbon nanotube-filled interface materials are added at selected interfaces. Interface regions 372 (between the integrated circuit chip and the mold compound 330), 374 (between the integrated circuit chip and the BGA type substrate 350) and 376 (between the BGA type substrate and the external circuitry) are shown by way of example. configuration between 360). These interface materials are beneficial for dissipating heat inside the interface material and for conducting heat away from the device 300 . For device 300, other interface-type applications may optionally be implemented in association with or separate from regions 372, 374, and 376, such as the underfill method provided in FIG. 1 . For example, the area 376 between the BGA type substrate and the external circuit arrangement 360 can implement an underfill type approach, filling the voids around the series of solder ball connectors 390 .
在区域374的碳纳米管填充的界面材料可选地实现成管芯附着复合物,该界面材料将集成电路芯片340(管芯)物理固定到BGA型衬底350。从而,在区域374使用的具有碳-纳米管填料的材料结构硬化,并连接到集成电路芯片340和BGA型衬底350二者。The carbon nanotube filled interface material at region 374 is optionally implemented as a die attach compound, which interface material physically secures the integrated circuit chip 340 (die) to the BGA type substrate 350 . Thus, the material structure with carbon-nanotube fillers used at region 374 hardens and connects to both the integrated circuit chip 340 and the BGA type substrate 350 .
选择模塑复合物330中的碳纳米管填料的成分和配置,以满足各种应用需求。为满足这些需求,碳纳米管填料可混合在模塑复合物330中和/或与其它填料结合,如图1A和/或1B所示。在一种实现中,模塑复合物330中碳纳米管填料的浓度足以增强模塑复合物中的导电性。邻近导电电路的模塑复合物330部分绝缘。要求碳纳米管填料的相对高浓度使模塑复合物导电,也有利于导热,相应地去除器件300的热量。The composition and configuration of the carbon nanotube filler in molding compound 330 is selected to meet various application requirements. To meet these needs, carbon nanotube fillers may be mixed in the molding compound 330 and/or combined with other fillers, as shown in FIGS. 1A and/or 1B. In one implementation, the concentration of carbon nanotube filler in molding compound 330 is sufficient to enhance electrical conductivity in the molding compound. Portions of the molding compound 330 adjacent to the conductive circuitry are insulated. The relatively high concentration of carbon nanotube filler required to make the mold compound electrically conductive also facilitates thermal conductivity, which in turn removes heat from the device 300 .
在一种应用中,模塑复合物330的碳纳米管填料浓度足够高,以便在模塑复合物中按照“传输线效应”(“transmission line effect”)的方式促进导电性(例如,类似典型地与同轴电缆相关的传输线效应)。这样足够高的浓度与特定应用有关,如模塑复合物的厚度,任何相关电场和电路邻近的强度。相对于导电模塑复合物330产生电场,并用在集成电路芯片340中用于各种目的。例如,根据电流特性如通过的电流量、碳纳米管填料的位置和电流频率,模塑复合物330中通过的电流导致与集成电路芯片340中的电流的相互作用。因而,选择这些特性为各个特定应用满足所需的相互作用,例如,使得产生的电场在相邻的电路引起特征反应。In one application, the carbon nanotube filler concentration of the molding compound 330 is high enough to promote electrical conductivity in the molding compound by means of a "transmission line effect" (e.g., like typically transmission line effects associated with coaxial cables). Such sufficiently high concentrations are application specific, such as the thickness of the molding compound, the strength of any relevant electric fields and proximity to the circuit. An electric field is generated relative to conductive molding compound 330 and used in integrated circuit chip 340 for various purposes. For example, the current passing through the molding compound 330 causes an interaction with the current in the integrated circuit chip 340 according to current characteristics such as the amount of current passed, the location of the carbon nanotube filler, and the frequency of the current. Thus, these properties are chosen to meet the desired interaction for each particular application, eg, such that the generated electric field causes a characteristic response in adjacent circuits.
选择模塑复合物330的体材料(”bulk material”)(保持碳纳米管填料的材料)以满足应用需求,如那些与导电或导热相关的需要,以及与强度、耐久性和可燃性相关的物理需求。诸如环氧树脂、联苯和其它塑料的材料是应用于各种应用的示例。在各种应用中,对碳纳米管填料选择与生产有关的体材料特性,以应对各种挑战如与器件300所处应力相关的结合线变形(弯曲(“sweep”))和其它挑战。例如,通常保持碳纳米管填料的尺寸小到有利于电路连接器如连接器380和382周围的模塑复合物330的塑变。The "bulk material" (the material holding the carbon nanotube filler) of the molding compound 330 is selected to meet application requirements, such as those related to electrical or thermal conductivity, as well as those related to strength, durability, and flammability physical needs. Materials such as epoxy, biphenyl, and other plastics are examples for a variety of applications. In various applications, the production-related bulk material properties of the carbon nanotube filler are selected to address challenges such as bond line deformation (bending ("sweep")) and others associated with the stresses to which the device 300 is exposed. For example, the size of the carbon nanotube filler is generally kept small to facilitate plastic deformation of the molding compound 330 around circuit connectors, such as connectors 380 and 382 .
在本发明的另一种示例实施方式中,采用本质上受ESD(静电放电)保护的碳纳米管填料浓度的复合物材料实现模塑复合物。使用图3作为示例,集成电路芯片340由具有模塑复合物330和/或涂敷有含碳纳米管的塑料的绝缘复合物包封。模塑复合物(如果应用,还有碳纳米管涂层)基本缺乏磁粉,这使采用涂层时的极性感应互作用最小化。在器件300运行时,模塑复合物(或碳纳米管涂层)有利于相对小的电流泄漏。该方法适用于各种器件,在此结合图3的描述是特定示例。采用这种方法,可容易地实现包括图1A和图1B中配置的那些应用的其它应用。In another exemplary embodiment of the present invention, the molding compound is realized with a composite material having a carbon nanotube filler concentration that is inherently ESD (electrostatic discharge) protected. Using FIG. 3 as an example, integrated circuit chip 340 is encapsulated by an insulating compound with molding compound 330 and/or coated with carbon nanotube-containing plastic. The molding compound (and carbon nanotube coating, if applied) is substantially devoid of magnetic powder, which minimizes polarity-induced interactions when the coating is applied. The mold compound (or carbon nanotube coating) facilitates relatively little current leakage when the device 300 is in operation. The method is applicable to a variety of devices, the description herein in conjunction with FIG. 3 is a specific example. Using this approach, other applications including those configured in FIGS. 1A and 1B can be readily implemented.
以上描述和图中显示的各种实施方式只是以举例说明的方式提供,不应被认为限制本发明。基于上述讨论和说明,本领域的技术人员将容易地认识到对本发明可以作各种更改和改变,不必严格地遵从本文说明和描述的示例实施方式和应用。例如,可采用与碳不同的其它材料如硼或附加该材料,实现碳纳米管。根据另一个示例,与碳纳米管的特性类似的填料(如热导接近于3000W/mK,热膨胀系数大约为0.25ppm)可替代用作或另外用作碳纳米管填料。此外,以示例的方式讨论的衬底型材料可采用许多不同类型的材料实现,单独使用和/或结合另一种材料或结合上述材料使用。此类更改和改变并不背离本发明的实质和范围。The various embodiments described above and shown in the drawings are provided by way of illustration only and should not be considered as limiting the present invention. Based on the above discussion and illustrations, those skilled in the art will readily recognize that various modifications and changes can be made to the present invention without strictly following the exemplary embodiments and applications illustrated and described herein. For example, carbon nanotubes may be realized using or in addition to other materials than carbon, such as boron. According to another example, fillers with properties similar to those of carbon nanotubes (eg, thermal conductivity close to 3000 W/mK, coefficient of thermal expansion about 0.25 ppm) may be used instead or additionally as carbon nanotube fillers. Furthermore, the substrate-type materials discussed by way of example may be implemented with many different types of materials, alone and/or in combination with another material or in combination with the aforementioned materials. Such alterations and changes do not depart from the spirit and scope of the invention.
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- 2005-11-04 CN CNB2005800456738A patent/CN100521126C/en active Active
- 2005-11-04 EP EP11150596A patent/EP2302669A1/en not_active Ceased
- 2005-11-04 KR KR1020077011528A patent/KR101183754B1/en active Active
- 2005-11-04 US US11/718,711 patent/US20110156255A1/en not_active Abandoned
- 2005-11-04 EP EP05800507A patent/EP1810324A1/en not_active Ceased
- 2005-11-04 JP JP2007539700A patent/JP4901745B2/en active Active
- 2005-11-04 WO PCT/IB2005/053623 patent/WO2006048844A1/en active Application Filing
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102005656A (en) * | 2009-08-31 | 2011-04-06 | Smk株式会社 | Minute connector |
| CN102005656B (en) * | 2009-08-31 | 2014-09-03 | Smk株式会社 | Minute connector |
| CN102480908A (en) * | 2010-11-25 | 2012-05-30 | 光宏精密股份有限公司 | Molded interconnect assembly having thermally conductive properties and method of making same |
| WO2012068843A1 (en) * | 2010-11-25 | 2012-05-31 | 光宏精密股份有限公司 | Moulded interconnect device with heat conduction property and manufacturing method thereof |
| CN102480908B (en) * | 2010-11-25 | 2015-03-18 | 光宏精密股份有限公司 | Molded interconnect assembly having thermally conductive properties and method of making same |
| CN103311195A (en) * | 2012-03-15 | 2013-09-18 | 南亚科技股份有限公司 | Heat radiation structure |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006048844A1 (en) | 2006-05-11 |
| EP2302669A1 (en) | 2011-03-30 |
| KR101183754B1 (en) | 2012-09-17 |
| JP2008519453A (en) | 2008-06-05 |
| EP1810324A1 (en) | 2007-07-25 |
| TW200633158A (en) | 2006-09-16 |
| KR20070084429A (en) | 2007-08-24 |
| CN100521126C (en) | 2009-07-29 |
| JP4901745B2 (en) | 2012-03-21 |
| US20110156255A1 (en) | 2011-06-30 |
| TWI393226B (en) | 2013-04-11 |
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