CN101241278B - Fringe field switching mode liquid crystal display device - Google Patents

Abstract

The present invention provides a fringe field switching (FFS) mode liquid crystal display (LCD), which includes a lower substrate, an upper substrate, and a liquid crystal layer sandwiched between the substrates, each pixel area is composed of gates crossing each other on the lower substrate. The row and the data row are defined, and the intersection of the gate row and the data row is distributed with switching devices. The FFS mode LCD includes a transparent pixel electrode and a transparent common electrode, and the transparent common electrode is arranged separately through an insulating layer sandwiched between the transparent pixel electrode and the transparent common electrode and the transparent pixel electrode, and the light transmittance is adjusted by applying an electric field to the liquid crystal layer , the transparent common electrode has a plurality of strips, and the strip has a predetermined width in a direction substantially parallel to the data row, and the transparent common electrode has a first strip covering the data row and adjacent to the first strip in the central area of the pixel area. For the second strip, the distance between them is larger than the distance between the strips formed in the pixel area, and one end of the transparent pixel electrode is arranged between the first strip and the adjacent second strip.

Description

Fringe Field Switching Mode LCD

technical field

The present invention relates to fringe field switching (FFS) mode liquid crystal displays (LCDs), and more particularly to an FFS mode LCD that achieves increased light transmittance and aperture ratio at minimal cost and without special processing. the

Background technique

Generally, FFS mode LCDs are proposed to improve the lower aperture ratio and light transmittance of In-Plane Switching (IPS) mode LCD devices, which has been disclosed in Korean Patent Application No. 1998-0009243. the

In the FFS mode LCD, the common electrode and the pixel electrode are made of transparent conductors, which increases the aperture ratio and light transmittance compared with the IPS mode LCD, and the space formed between the common electrode and the pixel electrode is larger than that of the upper and lower glass The space between the substrates is narrower, thereby forming a fringe electric field between the common electrode and the pixel electrode, and driving all the liquid crystal molecules present in the upper portion of the electrodes, thereby obtaining higher light transmittance. the

But in the FFS mode LCD, a light-shielding area that blocks light is usually formed on the data line, which reduces the aperture ratio. the

If the light shielding area is removed in order to increase the aperture ratio, the contrast ratio (CR) will deteriorate due to light leakage. Thus, the shading area cannot be removed. the

Contents of the invention

The present invention aims to make the electric field formed in the data row different from the electric field formed in the center of the pixel area, so that the light-shielding area can be removed or the area where the light-shielding area is formed can be reduced. the

Another object of the present invention is to increase the aperture ratio and prevent light leakage. the

A further object of the present invention is to adjust the gap distance, layout, etc. of data lines, transparent common electrodes and transparent pixel electrodes, and thereby provide a fringe field switching (FFS) mode liquid crystal display (LCD) at a minimum cost and without special processing . the

Another object of the present invention is to form a low-impedance metal line on the transparent common electrode in the non-opening area, wherein the gate line and the data line pass through the non-opening area, so that the current flows between the metal line and the transparent common electrode flow between them, and reduces the impedance of the transparent common electrode, and thus provides a high-brightness fringe field switching mode liquid crystal display, which can effectively reduce the load on the common electrode line (Vcom) in the liquid crystal display panel, and can Effectively solve the picture quality problems such as greening and flickering caused by the increase of Vcom load. the

One aspect of the present invention is to provide a fringe field switching mode liquid crystal display, which includes a lower substrate, an upper substrate, and a liquid crystal layer sandwiched between the substrates, each pixel region is defined by a gate row and a data row, so The gate row and the data row are formed to cross each other on the lower substrate, and switch devices are distributed at the intersection of the gate row and the data row, wherein the fringe field switching mode liquid crystal display includes a transparent pixel electrode and a transparent common electrode in the pixel area, The transparent common electrode is separated from the transparent pixel electrode by an insulating layer sandwiched between the transparent pixel electrode and the transparent common electrode, so that the light transmittance can be adjusted by applying an electric field to the liquid crystal layer, and the transparent common electrode has multiple strips, the strips have a predetermined width in a direction substantially parallel to the data row, the transparent common electrode has a first strip covering the data row, and a second strip adjacent to the first strip, the first The distance between the strip and the second strip is larger than the distance between the strips formed in the pixel area, and the transparent pixel electrode is flat, and compared with the second strip, one end of the transparent pixel electrode is closer to The first strip is also disposed between the first strip and the second strip, or one end of the transparent pixel electrode is disposed at a central portion between the first strip and the second strip. the

The width of the first bar can be set to be 1 to 5 times the width of the data row. the

[12] One end of the transparent pixel electrode may be closer to the first strip than to the second strip, and located at the center between the first and second strips. the

Preferably, when the non-transmissive area with the minimum transmittance lower than 10% based on the data line is included in the width of the data line, even if the light-shielding area on the data line does not exist or is drastically reduced, it is possible to Shades the upper part of the data row. More preferably, a non-light-transmitting region having a minimum light transmittance lower than 7% based on the data line may be included within the width of the data line. the

The transparent pixel electrode can be in the shape of a plate or a slit. the

When the transparent common electrodes of the respective pixel regions are connected to each other and the same voltage is applied to the transparent common electrodes, the transparent common electrodes can reduce the overall impedance. the

Another aspect of the present invention is to provide a fringe field switching mode liquid crystal display, which includes a lower substrate, an upper substrate, and a liquid crystal layer sandwiched between the substrates, each pixel region is defined by a gate row and a data row, The gate row and the data row intersect each other on the lower substrate, and switch devices are distributed at the intersection of the gate row and the data row, wherein the fringe field switching mode liquid crystal display includes a transparent pixel electrode and a transparent common electrode in the pixel area , the transparent common electrode is separated from the transparent pixel electrode by an insulating layer sandwiched between the transparent pixel electrode and the transparent common electrode, so that the light transmittance can be adjusted by applying an electric field to the liquid crystal layer, and the transparent common electrode is in having a predetermined width in a direction parallel to the data row, and having a plurality of stripes, wherein a first stripe covering the data row and a second stripe adjacent to the first stripe are formed in the pixel area, and The electric field formed in the region including the data row has a smaller vertical electric field component than the electric field formed in the central region of the pixel region. The transparent pixel electrode is flat, and compared with the second strip, one end of the transparent pixel electrode is closer to the first strip and arranged between the first strip and the second strip, Or one end of the transparent pixel electrode is disposed at the central portion between the first and second bars. The transparent common electrode has a first strip completely covering the data row in the pixel area, and a second strip adjacent to the first strip. the

At the same time, if the voltage applied to the transparent pixel electrode and the transparent common electrode as well as the layout of each electrode, the gap distance, etc. are adjusted, the light transmittance of the data row and the adjacent area can be significantly reduced. Thus, it is possible to remove the light-shielding area on the data row and the adjacent area, or drastically reduce the area in which the light-shielding area is formed, and also prevent rotational displacement. the

Another aspect of the present invention also provides a fringe field switching mode liquid crystal display, which includes a lower substrate, an upper substrate, and a liquid crystal layer sandwiched between the substrates, and each pixel area is defined by a gate row and a data row , the gate row and the data row intersect each other on the lower substrate, and switching devices are distributed at the intersection of the gate row and the data row, wherein the fringe field switching mode liquid crystal display includes transparent pixel electrodes and transparent common electrodes in the pixel area An electrode, the transparent common electrode is separately provided in the non-opening area in which the gate row and the data row are formed by an insulating layer sandwiched between the transparent pixel electrode and the transparent common electrode, and the transparent pixel electrode is arranged so that by applying an electric field to the liquid crystal layer The light transmittance can be adjusted, and a metal row with a specific thickness is arranged above or below the transparent common electrode in the non-opening area, so as to be electrically connected to the transparent common electrode. The transparent pixel electrode is in the shape of a flat plate, and the transparent common electrode has a first strip completely covering the data row in the pixel area, and a second strip adjacent to the first strip, and is connected to the Compared with the second strip, one end of the transparent pixel electrode is closer to the first strip and disposed between the first strip and the second strip, or one end of the transparent pixel electrode is disposed between the first strip and the second strip. The central part between the first and the second. the

Description of drawings

The above and other objects, features and advantages of the present invention will be more apparent to those skilled in the art by describing in detail the exemplary embodiments of the present invention in conjunction with the accompanying drawings. In the attached picture:

[20] FIGS. 1A to 1E are plan views illustrating a process of forming a pixel region layer on a lower substrate of an FFS mode LCD device according to an exemplary embodiment of the present invention;

[21] Fig. 2 is a sectional view along line I-I' in Fig. 1A;

[22] Fig. 3 is a sectional view along line II-II' in Fig. 1A;

[23] Figure 4 is a plan view showing some layers in Figure 1A;

[24] According to an exemplary embodiment of the present invention, FIGS. 5A to 5D illustrate comparative simulation results of changes in light transmittance according to the disposition position of one end of the transparent pixel electrode. the

[25] Figure 6 is an image showing the minimum transmittance on a data row basis;

[26] FIG. 7 is a plan view of an FFS mode LCD device of another exemplary embodiment of the present invention;

[27] Fig. 8 is a sectional view along line I-I' in Fig. 7;

[28] Fig. 9 is a sectional view along line II-II' in Fig. 7;

[29] Fig. 10 is a sectional view along the I-I' line in the improved embodiment of Fig. 7;

[30] FIG. 11 is a sectional view along line II-II' in a modified example of FIG. 7 . the

Detailed ways

[31] Hereinafter, exemplary embodiments of the present invention will be described in detail. However, the present invention is not limited to the embodiments disclosed below, but can be implemented in various forms. In order to enable those of ordinary skill in the art to implement and practice the invention, the following examples are described. the

[32] An FFS mode LCD includes a lower substrate, an upper substrate, and a liquid crystal layer sandwiched between the substrates. Each pixel area is defined by a gate row and a data row, and the gate row and the data row are formed to cross each other on the lower substrate. Switching devices are distributed at the intersections of gate rows and data rows. In order to adjust the light transmittance by applying an electric field to the liquid crystal layer, the FFS mode LCD has a transparent pixel electrode and a transparent common electrode in the pixel area, and the transparent common electrode is sandwiched between the transparent pixel electrode and the transparent common electrode. The insulating layer in between is set apart from the transparent pixel electrode, so that the transparent common electrode partially overlaps with the transparent pixel electrode. the

[33] FIG. 1A is a plan view of a part of a pixel region formed through a manufacturing process on a lower substrate of an FFS mode LCD, according to an exemplary embodiment of the present invention. 1B to 1E are plan views showing the process of sequentially forming and stacking respective layers. Fig. 2 is a cross-sectional view along line II-I' in Fig. 1A, and Fig. 3 is a cross-sectional view along line II-II' in Fig. 1A. the

[34] Referring to FIGS. 1A-1E , 2 and 3 , the gate row G and the data row 600 made of opaque metal are arranged to cross at right angles on the lower substrate 100 , thereby forming a unit pixel. In such a unit pixel region, the transparent common electrode 800 and the transparent pixel electrode 400 are provided with the insulating layer 700 sandwiched between the two electrodes 800 and 400 . The transparent pixel electrode 400 is provided in the form of a flat plate on the same layer as the data row 600, for example, and the transparent common electrode 800 is formed to have a plurality of stripes by patterning a transparent conductive layer deposited on the insulating layer 700, and is partially connected to the transparent The pixel electrodes 400 overlap. the

[35] On the gate 200 in the gate row G, an active pattern (active pattern) 500, a source 600a and a drain 600b are provided with a gate insulating layer 300 sandwiched between the gate 200 and the active pattern 500, The active pattern 500 has an amorphous silicon (a-Si) layer and an n+a-Si layer deposited in sequence, thereby forming a thin film transistor (TFT) T. Referring to FIG. The drain electrode 600b is electrically connected to the transparent pixel electrode 400 to provide a data signal to the unit pixel. the

[36] Meanwhile, a color filter (not shown in the drawings) corresponding to each pixel region formed on the lower substrate 100 and used to develop screen colors is provided on the upper substrate. Unlike the conventional technology, the light-shielding area on the data row 600, such as the black matrix, can be removed or reduced compared with the conventional technology. Unlike conventional techniques, the shading regions are preferably removed from the data row 600. In addition, the transparent common electrode 800 is not formed on the data row 600 in the conventional art, but is formed on the data row 600 in the exemplary embodiment of the present invention. the

[37] A method of manufacturing an FFS mode LCD will now be described in detail with reference to FIGS. 1A to 1E , 2 and 3 . the

[38] Referring to FIG. 1A to FIG. 1E and FIG. 2 , the gate row G including the gate electrode 200 is formed on the lower substrate 100 . More specifically, an opaque metal layer is deposited and patterned on the lower substrate 100, and thus, the gate row G including the gates 200 is formed in the TFT T region on the lower substrate 100. the

[39] Subsequently, the gate insulating layer 300 is deposited on the entire lower substrate 100, thereby covering the gate row G including the gate electrode 200, and then by depositing and patterning a transparent conductive layer on the gate insulating layer 300, the flat transparent pixel electrode 400 are formed and distributed in each pixel area. the

[40] On the above composite substrate, an a-Si layer and an n+a-Si layer are sequentially deposited and patterned, thereby forming an active pattern 500 on the gate insulating layer 300 above the gate electrode 200 . the

[41] After the metal layer for the source and drain is deposited, the metal layer is patterned to form a data row 600 including a source 600a and a drain 600b, thereby forming a TFT T. Here, the drain electrode 600b is provided to be electrically connected to the pixel electrode 400 . the

[42] Subsequently, for example, an insulating layer 700 made of silicon nitride (SiNx) is deposited on the composite structure in which the TFT T is formed, and then the slit-shaped transparent common electrode 800 is partly or completely connected to the transparent pixel electrode 400 overlapping. Thereafter, although not shown in the drawings, an alignment layer is deposited on the uppermost portion of the composite substrate in which the common electrode 800 is formed, thereby completing the fabrication of the array substrate. the

[43] Meanwhile, a color filter is optionally formed on the upper substrate, and an alignment layer is formed on the combined substrate. The upper and lower substrates 100 are attached with a liquid crystal layer sandwiched between the substrates, thereby completing the FFS mode LCD of the exemplary embodiment of the present invention. Needless to say, polarizers may be attached to the outer surfaces of the respective substrates after the substrates are attached together. the

[44] In FIG. 1A, the transparent pixel electrode 400 is shown in the form of a flat plate. The transparent pixel electrode 400 may also have a shape such as a slit shape, but a plate shape is more effective than other shapes. the

[45] Referring to FIG. 4 , the structure of the transparent common electrode 800 including a plurality of stripes covers the entire portion except the region in which the TFT T is formed (see FIG. 1A and FIG. 2 ), and can communicate with The respective pixel areas are electrically connected. the

[46] An exemplary embodiment of the present invention will be described in further detail below with reference to FIGS. 3 and 4 . the

[47] The transparent common electrode 800 has a plurality of stripes having a predetermined width in a direction substantially parallel to the data row 600 . The first strip _C1 of the transparent common electrode 800 is formed to cover the entire data row 600, so that the light-shielding area on the data row 600 used in the conventional technology can be removed or significantly reduced.

[48] In other words, the first strip _C1 is disposed on the data row 600, thereby enabling to reduce rotational displacement and increase light transmittance. Here, the width L ₁ of the first strip C ₁ is greater than the width L ₃ of the data row 600 , which effectively covers the entire data row 600 . In this configuration, the first strip _C1 can be used to block the electric field of the data row 600. Preferably, the width _L1 of the first strip _C1 can be set to 1 to 5 times the width _L3 of the data row 600, and more preferably, the width _L1 of the first strip _C1 can be set to the width _L3 of the data row 600 2 to 4.5 times of that.

[49] The distance D1 between the first strip _C1 and the second strip _{C2 of} the transparent common electrode 800 is set larger than the distance _D2 between the strips formed in the pixel. In this structure, compared with the electric field formed by the transparent pixel electrode 400 and the transparent common electrode 800 in the central area A of the pixel area, in the area B including the data line 600, the transparent pixel electrode 400, the transparent common electrode The electric field formed by 800 and data row 600 has a smaller vertical electric field component. The distance _D1 between the first strip _C1 and the adjacent second strip _C2 may be set to be 0.5˜3 μm larger than the distance _D2 between the strips formed in the pixel.

[50] Preferably, the width L ₂ of the second strip C ₂ is set to be smaller than the distance D ₁ between the first strip C ₁ and the second strip C ₂ , and also smaller than the distance between the second strip C ₂ and the adjacent second strip C 2 The distance _{D 2} between the third strip C ₃ of C 2 in the direction of the pixel area. More preferably, the width L ₂ of the second strip C ₂ is set to be 2˜4 μm smaller than the distance D ₁ between the first strip C ₁ and the second strip C ₂ . In addition, the width L ₂ of the second strip C ₂ is set to be 1.5˜2.5 μm smaller than the distance D ₂ between the second strip C ₂ and the third strip C ₃ .

[51] One end E of the transparent pixel electrode 400 is disposed between the first strip C1 of the transparent common electrode 800 covering the data row ₆₀₀ and the adjacent second strip _C2 . Preferably, one end E of the transparent pixel electrode 400 is closer to the first strip C ₁ than to the second strip C ₂ . More preferably, one end E of the transparent pixel electrode 400 is located at the central portion between the first bar _C1 and the second bar _C2 . The term "central portion" means a region that is substantially central, and the central portion may have a predetermined error (within ±0.5 μm around the exact center) from the exact center in actual processing.

[52] Meanwhile, in this structure, the non-light-transmitting region may be formed on the data row 600 and have a width similar to that of the data row 600, which reduces deterioration of light transmittance and prevents light leakage. Therefore, even when the light-shielding area on the data row 600 used in the conventional technology is reduced or removed, the light can be blocked. the

[53] According to an exemplary embodiment of the present invention, FIG. 5A to FIG. 5D show how the light transmittance varies with the setting position of one end E of the transparent pixel electrode 400 between the first bar _C1 and the second bar _C2 . Compare the simulation results.

[54] Referring to FIGS. 5A-5D , when one end E of the transparent pixel electrode 400 is closer to the second strip C ₂ than the first strip C ₁ , the light transmittance is 63.94% (see FIG. 5A ). When one end E of the transparent pixel electrode 400 is disposed at the exact center between the first bar _C1 and the second bar _C2 , the light transmittance is 74.46% (see FIG. 5B ). When one end E of the transparent pixel electrode 400 is closer to the first strip _C1 , the light transmittance is 75.72% (see FIG. 5C ). When one end E of the transparent pixel electrode 400 extends across the first strip _C1 , the light transmittance is 76.12% (see FIG. 5D ). Theoretically, the light transmittance in FIGS. 5A to 5D will be divided by 2 when a polarizer is installed.

[55] In the case of FIG. 5A , if an area corresponding to a minimum light transmittance of, for example, less than 10% is regarded as a non-light-transmitting area, the width X of the non-light-transmitting area is set relatively larger than the width L ₃ of the data row 600 . Then, the aperture ratio is lowered, and the light transmittance is also lowered as a whole.

[56] In the case of FIG. 5D, the transmittance is high, but the minimum point of the transmittance curve corresponding to the upper part of the data line 600 is higher than 10%. Then, the non-light-transmitting region is hardly formed, and light leakage occurs. Therefore, it is impossible to remove or reduce the light-shielding area on the data row 600 . the

[57] The inventors of the present invention found that, in the situation shown in FIG. 5B or FIG. _5C , compared with the second strip C2, one end E of the transparent pixel electrode 400 is between the first strip _C1 and the second _strip C2 It would be more effective to set the interval close to the first C ₁ , or to be in the center between the first C ₁ and the second C ₂ .

[58] Referring to FIG. 5B and FIG. 5C, if an area corresponding to a minimum light transmittance of less than 10%, for example, is regarded as a non-light-transmitting area, the width X of the non-light-transmitting area can be set to be equal to or smaller than the width L of the data row 600 ₃ . More specifically, the inventors of the present invention found that in the non-transmissive area, it is possible to secure light transmittance, prevent light leakage, and form a suitable non-transmissive area similar to the data row 600 .

[59] At the same time, in FIG. 5A, the curve obtained from the light transmittance at the upper part of the data row 600 decreases from the maximum value, and is far lower than the maximum value of the pixel area, so the light transmittance decreases as a whole. In FIG. 5D , the minimum transmittance of the upper part of the data row 600 is higher than that of the upper part of the data row 600 in FIG. 5A , FIG. 5B and FIG. 5C , thus no non-transmissive region is formed. the

[60] Further details will be described below with reference to FIG. 6 . the

[61] FIG. 6 is an image showing the minimum light transmittance based on the data line. Referring to FIG. 6 , a parabola of light transmittance having a minimum point at the center of the data row 600 is shown (see FIGS. 5A to 5D ). the

[62] Here, assuming that the area where the transmittance curve corresponds to 10% or less is defined as the non-transmitting area, the inventors of the present invention found that when the non-transmitting area is set to be equal to or less than the data line 600 When the width L is ₃ , the effect of the present invention is the best.

[63] In other words, when the transmittance curves (a) to (d) are shown in Figure 6, the width _L3 of the data row 600 can be compared with the width of the non-transmitting region of each transmittance curve compared to. Then, the light transmittance curve (a) is much larger than the width L ₃ of the data line 600, the non-light transmittance area of the light transmittance curve (b) has an approximate size with the width L ₃ of the data line 600, and the light transmittance curve (c ) is smaller than the width L ₃ of the data line 600, and the light transmittance curve (d) has no non-light-transmitting region.

[64] At the same time, if the non-transmissive area of the light transmittance curve is equal to or smaller than the width L ₃ of the data line 600, the light transmittance can be guaranteed and light leakage can be prevented, and the appropriate non-transmissive area is set to be approximately equal to the data line 600. Line 600. Thus, there may be no light-shielding area (usually formed on the substrate), or a significantly reduced light-shielding area may not be formed.

[65] In FIG. 6, the non-light-transmitting region has a light transmittance of less than 10%. Preferably, an area with a light transmittance of less than 10% is identified as a non-light transmittance area, but the light transmittance may be less than 5% or less than 7%. the

[66] FIG. 7 is a plan view of an FFS mode LCD device according to another exemplary embodiment of the present invention. Fig. 8 is a cross-sectional view along line II-I' in Fig. 7, and Fig. 9 is a cross-sectional view along line II-II' in Fig. 7 . Fig. 10 is a sectional view along the line I-I' in the modified embodiment of Fig. 7, and Fig. 11 is a sectional view along the line II-II' in the modified embodiment of Fig. 7 . the

[67] Referring to FIGS. 7 to 11 , an FFS mode LCD according to another exemplary embodiment of the present invention generally includes an upper substrate 1100 and a lower substrate 1200 connected together to face each other, and filled with two substrates and a spacer ( not shown) the liquid crystal layer 1300 in the formed liquid crystal space. the

[68] Here, the upper substrate 1100 generally refers to a color filter array substrate, and generally includes an insulating substrate 1110, a light shielding region 1120, a color filter 1130, and the like. the

[69] The light shielding region 1120 is a light shielding unit for preventing light leakage, and is formed on the substrate 1110 at a certain pitch. In general, the light shielding region 1120 defines boundaries of red (R), green (G) and blue (B) color filters, and is formed of a photosensitive organic material including carbon black. the

[70] The color filter 1130 includes red (R), green (G), and blue (B) color filter patterns arranged between the respective light shielding regions 1120, and the color filter 1130 is used to impart color to light, so The light is emitted from a backlight unit (not shown) and passes through the liquid crystal layer 1300. the

[71] More specifically, gate rows GL and data rows DL formed of opaque metal are arranged to cross at right angles on the lower substrate 1200, thereby forming unit pixels. In the unit pixel region, the transparent common electrode 1220 and the transparent pixel electrode 1230 are provided with an insulating layer 1240 sandwiched between the two electrodes 1220 and 1230 . The transparent pixel electrode 1230 is disposed on the same layer as the data row DL in the form of, for example, a flat plate, and by patterning a transparent conductive layer deposited on the insulating layer 1240, the transparent common electrode 1220 is formed to have a plurality of stripes, and partly The ground overlaps the transparent pixel electrode 1230 . the

[72] On the gate 1250 in the gate row GL, the active pattern 1270, the source 1280a, and the drain 1280b are provided with a gate insulating layer 1260 sandwiched between the gate 1250 and the active pattern 1270, and the active pattern 1250 It includes an a-Si layer and an n+a-Si layer deposited in sequence, thereby forming a TFT. The drain electrode 1280b is electrically connected to the transparent pixel electrode 1230 so as to provide a data signal to the unit pixel. the

[73] In particular, the low-impedance metal row 1290 for reducing the impedance of the transparent common electrode 1220 is formed with a specific thickness on the transparent common electrode 1220 in the non-opening area, such as the non-light-transmitting area, and is connected with the transparent common electrode 1220 are electrically connected, wherein gate rows GL and data rows DL are formed in the non-opening area. the

)，因此在金属行1290上形成的透明公共电极1220没有被阶差(step difference)断开，或者由摩擦(rubbing)阶差造成的所述漏光也被最小化。然而，随着LCD尺寸的增加，为了减小透明公共电极1220的阻抗，金属行1290的厚度可以约为1000

或者更大。  [74] Here, the thickness of the metal row 1290 of low resistance is about hundreds of Angstroms (

), so that the transparent common electrode 1220 formed on the metal row 1290 is not disconnected by the step difference, or the light leakage caused by the rubbing step difference is also minimized. However, as the LCD size increases, in order to reduce the resistance of the transparent common electrode 1220, the thickness of the metal row 1290 may be about 1000

or bigger.

[75] Meanwhile, as shown in FIGS. 10 and 11 , a low-resistance metal row 1290 may be formed under the transparent common electrode 1220 . the

[76] The low-resistance metal row 1290 may be formed of a low-resistance metal material, such as copper (Cu), aluminum (Al), aluminum neodymium (AlNd), molybdenum (Mo), titanium (Ti) and at least one of molybdenum tungsten (MoW) or at least one of their alloys. the

[77] As mentioned above, in order to reduce the impedance of the transparent common electrode 1220, above or below the transparent common electrode 1220 in the non-opening area, a low-impedance metal row 1290 is formed for electrical connection, wherein the gate row GL and the data A row DL passes through the non-opening area. Therefore, the load on the common electrode line (Vcom) in the liquid crystal display panel can be effectively reduced, and the picture quality problems such as greenishness and flickering caused by the increase of Vcom load can be effectively solved. the

[78] According to the FFS mode LCD of the present invention, in the light shielding region for shielding light, the light shielding region formed on the data line can be removed or reduced, and light leakage and rotational displacement can be prevented. the

[79] In addition, the present invention adjusts the width, layout, etc. of data lines, transparent common electrodes, and transparent pixel electrodes, thereby increasing the aperture ratio with minimal cost and without special processing. the

[80] In addition, the present invention can be easily applied to liquid crystal panels of FFS structure, and in medium-sized liquid crystal panels and small-sized liquid crystal panels used in notebooks, etc., have high brightness without problems of picture quality, such as decreased aperture ratio, hair loss, etc. Green issues and more. the

[81] While the invention has been shown and described with reference to certain exemplary embodiments, it will be understood by those skilled in the art that the invention may be made without departing from the spirit and scope of the invention as defined in the appended claims. Transformation of various forms and details. the

Claims (11)

1. A fringe field switching mode liquid crystal display, which includes a lower substrate, an upper substrate and a liquid crystal layer sandwiched between the substrates, each pixel area is defined by a gate row and a data row, and the gate row and data row rows are formed to cross each other on the lower substrate, and switching devices are distributed at the intersections of the gate rows and data rows, Wherein, the fringe field switching mode liquid crystal display includes a transparent pixel electrode and a transparent common electrode in the pixel area, and the transparent common electrode is connected to the transparent pixel electrode and the transparent common electrode through an insulating layer sandwiched between the transparent pixel electrode and the transparent common electrode. The pixel electrodes are set separately, so that the light transmittance can be adjusted by applying an electric field to the liquid crystal layer, the transparent common electrode has a plurality of stripes having a predetermined width in a direction substantially parallel to the data row, The transparent common electrode has a first strip covering the data row, and a second strip adjacent to the first strip, a distance between the first and second bars is greater than a distance between bars formed in the pixel area, and The transparent pixel electrode is flat, and Compared with the second strip, one end of the transparent pixel electrode is closer to the first strip and disposed between the first strip and the second strip, or one end of the transparent pixel electrode is disposed between The central portion between the first and second bars. 2. The fringe field switching mode liquid crystal display according to claim 1, wherein the width of the first strip of the transparent common electrode covering the data row is larger than the width of the second strip of the adjacent transparent common electrode . 3. The fringe field switching mode liquid crystal display according to claim 1, wherein the transparent pixel electrode is disposed on the same layer as the data row. 4. The fringe field switching mode liquid crystal display of claim 1, wherein the transparent pixel electrode and the data row are provided with an insulating layer interposed therebetween. 5. The fringe field switching mode liquid crystal display of claim 1, wherein a non-light-transmitting region having a minimum light transmittance lower than 10% based on the data line is included in a width of the data line. 6. The fringe field switching mode liquid crystal display of claim 5, wherein a non-light-transmitting region having a minimum light transmittance lower than 7% based on the data line is included in a width of the data line. 7. The fringe field switching mode liquid crystal display according to claim 1, wherein the transparent common electrodes of each of the pixel regions are connected to each other, and the same voltage is applied to the transparent common electrodes. 8. A fringe field switching mode liquid crystal display, which includes a lower substrate, an upper substrate and a liquid crystal layer sandwiched between the substrates, each pixel area is defined by a gate row and a data row, and the gate row and data row rows are formed to cross each other on the lower substrate, and switching devices are distributed at the intersections of the gate rows and data rows, Wherein, the fringe field switching mode liquid crystal display includes a transparent pixel electrode and a transparent common electrode in the pixel region, and the transparent common electrode is connected to the transparent pixel electrode and the transparent common electrode through an insulating layer sandwiched between the transparent pixel electrode and the transparent common electrode. The pixel electrodes are set separately, so that the light transmittance can be adjusted by applying an electric field to the liquid crystal layer, The transparent common electrode has a predetermined width in a direction parallel to the data row and has a plurality of stripes, wherein a first stripe covering the data row and a first stripe with the first stripe are formed in the pixel region. the second adjacent bar, and The electric field formed in the area including the data row has a smaller vertical electric field component than the electric field formed in the central area of the pixel area, The transparent pixel electrode is flat, and Compared with the second strip, one end of the transparent pixel electrode is closer to the first strip and disposed between the first strip and the second strip, or one end of the transparent pixel electrode is disposed between the central part between the first and second clauses, 9. The fringe field switching mode liquid crystal display of claim 8, wherein a non-light-transmitting region having a minimum light transmittance lower than 10% based on the data line is included in a width of the data line. 10. A fringe field switching mode liquid crystal display, which includes a lower substrate, an upper substrate and a liquid crystal layer sandwiched between the substrates, each pixel area is defined by a gate row and a data row, and the gate row and data row rows are formed to cross each other on the lower substrate, and switching devices are distributed at the intersections of the gate rows and data rows, Wherein, the fringe field switching mode liquid crystal display includes a transparent pixel electrode and a transparent common electrode in the pixel area, and the transparent common electrode is sandwiched between the transparent pixel electrode and the transparent common electrode by insulating layer is set separately from the transparent pixel electrode, and the gate row and data row are formed in the non-opening area, so that the light transmittance can be adjusted by applying an electric field to the liquid crystal layer, and Above or below the transparent common electrode in the non-opening area, a metal row with a specific thickness is arranged to be electrically connected to the transparent common electrode, The transparent pixel electrode is flat, and The transparent common electrode has a first strip completely covering the data row in the pixel area, and a second strip adjacent to the first strip, Compared with the second strip, one end of the transparent pixel electrode is closer to the first strip and disposed between the first strip and the second strip, or one end of the transparent pixel electrode is disposed between The central portion between the first and second bars. 11. The fringe field switching mode liquid crystal display according to claim 10, wherein the metal row is formed of a low-impedance metal material, and the metal material includes copper (Cu), aluminum (Al), aluminum neodymium (AlNd ), molybdenum (Mo), titanium (Ti) and molybdenum tungsten (MoW) or at least one of their alloys.

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