CN101303532B - Six-degree-of-freedom precision positioning table with switchable stations - Google Patents
Six-degree-of-freedom precision positioning table with switchable stations Download PDFInfo
- Publication number
- CN101303532B CN101303532B CN 200810038759 CN200810038759A CN101303532B CN 101303532 B CN101303532 B CN 101303532B CN 200810038759 CN200810038759 CN 200810038759 CN 200810038759 A CN200810038759 A CN 200810038759A CN 101303532 B CN101303532 B CN 101303532B
- Authority
- CN
- China
- Prior art keywords
- precision positioning
- air supporting
- supporting plate
- positioning platform
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
- Details Of Measuring And Other Instruments (AREA)
Abstract
本发明公开了一种可切换工位的六自由度精密定位台,所述精密定位台包括吸版台、气浮板、水平向微调机构、底座和垂向调节机构,所述吸版台通过一工位切换机构安装在气浮板的上方,用于承载掩模版,所述水平向微调机构和气浮板连接,用于驱动气浮板在水平方向上移动,所述气浮板下方连接底座,所述垂向调节机构安装在所述底座下方。本发明的精密定位台具有工位切换功能、水平向微调功能和垂向调节功能,可实现六自由度精密调节和定位,并可满足更多工作位置的要求。
The invention discloses a six-degree-of-freedom precision positioning table with switchable stations. The precision positioning table includes a plate suction table, an air floating plate, a horizontal fine-tuning mechanism, a base and a vertical adjustment mechanism. The plate suction table passes through A station switching mechanism is installed on the top of the air floating plate to carry the reticle. The horizontal fine-tuning mechanism is connected to the air floating plate to drive the air floating plate to move in the horizontal direction. The bottom of the air floating plate is connected to the base , the vertical adjustment mechanism is installed under the base. The precision positioning table of the present invention has the function of station switching, horizontal fine-tuning and vertical adjustment, can realize six-degree-of-freedom precise adjustment and positioning, and can meet the requirements of more working positions.
Description
Claims (12)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200810038759 CN101303532B (en) | 2008-06-10 | 2008-06-10 | Six-degree-of-freedom precision positioning table with switchable stations |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200810038759 CN101303532B (en) | 2008-06-10 | 2008-06-10 | Six-degree-of-freedom precision positioning table with switchable stations |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101303532A CN101303532A (en) | 2008-11-12 |
| CN101303532B true CN101303532B (en) | 2010-06-09 |
Family
ID=40113492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200810038759 Active CN101303532B (en) | 2008-06-10 | 2008-06-10 | Six-degree-of-freedom precision positioning table with switchable stations |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101303532B (en) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102109766B (en) * | 2009-12-25 | 2012-12-12 | 上海微电子装备有限公司 | Decoupling mechanism and exposure machine using same |
| CN102377289B (en) * | 2010-08-17 | 2013-05-22 | 上海微电子装备有限公司 | Lateral locking device |
| CN102678748B (en) | 2011-03-07 | 2014-07-16 | 上海微电子装备有限公司 | Split type air foot |
| CN102678749B (en) * | 2011-03-15 | 2014-08-20 | 上海微电子装备有限公司 | Air floatation structure of separated type air foot |
| CN103212799B (en) * | 2012-01-19 | 2016-04-27 | 昆山思拓机器有限公司 | A kind of two-dimension moving platform device being applicable to thin-wall pipes Laser Micro-Machining |
| CN103376664B (en) * | 2012-04-20 | 2016-02-03 | 上海微电子装备有限公司 | A kind of mask platform with Switch of working position function |
| CN104062854B (en) * | 2013-03-21 | 2016-08-03 | 上海微电子装备有限公司 | Leveling and focusing device for lithographic equipment |
| CN104570614B (en) * | 2013-10-25 | 2017-06-06 | 上海微电子装备有限公司 | Can Switch of working position precision positioning platform |
| CN104749895B (en) * | 2013-12-30 | 2018-03-02 | 上海微电子装备(集团)股份有限公司 | A kind of double air supporting large substrate transmitting devices |
| CN104359648B (en) * | 2014-10-17 | 2017-07-11 | 北京航天益森风洞工程技术有限公司 | Hypersonic wind tunnel Three Degree Of Freedom attack angle mechanism |
| CN106814551B (en) * | 2015-11-30 | 2019-04-12 | 上海微电子装备(集团)股份有限公司 | A kind of substrate delivery/reception device and handover method |
| CN107093768B (en) * | 2017-04-14 | 2019-04-09 | 鹤壁市诺信电子有限公司 | A kind of secondary positioning trimming device of laminating machine |
| CN109725497A (en) * | 2017-10-31 | 2019-05-07 | 上海微电子装备(集团)股份有限公司 | Move table transferring mechanism, sports platform system and lithographic equipment |
| CN109015546B (en) * | 2018-10-16 | 2024-03-01 | 天津中精微仪器设备有限公司 | Air-floatation four-dimensional adjusting table |
| DE102018220565A1 (en) * | 2018-11-29 | 2020-06-04 | Carl Zeiss Smt Gmbh | Projection exposure system for semiconductor lithography with a semi-active spacer and method for using the semi-active spacer |
| CN109491201B (en) * | 2018-12-26 | 2024-01-19 | 仪晟科学仪器(嘉兴)有限公司 | High-precision two-dimensional movement mechanism for mask |
| CN111722475B (en) * | 2019-03-22 | 2021-11-23 | 上海微电子装备(集团)股份有限公司 | Adjusting component and fine adjustment device |
| CN112756996A (en) * | 2020-12-29 | 2021-05-07 | 中国科学院长春光学精密机械与物理研究所 | Six-degree-of-freedom adjusting device |
| CN116093014B (en) * | 2023-03-20 | 2023-07-07 | 快克智能装备股份有限公司 | Working platform, presintering device and presintering method |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6603531B1 (en) * | 2000-11-16 | 2003-08-05 | Nikon Corporation | Stage assembly including a reaction assembly that is connected by actuators |
| CN1200321C (en) * | 2003-08-29 | 2005-05-04 | 清华大学 | Step-by-step projection photo-etching machine double set shifting exposure ultra-sophisticated positioning silicon chip bench system |
| CN1662821A (en) * | 2002-08-07 | 2005-08-31 | 东京毅力科创株式会社 | Placing table drive device and probe method |
| CN1866494A (en) * | 2006-06-12 | 2006-11-22 | 上海微电子装备有限公司 | High precision silicon slice bench and uses thereof |
| CN101075098A (en) * | 2007-04-27 | 2007-11-21 | 清华大学 | Ultrathin triple-freedom inching work table |
| CN101162367A (en) * | 2006-10-11 | 2008-04-16 | 优志旺电机株式会社 | Stage device |
-
2008
- 2008-06-10 CN CN 200810038759 patent/CN101303532B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6603531B1 (en) * | 2000-11-16 | 2003-08-05 | Nikon Corporation | Stage assembly including a reaction assembly that is connected by actuators |
| CN1662821A (en) * | 2002-08-07 | 2005-08-31 | 东京毅力科创株式会社 | Placing table drive device and probe method |
| CN1200321C (en) * | 2003-08-29 | 2005-05-04 | 清华大学 | Step-by-step projection photo-etching machine double set shifting exposure ultra-sophisticated positioning silicon chip bench system |
| CN1866494A (en) * | 2006-06-12 | 2006-11-22 | 上海微电子装备有限公司 | High precision silicon slice bench and uses thereof |
| CN101162367A (en) * | 2006-10-11 | 2008-04-16 | 优志旺电机株式会社 | Stage device |
| CN101075098A (en) * | 2007-04-27 | 2007-11-21 | 清华大学 | Ultrathin triple-freedom inching work table |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101303532A (en) | 2008-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101303532B (en) | Six-degree-of-freedom precision positioning table with switchable stations | |
| CN100573340C (en) | Two-freedom degree electric machine actuating mechanism and corresponding 6-freedom micro-motion platform | |
| CN101727019B (en) | Double-platform exchange system for silicon chip platform of lithography machine and exchange method thereof | |
| CN101571676B (en) | A dual-stage exchange system for silicon wafer stages of a lithography machine | |
| CN101551599B (en) | Double-stage switching system of photoetching machine wafer stage | |
| WO2015165336A1 (en) | Integrated coarse and fine moving mask table driven by planar motor | |
| CN205972897U (en) | Material moves and carries locating platform | |
| WO2024088126A1 (en) | Guide rotating mechanism for sliding plate | |
| CN202716355U (en) | Combined vibrating table used for component forming | |
| CN101791898B (en) | Solar cell printing screen frame aligning and adjusting device | |
| CN101718959A (en) | Method and system for exchanging two silicon wafer stages of photoetching machine | |
| KR20180095930A (en) | Moving platform devices, exposure devices and lithography machines | |
| CN102393609B (en) | Girder-type single/double guide rail double-drive step-scanning double-workpiece exchange device and method | |
| CN108663797B (en) | A slit-type iris diaphragm based on air-float guide | |
| CN102419517B (en) | Exchange apparatus and method for double-workpiece stage based on double-guide rail double-drive step scanning | |
| CN109327126A (en) | A linear motion device based on parallel moving magnets | |
| CN102455601B (en) | Four-degree-of-freedom precision positioning device | |
| CN101408732A (en) | Embedded type common basal plane two-dimension balance double-drive double-workpiece platform positioning system | |
| CN218560277U (en) | Automatic plate feeding machine | |
| CN201181388Y (en) | Double-swapping device for silicon wafer stage of lithography machine with conveyor belt structure | |
| CN102830591B (en) | Photo-etching machine silicon wafer stage driving apparatus | |
| CN210428092U (en) | Alignment installation system of mask plate of double-sided exposure machine | |
| CN111681490B (en) | Real operation panel of instructing of integrated form mechatronic | |
| CN102495529A (en) | Lintel type dual-guide rail dual-drive stepping scanning double silicon wafer stage exchanging device and method thereof | |
| CN116238255B (en) | Air conditioner panel universal fixture and printing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Co-patentee after: Shanghai Nanpre Mechanics Co.,Ltd. Patentee after: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd. Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Co-patentee before: Shanghai Nanpre Mechanics Co.,Ltd. Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20250807 Address after: 3 / F, building 19, building 8, No. 498, GuoShouJing Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai, 201203 Patentee after: Shanghai Xinshang Microelectronics Technology Co.,Ltd. Country or region after: China Patentee after: Shanghai Nanpre Mechanics Co.,Ltd. Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd. Country or region before: China Patentee before: Shanghai Nanpre Mechanics Co.,Ltd. |