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CN101425523A - CMOS sensor package assembly and method of manufacturing the same - Google Patents

CMOS sensor package assembly and method of manufacturing the same Download PDF

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CN101425523A
CN101425523A CN 200710164375 CN200710164375A CN101425523A CN 101425523 A CN101425523 A CN 101425523A CN 200710164375 CN200710164375 CN 200710164375 CN 200710164375 A CN200710164375 A CN 200710164375A CN 101425523 A CN101425523 A CN 101425523A
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metal layer
oxide semiconductor
carrier
electrical connection
patterned metal
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叶秀慧
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector

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Abstract

The invention provides a packaging structure of a complementary metal oxide semiconductor sensing chip, which comprises: a carrier plate having an upper surface and a lower surface, the upper surface of the carrier plate being provided with a patterned metal layer; a CMOS sensing chip, wherein the active surface of the CMOS sensing chip is provided with a plurality of CMOS sensing components and a plurality of bonding pads arranged near the periphery of the active surface, and each bonding pad is electrically connected with part of the patterned metal layer; a plurality of electrical connection components arranged on part of the patterned metal layer and forming electrical connection; the sealing colloid covers the upper surface of the carrier plate, the electrical connection assembly and the complementary metal oxide semiconductor sensing device; and a plurality of conductive elements formed on the connecting elements. The novel CMOS sensor packaging process and the structure thereof can effectively reduce the packaging time and effectively improve the reliability of the CMOS sensor.

Description

互补式金属氧化物半导体传感器封装组件及其制造方法 Complementary metal oxide semiconductor sensor package assembly and manufacturing method thereof

技术领域 technical field

本发明主要涉及一种半导体封装组件,尤其涉及一种互补式金属氧化物半导体传感器封装组件及其制造方法。The present invention mainly relates to a semiconductor packaging component, in particular to a complementary metal oxide semiconductor sensor packaging component and a manufacturing method thereof.

背景技术 Background technique

半导体技术发展非常快速,特别是半导体芯片(semiconductordice)有趋于小型化的倾向。然而,半导体芯片的功能需求却有相对多样化的倾向。换言之,半导体芯片在一较小区域中需求更多的输入/输出盘(pads),所以引脚(pins)的密度也随之快速提高。其导致半导体芯片之封装变得更困难且降低成品率。封装结构的主要目的在于保护芯片免受外部损伤。然而,大部份封装技术是先将一晶圆上的芯片切割成多个单一芯片,然后再封装与测试每一颗单一芯片。另外,一种称为“晶圆级封装”(wafer level package;WLP)的封装技术,可以在分割芯片成为单一芯片之前,在一晶圆上封装芯片。晶圆级封装技术有一些优点,例如生产周期较短、成本较低以及不需要填充物(under-fill)。The development of semiconductor technology is very fast, especially the trend of miniaturization of semiconductor chips. However, the functional requirements of semiconductor chips tend to be relatively diversified. In other words, semiconductor chips require more I/O pads in a smaller area, so the density of pins also increases rapidly. This makes packaging of semiconductor chips more difficult and reduces yield. The main purpose of the packaging structure is to protect the chip from external damage. However, most of the packaging technologies first cut the chips on a wafer into multiple single chips, and then package and test each single chip. In addition, a packaging technology called "wafer level package" (wafer level package; WLP) can package chips on a wafer before dividing the chip into a single chip. Wafer-level packaging technology has some advantages, such as shorter production cycle, lower cost and no need for under-fill.

一种数字影像技术已广泛运用至影像摄影装置,例如数字相机、影像扫描等,目前的影像摄影装置大都使用互补式金氧半导体传感器(CMOS传感器)作为影像读取的装置。互补式金属氧化物半导体传感器具有一固定于其中的芯片(chip),影像信号通过芯片的感测区域中的多个数组式感测组件传送到数字处理器,用以转换模拟信号成为数字信号。由于互补式金氧半导体传感器的感测区域对于灰尘粒子相当敏感,会导致感测组件的质量下降。为了达到上述目的,一般是在芯片的感测区域的多个感测组件上再形成一透明材质,特别是一种玻璃,用以保护感测组件,并且还可以增加聚焦的功能。A digital imaging technology has been widely applied to imaging devices, such as digital cameras, image scanning devices, etc. Most current imaging devices use complementary metal oxide semiconductor sensors (CMOS sensors) as image reading devices. The CMOS sensor has a chip fixed therein, and the image signal is transmitted to a digital processor through a plurality of array sensing elements in the sensing area of the chip for converting the analog signal into a digital signal. Since the sensing region of the CMOS sensor is quite sensitive to dust particles, the quality of the sensing component will be degraded. In order to achieve the above purpose, a transparent material, especially a glass, is formed on the multiple sensing elements in the sensing area of the chip to protect the sensing elements and increase the focusing function.

接着,请参考图1,为先前技术所披露的一种以晶圆级封装来形成一CMOS传感器的封装结构,其封装结构是将一CMOS传感器固接于绝缘基板100之上,在CMOS传感器的感测区域上形成一微型透镜140数组,然后再在微型透镜140数组上形成另一保护层150。Next, please refer to FIG. 1 , which is a packaging structure of a CMOS sensor disclosed in the prior art with wafer-level packaging. The packaging structure is that a CMOS sensor is fixed on an insulating substrate 100, and the An array of microlenses 140 is formed on the sensing area, and then another protection layer 150 is formed on the array of microlenses 140 .

很明显地,在先前技术中,对CMOS传感器的封装工艺较为复杂且必须逐层来完成,除了增加工艺的时间外,还有可能在制造过程中,使得CMOS传感器的感测区域受到污染。为此,本发明提出一种新的CMOS传感器封装工艺及其结构,可以有效减少封装的时间并可有效地提升CMOS传感器的可靠度。Obviously, in the prior art, the packaging process of the CMOS sensor is relatively complicated and must be completed layer by layer. In addition to increasing the process time, the sensing area of the CMOS sensor may be polluted during the manufacturing process. Therefore, the present invention proposes a new CMOS sensor packaging process and its structure, which can effectively reduce the packaging time and effectively improve the reliability of the CMOS sensor.

发明内容 Contents of the invention

鉴于以上的问题,本发明的主要目的在于提供一种互补式金属氧化物半导体传感器封装组件,藉以减少制造时间以节省制造成本。In view of the above problems, the main purpose of the present invention is to provide a CMOS sensor package assembly, so as to reduce the manufacturing time and save the manufacturing cost.

本发明的另一主要目的在于提供一种互补式金属氧化物半导体传感器封装组件,藉以增加组件的可靠度。Another main objective of the present invention is to provide a CMOS sensor package assembly, thereby increasing the reliability of the assembly.

根据以上目的,本发明提供一种互补式金属氧化物半导体感测芯片的封装结构,包括:一个具有一上表面及一下表面的载板,载板的上表面配置有图案化的金属层;一个互补式金属氧化物半导体感测芯片,其主动面上配置有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在主动面的外围附近上,且每一焊盘与部份的图案化金属层电性连接;多个电性连接组件,设置在部份图案化金属层之上并形成电性连接;封胶体,包覆载板的上表面、电性连接组件及互补式金属氧化物半导体感测装置;及多个导电组件,形成在这些连接组件之上。According to the above purpose, the present invention provides a package structure of a complementary metal oxide semiconductor sensing chip, comprising: a carrier plate having an upper surface and a lower surface, the upper surface of the carrier plate is provided with a patterned metal layer; a Complementary metal oxide semiconductor sensing chip, its active surface is equipped with a plurality of complementary metal oxide semiconductor sensing components and has a plurality of pads arranged near the periphery of the active surface, and each pad is connected to a part The patterned metal layer is electrically connected; a plurality of electrical connection components are arranged on part of the patterned metal layer and form an electrical connection; the encapsulant covers the upper surface of the carrier board, the electrical connection components and the complementary a metal oxide semiconductor sensing device; and a plurality of conductive elements formed on the connection elements.

本发明还披露一种互补式金属氧化物半导体感测芯片的封装方法,包含:提供一具有一上表面及一下表面的载板;形成多个相同图案化的金属层在载板的上表面上;接着电性连接多个互补式金属氧化物半导体感测芯片至多个图案化金属层,其中互补式金属氧化物半导体感测芯片的主动面上具有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在主动面之外围附近上,通过焊盘电性连接于部份图案化金属层之上;电性连接多个电性连接组件于部份图案化之金属层之上;然后执行一注模步骤,以包覆载板的上表面、电性连接组件及这些互补式金属氧化物半导体感测芯片;接着暴露出电性连接组件的一端点;形成多个导电组件在每一已暴露的电性连接组件的端点上;及执行一切割步骤,以形成多个完成封装的互补式金属氧化物半导体感测装置。The present invention also discloses a packaging method for a complementary metal oxide semiconductor sensor chip, including: providing a carrier board with an upper surface and a lower surface; forming a plurality of identically patterned metal layers on the upper surface of the carrier board ; then electrically connect a plurality of complementary metal oxide semiconductor sensing chips to a plurality of patterned metal layers, wherein the active surface of the complementary metal oxide semiconductor sensing chip has a plurality of complementary metal oxide semiconductor sensing elements and A plurality of pads are arranged near the periphery of the active surface, and are electrically connected to the part of the patterned metal layer through the pads; electrically connected to a plurality of electrical connection components on the part of the patterned metal layer; Then perform an injection molding step to cover the upper surface of the carrier board, the electrical connection components and the CMOS sensing chips; then expose an end of the electrical connection components; form a plurality of conductive components in each an exposed terminal of the electrical connection element; and performing a cutting step to form a plurality of packaged CMOS sensing devices.

有关本发明的特征,现配合图示作最佳实施例详细说明如下。(为使对本发明的目的、构造、特征、及其功能有进一步的了解,现配合实施例详细说明如下。)Relevant features of the present invention are described in detail below as the best embodiment in conjunction with the drawings. (In order to have a further understanding of the object, structure, feature, and function of the present invention, now cooperate with embodiment to describe in detail as follows.)

附图说明 Description of drawings

图1为现有的封装组件的剖面示意图;FIG. 1 is a schematic cross-sectional view of an existing package assembly;

图2为根据本发明在载板上形成多个图案化金属层的示意图;2 is a schematic diagram of forming a plurality of patterned metal layers on a carrier according to the present invention;

图3为根据本发明在多个图案化金属层上贴附多个互补式金属氧化物半导体传感器芯片的剖面示意图;3 is a schematic cross-sectional view of a plurality of CMOS sensor chips attached to a plurality of patterned metal layers according to the present invention;

图4为根据本发明在图3的结构上形成多个电性连接组件的剖面示意图;4 is a schematic cross-sectional view of forming a plurality of electrical connection components on the structure of FIG. 3 according to the present invention;

图5为根据本发明执行一注模工序、用封胶体来包覆图4的结构的剖面示意图;5 is a schematic cross-sectional view of performing an injection molding process according to the present invention to cover the structure of FIG. 4 with an encapsulant;

图6为根据本发明在图5的结构中,在多个电性连接组件上形成多个导电组件的剖面示意图;及6 is a schematic cross-sectional view of a plurality of conductive components formed on a plurality of electrical connection components in the structure of FIG. 5 according to the present invention; and

图7为根据本发明所披露的另一封装结构的剖示图。FIG. 7 is a cross-sectional view of another package structure disclosed in the present invention.

具体实施方式 Detailed ways

本发明披露一种互补式金氧半导体感测芯片的封装结构及其制造方法,因此,本发明是针对已完成制造并且也已切割的互补式金氧半导体感测芯片进行封装。然而,为便于说明,本发明对互补式金属氧化物半导体感测芯片的定义为一主动面上具有多个成数组式排列的感测组件以及位于感测组件周围有多个焊盘。图2至图8为分别说明本发明所披露的互补式金氧半导体感测芯片的封装结构剖示图以及制造步骤流程图。The present invention discloses a package structure of a complementary metal oxide semiconductor sensing chip and a manufacturing method thereof. Therefore, the present invention is aimed at packaging the manufactured and cut complementary metal oxide semiconductor sensing chip. However, for ease of description, the CMOS sensing chip in the present invention is defined as having a plurality of sensing elements arranged in an array on an active surface and a plurality of bonding pads around the sensing elements. 2 to 8 are schematic cross-sectional views illustrating the packaging structure of the complementary metal-oxide-semiconductor sensing chip disclosed in the present invention and a flow chart of manufacturing steps, respectively.

请参阅图2,是表示将多个图案化的金属层形成在载板上的剖面示意图。首先,提供具有一上表面及一下表面的载板(carriersubstrate)10,在本发明的具体实施例中,载板10为一种透明材料,其可以是玻璃或是光学级的玻璃。如图2所示,多个图案化的金属层12形成在载板10的方式包括:先将一金属层形成在载板10上;然后涂布一光阻层于金属层之上并经过一图案化的光罩曝光及显影后,在金属层上形成一具有图案化的光阻层(未在图中表示);接着执行一蚀刻步骤,以移除部份的金属层;接着,移除具有图案化的光阻层,藉此在载板10上形成多个相同图案化的金属层12。Please refer to FIG. 2 , which is a schematic cross-sectional view showing forming a plurality of patterned metal layers on a carrier. Firstly, a carrier substrate 10 having an upper surface and a lower surface is provided. In a specific embodiment of the present invention, the carrier substrate 10 is a transparent material, which may be glass or optical grade glass. As shown in FIG. 2 , the method of forming a plurality of patterned metal layers 12 on the carrier 10 includes: first forming a metal layer on the carrier 10; then coating a photoresist layer on the metal layer and passing through a After the patterned photomask is exposed and developed, a patterned photoresist layer (not shown) is formed on the metal layer; then an etching step is performed to remove part of the metal layer; There is a patterned photoresist layer, thereby forming a plurality of identically patterned metal layers 12 on the carrier 10 .

此外,上述将多个图案化的金属层12形成在载板10的方式也可以包括:先将光阻层涂布在载板10上,然后经过一图案化的光罩曝光及显影后,在光阻层上形成图案化的凹槽或是沟渠,再将金属材料填入凹槽或是沟渠中,最后再将光阻移除后,即可在载板10上形成图案化的金属层12。在本发明中,上述金属材料的形成方式可以是蒸镀(evaporating process)或是溅镀(sputtering process),而在一较佳实施例中,是使用电镀(plating)方式来形成。In addition, the above-mentioned method of forming a plurality of patterned metal layers 12 on the carrier 10 may also include: first coating the photoresist layer on the carrier 10, then exposing and developing a patterned photomask, and then Patterned grooves or trenches are formed on the photoresist layer, and metal materials are filled into the grooves or trenches, and finally the photoresist is removed to form a patterned metal layer 12 on the carrier 10 . In the present invention, the above-mentioned metal material can be formed by evaporating process or sputtering process, and in a preferred embodiment, it is formed by plating.

此外,载板10上的虚线101为切割道(sawing street),在此要强调,此虚线101其可以是已形成在载板10之上,同时其也可以是不存在的线,对此本发明并不加以限制,其目的是在组件完成封装之后对载板10进行切割的基准线,以形成多个单一封装组件。In addition, the dotted line 101 on the carrier board 10 is a cutting road (sawing street). It should be emphasized here that the dotted line 101 can be formed on the carrier board 10, and it can also be a line that does not exist. The invention is not limited, and its purpose is to be a reference line for cutting the carrier board 10 after the components are packaged, so as to form a plurality of single packaged components.

接着,请参阅图3,是表示将多个互补式金属氧化物半导体感测芯片(CMOS chip,Complementary Metal-Oxide Semiconductorchip)20贴附在多个图案化的金属层12上的剖面示意图,其中互补式金属氧化物半导体感测芯片20的主动面202上具有多个成数组排列的感测组件(未显示于图中)以及位于感测组件周围的多个焊盘(pad)2022。如图3所示,以倒装技术(flip chip technology)的方式,将每一个互补式金属氧化物半导体感测芯片20上的多个焊盘2022的朝向图案化的金属层12的上表面,并将多个焊盘2022与图案化的金属层12的部份上表面电性连接,藉此倒装技术使得每一个互补式金属氧化物半导体感测芯片20上的多个成数组排列的感测组件透过透明载板10而进行感测。在此,可以利用导电胶(未在图中表示),例如:锡膏,将多个焊盘2022与图案化的金属层12的部份上表面电性连接。Next, please refer to FIG. 3 , which is a schematic cross-sectional view showing a plurality of complementary metal-oxide-semiconductor sensing chips (CMOS chip, Complementary Metal-Oxide Semiconductorchip) 20 attached to a plurality of patterned metal layers 12, wherein complementary The active surface 202 of the type metal oxide semiconductor sensing chip 20 has a plurality of sensing elements (not shown in the figure) arranged in groups and a plurality of pads 2022 around the sensing elements. As shown in FIG. 3 , in the manner of flip chip technology, the upper surface of the plurality of pads 2022 on each complementary metal oxide semiconductor sensing chip 20 facing the patterned metal layer 12, And a plurality of bonding pads 2022 are electrically connected to part of the upper surface of the patterned metal layer 12, so that the flip-chip technology makes a plurality of sensor arrays arranged in groups on each complementary metal oxide semiconductor sensor chip 20 The sensing component performs sensing through the transparent carrier 10 . Here, conductive glue (not shown in the figure), such as solder paste, can be used to electrically connect the plurality of pads 2022 to a part of the upper surface of the patterned metal layer 12 .

接着,请参阅图4,是表示在图3的结构上形成多个电性连接组件的剖面示意图。如图4所示,多个电性连接组件(connectingelement)30形成在暴露的部份图案化金属层12的上表面,且邻近于每一个互补式金属氧化物半导体感测芯片20,其中每一个电性连接组件30的高度均等,且高于互补式金属氧化物半导体感测芯片20的厚度;在本实施例中,此多个电性连接组件30为一种具有金手指的结构,是通过绝缘材料(例如塑料)或是陶瓷材料(ceramic)来包覆多条与图案化金属层12相应的金属线302所形成;接着,再将电性连接组件30经由导电胶(未在图中表示),例如锡膏(paste)与载板10上的图案化的金属层12电性连接。Next, please refer to FIG. 4 , which is a schematic cross-sectional view showing a plurality of electrical connection components formed on the structure in FIG. 3 . As shown in FIG. 4 , a plurality of electrical connecting elements (connecting elements) 30 are formed on the upper surface of the exposed part of the patterned metal layer 12, and adjacent to each CMOS sensing chip 20, each of which The heights of the electrical connection components 30 are uniform and higher than the thickness of the CMOS sensor chip 20; insulating material (such as plastic) or ceramic material (ceramic) to cover a plurality of metal lines 302 corresponding to the patterned metal layer 12; ), such as solder paste (paste), is electrically connected to the patterned metal layer 12 on the carrier 10 .

在上述的图2及图3的制造过程中,均使用导电胶材料来作为电性连接材料,因此在制造上,可以选择将导电胶材料涂布在图案化的金属层12上;当然,其也可以分别涂布在互补式金属氧化物半导体感测芯片20的焊盘202上以及电性连接组件30的端点上,对此本发明并不加以限制。In the manufacturing process of above-mentioned Fig. 2 and Fig. 3, all use conductive glue material as electrical connection material, so in manufacturing, can choose to coat conductive glue material on the patterned metal layer 12; Certainly, its It can also be coated on the bonding pad 202 of the CMOS sensing chip 20 and the terminal of the electrical connection component 30 respectively, and the present invention is not limited thereto.

接下来,如图5所示,是表示一封胶体40包覆图4中的结构的剖示图。将多个电性连接组件30电性连接至图案化金属层12上之后,随即进行注模工序(molding process),以形成一封胶体40来包覆住互补式金属氧化物半导体感测芯片20、多个电性连接组件30及图案化金属层12。然后,移除部份的封胶体40以暴露出电性连接组件30,例如当电性连接组件30为一金手指结构时,移除部份的封胶体40以暴露出金属线302的端点。另外,也可以选择在进行注模工序之前,先利用保护层(未在图中表示),例如胶带,以覆盖住电性连接组件30,例如金属线302之端点,然后将模流注入至与电性连接组件30同样高度之后,再进行脱胶以暴露出多个电性连接组件30。而在本发明的具体实施例中,其封胶体40的材料包括环氧化物(epoxy)或是胶体(colloid)。Next, as shown in FIG. 5 , it is a cross-sectional view showing the encapsulant 40 covering the structure in FIG. 4 . After the plurality of electrical connection components 30 are electrically connected to the patterned metal layer 12, the injection molding process (molding process) is performed immediately to form a colloid 40 to cover the CMOS sensing chip 20. , a plurality of electrical connection components 30 and the patterned metal layer 12 . Then, part of the encapsulant 40 is removed to expose the electrical connection element 30 , for example, when the electrical connection element 30 is a gold finger structure, part of the encapsulant 40 is removed to expose the terminal of the metal wire 302 . In addition, it is also possible to choose to use a protective layer (not shown in the figure), such as adhesive tape, to cover the electrical connection component 30 before the injection molding process, such as the terminal of the metal wire 302, and then inject the mold flow into the After the electrical connection components 30 have the same height, debonding is performed to expose a plurality of electrical connection components 30 . In a specific embodiment of the present invention, the material of the encapsulant 40 includes epoxy or colloid.

接着,请继续参阅图6,是表示在电性连接组件30(例如金属线302)上形成多个导电组件的示意图。在此具体实施例中,是利用封装技术中的现有技术,例如植球,在每一个暴露的电性连接组件30的上方形成多个导电组件50,以将此导电组件50作为对封装体之外的电性连接点。在此要强调,导电组件30可以是锡球(solderball),其也可以是金属凸块(solder bump)。Next, please continue to refer to FIG. 6 , which is a schematic diagram showing a plurality of conductive components formed on the electrical connection component 30 (such as the metal wire 302 ). In this specific embodiment, a plurality of conductive components 50 are formed on the top of each exposed electrical connection component 30 by using the existing technology in packaging technology, such as ball planting, so that the conductive components 50 serve as a package body other electrical connections. It should be emphasized here that the conductive component 30 may be a solder ball, or it may be a metal bump.

另外,本发明还披露另一具体实施例,如图7所示。在本实施例中,在将多个互补式金属氧化物半导体感测芯片20与载板10上的多个图案化金属层12完成电性连接之后,即先进行注模工序,以形成一封胶体40来包覆多个互补式金属氧化物半导体感测芯片20及部份图案化的金属层12。紧接着,在完成对准工序(alignmentprocess)之后,利用蚀刻步骤,例如干式蚀刻或是反应性离子蚀刻(RIE),将部份图案化金属层12上的封胶体40移除,以形成多个孔洞并暴出部份图案化露出的金属层12;接着,再利用电镀的方式,将导电材料填满孔洞,以形成多个电性连接组件30,再接着,将多个导电组件50形成在多个电性连接组件30上之后,即可完成互补式金属氧化物半导体感测芯片20的封装操作步骤。同样地,在此本实施例中的导电组件30可以是锡球(solder ball)也可以是金属凸块(solder bump)。In addition, the present invention also discloses another specific embodiment, as shown in FIG. 7 . In this embodiment, after the plurality of CMOS sensing chips 20 are electrically connected to the plurality of patterned metal layers 12 on the carrier 10, the injection molding process is first performed to form a package. The colloid 40 is used to cover a plurality of CMOS sensing chips 20 and a part of the patterned metal layer 12 . Next, after the alignment process is completed, an etching step, such as dry etching or reactive ion etching (RIE), is used to remove part of the encapsulant 40 on the patterned metal layer 12 to form multiple layers. A hole is formed and a part of the metal layer 12 exposed by patterning is exposed; then, the hole is filled with conductive material by electroplating to form a plurality of electrical connection components 30, and then a plurality of conductive components 50 are formed. After the multiple electrical connection components 30 are made, the packaging operation steps of the CMOS sensing chip 20 can be completed. Likewise, the conductive component 30 in this embodiment may be a solder ball or a metal bump.

在完成上述的图6及图7的步骤后,再进行芯片切割工序(diesawing),并依照切割道101的位置来切割载板10,以形成多个完成封装的互补式金属氧化物半导体感测装置。很明显地,由本发明所披露的过程中可知,在载板10上形成多个图案化金属层12的工序与完成互补式金属氧化物半导体感测芯片20的工序可以分别实施,因此可以有效地缩短封装的时间;此外,在本发明所披露的过程可知,每一个互补式金属氧化物半导体感测芯片20的5个面(除了主动面与透明载板10连接外)都被封胶体40所包覆,因此可以提高互补式金属氧化物半导体感测芯片20的可靠度。After the above-mentioned steps in FIG. 6 and FIG. 7 are completed, the chip dicing process (diesawing) is performed, and the carrier 10 is cut according to the position of the dicing line 101 to form a plurality of packaged CMOS sensors. device. Obviously, it can be seen from the process disclosed in the present invention that the process of forming a plurality of patterned metal layers 12 on the carrier 10 and the process of completing the complementary metal oxide semiconductor sensing chip 20 can be implemented separately, so it can be effectively Shorten the packaging time; in addition, in the process disclosed in the present invention, it can be known that the 5 faces of each complementary metal oxide semiconductor sensor chip 20 (except the active face connected to the transparent carrier 10) are covered by the encapsulant 40 Therefore, the reliability of the CMOS sensing chip 20 can be improved.

当互补式金属氧化物半导体感测芯片20完成封装以形成互补式金属氧化物半导体感测装置之后,其可通过互补式金属氧化物半导体感测装置上的多个导电组件50与电路板(未显示于图中)完成电性连接,并通过电路板与其它的控制装置电性连接,以便驱动本发明的互补式金属氧化物半导体感测装置进行影像的读取。特别是当本发明的互补式金属氧化物半导体感测装置与可挠性软板(flexible circuit)连接后,其可以应用于各种可携式的数字影像装置中,例如数字相机、个人数字助理装置(PDA)、具有照相功能的通讯装置(例如移动电话)等等,以增加互补式金属氧化物半导体传感器封装组件的应用性。After the complementary metal oxide semiconductor sensing chip 20 is packaged to form a complementary metal oxide semiconductor sensing device, it can pass through a plurality of conductive components 50 and a circuit board (not shown) on the complementary metal oxide semiconductor sensing device. (shown in the figure) is electrically connected, and is electrically connected with other control devices through the circuit board, so as to drive the CMOS sensing device of the present invention to read images. Especially when the CMOS sensing device of the present invention is connected with a flexible circuit, it can be applied to various portable digital imaging devices, such as digital cameras and personal digital assistants. Devices (PDA), communication devices with camera function (such as mobile phones), etc., to increase the applicability of CMOS sensor package components.

虽然本发明以前述较佳实施例披露如上,然而其并非用以限定本发明,本领域普通技术人员在不脱离本发明之精神和范围内,应当可作多种更动与润饰,因此本发明的专利保护范围须以权利要求书的限定为准。Although the present invention is disclosed above with the foregoing preferred embodiments, it is not intended to limit the present invention. Those skilled in the art should be able to make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of patent protection shall be subject to the limitations of the claims.

主要组件符号说明Explanation of main component symbols

10    载板                  101     切割道10 carrier board 101 cutting lane

102   感测区域              12      金属层102 sensing area 12 metal layer

20    互补式金属氧化物半导体感测芯片(CMOS chip)20 Complementary metal oxide semiconductor sensor chip (CMOS chip)

202   主动面                2022    焊盘202 active surface 2022 pad

30    电性连接组件          302     金属线30 Electrical connection components 302 Metal wires

40    封胶体                50      导电组件40 Sealant 50 Conductive components

Claims (10)

1.一种互补式金属氧化物半导体感测芯片的封装结构,包括:1. A packaging structure for a complementary metal oxide semiconductor sensing chip, comprising: 载板,具有上表面及下表面;a carrier plate having an upper surface and a lower surface; 图案化的金属层,设置于所述载板的所述上表面之上,且暴露出所述金属层;a patterned metal layer disposed on the upper surface of the carrier and exposing the metal layer; 互补式金属氧化物半导体感测芯片,其主动面上配置有复多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在所述主动面的外围附近上,这些焊盘电性连接于部份所述图案化金属层之上;The complementary metal oxide semiconductor sensing chip has a plurality of complementary metal oxide semiconductor sensing components configured on its active surface and has a plurality of pads arranged near the periphery of the active surface, and these pads are electrically connected connected to a portion of the patterned metal layer; 多个电性连接组件,设置在部份所述图案化金属层之上并形成电性连接;A plurality of electrical connection components are arranged on part of the patterned metal layer and form electrical connections; 封胶体,包覆所述载板的所述上表面、这些电性连接组件及所述互补式金属氧化物半导体感测装置;及an encapsulant covering the upper surface of the carrier, the electrical connection components and the CMOS sensing device; and 多个导电组件,形成在这些连接组件之上。A plurality of conductive components are formed on the connection components. 2.根据权利要求1所述的封装结构,其中这些电性连接组件为一种金手指结构。2. The package structure according to claim 1, wherein the electrical connection components are a golden finger structure. 3.一种互补式金属氧化物半导体感测芯片的封装方法,包含:3. A packaging method for a complementary metal oxide semiconductor sensing chip, comprising: 提供具有上表面及下表面的载板;providing a carrier plate having an upper surface and a lower surface; 形成多个相同图案化的金属层在所述载板的所述上表面上,包含:forming a plurality of identically patterned metal layers on the upper surface of the carrier, comprising: 形成金属层在所述载板上;forming a metal layer on the carrier; 形成具有多个相同图案化的光阻层在所述金属层上;forming a plurality of identically patterned photoresist layers on the metal layer; 移除部份所述金属层以形成所述图案化金属层,且暴露出部份所述载板的所述上表面;及removing part of the metal layer to form the patterned metal layer, and exposing part of the upper surface of the carrier; and 移除所述具有这些图案化的光阻层;removing said photoresist layer having these patterns; 电性连接多个互补式金属氧化物半导体感测芯片至所述多个图案化金属层,其中所述互补式金属氧化物半导体感测芯片的主动面上具有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在所述主动面的外围附近上,通过这些焊盘电性连接于部份所述图案化金属层之上;Electrically connecting a plurality of complementary metal oxide semiconductor sensing chips to the plurality of patterned metal layers, wherein the active surface of the complementary metal oxide semiconductor sensing chip has a plurality of complementary metal oxide semiconductor sensing chips The test component has a plurality of pads disposed near the periphery of the active surface, and is electrically connected to part of the patterned metal layer through these pads; 电性连接多个电性连接组件于部份所述图案化金属层之上;electrically connecting a plurality of electrical connection components on a portion of the patterned metal layer; 执行一注模步骤,以包覆所述载板的上表面、这些电性连接组件及这些互补式金属氧化物半导体感测芯片;performing an injection molding step to cover the upper surface of the carrier board, the electrical connection components and the CMOS sensing chips; 暴露出这些电性连接组件的端点;exposing the terminals of these electrically connected components; 形成多个导电组件在每一这些已暴露的电性连接组件的端点上;及forming a plurality of conductive elements at the terminals of each of the exposed electrical connection elements; and 执行切割步骤,以形成多个完成封装的互补式金属氧化物半导体感测装置。A cutting step is performed to form a plurality of packaged CMOS sensing devices. 4.根据权利要求3所述的封装方法,其中这些电性连接组件为一种金手指结构。4. The packaging method according to claim 3, wherein the electrical connection components are a golden finger structure. 5.一种互补式金属氧化物半导体感测芯片的封装方法,包含:提供具有上表面及下表面的载板;5. A packaging method for a complementary metal oxide semiconductor sensing chip, comprising: providing a carrier plate with an upper surface and a lower surface; 形成多个相同图案化的金属层在所述载板的所述上表面上;forming a plurality of identically patterned metal layers on the upper surface of the carrier; 电性连接多个互补式金属氧化物半导体感测芯片至所述多个图案化金属层,其中所述互补式金属氧化物半导体感测芯片的主动面上具有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在所述主动面的外围附近上,通过这些焊盘电性连接于部份所述图案化金属层之上;Electrically connecting a plurality of complementary metal oxide semiconductor sensing chips to the plurality of patterned metal layers, wherein the active surface of the complementary metal oxide semiconductor sensing chip has a plurality of complementary metal oxide semiconductor sensing chips The test component has a plurality of pads disposed near the periphery of the active surface, and is electrically connected to part of the patterned metal layer through these pads; 注入模流,以形成封胶体来包覆所述载板的所述上表面及所述互补式金属氧化物半导体感测芯片;Injecting mold flow to form an encapsulant to cover the upper surface of the carrier plate and the CMOS sensing chip; 形成多个孔洞以暴露出部份所述图案化金属层;forming a plurality of holes to expose part of the patterned metal layer; 填满这些孔洞以形成多个电性连接组件;filling the holes to form a plurality of electrical connection components; 形成多个导电组件在这些电性连接组件之上;及forming a plurality of conductive components over the electrically connected components; and 执行切割步骤,以形成多个完成封装的互补式金属氧化物半导体感测装置。A cutting step is performed to form a plurality of packaged CMOS sensing devices. 6.根据权利要求5所述的封装方法,其中形成这些图案化金属层的方法包含:6. The packaging method according to claim 5, wherein the method of forming the patterned metal layers comprises: 形成金属层在所述载板上;forming a metal layer on the carrier; 形成具有多个相同图案化的光阻层在所述金属层上;forming a plurality of identically patterned photoresist layers on the metal layer; 移除部份所述金属层以形成这些相同图案化金属层,且暴露出部份所述载板的所述上表面;及removing a portion of the metal layer to form these same patterned metal layers and exposing a portion of the upper surface of the carrier; and 移除具有所述些图案化之光阻层。removing the patterned photoresist layer. 7.根据权利要求5所述的封装方法,其中形成这些孔洞是以蚀刻方式形成。7. The packaging method according to claim 5, wherein the holes are formed by etching. 8.一种互补式金属氧化物半导体感测装置的封装方法,包含:8. A packaging method for a complementary metal oxide semiconductor sensing device, comprising: 提供具有上表面及下表面的载板;providing a carrier plate having an upper surface and a lower surface; 形成多个相同图案化的金属层在所述载板的所述上表面上,其中形成这些相同图案化金属层的方法包含:forming a plurality of identically patterned metal layers on the upper surface of the carrier, wherein the method of forming these identically patterned metal layers comprises: 形成金属层在所述载板上;forming a metal layer on the carrier; 形成具有图案化的光阻层在所述金属层上;forming a patterned photoresist layer on the metal layer; 移除部份所述金属层以形成所述图案化金属层,且暴露出部份所述载板的所述上表面;及removing part of the metal layer to form the patterned metal layer, and exposing part of the upper surface of the carrier; and 移除所述具有图案化光阻层;removing the patterned photoresist layer; 电性连接多个互补式金属氧化物半导体感测芯片至所述多个图案化的金属层,其中所述互补式金属氧化物半导体感测芯片的主动面上具有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在所述主动面的外围附近上,通过这些焊盘电性连接于部份所述图案化金属层之上;Electrically connecting a plurality of CMOS sensing chips to the plurality of patterned metal layers, wherein the active surface of the CMOS sensing chip has a plurality of CMOS sensing chips The sensing component has a plurality of pads disposed near the periphery of the active surface, and is electrically connected to part of the patterned metal layer through these pads; 电性连接多个电性连接组件于部份所述图案化金属层之上;electrically connecting a plurality of electrical connection components on a portion of the patterned metal layer; 在所述多个电性连接组件的相对于所述图案化金属层的另一端上形成隔离层;forming an isolation layer on the other end of the plurality of electrical connection components relative to the patterned metal layer; 执行注模步骤,以包覆所述载板的上表面、这些电性连接组件及这些互补式金属氧化物半导体感测装置;performing an injection molding step to cover the upper surface of the carrier board, the electrical connection components and the CMOS sensing devices; 剥离所述隔离层以暴露出所述多个电性连接组件的相对于所述图案化金属层的金属端;peeling off the isolation layer to expose metal ends of the plurality of electrical connection components relative to the patterned metal layer; 在每一这些电性连接组件的所述暴露的金属端上形成多个导电组件;及forming a plurality of conductive elements on said exposed metal end of each of these electrically connected elements; and 执行切割步骤,以形成多个完成封装的互补式金属氧化物半导体感测装置。A cutting step is performed to form a plurality of packaged CMOS sensing devices. 9.一种影像读取装置,是将完成封装的互补式金属氧化物半导体感测装置电性连接至可挠性电路板所组成,其中所述互补式金属氧化物半导体感测装置的特征在于,包括:9. An image reading device, which is formed by electrically connecting a packaged complementary metal oxide semiconductor sensing device to a flexible circuit board, wherein the complementary metal oxide semiconductor sensing device is characterized in that ,include: 载板,具有上表面及下表面;a carrier plate having an upper surface and a lower surface; 图案化的金属层,设置于所述载板所述上表面之上,且暴露出所述金属层;a patterned metal layer disposed on the upper surface of the carrier and exposing the metal layer; 互补式金属氧化物半导体感测芯片,其主动面上配置有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在所述主动面的外围附近上,这些焊盘电性连接于部份所述图案化金属层之上;The complementary metal oxide semiconductor sensing chip has a plurality of complementary metal oxide semiconductor sensing components configured on its active surface and has a plurality of pads arranged near the periphery of the active surface, and these pads are electrically connected on a portion of the patterned metal layer; 多个电性连接组件,设置在部份所述图案化金属层之上并形成电性连接;A plurality of electrical connection components are arranged on part of the patterned metal layer and form electrical connections; 封胶体,包覆所述载板的所述上表面、这些电性连接组件及所述互补式金属氧化物半导体感测装置;及an encapsulant covering the upper surface of the carrier, the electrical connection components and the CMOS sensing device; and 多个导电组件,形成在所述些连接组件之上并与所述可挠性电路板电性连接。A plurality of conductive components are formed on the connection components and electrically connected with the flexible circuit board. 10.一种具有互补式金属氧化物半导体感测装置的数字装置,所述数字装置选自于数字照相机、移动电话及个人数字助理所组成的群组,其中所述互补式金属氧化物半导体感测装置的特征在于:包括10. A digital device having a complementary metal oxide semiconductor sensing device selected from the group consisting of a digital camera, a mobile phone, and a personal digital assistant, wherein the complementary metal oxide semiconductor sensing device The measuring device is characterized in that it includes 载板,具有上表面及下表面;a carrier plate having an upper surface and a lower surface; 图案化的金属层,设置于所述载板的所述上表面之上,且暴露出所述金属层;a patterned metal layer disposed on the upper surface of the carrier and exposing the metal layer; 互补式金属氧化物半导体感测装置,其主动面上配置有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在所述主动面的外围附近上,所述些焊盘电性连接于部份所述图案化金属层之上;The complementary metal oxide semiconductor sensing device has a plurality of complementary metal oxide semiconductor sensing elements configured on its active surface and has a plurality of pads arranged near the periphery of the active surface, and the pads are electrically connected Sexually connected to a portion of the patterned metal layer; 多个电性连接组件,设置在部份所述图案化金属层之上并形成电性连接;A plurality of electrical connection components are arranged on part of the patterned metal layer and form electrical connections; 封胶体,包覆所述载板的所述上表面、这些电性连接组件及所述互补式金属氧化物半导体感测装置;及an encapsulant covering the upper surface of the carrier, the electrical connection components and the CMOS sensing device; and 多个导电组件,形成在所述些连接组件之上。A plurality of conductive components are formed on the connection components.
CN 200710164375 2007-10-30 2007-10-30 CMOS sensor package assembly and method of manufacturing the same Pending CN101425523A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105304667A (en) * 2015-11-02 2016-02-03 武汉新芯集成电路制造有限公司 Method for preparing backside-illuminated sensor
CN105390516A (en) * 2015-10-28 2016-03-09 武汉新芯集成电路制造有限公司 Back-illuminated image sensor and preparation method thereof
WO2018196630A1 (en) * 2017-04-28 2018-11-01 苏州迈瑞微电子有限公司 Sensor package structure manufacturing method and sensor package structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105390516A (en) * 2015-10-28 2016-03-09 武汉新芯集成电路制造有限公司 Back-illuminated image sensor and preparation method thereof
CN105304667A (en) * 2015-11-02 2016-02-03 武汉新芯集成电路制造有限公司 Method for preparing backside-illuminated sensor
WO2018196630A1 (en) * 2017-04-28 2018-11-01 苏州迈瑞微电子有限公司 Sensor package structure manufacturing method and sensor package structure

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