CN101425523A - CMOS sensor package assembly and method of manufacturing the same - Google Patents
CMOS sensor package assembly and method of manufacturing the same Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明主要涉及一种半导体封装组件,尤其涉及一种互补式金属氧化物半导体传感器封装组件及其制造方法。The present invention mainly relates to a semiconductor packaging component, in particular to a complementary metal oxide semiconductor sensor packaging component and a manufacturing method thereof.
背景技术 Background technique
半导体技术发展非常快速,特别是半导体芯片(semiconductordice)有趋于小型化的倾向。然而,半导体芯片的功能需求却有相对多样化的倾向。换言之,半导体芯片在一较小区域中需求更多的输入/输出盘(pads),所以引脚(pins)的密度也随之快速提高。其导致半导体芯片之封装变得更困难且降低成品率。封装结构的主要目的在于保护芯片免受外部损伤。然而,大部份封装技术是先将一晶圆上的芯片切割成多个单一芯片,然后再封装与测试每一颗单一芯片。另外,一种称为“晶圆级封装”(wafer level package;WLP)的封装技术,可以在分割芯片成为单一芯片之前,在一晶圆上封装芯片。晶圆级封装技术有一些优点,例如生产周期较短、成本较低以及不需要填充物(under-fill)。The development of semiconductor technology is very fast, especially the trend of miniaturization of semiconductor chips. However, the functional requirements of semiconductor chips tend to be relatively diversified. In other words, semiconductor chips require more I/O pads in a smaller area, so the density of pins also increases rapidly. This makes packaging of semiconductor chips more difficult and reduces yield. The main purpose of the packaging structure is to protect the chip from external damage. However, most of the packaging technologies first cut the chips on a wafer into multiple single chips, and then package and test each single chip. In addition, a packaging technology called "wafer level package" (wafer level package; WLP) can package chips on a wafer before dividing the chip into a single chip. Wafer-level packaging technology has some advantages, such as shorter production cycle, lower cost and no need for under-fill.
一种数字影像技术已广泛运用至影像摄影装置,例如数字相机、影像扫描等,目前的影像摄影装置大都使用互补式金氧半导体传感器(CMOS传感器)作为影像读取的装置。互补式金属氧化物半导体传感器具有一固定于其中的芯片(chip),影像信号通过芯片的感测区域中的多个数组式感测组件传送到数字处理器,用以转换模拟信号成为数字信号。由于互补式金氧半导体传感器的感测区域对于灰尘粒子相当敏感,会导致感测组件的质量下降。为了达到上述目的,一般是在芯片的感测区域的多个感测组件上再形成一透明材质,特别是一种玻璃,用以保护感测组件,并且还可以增加聚焦的功能。A digital imaging technology has been widely applied to imaging devices, such as digital cameras, image scanning devices, etc. Most current imaging devices use complementary metal oxide semiconductor sensors (CMOS sensors) as image reading devices. The CMOS sensor has a chip fixed therein, and the image signal is transmitted to a digital processor through a plurality of array sensing elements in the sensing area of the chip for converting the analog signal into a digital signal. Since the sensing region of the CMOS sensor is quite sensitive to dust particles, the quality of the sensing component will be degraded. In order to achieve the above purpose, a transparent material, especially a glass, is formed on the multiple sensing elements in the sensing area of the chip to protect the sensing elements and increase the focusing function.
接着,请参考图1,为先前技术所披露的一种以晶圆级封装来形成一CMOS传感器的封装结构,其封装结构是将一CMOS传感器固接于绝缘基板100之上,在CMOS传感器的感测区域上形成一微型透镜140数组,然后再在微型透镜140数组上形成另一保护层150。Next, please refer to FIG. 1 , which is a packaging structure of a CMOS sensor disclosed in the prior art with wafer-level packaging. The packaging structure is that a CMOS sensor is fixed on an insulating substrate 100, and the An array of microlenses 140 is formed on the sensing area, and then another protection layer 150 is formed on the array of microlenses 140 .
很明显地,在先前技术中,对CMOS传感器的封装工艺较为复杂且必须逐层来完成,除了增加工艺的时间外,还有可能在制造过程中,使得CMOS传感器的感测区域受到污染。为此,本发明提出一种新的CMOS传感器封装工艺及其结构,可以有效减少封装的时间并可有效地提升CMOS传感器的可靠度。Obviously, in the prior art, the packaging process of the CMOS sensor is relatively complicated and must be completed layer by layer. In addition to increasing the process time, the sensing area of the CMOS sensor may be polluted during the manufacturing process. Therefore, the present invention proposes a new CMOS sensor packaging process and its structure, which can effectively reduce the packaging time and effectively improve the reliability of the CMOS sensor.
发明内容 Contents of the invention
鉴于以上的问题,本发明的主要目的在于提供一种互补式金属氧化物半导体传感器封装组件,藉以减少制造时间以节省制造成本。In view of the above problems, the main purpose of the present invention is to provide a CMOS sensor package assembly, so as to reduce the manufacturing time and save the manufacturing cost.
本发明的另一主要目的在于提供一种互补式金属氧化物半导体传感器封装组件,藉以增加组件的可靠度。Another main objective of the present invention is to provide a CMOS sensor package assembly, thereby increasing the reliability of the assembly.
根据以上目的,本发明提供一种互补式金属氧化物半导体感测芯片的封装结构,包括:一个具有一上表面及一下表面的载板,载板的上表面配置有图案化的金属层;一个互补式金属氧化物半导体感测芯片,其主动面上配置有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在主动面的外围附近上,且每一焊盘与部份的图案化金属层电性连接;多个电性连接组件,设置在部份图案化金属层之上并形成电性连接;封胶体,包覆载板的上表面、电性连接组件及互补式金属氧化物半导体感测装置;及多个导电组件,形成在这些连接组件之上。According to the above purpose, the present invention provides a package structure of a complementary metal oxide semiconductor sensing chip, comprising: a carrier plate having an upper surface and a lower surface, the upper surface of the carrier plate is provided with a patterned metal layer; a Complementary metal oxide semiconductor sensing chip, its active surface is equipped with a plurality of complementary metal oxide semiconductor sensing components and has a plurality of pads arranged near the periphery of the active surface, and each pad is connected to a part The patterned metal layer is electrically connected; a plurality of electrical connection components are arranged on part of the patterned metal layer and form an electrical connection; the encapsulant covers the upper surface of the carrier board, the electrical connection components and the complementary a metal oxide semiconductor sensing device; and a plurality of conductive elements formed on the connection elements.
本发明还披露一种互补式金属氧化物半导体感测芯片的封装方法,包含:提供一具有一上表面及一下表面的载板;形成多个相同图案化的金属层在载板的上表面上;接着电性连接多个互补式金属氧化物半导体感测芯片至多个图案化金属层,其中互补式金属氧化物半导体感测芯片的主动面上具有多个互补式金属氧化物半导体感测组件且具有多个焊盘设置在主动面之外围附近上,通过焊盘电性连接于部份图案化金属层之上;电性连接多个电性连接组件于部份图案化之金属层之上;然后执行一注模步骤,以包覆载板的上表面、电性连接组件及这些互补式金属氧化物半导体感测芯片;接着暴露出电性连接组件的一端点;形成多个导电组件在每一已暴露的电性连接组件的端点上;及执行一切割步骤,以形成多个完成封装的互补式金属氧化物半导体感测装置。The present invention also discloses a packaging method for a complementary metal oxide semiconductor sensor chip, including: providing a carrier board with an upper surface and a lower surface; forming a plurality of identically patterned metal layers on the upper surface of the carrier board ; then electrically connect a plurality of complementary metal oxide semiconductor sensing chips to a plurality of patterned metal layers, wherein the active surface of the complementary metal oxide semiconductor sensing chip has a plurality of complementary metal oxide semiconductor sensing elements and A plurality of pads are arranged near the periphery of the active surface, and are electrically connected to the part of the patterned metal layer through the pads; electrically connected to a plurality of electrical connection components on the part of the patterned metal layer; Then perform an injection molding step to cover the upper surface of the carrier board, the electrical connection components and the CMOS sensing chips; then expose an end of the electrical connection components; form a plurality of conductive components in each an exposed terminal of the electrical connection element; and performing a cutting step to form a plurality of packaged CMOS sensing devices.
有关本发明的特征,现配合图示作最佳实施例详细说明如下。(为使对本发明的目的、构造、特征、及其功能有进一步的了解,现配合实施例详细说明如下。)Relevant features of the present invention are described in detail below as the best embodiment in conjunction with the drawings. (In order to have a further understanding of the object, structure, feature, and function of the present invention, now cooperate with embodiment to describe in detail as follows.)
附图说明 Description of drawings
图1为现有的封装组件的剖面示意图;FIG. 1 is a schematic cross-sectional view of an existing package assembly;
图2为根据本发明在载板上形成多个图案化金属层的示意图;2 is a schematic diagram of forming a plurality of patterned metal layers on a carrier according to the present invention;
图3为根据本发明在多个图案化金属层上贴附多个互补式金属氧化物半导体传感器芯片的剖面示意图;3 is a schematic cross-sectional view of a plurality of CMOS sensor chips attached to a plurality of patterned metal layers according to the present invention;
图4为根据本发明在图3的结构上形成多个电性连接组件的剖面示意图;4 is a schematic cross-sectional view of forming a plurality of electrical connection components on the structure of FIG. 3 according to the present invention;
图5为根据本发明执行一注模工序、用封胶体来包覆图4的结构的剖面示意图;5 is a schematic cross-sectional view of performing an injection molding process according to the present invention to cover the structure of FIG. 4 with an encapsulant;
图6为根据本发明在图5的结构中,在多个电性连接组件上形成多个导电组件的剖面示意图;及6 is a schematic cross-sectional view of a plurality of conductive components formed on a plurality of electrical connection components in the structure of FIG. 5 according to the present invention; and
图7为根据本发明所披露的另一封装结构的剖示图。FIG. 7 is a cross-sectional view of another package structure disclosed in the present invention.
具体实施方式 Detailed ways
本发明披露一种互补式金氧半导体感测芯片的封装结构及其制造方法,因此,本发明是针对已完成制造并且也已切割的互补式金氧半导体感测芯片进行封装。然而,为便于说明,本发明对互补式金属氧化物半导体感测芯片的定义为一主动面上具有多个成数组式排列的感测组件以及位于感测组件周围有多个焊盘。图2至图8为分别说明本发明所披露的互补式金氧半导体感测芯片的封装结构剖示图以及制造步骤流程图。The present invention discloses a package structure of a complementary metal oxide semiconductor sensing chip and a manufacturing method thereof. Therefore, the present invention is aimed at packaging the manufactured and cut complementary metal oxide semiconductor sensing chip. However, for ease of description, the CMOS sensing chip in the present invention is defined as having a plurality of sensing elements arranged in an array on an active surface and a plurality of bonding pads around the sensing elements. 2 to 8 are schematic cross-sectional views illustrating the packaging structure of the complementary metal-oxide-semiconductor sensing chip disclosed in the present invention and a flow chart of manufacturing steps, respectively.
请参阅图2,是表示将多个图案化的金属层形成在载板上的剖面示意图。首先,提供具有一上表面及一下表面的载板(carriersubstrate)10,在本发明的具体实施例中,载板10为一种透明材料,其可以是玻璃或是光学级的玻璃。如图2所示,多个图案化的金属层12形成在载板10的方式包括:先将一金属层形成在载板10上;然后涂布一光阻层于金属层之上并经过一图案化的光罩曝光及显影后,在金属层上形成一具有图案化的光阻层(未在图中表示);接着执行一蚀刻步骤,以移除部份的金属层;接着,移除具有图案化的光阻层,藉此在载板10上形成多个相同图案化的金属层12。Please refer to FIG. 2 , which is a schematic cross-sectional view showing forming a plurality of patterned metal layers on a carrier. Firstly, a
此外,上述将多个图案化的金属层12形成在载板10的方式也可以包括:先将光阻层涂布在载板10上,然后经过一图案化的光罩曝光及显影后,在光阻层上形成图案化的凹槽或是沟渠,再将金属材料填入凹槽或是沟渠中,最后再将光阻移除后,即可在载板10上形成图案化的金属层12。在本发明中,上述金属材料的形成方式可以是蒸镀(evaporating process)或是溅镀(sputtering process),而在一较佳实施例中,是使用电镀(plating)方式来形成。In addition, the above-mentioned method of forming a plurality of patterned
此外,载板10上的虚线101为切割道(sawing street),在此要强调,此虚线101其可以是已形成在载板10之上,同时其也可以是不存在的线,对此本发明并不加以限制,其目的是在组件完成封装之后对载板10进行切割的基准线,以形成多个单一封装组件。In addition, the
接着,请参阅图3,是表示将多个互补式金属氧化物半导体感测芯片(CMOS chip,Complementary Metal-Oxide Semiconductorchip)20贴附在多个图案化的金属层12上的剖面示意图,其中互补式金属氧化物半导体感测芯片20的主动面202上具有多个成数组排列的感测组件(未显示于图中)以及位于感测组件周围的多个焊盘(pad)2022。如图3所示,以倒装技术(flip chip technology)的方式,将每一个互补式金属氧化物半导体感测芯片20上的多个焊盘2022的朝向图案化的金属层12的上表面,并将多个焊盘2022与图案化的金属层12的部份上表面电性连接,藉此倒装技术使得每一个互补式金属氧化物半导体感测芯片20上的多个成数组排列的感测组件透过透明载板10而进行感测。在此,可以利用导电胶(未在图中表示),例如:锡膏,将多个焊盘2022与图案化的金属层12的部份上表面电性连接。Next, please refer to FIG. 3 , which is a schematic cross-sectional view showing a plurality of complementary metal-oxide-semiconductor sensing chips (CMOS chip, Complementary Metal-Oxide Semiconductorchip) 20 attached to a plurality of patterned
接着,请参阅图4,是表示在图3的结构上形成多个电性连接组件的剖面示意图。如图4所示,多个电性连接组件(connectingelement)30形成在暴露的部份图案化金属层12的上表面,且邻近于每一个互补式金属氧化物半导体感测芯片20,其中每一个电性连接组件30的高度均等,且高于互补式金属氧化物半导体感测芯片20的厚度;在本实施例中,此多个电性连接组件30为一种具有金手指的结构,是通过绝缘材料(例如塑料)或是陶瓷材料(ceramic)来包覆多条与图案化金属层12相应的金属线302所形成;接着,再将电性连接组件30经由导电胶(未在图中表示),例如锡膏(paste)与载板10上的图案化的金属层12电性连接。Next, please refer to FIG. 4 , which is a schematic cross-sectional view showing a plurality of electrical connection components formed on the structure in FIG. 3 . As shown in FIG. 4 , a plurality of electrical connecting elements (connecting elements) 30 are formed on the upper surface of the exposed part of the patterned
在上述的图2及图3的制造过程中,均使用导电胶材料来作为电性连接材料,因此在制造上,可以选择将导电胶材料涂布在图案化的金属层12上;当然,其也可以分别涂布在互补式金属氧化物半导体感测芯片20的焊盘202上以及电性连接组件30的端点上,对此本发明并不加以限制。In the manufacturing process of above-mentioned Fig. 2 and Fig. 3, all use conductive glue material as electrical connection material, so in manufacturing, can choose to coat conductive glue material on the
接下来,如图5所示,是表示一封胶体40包覆图4中的结构的剖示图。将多个电性连接组件30电性连接至图案化金属层12上之后,随即进行注模工序(molding process),以形成一封胶体40来包覆住互补式金属氧化物半导体感测芯片20、多个电性连接组件30及图案化金属层12。然后,移除部份的封胶体40以暴露出电性连接组件30,例如当电性连接组件30为一金手指结构时,移除部份的封胶体40以暴露出金属线302的端点。另外,也可以选择在进行注模工序之前,先利用保护层(未在图中表示),例如胶带,以覆盖住电性连接组件30,例如金属线302之端点,然后将模流注入至与电性连接组件30同样高度之后,再进行脱胶以暴露出多个电性连接组件30。而在本发明的具体实施例中,其封胶体40的材料包括环氧化物(epoxy)或是胶体(colloid)。Next, as shown in FIG. 5 , it is a cross-sectional view showing the encapsulant 40 covering the structure in FIG. 4 . After the plurality of
接着,请继续参阅图6,是表示在电性连接组件30(例如金属线302)上形成多个导电组件的示意图。在此具体实施例中,是利用封装技术中的现有技术,例如植球,在每一个暴露的电性连接组件30的上方形成多个导电组件50,以将此导电组件50作为对封装体之外的电性连接点。在此要强调,导电组件30可以是锡球(solderball),其也可以是金属凸块(solder bump)。Next, please continue to refer to FIG. 6 , which is a schematic diagram showing a plurality of conductive components formed on the electrical connection component 30 (such as the metal wire 302 ). In this specific embodiment, a plurality of
另外,本发明还披露另一具体实施例,如图7所示。在本实施例中,在将多个互补式金属氧化物半导体感测芯片20与载板10上的多个图案化金属层12完成电性连接之后,即先进行注模工序,以形成一封胶体40来包覆多个互补式金属氧化物半导体感测芯片20及部份图案化的金属层12。紧接着,在完成对准工序(alignmentprocess)之后,利用蚀刻步骤,例如干式蚀刻或是反应性离子蚀刻(RIE),将部份图案化金属层12上的封胶体40移除,以形成多个孔洞并暴出部份图案化露出的金属层12;接着,再利用电镀的方式,将导电材料填满孔洞,以形成多个电性连接组件30,再接着,将多个导电组件50形成在多个电性连接组件30上之后,即可完成互补式金属氧化物半导体感测芯片20的封装操作步骤。同样地,在此本实施例中的导电组件30可以是锡球(solder ball)也可以是金属凸块(solder bump)。In addition, the present invention also discloses another specific embodiment, as shown in FIG. 7 . In this embodiment, after the plurality of
在完成上述的图6及图7的步骤后,再进行芯片切割工序(diesawing),并依照切割道101的位置来切割载板10,以形成多个完成封装的互补式金属氧化物半导体感测装置。很明显地,由本发明所披露的过程中可知,在载板10上形成多个图案化金属层12的工序与完成互补式金属氧化物半导体感测芯片20的工序可以分别实施,因此可以有效地缩短封装的时间;此外,在本发明所披露的过程可知,每一个互补式金属氧化物半导体感测芯片20的5个面(除了主动面与透明载板10连接外)都被封胶体40所包覆,因此可以提高互补式金属氧化物半导体感测芯片20的可靠度。After the above-mentioned steps in FIG. 6 and FIG. 7 are completed, the chip dicing process (diesawing) is performed, and the
当互补式金属氧化物半导体感测芯片20完成封装以形成互补式金属氧化物半导体感测装置之后,其可通过互补式金属氧化物半导体感测装置上的多个导电组件50与电路板(未显示于图中)完成电性连接,并通过电路板与其它的控制装置电性连接,以便驱动本发明的互补式金属氧化物半导体感测装置进行影像的读取。特别是当本发明的互补式金属氧化物半导体感测装置与可挠性软板(flexible circuit)连接后,其可以应用于各种可携式的数字影像装置中,例如数字相机、个人数字助理装置(PDA)、具有照相功能的通讯装置(例如移动电话)等等,以增加互补式金属氧化物半导体传感器封装组件的应用性。After the complementary metal oxide
虽然本发明以前述较佳实施例披露如上,然而其并非用以限定本发明,本领域普通技术人员在不脱离本发明之精神和范围内,应当可作多种更动与润饰,因此本发明的专利保护范围须以权利要求书的限定为准。Although the present invention is disclosed above with the foregoing preferred embodiments, it is not intended to limit the present invention. Those skilled in the art should be able to make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of patent protection shall be subject to the limitations of the claims.
主要组件符号说明Explanation of main component symbols
10 载板 101 切割道10
102 感测区域 12 金属层102
20 互补式金属氧化物半导体感测芯片(CMOS chip)20 Complementary metal oxide semiconductor sensor chip (CMOS chip)
202 主动面 2022 焊盘202
30 电性连接组件 302 金属线30
40 封胶体 50 导电组件40
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105304667A (en) * | 2015-11-02 | 2016-02-03 | 武汉新芯集成电路制造有限公司 | Method for preparing backside-illuminated sensor |
| CN105390516A (en) * | 2015-10-28 | 2016-03-09 | 武汉新芯集成电路制造有限公司 | Back-illuminated image sensor and preparation method thereof |
| WO2018196630A1 (en) * | 2017-04-28 | 2018-11-01 | 苏州迈瑞微电子有限公司 | Sensor package structure manufacturing method and sensor package structure |
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2007
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105390516A (en) * | 2015-10-28 | 2016-03-09 | 武汉新芯集成电路制造有限公司 | Back-illuminated image sensor and preparation method thereof |
| CN105304667A (en) * | 2015-11-02 | 2016-02-03 | 武汉新芯集成电路制造有限公司 | Method for preparing backside-illuminated sensor |
| WO2018196630A1 (en) * | 2017-04-28 | 2018-11-01 | 苏州迈瑞微电子有限公司 | Sensor package structure manufacturing method and sensor package structure |
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