CN101526743A - Maskless exposure device - Google Patents
Maskless exposure device Download PDFInfo
- Publication number
- CN101526743A CN101526743A CN200910007180A CN200910007180A CN101526743A CN 101526743 A CN101526743 A CN 101526743A CN 200910007180 A CN200910007180 A CN 200910007180A CN 200910007180 A CN200910007180 A CN 200910007180A CN 101526743 A CN101526743 A CN 101526743A
- Authority
- CN
- China
- Prior art keywords
- mentioned
- lens
- optical axis
- laser
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- 238000007493 shaping process Methods 0.000 claims abstract description 9
- 230000003287 optical effect Effects 0.000 claims description 74
- 239000000758 substrate Substances 0.000 claims description 20
- 230000014509 gene expression Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 239000011295 pitch Substances 0.000 description 4
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 230000003760 hair shine Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 102220152218 rs143647619 Human genes 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Semiconductor Lasers (AREA)
Abstract
The invention a maskless exposure device which makes the light axis of the emergent light beam from the semiconductor laser device parallel with high efficiency even in the occasion by utilizing a plurality of semiconductor laser devices as light source. A shaping lens adjusting the emergent angle of each laser beam to the expected angle for each arrangement of a plurality of laser light-sources and a beam angle adjusting mechanism which comprises adjusting lenses and an adjusting lens retaining mechanism positioning the adjusting lens in the direction at a right angle with the light axis thereof arrange the beam adjusting mechanism between the laser light-source and a shaft distance switching device to make the light axis of the adjusting lens and the designed light axis of the laser light-source in parallel and move the adjusting lens to the direction at a right angle with the light axis to make the light axis of the laser beam and the designed light axis in parallel.
Description
Technical field
The present invention relates to make laser being exposed convergence scanning on the thing, be exposed the maskless exposure device of drawing figure on the thing.
Background technology
In the past, the occasion that is exposed face exposure (drawing) figure of thing (hereinafter referred to as " substrate ") at the substrate of the TET of printed base plate, LCD substrate and pseudo-colour filtering plate base or plasma scope etc. is the mask of making as the master of figure, by with the mask exposure device expose to the substrate at the graph copying that forms on the mask (drawing).
It is big that the size of substrate becomes in recent years gradually, with respect to this, to the design of substrate with make required time and shorten gradually.In addition, being difficult to make design mistake when the design substrate is zero, and most of occasion need be revised design and make mask once more.In addition, according to the kind of substrate, most occasions are wide in variety, and produced in small quantities is the situation that is difficult to avoid to each substrate manufacture mask on aspect the cost and duration aspect etc.
In view of above-mentioned condition, in recent years to the grow that requires of the maskless exposure that do not use mask.As the method for carrying out maskless exposure, have and use liquid crystal or DMD two-dimensional space modulators such as (Digital Mirror Device) to produce X-Y scheme, with projecting lens it is drawn method (patent documentation 1) on the substrate.
In addition, useful polygon mirror makes the laser scanning of being crossed by EO modulator or AO modulators modulate draw method on the substrate.
The former method can be drawn trickleer figure, but the device price is high.On the other hand, the latter's method is difficult to height and draws large-area graphs subtly, but can draw rough figure in big zone.In addition, the latter's method can be produced because of simple in structure less expensively, but needs the laser instrument of big output power in order to shorten the production cycle, and initial cost and operating cost are higher.To this,, have the technology (patent documentation 2) of a plurality of semiconductor lasers as light source in order to reduce the cost of light source.
Patent documentation 1: the spy opens the 2004-39871 communique
Patent documentation 2: the spy opens the 2006-267719 communique
Summary of the invention
Being the occasion of light source with a plurality of semiconductor lasers, draw quality in order to improve, must make from the optical axis of the light beam of each semiconductor laser outgoing to be parallel to each other, must carry out the positioning operation of light beam effectively.
The purpose of this invention is to provide a kind of maskless exposure device, it also can make from the optical axis of the light beam of each semiconductor laser outgoing parallel in the occasion that with a plurality of semiconductor lasers is light source effectively.
In order to address the above problem, the invention provides a kind of maskless exposure device, have: with predetermined spaced a plurality of LASER Light Source, make the distance between axles converting means that is arranged in certain position relation from above-mentioned LASER Light Source emitting laser light beam, long focus lens, make the polygon mirror of above-mentioned laser beam at the y scanning direction, make the above-mentioned laser beam of scanning converge to f θ lens on the substrate, the objective table that carries aforesaid substrate and move freely in x direction with above-mentioned direction of scanning quadrature, rotation angle and the position of above-mentioned objective table and the control circuit of above-mentioned LASER Light Source according to the above-mentioned polygon mirror of exposure figure information Control, it is characterized in that, to each of above-mentioned a plurality of LASER Light Source be provided with by the shaping lens of the shooting angle of above-mentioned laser beam being adjusted to desirable angle and keep above-mentioned at least one adjust the beam angle adjusting mechanism that lens are formed its maintaining body that moves freely on respect to the rectangular direction of the optical axis of these adjustment lens, above-mentioned beam angle adjusting mechanism is configured in the light shaft coaxle that makes between above-mentioned light source and the above-mentioned distance between axles converting means in the design of the optical axis of above-mentioned adjustment lens and above-mentioned LASER Light Source, and is parallel with the optical axis in the design by the optical axis that above-mentioned adjustment lens is moved in right angle orientation with respect to this optical axis make above-mentioned laser beam.
Effect of the present invention is as follows.
Can make the optical axis of a plurality of light beams parallel effectively.
Description of drawings
Fig. 1 is the whole pie graph of maskless exposure device of the present invention.
Fig. 2 is the key diagram of the light source portion 1 among Fig. 1.
Fig. 3 is the Pareto diagram that shines a plurality of hot spots on the exposure base.
Fig. 4 is the figure of expression from the light path of LD emitting laser light beam.
Fig. 5 is the key diagram (the 1st embodiment) of beam angle adjusting mechanism of the present invention.
Fig. 6 is the key diagram (the 2nd embodiment) of beam angle adjusting mechanism of the present invention.
Fig. 7 is the key diagram (the 3rd embodiment) of beam angle adjusting mechanism of the present invention.
Fig. 8 is the key diagram (the 4th embodiment) of beam angle adjusting mechanism of the present invention.
Fig. 9 is the key diagram of light-beam position adjusting mechanism of the present invention.
Figure 10 is the whole pie graph of other maskless exposure device of the present invention.
Among the figure:
2-beam angle adjusting mechanism, 12-LASER Light Source (LD), the 13-shaping lens, 14-distance between axles converting means, 2011-adjusts lens, and 2012-adjusts lens.
Embodiment
Fig. 1 is the whole pie graph of maskless exposure device of the present invention.In addition, Fig. 2 is the key diagram of the light source portion 1 among Fig. 1, (a) is the front elevation (from the being seen figure of mirror 100 sides, the left side of this figure is a upside in Fig. 1) of light source portion 1, (b) is representational section plan.In addition, Fig. 3 is the Pareto diagram that shines a plurality of hot spots on the exposure base.
The optical system of maskless exposure device 200 comprises: distance between axles converting means 14, catoptron 100, long focus lens 3, cylinder lenses 34, catoptron 4, polygon mirror 5, f θ lens 6, the mirror 62 of turning back, cylinder lenses 61, objective table 7 and the control circuit 9 of the multiple beam arrangement pitches of light source portion 1, beam angle adjusting mechanism 2, a direction of compression.Control circuit 9 control multiple beam generating units 11, polygon mirror 5 and objective table 7.Exposure base 8 is fixed on the objective table 7.
As shown in Figure 2, light source portion 1 comprises support 11, semiconductor laser 12 (hereinafter referred to as " LD ") and the non-spherical lens (shaping lens) 13 that forms with copper material.On support 11, the LD12 that is installed on the shell that external diameter is 5～6mm arranges and amounts to 128 in 16 in x direction (about each 8), 8 in y direction with the spacing of 13mm.Also have, the central shaft of the shell of LD12 is to be parallel to each other and the mode parallel with the optical axis in the design is positioned on the support 11.
Shown in the dotted line among Fig. 2 (a), the LD12 of LD12 and adjacent column departs from 13/8mm and arranges.The LD12 ejaculation is about 22 degree at the halfwidth of the angle of divergence of x direction, is about the laser of 8 degree at the halfwidth of y direction.On the optical axis of the laser beam that penetrates from LD12, each LD12 is disposed non-spherical lens 13.The front side focus of non-spherical lens 13 is positioned the luminous point (supposing to be the position from the pointolite F of the occasion of pointolite outgoing from LD12 emitting laser light beam) of LD12, and making from what LD12 penetrated becomes parallel beam for the laser beam of diverging light.That is, for example, the focal distance f of non-spherical lens 13
AsBe 6mm, the optical axis of the laser beam that penetrates from LD12 and the spigot shaft coaxle of shell, and the occasion of the light shaft coaxle of this optical axis and non-spherical lens 13 incides beam diameter (the intensity e of the laser beam of non-spherical lens 13 as the about 4mm of x direction, the about 1.5mm of y direction
-2Beam diameter) directional light 10A from non-spherical lens 13 outgoing.Also have, occasion that tilts with respect to the central shaft (hereinafter referred to as " optical axis in the design ") of shell from the optical axis of LD12 emitting laser light beam or the parallel occasion of optical axis in the optical axis of LD12 emitting laser light beam and the design all will be narrated in the back to the occasion that the direction vertical with respect to the optical axis in the design is partial to.
Incide on the beam angle adjusting mechanism 2 from non-spherical lens 13 emitting laser light beams.Each LD12 is provided with beam angle adjusting mechanism 2.This occasion because the optical axis of all laser beams is parallel to each other (being parallel to the optical axis in the design), sees through angle-adjusting mechanism 2 without change so incide the laser beam of beam angle adjusting mechanism 2.Also have, to will narrating in the back in detail of angle-adjusting mechanism 2.
The multiple beam of arranging in the xy direction with the spacing of 13mm incides on the distance between axles converting means 14.As shown in Figure 2, distance between axles converting means 14 is that 16 prisms 1401～1408,1411～1418 of parallelogram constitute by the cross section, incides laser beam on the distance between axles converting means 14 as multiple beam 10A outgoing.The multiple beam 10A of outgoing is compressed to about 1mm in the spacing of x direction.The compressed multiple beam 10A of the spacing of x direction is reflected mirror 100 reflections and incides long focus lens 3.
The cylinder lenses 34 of the focal distance f c that is configured in polygon mirror 5 sides of long focus lens 3 makes multiple beam further reduce (that is, the multiple beam that has been compressed in the spacing of x direction by distance between axles converting means 14 further is reduced in the x direction) in the x direction in the spacing of x direction on the polygon mirror reflecting surface.It is f that the multiple beam that is reflected by polygon mirror 5 incides focal length
θ F θ lens 6, and be bent into the right angle by the mirror 62 of being turned back.Is f by the multiple beam of bending by focal length
θ cCylinder lenses 61 (coordinate on the substrate shown in Fig. 1 lower-left has focal power in the x direction) assemble, be radiated on the light-sensitive surface of exposure base 8 by the many hot spots 80 that are spaced apart Py that are spaced apart Px, y direction of the x direction that rearranges shown in Figure 3.
To this, if make polygon mirror 5 along being rotated counterclockwise among Fig. 1, many hot spots then shown in Figure 3 in exposure base 8 upper edges-the y scanning direction.This occasion owing to can enough y directions 8 hot spots arranged side by side be exposed by any place that will draw, is drawn thereby can carry out the high high precision of tediously long degree.
More than desirable occasion (that is, the light shaft coaxle in the optical axis of all laser beams of LD outgoing and the design) is illustrated, but can tilt with respect to the optical axis (central shaft of shell) in the design from the optical axis of LD emitting laser light beam sometimes.
Fig. 4 is the figure of expression from the light path of LD12 emitting laser light beam, (a) light path in the expression design, (b) luminous point of expression LD12 is in (on the focus of front side) on the central shaft of non-spherical lens 13, but the light path of the occasion of inclined light shaft, (c) luminous point of expression LD12 departs from the light path of occasion of the central shaft of non-spherical lens 13.In addition, (d) be the figure of adjustment example of expression (c).
Shown in this Fig. 4 (b), the luminous point F of LD12 is (front side focus) on the central shaft O of non-spherical lens 13, but in the occasion of the inclined light shaft of laser beam, parallel from the optical axis of non-spherical lens 13 emitting laser light beams with the optical axis in the design.(on direction, departing from) perpendicular to the optical axis in this design
In addition, shown in Fig. 4 (c), the luminous point of LD12 departs from the occasion of the central shaft O of non-spherical lens 13, shown in Fig. 4 (d), if the central shaft O of non-spherical lens 13 is moved on perpendicular to the direction of the optical axis in the design, the degree of tilt with respect to the optical axis in the design is reduced.That is, the luminous point of LD12 is from the optical axis deviation Δ 1 of non-spherical lens 13, and light beam is represented with respect to the following formula 1 of degree of tilt Δ θ 1 usefulness of the central shaft parallel with desirable optical axis.Therefore, utilize and to have omitted illustrated mechanism,, just can make Δ θ 1 reduce (during Δ 1=0, Δ θ 1=0) by allowing the optical axis O of non-spherical lens 13 Δ 1 be reduced near the optical axis O of actual laser beam.
Secondly, the allowable value to Δ θ 1 describes.
Now, the optical axis of establishing the laser beam that incides long focus lens 3 is Δ θ x, Δ θ y with respect to the optical axis in the design in the angle of x, y direction.Many hot spots arrangement pitches is different on x, y direction with respect to the multiplying power (imaging multiplying power) that incides long focus lens 3 many hot spots arrangement pitches before on the exposure base.To this, the multiplying power of establishing x, y direction is respectively Mx, My, and fc is the focal length of cylinder lenses 34, f
θ cBe the focal length of cylinder lenses 61, f
θBe the focal length of f θ lens 6, f
LBe the focal length of long focus lens 3, then Mx, My are by formula 2,3 expressions.
Mx=fcf
θ c/ (f
θf
L) (formula 2)
My=f
θf
L(formula 3)
For example, xy spacing Px, the Py of hot spot is about 5 μ m, 20 μ m respectively on the exposure base shown in Figure 3, and the value of Mx and My is about Mx=0.005, My=0.015.The occasion of the lens combination of this multiplying power, the inverse of imaging multiplying power are angle multiplying power M
θ xAnd M
θ yRespectively by formula 4,5 expressions.
M
θ x=1/Mx=200 (formula 4)
M
θ y=1/My=67 (formula 5)
That is, the laser beam that incides long focus lens 3 with respect to the optical axis in the design when x, y direction tilt Δ θ x, Δ θ y respectively, substrate incident angle Δ θ
Ex, Δ θ
EyBy formula 6,7 expressions.
Δ θ
Ex=M
θ xΔ θ x=Δ θ x/Mx=200 Δ θ x (formula 6)
Δ θ
Ey=M
θ yΔ θ y=Δ θ y/My=67 Δ θ y (formula 7)
At this, 0.25 times of the resolution r that draws is allowed in the arrangement of supposing the many hot spots on the exposure base in depth of focus Df, and then formula 8,9 is set up.
0.25r 〉=Df Δ θ
Ex(formula 8)
0.25r 〉=Df Δ θ
Ey(formula 9)
Now, establishing r is 5 μ m, and Df is 300 μ m, then Δ θ x, Δ θ y by (formula 6)～(formula 9) need for
Δ θ x≤2.1 * 10
-5(rad)=4.3 (second)
Δ θ y≤6.2 * 10
-5(rad)=13 (second)
That is, need make the multiple beam that incides long focus lens 3 is mutual about the 5 seconds depth of parallelism.
For by making focal distance f
AsFor the central shaft O of the non-spherical lens 13 of 6mm moves on perpendicular to the direction of the optical axis in the design, make from the optical axis of non-spherical lens 13 emitting laser light beams with respect to the inclination angle Δ θ 1 of the optical axis in the design below 5 seconds, need make Δ 1 below 0.15 μ m.But this fine setting is very difficult under the situation that LD12 closely installs.To this, in the present invention, beam angle adjusting mechanism 2 is set, be adjusted at the optical axis of the light beam of non-spherical lens 13 outgoing by this beam angle adjusting mechanism 2.
Secondly, beam angle adjusting mechanism 2 is described.Also have, non-spherical lens 13 is convex lens.
Fig. 5 is the key diagram of beam angle adjusting mechanism 2 of the present invention.
Illustrated occasion, beam angle adjusting mechanism 2 by focal distance f 21 for the concavees lens 2011 (the 1st adjusts lens) of-100mm, focal distance f 22 for the convex lens 2012 of 110mm (the 2nd adjusts lens), keep convex lens 2012 and made omission that convex lens 2012 can locate on the direction perpendicular to optical axis the maintaining body formation of illustrated convex lens 2012, the focus O of the front side of concavees lens 2011 and convex lens 2012
11Be consistent.In addition, the central shaft R of the central shaft Q of the central shaft P of non-spherical lens 13, concavees lens 2011, convex lens 2012 is consistent with the optical axis in the design.
As shown in the figure, depart from the occasion of Δ A at luminous point F from the optical axis (optical axis of non-spherical lens 13) in the design, the parallel beam B1 parallel with the straight line PF that sees through non-spherical lens 13 rear-inclined Δ θ 1 is at the front side of concavees lens 2011 focus O
11Some O on the face
11kMake the virtual image of parallel beam B1.Point O
11kOptical axis deviation Δ K from non-spherical lens 13.Light beam B2 conduct is from an O
11kThe light beam of dispersing incides convex lens 2012, as with straight line RO
11kParallel parallel beam B3 (angle with respect to the optical axis in the design is Δ θ 2) outgoing.To this, the central shaft R by making convex lens 2012 as shown in phantom in FIG., just can make the optical axis parallel (Δ θ 2=0) in parallel beam B3 and the design to the only mobile Δ K of the R ' of the below of figure (at this, RR '=Δ K).
At this, for the degree of tilt that makes the light beam that has seen through convex lens 2012 was provided by following formula 10 with interior necessary displacement Δ K at 5 seconds.
Δ K≤f22 Δ θ 2 (formula 10)
F22=110mm, Δ θ 2=5 substitution second formula 10, obtain Δ K≤2.7 (μ m).That is,, convex lens 2012 are moved about 3 μ m get final product in order to adjust to 5 seconds degree of tilt.Because this 0.15 μ m with the occasion that without this angle-adjusting mechanism 2 non-spherical lens 13 is moved to adjust is in a ratio of 20 times setting range, thereby can be easy to make the degree of tilt of light beam near 0.
Fig. 6 is the figure of the 2nd embodiment of expression beam angle adjusting mechanism 2.Also have, the focus of non-spherical lens 13 is O
12, the focus of convex lens 2013 (adjustment lens) is O
2, focus O
12, O
2On the optical axis in design.In addition, luminous point F is configured in the focus O of light incident side
12And between the non-spherical lens 13.
As shown in the figure, depart from the occasion of Δ A from the optical axis (optical axis of non-spherical lens 13) in the design at luminous point F, see through behind the non-spherical lens 13 light beam B1 as from straight line PF at focus O
12Some O on the face
12kThe light beam of dispersing incides convex lens 2013, as with straight line QO
2kParallel parallel beam B2 (angle with respect to the optical axis in the design is Δ θ 2) outgoing.At this, some O
2kBe straight line PF and focus O
2The point that face intersects is from the optical axis deviation Δ K of non-spherical lens 13.Therefore, central shaft Q by making convex lens 2013 to the mobile Δ K in the below of figure (about 3 μ m) to Q ' (at this, QQ '=Δ K), as shown in phantom in FIG., just can make parallel beam B2 and the design on optical axis parallel (Δ θ 2=0) or make Δ θ 2 below 5 seconds.
Fig. 7 is the figure of the 3rd embodiment of expression beam angle adjusting mechanism 2.Also have, non-spherical lens 13 is convex lens.
Convex lens 2014 (the 1st adjust lens) and concavees lens 2015 (the 2nd adjustment lens) focal distance f 24, f25 separately be respectively 110mm and-100mm, the focus O of exiting side separately
13Consistent.
As shown in the figure, depart from the occasion of Δ A from the optical axis (optical axis of non-spherical lens 13) in the design, see through parallel beam B1 behind the non-spherical lens 13 with respect to the inclined light shaft Δ θ 1 in the design at luminous point F.The parallel beam B1 that incides convex lens 2014 is as converging to focus O
13O on the face
13kLight beam B2 from convex lens 2014 outgoing, by concavees lens 2015 as and straight line RO
13kParallel parallel beam B3 is from concavees lens 2015 outgoing.At this, some O
13kBe by a Q straight line and the focus O parallel with straight line PF
13The point that face intersects only departs from Δ K from the optical axis of non-spherical lens 13.To this, central shaft R by making concavees lens 2015 to the mobile Δ K in the top of figure (about 3 μ m) to R ' (at this, RR '=Δ K), as shown in phantom in FIG., just can make parallel beam B3 and the design on optical axis parallel (Δ θ 2=0) or make Δ θ 2 below 5 seconds.
Fig. 8 is the figure of the 4th embodiment of expression beam angle adjusting mechanism 2.
As shown in the figure, depart from the occasion of Δ A from the optical axis (optical axis of non-spherical lens 13) in the design, see through light beam B1 behind the non-spherical lens 13 as converging to an O at luminous point F
14kLight beam incide concavees lens 2016, as with straight line QO
14kParallel light beam B2 is from concavees lens 2016 outgoing.At this, some O
14kBe straight line PF and focus O
14The point that face intersects only departs from Δ K from the optical axis of non-spherical lens 13.Therefore, central shaft Q by making concavees lens 2016 to the mobile Δ K in the top of figure (about 3 μ m) to Q ' (at this, QQ '=Δ K), as shown in phantom in FIG., just can make parallel beam B2 and the design on optical axis parallel (Δ θ 2=0) or make Δ θ 2 below 5 seconds.
In above-mentioned the 1st～the 4th embodiment, the position configuration of light source becomes the state of design, but in fact the error of making etc. is arranged, and departs from optical axis direction sometimes.Method of adjustment to this occasion describes.
Below, the occasion of Fig. 8 is described.
Now, to improve the amount trimmed of the depth of parallelism (high more near the plane wave depth of parallelism more) through parallel beam be Δ z in the fine setting that has been made as the optical axis direction by concavees lens 2016.The allowance of this amount trimmed big more (setting range is big more), it is just easy more to adjust.
Seeing through parallel beam is the occasion of complete plane wave, and the picture that the O14 that non-spherical lens became is ordered is infinity from the distance b of concavees lens 2016.For example, b is that 30000mm is above, can regard plane wave as, and then Δ z satisfies formula 11 and gets final product.
Δ z≤110-110 * 30000/ (110+30000)=0.402 (mm) (formula 11)
From formula 11 as can be known, concavees lens 2016 are carried out rough adjustment about 0.4mm, just can become directional light (plane wave).
To this, shown in Figure 4 original only obtain directional light with LD and non-spherical lens, the non-spherical lens that is used to obtain the plane wave of above-mentioned degree diminishes at the amount trimmed Δ z ' of optical axis direction, is very difficult to adjust.That is, the focal distance f As that establishes non-spherical lens is 6mm,
Δz’≤6-6×30000/(6+30000)＝0.0012(mm)
That is, need adjust non-spherical lens, be difficult to become plane wave with the high precision of 1.2 μ m.
The occasion of above-mentioned the 1st～the 3rd embodiment (that is, the occasion of the lens that the combination non-spherical lens is long with compare focal length with non-spherical lens) similarly, is the high plane wave of precision by can make emergent light about optical axis direction fine setting 0.4mm.
Also have, make the optical axis of the multiple beam that incides long focus lens 3 have the depth of parallelism about 5 seconds mutually, deflection is perpendicular to the direction of optical axis, and many hot spots 80 shown in Figure 3 are in spacing Px, the Py difference of xy direction.To this, for example, as shown in Figure 9, light beam exiting side at angle-adjusting mechanism 2 disposes parallel plate 2023 at x, y both direction, by parallel plate 2023x that is configured in the x direction and the parallel plate 2023y that is configured in the y direction are rotated respectively, can make the position (that is, many hot spots 80 are at spacing Px, the Py of xy direction) of the optical axis of multiple beam approaching.
Because directional light incides parallel plate 2023x, y, so seeing through the flatness of light wave face does not worsen because of the inclination of parallel plate 2023x, y, in addition, do not change the inclination of light beam, can only finely tune the position (with respect to the rectangular direction of optical axis in the design) of light beam.Therefore, parallel plate 2023x, y can be applicable to above-mentioned any embodiment.
Figure 10 is the whole pie graph of other maskless exposure device of the present invention.
Mirror 15 reflection that is reflected of the ultraviolet light LD multiple beam of 375nm sees through the synthetic mirror 16 of wavelength.The royal purple light LD multiple beam of another 405nm by synthetic mirror 16 reflections of wavelength after, by with the almost completely consistent light path of the multiple beam of 375nm.Behind parallel plate one body unit 14 of the multiple beam of two wavelength by compression multiple beam arrangement pitches, the spacing of x direction is compressed to 1mm.Bore is about the long focus lens 3 of 120mm because 375nm and two wavelength of 405nm are carried out colorimetric compensation, so the multiple beam of two wavelength that has seen through long focus lens 3 is in polygon mirror 5 its chief ray unanimities of upper edge y direction (horizontal direction).Owing to also carry out colorimetric compensation in the x direction, thus with the light beam of 1mm spacing arrangement with focal distance f by the spherical lens system of long focus lens 3
LFocal distance f with the 4th group of cylinder lenses that colorimetric compensation is crossed of front end
cThe multiplying power f that is determined
c/ f
LTwo wavelength are all dwindled the same position that converges on the polygon mirror.
The light beam of two wavelength that reflected by polygon mirror 5 sees through f θ lens 6, spot diameter dy on substrate the respectively convergence of y direction to be determined with formula 12 in the beam diameter Dy and the wavelength X of y direction with the focal distance f θ of f θ lens 6, incident light.For the opposing party x direction, the sphere by f θ lens 6 is the cylinder lenses 61 that the colorimetric compensation behind focal distance f θ and the f θ lens is crossed, and the x direction spot diameter Dx of long focus lens incident light is assembled respectively on substrate with the spot diameter dx that formula 13 is determined.At this, dx, dy size are much at one.
Dy=4f θ λ/(π Dy) (formula 12)
Dx=Dxf
cf
θ c/ (f
LF θ) (formula 13)
Like this, thus since the multiple beam of two wavelength assemble at homologous field spot diameter 20 μ m simultaneously, thereby synchronous with the rotational speed of polygon mirror 5, the objective table 7 that carried exposure base 8 is moved along the direction of the arrow of Figure 10.Have again, synchronous with the rotation of polygon mirror, by slave controller 9 each LD12 is lit a lamp at the allocation position of each LD with by the moment on-off that the desirable information of drawing determines, with 2 wavelength desirable figure of drawing that on substrate 8, exposes to simultaneously.
The maskless exposure device of present embodiment uses the LD near the wavelength of the h line of the mercury lamp that uses in original mask exposure device and i line can carry out mask exposure simultaneously, uses the photoresist of the cheapness of original usefulness can carry out excellent exposure.
Claims (6)
1. maskless exposure device, have: with predetermined spaced a plurality of LASER Light Source, make the distance between axles converting means that is arranged in certain position relation from above-mentioned LASER Light Source emitting laser light beam, make the polygon mirror of above-mentioned laser beam at the y scanning direction, be positioned to the long focus lens of focal position on the reflecting surface of above-mentioned polygon mirror of exiting side, make the above-mentioned laser beam of scanning converge to f θ lens on the substrate, the objective table that carries aforesaid substrate and move freely in x direction with above-mentioned direction of scanning quadrature, rotation angle and the position of above-mentioned objective table and the control circuit of above-mentioned LASER Light Source according to the above-mentioned polygon mirror of exposure figure information Control, it is characterized in that
Each of above-mentioned a plurality of LASER Light Source possesses the beam angle adjusting mechanism, this beam angle adjusting mechanism comprise with the shooting angle of above-mentioned laser beam adjust to desirable angle shaping lens, be used for emergent light is adjusted to directional light at least one adjust lens, keep above-mentioned at least one adjust the maintaining body that lens move freely it on respect to the rectangular direction of the optical axis of these adjustment lens
Above-mentioned beam angle adjusting mechanism is configured in the light shaft coaxle that makes between above-mentioned light source and the above-mentioned distance between axles converting means in the design of the optical axis of above-mentioned adjustment lens and above-mentioned LASER Light Source, by above-mentioned adjustment lens are moved on respect to the rectangular direction of this optical axis, make the optical axis of above-mentioned laser beam parallel with the optical axis in the design.
2. maskless exposure device according to claim 1 is characterized in that,
Above-mentioned a plurality of LASER Light Source is a semiconductor laser, exiting side by being configured in above-mentioned semiconductor laser be the shaping lens of non-spherical lens, will become parallel beam and incide above-mentioned adjustment lens from above-mentioned semiconductor laser emitting laser beam shaping.
3. maskless exposure device according to claim 1 is characterized in that,
Above-mentioned beam angle adjusting mechanism is by identical two the adjustment lens with positive and negative focal power in focal position are constituted.
4. maskless exposure device according to claim 3 is characterized in that,
At least one of above-mentioned adjustment lens can be finely tuned at optical axis direction.
5. maskless exposure device according to claim 2 is characterized in that,
Above-mentioned shaping lens is to make the non-spherical lens that becomes the divergent beams outgoing from above-mentioned semiconductor laser emitting laser light beam,
Above-mentioned beam angle adjusting mechanism is made of adjustment lens with positive focal power.
6. maskless exposure device according to claim 2 is characterized in that,
Above-mentioned shaping lens is to make the non-spherical lens that becomes the convergent beam outgoing from above-mentioned semiconductor laser emitting laser light beam, and above-mentioned beam angle adjusting mechanism is made of adjustment lens with negative focal power.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008052273A JP2009210726A (en) | 2008-03-03 | 2008-03-03 | Maskless exposure apparatus |
| JP2008052273 | 2008-03-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101526743A true CN101526743A (en) | 2009-09-09 |
Family
ID=41094657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910007180A Pending CN101526743A (en) | 2008-03-03 | 2009-02-13 | Maskless exposure device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2009210726A (en) |
| CN (1) | CN101526743A (en) |
| TW (1) | TW200947139A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102259471A (en) * | 2011-05-17 | 2011-11-30 | 中山新诺科技有限公司 | Maskless laser thermal transfer system |
| CN109491215A (en) * | 2018-12-06 | 2019-03-19 | 金华飞光科技有限公司 | A method of improving the DMD mask-free photolithography precision of images |
| CN114167678A (en) * | 2021-12-10 | 2022-03-11 | Tcl华星光电技术有限公司 | Exposure device and combination mask |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101059811B1 (en) | 2010-05-06 | 2011-08-26 | 삼성전자주식회사 | Alignment method for overlay in maskless exposure apparatus and maskless exposure |
| CN110031964B (en) * | 2016-05-06 | 2022-06-10 | 株式会社尼康 | Drawing device |
| CN113985708B (en) * | 2021-10-26 | 2024-02-13 | 之江实验室 | Super-resolution high-speed parallel laser direct writing method and device capable of continuous image rotation modulation |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3476098B2 (en) * | 1994-08-26 | 2003-12-10 | 株式会社ニコン | Exposure equipment |
| JPH09243909A (en) * | 1996-03-05 | 1997-09-19 | Sony Corp | Camera shake correction optical system |
| JPH11330592A (en) * | 1998-05-19 | 1999-11-30 | Nikon Corp | Laser light source device and exposure apparatus having the same |
| JP2000036461A (en) * | 1999-07-21 | 2000-02-02 | Nikon Corp | Exposure apparatus and method, and method of manufacturing semiconductor element |
| JP2001155993A (en) * | 1999-09-13 | 2001-06-08 | Nikon Corp | Illumination optical device and projection exposure apparatus having the same |
| JP4618463B2 (en) * | 1999-12-15 | 2011-01-26 | 株式会社ニコン | Front teleconverter |
| JP4508743B2 (en) * | 2004-03-31 | 2010-07-21 | 日立ビアメカニクス株式会社 | Pattern exposure method and pattern exposure apparatus |
| JP4410134B2 (en) * | 2005-03-24 | 2010-02-03 | 日立ビアメカニクス株式会社 | Pattern exposure method and apparatus |
| JP4911558B2 (en) * | 2005-06-29 | 2012-04-04 | 株式会社小松製作所 | Narrow band laser equipment |
-
2008
- 2008-03-03 JP JP2008052273A patent/JP2009210726A/en active Pending
-
2009
- 2009-02-04 TW TW98103471A patent/TW200947139A/en unknown
- 2009-02-13 CN CN200910007180A patent/CN101526743A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102259471A (en) * | 2011-05-17 | 2011-11-30 | 中山新诺科技有限公司 | Maskless laser thermal transfer system |
| CN109491215A (en) * | 2018-12-06 | 2019-03-19 | 金华飞光科技有限公司 | A method of improving the DMD mask-free photolithography precision of images |
| CN114167678A (en) * | 2021-12-10 | 2022-03-11 | Tcl华星光电技术有限公司 | Exposure device and combination mask |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200947139A (en) | 2009-11-16 |
| JP2009210726A (en) | 2009-09-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101662330B1 (en) | Illumination optics, illumination optics, exposure apparatus, and device manufacturing method | |
| JP5696644B2 (en) | Image display device | |
| US6504650B1 (en) | Optical transformer and system using same | |
| CN101526743A (en) | Maskless exposure device | |
| JP2005316349A (en) | Pattern exposure method and pattern exposure apparatus | |
| JP5101106B2 (en) | Aperture device and / or filter device, particularly for optical instruments such as microscopes, whose position, form and / or optical properties can be changed | |
| CN104950438A (en) | Light irradiation apparatus and drawing apparatus | |
| JP6239157B2 (en) | Laser light source device and video display device | |
| CN116224484B (en) | Preparation method of two-dimensional pupil-expanding holographic optical waveguide sheet, optical waveguide sheet and AR (augmented reality) glasses | |
| CN104142613B (en) | A kind of large area digital photolithography optical system | |
| CN202916586U (en) | Maskless graphic exposure system based on spatial light modulator | |
| US8089614B2 (en) | Device for changing pitch between light beam axes, and substrate exposure apparatus | |
| CN216720532U (en) | Light beam translation device and laser beam combiner | |
| JP2009301066A (en) | Pattern exposure method and pattern exposure apparatus | |
| CN114690521A (en) | Laser light source devices and projection equipment | |
| CN117289553B (en) | Alignment adjusting system of MLA lens of lithography machine | |
| KR102675375B1 (en) | Illumination optical system, exposure apparatus, and article manufacturing method | |
| CN114509879B (en) | Dynamic grating pattern generation method and system for 3D measurement | |
| CN112445074B (en) | Lighting device, exposure system and photoetching equipment | |
| CN115145126B (en) | A photolithography spectroscopic device, system, method, equipment and readable storage medium | |
| CN119376111B (en) | Multi-viewpoint retina projection augmented reality near-to-eye display optical system | |
| CN116300328A (en) | A laser direct writing light source and laser direct writing device | |
| EP3911993B1 (en) | Projector and method for increasing projected light intensity | |
| JP2011222841A (en) | Spatial light modulation unit, illumination optical system, exposure device, and device manufacturing method | |
| CN120085510A (en) | Line pattern projector |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20090909 |