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CN101587850B - Load bearing structure and test device - Google Patents

Load bearing structure and test device Download PDF

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Publication number
CN101587850B
CN101587850B CN 200810093293 CN200810093293A CN101587850B CN 101587850 B CN101587850 B CN 101587850B CN 200810093293 CN200810093293 CN 200810093293 CN 200810093293 A CN200810093293 A CN 200810093293A CN 101587850 B CN101587850 B CN 101587850B
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wafer
holding tank
bearing structure
groove
testing apparatus
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CN101587850A (en
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陈升鸿
王先章
陈事昌
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Raydium Semiconductor Corp
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Abstract

本发明披露一种承载结构,该承载结构用以承载从晶圆切割出的晶圆部分并结合测试装置测试该晶圆部分。该承载结构包括本体、第一容纳槽、第二容纳槽以及固定构件。该本体的尺寸大体上与该晶圆相等。该第一容纳槽设置于该本体的第一面上,并且可容纳该晶圆部分。该第二容纳槽设置于该第一面上并且连接该第一容纳槽。该固定构件设置于该第二容纳槽中,并且可抵扣该晶圆部分的侧边以将该晶圆部分固定于该第一容纳槽中。本发明的承载结构可以承载并固定从晶圆切割出的晶粒、晶片或是残缺晶圆等晶圆部分。当将承载结构连同晶圆部分置入测试装置测试时,可获得更精确的测试结果。

Figure 200810093293

The present invention discloses a bearing structure, which is used to bear a wafer portion cut from a wafer and test the wafer portion in combination with a testing device. The bearing structure comprises a body, a first receiving groove, a second receiving groove and a fixing member. The size of the body is substantially equal to that of the wafer. The first receiving groove is arranged on the first surface of the body and can accommodate the wafer portion. The second receiving groove is arranged on the first surface and connected to the first receiving groove. The fixing member is arranged in the second receiving groove and can buckle the side of the wafer portion to fix the wafer portion in the first receiving groove. The bearing structure of the present invention can bear and fix wafer portions such as grains, chips or incomplete wafers cut from a wafer. When the bearing structure together with the wafer portion is placed in a testing device for testing, a more accurate test result can be obtained.

Figure 200810093293

Description

承载结构以及测试装置 Load bearing structure and test device

技术领域technical field

本发明涉及一种承载结构以及测试装置,并且特别地,本发明涉及一种可互相结合以对已切割的晶圆部分(wafer portion)作测试的承载结构以及测试装置。The present invention relates to a carrier structure and a testing device, and in particular, the present invention relates to a carrier structure and a testing device that can be combined with each other to test a diced wafer portion.

背景技术Background technique

近年来,半导体工艺的发展使近代电子工业呈现飞跃性成长,小至人们居住的生活环境、工作环境,大至外层空间的研究,均与电子工业的进步息息相关。因此,半导体技术可谓是近代科技的基石。In recent years, the development of semiconductor technology has led to the rapid growth of the modern electronics industry. From the living environment and working environment where people live, to the study of outer space, they are all closely related to the progress of the electronics industry. Therefore, semiconductor technology can be described as the cornerstone of modern technology.

在半导体技术中,其基本元件由硅晶圆(wafer)的生产开始,并利用显影、蚀刻以及沉积等处理技术在晶圆表面形成各种结构,接着切割晶圆以形成晶粒(die),最后再进行封装而成为半导体基本元件。在晶圆表面上形成各种结构后,会将晶圆送入测试设备中进行测试,而获得晶圆上的各晶粒所具有的电气特性,由此改良原工艺而获得更高的合格率。因此,晶圆测试在半导体技术中是检验工艺的重要技术。In semiconductor technology, its basic components start with the production of silicon wafers (wafers), and various structures are formed on the surface of the wafers using processing technologies such as development, etching, and deposition, and then the wafers are cut to form dies. Finally, it is packaged to become a semiconductor basic component. After forming various structures on the surface of the wafer, the wafer will be sent to the testing equipment for testing to obtain the electrical characteristics of each grain on the wafer, thereby improving the original process to obtain a higher pass rate . Therefore, wafer testing is an important technique for verifying processes in semiconductor technology.

一般常见的晶圆测试工艺是利用测试设备与探针板(probecard)来测试晶圆上的每个晶粒。探针板的检测头可设置有以金属制成的探针,此探针可用以接触晶片(chip)上的焊锡、凸块或是其它现有可作为信号传输的不同设计,以直接对晶片输入信号以及读取其输出值。针对检测结果不合格的晶片或晶粒,将会标示并筛选出来。在进行晶片切割后功能未达标准的晶片或晶粒将不会继续进行封装工艺。A common wafer testing process uses testing equipment and a probe card to test each die on the wafer. The detection head of the probe card can be provided with a probe made of metal, which can be used to contact the solder, bump or other existing different designs that can be used as signal transmission to directly contact the chip. Input signal and read its output value. Wafers or dies with unqualified test results will be marked and screened out. Wafers or dies whose functions are not up to standard after wafer dicing will not proceed to the packaging process.

然而,经由晶圆测试后合格的晶粒或晶片仍有可能会有不正常或是效率不佳的问题,此时需对晶粒或晶片进行再检测以找出不正常的原因。由于市面上所使用的测试设备,例如UF200或是UF2000,并无法对已从晶圆中切割出的晶片或晶粒进行测试。在现有技术中,已切割的晶片或晶粒的再测试通常是将晶片或晶粒设置于印刷电路板上,再以测试设备测试。However, the qualified dies or wafers after the wafer test may still have problems of abnormality or poor efficiency. At this time, the dies or wafers need to be re-inspected to find out the abnormal reason. Because the test equipment used in the market, such as UF200 or UF2000, cannot test the chips or dies that have been cut from the wafer. In the prior art, the retesting of the diced wafers or dies is usually performed by disposing the wafers or dies on a printed circuit board and then testing them with testing equipment.

上述现有技术所使用的方法,其中晶片或晶粒设置于印刷电路板上,其测试环境将会与原本的晶片或晶粒有差异,因此,所测试出的电气特性也随之具有差异,而无法准确得到晶片或晶粒的特性。In the method used in the above-mentioned prior art, wherein the chips or dies are arranged on the printed circuit board, the test environment will be different from the original chips or dies, so the electrical characteristics tested will also be different accordingly. However, the characteristics of the wafer or die cannot be accurately obtained.

发明内容Contents of the invention

因此,本发明的范畴在于提供一种承载结构,可结合测试装置进行晶粒或晶片等晶圆部份的测试。Therefore, the scope of the present invention is to provide a supporting structure that can be combined with a testing device to perform testing of wafer parts such as dies or wafers.

根据一个具体实施例,本发明的承载结构用以承载从晶圆切割出的晶圆部分,并且可结合测试装置测试此晶圆部分。本具体实施例的承载结构包括本体、第一容纳槽、第二容纳槽以及固定构件。According to one embodiment, the carrier structure of the present invention is used to carry a wafer portion cut from a wafer, and the wafer portion can be tested in combination with a testing device. The bearing structure of this specific embodiment includes a body, a first receiving groove, a second receiving groove and a fixing member.

在本具体实施例中,承载结构的本体尺寸与切割出晶圆部分的晶圆的尺寸大体上相等。第一容纳槽设置于本体的第一面上,此第一容纳槽可用以容纳待测试的晶圆部分。第二容纳槽也设置于第一面上,并且连接第一容纳槽。固定构件设置于第二容纳槽中,并且其可抵扣晶圆部分的侧边以将晶圆部分固定于第一容纳槽中。In this embodiment, the size of the body of the carrier structure is substantially equal to the size of the wafer from which the wafer portion is cut. The first accommodating groove is arranged on the first surface of the body, and the first accommodating groove can be used to accommodate the wafer part to be tested. The second accommodating groove is also arranged on the first surface and connected to the first accommodating groove. The fixing member is disposed in the second receiving slot, and can engage against the side of the wafer part to fix the wafer part in the first receiving slot.

根据另一具体实施例,本发明的承载结构用以承载从晶圆切割出的晶圆部分,并且可结合测试装置测试此晶圆部分。本具体实施例的承载结构包括本体、第一容纳槽以及沟槽。According to another embodiment, the carrier structure of the present invention is used to carry a wafer portion cut from a wafer, and the wafer portion can be tested in combination with a testing device. The bearing structure of this specific embodiment includes a body, a first receiving groove and a groove.

在本具体实施例中,承载结构的本体尺寸与切割出晶圆部分的晶圆的尺寸大体上相等。第一容纳槽设置于本体的第一面上,此第一容纳槽可用以容纳待测试的晶圆部分。沟槽设置于本体的第二面上,此第二面相对于第一面。此外,沟槽内具有从第二面贯穿本体至第一面的孔洞。当本具体实施例的承载结构结合测试装置测试晶圆部分时,测试装置能在承载结构上产生吸引气压来从沟槽以及孔洞吸引晶片并将晶圆部分固定于第一容纳槽。In this embodiment, the size of the body of the carrier structure is substantially equal to the size of the wafer from which the wafer portion is cut. The first accommodating groove is arranged on the first surface of the body, and the first accommodating groove can be used to accommodate the wafer part to be tested. The groove is disposed on the second surface of the body, and the second surface is opposite to the first surface. In addition, there is a hole in the groove that runs through the body from the second surface to the first surface. When the carrying structure of this embodiment is combined with the testing device to test the wafer portion, the testing device can generate suction air pressure on the carrying structure to attract the wafer from the groove and the hole and fix the wafer portion in the first receiving groove.

根据本发明的承载结构,进一步包括至少一个第三容纳槽,并且该第一容纳槽以及该第三容纳槽根据规则设置并排列于该第一面上。According to the carrying structure of the present invention, it further includes at least one third receiving groove, and the first receiving groove and the third receiving groove are arranged and arranged on the first surface according to rules.

根据本发明的承载结构,其中,该晶圆部分选自由晶片、晶粒以及残缺晶圆所组成的组中的一个。According to the carrying structure of the present invention, wherein the wafer portion is selected from a group consisting of a wafer, a die and a defective wafer.

本发明的另一范畴在于提供一种测试装置,可用以测试从晶圆切割出的晶圆部分。Another scope of the present invention is to provide a testing device for testing wafer portions cut from a wafer.

根据一个具体实施例,本发明的测试装置包括承载结构以及探针构件。其中承载结构可用以承载晶圆部分,并且通过探针构件可以测试晶圆部分。According to a specific embodiment, the test device of the present invention comprises a load-bearing structure and a probe member. Wherein the supporting structure can be used to support the wafer part, and the wafer part can be tested through the probe member.

在本具体实施例中,承载结构进一步包括本体、第一容纳槽、第二容纳槽以及固定构件。承载结构的本体尺寸与切割出晶圆部分的晶圆的尺寸大体上相等。第一容纳槽设置于本体的第一面上,此第一容纳槽可用以容纳待测试的晶圆部分。第二容纳槽也设置于第一面上,并且连接第一容纳槽。固定构件设置于第二容纳槽中,并且其可抵扣晶圆部分的侧边以将晶圆部分固定于第一容纳槽中。承载结构固定晶圆部分后,探针构件可接着测试晶圆部分。In this specific embodiment, the carrying structure further includes a body, a first receiving groove, a second receiving groove and a fixing member. The size of the body of the carrier structure is substantially equal to the size of the wafer from which the wafer portion is cut. The first accommodating groove is arranged on the first surface of the body, and the first accommodating groove can be used to accommodate the wafer part to be tested. The second accommodating groove is also arranged on the first surface and connected to the first accommodating groove. The fixing member is disposed in the second receiving slot, and can engage against the side of the wafer part to fix the wafer part in the first receiving slot. After the carrier structure secures the wafer portion, the probe structure can then test the wafer portion.

根据本发明的测试装置,其中,该承载结构进一步包括沟槽,设置于该本体的相对于该第一面的第二面上,并且该沟槽的位置相对于该第一容纳槽。According to the testing device of the present invention, wherein the bearing structure further includes a groove disposed on the second surface of the body opposite to the first surface, and the position of the groove is opposite to the first receiving groove.

根据本发明的测试装置,其中,该沟槽内具有从该第二面贯穿该本体至该第一面的孔洞。According to the testing device of the present invention, there is a hole in the groove penetrating the main body from the second surface to the first surface.

根据本发明的测试装置,进一步包括:气压产生元件,对应该孔洞,用以产生吸引气压来吸引并固定该晶圆部分。The testing device according to the present invention further includes: an air pressure generating element, corresponding to the hole, for generating suction air pressure to attract and fix the wafer part.

根据本发明的测试装置,其中,该承载结构进一步包括至少一个第三容纳槽,并且该第一容纳槽以及该第三容纳槽根据规则设置并排列于该第一面上。According to the testing device of the present invention, wherein the bearing structure further includes at least one third receiving groove, and the first receiving groove and the third receiving groove are regularly arranged and arranged on the first surface.

根据本发明的测试装置,其中,该晶圆部分选自由晶片、晶粒以及残缺晶圆所组成的组中的一个。According to the testing device of the present invention, wherein the wafer portion is selected from a group consisting of wafers, dies and defective wafers.

根据另一具体实施例,本发明的测试装置包括承载结构以及探针构件。其中承载结构可用以承载并固定晶圆部分,并且通过探针构件可以测试晶圆部分。与上一具体实施例不同之处,在于本具体实施例的承载结构包括本体、第一容纳槽以及沟槽。According to another specific embodiment, the testing device of the invention comprises a load-bearing structure and a probe member. The supporting structure can be used to support and fix the wafer part, and the wafer part can be tested through the probe member. The difference from the previous specific embodiment is that the carrying structure of this specific embodiment includes a body, a first receiving groove and a groove.

在本具体实施例中,承载结构的本体尺寸与切割出晶圆部分的晶圆的尺寸大体上相等。第一容纳槽设置于本体的第一面上,此第一容纳槽可用以容纳待测试的晶圆部分。沟槽设置于本体的第二面上,此第二面相对于第一面。此外,沟槽内具有从第二面贯穿本体至第一面的孔洞。当本具体实施例的承载结构结合测试装置测试晶圆部分时,测试装置能在承载结构上产生吸引气压来从沟槽以及孔洞吸引晶片并将晶圆部分固定于第一容纳槽。In this embodiment, the size of the body of the carrier structure is substantially equal to the size of the wafer from which the wafer portion is cut. The first accommodating groove is arranged on the first surface of the body, and the first accommodating groove can be used to accommodate the wafer part to be tested. The groove is disposed on the second surface of the body, and the second surface is opposite to the first surface. In addition, there is a hole in the groove that runs through the body from the second surface to the first surface. When the carrying structure of this embodiment is combined with the testing device to test the wafer portion, the testing device can generate suction air pressure on the carrying structure to attract the wafer from the groove and the hole and fix the wafer portion in the first receiving groove.

根据本发明的测试装置,其中,该承载结构进一步包括:第二容纳槽,设置于该第一面上,该第二容纳槽连接该第一容纳槽;以及固定构件,设置于该第二容纳槽中,该固定构件抵扣该晶圆部分的侧边,以将该晶圆部分固定于该第一容纳槽中。According to the testing device of the present invention, wherein, the bearing structure further includes: a second receiving groove disposed on the first surface, the second receiving groove connected to the first receiving groove; and a fixing member disposed on the second receiving groove In the groove, the fixing member presses against the side of the wafer part to fix the wafer part in the first receiving groove.

根据本发明的测试装置,其中,该承载结构进一步包括至少一个第三容纳槽,并且该第一容纳槽以及该第三容纳槽根据规则设置并排列于该第一面上。According to the testing device of the present invention, wherein the bearing structure further includes at least one third receiving groove, and the first receiving groove and the third receiving groove are regularly arranged and arranged on the first surface.

根据本发明的测试装置,其中,该晶圆部分选自由晶片、晶粒以及残缺晶圆所组成的组中的一个。According to the testing device of the present invention, wherein the wafer portion is selected from a group consisting of wafers, dies and defective wafers.

关于本发明的优点与精神可以通过以下的发明详述及附图得到进一步的了解。The advantages and spirit of the present invention can be further understood through the following detailed description of the invention and the accompanying drawings.

附图说明Description of drawings

图1示出根据本发明的一个具体实施例的承载结构的示意图。Fig. 1 shows a schematic diagram of a bearing structure according to a specific embodiment of the present invention.

图2A示出根据本发明的另一具体实施例的承载结构的正面示意图。Fig. 2A shows a schematic front view of a bearing structure according to another specific embodiment of the present invention.

图2B示出图2A的承载结构的背面示意图。FIG. 2B shows a schematic view of the back side of the carrying structure of FIG. 2A .

图2C示出图2A的承载结构沿剖面线A-A的剖面示意图。FIG. 2C shows a schematic cross-sectional view of the bearing structure in FIG. 2A along the section line A-A.

图3示出图2C的承载结构结合测试装置固定晶圆部分的示意图。FIG. 3 shows a schematic diagram of the portion of the carrying structure in FIG. 2C combined with the test device for fixing the wafer.

图4A示出根据本发明的另一具体实施例的承载结构的正面示意图。Fig. 4A shows a schematic front view of a bearing structure according to another specific embodiment of the present invention.

图4B示出图4A的承载结构的背面示意图。FIG. 4B shows a schematic view of the back of the carrying structure of FIG. 4A .

图5示出根据本发明的一个具体实施例的测试装置的示意图。Fig. 5 shows a schematic diagram of a testing device according to a specific embodiment of the present invention.

图6示出根据本发明的另一具体实施例的测试装置的示意图。Fig. 6 shows a schematic diagram of a testing device according to another specific embodiment of the present invention.

具体实施方式Detailed ways

请参照图1,图1示出根据本发明的一个具体实施例的承载结构1的示意图。本具体实施例的承载结构1可用以结合测试装置(在图中未示出)测试晶圆部分2,其中,此晶圆部分2从晶圆(在图中未示出)切割出来,在实践中,晶圆部分2可为晶片、晶粒或是残缺晶圆。如图1所示,承载结构1包括本体10、第一容纳槽12、第二容纳槽14以及固定构件16。Please refer to FIG. 1 , which shows a schematic diagram of a bearing structure 1 according to a specific embodiment of the present invention. The carrying structure 1 of this specific embodiment can be used to test the wafer part 2 in combination with a test device (not shown in the figure), wherein, the wafer part 2 is cut out from the wafer (not shown in the figure), and in practice Among them, the wafer part 2 can be a wafer, a die or a defective wafer. As shown in FIG. 1 , the carrying structure 1 includes a body 10 , a first receiving groove 12 , a second receiving groove 14 and a fixing member 16 .

在本具体实施例中,本体10具有第一面100,第一容纳槽12以及第二容纳槽14均设置于第一面100之上,并且第二容纳槽14连接第一容纳槽12。固定构件16设置于第二容纳槽14中,并且固定构件16可抵扣住晶圆部分2的侧边,进而将晶圆部分2固定于第一容纳槽12中。In this specific embodiment, the body 10 has a first surface 100 , the first receiving groove 12 and the second receiving groove 14 are both disposed on the first surface 100 , and the second receiving groove 14 is connected to the first receiving groove 12 . The fixing member 16 is disposed in the second receiving groove 14 , and the fixing member 16 can be pressed against the side of the wafer portion 2 , thereby fixing the wafer portion 2 in the first receiving groove 12 .

请注意,在本具体实施例中,本体10的尺寸大体上与晶圆尺寸相等。也就是,在实践中,本体10的尺寸可以大体上与4英寸晶圆、5英寸晶圆、6英寸晶圆、8英寸晶圆以及12英寸晶圆等现有晶圆相等,根据切割出晶圆部分2的晶圆的尺寸以及测试装置可接受的规格而定。在实践中,本体10的外观也可大体上与晶圆相同。此外,在本具体实施例中,第一容纳槽12位于本体10的中央部位,然而在实践中,第一容纳槽12也可设置于本体10的第一面100的其它部分,而不受限于本具体实施例。Please note that in this embodiment, the size of the body 10 is substantially equal to the size of the wafer. That is, in practice, the size of the body 10 can be substantially equal to existing wafers such as 4-inch wafers, 5-inch wafers, 6-inch wafers, 8-inch wafers, and 12-inch wafers. Round part 2 depends on the size of the wafer and the acceptable specifications of the test equipment. In practice, the appearance of the body 10 may also be substantially the same as the wafer. In addition, in this specific embodiment, the first receiving groove 12 is located at the central part of the body 10, however, in practice, the first receiving groove 12 can also be provided on other parts of the first surface 100 of the body 10, without limitation. In this specific embodiment.

此外,在实践中,本体10的第一面100上可以更进一步地设置多个第一容纳槽12以及分别连接这些第一容纳槽12的第二容纳槽14以及设置于第二容纳槽14中的固定构件16。这些第一容纳槽12可排列于第一面100之上,在实践中,第一容纳槽12可根据晶圆部分2于原始晶圆上未切割前的位置而排列,或是根据测试装置的探针可对准的位置而排列。In addition, in practice, on the first surface 100 of the body 10, a plurality of first receiving grooves 12 and second receiving grooves 14 connected to these first receiving grooves 12 and disposed in the second receiving grooves 14 may be further provided. The fixing member 16. These first receiving grooves 12 can be arranged on the first surface 100. In practice, the first receiving grooves 12 can be arranged according to the position of the wafer part 2 on the original wafer before dicing, or according to the position of the testing device. The probes can be aligned in position.

上述具体实施例中,当固定构件16将晶圆部分2固定于第一容纳槽12后,测试装置可将其探针对准并接触晶圆部分2以及其上的电气接点(电接点),进一步测量晶圆部分2的电气特性。In the above specific embodiments, after the fixing member 16 fixes the wafer part 2 in the first receiving groove 12, the testing device can align its probes and contact the wafer part 2 and the electrical contacts (electrical contacts) thereon, The electrical characteristics of the wafer portion 2 were further measured.

请参照图2A至图2C,图2A示出根据本发明的另一具体实施例的承载结构3的正面示意图;图2B示出图2A的承载结构3的背面示意图;图2C示出图2A的承载结构3沿剖面线A-A的剖面示意图。本具体实施例的承载结构3用以结合测试装置测试晶圆部分2。如图2A至图2C所示,承载结构3包括本体30、第一容纳槽32以及沟槽34。Please refer to Fig. 2A to Fig. 2C, Fig. 2A shows the front schematic view of the carrying structure 3 according to another specific embodiment of the present invention; Fig. 2B shows the back schematic view of the carrying structure 3 of Fig. 2A; A schematic cross-sectional view of the bearing structure 3 along the section line A-A. The carrying structure 3 of this specific embodiment is used for testing the wafer portion 2 in combination with a testing device. As shown in FIGS. 2A to 2C , the carrying structure 3 includes a body 30 , a first receiving groove 32 and a groove 34 .

在本具体实施例中,本体30上具有第一面300以及相对于第一面300的第二面302,并且本体30的尺寸大体上与切割出晶圆部分2的晶圆的尺寸相等。第一容纳槽32设置于第一面300之上,其可用以容纳晶圆部分2。此外,沟槽34设置于第二面302上。沟槽34中具有孔洞340,孔洞340从第二面302贯穿本体30至第一面300。In this specific embodiment, the body 30 has a first surface 300 and a second surface 302 opposite to the first surface 300 , and the size of the body 30 is substantially equal to the size of the wafer from which the wafer part 2 is cut. The first receiving groove 32 is disposed on the first surface 300 and can be used for receiving the wafer part 2 . In addition, the groove 34 is disposed on the second surface 302 . A hole 340 is formed in the groove 34 , and the hole 340 passes through the body 30 from the second surface 302 to the first surface 300 .

请参照图3,图3示出图2C的承载结构3结合测试装置4固定晶圆部分2的示意图。如图3所示,当晶圆部分2放置于承载结构3的第一容纳槽32内,并且承载结构3连同晶圆部分2一起置入测试装置4中以测试晶圆部分2时,测试装置4可对沟槽34以及孔洞340造成吸引气压。此时晶圆部分2如果置于孔洞340之上,将会被吸引气压吸引,进而固定于第一容纳槽32中。在实践中,吸引气压可通过对承载结构3的沟槽34抽真空而产生。此外,本具体实施例中,沟槽34内设置一个孔洞340。然而,在实践中,孔洞340的数量可不受限于本说明书所列举的具体实施例,而根据使用者或设计者需求而定。Please refer to FIG. 3 . FIG. 3 shows a schematic diagram of the carrying structure 3 in FIG. 2C combined with the testing device 4 to fix the wafer portion 2 . As shown in Figure 3, when the wafer part 2 is placed in the first receiving groove 32 of the carrier structure 3, and the carrier structure 3 is put into the test device 4 together with the wafer part 2 to test the wafer part 2, the test device 4 can cause suction air pressure to the groove 34 and the hole 340. At this time, if the wafer part 2 is placed on the hole 340 , it will be attracted by the suction air pressure, and then be fixed in the first receiving groove 32 . In practice, the suction air pressure can be generated by evacuating the groove 34 of the carrying structure 3 . In addition, in this specific embodiment, a hole 340 is disposed in the groove 34 . However, in practice, the number of holes 340 is not limited to the specific embodiments listed in this specification, but can be determined according to the needs of users or designers.

在实践中,本体30的第一面300可进一步设置多个第一容纳槽32,并且,在本体30的第二面302也可设置相对于这些第一容纳槽32的多个沟槽34。同样地,这些沟槽34也可设置贯穿本体30的孔洞340。由此,承载结构3可同时承载多个晶圆部分2,并且当承载结构3连同多个晶圆部分2一起置入测试装置4中进行测试时,测试装置4产生的吸引气压可以同时吸引并且固定这些晶圆部分2。In practice, the first surface 300 of the body 30 may further be provided with a plurality of first receiving grooves 32 , and the second surface 302 of the body 30 may also be provided with a plurality of grooves 34 corresponding to the first receiving grooves 32 . Likewise, these grooves 34 can also be provided with holes 340 penetrating through the body 30 . Thus, the carrying structure 3 can carry a plurality of wafer parts 2 at the same time, and when the carrying structure 3 and the plurality of wafer parts 2 are put into the test device 4 for testing, the suction air pressure generated by the test device 4 can simultaneously attract and Fix these wafer parts 2 .

另外,在实践中当上述测试装置4产生吸引气压时,如果存在其上未放置晶圆部分2的孔洞340,对于这些孔洞340可以用胶带或是其它堵塞结构挡住这些未放置晶圆部分2的孔洞340,以避免吸引气压通过这些未放置晶圆部分2的孔洞340吸引外界气体而无法固定晶圆部分2。In addition, in practice, when the above-mentioned test device 4 generates suction air pressure, if there are holes 340 on which no wafer parts 2 are placed, adhesive tape or other blocking structures can be used to block these holes 340 where no wafer parts 2 are placed. The holes 340 are used to prevent the suction pressure from attracting outside air through the holes 340 where the wafer part 2 is not placed, and the wafer part 2 cannot be fixed.

在实践中,上述的各第一容纳槽32,可依据晶圆部分2原本于晶圆上未切割前的位置而排列,或是根据测试装置4的探针可对准的位置而排列。In practice, the above-mentioned first receiving grooves 32 can be arranged according to the original position of the wafer part 2 on the wafer before dicing, or according to the position where the probes of the testing device 4 can be aligned.

请参照图4A以及图4B,图4A示出根据本发明的另一具体实施例的承载结构5的正面示意图;图4B示出图4A的承载结构5的背面示意图。本具体实施例的承载结构5用以结合测试装置(在图中未示出)测试晶圆部分2。如图4A以及图4B所示,承载结构5包括本体50、第一容纳槽52、第二容纳槽54、固定构件56以及沟槽58。Please refer to FIG. 4A and FIG. 4B . FIG. 4A shows a schematic front view of a carrying structure 5 according to another embodiment of the present invention; FIG. 4B shows a schematic rear view of the carrying structure 5 in FIG. 4A . The carrying structure 5 of this embodiment is used to test the wafer part 2 in combination with a testing device (not shown in the figure). As shown in FIG. 4A and FIG. 4B , the carrying structure 5 includes a body 50 , a first receiving groove 52 , a second receiving groove 54 , a fixing member 56 and a groove 58 .

在本具体实施例中,本体50具有第一面500以及相对于第一面500的第二面502,第一容纳槽52以及第二容纳槽54分别设置于第一面500之上,并且第二容纳槽54连接第一容纳槽52。固定构件56设置于第二容纳槽54中,并且固定构件56可抵扣住晶圆部分2的侧边,进而将晶圆部分2固定于第一容纳槽52中。此外,在实际应用中,固定构件56本身可通过卡钩或栓锁等方式固定于本体50或第二容纳槽54,以避免其本身的滑动。In this specific embodiment, the body 50 has a first surface 500 and a second surface 502 opposite to the first surface 500, the first receiving groove 52 and the second receiving groove 54 are respectively provided on the first surface 500, and the second The two receiving slots 54 are connected to the first receiving slot 52 . The fixing member 56 is disposed in the second receiving groove 54 , and the fixing member 56 can be pressed against the side of the wafer part 2 to fix the wafer part 2 in the first receiving groove 52 . In addition, in practical applications, the fixing member 56 itself can be fixed to the main body 50 or the second receiving groove 54 by means of hooks or latches, so as to avoid its own sliding.

此外,在本具体实施例中,沟槽58可设置于第二面502上,并且其位置相对于第一容纳槽52。沟槽58内具有孔洞580,其可从第二面502贯穿本体50至第一面500。在实践中,当将承载结构5连同晶圆部分2置入测试装置时,测试装置可产生吸引气压,吸引气压通过沟槽58以及孔洞580吸引并且固定晶圆部分2。In addition, in this specific embodiment, the groove 58 can be disposed on the second surface 502 and its position is relative to the first receiving groove 52 . There is a hole 580 in the groove 58 , which can pass through the body 50 from the second surface 502 to the first surface 500 . In practice, when the carrier structure 5 and the wafer part 2 are put into the test device, the test device can generate suction air pressure, which attracts and fixes the wafer part 2 through the groove 58 and the hole 580 .

上述具体实施例的承载结构5,可通过位于第二容纳槽54中的固定构件56固定晶圆部分2,并且当其置入测试装置时,测试装置产生的吸引气压可以通过沟槽58以及孔洞580吸引并且进一步固定晶圆部分2,使晶圆部分2可被牢牢固定于承载结构5之上。The carrying structure 5 of the specific embodiment above can fix the wafer part 2 through the fixing member 56 located in the second receiving groove 54, and when it is placed into the testing device, the suction air pressure generated by the testing device can pass through the groove 58 and the hole 580 attracts and further fixes the wafer part 2 so that the wafer part 2 can be firmly fixed on the carrying structure 5 .

请参照图5,图5示出根据本发明的一个具体实施例的测试装置6的示意图。本具体实施例的测试装置6用以测试晶圆部分2,其中,晶圆部分2从晶圆(在图中未示出)切割出来。如图5所示,测试装置6包括承载结构60以及探针构件62。Please refer to FIG. 5 , which shows a schematic diagram of a testing device 6 according to a specific embodiment of the present invention. The test device 6 of this embodiment is used to test the wafer part 2, wherein the wafer part 2 is cut out from a wafer (not shown in the figure). As shown in FIG. 5 , the test device 6 includes a load-bearing structure 60 and a probe member 62 .

在本具体实施例中,承载结构60可用以承载并固定晶圆部分2,承载结构60可包括本体600、第一容纳槽602、第二容纳槽604以及固定构件606。第一容纳槽602以及第二容纳槽604分别设置于本体600的第一面6000之上,并且第二容纳槽604连接第一容纳槽602。固定构件606设置于第二容纳槽604中,并且固定构件606可抵扣住晶圆部分2的侧边,进而将晶圆部分2固定于第一容纳槽602中。In this specific embodiment, the carrying structure 60 can be used to carry and fix the wafer part 2 , and the carrying structure 60 can include a body 600 , a first receiving groove 602 , a second receiving groove 604 and a fixing member 606 . The first receiving groove 602 and the second receiving groove 604 are respectively disposed on the first surface 6000 of the body 600 , and the second receiving groove 604 is connected to the first receiving groove 602 . The fixing member 606 is disposed in the second receiving groove 604 , and the fixing member 606 can be pressed against the side of the wafer part 2 to fix the wafer part 2 in the first receiving groove 602 .

在本具体实施例中,本体600的尺寸与切割出晶圆部分2的晶圆的尺寸大体上相等。当承载结构60固定晶圆部分2并且置入测试装置6后,探针构件62耦接于测试装置6的处理单元(在图中未示出),可被控制以对准并接触晶圆部分2而进行测试。In this embodiment, the size of the body 600 is substantially equal to the size of the wafer from which the wafer portion 2 is cut. After the carrier structure 60 fixes the wafer part 2 and puts it into the test device 6, the probe member 62 is coupled to the processing unit (not shown in the figure) of the test device 6 and can be controlled to align and contact the wafer part. 2 while testing.

在实践中,承载结构60的第一面6000上可设置多个第一容纳槽602以及相对应的第二容纳槽604与固定构件606。这些第一容纳槽602可于第一面6000上排列,并且探针构件62可被控制对准这些第一容纳槽602以测试多个容纳于这些第一容纳槽602中的晶圆部分2。In practice, a plurality of first receiving grooves 602 and corresponding second receiving grooves 604 and fixing members 606 may be provided on the first surface 6000 of the carrying structure 60 . The first receiving grooves 602 can be arranged on the first surface 6000 , and the probe members 62 can be controlled to align with the first receiving grooves 602 to test a plurality of wafer parts 2 accommodated in the first receiving grooves 602 .

请参照图6,图6示出根据本发明的另一具体实施例的测试装置7的示意图。如图6所示,本具体实施例的测试装置7用以测试晶圆部分2,其中,晶圆部分2从晶圆(在图中未示出)切割出来。测试装置7包括承载结构70以及探针构件72。Please refer to FIG. 6 , which shows a schematic diagram of a testing device 7 according to another specific embodiment of the present invention. As shown in FIG. 6 , the test device 7 of this embodiment is used to test the wafer part 2 , wherein the wafer part 2 is cut out from a wafer (not shown in the figure). The testing device 7 comprises a carrying structure 70 and a probe member 72 .

在本具体实施例中,承载结构70可用以承载晶圆部分2,其包括本体700、第一容纳槽702以及沟槽704。本体700上具有第一面7000以及相对于第一面7000的第二面7002,并且本体700的尺寸大体上与切割出晶圆部分2的晶圆的尺寸相等。第一容纳槽702设置于第一面7000之上,其可用以容纳晶圆部分2。此外,沟槽704设置于第二面7002上。沟槽704中具有孔洞7040,孔洞7040从第二面7002贯穿本体700至第一面7000。In this specific embodiment, the carrying structure 70 can be used to carry the wafer part 2 , which includes a body 700 , a first receiving groove 702 and a groove 704 . The body 700 has a first surface 7000 and a second surface 7002 opposite to the first surface 7000, and the size of the body 700 is substantially equal to the size of the wafer from which the wafer part 2 is cut. The first accommodating slot 702 is disposed on the first surface 7000 and can be used for accommodating the wafer part 2 . In addition, the groove 704 is disposed on the second surface 7002 . There is a hole 7040 in the groove 704 , and the hole 7040 penetrates the body 700 from the second surface 7002 to the first surface 7000 .

在本具体实施例中,本体700的尺寸与切割出晶圆部分2的晶圆的尺寸大体上相等。当将承载结构70连同晶圆部分2置入测试装置7后,测试装置7可产生吸引气压通过沟槽704以及孔洞7040吸引并且固定晶圆部分2。接着,探针构件72可被控制以对准晶圆部分2而进行测试。In this embodiment, the size of the body 700 is substantially equal to the size of the wafer from which the wafer portion 2 is cut. After placing the carrier structure 70 and the wafer part 2 into the test device 7 , the test device 7 can generate suction air pressure to attract and fix the wafer part 2 through the groove 704 and the hole 7040 . Then, the probe member 72 may be controlled to be aligned with the wafer portion 2 for testing.

与现有技术相比较,本发明的承载结构可以承载并固定从晶圆切割出的晶粒、晶片或是残缺晶圆等晶圆部分。当将承载结构连同晶圆部分置入测试装置测试时,由于承载结构的本体外观以及尺寸大体上与晶圆相等,因此测试装置可直接于承载结构上进行晶圆部分的测试,并且其测试环境接近未切割晶圆前的测试环境,可获得更精确的测试结果。Compared with the prior art, the carrying structure of the present invention can carry and fix wafer parts such as crystal grains cut out from the wafer, wafers or defective wafers. When the carrying structure and the wafer part are placed into the test device for testing, since the appearance and size of the carrying structure are roughly equal to the wafer, the test device can directly test the wafer part on the carrying structure, and its test environment Closer to the test environment before uncut wafers, more accurate test results can be obtained.

通过以上对优选具体实施例的详述,希望能更加清楚描述本发明的特征与精神,而并非以上述所披露的优选具体实施例来对本发明的范畴加以限制。相反地,其目的是希望能将各种改变及等同的设置方案涵盖于本发明的权利要求保护范围的范畴内。因此,本发明的权利要求保护范围的范畴应该根据上述的说明作最宽广的解释,从而使其涵盖所有可能的改变以及等同的设置方案。Through the above detailed description of the preferred specific embodiments, it is hoped that the features and spirit of the present invention can be described more clearly, rather than limiting the scope of the present invention by the preferred specific embodiments disclosed above. On the contrary, the purpose is to include various changes and equivalent arrangements within the scope of protection of the claims of the present invention. Therefore, the protection scope of the claims of the present invention should be interpreted in the broadest way based on the above description, so as to cover all possible changes and equivalent arrangements.

主要元件符号说明Description of main component symbols

1、3、5、60、70:承载结构1, 3, 5, 60, 70: load-bearing structure

10、30、50、600、700:本体10, 30, 50, 600, 700: main body

12、32、52、602、702:第一容纳槽12, 32, 52, 602, 702: the first storage slot

14、54、604:第二容纳槽14, 54, 604: the second storage tank

16、56、606:固定构件16, 56, 606: fixed components

100、300、500、6000、7000:第一面100, 300, 500, 6000, 7000: the first side

302、502、7002:第二面            34、58、704:沟槽302, 502, 7002: second side 34, 58, 704: groove

340、580、7040:孔洞              2:晶圆部分340, 580, 7040: hole 2: wafer part

4、6、7:测试装置                 62、72:探针构件。4, 6, 7: Test device 62, 72: Probe components.

Claims (18)

1. bearing structure, the wafer segment that cuts out from wafer in order to carrying, and test described wafer segment in conjunction with testing apparatus, described bearing structure comprises:
Body, the size of described body equates with the size of described wafer;
First holding tank is arranged on first of described body, in order to hold described wafer segment;
Second holding tank is arranged on described first, and described second holding tank connects described first holding tank; And
Fixed component is arranged in described second holding tank, and the deduct side of described wafer segment of described fixed component is to be fixed in described wafer segment in described first holding tank.
2. bearing structure according to claim 1, wherein, described body on described first second, further comprise groove, and the position of described groove is with respect to described first holding tank.
3. bearing structure according to claim 2, wherein, have in the described groove from described second face and run through described body to described first hole, and described testing apparatus can produce and attracts air pressure to come from described groove and described hole attraction and fix described wafer segment.
4. bearing structure according to claim 1 further comprises at least one the 3rd holding tank, and described first holding tank and described the 3rd holding tank are according to the rule setting and be arranged on described first.
5. bearing structure according to claim 1, wherein, described wafer segment is selected from the group of being made up of crystal grain and incomplete wafer.
6. bearing structure according to claim 1, wherein, described testing apparatus is with the described wafer segment of probe component testing.
7. bearing structure, the wafer segment that cuts out from wafer in order to carrying, and test described wafer segment in conjunction with testing apparatus, described bearing structure comprises:
Body, the size of described body equate with the size of described wafer, and described body comprises first and with respect to described first second;
First holding tank is arranged on described first, in order to hold described wafer segment; And
Groove is arranged at described second and goes up and with respect to described first holding tank, and has in the described groove from described second face and run through described body to described first hole;
Wherein said testing apparatus can produce and attract air pressure to come from described groove and described hole attraction and fixing described wafer segment.
8. bearing structure according to claim 7 further comprises at least one the 3rd holding tank, and described first holding tank and described the 3rd holding tank are according to the rule setting and be arranged on described first.
9. bearing structure according to claim 7, wherein, described wafer segment is selected from the group of being made up of crystal grain and incomplete wafer.
10. testing apparatus, in order to the wafer segment that test cuts out from wafer, described testing apparatus comprises:
Bearing structure comprises:
Body, the size of described body equates with the size of described wafer;
First holding tank is arranged on first of described body, in order to hold described wafer segment;
Second holding tank is arranged on described first, and described second holding tank connects described first holding tank; And
Fixed component is arranged in described second holding tank, and the deduct side of described wafer segment of described fixed component is to be fixed in described wafer segment in described first holding tank; And
The probe member is in order to test described wafer segment.
11. testing apparatus according to claim 10, wherein, described bearing structure further comprises groove, be arranged at described body with respect on described first second, and the position of described groove is with respect to described first holding tank.
12. testing apparatus according to claim 11 wherein, has in the described groove from described second face and runs through described body to described first hole.
13. testing apparatus according to claim 12 further comprises:
The air pressure producing component, corresponding described hole attracts air pressure to attract and fixing described wafer segment in order to produce.
14. testing apparatus according to claim 10, wherein, described bearing structure further comprises at least one the 3rd holding tank, and described first holding tank and described the 3rd holding tank are according to the rule setting and be arranged on described first.
15. testing apparatus according to claim 10, wherein, described wafer segment is selected from the group of being made up of crystal grain and incomplete wafer.
16. a testing apparatus, in order to the wafer segment that test cuts out from wafer, described testing apparatus comprises:
Bearing structure comprises:
Body, the size of described body equate with the size of described wafer, and described body comprises first and with respect to described first second;
First holding tank is arranged on described first, in order to hold described wafer segment; And
Groove is arranged at described second and goes up and described relatively first holding tank, and has in the described groove from described second face and run through described body to described first hole;
The air pressure producing component, corresponding described hole attracts air pressure to attract and fixing described wafer segment in order to produce; And
The probe member is in order to test described wafer segment.
17. testing apparatus according to claim 16, wherein, described bearing structure further comprises at least one the 3rd holding tank, and described first holding tank and described the 3rd holding tank are according to the rule setting and be arranged on described first.
18. testing apparatus according to claim 16, wherein, described wafer segment is selected from the group of being made up of crystal grain and incomplete wafer.
CN 200810093293 2008-05-21 2008-05-21 Load bearing structure and test device Expired - Fee Related CN101587850B (en)

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CN103344794B (en) * 2013-06-24 2016-08-24 上海华力微电子有限公司 A kind of Multifunctional semiconductor sample fixture
TWI590355B (en) * 2016-02-25 2017-07-01 南茂科技股份有限公司 Wafer testing fixture, wafer dynamic test fixture and wafer testing method
CN107039298B (en) * 2016-11-04 2019-12-24 厦门市三安光电科技有限公司 Micro-component transfer device, transfer method, manufacturing method, device and electronic device

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