CN101679106A - 用于盖板的化学加强的可下拉玻璃 - Google Patents
用于盖板的化学加强的可下拉玻璃 Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 136
- 230000002787 reinforcement Effects 0.000 title description 7
- 238000005342 ion exchange Methods 0.000 claims abstract description 51
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 23
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 19
- 239000005354 aluminosilicate glass Substances 0.000 claims abstract description 19
- 230000006835 compression Effects 0.000 claims description 31
- 238000007906 compression Methods 0.000 claims description 31
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 20
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 19
- 229910052744 lithium Inorganic materials 0.000 claims description 19
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 14
- 230000004927 fusion Effects 0.000 claims description 14
- 239000005368 silicate glass Substances 0.000 claims description 13
- 239000006123 lithium glass Substances 0.000 claims description 5
- 238000002844 melting Methods 0.000 abstract description 6
- 230000008018 melting Effects 0.000 abstract description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 60
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 57
- 239000011734 sodium Substances 0.000 description 41
- 239000000395 magnesium oxide Substances 0.000 description 29
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 24
- 239000010410 layer Substances 0.000 description 18
- 239000005357 flat glass Substances 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000003280 down draw process Methods 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 9
- -1 K 2O Inorganic materials 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 6
- 150000001342 alkaline earth metals Chemical class 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 229910052787 antimony Inorganic materials 0.000 description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 5
- 229910052785 arsenic Inorganic materials 0.000 description 5
- 238000003286 fusion draw glass process Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229910001413 alkali metal ion Inorganic materials 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 4
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 4
- 229910000413 arsenic oxide Inorganic materials 0.000 description 4
- 229960002594 arsenic trioxide Drugs 0.000 description 4
- 238000005352 clarification Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 3
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- JRIGVWDKYXCHMG-UHFFFAOYSA-N (5-arsoroso-2-hydroxyphenyl)azanium;chloride Chemical compound Cl.NC1=CC([As]=O)=CC=C1O JRIGVWDKYXCHMG-UHFFFAOYSA-N 0.000 description 2
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- IKWTVSLWAPBBKU-UHFFFAOYSA-N a1010_sial Chemical compound O=[As]O[As]=O IKWTVSLWAPBBKU-UHFFFAOYSA-N 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052728 basic metal Inorganic materials 0.000 description 2
- 150000003818 basic metals Chemical class 0.000 description 2
- 238000003287 bathing Methods 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229950008475 oxophenarsine Drugs 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910001414 potassium ion Inorganic materials 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- 238000003283 slot draw process Methods 0.000 description 2
- 235000017550 sodium carbonate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- DJHGAFSJWGLOIV-UHFFFAOYSA-N Arsenic acid Chemical compound O[As](O)(O)=O DJHGAFSJWGLOIV-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- 206010013786 Dry skin Diseases 0.000 description 1
- 206010027336 Menstruation delayed Diseases 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- VEUACKUBDLVUAC-UHFFFAOYSA-N [Na].[Ca] Chemical compound [Na].[Ca] VEUACKUBDLVUAC-UHFFFAOYSA-N 0.000 description 1
- 229940115440 aluminum sodium silicate Drugs 0.000 description 1
- 229940000488 arsenic acid Drugs 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- FZFYOUJTOSBFPQ-UHFFFAOYSA-M dipotassium;hydroxide Chemical compound [OH-].[K+].[K+] FZFYOUJTOSBFPQ-UHFFFAOYSA-M 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 238000007499 fusion processing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- UFQXGXDIJMBKTC-UHFFFAOYSA-N oxostrontium Chemical compound [Sr]=O UFQXGXDIJMBKTC-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002957 persistent organic pollutant Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000429 sodium aluminium silicate Substances 0.000 description 1
- 235000012217 sodium aluminium silicate Nutrition 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
一种化学加强的碱金属铝硅酸盐玻璃,其具有可下拉组成。该玻璃的熔融温度小于约1650℃,液相线粘度至少为130千泊,在一种实施方式中,大于250千泊。该玻璃在较低温度经历离子交换至至少30微米的深度。
Description
相关申请交叉引用
本申请要求2007年5月18日提交的美国临时申请第60/930808号和2007年7月31日提交的美国专利申请第11/888213号的权益。
发明领域
本发明涉及碱金属铝硅酸盐玻璃。更具体地说,本发明涉及高强度、下拉的碱金属铝硅酸盐玻璃。甚至更具体地说,本发明涉及用作可移动电子装置中的盖板的高强度、下拉的碱金属铝硅酸盐玻璃。
发明背景
可移动电子装置,例如个人数字助理、移动或蜂窝电话、手表、膝上电脑和笔记本电脑等,经常结合有盖板。盖板的至少一部分是透明的,使得使用者能够看到显示。对于一些应用,盖板对使用者的触摸敏感。由于频繁接触,这些盖板必须具有高强度而且具有耐刻划性。
最新的这些装置的触摸敏感屏通常是化学加强的、可离子交换的“钠钙”型玻璃。这些玻璃通常是不仅包含Na2O(纯碱)、CaO(石灰)和SiO2(硅石)还包含若干其他氧化物例如MgO、Li2O、K2O、ZnO和ZrO2的复杂组合物。这些玻璃能适应经由锡金属浴上的浮法大规模制造玻璃板,但是不能通过某些方法(尤其是传统上更多地涉及精密玻璃板的下拉法,例如熔合拉制法和狭缝拉制法)形成。原因是这些钠钙玻璃的液相线温度太高,即它们在液相线温度的粘度太低从而不能适应熔合或狭缝拉制法。
发明概述
本发明提供一种碱金属铝硅酸盐玻璃,该玻璃能通过离子交换达到化学加强,其表现为能下拉成板的组合物。该玻璃的熔融温度小于约1650℃,液相线粘度至少为130千泊,在一种实施方式中,大于250千泊。该玻璃可以在较低温度下离子交换至至少30微米的深度。
因此,本发明一方面提供一种碱金属铝硅酸盐玻璃,该玻璃的液相线粘度至少为130千泊。该玻璃包含:64摩尔%≤SiO2≤68摩尔%;12摩尔%≤Na2O≤16摩尔%;8摩尔%≤Al2O3≤12摩尔%;0摩尔%≤B2O3≤3摩尔%;2摩尔%≤K2O≤5摩尔%;4摩尔%≤MgO≤6摩尔%;且0摩尔%≤CaO≤5摩尔%,其中:66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%。
本发明另一方面提供无锂玻璃,其压缩应力至少为200兆帕,层深度至少为30微米,厚度至少为0.3毫米。
本发明又一方面提供一种包括碱金属铝硅酸盐玻璃盖板的可移动电子装置,该玻璃盖板的液相线粘度至少为130千泊。该玻璃盖板包含:64摩尔%≤SiO2≤68摩尔%;12摩尔%≤Na2O≤16摩尔%;8摩尔%≤Al2O3≤12摩尔%;0摩尔%≤B2O3≤3摩尔%;2摩尔%≤K2O≤5摩尔%;4摩尔%≤MgO≤6摩尔%;且0摩尔%≤CaO≤5摩尔%,其中:66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%。
本发明又一方面提供一种用于装置的碱金属铝硅酸盐玻璃盖板。该玻璃盖板的液相线粘度至少为130千泊且包含:64摩尔%≤SiO2≤68摩尔%;12摩尔%≤Na2O≤16摩尔%;8摩尔%≤Al2O3≤12摩尔%;0摩尔%≤B2O3≤3摩尔%;2摩尔%≤K2O≤5摩尔%;4摩尔%≤MgO≤6摩尔%;且0摩尔%≤CaO≤5摩尔%,其中:66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%。
通过以下详细说明、附图和所附权利要求,本发明的这些和其他方面、优点和突出特征将是显而易见的。
附图简要说明
图1是具有包含碱金属铝硅酸盐玻璃的盖板的可移动电子装置的顶视图。
详细说明
在以下说明中,在附图中显示的若干视图中,类似的附图标记表示类似或对应的部件。还应该理解,除非有其他指明,否则,“顶部”、“底部”、“向外”、“向内”等之类的术语是方便用语,不应理解为限制性术语。另外,将一个组描述为包含至少一组要素及其组合时,应理解该组可以包含任意数量的那些引用的要素,不论是单独或彼此组合的形式。类似地,将一个组描述为包含至少一组要素或其组合时,应理解该组可以包含任意数量的那些引用的要素,不论是单独或彼此组合的形式。除非有另外的指明,否则,值的范围包括该范围的上限和下限。
参见图1,将理解该图用于描述本发明具体实施方式的目的,并不意图将本发明限制于此。
提供一种碱金属铝硅酸盐玻璃(在本文中也称为“玻璃”)。该玻璃的液相线粘度至少为130千泊。如本文所用,“液相线粘度”表示熔融玻璃在液相线温度的粘度,其中该液相线温度是指当熔融玻璃从熔融温度冷却下时开始出现晶体的温度,或者最后的晶体随温度从室温升高而熔融消失的温度。该玻璃包含以下氧化物,其浓度以摩尔百分数(摩尔%)表示:64≤SiO2≤68;12≤Na2O≤16;8≤Al2O3≤12;0≤B2O3≤3;2≤K2O≤5;4≤MgO≤6;且0≤CaO≤5。另外,66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%。铝硅酸盐玻璃的示例组合物列于表1中。表2列出以上范围之外的组合物,这些组合物至少在熔融温度、耐久性和/或液相线粘度中至少一个参数方面存在欠缺。
该碱金属铝硅酸盐玻璃的最大单一成分是SiO2,该成分构成玻璃的基质,在本发明玻璃中的存在浓度约为64摩尔%至最高约68摩尔%(包括68摩尔%)。SiO2作为粘度加强剂促进可成形性,为该玻璃赋予化学耐久性。浓度大于以上给出范围时,SiO2起到升高熔融温度的作用,该作用应被禁止,而浓度小于该范围时,玻璃的耐久性损失。另外,对于具有高K2O或高MgO浓度的玻璃,SiO2浓度较低能导致液相线温度显著升高。
Al2O3以浓度约为8摩尔%至最高约12摩尔%(包括12摩尔%)存在时,Al2O3提高粘度。Al2O3浓度大于该范围时,粘度会变高至禁止程度,液相线温度会变得太高而不能维持连续下拉过程。为了防止发生这种情况,本发明玻璃的碱金属氧化物(例如Na2O、K2O)总浓度远远超过Al2O3总含量。
使用助熔剂获得适合于连续制造过程的熔融温度。在本文所述的铝硅酸盐玻璃中,氧化物Na2O、K2O、B2O3、MgO、CaO和SrO用作助熔剂。要满足对熔融的各种限制条件,优选200泊时温度不超过1650℃。要实现这一点,应当满足以下条件:Na2O+K2O+B2O3+MgO+CaO+SrO-Al2O3>10摩尔%。
使用碱金属氧化物作为助剂以实现低液相线温度和低熔融温度。如本文所用,术语“熔融温度”指对应于200泊玻璃粘度的温度。对于钠的情况,使用Na2O以能够成功进行离子交换。为了发生充分离子交换以产生显著提高的玻璃强度,提供的Na2O浓度约为12摩尔%至最高约16摩尔%(包括16摩尔%)。但是,如果玻璃只包含本文所述范围内的Na2O、Al2O3和SiO2,则粘度将太高而不适合于熔融。因此,必须存在其他组分以确保良好的熔融和成形性能。假定存在这些组分,则在以下条件下获得合理的熔融温度:Na2O和Al2O3之间的浓度差约为2摩尔%至最高至约6摩尔%(包括6摩尔%)(即,2摩尔%≤Na2O-Al2O3≤6摩尔%)。
包含氧化钾(K2O)以获得低的液相线温度。但是,K2O也会降低玻璃的粘度,甚至比Na2O更甚。因此,Na2O和K2O浓度之和与Al2O3浓度之间的总差值应当约为4摩尔%至最高至约10摩尔%(包括10摩尔%)(即,4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%)。
B2O3用作助熔剂,即添加进来降低熔融温度的组分。即使添加少量(即小于约1.5摩尔%)B2O3也能显著降低熔融温度,否则,相同玻璃的熔融温度将高达100℃。但是如前文所述,添加钠以成功进行离子交换,所以,希望在较低Na2O含量和高Al2O3含量条件下,添加B2O3以确保形成可熔融的玻璃。因此,在一种实施方式中,Na2O和B2O3的总浓度存在一定联系,使得(Na2O+B2O3)-Al2O3≤2摩尔%。因此,在一种实施方式中,SiO2、B2O3和CaO的合并浓度约为66摩尔%至最高至约69摩尔%(包括69摩尔%)(即,66摩尔%≤SiO2+B2O3+CaO≤69摩尔%)。
当碱金属氧化物总浓度超过Al2O3浓度时,玻璃中存在的任何碱土金属氧化物都主要用作助熔剂。MgO是最有效的助熔剂,但是其在铝硅酸钠玻璃中在低MgO浓度时倾向于形成镁橄榄石(Mg2SiO4),从而导致该玻璃的液相线温度随着MgO含量非常剧烈地升高。在较高MgO水平,玻璃的熔融温度恰好在连续制造所要求的限度之内。但是,液相线温度可能太高,由此液相线粘度太低,从而不能适应下拉法,例如熔合拉制法。但是,添加B2O3和CaO中的至少一种能够显著降低这些富含MgO的组合物的液相线温度。事实上,可能必须存在一定含量的B2O3和/或CaO来获得适应熔合法的液相线粘度,尤其是对高钠、低K2O和高Al2O3浓度的玻璃而言。预计氧化锶(SrO)对高MgO玻璃的液相线温度的影响与CaO完全相同。因此在一种实施方式中,碱土金属氧化物浓度比MgO浓度本身更宽泛,例如5摩尔%≤MgO+CaO+SrO≤8摩尔%。
钡也是一种碱土金属,添加少量氧化钡(BaO)或用氧化钡替代其他碱土金属可以通过使富含碱土金属的晶相去稳定化从而产生较低的液相线温度。但是,人们认为钡是一种有害或毒性的材料。因此,虽然可以向本文所述的玻璃中添加至少2摩尔%的氧化钡而不产生有害影响或者甚至适度改进液相线粘度,但是一般保持低含量的氧化钡以使该玻璃的环境影响最小化。因此,在一种实施方式中,该玻璃基本不含钡。
除了上述元素,还可以添加其他元素和化合物以消除或减少玻璃中的缺陷。本发明的玻璃在约1500-1675℃时倾向于表现出200千泊的较高粘度。这种粘度是工业熔融过程的典型粘度,在一些情况中,可能要求在这种温度下熔融以获得具有低气态包含物水平的玻璃。为了促进消除气态包含物,添加化学澄清剂可能是有用的。这些澄清剂用气体填充早期气泡,从而增大气泡的上升通过熔体的速度。典型的澄清剂包括但并不限于:砷、锑、锡和铈的氧化物;金属卤化物(氟化物、氯化物和溴化物);金属硫酸盐等。氧化砷是特别有效的澄清剂,因为它们在熔化阶段的非常晚期释放氧。但是,一般认为砷和锑是有害的材料。因此,在一种实施方式中,该玻璃基本不含锑和砷,这些元素的氧化物的各自含量小于约0.05重量%。因此,在特定应用中完全避免使用砷或锑可能是有利的,改为使用非毒性组分例如锡、卤化物或硫酸盐来产生澄清效果。氧化锡(IV)(SnO2)以及氧化锡(IV)与卤化物的组合特别适合用作本发明中的澄清剂。
本文所述的玻璃是可下拉的;即,该玻璃能使用下拉法成形为板,下拉法例如但并不限于玻璃制造领域技术人员已知的熔合拉制法和狭槽拉制法。这些下拉法用于大规模制造可离子交换的平板玻璃。
熔合拉制法使用拉制槽,该槽具有用于接受熔融玻璃原料的沟道。该沟道具有在顶部沿着沟道长度在沟道两侧敞开的堰。沟道中充满熔融材料时,熔融玻璃在堰上溢流。由于重力的作用,熔融玻璃在拉制槽的外表面上向下流动。这些外表面向下和向内延伸,使得它们在拉制槽下方边缘处接合。两个流动的玻璃表面在该边缘处接合、熔合,形成流动单板。该熔合拉制法的优点在于,由于在沟道上流过的两个玻璃膜熔合在一起,所形成的玻璃板的外表面都不会接触该设备的任何部分。因此,这种接触不影响表面性质。
狭槽拉制法不同于熔合拉制法。在狭槽拉制法中,将熔融原料玻璃提供至拉制槽。拉制槽的底部具有带喷嘴的开放狭槽,该喷嘴沿着狭槽长度延伸。熔融玻璃流过狭槽/喷嘴,作为连续板向下拉并通入退火区中。与熔合拉制法相比,狭槽拉制法提供的板较薄,因为只有一个单板拉过狭槽,而不是象熔合下拉法那样将两个板熔合在一起。
要适应下拉法,本文所述的碱金属铝硅酸盐玻璃应具有高的液相线粘度。在一种实施方式中,该液相线粘度至少为130千泊,在另一种实施方式中,该液相线粘度至少为250千泊。
在一种实施方式中,本文所述的碱金属铝硅酸盐玻璃基本不含锂。如本文所用,“基本不含锂”表示在导致形成碱金属铝硅酸盐玻璃的任何工艺步骤期间都未向玻璃或玻璃原料中有目的地添加锂。应当理解,基本不含锂的碱金属铝硅酸盐玻璃或碱金属铝硅酸盐玻璃制品因为污染而非有意地包含少量锂。不含锂减轻了对离子交换浴的毒害,由此减少对玻璃进行化学加强所需要的盐供应的补充。另外,由于不含锂,该玻璃能适应连续单元(CU)熔融技术例如上述下拉法以及能与其中使用的材料相容,后者(使用的材料)包括熔制的氧化锆和氧化铝耐火材料以及氧化锆和氧化铝溢流槽。
在一种实施方式中,该玻璃通过离子交换加强。如本文所用,术语“经过离子交换的”理解为表示该玻璃通过玻璃制造领域技术人员已知的离子交换法加强。这些离子交换法包括但并不限于用加热的溶液处理加热的碱金属铝硅酸盐玻璃,加热的溶液中包含的离子的离子半径大于在玻璃表面存在的离子的离子半径,由此用较大的离子替换较小的离子。例如,钾离子可以替换玻璃中的钠离子。或者,具有较大原子半径的其他碱金属离子(例如铷和铯)可以替换玻璃中较小的碱金属离子。类似地,离子交换法中可以使用其他碱金属盐,例如但并不限于硫酸盐、卤化物等。在一种实施方式中,下拉的玻璃通过在包含KNO3的熔融盐浴中放置预定时间进行离子交换而达到化学加强。在一种实施方式中,该熔融盐浴的温度约为430℃,预定时间约为8小时。
下拉法产生较原始的表面。因为玻璃表面的强度由表面瑕疵的量和尺寸控制,所以,接触最少的原始表面具有较高的初始强度。当随后对这种高强度玻璃进行化学加强时,产生的强度大于经过研磨和抛光的表面的强度。通过离子交换进行化学加强或回火还增加了玻璃抗因操作而形成瑕疵的能力。因此,在一种实施方式中,对于300毫米×400毫米的板,下拉的碱金属铝硅酸盐玻璃的翘曲小于约0.5毫米。在另一种实施方式中,翘曲小于约0.3毫米。
表面压缩应力是指在化学加强期间因为玻璃表面层中包含的碱金属离子被更大离子半径的碱金属离子替代而引起的应力。在一种实施方式中,用钾离子替代本文所述玻璃的表面层中的钠离子。该玻璃的表面压缩应力至少约为200兆帕。在一种实施方式中,该表面压缩应力至少约为600兆帕。该碱金属铝硅酸盐玻璃的压缩应力层的深度至少约为30微米,在一种实施方式中,压缩应力层的深度至少约为40微米。
在低于玻璃网状物发生松弛的温度用较大的离子替代较小的离子使得离子在玻璃表面上产生一种分布从而导致应力曲线。替代进来的离子的较大体积在表面上产生压缩应力(CS)并且在玻璃中央产生张力(CT)。压缩应力与中央张力之间的关系如下:
CS=CT×(t-2DOL)/DOL;
其中t是玻璃的厚度,DOL是离子交换的深度,也指层的深度。
还提供了一种无锂玻璃,该玻璃的表面压缩应力至少约为200兆帕,表面压缩层的深度至少约为30微米,厚度至少约为0.3毫米。在一种实施方式中,压缩应力至少约为600兆帕,压缩层的深度至少约为40微米,无锂玻璃的厚度约为0.7毫米至最高约1.1毫米。
在一种实施方式中,该无锂玻璃包含:64摩尔%≤SiO2≤68摩尔%;12摩尔%≤Na2O≤16摩尔%;8摩尔%≤Al2O3≤12摩尔%;0摩尔%≤B2O3≤3摩尔%;2摩尔%≤K2O≤5摩尔%;4摩尔%≤MgO≤6摩尔%;且0摩尔%≤CaO≤5摩尔%,其中:66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%,并且液相线粘度至少为130千泊。在一种实施方式中,液相线粘度至少为250千泊。
提供一种包括盖板的可移动电子装置,盖板的至少一部分是透明的。这种可移动电子装置包括但并不限于,可移动通讯装置例如个人数字助理、移动电话、寻呼机、手表、收音机、膝上电脑和笔记本电脑等。如本文所用,“盖板”表示覆盖可视显示器的玻璃板或窗口。盖板的至少一部分是透明的,从而能够看到显示器。盖板具有一定程度的对冲击、破裂和刻划的耐受性,能用于要求窗口具有高表面强度、硬度和耐刻划性的电子装置中。在一种实施方式中,盖板是触控式的。图1中显示了移动电话的顶视图。移动电话100包括盖板110,该盖板11O包含本文所述的下拉式碱金属铝硅酸盐且化学加强的玻璃。在移动电话100中,盖板110用作显示窗口并且是耐刻划的。盖板110由本文所述的任何玻璃形成。该玻璃的板经下拉然后切割成需要的盖板形状和尺寸。在一种实施方式中,该玻璃板如本文所述通过离子交换加强。在一种实施方式中,该玻璃板和由其切割的盖板的厚度约为0.3毫米至最高至约3毫米(包括3毫米)。在另一种实施方式中,该玻璃板和盖板的厚度约为0.3毫米至最高至约1.5毫米(包括1.5毫米)。然后使用粘合剂或本领域中已知的其他方式将该盖板与可移动电子装置的主体连接。
还提供了用于某种装置的盖板,该装置例如但并不限于上述可移动电子装置,还包括非电子手表及其他。该盖板由以上本文所述的任何玻璃形成。
本发明优选实施方式
以下实施例说明本发明的优点和特征,并不以任何方式将本发明限制于此。
实施例1:熔融由原料形成的玻璃
以下描述制造具有与表1中实施例29相同标称组成的玻璃的方法。按照所示质量将以下材料混合在一起(按克计的量):
硅砂,-200目 1224.42
氧化铝,325目 322.21
硼酸 24.12
纯碱 452.95
碳酸钾 104.78
氧化镁 74.02
石灰石 15.78
五氧化砷 28.41
对于各种熔融操作,使用以下较粗或较细的以下材料可能是有利的:氧化铝或硅石;氧化铝、碱金属或碱土金属的氢氧化物;碱金属的氧化物、过氧化物或超氧化物;碱土金属的过氧化物;碱金属或碱土金属的羧酸盐。砷仅作为澄清剂存在,对玻璃的物理性质或离子交换能力没有任何影响。可以使用砷酸替代五氧化砷。或者,如果可以通过例如真空澄清或在熔融的澄清阶段长停留时间的其他方式避免气态包含物,则减少或消除氧化砷是可以接受的,以代之以锑或锡的氧化物,或者避开所有这些材料,而优选使用卤化物或硫酸盐原料来提供额外的澄清能力。
通过将各种材料一起剧烈摇晃或搅拌来混合原料。如果存在软质团块,则球磨之类更剧烈的混合方法可能是合适的。将充分混合的批料转移至容纳在耐火衬垫物中的1800立方厘米铂坩埚内,将含有批料的坩埚和衬垫物装入炉中,在约1575℃至最高至约1650℃(包括1650℃)的温度范围内加热,并在该温度保持4-16小时。该时间之后,从炉中取出坩埚,将玻璃倒入冷钢板上的玻璃自由成形饼(patty)中,然后转移到625℃的退火炉中。在该温度2小时之后,以约2℃/分钟的速率将退火炉降至室温(约25℃),然后取出玻璃进行进一步处理。
实施例2:玻璃板的离子交换
以下实施例描述了样品制备和离子交换实验。将如实施例1中制造的玻璃饼(patty)切割成适合离子交换评估的形状。对于本实施例的目的,对于不同玻璃的一致比较,优选的样品形状为1毫米厚度、5毫米宽度和40毫米长度,但是在其他应用中,可能需要较大或较小的样品。将样品研磨至合适的尺寸,然后对所有表面进行光学抛光。然后在甲基乙基酮中清洁样品并在约150℃干燥1小时以消除任何残余的有机污染物。将经过清洁的各个样品悬挂在熔融KNO3浴中并保持430℃,使玻璃和支架或浴容器之间的接触点最少。还可以使用其他碱金属盐,例如K、Rb和Cs的硝酸盐和卤化物。在浴中8小时之后,取出样品,使其冷却,在去离子水中清洗以去除任何残余盐。
实施例3:各种厚度的玻璃板的离子交换
在具有以下组成的玻璃样品上进行离子交换:66.48摩尔%(61.53重量%)SiO2;13.59摩尔%(13.0重量%)Na2O;10.42摩尔%(16.4重量%)Al2O3;0.63摩尔%(0.68重量%)B2O3;2.38摩尔%(3.45重量%)K2O;5.72摩尔%(3.53重量%)MgO;0.45摩尔%(0.39重量%)CaO;0.33摩尔%(1.0重量%)As2O3;和0.01摩尔%(0.022重量%)Fe2O3。该样品是50×50毫米的熔合拉制的正方形玻璃板,厚度为0.5毫米、0.7毫米和1.3毫米。0.5毫米和0.7毫米厚度的样品是双面研磨和抛光的。1.3毫米厚度的样品是从熔合拉制的板刻划切割得到。将样品浸入410℃的熔融KNO3浴中进行离子交换。浸入(或离子交换)时间为5小时至最长10小时。离子交换之后,测量各样品的压缩应力和层深度。使用以下等式由各样品的压缩应力(CS)、层深度(DOL)数据和板厚度t计算中央张应力(CT):
CS=CT×(t-2DOL)/DOL。
因此,对于指定的离子交换浴方案,中央张力值作为压缩应力和样品厚度变化的结果而变化。
表3中总结了0.5毫米厚度的样品的离子交换实验结果。这些样品的离子交换时间为5-7小时。层深度约为41微米至最大约51微米,交换时间越长,经过离子交换的层的深度越大。对于最长离子交换时间(7小时),压缩应力约为553兆帕,对于最短离子交换时间(5小时),压缩应力为669兆帕。
表3.用于0.5毫米厚度玻璃板的离子交换参数。
| 样品 | 离子交换时间(小时) | 压缩应力(兆帕) | 层深度(微米) | 中央张应力(兆帕) |
| 1 | 5 | 669 | 41.2 | 66 |
| 2 | 5 | 668.8 | 43.1 | 70 |
| 3 | 6 | 664.6 | 45.2 | 73 |
| 4 | 6 | 666.4 | 46.4 | 76 |
| 5 | 7 | 660.6 | 47.5 | 77 |
| 6 | 7 | 659.5 | 49.1 | 81 |
| 7 | 7 | 653.1 | 50.9 | 83 |
表4中总结了0.7毫米厚度的样品的离子交换实验的离子交换结果。这些样品的离子交换时间为7-10小时。层深度约为48微米至最大约61微米,较长的交换时间导致经过离子交换的层的深度较大。对于最长离子交换时间(10小时),压缩应力约为647兆帕,对于最短离子交换时间(7小时),压缩应力约为673兆帕。
表4.用于0.7毫米厚度玻璃板的离子交换参数。
| 样品 | 离子交换时间(小时) | 压缩应力(兆帕) | 层深度(微米) | 中央张应力(兆帕) |
| 1 | 7 | 673.1 | 47.9 | 53 |
| 2 | 7 | 675.3 | 47.5 | 53 |
| 3 | 8 | 661.9 | 53.1 | 59 |
| 4 | 8 | 664.6 | 52.9 | 59 |
| 5 | 9 | 648 | 55.9 | 62 |
| 6 | 9 | 654 | 55.7 | 62 |
| 7 | 10 | 646 | 60.7 | 68 |
| 8 | 10 | 647.2 | 59.4 | 66 |
表5中总结了1.3毫米厚度的样品的离子交换实验的结果。所有这些样品都经过20小时的离子交换。层的深度为79.7微米至最大81.5微米,而压缩应力约为661兆帕至665兆帕。
表5.用于1.3毫米厚度玻璃板的离子交换参数。
| 样品 | 离子交换时间(小时) | 压缩应力(兆帕) | 层深度(毫米) | 中央张应力(兆帕) |
| 1 | 20 | 664.3 | 81.5 | 47.6 |
| 2 | 20 | 661 | 79.7 | 46.2 |
| 3 | 20 | 662.5 | 81.3 | 47.4 |
| 4 | 20 | 665.2 | 81.3 | 47.5 |
| 5 | 20 | 662.3 | 81.1 | 47.2 |
对于不同厚度(表1中的样品5-7以及表2中的样品1和3)取得的结果进行比较显示,对于特定的离子交换方案,不同样品厚度获得的层深度基本是相同的。另外,压缩应力随玻璃厚度的增加有一定程度的增加。
虽然为了说明目的列出了典型的实施方式,但是不应将以上说明看作对发明范围的限制。因此,在不偏离本发明原理和范围的条件下,本领域技术人员可以进行各种改进、修改和替换。
Claims (25)
1.一种碱金属铝硅酸盐玻璃,该玻璃包含:
64摩尔%≤SiO2≤68摩尔%;12摩尔%≤Na2O≤16摩尔%;8摩尔%≤Al2O3≤12摩尔%;0摩尔%≤B2O3≤3摩尔%;2摩尔%≤K2O≤5摩尔%;4摩尔%≤MgO≤6摩尔%;和0摩尔%≤CaO≤5摩尔%,其中:66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%,并且该玻璃的液相线粘度至少为130千泊。
2.如权利要求1所述的玻璃,其特征在于,该玻璃是可下拉的。
3.如权利要求1所述的玻璃,其特征在于,该玻璃基本不含锂。
4.如权利要求1所述的玻璃,其特征在于,该玻璃是经过离子交换的。
5.如权利要求4所述的玻璃,其特征在于,该玻璃进行离子交换后,表面压缩应力至少约为200兆帕。
6.如权利要求4所述的玻璃,其特征在于,该玻璃进行离子交换后,表面压缩层的深度至少约为30微米。
7.如权利要求1所述的玻璃,其特征在于,该玻璃的液相线粘度至少为250千泊。
8.如权利要求1所述的玻璃,其特征在于,该玻璃的厚度约为0.3毫米至最大约3毫米。
9.如权利要求8所述的玻璃,其特征在于,该玻璃的厚度约为0.3毫米至最大约1.5毫米。
10.如权利要求9所述的玻璃,其特征在于,用300毫米×400毫米板测量,该玻璃的翘曲小于约0.5毫米。
11.如权利要求10所述的玻璃,其特征在于,该翘曲小于约0.3毫米。
12.如权利要求1所述的玻璃,其特征在于,该玻璃是盖板。
13.如权利要求12所述的玻璃,其特征在于,该玻璃是用于可移动电子装置的盖板。
14.如权利要求1所述的玻璃,其特征在于,该玻璃是狭槽拉制或熔合拉制的。
15.一种无锂铝硅酸盐玻璃,其表面压缩应力至少约为200兆帕,表面压缩层的深度至少约为30微米,厚度至少约为0.3毫米,其中该玻璃的液相线粘度至少为130千泊。
16.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,压缩应力至少约为600兆帕,表面压缩层的深度至少为40微米,厚度约为0.7毫米至最大约1.1毫米。
17.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,该玻璃包含64摩尔%≤SiO2≤68摩尔%;12摩尔%≤Na2O≤16摩尔%;8摩尔%≤Al2O3≤12摩尔%;0摩尔%≤B2O3≤3摩尔%;2摩尔%≤K2O≤5摩尔%;4摩尔%≤MgO≤6摩尔%;和0摩尔%≤CaO≤5摩尔%,其中:66摩尔%≤SiO2+B2O3+CaO≤69摩尔%;Na2O+K2O+B2O3+MgO+CaO+SrO>10摩尔%;5摩尔%≤MgO+CaO+SrO≤8摩尔%;(Na2O+B2O3)-Al2O3≤2摩尔%;2摩尔%≤Na2O-Al2O3≤6摩尔%;且4摩尔%≤(Na2O+K2O)-Al2O3≤10摩尔%。
18.如权利要求17所述的无锂铝硅酸盐玻璃,其特征在于,该玻璃的液相线粘度至少为250千泊。
19.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,该玻璃的厚度约为0.3毫米至最大约3毫米。
20.如权利要求19所述的无锂铝硅酸盐玻璃,其特征在于,该玻璃的厚度约为0.3毫米至最大约1.5毫米。
21.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,该玻璃是盖板。
22.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,该玻璃是用于可移动电子装置的盖板。
23.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,用300毫米×400毫米的板测量,该玻璃的翘曲小于约0.5毫米。
24.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,该翘曲小于约0.3毫米。
25.如权利要求15所述的无锂铝硅酸盐玻璃,其特征在于,该无锂玻璃是熔合拉制或狭槽拉制的。
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| JP3465642B2 (ja) | 1998-09-04 | 2003-11-10 | 日本板硝子株式会社 | 淡色高透過ガラスおよびその製造方法 |
| SG99350A1 (en) * | 2000-02-17 | 2003-10-27 | Hoya Corp | Glass for cathode-ray tube, strengthened glass, method for the production thereof and use thereof |
| JP2002174810A (ja) * | 2000-12-08 | 2002-06-21 | Hoya Corp | ディスプレイ用ガラス基板及びその製造方法並びにこれを用いたディスプレイ |
| JP2002343274A (ja) * | 2001-05-15 | 2002-11-29 | Asahi Glass Co Ltd | カラー陰極線管用ガラスパネルおよび陰極線管 |
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| JP2004131314A (ja) * | 2002-10-09 | 2004-04-30 | Asahi Glass Co Ltd | 透明導電膜付き化学強化ガラス基板、およびその製造方法 |
| JP4432110B2 (ja) * | 2003-02-19 | 2010-03-17 | 日本電気硝子株式会社 | 半導体パッケージ用カバーガラス |
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| JP2005089286A (ja) * | 2003-08-12 | 2005-04-07 | Nippon Electric Glass Co Ltd | フラットパネルディスプレイ装置用ガラス基板 |
| JP2005126320A (ja) * | 2003-10-01 | 2005-05-19 | Nippon Electric Glass Co Ltd | 固体撮像素子パッケージ用窓ガラス |
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| JP2007099557A (ja) * | 2005-10-04 | 2007-04-19 | Nippon Electric Glass Co Ltd | 強化ガラス物品およびその製造方法 |
| CN101454252A (zh) * | 2006-05-25 | 2009-06-10 | 日本电气硝子株式会社 | 强化玻璃及其制造方法 |
-
2007
- 2007-07-31 US US11/888,213 patent/US7666511B2/en not_active Ceased
-
2008
- 2008-05-16 TW TW097118303A patent/TWI398424B/zh active
- 2008-05-16 WO PCT/US2008/006328 patent/WO2008143999A1/en active Application Filing
- 2008-05-16 JP JP2010509349A patent/JP2010527892A/ja active Pending
- 2008-05-16 CN CN200880016095A patent/CN101679106A/zh active Pending
- 2008-05-16 EP EP08754519A patent/EP2158171A1/en not_active Ceased
- 2008-05-16 KR KR1020097026381A patent/KR20100019526A/ko not_active Withdrawn
-
2012
- 2012-02-23 US US13/403,756 patent/USRE44869E1/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2010527892A (ja) | 2010-08-19 |
| USRE44869E1 (en) | 2014-04-29 |
| US20080286548A1 (en) | 2008-11-20 |
| EP2158171A1 (en) | 2010-03-03 |
| TWI398424B (zh) | 2013-06-11 |
| US7666511B2 (en) | 2010-02-23 |
| KR20100019526A (ko) | 2010-02-18 |
| WO2008143999A1 (en) | 2008-11-27 |
| TW200911717A (en) | 2009-03-16 |
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