CN101793981A - Composite layer antireflection coating and preparation method thereof - Google Patents
Composite layer antireflection coating and preparation method thereof Download PDFInfo
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Abstract
The invention relates to a composite layer antireflection coating which is arranged on a substrate, and the antireflection coating is formed by alternate stacking of two monomer film layers made of materials with different refractive index; the monomer film layer which is close to the substrate is the monomer film layer with high refractive index; the monomer film layer stacked at the top layer is the monomer film layer with low refractive index; and monomer film layers are in different thickness, and the number of the monomer film layers with the high refractive index is equal to that of the monomer film layers with the low refractive index. The invention further correspondingly provides a preparation method of the composite layer antireflection coating. The prepared composite layer antireflection coating has simple structure, and can realize the obvious antireflection effect to a light source with wide wave band, and all the light, including the light with wide wavelength range (such as white light) and monochromatic light (such as laser) can reach very high transmittance by designing the thickness of the film layers.
Description
Technical Field
The invention relates to a composite layer antireflection film, in particular to a composite layer antireflection film suitable for a light source with a wide bandwidth and a preparation method thereof.
Background
The principle of the antireflection film is that a low-refractive-index layer with the refractive index smaller than that of a base material is vapor-deposited on the base material by utilizing the coherence of light, and the thickness of the low-refractive-index layer is 1/4 wavelength film layers. In order to achieve a better anti-reflection effect, an anti-reflection film is generally formed by adopting a double-layer dielectric film.
Fig. 1 is a schematic structural diagram of a conventional antireflection film. First, a high refractive index layer 102 is provided on a substrate 100. A low refractive index layer 101 is subsequently provided. Wherein each layer is an 1/4 wavelength film layer corresponding to the refractive index material. However, since the antireflection film has a good antireflection characteristic only for monochromatic light (e.g., laser light) of one wavelength, the antireflection bandwidth of the antireflection film is narrow. If it is desired to cover a wide spectral band, the 1/4 wavelength film is typically selected to have a certain middle wavelength, which is not very reflective for both high and low frequency bands, and thus has a high reflectivity. For example, some camera lenses have an antireflection coating of 1/4 coated at a wavelength of 550nm, which has good transmittance at wavelengths near green, but low transmittance for red and violet, thereby affecting the color quality of the photograph. The wider the bandwidth, the higher the reflectivity of the two end wave bands, and the full wave band anti-reflection can not be realized.
Disclosure of Invention
The technical problem to be solved by the invention is to provide a composite layer antireflection film suitable for a light source with a wider bandwidth and a preparation method thereof, aiming at the defect that the transmitted wavelength bandwidth of the existing antireflection film is limited.
The technical scheme adopted by the invention for solving the technical problems is as follows: constructing a composite layer antireflection film, which is arranged on a substrate and comprises monomer film layers of two different refractive index materials which are alternately superposed; the monomer film layer close to the substrate is a high-refractive index monomer film layer; the monomer film layer superposed on the uppermost layer is a monomer film layer with low refractive index; the thicknesses of the monomer film layers are different, and the high refractive index monomer film layers and the low refractive index monomer film layers are the same in number.
In the composite layer antireflection film of the invention, the thickness of the high-refractive-index monomer film layer is diH＝λi/(4nH) (ii) a The thickness of the low refractive index monomer film layer is diL＝λi/(4nL)；
Wherein,
λi＝λmin+(i-1/2)(λmax-λmin)/N；
nL、nHthe refractive indexes of the low-refractive index monomer film layer material and the high-refractive index monomer film layer material are respectively set;
λminand λmaxRespectively, a minimum wavelength and a maximum wavelength of the visible range;
i is a natural number; n is equal part of visible wavelength range.
In the composite layer antireflection film, the high-refractive index monomer film layer is made of any one of silicon monoxide, aluminum oxide and cerium fluoride.
In the composite layer antireflection film, the low refractive index monomer film layer is made of any one of magnesium fluoride, calcium fluoride, aluminum fluoride and lead fluoride.
The invention also provides a preparation method of the composite layer antireflection film, which comprises the following steps:
s01, arranging a high-refractive index monomer film layer made of a high-refractive index material on the surface of the base material;
s02, arranging a low-refractive index monomer film layer with a low refractive index as a material on the surface of the high-refractive index monomer film layer;
s03, repeating the steps S01 and S02 for multiple times to obtain the antireflection film with the composite layer.
In the preparation method of the invention, the thickness of the high refractive index monomer film layer is diH＝λi/(4nH) (ii) a The thickness of the low refractive index monomer film layer is diL＝λi/(4nL) (ii) a And correspond to the same lambdaiThe low-refractive index monomer film layer is tightly attached to the upper part of the high-refractive index monomer film layer；
Wherein,
λi＝λmin+(i-1/2)(λmax-λmin)/N；
nL、nHthe refractive indexes of the low-refractive index monomer film layer material and the high-refractive index monomer film layer material are respectively set;
λminand λmaxRespectively, a minimum wavelength and a maximum wavelength of the visible range;
i is a natural number; n is equal part of visible wavelength range.
In the preparation method of the invention, the material of the high-refractive index monomer film layer is any one of silicon monoxide, aluminum oxide and cerium fluoride.
In the preparation method of the invention, the low refractive index monomer film layer is made of any one of magnesium fluoride, calcium fluoride, aluminum fluoride and lead fluoride.
The implementation of the composite layer antireflection film and the preparation method thereof has the following beneficial effects: the antireflection film prepared by the invention has a simple structure, can have an obvious antireflection effect on a light source with a wide wavelength band, and all light can reach high transmittance including a wide wavelength range (such as white light) and monochromatic light (such as laser) by designing the thickness of the film layer.
Drawings
The invention will be further described with reference to the accompanying drawings and examples, in which:
FIG. 1 is a schematic view of a conventional antireflection film;
FIG. 2 is a schematic view of a composite layer antireflection film according to a preferred embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments.
The design idea of the invention is as follows: assuming the bandwidth of the reflected light is λmin，λmax]For example, visible light is [380nm, 780nm ]]The whole bandwidth is divided into N parts on average, and the bandwidth of each part is (lambda)max-λmin) N, the central wavelength of the ith part (i 1, 2, 3.) is λi＝λmin+(i-1/2)(λmax-λmin) 1/4 high and low refractive index film thickness d of/N, lambdaiiL＝λi/(4nL)，diH＝λi/(4nH) Wherein n isL、nHRespectively, the refractive index of the material with low refractive index and the refractive index of the material with high refractive index. According to the principle, monomer film layers made of different high-refractive-index materials and monomer film layers made of different low-refractive-index materials are alternately superposed on the base material, and the composite antireflection film is circulated in the way.
FIG. 2 is a schematic view of a composite antireflection film according to a preferred embodiment of the present invention. The composite layer antireflection film provided by the invention is provided with a plurality of film layers to perform antireflection on wavelengths in different ranges. The thickness of each coating film is designed by the following method.
Firstly, the bandwidth of the light (usually visible light) to be transmitted by the composite layer antireflection film is divided into N parts on average, where N is a positive integer not less than 2, and the N parts are respectively the first wavelength band to the nth wavelength band according to the wavelength from small to large. Assuming that the bandwidth of the light to be transmitted is λmin，λmax]For example, visible light is [380nm, 780nm ]]. The whole bandwidth is divided into N parts averagely, and the bandwidth of each part is (lambda)max-λmin)/N。
Subsequently, the center wavelength of each of the first to nth wavelength bands is acquired. For example, the i-th part (i ═ 1, 2, 3.. N) has a center wavelength λi＝λmin+(i-1/2)(λmax-λmin)/N。
And then preparing the composite layer antireflection film. The preparation method of the composite layer antireflection film provided by the invention specifically comprises the following steps:
in step S01, a high refractive index monomer film layer made of a high refractive index material is provided on the surface of the substrate.
In step S02, a low refractive index monomer film layer made of a low refractive index material is provided on the surface of the high refractive index monomer film layer.
In step S03, steps S01 and S02 are repeated a plurality of times to produce a composite layer antireflection film.
In the above manufacturing process, the thickness of the high refractive index monomer film layer is diH＝λi/(4nH) (ii) a The thickness of the low refractive index monomer film layer is diL＝λi/(4nL) (ii) a And correspond to the same lambdaiThe low-refractive-index monomer film layer with the thickness is arranged above the high-refractive-index monomer film layer in a clinging manner; wherein λ isi＝λmin+(i-1/2)(λmax-λmin)/N，λminAnd λmaxRespectively, a minimum wavelength and a maximum wavelength of the visible range; i is a natural number; n is an equal part of the visible wavelength range, i.e. lambdaiThe center wavelength of the i-th part (i ═ 1, 2, 3.. N) obtained in the above design process. n isL、nHThe refractive index of the low refractive index monomer film layer material and the refractive index of the high refractive index monomer film layer are respectively.
For example, the first high refractive index monomer film layer 202-1 corresponds to the center wavelength λ of the first wavelength band1＝λman+(1-1/2)(λmax-λmin) and/N. The high-refractive index monomer film layer is made of a high-refractive index material, the high-refractive index material is a material with a refractive index larger than that of the base material, namely glass, the larger the material is, the better the material is, and the material with the refractive index between 1.5 and 1.8 is generally selected. High refractive index materials include, but are not limited to, the following: silicon monoxide (SIO) and aluminum oxide (AL)2O3) Cerium (Ce)) A fluoride compound. The first low refractive index monomer film 201-1 also corresponds to the central wavelength λ of the first wavelength band1＝λmin+(1-1/2)(λmax-λmin) and/N. The low-refractive index monomer film layer is made of a low-refractive index material, and the low-refractive index material is generally selected to be close to the refractive index of 1.225. Currently commonly used low-refractive-index material MgF2The refraction is 1.38. The low refractive index materials of the present invention include, but are not limited to, the following: magnesium fluoride (MgF)2) Calcium fluoride (CaF)2) Aluminum fluoride (ALF)3) Lead fluoride (PbF)2)。
Therefore, the composite layer antireflection film provided by the invention comprises monomer film layers made of two materials with different refractive indexes, wherein the monomer film layers close to the substrate are alternately superposed, the monomer film layers are high-refractive index monomer film layers, and the monomer film layers superposed on the uppermost layer are low-refractive index monomer film layers. The thicknesses of the monomer film layers are different, and the number of the monomer film layers with high refractive index is the same as that of the monomer film layers with low refractive index. The thickness of the high refractive index monomer film layer is diH＝λi/(4nH) (ii) a The thickness of the low refractive index monomer film layer is diL＝λi/(4nL) (ii) a And correspond to the same lambdaiThe low-refractive index monomer film layer is tightly attached to the upper part of the high-refractive index monomer film layer. That is, the N high refractive index monomer film layers correspond to the first wavelength to the nth wavelength, and similarly, the N low refractive index monomer film layers also correspond to the first wavelength to the nth wavelength. For example, in FIG. 2, the first low refractive index monomer film 201-1 is 1/4 first wavelength film of the selected low refractive index material, and the thickness thereof is expressed by the formula d1L＝λ1/(4nL) And (4) obtaining. Similarly, the first high index monomer film layer 202-1 is 1/4 first wavelength film layer of the selected high index material, and its thickness is expressed by the formula d1H＝λ1/(4nH) And (4) obtaining. The first wavelength to the Nth wavelength are respectively equal to the central wavelengths of the first wavelength band to the Nth wavelength band obtained by dividing the bandwidth of the light which needs to be anti-reflection by the anti-reflection film into N parts.
As shown in fig. 2, step 1: a substrate 200 (typically glass) is first coated with lambda11/4 high refractive index monomer film layer 202-1, followed by λ plating11/4 low refractive index monomer film layer 201-1. Step 2: firstly plating lambda on the basis of the previous step of plating21/4 high refractive index monomer film layer 202-2, followed by λ plating21/4 low refractive index monomer film layer 201-2. And 3, step 3: firstly plating lambda on the basis of the previous step of plating31/4 high refractive index monomer film layer, followed by λ plating31/4 Low refractive index monomer film layer … … and so on, step N-1: firstly plating lambda on the basis of the previous step of platingN-11/4 high refractive index monomer film layer 202-N-1, followed by λ platingN-11/4 Low refractive index monomer film layer 201-N-1. And (N) step: firstly plating lambda on the basis of the previous step of platingN1/4 high refractive index monomer film layer 202-N, followed by λ platingN1/4 low refractive index monomer film layer 201-N. And finishing the film coating. Thus, the uppermost layer is a low-refractive index monomer film layer, and the total film layer number is an even number.
In some preferred embodiments of the invention, the wavelength λ may be determined according to the corresponding wavelengthiThe monomer film layers are arranged in sequence from small to large as described above. The step sequence of the film coating can also be adjusted, and the larger the N is, namely the more the number of the film layers is, the higher the reflectivity is. For example, the nth high refractive index monomer film layer 202-N is disposed on the substrate 200, the nth low refractive index monomer film layer 201-N is disposed, the nth-1 high refractive index monomer film layer 202-N-1, the nth-1 low refractive index monomer film layer 201-N-1 … … are disposed to the first high refractive index monomer film layer 202-1 and the first low refractive index monomer film layer 201-1. Although the order of coating is different from the aforementioned method, the purpose of transmitting light within a certain bandwidth can be achieved.
Further examples of the present invention are explained below. Setting the visible light bandwidth as 380nm, 780nm]The whole bandwidth is divided into 40 parts on average, each part has a bandwidth of (780- & ltSUB & gt 380)/40- & ltSUB & gt 10nm, and the central wavelength of the ith part (i- & ltSUB & gt 1, 2, 3 … 40) is lambdai380+10 (i-1/2). The high refractive index material can be selected from Al2O3Refractive index nH1.65; the low refractive index material can be MgF2Refractive index nL＝1.38。λi1/4 eachThickness d of high and low refractive index layeriL＝λi/(5.52)，diH＝λi/(6.6)。
Step 1: first plating lambda on the substrate 20011/4 high refractive index monomer film layer Al of 385nm2O3(film thickness d)1H58.3nm), followed by λ plating11/4 low refractive index monomer film layer MgF of 385nm2(film thickness d)1L69.7 nm). Step 2: firstly plating lambda on the basis of the previous step of plating2395nm 1/4 high-refractive index monomer film layer Al2O3(film thickness d)2H59.8nm), followed by λ plating2395nm 1/4 low refractive index monomer film layer MgF2(film thickness d)2L71.6 nm). … … and so on, step 40: firstly plating lambda on the basis of the previous step of plating40775nm 1/4 high refractive index monomer film layer Al2O3(film thickness d)40H117.4nm), followed by λ plating40775nm 1/4 low refractive index monomer film MgF2(film thickness d)40L＝140.4nm)。
The composite layer antireflection film can have a very obvious antireflection effect on a light source with a wide waveband, and can cover the whole bandwidth. While also being applicable to narrow bandwidth light sources. The film thickness can be designed to achieve high transmittance for all light, including a wide wavelength range (such as white light) and monochromatic light (such as laser light). The composite layer antireflection film provided by the invention has a simple structure, and the film layer materials are commonly used in the prior art and have acquireability. The antireflection film of the invention is plated on a lens, and can have a transmittance of more than 95% for all bands.
While the invention has been described with reference to specific embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the scope of the invention. In addition, many modifications may be made to adapt a particular situation or material to the teachings of the invention without departing from the essential scope thereof. Therefore, it is intended that the invention not be limited to the particular embodiments disclosed, but that the invention will include all embodiments falling within the scope of the appended claims.
Claims (8)
1. A composite layer antireflection film is arranged on a substrate and is characterized in that the antireflection film comprises two monomer film layers made of materials with different refractive indexes which are alternately superposed; the monomer film layer close to the substrate is a high-refractive index monomer film layer; the monomer film layer superposed on the uppermost layer is a monomer film layer with low refractive index; the thicknesses of the monomer film layers are different, and the high refractive index monomer film layers and the low refractive index monomer film layers are the same in number.
2. Composite layer antireflective according to claim 1A film, wherein the high refractive index monomer film layer has a thickness diH＝λi/(4nH) (ii) a The thickness of the low refractive index monomer film layer is diL＝λi/(4nL)；
Wherein,
λi＝λmin+(i-1/2)(λmax-λmin)/N；
nL、nHthe refractive indexes of the low-refractive index monomer film layer material and the high-refractive index monomer film layer material are respectively set;
λminand λmaxRespectively, a minimum wavelength and a maximum wavelength of the visible range;
i is a natural number; n is equal part of visible wavelength range.
3. The antireflection film with composite layers as claimed in claim 1, wherein the material of the high refractive index monomer film layer is any one of silicon monoxide, aluminum oxide and cerium fluoride.
4. The antireflection film with composite layers as claimed in claim 1, wherein the material of the low refractive index monomer film layer is any one of magnesium fluoride, calcium fluoride, aluminum fluoride and lead fluoride.
5. The preparation method of the composite layer antireflection film is characterized by comprising the following steps of:
s01, arranging a high-refractive index monomer film layer made of a high-refractive index material on the surface of the base material;
s02, arranging a low-refractive index monomer film layer with a low refractive index as a material on the surface of the high-refractive index monomer film layer;
s03, repeating the steps S01 and S02 for multiple times to obtain the antireflection film with the composite layer.
6. The method according to claim 5, wherein the high refractive index monomer film layer has a thickness diH＝λi/(4nH) (ii) a The thickness of the low refractive index monomer film layer is diL＝λi/(4nL)；
Wherein,
λi＝λmin+(i-1/2)(λmax-λmin)/N；
nL、nHthe refractive indexes of the low-refractive index monomer film layer material and the high-refractive index monomer film layer material are respectively set;
λminand λmaxRespectively, a minimum wavelength and a maximum wavelength of the visible range;
i is a natural number; n is equal part of visible wavelength range.
7. The method according to claim 5, wherein the high refractive index monomer film layer is made of any one of silicon monoxide, aluminum oxide and cerium fluoride.
8. The method according to claim 5, wherein the low refractive index monomer film layer is made of any one of magnesium fluoride, calcium fluoride, aluminum fluoride and lead fluoride.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102689439A (en) * | 2011-03-22 | 2012-09-26 | 株式会社小糸制作所 | Welding method and welding apparatus |
| CN104749784A (en) * | 2015-03-26 | 2015-07-01 | 上海师范大学 | Application of light splitting element capable of rapidly adjusting central work wavelength of diffracted wave |
| CN105268110A (en) * | 2014-06-19 | 2016-01-27 | 昆山科技大学 | Jaundice phototherapy device |
| CN108897077A (en) * | 2018-09-04 | 2018-11-27 | 浙江舜宇光学有限公司 | Film layer structure and camera lens for resin lens |
| CN114296169A (en) * | 2021-12-30 | 2022-04-08 | 神华国华永州发电有限责任公司 | Filter for near-infrared dual-band imaging and design method thereof |
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2010
- 2010-01-29 CN CN201010105358A patent/CN101793981A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102689439A (en) * | 2011-03-22 | 2012-09-26 | 株式会社小糸制作所 | Welding method and welding apparatus |
| CN102689439B (en) * | 2011-03-22 | 2014-11-05 | 株式会社小糸制作所 | Welding method and welding apparatus |
| US9061468B2 (en) | 2011-03-22 | 2015-06-23 | Koito Manufacturing Co., Ltd. | Welding method and welding apparatus |
| CN105268110A (en) * | 2014-06-19 | 2016-01-27 | 昆山科技大学 | Jaundice phototherapy device |
| CN105268110B (en) * | 2014-06-19 | 2018-03-13 | 昆山科技大学 | Jaundice phototherapy device |
| CN104749784A (en) * | 2015-03-26 | 2015-07-01 | 上海师范大学 | Application of light splitting element capable of rapidly adjusting central work wavelength of diffracted wave |
| CN108897077A (en) * | 2018-09-04 | 2018-11-27 | 浙江舜宇光学有限公司 | Film layer structure and camera lens for resin lens |
| CN114296169A (en) * | 2021-12-30 | 2022-04-08 | 神华国华永州发电有限责任公司 | Filter for near-infrared dual-band imaging and design method thereof |
| CN114296169B (en) * | 2021-12-30 | 2024-07-30 | 国家能源集团永州发电有限公司 | Filter for near infrared dual-band imaging and design method thereof |
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Application publication date: 20100804 |