CN101826448A - Substrate buffering unit - Google Patents
Substrate buffering unit Download PDFInfo
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- CN101826448A CN101826448A CN201010123013A CN201010123013A CN101826448A CN 101826448 A CN101826448 A CN 101826448A CN 201010123013 A CN201010123013 A CN 201010123013A CN 201010123013 A CN201010123013 A CN 201010123013A CN 101826448 A CN101826448 A CN 101826448A
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- 239000000758 substrate Substances 0.000 title claims abstract description 90
- 230000003139 buffering effect Effects 0.000 title claims abstract description 26
- 238000001514 detection method Methods 0.000 claims description 8
- 230000000052 comparative effect Effects 0.000 claims description 2
- 238000010926 purge Methods 0.000 abstract description 4
- 230000007246 mechanism Effects 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 14
- 230000003028 elevating effect Effects 0.000 description 11
- 230000032258 transport Effects 0.000 description 11
- 239000011521 glass Substances 0.000 description 10
- 239000000428 dust Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 230000002411 adverse Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000008676 import Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G45/00—Lubricating, cleaning, or clearing devices
- B65G45/10—Cleaning devices
- B65G45/22—Cleaning devices comprising fluid applying means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/067—Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Warehouses Or Storage Devices (AREA)
Abstract
The invention provides a kind of substrate buffering unit.This substrate buffering unit makes to a direction substrate conveying to be kept out of the way temporarily, can be expeditiously with the air purge cushion space.This substrate buffering unit will substrate conveying be accommodated in substrate transport path temporarily, and substrate is kept out of the way from the aforesaid substrate transport path, wherein, comprise: the housing of case shape, its upper surface open; Mounting portion, it is used for mounting and is moved into substrate in the above-mentioned housing from the aforesaid substrate transport path; The shelf portion of case shape, it is configured to above-mentioned mounting portion is moved to the assigned position that leaves from the aforesaid substrate transport path; The air introducing port, it is arranged on the side of above-mentioned shelf portion, is used for importing clean air to above-mentioned mounting portion; Exhaust component, it is connected in above-mentioned shelf portion, is used to aspirate the air in this shelf portion and this air is discharged to outside the above-mentioned housing; Exhausting window, its above-mentioned shelf of ratio portion that is arranged on above-mentioned housing side is used for the atmosphere in this housing is carried out exhaust by on the position of below.
Description
Technical field
The present invention relates to a kind of substrate buffering unit that is used for making the glass substrate carried in substrate transport path, for example flat-panel monitor (FPD) is adopted temporarily to keep out of the way from substrate transport path, particularly relate to a kind of can be expeditiously with the substrate buffering unit in space in the air purge buffer unit.
Background technology
In the manufacture process of FPD, adopt photoetching technique in order to form circuit pattern on the glass substrate of using at FPD.Utilize photoetching process to form that circuit pattern is as described below to carry out like this: coating liquid against corrosion on glass substrate and form resist film, make the resist film exposure accordingly with circuit pattern, it is carried out development treatment.In order to form circuit pattern, adopt the manufacturing line that forms along the each processing unit of carrying production line (substrate transport path) setting to carry out processing such as the coating of liquid against corrosion, development treatment.When glass substrate is transferred on carrying production line, manage the unit throughout and be implemented predetermined process.
But, on above-mentioned manufacturing line, usually, make glass substrate carry out buffer unit certainly from carry production line to keep out of the way temporarily in order to be adjusted at the opportunity that receives and surrender substrate between the each processing unit, to be provided with.
As this buffer unit, this case applicant discloses the buffer unit (below be called the lift buffer unit) of such lift formula in patent documentation 1,, take out of or move into substrate by the frame portion lifting that allows to multilayer mounting glass substrate that is.
Substrate according to disclosed lift buffer unit in Fig. 7 simple declaration patent documentation 1 is kept out of the way action.Lift buffer unit 200 shown in (a)～Fig. 7 of Fig. 7 (c) comprise be arranged on carry on the production line and have with the frame portion 205 of the 202a～202f of substrate-placing portion of multilayer setting and can serve as with these 205 supportings can lifting moving elevating mechanism 206.
When needs made substrate keep out of the way in the lift buffer unit 200, the driving of the auxiliary conveyor belt mechanism 210 in directions X downstream stopped.And shown in Fig. 7 (a), first substrate G1 that transports from the directions X upstream side is by mouthful 201a that moves into of housing 201, and when whole base plate was positioned in the 202a of mounting portion and goes up, conveyer mechanism 250a stopped.Thus, become substrate G1 and be positioned in state on the 202a of mounting portion.
Then, when the directions X upstream side transports next substrate G2, being connected between conveyer mechanism 250a and its drive source is disengaged.
Then, utilize elevating mechanism 206 that frame portion 205 is risen, make among the 202b～202f of mounting portion any, be that the 202b of mounting portion is consistent with the height of carrying production line like that shown in for example Fig. 7 (b), the conveyer mechanism 250b of the 202b of mounting portion is connected in its drive division and drives this conveyer mechanism 250b.At this, substrate G 1 becomes the state of together carrying production line to keep out of the way certainly with the 202a of mounting portion.Then, when whole base plate G2 was positioned on the 202b of mounting portion, the driving of conveyer mechanism 250b was stopped.
By this operation repeatedly, till the holding state that substrate is carried is disengaged, carry follow-up substrate G3, the G4 that transport on the production line ... be positioned in respectively the 202c of mounting portion, 202d ... on take care of (with reference to (c) of Fig. 7).
But above-mentioned lift buffer unit 200 together is arranged in the clean room with other unit.Be provided with the clean air feedway that is known as FFU (fan filter unit) at the top of clean room, thus, form the vertical laminar flow that air flows downwards.
In the past, utilize this sinking to guarantee indoor cleannes and then guaranteed to contain cleannes in the shelf portion 205 of substrate.
That is, as shown in Figure 8, be drawn in the housing 201 for the clean air that will flow to the below and open from the top as the upper surface of the housing 201 of Shell Plate.Therefore, the sinking in the clean room flow in the housing 201 from the upper surface of housing 201, forms to move into from substrate to take out of flowing of clean air that a mouthful 201a, 201b flow out.
Patent documentation 1: TOHKEMY 2007-250671 communique
But, in above-mentioned structure, shelf portion 205 utilizes elevating mechanism 206 in housing 201 during lifting moving, and the volume in the space 207 of shelf portion 205 belows changes as shown in Figure 9, destruction is formed on flowing of air in the housing 201, might produce unfavorable condition.
That is, during each shelf portion 205 lifting moving, the volume in the space 207 of its below all changes and is compressed expansion, therefore, roll dust from elevating mechanism 206, dust flow in the shelf portion 205, is created in to adhere to the such problem of dust on the substrate of mounting in shelf portion 205.
Summary of the invention
The present invention promptly makes under situation as described above, and its purpose is to provide a kind of substrate buffering unit of temporarily keeping out of the way to a direction substrate conveying that makes, wherein, and can be expeditiously with the air purge cushion space.
In order to address the above problem, substrate buffering unit of the present invention is accommodated substrate conveying on substrate transport path temporarily, and this substrate is kept out of the way from the aforesaid substrate transport path, it is characterized in that, comprising: the housing of case shape, its upper surface open; Mounting portion, it is used for mounting and is moved into substrate in the above-mentioned housing from the aforesaid substrate transport path; The shelf portion of case shape, it is configured to above-mentioned mounting portion is moved to the assigned position that leaves from the aforesaid substrate transport path; The air introducing port, it is arranged on the side of above-mentioned shelf portion, is used for importing clean air to above-mentioned mounting portion; Exhaust component, it is connected in above-mentioned shelf portion, is used to aspirate the air in this shelf portion and this air is discharged to outside the above-mentioned housing; Exhausting window, its above-mentioned shelf of ratio portion that is arranged on above-mentioned housing side is used for the atmosphere in this housing is carried out exhaust by on the position of below.
By exhaust component is set like this, in housing, clean air is imported into forcibly from a side of shelf portion, flows and is discharged to a direction.And,, can discharge expeditiously and not be directed in the shelf portion and flow to the clean air of shelf subordinate side by exhausting window being set in the lower part of frame side.
In addition, in housing, can make upper space be in malleation all the time, produce rolling of air in the lower space thereby can be suppressed at respect to lower space.
Also best above-mentioned exhausting window utilization opens and closes a plurality of open and close members that freely are provided with separately can change the aperture area of this exhausting window multistagely.
This substrate buffering unit also preferably includes the air pressure of the upper space that is used to detect in the above-mentioned housing and lower space or is used to detect upper space in the above-mentioned housing and the lower space air pressure detection part of any air pressure wherein, can carry out the driven for opening and closing parts of driven for opening and closing at each above-mentioned open and close member, and control any control assembly in above-mentioned driven for opening and closing parts and the above-mentioned exhaust component at least, above-mentioned control assembly is according to the comparative result of the atmospheric pressure value of the testing result of above-mentioned air pressure detection part and regulation, at least determine any in the exhaust output of the aperture area of above-mentioned exhausting window and above-mentioned exhaust component, control any in above-mentioned driven for opening and closing parts and the above-mentioned exhaust component at least.
By constituting in this wise, change the exhaust output of the aperture area and the exhaust component of exhausting window according to the lifting moving of shelf portion, can in housing, form stable sinking.
Thereby, in housing, suppress air and produce adverse current, roll, can prevent to flow in the shelf portion from the dust that drive systems such as motor produce.
The side that also is preferably in above-mentioned case shape shelf portion is provided with first cowling panel, and this first cowling panel is used for the clean air that the side in this shelf portion flows down is directed to above-mentioned exhausting window.
The upper surface that also is preferably in above-mentioned case shape shelf portion is provided with second cowling panel, and the clean air that this second cowling panel is used for flowing down from the top is directed to the side of this shelf portion.
By first, second cowling panel is set like this, the clean air that will import from the top carries out rectification and suppresses turbulization, can form towards shelf portion side and exhausting window flow by the air flows after the rectification.
Adopt the present invention, can obtain to make the substrate buffering unit of temporarily keeping out of the way to a direction substrate conveying, wherein, can be expeditiously with the air purge cushion space.
Description of drawings
Fig. 1 is the sectional view of substrate buffering unit of the present invention.
Fig. 2 is that A-A among Fig. 1 is to view.
Fig. 3 is that B-B among Fig. 2 is to view.
Fig. 4 is that C-C among Fig. 2 is to view.
Fig. 5 is the block diagram of open and close controlling that is used for the exhausting window that substrate buffering unit had of key diagram 1.
Fig. 6 is the figure that the aperture area of expression exhausting window changes step by step.
Fig. 7 is used for the substrate of lift buffer unit is kept out of the way the figure that action describes.
Fig. 8 is the cutaway view that the air flows in the lift buffer unit of representing in the past forms.
Fig. 9 is the cutaway view that another air flows in the lift buffer unit of representing in the past forms.
Embodiment
Below, describe the execution mode of substrate buffering unit of the present invention with reference to the accompanying drawings in detail.Substrate buffering unit of the present invention for example is arranged on and forms on the manufacturing line of circuit pattern by photo-mask process, and the glass substrate that will use as the FPD of processed substrate is accommodated temporarily and it is kept out of the way.In the following embodiments, the example that is applied to the lift buffer unit is described.
Fig. 1 is the sectional view of substrate buffering unit of the present invention, Fig. 2 be A-A among Fig. 1 to view, Fig. 3 be B-B among Fig. 2 to view, Fig. 4 is that C-C among Fig. 2 is to view.
Illustrated substrate buffering unit 100 comprises and can be in unit housings 1 supports this shelf portion 2 as the shelf portion 2 of the case shape of the glass substrate G of processed substrate and from the below with multilayer (among the figure being 5 layers) mounting and make the elevating mechanism 3 of these shelf portion 2 lifting moving.
Glass substrate G is moved into this substrate buffering unit 100 from mouthful 1a that moves into of unit housings shown in Figure 11, on being accommodated in shelf portion 2 after, suitably mouthful 1b that takes out of from opposition side is taken out of from this substrate buffering unit 100.
Moving into mouthful 1a and take out of mouthful 1b carry the height and position of production line (substrate transport path) to be provided with aligning in the above-mentioned housing 1 with the substrate of the so-called advection mode that is arranged on the upstream of substrate buffering unit 100 and downstream.
As shown in Figure 1, 2, shelf portion 2 has the shell 20 of case shape, in this shell 20 for example with 5 layers of mounting portion 6 that is provided with substrate G.In shell 20,, be provided with a plurality of substrates accordingly with the mounting portion 6 of each layer and move into mouthful 2a and take out of a mouthful 2b in the side of taking out of a mouthful 1a, 1b towards moving into of above-mentioned housing 1.
Shelf portion 2 (shell 20) utilize elevating mechanism 3 can be in housing 1 lifting moving, therefore, move into or take out of under the situation of glass substrate G in mounting portion 6 with respect to specified layer, shelf portion 2 is made the mounting portion 6 of this specified layer become the above-mentioned height of moving into mouthful 1a and taking out of mouthful 1b by elevating mechanism 3 lifting moving.
In addition, with after substrate G mounting is in the mounting portion 6 of regulation, utilize elevating mechanism 3 to make shelf portion 2 lifting moving, thereby can make this substrate G carry production line to keep out of the way from substrate to the assigned position of carrying production line to leave from substrate.
In addition, as shown in Figure 2, in each mounting portion 6, be provided with a plurality of roller conveying axis 13 that are used for conveying substrate side by side, be provided with in each end of 13 and be used to drive axle rotary drive mechanism 14 each 13 rotation, that constitute by motor etc.
In addition, as shown in Figure 1 and Figure 2, the upper surface open of housing 1.Therefore, be arranged in the clean room, utilize sinking under the situation of its top supplying clean air, such as shown in the figure last direction housing 1 interior supplying clean air from housing 1 at this buffer cell 100.
At this, be provided with cowling panel 45 (second cowling panel) at the upper surface of shelf portion 2, the central portion drum dome of this cowling panel 45 will be from the sinking of top to the guiding of the side of shelf portion 2.
Be provided with the air introducing port 6a that is used for importing clean air to each mounting portion 6 in a side of shelf portion 2.A part that flows to the sinking of shelf portion 2 sides from the top flow into each mounting portion 6 from above-mentioned air introducing port 6a, forms flowing of clean air shown in arrow among Fig. 2 like that.
In each mounting portion 6, above-mentioned axle rotary drive mechanism 14 is arranged on the downstream, therefore, can not flow into each mounting portion 6 from the dust of driving mechanism.Illustrate in greater detail, above-mentioned a plurality of rotary drive mechanisms 14 quilt cover members 15 cover, and are provided with the blast pipe 16 that extends downwards in the bottom of cover member 15, and this blast pipe 16 is connected in the exhaust apparatus 30 (exhaust component) of outside.
That is,, utilize its suction force in each mounting portion 6, to import clean air, in each mounting portion 6, form the flowing of clean air of a direction forcibly from above-mentioned air introducing port 6a by exhaust apparatus 30 is set.Therefore, after the axle rotary drive mechanism 14 of clean air by the downstream, can adverse current and must be discharged to the outside.
In addition, exhaust apparatus 30 is preferably the variable structure of exhaust output, in this case, can wait according to the state that for example is fed into the sinking in the housing 1 and set best exhaust output.
In addition, as shown in Figure 3, Figure 4, move at the substrate that is not housing 1 on the left and right sides face of housing 1 of the face of taking out of, for example laterally be provided with 2 exhausting windows 40 that can open and close side by side for the atmosphere in the housing 1 is carried out exhaust in the bottom of each face.
Each exhausting window 40 have respectively a plurality of open and close members, for example have respectively longitudinally be set up in parallel 4 open closing plate 41a, 41b, 41c, 41d, these opening-closing plates 41a～41d is provided with can distinguish the mode that opens and closes independently.
Like that by driven for opening and closing parts 42a such as motor, 42b, 42c, 42d difference on-off action, each driver part 42a～42d utilizes the control part 43 (control assembly) that is made of computer to come drive controlling to preferred each opening-closing plate 41a～41d schematically shown in Figure 5.
As shown in Figure 1 and Figure 2, also be preferably in baroceptor S1 (air pressure detection part) that is provided with the air pressure that detects the upper space in the housing 1 in the housing 1 and the baroceptor S2 (air pressure detection part) that detects the air pressure of lower space, control the aperture area of above-mentioned exhausting window 40 according to these testing results.
In this case, for example the testing result of each transducer S1, S2 is respectively greater than the situation of predefined authorized pressure value, perhaps the pressure differential between the sensor S1, the S2 is that the authorized pressure value is with under the first-class situation, the aperture area of control part 43 decision exhausting windows 40 is controlled each driven for opening and closing parts 42a～42d.
At this, by the switching of opening-closing plate 41a～41d is controlled, make shelf portion 2 how the air pressure in lifting moving, the housing 1 all be that top is malleation all the time, thereby can carry out rectification and suppress to take place air and roll the air flows in the lower space in the housing 1.
At this moment, for air in the lower space that is suppressed at housing 1 is effectively rolled, each opening-closing plate 41a～41d of exhausting window 40 preferably for example opens from the opening-closing plate 41a of below in order, divides the aperture area that changes exhausting window 40 multistagely.For example, Fig. 5 represents the state that opening-closing plate 41a only opens, (a) expression opening-closing plate 41a of Fig. 6, the state that 41b opens, (b) expression opening-closing plate 41a of Fig. 6, the state that 41b, 41c open, (c) of Fig. 6 represents the state that all opening-closing plate 41a～41d open.
In addition, be provided with woven wire 44, rectification is carried out in exhaust in the inboard of opening-closing plate 41a～41d.
Also preferably according to the testing result of above-mentioned gas transducer S1, S2, control part 43 is the exhaust output of the above-mentioned exhaust apparatus 30 of control further, in this case, and can be to the further rectification of air flows in the housing 1.
In addition, as shown in Figure 2, on the side of shelf portion 2, be provided with from above sinking in, the clean air that do not flow to mounting portion 6 is directed to the cowling panel 48 (first cowling panel) of above-mentioned exhausting window 40.
In addition, the clean air that runs down into shelf portion 2 belows also is sucked in the shell 46 of elevating mechanism 3 except discharging from above-mentioned exhausting window 40.Promptly, above-mentioned shell 46 is connected in above-mentioned exhaust apparatus 30 via blast pipe 47, (during the space compression of below) aspirated forcibly only to utilize from what the exhaust of exhausting window 40 can't be discharged fully and rolled air when particularly descending in shelf portion 2, utilizes exhaust apparatus 30 that this part is rolled air and is discharged to the outside.Utilize this structure, can make the dust that produces from elevating mechanism 3 can not flow to shelf portion 2 because of rolling of air.
As mentioned above, adopt embodiments of the present invention, by exhaust apparatus 30 is set, in housing 1, clean air is imported into forcibly from a side of shelf portion 2, flows and is discharged to a direction.And, being used for discharging expeditiously and not being drawn in the shelf portion 2 and flowing to the exhausting window 40 of the clean air of shelf portion 2 belows, the mode that can freely change with its aperture area is arranged on the lower side of housing 1.
Utilize this structure, in shelf portion 2, clean air can adverse current after by axle rotary drive mechanism 14 and must be discharged to the outside.
In addition, in housing 1, upper space is a malleation with respect to lower space all the time, can be suppressed in the lower space and roll.Particularly, change the aperture area of the exhausting window 40 on the lower side that is arranged on above-mentioned housing 1 by lifting moving, can in housing 1, form stable sinking according to shelf portion 2.
Thereby, in housing 1, suppress air and produce adverse current, roll, can prevent to flow in the shelf portion 2 (mounting portion 6) from the dust that drive systems such as motor produce.
In addition, in the above-described embodiment, as the air pressure detection part that detects the air pressure in the housing 1, the baroceptor S2 that is provided with the baroceptor S1 of the air pressure that is used to detect upper space and is used to detect the air pressure of lower space, in the situation of their detected atmospheric pressure values greater than setting, perhaps under the situation of the difference of their testing result greater than setting, the switching of the opening-closing plate 41a～41d of exhausting window 40 is controlled.But, the present invention is not limited to this structure, also can baroceptor be set as the air pressure detection part at upper space in the housing 1 or in the lower space any, under the situation of the detected atmospheric pressure value of baroceptor, the switching of the opening-closing plate 41a～41d of exhausting window 40 is controlled greater than setting.
In addition, in the above-described embodiment, according to the testing result of baroceptor S1, S2, the switching of 43 couples of opening-closing plate 41a～41d of control part is controlled, more preferably the exhaust output of control part 43 control exhaust apparatus 30.
But the present invention is not limited to this, also can be according to the testing result of baroceptor S1, S2, and utilize control part 43 to control in the exhaust output of the open and close controlling of opening-closing plate 41a～41d and exhaust apparatus 30 any at least.
In addition, in the above-described embodiment, expression applies the present invention to the example of the lift buffer unit of multiple field, but the present invention is not limited to this mode.For example, can not multiple field also, also can be the base-plate buffering device of one deck, and, also can be applied to not adopt the elevating mechanism 3 of shelf portion 2 and utilize manipulator etc. to take out of or move into the buffer unit of a plurality of substrates.
Claims (5)
1. substrate buffering unit, it is used for to accommodate in the substrate transport path substrate conveying temporarily this substrate being kept out of the way from the aforesaid substrate transport path, it is characterized in that,
Comprise:
The housing of case shape, its upper surface open;
Mounting portion, it is used for mounting and is moved into substrate in the above-mentioned housing from the aforesaid substrate transport path;
The shelf portion of case shape, it is configured to above-mentioned mounting portion is moved to the assigned position that leaves from the aforesaid substrate transport path;
The air introducing port, it is arranged on the side of above-mentioned shelf portion, is used for importing clean air to above-mentioned mounting portion;
Exhaust component, it is connected in above-mentioned shelf portion, is used to aspirate the air in this shelf portion and this air is discharged to outside the above-mentioned housing;
Exhausting window, its above-mentioned shelf of ratio portion that is arranged on above-mentioned housing side is used for the atmosphere in this housing is carried out exhaust by on the position of below.
2. substrate buffering unit according to claim 1 is characterized in that,
Utilize to open and close a plurality of open and close members that freely are provided with separately, the aperture area of above-mentioned exhausting window can be changed multistagely.
3. substrate buffering unit according to claim 2 is characterized in that,
The aforesaid substrate buffer cell comprise the air pressure of the upper space that is used for detecting in the above-mentioned housing and lower space or upper space in the above-mentioned housing and lower space any air pressure the air pressure detection part, can carry out the driven for opening and closing parts of driven for opening and closing and control any control assembly in above-mentioned driven for opening and closing parts and the above-mentioned exhaust component at least at each above-mentioned open and close member;
Above-mentioned control assembly is according to the comparative result of the atmospheric pressure value of the testing result of above-mentioned air pressure detection part and regulation, at least determine any in the exhaust output of the aperture area of above-mentioned exhausting window and above-mentioned exhaust component, control any in above-mentioned driven for opening and closing parts and the above-mentioned exhaust component at least.
4. according to each described substrate buffering unit in the claim 1～3, it is characterized in that,
Be provided with first cowling panel on the side of above-mentioned case shape shelf portion, this first cowling panel is used for the clean air that the side in this shelf portion flows down is directed to above-mentioned exhausting window.
5. according to each described substrate buffering unit in the claim 1～3, it is characterized in that,
Be provided with second cowling panel on the upper surface of above-mentioned case shape shelf portion, the clean air that this second cowling panel is used for flowing down from the top is directed to the side of this shelf portion.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009052945A JP4873506B2 (en) | 2009-03-06 | 2009-03-06 | Substrate buffer unit |
| JP2009-052945 | 2009-03-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101826448A true CN101826448A (en) | 2010-09-08 |
| CN101826448B CN101826448B (en) | 2012-05-30 |
Family
ID=42690293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010123013XA Expired - Fee Related CN101826448B (en) | 2009-03-06 | 2010-02-25 | Substrate buffering unit |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4873506B2 (en) |
| KR (1) | KR20100100682A (en) |
| CN (1) | CN101826448B (en) |
| TW (1) | TWI401199B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108369919A (en) * | 2015-11-27 | 2018-08-03 | 株式会社日立国际电气 | Substrate processing device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001284426A (en) * | 2000-03-29 | 2001-10-12 | Nikon Corp | Wafer lifting device |
| JP3631997B2 (en) * | 2001-12-26 | 2005-03-23 | 株式会社クリーントランスポートマトリックス | Particle contamination prevention method and particle contamination prevention structure |
| JP4884039B2 (en) * | 2006-03-14 | 2012-02-22 | 東京エレクトロン株式会社 | Substrate buffer apparatus, substrate buffering method, substrate processing apparatus, control program, and computer-readable storage medium |
| JP4435799B2 (en) * | 2007-03-19 | 2010-03-24 | 東京エレクトロン株式会社 | Open / close valve and processing apparatus provided with the open / close valve |
-
2009
- 2009-03-06 JP JP2009052945A patent/JP4873506B2/en not_active Expired - Fee Related
-
2010
- 2010-02-25 CN CN201010123013XA patent/CN101826448B/en not_active Expired - Fee Related
- 2010-03-01 TW TW099105817A patent/TWI401199B/en not_active IP Right Cessation
- 2010-03-05 KR KR1020100019630A patent/KR20100100682A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108369919A (en) * | 2015-11-27 | 2018-08-03 | 株式会社日立国际电气 | Substrate processing device |
| CN108369919B (en) * | 2015-11-27 | 2022-10-25 | 株式会社国际电气 | Substrate processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4873506B2 (en) | 2012-02-08 |
| TW201033101A (en) | 2010-09-16 |
| JP2010206123A (en) | 2010-09-16 |
| KR20100100682A (en) | 2010-09-15 |
| TWI401199B (en) | 2013-07-11 |
| CN101826448B (en) | 2012-05-30 |
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