CN101892015B - Fluorine-free polishing agent composition - Google Patents
Fluorine-free polishing agent composition Download PDFInfo
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- CN101892015B CN101892015B CN 201010246593 CN201010246593A CN101892015B CN 101892015 B CN101892015 B CN 101892015B CN 201010246593 CN201010246593 CN 201010246593 CN 201010246593 A CN201010246593 A CN 201010246593A CN 101892015 B CN101892015 B CN 101892015B
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Abstract
The invention discloses a fluorine-free polishing agent composition. The composition consists of the following components in percentage by weight: 20.0 to 60.0 percent of acrylate-styrene polymer emulsion, 0.01 to 2.0 percent of wetting and flatting agent, 2.0 to 10.0 percent of film forming aid, 0.5 to 3.5 percent of tri-butoxyethyl phosphate, 0.0 to 10.0 percent of wax emulsion, 0.0 to 10.0 percent of alkali-soluble resin, 0.0 to 1.0 percent of antifoaming agent, 0.0 to 0.5 percent of bactericide and the balance of water. A polyether organic silicon surfactant is used for replacing a fluorine-containing surfactant so as to ensure the wetting and flatting agent for nursing a coating and reduce the pollution of fluorine to the environment.
Description
Technical field
The present invention relates to chemical technology field, a kind of polishing agent combination particularly, this polishing agent combination is applicable to various ground, furniture, vehicle etc.
Background technology
Polishing agent combination is widely used in being coated with of surfaces of various materials and is covered with, and plays modification, repairs and protect the surface of these materials.But usually all use fluorine-containing surfactant as moistening flatting agent in the present employed polishing agent combination, along with polishing agent coating abrasion or removal, the contained fluorine of coating also enters in the water with waste liquid, causes fluorine element to pollute.
The harm main manifestations of fluorine is impact that farming animals are herded and people's impact.Fluorine makes the concentration of hazard of plant only be equivalent to 1% of sulfur dioxide, and plant is after absorbing, putting aside fluorine, and leaf tip and edge are withered and yellow to wither, crops depauperation when serious, and the underproduction is in poor harvest; Serious fluorine poisoning can cause house to hold bone injury distortion, fracture so that the death of becoming thin.The high concentration fluoride pollution can cause skin burn, dermatitis, respiratory inflammation, and low dose fluoride pollutes the fluorine poisoning then can cause human teeth and bone, causes tooth defect, comes off or waist has a pain in the leg, joint deformity, calcification etc.In recent years research finds that also fluoride not only is confined to bone and tooth to the toxic action of human body, can also cause that metabolism is disorderly, even indirectly cause a series of even more serious consequences.
Therefore, the not fluorine-containing polishing agent combination of exploitation is conducive to reduce fluorine element and pollutes, thereby reduces fluorine element to human and vegeto-animal harm.
Summary of the invention
The purpose of this invention is to provide a kind of not fluorine-containing polishing agent combination.
The objective of the invention is to realize by following scheme:
A kind of not fluorine-containing polishing agent combination, said composition is comprised of following substances:
The acrylate styrene polymer emulsion of 20.0%～60.0% weight,
The moistening flatting agent of 0.01%～2.0% weight,
The coalescents of 2.0%～10.0% weight,
The three butoxy ethyl ester of phosphoric acid of 0.5%～3.5% weight,
The wax emulsion of 0.0%～10.0% weight,
The alkali soluble resins of 0.0%～10.0% weight,
0.0%～1.0% defoamer,
0.0%～0.5% bactericide, and
The water of surplus, total weight is in 100%.
The acrylate styrene polymer emulsion that described acrylate styrene polymer emulsion is metal corsslinking does not contain fluorine element in this polymer emulsion, and the solid content of emulsion is between 15.0%～50.0%, and glass transition temperature is between 25 ℃～85 ℃.
Described moistening flatting agent is not fluorine-containing polyethers organic silicon surfactant.
Described coalescents is one or more in diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, propandiol butyl ether, propylene glycol phenylate, the dibutyl phthalate.
Described wax emulsion is one or more in polythene wax emulsion, polypropylene wax emulsion, oxidized polyethylene wax emulsion, its chlorinated polypropylene wax emulsion.
The present invention has utilized the polyethers organic silicon surfactant to replace traditional fluorine-containing surfactant and has made moistening flatting agent, and select not fluorine-containing acrylate polymer emulsion and other not fluorine-containing promoter materials, obtained polishing agent combination of the present invention, said composition had both guaranteed the moistening flatting agent of nursing coating, had reduced again the pollution of fluorine to environment.
Embodiment
Following examples further specify application of the present invention, but scope of the present invention are not produced any restriction.
In following examples, the main raw material(s) of using is described as follows:
Sunpolymer-100, zinc cross linked acrylic styrene polymer emulsion, solid content 38%, 45 ℃ of glass transition temperatures, Shanghai Sanrui Chemistry Co., Ltd produces;
Sunpolymer-300, zinc cross linked acrylic styrene polymer emulsion, solid content 38%, 65 ℃ of glass transition temperatures, Shanghai Sanrui Chemistry Co., Ltd produces;
Tegopren 5840, polyethers organic silicon surfactant, German goldschmidt chemical corporation production;
Tegopren 5878, polyethers organic silicon surfactant, German goldschmidt chemical corporation production;
WE1401, polythene wax emulsion is because safe polymer trade (Shanghai) Co., Ltd. produces;
Tego 314XP, defoamer, German goldschmidt chemical corporation production;
Primal 1531, alkali soluble resins, and Rhom and Hass produces.
The method of testing of using is as follows:
Glossiness: on the black marble of a 20cm * 40cm, with soft gauze sponge first from above-below direction, again from left and right directions, polishing agent is coated on the surface equably.Cover ratio and be approximately 20g/m
2Be 30 minutes (application conditions: influential to drying time such as temperature and relative humidity) the minimum drying time between each the application, be coated with altogether twice. survey specular gloss with 60 ° of mirror image glossometers again, get altogether 6 points, its mean value is the gloss of polishing agent.
Wetting levelability: after coating was finished, then the marble surface diagonal angle mark signature trace after just being painted with at once observed the wettability of polishing agent combination and base material, smooth coating degree.
Very good: polishing agent and base material complete wetting, do not produce any shrinkage cavity, it is very smooth to film;
Fine: polishing agent and base material complete wetting, produce few shrinkage cavity, it is very smooth to film;
Good: polishing agent and base material are wetting, produce few shrinkage cavity, the significantly cut of having filmed not;
Poor: polishing agent and base material are wetting, produce more shrinkage cavity, the cut of having filmed;
Very poor: polishing agent and base material are nonwetting, produce a lot of shrinkage cavities, and the cut of filming is obvious.
Embodiment 1
A kind of polishing agent combination, its prescription is (percentage by weight):
Table 1 polishing agent combination A prescription
| Sequence number | Form | Consumption |
| 1 | Deionized water | 51.20 |
| 2 | Tegopren 5878 | 0.10 |
| 3 | Tego 314XP | 0.10 |
| 4 | Diethylene glycol monoethyl ether | 4.00 |
| 5 | Three butoxy ethyl ester of phosphoric acid | 1.60 |
| 6 | Sunpolymer-100 | 35.00 |
| 7 | WE1401 | 8.00 |
Under stirring action, in reactor, add component according to upper tabular order order, after being uniformly dispersed, a component adds again next component, after all components adds complete and is uniformly dispersed, continue again to stir about 30 minutes, obtain polishing agent combination A.
Embodiment 2
A kind of polishing agent combination, its prescription is (percentage by weight):
Table 2 polishing agent combination B prescription
| Sequence number | Form | Consumption |
| 1 | Deionized water | 44.30 |
| 2 | Tegopren 5840 | 0.30 |
| 3 | Tego 314XP | 0.10 |
| 4 | Diethylene glycol monoethyl ether | 4.50 |
| 5 | Dipropylene glycol monomethyl ether | 2.00 |
| 6 | Three butoxy ethyl ester of phosphoric acid | 1.80 |
| 7 | Sunpolymer-300 | 45.00 |
| 8 | Primal 1531 | 2.00 |
Under stirring action, in reactor, add component according to upper tabular order order, after being uniformly dispersed, a component adds again next component, after all components adds complete and is uniformly dispersed, continue again to stir about 30 minutes, obtain polishing agent combination B.
Comparative example
Prescription is identical with polishing agent combination A with the preparation method, but changes moistening flatting agent into fluorine surfactant FC-120 that 3M company provides by Tegopren 5878.The product called after polishing agent combination C that obtains.
Performance test:
The polishing agent combination of embodiment 1-2, comparative example preparation is coated with twice at black marble, and wetting flow leveling and the glossiness of comparative product the results are shown in Table 3.
Table 3 the performance test results
| Polishing agent combination A | Polishing agent combination B | Polishing agent combination C | |
| Glossiness/60 ° | 82 | 86 | 81 |
| Wetting levelability | Very good | Very good | Very good |
Claims (3)
1. not fluorine-containing polishing agent combination is characterized in that said composition is comprised of following substances:
The acrylate styrene polymer emulsion of 20.0%～60.0% weight,
The moistening flatting agent of 0.01%～2.0% weight,
The coalescents of 2.0%～10.0% weight,
The three butoxy ethyl ester of phosphoric acid of 0.5%～3.5% weight,
The wax emulsion of 0.0%～8.0% weight,
The alkali soluble resins of 0.0%～10.0% weight,
0.0%～1.0% defoamer,
0.0%～0.5% bactericide, and
The water of surplus, total weight is in 100%; Wherein:
Described moistening flatting agent is not fluorine-containing polyethers organic silicon surfactant;
Described coalescents is one or more in diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, propandiol butyl ether, propylene glycol phenylate, the dibutyl phthalate;
Described wax emulsion is one or more in polythene wax emulsion, polypropylene wax emulsion, oxidized polyethylene wax emulsion, its chlorinated polypropylene wax emulsion;
Described alkali soluble resins is Primal 1531.
2. polishing agent combination according to claim 1 is characterized in that the acrylate styrene polymer emulsion that described acrylate styrene polymer emulsion is metal corsslinking.
3. polishing agent combination according to claim 2, it is characterized in that not containing fluorine element in its chemical composition of acrylate styrene polymer emulsion of described metal corsslinking, and the solid content of emulsion is between 15.0%～50.0%, and glass transition temperature is between 25 ℃～85 ℃.
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| CN 201010246593 CN101892015B (en) | 2010-08-06 | 2010-08-06 | Fluorine-free polishing agent composition |
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| CN 201010246593 CN101892015B (en) | 2010-08-06 | 2010-08-06 | Fluorine-free polishing agent composition |
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| CN101892015B true CN101892015B (en) | 2013-04-03 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102643586A (en) * | 2012-05-08 | 2012-08-22 | 合众（佛山）化工有限公司 | High-solid-content quick-drying water-based white primer and preparation method thereof |
| CN104974673A (en) * | 2014-12-02 | 2015-10-14 | 裴萌 | Shoe polish |
| CN105538714B (en) * | 2015-12-30 | 2018-08-07 | 中山大学惠州研究院 | A kind of 3D printing product polishing agent and preparation method thereof and polishing method |
| CN107541729A (en) * | 2017-09-21 | 2018-01-05 | 安徽霍山龙鑫金属科技有限公司 | A kind of high-performance environment-friendly metal polish and preparation method thereof |
| CN108624238B (en) * | 2018-05-15 | 2020-09-18 | 江苏雪豹日化有限公司 | Durable wear-resistant floor polishing agent and preparation method thereof |
| CN109575733B (en) * | 2018-12-06 | 2021-02-05 | 山东中佳生活服务有限公司 | Safe and environment-friendly anti-skid composition and application thereof in vehicles |
| CN113322008A (en) * | 2021-05-10 | 2021-08-31 | 南京卓胜自动化设备有限公司 | Single crystal alkali polishing additive, polishing solution and polishing method |
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| JP4776269B2 (en) * | 2005-04-28 | 2011-09-21 | 株式会社東芝 | Metal film CMP slurry and method for manufacturing semiconductor device |
| CN100478413C (en) * | 2007-04-25 | 2009-04-15 | 上海三瑞化学有限公司 | Low-luster polishing agent combination and preparation method thereof |
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