CN102501450A - Light-transmission single-silver low radiation coated glass and manufacturing method for same - Google Patents
Light-transmission single-silver low radiation coated glass and manufacturing method for same Download PDFInfo
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- CN102501450A CN102501450A CN2011103817576A CN201110381757A CN102501450A CN 102501450 A CN102501450 A CN 102501450A CN 2011103817576 A CN2011103817576 A CN 2011103817576A CN 201110381757 A CN201110381757 A CN 201110381757A CN 102501450 A CN102501450 A CN 102501450A
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- silver
- dielectric
- glass
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- 239000011521 glass Substances 0.000 title claims abstract description 50
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 38
- 239000004332 silver Substances 0.000 title claims abstract description 38
- 230000005855 radiation Effects 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 238000004544 sputter deposition Methods 0.000 claims abstract description 18
- 239000000919 ceramic Substances 0.000 claims abstract description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 34
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 23
- 239000001301 oxygen Substances 0.000 claims description 23
- 229910052760 oxygen Inorganic materials 0.000 claims description 23
- 239000012300 argon atmosphere Substances 0.000 claims description 18
- 229910052786 argon Inorganic materials 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 4
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 4
- 229910007717 ZnSnO Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims description 3
- 230000007704 transition Effects 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 7
- 238000009413 insulation Methods 0.000 abstract description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 238000002310 reflectometry Methods 0.000 abstract description 3
- 238000004321 preservation Methods 0.000 abstract description 2
- 230000004888 barrier function Effects 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 67
- 239000000047 product Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 2
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Abstract
The invention discloses multi-layered structure coated glass produced by a vacuum sputtering method, and particularly relates to light-transmission single-silver low radiation coated glass and a manufacturing method for the same. The coated glass comprises a glass substrate and coated film layers coated on the glass substrate, and is characterized in that based on the glass substrate, the coated film layers sequentially include a first dielectric layer, a second dielectric layer, a silver layer, a third dielectric layer, a fourth dielectric layer and a fifth dielectric layer from inside to outside. The glass film layers include the silver layer with infrared reflectivity and the dielectric layers for decreasing visible light reflection and protecting the silver layer, the dielectric layers behind the silver layer are made of novel ceramic AZO, an existing metal barrier layer is replaced, a film layer framework is optimized, the coated glass obtains transmittance equal to or even higher than that of a common transparent raw sheet as thick as the coated glass, and the coated glass is transparent and natural, and has fine heat insulation and heat preservation effects.
Description
Technical field
The present invention relates to a kind of coated glass, specifically is a kind of printing opacity list silver low radiation coated glass and manufacturing approach thereof.
Background technology
Common in the market single silver low radiation plated film product; Owing to use metallic diaphragm as the silver layer protective layer; Often printing opacity can not be accomplished very highly, and the existence of metal level protective layer also makes rete that the absorption of light is increased, and it is limpid inadequately, penetrating to make glass take a fancy to.
Summary of the invention
Technical purpose of the present invention is to solve the problem that exists in the prior art, and a kind of limpid, penetrating low radiation coated glass and manufacturing approach thereof are provided.
Technical scheme of the present invention is:
A kind of printing opacity list silver low radiation coated glass comprises glass substrate and is plated in the plated film rete on the glass substrate, it is characterized in that:
With the glass substrate is the basis, and said plated film rete comprises first dielectric layer, second dielectric layer, silver layer, the 3rd dielectric layer, the 4th dielectric layer and the 5th dielectric layer from inside to outside successively;
Wherein, the 3rd dielectric layer is the AZO layer, and the effect of this rete is that the protection silver layer is not oxidized, and improves the adhesive force of silver layer and other rete;
Further technical scheme also comprises:
First dielectric layer is the NbOx layer, and according to the difference of coating process condition enactment, the final material that forms of plated film is a kind of in the niobium oxide.The effect of this coating is the Na that stops in the glass
+In rete, permeate, improve the rete transmitance, can effectively increase the absorption affinity between rete and the glass substrate, and the optical property and the color of controlling diaphragm system;
Second dielectric layer is the ZnAlOx layer, and this layer plays the place mat effect to silver layer, and silver layer is film forming better above that, and the protection silver layer is not oxidized;
The material of silver layer is Ag, is used to reduce radiance, reaches heat insulation, heat preservation effect;
The 4th dielectric layer is ZnSnO
3Layer, this rete is protected whole film layer structure, reduces oxidation, improves the physics and the chemical property of rete, and the optical property and the color of controlling diaphragm system.
The material of the 5th dielectric layer is Si
3N
4Layer, the effect of this rete is between silver layer and dielectric layer, absorption affinity to be provided, and protects whole film layer structure, reduces oxidation, improves the physics and the chemical property of rete, and the optical property and the color of controlling diaphragm system.
A kind of method that is used to produce above-mentioned printing opacity list silver low radiation coated glass is characterized in that, the plated film rete on the said glass substrate adopts the vacuum magnetic-control sputtering plated film, may further comprise the steps:
Step 1, cleaning-drying glass substrate;
Step 2, carry out the forevacuum transition;
Step 3, on glass substrate, be coated with first dielectric layer, second dielectric layer, silver layer, the 3rd dielectric layer, the 4th dielectric layer, the 5th dielectric layer successively;
Said the 3rd dielectric layer exchanges negative electrode through rotation AZO target is sputter coating in straight argon or oxygen, argon atmosphere;
Further technical scheme also comprises:
Said first dielectric layer exchanges ceramic niobium oxide target sputter coating in oxygen, argon atmosphere of negative electrode through rotation;
Said second dielectric layer exchanges zinc-aluminium target sputter coating, wherein mass ratio Zn: Al=98 in oxygen, argon atmosphere of negative electrode through rotation: 2;
Said silver layer is through silver-colored target sputter in argon atmosphere of direct current planar negative electrode;
Said the 4th dielectric layer exchanges zinc-tin target sputter coating, wherein mass ratio Zn: Sn=50 in oxygen, argon atmosphere of negative electrode through rotation: 50;
Said the 5th dielectric layer exchanges sial target sputter coating, wherein mass ratio Si: Al=92 in nitrogen, argon atmosphere of negative electrode through rotation: 8;
As preferred version, when plated film first dielectric layer, the volume ratio of oxygen and argon gas was made as 1: 10;
Plated film second dielectric substrate, the volume ratio of oxygen and argon gas was made as 9: 14;
Plated film the 3rd dielectric substrate, the volume ratio of oxygen and argon gas was made as 9: 100;
Plated film the 4th dielectric substrate, the volume ratio of oxygen and argon gas was made as 3: 2;
Plated film the 5th dielectric substrate, the volume ratio of nitrogen and argon gas was made as 2: 1.
The product that the present invention produces is owing to used ceramic material AZO as the silver layer rear dielectric layer; Replaced the coat of metal in the existing product, and used the new material of high index of refraction to offset the absorption of silver layer, so that the printing opacity of product of the present invention can reach the same with stack pile glass raw sheet; Even higher transmitance; And product appearance is limpid, penetrating, can also guarantee good heat insulation, heat insulation effect, meets the demand that the consumer pursues the nature environmental protection.
Description of drawings
Fig. 1 is a structural representation of the present invention;
Fig. 2 is a schematic flow sheet of the present invention.
The specific embodiment
In order to illustrate technical scheme of the present invention and technical purpose, the present invention is done further introduction below in conjunction with the accompanying drawing and the specific embodiment.
As shown in the figure; A kind of printing opacity list silver low radiation coated glass; Comprise glass substrate and be plated in the plated film rete on the glass substrate; With the glass substrate is the basis, and said plated film rete comprises first dielectric layer, second dielectric layer, silver layer, the 3rd dielectric layer, the 4th dielectric layer and the 5th dielectric layer from inside to outside successively;
Wherein, first dielectric layer is the NbOx layer, and through ceramic niobium oxide target sputter coating in oxygen argon atmosphere of rotation interchange negative electrode, the volume ratio of oxygen and argon gas is 1: 10;
Second dielectric layer is the ZnAlOx layer, exchanges zinc-aluminium target sputter coating, wherein mass ratio Zn: Al=98 in oxygen, argon atmosphere of negative electrode through rotation: 2, and the volume ratio of oxygen and argon gas is 9: 14;
The material of silver layer is Ag, through silver-colored target sputter coating in argon atmosphere of direct current planar negative electrode;
The material of the 3rd dielectric layer is the AZO layer, and through AZO target sputter coating in oxygen, argon atmosphere of rotation interchange negative electrode, the volume ratio of oxygen and argon gas is 9: 100;
The material of the 4th dielectric layer is ZnSnO
3Layer, through rotating zinc-tin target sputter coating, wherein mass ratio Zn: the Sn=50 in oxygen, argon atmosphere that exchanges negative electrode: 50, the volume ratio of oxygen and argon gas is 3: 2;
The material of the 5th dielectric layer is Si
3N
4Layer, through rotating the sial target sputter in nitrogen, argon atmosphere that exchanges negative electrode, wherein mass ratio Si: Al=92: 8, the volume ratio of nitrogen and argon gas is 2: 1.
The present invention adopts magnetron sputtering coater to carry out the plated film of glass; Said magnetron sputtering coater comprises that 19 exchange Rotating Double negative electrode, 7 direct current planar negative electrodes, the technological parameter that the present invention adopts following table to list; Use 6 to exchange the Rotating Double negative electrode; 1 direct current planar direct current negative electrode is made printing opacity list silver low radiation coated glass of the present invention, and the list of locations of its technological parameter and target is following:
1#, 2# target are coated with first dielectric layer in the table; The 3# target is coated with second dielectric layer, and the 4# target is coated with silver layer, and the 5# target is coated with the 3rd dielectric layer; The 6# target is coated with the 4th dielectric layer; The 7# target is coated with the 5th dielectric layer, and glass substrate will pass through cleaning, drying and forevacuum transition before plated film, as shown in Figure 2.
Behind the plated film, the optical property of product is following:
Glass visible light transmissivity T=89.8%;
Visible light glass reflectivity=4.7%;
Visible light glass chromaticity coordinates a* value=-2.3;
Visible light glass chromaticity coordinates b* value=-5.8;
Visible light face reflectivity=3.8%;
Visible light face chromaticity coordinates a*=2.8;
Visible light face chromaticity coordinates b*=-7.7;
Glass radiance E=0.06.
Below disclose the present invention with preferred embodiment, so it is not in order to restriction the present invention, and all employings are equal to replacement or the technical scheme that obtained of equivalent transformation mode, all drop within protection scope of the present invention.
Claims (5)
1. a printing opacity list silver low radiation coated glass comprises glass substrate and is plated in the plated film rete on the glass substrate, it is characterized in that:
With the glass substrate is the basis, and said plated film rete comprises first dielectric layer, second dielectric layer, silver layer, the 3rd dielectric layer, the 4th dielectric layer and the 5th dielectric layer from inside to outside successively;
Wherein, the 3rd dielectric layer is the AZO layer.
2. a kind of printing opacity list silver low radiation coated glass according to claim 1 is characterized in that:
First dielectric layer is the NbOx layer;
Second dielectric layer is the ZnAlOx layer;
The material of silver layer is Ag;
The 4th dielectric layer is ZnSnO
3Layer;
The 5th dielectric layer is Si
3N
4Layer.
3. the manufacturing approach of a printing opacity list silver low radiation coated glass is characterized in that, the plated film rete on its glass substrate adopts the vacuum magnetic-control sputtering plated film, may further comprise the steps:
Step 1, cleaning, dry glass substrate;
Step 2, carry out the forevacuum transition;
Step 3, on glass substrate, be coated with first dielectric layer, second dielectric layer, silver layer, the 3rd dielectric layer, the 4th dielectric layer, the 5th dielectric layer successively;
Said the 3rd dielectric layer exchanges negative electrode through rotation AZO target is sputter coating in straight argon or oxygen, argon atmosphere.
4. by the manufacturing approach of the described a kind of printing opacity list silver low radiation coated glass of claim 3, it is characterized in that:
Said first dielectric layer exchanges ceramic niobium oxide target sputter coating in oxygen, argon atmosphere of negative electrode through rotation;
Said second dielectric layer exchanges allumen target sputter coating, wherein mass ratio Zn: Al=98 in oxygen, argon atmosphere of negative electrode through rotation: 2;
Said silver layer is through silver-colored target sputter coating in argon atmosphere of direct current planar negative electrode;
Said the 4th dielectric layer exchanges zinc-tin target sputter coating, wherein mass ratio Zn: Sn=50 in oxygen, argon atmosphere of negative electrode through rotation: 50;
Said the 5th dielectric layer is through rotating the sial target sputter in nitrogen, argon atmosphere that exchanges negative electrode, wherein mass ratio Si: Al=92: 8.
5. by the manufacturing approach of the described a kind of printing opacity list silver low radiation coated glass of claim 4, it is characterized in that each rete is in the process of being coated with, its process gas composition is:
Plated film first dielectric layer, the volume ratio of oxygen and argon gas are 1: 10;
Plated film second dielectric substrate, the volume ratio of oxygen and argon gas are 9: 14;
Plated film the 3rd dielectric substrate, the volume ratio of oxygen and argon gas are 9: 100;
Plated film the 4th dielectric substrate, the volume ratio of oxygen and argon gas are 3: 2;
Plated film the 5th dielectric substrate, the volume ratio of nitrogen and argon gas are 2: 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103817576A CN102501450A (en) | 2011-11-25 | 2011-11-25 | Light-transmission single-silver low radiation coated glass and manufacturing method for same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103817576A CN102501450A (en) | 2011-11-25 | 2011-11-25 | Light-transmission single-silver low radiation coated glass and manufacturing method for same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102501450A true CN102501450A (en) | 2012-06-20 |
Family
ID=46213612
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103817576A Pending CN102501450A (en) | 2011-11-25 | 2011-11-25 | Light-transmission single-silver low radiation coated glass and manufacturing method for same |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105518080A (en) * | 2013-09-02 | 2016-04-20 | 乐金华奥斯有限公司 | Low-emissivity coating and construction material for window and door including same |
| CN106483732A (en) * | 2016-12-16 | 2017-03-08 | 揭阳市宏光镀膜玻璃有限公司 | A kind of high infrared reflection electrochomeric glass and preparation method thereof |
| CN106502021A (en) * | 2016-12-16 | 2017-03-15 | 揭阳市宏光镀膜玻璃有限公司 | A kind of high infrared reflection full-solid electrochromic glass and preparation method thereof |
| CN106746735A (en) * | 2017-02-20 | 2017-05-31 | 揭阳市宏光镀膜玻璃有限公司 | A kind of low radiation coated glass of green keynote and preparation method thereof |
| CN109305763A (en) * | 2018-08-30 | 2019-02-05 | 河北中玻新材料有限公司 | A kind of high-transparency list silver low-radiation coated glass |
| CN111253082A (en) * | 2020-03-23 | 2020-06-09 | 中山市格兰特实业有限公司 | A kind of ultra-shielding heat-insulating three-silver temperable Low-E glass and preparation method thereof |
| CN113277741A (en) * | 2021-04-30 | 2021-08-20 | 长兴旗滨节能玻璃有限公司 | Coated glass and preparation method thereof |
| CN114853359A (en) * | 2022-04-26 | 2022-08-05 | 台玻天津玻璃有限公司 | Method for manufacturing double-sided mirror coated glass |
| CN114853360A (en) * | 2022-05-31 | 2022-08-05 | 长兴旗滨节能玻璃有限公司 | A kind of anti-reflection low-emissivity glass and insulating glass |
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2011
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| CN1363530A (en) * | 2001-01-09 | 2002-08-14 | 上海耀华皮尔金顿玻璃股份有限公司 | Absorption-type low-radiation film coated glass |
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105518080A (en) * | 2013-09-02 | 2016-04-20 | 乐金华奥斯有限公司 | Low-emissivity coating and construction material for window and door including same |
| CN106483732A (en) * | 2016-12-16 | 2017-03-08 | 揭阳市宏光镀膜玻璃有限公司 | A kind of high infrared reflection electrochomeric glass and preparation method thereof |
| CN106502021A (en) * | 2016-12-16 | 2017-03-15 | 揭阳市宏光镀膜玻璃有限公司 | A kind of high infrared reflection full-solid electrochromic glass and preparation method thereof |
| CN106746735A (en) * | 2017-02-20 | 2017-05-31 | 揭阳市宏光镀膜玻璃有限公司 | A kind of low radiation coated glass of green keynote and preparation method thereof |
| CN109305763A (en) * | 2018-08-30 | 2019-02-05 | 河北中玻新材料有限公司 | A kind of high-transparency list silver low-radiation coated glass |
| CN109305763B (en) * | 2018-08-30 | 2021-07-23 | 望美实业集团有限公司 | High-transmittance single-silver low-emissivity coated glass |
| CN111253082A (en) * | 2020-03-23 | 2020-06-09 | 中山市格兰特实业有限公司 | A kind of ultra-shielding heat-insulating three-silver temperable Low-E glass and preparation method thereof |
| CN111253082B (en) * | 2020-03-23 | 2023-11-14 | 中山市格兰特实业有限公司 | A super-shielding and heat-insulating triple-silver temperable Low-E glass and its preparation method |
| CN113277741A (en) * | 2021-04-30 | 2021-08-20 | 长兴旗滨节能玻璃有限公司 | Coated glass and preparation method thereof |
| CN114853359A (en) * | 2022-04-26 | 2022-08-05 | 台玻天津玻璃有限公司 | Method for manufacturing double-sided mirror coated glass |
| CN114853360A (en) * | 2022-05-31 | 2022-08-05 | 长兴旗滨节能玻璃有限公司 | A kind of anti-reflection low-emissivity glass and insulating glass |
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Application publication date: 20120620 |