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CN102611853B - A kind of complementary metal oxide semiconductors (CMOS) time delay integration formula sensor - Google Patents

A kind of complementary metal oxide semiconductors (CMOS) time delay integration formula sensor Download PDF

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CN102611853B
CN102611853B CN201110266773.0A CN201110266773A CN102611853B CN 102611853 B CN102611853 B CN 102611853B CN 201110266773 A CN201110266773 A CN 201110266773A CN 102611853 B CN102611853 B CN 102611853B
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CN102611853A (en
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王勤立
李世祖
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X Scan Imaging Corp
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/768Addressed sensors, e.g. MOS or CMOS sensors for time delay and integration [TDI]
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/30Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from X-rays

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Abstract

本发明公开一种由M个像素所构成的互补金属氧化物半导体(CMOS)时间延迟与积分(TDI)式影像感测器,各像素是由一行N个时间延迟与积分级所形成。各时间延迟与积分级包括:一光二极管,其收集光电荷;以及一前置放大器,其将光电荷依比例地转换成电压。各时间延迟与积分级亦包含一组电容器、放大器、以及开关用于储存积分信号电压,而相关双取样与维持(CDS)技术(真实或拟似)同时维持光信号与重设电压。此互补金属氧化物半导体时间延迟与积分结构特别有利于执行X光扫瞄侦测器系统,其须要大尺寸像素与信号处理电路,并可使信号处理电路与光二极管阵列实体地分开,以便屏蔽信号电路免受X光的辐射损害。

The invention discloses a Complementary Metal Oxide Semiconductor (CMOS) time delay and integration (TDI) image sensor composed of M pixels. Each pixel is formed by a row of N time delay and integration stages. Each time delay and integration stage includes: a photodiode, which collects the photocharge; and a preamplifier, which proportionally converts the photocharge into a voltage. Each time delay and integration stage also includes a set of capacitors, amplifiers, and switches to store the integrated signal voltage, while correlated double sample and hold (CDS) techniques (real or pseudo) maintain the optical signal and reset the voltage simultaneously. This CMOS time delay and integration architecture is particularly beneficial for implementing X-ray scanning detector systems that require large pixel size and signal processing circuitry and allows the signal processing circuitry to be physically separated from the photodiode array for shielding Signal circuits are protected from X-ray radiation damage.

Description

一种互补金属氧化物半导体时间延迟积分式感测器A Complementary Metal Oxide Semiconductor Time Delay Integral Sensor

技术领域 technical field

本发明涉及固态影像感测器领域,更特别有关于一种用于X光影像扫瞄应用的互补金属氧化物半导体(CMOS)时间延迟与积分(TDI)式感测器。The present invention relates to the field of solid state image sensors, and more particularly to a complementary metal oxide semiconductor (CMOS) time delay and integration (TDI) sensor for X-ray image scanning applications.

背景技术 Background technique

本发明有关于时间延迟与积分(TDI)式互补金属氧化物半导体(CMOS)线性影像感测器,其适用于高速X光影像扫瞄应用。通常时间延迟与积分影像感测器使用于高速线扫瞄应用,其积分输入光线信号非常低。在正常线扫瞄应用中,增加积分输入光线信号的一种方式为降低扫瞄速度,且亦因此增加积分时间。此时间延迟与积分感测器允许线扫瞄侦测器系统增加光线信号,且不会牺牲扫瞄速率。此时间延迟与积分感测器使用电荷移转装置,例如电荷耦合装置(CCD),且以正常方式执行。The present invention relates to time-delay and integration (TDI) complementary metal-oxide-semiconductor (CMOS) linear image sensors suitable for high-speed X-ray image scanning applications. Typically time-delay and integrating image sensors are used in high-speed line scan applications where the integrating input light signal is very low. In normal line scan applications, one way to increase the integration of the input light signal is to reduce the scan speed and thus increase the integration time. This time delay and integrating sensor allows line scan detector systems to increase the light signal without sacrificing scan rate. This time delay and integration sensor uses a charge transfer device, such as a charge coupled device (CCD), and is implemented in the normal way.

在电荷耦合装置时间延迟与积分阵列中,各侦测器像素包括N级时间延迟与积分位置。例如,对于一种M个像素的线性侦测器,其包含二因次MxN级电荷耦合装置阵列,此用于各像素的N级电荷耦合装置是与扫瞄方向平行。此第一级电荷耦合装置在操作中,在等于一线时间的积分时间中将光线信号积分。此信号电荷将从电荷耦合装置的第一级移转至第二级,而在扫瞄下的物件亦与信号电荷的移动同步,从电荷耦合装置的第一级移至第二级。此第二级电荷耦合装置对于相同物件在第二积分时间期间,将信号电荷积分。因此,在积分时间结束时,此在第二级电荷耦合装置的信号电荷为其从第一级所接收信号电荷的两倍。接着,第二级电荷耦合装置的信号电荷与物件的移动同步移至第三级。此第三级电荷耦合装置除了由第二级所接收信号的外,再度将光线信号积分。此过程重复,且当其抵达最后N级电荷耦合装置时,光线信号增大N倍。然后,利用一输出电荷耦合装置暂存器依序读出M个像素信号。In a CCD time delay and integration array, each detector pixel includes N stages of time delay and integration positions. For example, for a linear detector with M pixels, which includes a two-dimensional M×N-level CCD array, the N-level CCDs for each pixel are parallel to the scanning direction. In operation, the first stage CCD integrates the light signal for an integration time equal to one line time. This signal charge will be transferred from the first stage of the CCD to the second stage, and the object under scanning will also be moved from the first stage of the CCD to the second stage synchronously with the movement of the signal charge. The second stage CCD integrates the signal charge for the same object during a second integration time. Therefore, at the end of the integration time, the signal charge of the CCD at the second stage is twice that of the signal charge it received from the first stage. Then, the signal charge of the second-stage charge-coupled device is moved to the third stage synchronously with the movement of the object. This third stage CCD again integrates the light signal in addition to the signal received by the second stage. This process repeats, and when it reaches the last N stage of CCD, the light signal is increased by N times. Then, M pixel signals are sequentially read out by using an output charge-coupled device register.

虽然,此电荷耦合装置时间延迟与积分影像系统广泛地使用于可视高速工业检视应用与医疗X光扫瞄应用,例如电脑断层(CT)扫瞄与牙齿全景扫瞄,其在X光工业检视应用中的确有缺点。在X光工业检视系统中,在正常情况下,此侦测器像素尺寸相较于正常电荷耦合装置感测器像素尺寸为相当大。在此种应用中,所须像素尺寸的范围从数毫米至数十毫米。当像素尺寸增加时,电荷耦合装置的扫瞄速率大幅降低,因此不适合用于此种应用。Although, the charge-coupled device time-delay and integral imaging system is widely used in visual high-speed industrial inspection applications and medical X-ray scanning applications, such as computer tomography (CT) scanning and dental panoramic scanning, which are used in X-ray industrial inspection There are indeed shortcomings in the application. In X-ray industrial inspection systems, under normal conditions, the detector pixel size is quite large compared to the normal CCD sensor pixel size. In such applications, the required pixel size ranges from a few millimeters to tens of millimeters. As the pixel size increases, the scan rate of CCDs drops drastically, making them unsuitable for this application.

此电荷耦合装置时间延迟与积分影像系统的第二个缺点为,其非常容易遭受到X光幅射损害。医疗X光扫瞄应用中,所使用X光能量与剂量,在正常情况下低于工业检视应用许多。在医疗应用中,不仅X光剂量受到联邦药品管理局(FDA)管制,由于人类软组织,其能量在正常情况下低于100K电子伏特(ev)。对于工业应用,取决于所须检视材料种类,其所使用能量范围从50K电子伏特至15M电子伏特。由于在工业检视系统中,并无规定以限制X光剂量,其所使用剂量可以高于医疗扫瞄系统用剂量许多。此在X光下电荷耦合装置感测器的幅射曝露累积会增加其暗电流,移动其井电位,且因此会减少其可使用年限。A second disadvantage of the CCD time-delay and integral imaging system is that it is very susceptible to damage from X-ray radiation. In medical X-ray scanning applications, the X-ray energy and dose used are much lower than in industrial inspection applications under normal circumstances. In medical applications, not only is X-ray dose regulated by the Federal Drug Administration (FDA), but due to human soft tissue, its energy is normally below 100K electron volts (ev). For industrial applications, the energy used ranges from 50KeV to 15MeV, depending on the type of material to be inspected. Since there is no regulation to limit the X-ray dose in the industrial inspection system, the dose used can be much higher than that used in the medical scanning system. This cumulative radiation exposure of the CCD sensor to X-rays increases its dark current, shifts its well potential, and thus reduces its useful life.

发明内容 Contents of the invention

本发明的目的在于实施互补金属氧化物半导体(CMOS)侦测器系统,其可以减轻在X光工业检视系统中,电荷耦合装置侦测器的缺点。由于在电荷领域中信号电荷并不会从一个互补金属氧化物半导体电路移至另一个互补金属氧化物半导体电路,使得更难以使用互补金属氧化物半导体电路,以执行时间延迟与积分感测器。本发明的方法使用电荷积分与加总放大器,以执行在互补金属氧化物半导体电路中的时间延迟与积分感测器。It is an object of the present invention to implement a complementary metal-oxide-semiconductor (CMOS) detector system that alleviates the disadvantages of CCD detectors in X-ray industrial inspection systems. Since the signal charge does not move from one CMOS circuit to another in the charge domain, it is more difficult to use CMOS circuits to implement time-delay and integrating sensors. The method of the present invention uses a charge integrating and summing amplifier to implement a time delay and integrating sensor in a CMOS circuit.

因此,本发明的目的为提供一种时间延迟与积分(TDI)式影像感测结构,其可以使用标准互补金属氧化物半导体工艺实施。It is therefore an object of the present invention to provide a time delay and integration (TDI) image sensing structure which can be implemented using standard CMOS processes.

本发明的另一目的为提供一种时间延迟与积分影像感测侦测器系统,其适合之技术,例如使用于X光工业侦测系统中的较大像素-至-像素间距,而不会牺牲读取速度。Another object of the present invention is to provide a time-delay and integration image sensing detector system that is suitable for technologies such as larger pixel-to-pixel pitches used in X-ray industrial inspection systems without at the expense of read speed.

本发明还有另一目的为提供一种X光时间延迟与积分侦测系统,其中互补金属氧化物半导体电路可以与光二极管侦测器分开,以致于可以容易地屏蔽互补金属氧化物半导体电路,以避免X光幅射损害。Still another object of the present invention is to provide an X-ray time delay and integration detection system, wherein the CMOS circuit can be separated from the photodiode detector, so that the CMOS circuit can be easily shielded, To avoid X-ray radiation damage.

本发明的优点为,可以许多方式使用互补金属氧化物半导体电路以执行时间延迟与积分感测器。首先,可以使用标准商业互补金属氧化物半导体工艺,将所有周边装置例如放大器、计时产生器,以及驱动器与光二极管集成在一起。其次,其可使用大像素尺寸侦测器、例如0.8毫米至数毫米像素尺寸的大像素侦测器实施。此特别有益于须要大像素尺寸的X光扫瞄应用,例如货柜与油管检视。众所熟知,电荷耦合装置以较小像素尺寸运作较佳。当像素尺寸变大时,电荷耦合装置的速度大幅降低。因此,互补金属氧化物半导体时间延迟与积分感测器更适合用于X光工业扫瞄应用。第三,众所熟知,电荷耦合装置与互补金属氧化物半导体电路容易遭受X光幅射损害。在此互补金属氧化物半导体执行中,周边电路可与光二极管阵列集成于相同芯片上,但与光二极管侦测器却有足够间隔或间隙。因此,可以将周边电路以如铅的重金属轻易地覆盖,将其屏蔽以避免X光幅射损害。An advantage of the present invention is that CMOS circuits can be used in many ways to implement time delay and integrate sensors. First, all peripheral devices such as amplifiers, timing generators, and drivers can be integrated with the photodiodes using standard commercial CMOS processes. Second, it can be implemented using a large pixel size detector, for example a large pixel detector with a pixel size of 0.8 millimeters to several millimeters. This is especially beneficial for X-ray scanning applications that require large pixel sizes, such as container and oil pipeline inspection. It is well known that CCDs work better with smaller pixel sizes. As the pixel size gets larger, the speed of the CCD drops dramatically. Therefore, CMOS time delay and integration sensors are more suitable for X-ray industrial scanning applications. Third, it is well known that CCDs and CMOS circuits are susceptible to X-ray radiation damage. In this CMOS implementation, peripheral circuitry can be integrated on the same die as the photodiode array, but with sufficient separation or clearance from the photodiode detector. Therefore, peripheral circuits can be easily covered with heavy metals such as lead, shielding them from X-ray radiation damage.

本发明使用光二极管作为侦测器以整合输入光线信号。各时间延迟与积分级包括:一光二极管侦测器、多个放大器、多个储存电容器、以及多个开关。各光二极管连接至积分放大器、加总电路、以及多个储存电路。此积分与加总功能可以在单一或多个放大器中实施。此储存电路使用储存电容器与缓冲放大器实施。使用相关双取样与维持(CDS)技术以同时维持光信号与重设电压。可以将相关双取样与维持光信号(信号与重设)电压传送至后一个时间延迟与积分级用于加总,而不会累积偏差杂讯。此在序列中后一个时间延迟与积分级不仅在一积分时间(线时间)期间将光信号积分,且亦从前一个时间延迟与积分级接收所储存相关双取样与维持电压。加总电路将电流与前一个时间延迟与积分级相关双取样与维持光信号组合,且将此新的相关双取样与维持电压输出至储存电路。将所储存相关双取样与维持电压传送至后一个时间延迟与积分级。此过程重复一直至抵达最后一个时间延迟与积分级,而以差动放大器读取相关双取样与维持信号。在正常情况下,使用类似于标准互补金属氧化物半导体线性光二极管阵列(PDA)的数字扫瞄位移暂存器,以实施读取。此时间延迟与积分功能的操作,包括电荷积分、加总与相关双取样与维持信号储存与移转,此操作是由多个控制开关与一组计时信号控制。The present invention uses photodiodes as detectors to integrate incoming light signals. Each time delay and integration stage includes: a photodiode detector, amplifiers, storage capacitors, and switches. Each photodiode is connected to an integral amplifier, a summing circuit, and a plurality of storage circuits. This integrating and summing function can be implemented in single or multiple amplifiers. The storage circuit is implemented using a storage capacitor and a buffer amplifier. Use correlated double sample and hold (CDS) technique to maintain optical signal and reset voltage at the same time. Correlated double sampled and held optical signal (signal and reset) voltages can be passed to a later time delay and integration stage for summing without accumulating bias noise. This latter time delay and integration stage in the sequence not only integrates the optical signal during an integration time (line time), but also receives the stored associated double sample and hold voltage from the previous time delay and integration stage. The summing circuit combines the current with the previous time-delayed and integrating stage correlated double-sampled and held light signal and outputs this new correlated double-sampled and held voltage to the storage circuit. The stored correlated double sample and hold voltages are passed to the next time delay and integration stage. This process is repeated until the last time delay and integration stage is reached, and the correlated double sample and hold signal is read by the difference amplifier. Normally, reading is performed using a digital scan shift register similar to a standard CMOS linear photodiode array (PDA). The operation of the time delay and integration function, including charge integration, summation and correlated double sample and hold signal storage and transfer, is controlled by a plurality of control switches and a set of timing signals.

此使用互补金属氧化物半导体电路以执行时间延迟与积分侦测器系统的优点为,其可以使用标准互补金属氧化物半导体工艺,与所有操作时脉产生器以及信号处理电路集成于一单一芯片上。因此,可以降低制造成本。The advantage of using CMOS circuits to implement a time delay and integration detector system is that it can be integrated on a single chip with all operating clock generators and signal processing circuits using standard CMOS processes . Therefore, manufacturing cost can be reduced.

此使用互补金属氧化物半导体电路以执行X光时间延迟与积分侦测器系统的另一优点为,其可以较大像素尺寸同时以非常高扫瞄速度执行。Another advantage of using CMOS circuits to implement an X-ray time-delay and integration detector system is that it can be implemented at very high scan speeds at the same time with larger pixel sizes.

此在本发明中使用互补金属氧化物半导体电路以执行时间延迟与积分侦测器系统的另一优点为,可以将互补金属氧化物半导体电路与光二极管分开。因此,可以将互补金属氧化物半导体电路适当地屏蔽,以避免X光幅射损害。Another advantage of using CMOS circuits in the present invention to implement a time delay and integration detector system is that the CMOS circuits can be separated from the photodiodes. Therefore, the CMOS circuits can be properly shielded from X-ray radiation damage.

本发明此等以及其他目的与优点,将由于目前所知执行本发明之最佳模式之说明并参考所附图式,对于熟习此技术人士为明显。These and other objects and advantages of the present invention will become apparent to those skilled in the art from the description of the best mode currently known for carrying out the invention and with reference to the accompanying drawings.

附图说明 Description of drawings

图1为根据本发明互补金属氧化物半导体(CMOS)时间延迟与积分(TDI)级的电路图;1 is a circuit diagram of a Complementary Metal Oxide Semiconductor (CMOS) Time Delay and Integrator (TDI) stage according to the present invention;

图2为具有N个时间延迟与积分级的一行时间延迟与积分像素的电路图,与数字扫瞄位移暂存器的方块图;2 is a circuit diagram of a row of time delay and integration pixels with N time delay and integration stages, and a block diagram of a digital scanning shift register;

图3为输出差动放大器读取视讯信号的方块图;Fig. 3 is the block diagram of output differential amplifier reading video signal;

图4为操作时间延迟与积分感测器的时序图;FIG. 4 is a timing diagram of operating a time delay and integration sensor;

图5为本发明另一较佳实施例的电路图;以及Fig. 5 is the circuit diagram of another preferred embodiment of the present invention; And

图6为操作时间延迟与积分感测器的另一时序图。FIG. 6 is another timing diagram of operating the time delay and integration sensor.

附图标记说明:10-扫瞄位移暂存器;20-差动放大器;30-增益级;50-第一级;52-加总电容器;60-积分放大器;61-加总电容器;62-加总电容器;70-加总放大器;100-时间延迟与积分级;101-光二极管;102-加总电容器;103-积分与加总放大器;104-相关双取样与维持电路;200-后一个级;205-缓冲放大器;206-缓冲放大器;207-开关。Explanation of reference signs: 10-scan shift register; 20-differential amplifier; 30-gain stage; 50-first stage; 52-summing capacitor; 60-integrating amplifier; 61-summing capacitor; 62- Summing capacitor; 70-summing amplifier; 100-time delay and integration stage; 101-photodiode; 102-summing capacitor; 103-integrating and summing amplifier; 104-correlated double sampling and holding circuit; stage; 205-buffer amplifier; 206-buffer amplifier; 207-switch.

具体实施方式 detailed description

图1至图4说明本发明的一较佳实施例。图1显示时间延迟与积分(TDI)级100的电路图。图2显示具有N个时间延迟与积分级的线性侦测器的一像素的电路图。对于M像素阵列,其包括M行电路,如同于图2中显示。图3显示在最后时间延迟与积分级读取信号的相关双取样与维持差动放大器的方块图。图4显示用于操作时间延迟与积分感测器的时序图。1 to 4 illustrate a preferred embodiment of the present invention. FIG. 1 shows a circuit diagram of a time delay and integrate (TDI) stage 100 . FIG. 2 shows a circuit diagram of a pixel of a linear detector with N time delay and integration stages. For an M pixel array, it includes M rows of circuits, as shown in FIG. 2 . Figure 3 shows a block diagram of a correlated double sample and hold differential amplifier for reading the signal at the final time delay and integration stage. Figure 4 shows a timing diagram for operating a time delay and integration sensor.

如同于图1中显示,各时间延迟与积分级100包括:一光二极管101、一加总电容器102、一积分与加总放大器103、以及一相关双取样与维持电路104。此积分与加总放大器103包括:一放大器A1、一积分电容器C1、以及一重设开关SW1。积分电容器C1与重设开关SW1连接介于放大器A1的输入与输出端子之间。相关双取样与维持电路104包括:两个输入开关SW2与SW3;一第一储存电路,其包含电容器C2与缓冲放大器A2;一移转开关SW4;一第二储存电路,其包含电容器C3与缓冲放大器A3;一第三储存电路,其包含电容器C4与缓冲放大器A4;以及两个输出开关SW5与SW6。使用加总电容器102以接收来自前一时间延迟与积分级的重设与光信号电压。使用积分与加总放大器103以重新设定光二极管101,且将来自前一时间延迟与积分级与其本身光二极管101的重设与光信号电压积分且加总。使用相关双取样与维持电路104将来自积分与加总放大器103输出的经组合的重设与光信号电压进行取样与维持。As shown in FIG. 1 , each time delay and integration stage 100 includes: a photodiode 101 , a summing capacitor 102 , an integrating and summing amplifier 103 , and a correlated double sample and hold circuit 104 . The integrating and summing amplifier 103 includes: an amplifier A1, an integrating capacitor C1, and a reset switch SW1. An integrating capacitor C1 and a reset switch SW1 are connected between the input and output terminals of the amplifier A1. Correlated double sampling and holding circuit 104 includes: two input switches SW2 and SW3; a first storage circuit, which includes capacitor C2 and buffer amplifier A2; a transfer switch SW4; a second storage circuit, which includes capacitor C3 and buffer amplifier Amplifier A3; a third storage circuit including capacitor C4 and buffer amplifier A4; and two output switches SW5 and SW6. A summing capacitor 102 is used to receive the reset and light signal voltages from the previous time delay and integration stage. The integrating and summing amplifier 103 is used to reset the photodiode 101 and the reset and light signal voltage from the previous time delay and integrating stage with its own photodiode 101 is integrated and summed. The combined reset and light signal voltage from the output of integrating and summing amplifier 103 is sampled and held using correlated double sample and hold circuit 104 .

图2显示一行像素,其具有串联N个级的个别时间延迟与积分电路。各个别时间延迟与积分级为时间延迟与积分级100的复制,所不同者为第一级50与最后级200。在第一时间延迟与积分级50中由于并无前一级,加总电容器52的一端接地。在最后级200中,缓冲放大器A3与A4以缓冲放大器205与206取代,其具有较大驱动电力,以驱动输出差动放大器20的较重电容负载,如同于图3中所示。为了方便读取重设与光信号,此最后级200的输出开关SW5与SW6以一组开关207取代。开关207是由代表来自数字扫瞄位移暂存器10输出的SM驱动。扫瞄位移暂存器10依序地读取此类似标准光二极管阵列的M级阵列的各像素。在各时间延迟与积分级中所有开关SW1至SW6是由相同时脉脉冲所驱动,如同第图4中所显示。Figure 2 shows a row of pixels with individual time delay and integration circuits connected in series with N stages. Each individual time delay and integration stage is a duplicate of the time delay and integration stage 100 , except that the first stage 50 and the last stage 200 are different. In the first time delay and integration stage 50, since there is no previous stage, one end of the summing capacitor 52 is connected to ground. In the final stage 200, buffer amplifiers A3 and A4 are replaced by buffer amplifiers 205 and 206, which have larger drive power to drive the heavier capacitive load of output differential amplifier 20, as shown in FIG. In order to read the reset and light signals conveniently, the output switches SW5 and SW6 of the last stage 200 are replaced by a set of switches 207 . The switch 207 is driven by SM representing the output from the digital scan shift register 10 . The scan shift register 10 sequentially reads the pixels of the M-level array similar to the standard photodiode array. All switches SW1 to SW6 in each time delay and integration stage are driven by the same clock pulse, as shown in FIG. 4 .

参考图1,在操作中,光二极管101与积分与加总放大器103是在其光信号积分过程开始之前通过将开关SW1关闭(close)而重新设定。同时亦将开关SW2与SW6关闭。此开关SW6的关闭允许将在电容器C4上所储存的重设电压移转至其后的时间延迟与积分级。因此,经由加总电容器102,将前一时间延迟与积分级的重设电压与放大器103的重设电压加总。将所组合的重设电压经由开关SW2储存于电容器C2上。为了开始各时间延迟与积分级的积分过程,将开关SW1开启(open),接着将开关SW2与SW6开启。在SW2与SW1开启之间有延迟(SW1较SW2为早开启),如同于图4时序图中所显示。此显示在电容器C2中取样此重设电压之前,将放大器A1先行设定。Referring to FIG. 1 , in operation, photodiode 101 and integrating and summing amplifier 103 are reset by closing switch SW1 before their optical signal integration process begins. At the same time, the switches SW2 and SW6 are also turned off. Closing of this switch SW6 allows the reset voltage stored on capacitor C4 to be transferred to subsequent time delay and integration stages. Thus, the reset voltage of the previous time delay and integration stage is summed with the reset voltage of the amplifier 103 via the summing capacitor 102 . The combined reset voltage is stored on capacitor C2 via switch SW2. To start the integration process for each time delay and integration stage, switch SW1 is opened, followed by switches SW2 and SW6. There is a delay between SW2 and SW1 turning on (SW1 turns on earlier than SW2), as shown in the timing diagram of FIG. 4 . This shows that amplifier A1 is pre-set before sampling this reset voltage in capacitor C2.

一旦积分过程开始,将开关SW5关闭,以允许储存在电容器C3上的光信号移转至其后的时间延迟与积分级。因此,经由加总电容器102,将之前时间延迟与积分级的光信号与来自光二极管101的目前时间延迟与积分级光信号加总。在此积分循环结束时,将开关SW3关闭,且将所组合光信号取样且储存于电容器C3中。在开关SW3开启后,将开关SW4关闭,且将储存于C2上的重设电压移转至电容器C4。将光二极管101与放大器A1再度重设,以开始下一个积分循环。此过程重复一直至其抵达最后时间延迟与积分级200为止,如同于图2中所显示。Once the integration process begins, switch SW5 is closed to allow the optical signal stored on capacitor C3 to be transferred to subsequent time delay and integration stages. Thus, the previous time-delayed and integrated-level optical signal is summed with the current time-delayed and integrated-level optical signal from the photodiode 101 via the summing capacitor 102 . At the end of this integration cycle, switch SW3 is closed and the combined optical signal is sampled and stored in capacitor C3. After switch SW3 is turned on, switch SW4 is turned off, and the reset voltage stored on C2 is transferred to capacitor C4. The photodiode 101 and the amplifier A1 are reset again to start the next integration cycle. This process repeats until it reaches the final time delay and integration stage 200, as shown in FIG. 2 .

然后通过开始脉冲SI以启始扫瞄位移暂存器10,而由类似标准光二极管阵列的M像素线性阵列读取信号。当一像素由扫瞄暂存器10的输出SM定址时,将此像素的重设与光信号电压移转至用于处理视讯的相关双取样与维持输出差动放大器20。可以添加增益级30以增加信号位准。因此,获得单端视讯信号,如同于图4中所显示。The scan of the shift register 10 is then initiated by the start pulse SI, and the signal is read from a linear array of M pixels similar to a standard photodiode array. When a pixel is addressed by the output SM of the scan register 10, the pixel's reset and light signal voltages are diverted to a correlated double sample and hold output differential amplifier 20 for video processing. A gain stage 30 can be added to increase the signal level. Thus, a single-ended video signal is obtained, as shown in FIG. 4 .

图显5示本发明另一较佳实施例的电路图,以说明一时间延迟与积分级。此图1与图5中电路的惟一差异为,此在图1中积分与加总放大器103的功能以图5的积分放大器60与加总放大器70取代。图1与图5的相关双取样与维持电路为相同。积分放大器60包括:放大器A1a、积分电容器C1a、以及重设开关SW1a。积分放大器60的功能为重设光二极管101,且将光信号积分于积分电容器C1a中。加总放大器70包括:放大器A1b、积分电容器C1b、以及重设开关SW1b。加总放大器70的功能为,将经由加总电容器61的光二极管101的重设与光电压与经由加总电容器62从前一个时间延迟与积分级所接收重设与光电压相加。Figure 5 shows a circuit diagram of another preferred embodiment of the present invention to illustrate a time delay and integration stage. The only difference between the circuits in FIG. 1 and FIG. 5 is that the functions of the integrating and summing amplifier 103 in FIG. 1 are replaced by the integrating amplifier 60 and the summing amplifier 70 in FIG. 5 . The correlated double sampling and holding circuits in FIG. 1 and FIG. 5 are the same. The integrating amplifier 60 includes: an amplifier A1a, an integrating capacitor C1a, and a reset switch SW1a. The function of the integrating amplifier 60 is to reset the photodiode 101 and integrate the light signal in the integrating capacitor C1a. The summing amplifier 70 includes: an amplifier A1b, an integrating capacitor C1b, and a reset switch SW1b. The function of summing amplifier 70 is to add the reset and photovoltage of photodiode 101 via summing capacitor 61 to the reset and photovoltage received from the previous time delay and integration stage via summing capacitor 62 .

相关双取样与维持电路104然后实施与以上说明相同的取样-与-维持功能。须要将图4中的时序图稍微修正,以方便将积分功能与加总功能分开。Correlated double sample and hold circuit 104 then performs the same sample-and-hold function as explained above. The timing diagram in Figure 4 needs to be modified slightly to facilitate the separation of the integrating function from the summing function.

如同于图1与4中显示,相关双取样与维持电路104使用两个平行独立储存电路,以传送重设信号与光信号。以替代方式,可以使用一链(chain)储存电路,且此重设信号与光信号可以经由此链一次一个地传送。使用单一链储存电路的优点为,重设电压与光信号具有由缓冲放大器所导致的相同偏差。因此,可以通过以后的时间延迟与积分级完全去除此偏差。As shown in FIGS. 1 and 4, the correlated double sample and hold circuit 104 uses two parallel independent storage circuits to transmit the reset signal and the optical signal. Alternatively, a chain of storage circuits can be used, and the reset signal and optical signal can be sent through the chain one at a time. The advantage of using a single chain storage circuit is that the reset voltage has the same offset as the optical signal caused by the buffer amplifier. Therefore, this deviation can be completely removed by later time delays and integration stages.

在本发明还有另一较佳实施例中,此在图1中所显示时间延迟与积分级可以图6中所显示时序序列交替地操作。在此操作模式中,在储存相关双取样与维持电路104中重设信号与光信号与光二极管101的光信号相加之前,可以首先取得此重设信号与光信号间的差异。然后可以将累积光信号取样且保持于电容器C3中,亦可以将光二极管101的重设信号取样且保持于电容器C2中,而并不与前一时间延迟与积分级的重设信号组合。此由图4与6中时序图所代表两种操作模式可以保持本发明的优点。In yet another preferred embodiment of the present invention, the time delay and integration stages shown in FIG. 1 can be operated alternately in the timing sequence shown in FIG. 6 . In this mode of operation, the difference between the reset signal and the light signal may first be obtained before being added to the light signal of the photodiode 101 in the storage correlated double sample and hold circuit 104 . The accumulated light signal can then be sampled and held in capacitor C3, and the reset signal of photodiode 101 can also be sampled and held in capacitor C2 without being combined with the reset signal of the previous time delay and integration stage. Therefore, the advantages of the present invention can be maintained for the two operation modes represented by the timing diagrams in FIGS. 4 and 6 .

类似地,亦可将由图6所代表新操作模式,以稍微时序修正,而应用于图5中的时间延迟与积分电路,以方便将积分与加总功能分开。Similarly, the new mode of operation represented by FIG. 6 can also be applied to the time delay and integration circuit in FIG. 5 with a slight timing modification, so as to facilitate the separation of the integrating and summing functions.

以上说明较佳实施例仅为本发明之例,其可以由本发明导出各种变化。The preferred embodiments described above are only examples of the present invention, and various changes can be derived from the present invention.

Claims (24)

1. a complementary metal oxide semiconductors (CMOS) time delay and integration type sensor, it is characterised in that including:
One integration with add up amplifier, it has an integration input terminal, switch reseted by the totalling input terminal that can engage with described integration input terminal or separate, a lead-out terminal, an integrating condenser and;
One optical detector, is connected to described integration and the described integration input terminal adding up amplifier;
One adds up capacitor, and its first electrode is connected to the output of previous time delay and integration stages, and its second electrode is connected to described integration and adds up the described totalling input terminal of amplifier;
One correlated double sampling and holding circuit, it includes multiple switch and multiple storage circuits, described correlated double sampling and holding circuit have an input terminal and are connected to described integration and add up the described lead-out terminal of amplifier, and described correlated double sampling has a lead-out terminal with holding circuit and is connected to the described totalling capacitor of time delay and integration stages thereafter; And
Wherein, first pass through and described switch of reseting cuts out, described integration is reset with adding up amplifier, and when described reset switch later on time, by described optical detector reset signal and the signal of reseting being stored in described previous time delay with the correlated double sampling of integration stages and holding circuit adds assembly one combination and resets signal, and sampled at once by described correlated double sampling and holding circuit and kept;Then described integration starts the optical signal integration of described optical detector with adding up amplifier, and the integral light signal of described optical detector is added assembly one combination optical signal with being stored in the described previous time delay described correlated double sampling with integration stages with the described optical signal in holding circuit simultaneously, and sampled by described correlated double sampling and holding circuit and keep; And described combination optical signal resets signal with described combination and is maintained at described correlated double sampling and in holding circuit, is ready for being sent to later described time delay and integration stages.
2. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterised in that described integration includes one or more level with adding up amplifier.
3. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterized in that, described integration input terminal and described totalling input terminal are bonded into an input terminal, and wherein said integration has one first electrode with the described integrating condenser adding up amplifier and is connected to described input terminal, and one second electrode is connected to described lead-out terminal.
4. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 3 and integration type sensor, it is characterised in that described integration is an analogue amplifier with totalling amplifier, has single or differential input.
5. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterized in that, described integration has a two-stage amplifier with adding up amplifier, described optical signal integration implemented by its first order amplifier, and amplifier enforcement in the second level adds general function, and the input of described first order amplifier becomes described integration and adds up the integration input terminal of amplifier, the input of described second level amplifier is connected to the output of described first order amplifier, and become described integration and the described totalling input terminal adding up amplifier, and the described lead-out terminal being output into described integration and totalling amplifier of described second level amplifier.
6. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 5 and integration type sensor, it is characterized in that, described first order amplifier is analogue amplifier, there is single or differential input, and one first electrode of described integrating condenser is connected to described integration input terminal, and one second electrode of described integrating condenser is connected to the output of described first order amplifier.
7. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 5 and integration type sensor, it is characterized in that, described second level amplifier is an analogue amplifier, there is single or differential input, and have more an additional capacitor, one first electrode of described additional capacitor is connected to the input of described second level amplifier, and one second electrode of described additional capacitor is connected to the output of described second level amplifier.
8. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterised in that described optical detector has a light sensitive diode, and it can convert light to electric current.
9. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterised in that the described storage circuit of described correlated double sampling and holding circuit has a reservior capacitor and a buffer amplifier.
10. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterized in that, it is transmit abreast in the described correlated double sampling independent storage circuit with holding circuit that described combination resets signal with described combination optical signal.
11. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterised in that it is transmit in the single chain of described storage circuit that described combination resets signal with described combination optical signal; And described combination reseted signal and transmitted one at a time by each described storage circuit with described combination optical signal.
12. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 1 and integration type sensor, it is characterized in that, described optical detector, described integration is integrated on an one chip with adding up amplifier and described correlated double sampling with holding circuit, and plurality of described integration with add up amplifier, described correlated double sampling is physically isolated with holding circuit and multiple described optical detectors, so that multiple described integrations and totalling amplifier, described correlated double sampling and holding circuit can be shielded from harmful width in receiving light line process and penetrate, and multiple described optical detector is exposed to harmful width penetrates.
13. a complementary metal oxide semiconductors (CMOS) time delay and integration type sensor, it is characterised in that including:
One integration with add up amplifier, it has an integration input terminal, switch reseted by the totalling input terminal that can engage with described integration input terminal or separate, a lead-out terminal, an integrating condenser and;
One optical detector, is connected to described integration and the described integration input terminal adding up amplifier;
One adds up capacitor, and its first electrode is connected to the output of previous time delay and integration stages, and its second electrode is connected to described integration and adds up the described totalling input terminal of amplifier;
One correlated double sampling and holding circuit, it includes multiple switch and multiple storage circuits, described correlated double sampling and holding circuit have an input terminal and are connected to described integration and add up the described lead-out terminal of amplifier, and described correlated double sampling has a lead-out terminal with holding circuit and is connected to the described totalling capacitor of time delay and integration stages thereafter; And
Wherein, first pass through and described switch of reseting cut out, described integration is reset with adding up amplifier, and when described reset switch later on time, described correlated double sampling and holding circuit reseted sample of signal and maintenance by producing; Then described integration starts the optical signal integration of described optical detector with adding up amplifier, and produce an accumulating signal, its integral light signal being described optical detector and reset the summation of the difference of signal with the described correlated double sampling in described previous time delay with integration stages with institute's maintenance in holding circuit with institute's maintenances prior cumulative signal in holding circuit at the described correlated double sampling of described previous time delay and integration stages, described accumulating signal is sampled and maintenance by described correlated double sampling and holding circuit; And described accumulating signal and described signal of reseting are maintained at described correlated double sampling and in holding circuit, are ready for being sent to later described time delay and integration stages.
14. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterised in that described integration includes one or more level with adding up amplifier.
15. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterized in that, described integration input terminal and described totalling input terminal are bonded into an input terminal, and wherein said integration has one first electrode with the described integrating condenser adding up amplifier and is connected to described input terminal, and one second electrode is connected to described lead-out terminal.
16. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 15 and integration type sensor, it is characterised in that described integration is an analogue amplifier with totalling amplifier, has single or differential input.
17. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterized in that, described integration has a two-stage amplifier with adding up amplifier, described optical signal integration implemented by its first order amplifier, and amplifier enforcement in the second level adds general function, and the input of described first order amplifier becomes described integration and adds up the integration input terminal of amplifier, the input of described second level amplifier is connected to the output of described first order amplifier, and become described integration and the described totalling input terminal adding up amplifier, and the described lead-out terminal being output into described integration and totalling amplifier of described second level amplifier.
18. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 17 and integration type sensor, it is characterized in that, described first order amplifier is an analogue amplifier, there is single or differential input, and one first electrode of described integrating condenser is connected to described integration input terminal, and one second electrode of described integrating condenser is connected to the output of described first order amplifier.
19. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 17 and integration type sensor, it is characterized in that, described second level amplifier is analogue amplifier, there is single or differential input, and have more an additional capacitor, one first electrode of described additional capacitor is connected to the input of described second level amplifier, and one second electrode of described additional capacitor is connected to the output of described second level amplifier.
20. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterised in that described optical detector has a light sensitive diode, and it can convert light to electric current.
21. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterised in that the described storage circuit of described correlated double sampling and holding circuit has a reservior capacitor and a buffer amplifier.
22. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterised in that described in reset signal with described accumulating signal be transmit abreast in the described correlated double sampling independent storage circuit with holding circuit.
23. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterised in that described in reset signal with described accumulating signal be transmit in the single chain of described storage circuit; And described in reset signal and described accumulating signal and transmitted one at a time by each described storage circuit.
24. complementary metal oxide semiconductors (CMOS) time delay as claimed in claim 13 and integration type sensor, it is characterized in that, described optical detector, described integration is integrated on an one chip with adding up amplifier and described correlated double sampling with holding circuit, and plurality of described integration with add up amplifier, described correlated double sampling is physically isolated with holding circuit and multiple described optical detectors, so that multiple described integrations and totalling amplifier, described correlated double sampling and holding circuit can be shielded from harmful width in receiving light line process and penetrate, and multiple described optical detector is exposed to harmful width penetrates.
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