CN102654688A - Color-film substrate, manufacturing method and liquid crystal display device thereof - Google Patents

Abstract

The invention provides a color filter substrate, a manufacturing method thereof, and a liquid crystal display device, which relate to the field of liquid crystal displays and are used for improving the yield rate of products. The color filter substrate includes: a black matrix and a color filter; at least one main spacer and at least one sub-spacer are arranged in the area facing the black matrix; A booster layer with a predetermined thickness is provided between them and directly opposite to the main spacers, and the heights of the main spacers and the auxiliary spacers are the same.

Description

A color filter substrate, its manufacturing method, and a liquid crystal display device

technical field

The invention relates to the field of liquid crystal display, in particular to a color filter substrate, a manufacturing method thereof, and a liquid crystal display device.

Background technique

In TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-Liquid Crystal Display), the liquid crystal display panel is composed of a color film substrate and an array substrate, and the liquid crystal layer is sandwiched between the color film substrate and the array substrate. between. In order to ensure the uniformity of the thickness of the liquid crystal layer, spacers need to be provided. In the current design of the spacer, the structure combining the main spacer and the auxiliary spacer is usually adopted.

As shown in FIG. 1 , the color filter substrate 100 includes a substrate 11 , a black matrix 12 , a color filter 13 , an insulating layer 16 , a common electrode layer 17 , main spacers 18 and sub-spacers 19 . Wherein, the color filter 13 includes three kinds of filter layers of red, green and blue arranged in sequence (the three kinds of filter layers are respectively marked with different fillings in the figure). In addition, the heights of the main spacer 18 and the auxiliary spacer 19 are different, the height of the main spacer is d ₁ , the height of the auxiliary spacer is d ₂ , and d ₁ is greater than d ₂ ; To control the thickness of the liquid crystal layer, the auxiliary spacer 19 bears pressure together with the main spacer 18 when the liquid crystal display panel is subjected to external pressure, so that the liquid crystal layer maintains a certain thickness.

However, in the process of manufacturing the above-mentioned main spacers 18 and sub-spacers 19, if a negative photoresist is used as the material for manufacturing the spacers, the required exposure amount at the corresponding positions of the main spacers 18 Larger, the exposure amount required at the corresponding position of the sub-spacer 19 is smaller; when performing photolithography processes with different exposure amounts for the same layer of material, half-tone (Half-tone) or gray is usually used in the prior art. Gray-tone process; in the semi-transparent or gray-scale process, small changes in exposure will seriously affect the result of the process, that is, it is easy to have problems such as uneven height of the sub-spacer, which will affect the yield of the product .

Contents of the invention

Embodiments of the present invention provide a color filter substrate, a manufacturing method thereof, and a liquid crystal display device, so as to improve product yield.

In order to achieve the above object, embodiments of the present invention adopt the following technical solutions:

On the one hand, a color filter substrate is provided, including: a black matrix and a color filter; at least one main spacer and at least one sub-spacer are arranged in the area facing the black matrix; it is characterized in that, in the Between the main spacer and the black matrix and at the position facing the main spacer, a booster layer with a predetermined thickness is provided, and the height of the main spacer and the auxiliary spacer are the same .

On the one hand, a method for manufacturing a color filter substrate is provided, including:

Form a black matrix on a transparent substrate by patterning process;

Using a patterning process, forming a booster layer and at least three kinds of filter layers on the substrate forming the black matrix;

On the substrate on which the filter layer and the booster layer are formed, a main spacer and a sub-spacer with the same height are fabricated, wherein the main spacer is arranged at a position facing the booster layer.

In one aspect, a liquid crystal display device is provided, including the above-mentioned color filter substrate.

Embodiments of the present invention provide a color filter substrate, a manufacturing method thereof, and a liquid crystal display device, in which a heightening layer with a predetermined thickness is provided at a position between the main spacer and the black matrix and facing the main spacer, and The height of the main spacer and the auxiliary spacer is the same; taking the plane where the transparent substrate is located as a reference plane, the main spacer is higher than the auxiliary spacer by the above-mentioned predetermined thickness, which is the main spacer required in the prior art. The height difference between the spacer and the sub-spacer, the height of the main spacer and the sub-spacer are the same, so that the photolithography process of a common mask can be used, compared with the use of half-tone (Half-tone) or gray in the prior art The gray-tone process reduces the difficulty of the process and improves the yield of the product.

Description of drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.

FIG. 1 is a cross-sectional view of a color filter substrate in the prior art;

2 is a cross-sectional view of a color filter substrate in an embodiment of the present invention;

FIG. 3 , FIG. 4 , and FIG. 5 are schematic diagrams of the manufacturing process of the color filter substrate according to the embodiment of the present invention.

Reference signs:

100-color film substrate; 11-transparent substrate; 12-black matrix; 13-color film; 131-red filter layer; 132-green filter layer; 133-blue filter layer; 16-insulation layer; 17- Common electrode layer; 18-main spacer; 19-secondary spacer; 21-first booster layer; 22-second booster layer.

Detailed ways

The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

As shown in FIG. 2 , an embodiment of the present invention provides a color filter substrate 100, including: a black matrix 12 and a color filter 13; at least one main spacer 18 and at least one Auxiliary spacer 19; between the main spacer 18 and the black matrix 12 and at the position facing the main spacer 18, a booster layer with a predetermined thickness is provided, and the main spacer The spacers 18 and the secondary spacers 19 have the same height.

Wherein, the predetermined thickness of the booster layer is preferably the required height difference (d ₁ -d ₂ ) between the main spacer 18 and the auxiliary spacer 19 in FIG. 1 . In addition, the enhancement layer can be made of any one of materials such as black matrix materials and materials for making color filters. By providing the booster layer, it is possible to ensure that the heights of the main and sub spacers are the same when the main spacers 18 and the sub spacers 19 perform their respective functions. In this way, it is convenient to utilize the photolithography process of common mask plate (the photolithography process that can only treat the patterned film, completely remove or completely retain according to the pattern requirements) to make the main and auxiliary spacers, thereby reducing the process difficulty and improving product yield.

Further, the color filter substrate 100 further includes: an insulating layer 16 covering the black matrix 12 and the color filter 13;

Between the main spacer 18 and the black matrix 12 and at the position facing the main spacer 18, a booster layer with a predetermined thickness is provided, specifically, between the insulating layer 16 and the A booster layer with a predetermined thickness is disposed between the black matrices 12 and at a position facing the main spacer 18 .

In the embodiment of the present invention, it is not limited to set the booster layer on a fixed layer. For example, the booster layer can be set in the area between the common electrode layer 17 and the insulating layer 16 and facing the main spacer, but in After comprehensively considering various conditions such as the process and the display effect of the liquid crystal panel, preferably, the booster layer is arranged between the insulating layer and the black matrix and directly opposite to the main spacer.

Further, in the embodiment of the present invention, the increase layer is at least one layer, and the number of layers of the increase layer is not limited to the number of layers in the embodiment, and can be considered in consideration of production cost, manufacturing process difficulty, etc. Under the factor condition, select the required number of layers.

Preferably, the color filter includes: three kinds of filter layers of red, green and blue, and the enhancement layer is divided into a first enhancement layer 21 and a second enhancement layer 22;

The first enhancement layer 21 is the same layer as the first filter layer, and the second enhancement layer 22 is the same layer as the second filter layer, wherein the first filter layer and the second filter layer layer is any two of the three filter layers.

In the embodiment of the present invention, the first enhancement layer 21 and the first optical filter layer being the same layer means that the material of the first optical filter layer is used to make a thin film, and the patterning process of the ordinary mask plate is used to pattern the thin film Form the first enhancement layer and the first filter layer, because both are the same layer, so the thickness of the first enhancement layer 21 is equal to the thickness of the first filter layer; The second enhancement layer 22 and the second filter layer are The same layer means that the material of the second filter layer is used to make a film, and the film is patterned to form the second enhancement layer and the second filter layer by using the patterning process of a common mask. Since the two are the same layer, the second The thickness of the second enhancement layer 22 is equal to the thickness of the second filter layer. Considering that the predetermined thickness of the increased layer, that is, the height difference between the main spacer and the auxiliary spacer required by the prior art, is approximately equal to the thickness of the two filter layers, so in the embodiment of the present invention, the two layers are respectively used. The method of making the filter layer in the same layer is used to make the enhancement layer, which can reduce the complexity of the process.

An embodiment of the present invention provides a method for manufacturing a color filter substrate, and the method includes at least three steps of S1, S2, and S3.

S1. As shown in FIG. 3, a black matrix 12 is formed on the transparent substrate 11 by using a patterning process;

S2. Using a patterning process, form a booster layer and at least three kinds of filter layers on the substrate forming the black matrix 12; in the embodiment of the present invention, the number of layers forming the filter layer is at least three, that is, In addition to forming a red filter layer, a green filter layer, and a blue filter layer on the film substrate, filter layers of other colors can also be formed on the color filter substrate, for example, a white filter layer can also be formed.

In the embodiment of the present invention, taking the formation of three color filter layers of red, green and blue as an example, as shown in FIG. 4, the three filter layers are red filter layer 131, green filter layer 132, The optical layer 133, the arrangement order of these three kinds of filter layers in the figure is just an example of the description scheme, and although the three kinds of filter layers are arranged in order in the figure, it does not mean that the three kinds of filter layers in the same pixel are referred to Filter layer; that is to say, the three filter layers in the illustration can be in the same pixel or in different pixels.

Preferably, forming the raising layer and at least three kinds of filter layers on the substrate forming the black matrix specifically includes: in the process of patterning to form any two kinds of filter layers, the area corresponding to the main spacer will cover the The material of the filter layer on the black matrix remains to form the enhancement layer.

Specifically, as shown in Figure 4, when the order of forming three kinds of filter layers is red filter layer, green filter layer, and blue filter layer, and the red filter layer and the green filter layer are selected as the three kinds of filters. Any two kinds of filter layers of the filter layer; then this step can be specifically, depositing a red filter layer material on the substrate that has completed step S1, and using a patterning process to form the red filter layer 131 and the first enhancement layer 21; continue Deposit the material of the green filter layer, and form the green filter layer 132 and the second enhancement layer 22 by patterning; continue to deposit the material of the blue filter layer, and form the blue filter layer 133 by patterning. This specific method is provided as an example for reference only.

It can be seen from the above manufacturing method that during the process of forming the filter layer on the substrate on which the black matrix is formed, the setting of the booster layer is realized at the same time, and the steps of the method are relatively simple, which is a preferred manufacturing method. Of course, other manufacturing methods are also possible. For example, at the position where the booster layer is set as shown in FIG. 4 , the black matrix material is used to make the booster layer, and the manufacture of the color filter substrate can also be completed by continuing to follow the steps below.

It should be noted that the area of the filter layer material covering the area corresponding to the main spacer on the black matrix can be approximately equal to the cross-sectional area of the main spacer, or larger than the cross-sectional area of the main spacer;

S3. On the substrate forming the filter layer and the booster layer, make a main spacer and a sub-spacer with the same height, wherein the main spacer is arranged at a position facing the booster layer superior. When making the main and auxiliary spacers with the same height, the main spacer 18 needs to be arranged on the position facing the increased layer. In the region facing the matrix. In the embodiment of the present invention, the cross-sectional area of the main spacer 18 and the auxiliary spacer 19 is not limited. According to actual needs, the cross-sectional area of the main and auxiliary spacers may be the same or different. In addition, since there are various types of color filter substrates, for example, some color filter substrates do not have a common electrode layer, and there are many ways to manufacture various types of color filter substrates.

Further, in the process of manufacturing the color filter substrate, before S3, as shown in FIG. 5 , an insulating layer 16 and a common electrode layer 17 are fabricated on the substrate on which the filter layer and the enhancement layer are formed.

As shown in FIG. 2 , after the insulating layer 16 and the common electrode layer 17 are formed on the substrate on which the filter layer and the enhancement layer are formed. On the common electrode layer 17 , a main spacer 18 and a sub-spacer 19 having the same height are fabricated, wherein the main spacer 18 is disposed at a position facing the booster layer.

In each of the above steps, processes such as deposition, exposure, and development are required.

In the color filter substrate and its manufacturing method provided in the embodiments of the present invention, a heightening layer with a predetermined thickness is provided between the main spacer and the black matrix and at the position facing the main spacer, and the main The heights of the spacers and the sub-spacers are the same, so that the main and sub-spacers can be produced by using the photolithography process of a common mask plate, compared with the half-tone (Half-tone) or gray-scale ( Gray-tone) technology reduces the difficulty of the process; moreover, the use of a common mask plate can solve the problem of uneven height when making the main and auxiliary spacers, and improve the yield rate of the product.

An embodiment of the present invention also provides a liquid crystal display device, including the color filter substrate provided in the above embodiments, and the color filter may be any color filter substrate described above. Specifically, the color filter substrate includes: a black matrix and a color filter; at least one main spacer and at least one sub-spacer are arranged in the area facing the black matrix; A booster layer with a predetermined thickness is provided between the black matrices and at a position facing the main spacers, and the heights of the main spacers and the auxiliary spacers are the same.

The liquid crystal display device may be a liquid crystal display panel including a color filter substrate and an array substrate formed in a box, and the liquid crystal display device may also be a liquid crystal display further comprising a backlight on the basis of the liquid crystal display panel.

The above is only a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Anyone skilled in the art can easily think of changes or substitutions within the technical scope disclosed in the present invention. Should be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention should be determined by the protection scope of the claims.

Claims (8)

1. a color membrane substrates comprises: black matrix and color film; In the zone, be provided with at least one main chock insulator matter and at least one secondary chock insulator matter at said black matrix; It is characterized in that, between said main chock insulator matter and the said black matrix and with said main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness, and the height of said main chock insulator matter and said secondary chock insulator matter is identical.

2. color membrane substrates according to claim 1 is characterized in that, said color membrane substrates also comprises: the insulation course that covers said black matrix and said color film;

Between said main chock insulator matter and the said black matrix and with said main chock insulator matter over against the position on, be provided with predetermined thickness increase the layer be specially,

Between said insulation course and the said black matrix and with said main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness.

3. color membrane substrates according to claim 1 is characterized in that, the said layer that increases is at least one deck.

4. according to the described color membrane substrates of each claim of claim 1～3, it is characterized in that said color film comprises: three kinds of filter layers of RGB, the said layer that increases is divided into first and increases layer and second increase layer;

Said first increases layer and first filter layer for layer, and said second increases layer and second filter layer for together layer, and said first filter layer and said second filter layer are any two kinds in said three kinds of filter layers.

5. the manufacturing approach of a color membrane substrates is characterized in that, comprising:

Utilize composition technology, on transparency carrier, form black matrix;

Utilize composition technology, on the substrate that forms black matrix, form and increase layer and at least three kinds of filter layers;

Forming on the substrate that said filter layer and said increases layer, makes highly identical main chock insulator matter and secondary chock insulator matter, said main chock insulator matter be arranged on said increase layer over against the position on.

6. method according to claim 5 is characterized in that, said on the substrate that forms black matrix, formation increases layer and comprise with at least three kinds of filter layers:

Patterning with the process that forms any two kinds of filter layers in, will cover filter material on the black matrix and keep and increase layer in that the corresponding zone of main chock insulator matter is set with formation.

7. according to claim 5 or 6 described methods, it is characterized in that said method also comprises:

Make insulation course and/or common electrode layer being formed with on the substrate that said filter layer and said increases layer.

8. a liquid crystal indicator is characterized in that, comprises each described color membrane substrates of claim 1～4.

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