CN102789143A - Exposure machine target image alignment device and exposure machine using the device - Google Patents
Exposure machine target image alignment device and exposure machine using the device Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明涉及一种令摄影镜头及对位光源借由设置于滑轨的滑座予以平移移载,以使其移载过程非常平稳不晃动的设计,特别涉及一种曝光机标靶影像对位装置及使用该装置的曝光机。The invention relates to a design for translational transfer of a photographic lens and an alignment light source through a sliding seat arranged on a slide rail, so that the transfer process is very stable and does not shake, and particularly relates to an exposure machine target image alignment device and an exposure machine using the device.
背景技术 Background technique
如图1~图3所示,一台曝光机中通常会设置有上下两个曝光框10a、10b,而相对于对位装置20与曝光装置30交替移位,以让一曝光框10a借对位装置20进行对位程序,另一曝光框10b则由曝光装置30进行曝光程序,得以交替进行对位程序与曝光程序;然而,工件在以曝光装置30进行曝光程序前,必须先让工件借对位装置20相对底片对位,以获得较佳的曝光品质,而工件与底片间的对位精度,除了标靶辨识算法的优劣外,标靶的影像品质则是另一项重要因素。As shown in Figures 1 to 3, an exposure machine is usually provided with two
其次,传统的曝光机标靶影像对位装置40是设置于曝光机的对位装置20上方,而该标靶影像对位装置40将一对以上的摄影镜头41及对位光源42设置于一升降移载单元43;其中,该标靶影像对位装置40于进行对位程序之前,必须令该摄影镜头41及对位光源42下降贴近置放于曝光框10a或10b的工件表面,以获致较佳的标靶影像对位品质;但由于该标靶影像对位装置40的设置位置位于整台曝光机的高处重心较高,故致使该摄影镜头41及对位光源42会于下降的过程产生严重的晃动,而产生晃动非常不利于对位程序的进行,必须等待晃动自然停止后,才得以进行对位程序,因而影响到生产速度。Secondly, the traditional exposure machine target
再次,由于前述标靶影像对位装置40的摄影镜头41及对位光源42相对上下两个曝光框10a、10b可有不同的升降行程,两个曝光框10a、10b遂被设置于不同的高度,但不同高度的曝光框10a、10b于进行曝光程序时,会有接受到不同强度的曝光能量而造成曝光不均匀的问题。Again, because the photographing
发明内容Contents of the invention
本发明所要解决的主要技术问题在于,克服现有技术存在的上述缺陷,而提供一种曝光机标靶影像对位装置及使用该装置的曝光机,其具有摄影镜头及对位光源于移动过程不晃动的功效,且具有令曝光机的两个曝光框接受相同强度曝光能量的功效。The main technical problem to be solved by the present invention is to overcome the above-mentioned defects in the prior art, and provide an exposure machine target image alignment device and an exposure machine using the device, which has a photographic lens and an alignment light source in the moving process It has the effect of not shaking, and has the effect of making the two exposure frames of the exposure machine receive the same intensity of exposure energy.
本发明解决其技术问题所采用的技术方案是:The technical solution adopted by the present invention to solve its technical problems is:
一种曝光机标靶影像对位装置结构特征,是将一对以上的摄影镜头及对位光源设置于一平移移载单元,而借该平移移载单元往复移载该摄影镜头及对位光源至停驻于对位装置上方的曝光框上方。The structural feature of a target image alignment device of an exposure machine is that more than one pair of photographic lenses and alignment light sources are arranged on a translational transfer unit, and the photographic lens and alignment light source are reciprocally transferred by the translational transfer unit To stop above the exposure frame above the alignment device.
前述的曝光机标靶影像对位装置,其中摄影镜头镜头前缘至置放于曝光框的工件表面的距离在50~150mm之间。In the aforementioned exposure machine target image alignment device, the distance from the front edge of the photographic lens to the surface of the workpiece placed on the exposure frame is between 50 mm and 150 mm.
前述的曝光机标靶影像对位装置,其中平移移载单元沿着该曝光框的移位走向平行设置有第一轴向滑轨,并于该第一轴向滑轨上设置有第一轴向滑座,而于该第一轴向滑座上设置有第二轴向滑轨,且于该第二轴向滑轨上设置有第二轴向滑座,该第二轴向滑座供该摄影镜头及对位光源设置。In the above-mentioned exposure machine target image alignment device, wherein the translation transfer unit is provided with a first axial slide rail parallel to the displacement direction of the exposure frame, and a first axis is provided on the first axial slide rail. to the sliding seat, and the second axial sliding seat is provided on the first axial sliding seat, and the second axial sliding seat is provided on the second axial sliding seat, and the second axial sliding seat is provided for The photographic lens and alignment light source settings.
再者,本发明的曝光机结构特征,包括有:一对位装置;一曝光装置;上、下曝光框,相对该对位装置与该曝光装置交替移位停驻;一顶升装置,将停驻状态的该下曝光框顶升至与该上曝光框同一高度;以及一标靶影像对位装置,将一对以上的摄影镜头及对位光源设置于一平移移载单元,而借该平移移载单元往复移载该摄影镜头及对位光源至停驻于该对位装置上方的曝光框上方。Furthermore, the structural features of the exposure machine of the present invention include: an alignment device; an exposure device; upper and lower exposure frames, which alternately shift and stop relative to the alignment device and the exposure device; a jacking device, which The lower exposure frame in the parked state is lifted to the same height as the upper exposure frame; and a target image alignment device is used to set more than one pair of photographic lenses and alignment light sources on a translation transfer unit, and by the The translation transfer unit reciprocates and transfers the photographic lens and alignment light source to the exposure frame above the alignment device.
此外,该摄影镜头镜头前缘至置放于曝光框的工件表面的距离在50~150mm之间。又,该平移移载单元沿着该曝光框的移位走向平行设置有第一轴向滑轨,并于该第一轴向滑轨上设置有第一轴向滑座,而于该第一轴向滑座上设置有第二轴向滑轨,且于该第二轴向滑轨上设置有第二轴向滑座,该第二轴向滑座供该摄影镜头及对位光源设置。In addition, the distance from the front edge of the photographic lens to the surface of the workpiece placed in the exposure frame is between 50mm and 150mm. Also, the translation transfer unit is provided with a first axial slide rail parallel to the displacement direction of the exposure frame, and a first axial slide seat is provided on the first axial slide rail, and a first axial slide seat is arranged on the first axial slide rail. A second axial sliding rail is arranged on the axial sliding seat, and a second axial sliding seat is arranged on the second axial sliding rail, and the second axial sliding seat is provided for the photographic lens and alignment light source.
本发明的有益效果是,其具有摄影镜头及对位光源于移动过程不晃动的功效,且具有令曝光机的两个曝光框接受相同强度曝光能量的功效。The beneficial effect of the present invention is that it has the effect of not shaking the photographic lens and the alignment light source during the moving process, and has the effect of allowing the two exposure frames of the exposure machine to receive the same intensity of exposure energy.
附图说明 Description of drawings
下面结合附图和实施例对本发明进一步说明。The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
图1是现有曝光机的动作状态说明图一。FIG. 1 is an explanatory diagram of the operating state of a conventional exposure machine.
图2是现有曝光机的动作状态说明图二。Fig. 2 is the second explanatory diagram of the operating state of the conventional exposure machine.
图3是现有曝光机的动作状态说明图三。Fig. 3 is the third explanatory diagram of the operating state of the conventional exposure machine.
图4是本发明的动作状态说明图一。Fig. 4 is an explanatory diagram 1 of the operating state of the present invention.
图5是本发明的动作状态说明图二。Fig. 5 is the second explanatory diagram of the operating state of the present invention.
图6是本发明的动作状态说明图三。Fig. 6 is an explanatory diagram 3 of the action state of the present invention.
图中标号说明:Explanation of symbols in the figure:
10a、10b曝光框10a, 10b exposure frame
20对位装置20 alignment device
30曝光装置30 exposure device
40、50标靶影像对位装置40, 50 target image alignment device
41、51摄影镜头41, 51 photography lens
42、52对位光源42, 52 alignment light source
43升降移载单元43 Lifting and transferring unit
53平移移载单元53 translation transfer unit
531第一轴向滑轨531 first axial slide rail
532a、532b第一轴向滑座532a, 532b first axial sliding seat
533a、533b第二轴向滑轨533a, 533b second axial slide rail
534a、534b第二轴向滑座534a, 534b second axial sliding seat
60顶升装置60 jacking device
具体实施方式 Detailed ways
首先,请参阅图4~图6所示,本发明的曝光机标靶影像对位装置50,是将一对以上的摄影镜头51及对位光源52设置于一平移移载单元53,该平移移载单元53往复移载该摄影镜头51及对位光源52至停驻于对位装置20上方的曝光框10a、10b上方,用以撷取标靶影像,而该摄影镜头51镜头前缘至置放于曝光框的工件表面的较佳距离约在50~150mm之间。First, please refer to FIGS. 4 to 6, the exposure machine target
再者,该平移移载单元53沿着该曝光框10a、10b的移位走向平行设置有第一轴向滑轨531,并于该第一轴向滑轨531上设置有第一轴向滑座532a、532b,而于该第一轴向滑座532a、532b上设置有第二轴向滑轨533a、533b,且于该第二轴向滑轨533a、533b上设置有第二轴向滑座534a、534b,该第二轴向滑座534a、534b则供该摄影镜头51及对位光源52设置,该摄影镜头51及对位光源52随着第一轴向滑座532a、532b的滑移,而被往复移载至停驻于对位装置20上方的曝光框10a、10b上方。Furthermore, the
此外,本发明的曝光机包括有:一对位装置20;一曝光装置30;上、下曝光框10a、10b,相对该对位装置20与该曝光装置30交替移位停驻;一顶升装置60,将停驻状态的该下曝光框10b顶升至与该上曝光框10a同一高度;以及一标靶影像对位装置50,将一对以上的摄影镜头51及对位光源52设置于一平移移载单元53,而借该平移移载单元53往复移载该摄影镜头51及对位光源52至停驻于该对位装置20上方的曝光框10a、10b上方。In addition, the exposure machine of the present invention includes: a
根据上述结构,本发明的曝光机标靶影像对位装置50,是利用该平移移载单元53往复移载该摄影镜头51及对位光源52至停驻于对位装置20上方的曝光框10a、10b上方,用以撷取标靶影像,而该摄影镜头51及对位光源52借由设置于第一轴向滑轨531的第一轴向滑座532a、532b予以移载,故其移载过程非常平稳,而具有摄影镜头及对位光源于移动过程不晃动的功效。According to the above structure, the exposure machine target
又,因一台曝光机中通常会设置有上下两个曝光框10a、10b,为了让上下两个曝光框10a、10b具有相同的标靶影像品质,故借该顶升装置60将该下曝光框10b顶升至与该上曝光框10a同一高度,再进行撷取标靶影像及对位的程序;而此将该下曝光框10b顶升至与该上曝光框10a同一高度的动作,亦可应用于曝光程序,则具有令曝光机的两个曝光框接受相同强度曝光能量的功效。In addition, two
以上所述,仅是本发明的较佳实施例而已,并非对本发明作任何形式上的限制,凡是依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与修饰,均仍属于本发明技术方案的范围内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention still belong to within the scope of the technical solutions of the present invention.
综上所述,本发明在结构设计、使用实用性及成本效益上,完全符合产业发展所需,且所揭示的结构亦是具有前所未有的创新构造,具有新颖性、创造性、实用性,符合有关发明专利要件的规定,故依法提起申请。In summary, the present invention fully meets the needs of industrial development in terms of structural design, practicability and cost-effectiveness, and the disclosed structure also has an unprecedented innovative structure, novelty, creativity and practicability, and meets the requirements of relevant According to the requirements of the invention patent requirements, the application is filed according to law.
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| CN2011101271628A CN102789143A (en) | 2011-05-17 | 2011-05-17 | Exposure machine target image alignment device and exposure machine using the device |
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Cited By (2)
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| CN106681108A (en) * | 2015-11-09 | 2017-05-17 | 川宝科技股份有限公司 | Target image alignment device and exposure machine with same |
| CN106707687A (en) * | 2017-01-19 | 2017-05-24 | 广州美维电子有限公司 | PCB (Printed Circuit Board) exposure method and device |
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| US20040174510A1 (en) * | 2000-09-21 | 2004-09-09 | Canon Kabushiki Kaisha | Alignment method and exposure apparatus using the method |
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| CN106707687A (en) * | 2017-01-19 | 2017-05-24 | 广州美维电子有限公司 | PCB (Printed Circuit Board) exposure method and device |
| CN106707687B (en) * | 2017-01-19 | 2020-05-22 | 广州美维电子有限公司 | PCB exposure method and device |
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Application publication date: 20121121 |