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CN102789143A - Exposure machine target image alignment device and exposure machine using the device - Google Patents

Exposure machine target image alignment device and exposure machine using the device Download PDF

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Publication number
CN102789143A
CN102789143A CN2011101271628A CN201110127162A CN102789143A CN 102789143 A CN102789143 A CN 102789143A CN 2011101271628 A CN2011101271628 A CN 2011101271628A CN 201110127162 A CN201110127162 A CN 201110127162A CN 102789143 A CN102789143 A CN 102789143A
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exposure
alignment
target image
alignment device
transfer unit
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Chinese (zh)
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张鸿明
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Chime Ball Technology Co ltd
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Chime Ball Technology Co ltd
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Abstract

A target image alignment device of an exposure machine and the exposure machine using the device, the target image alignment device of the exposure machine is provided with more than one pair of photographic lens and alignment light source on a translation transfer unit, and the photographic lens and the alignment light source are transferred to and fro above an exposure frame which is parked above the alignment device by the translation transfer unit; an exposure machine using a translation type target image alignment device, comprising: an alignment device; an exposure device; the upper and lower exposure frames are alternatively shifted and parked relative to the alignment device and the exposure device; the jacking device jacks the lower exposure frame in the parking state to the same height as the upper exposure frame; and a target image alignment device, wherein more than one pair of photographic lens and alignment light source are arranged on a translation transfer unit, and the photographic lens and the alignment light source are transferred to the upper part of an exposure frame which is positioned above the alignment device in a reciprocating way by the translation transfer unit. The invention has the effects that the camera lens and the alignment light source do not shake in the moving process and the two exposure frames receive the exposure energy with the same intensity.

Description

曝光机标靶影像对位装置及使用该装置的曝光机Exposure machine target image alignment device and exposure machine using the device

技术领域 technical field

本发明涉及一种令摄影镜头及对位光源借由设置于滑轨的滑座予以平移移载,以使其移载过程非常平稳不晃动的设计,特别涉及一种曝光机标靶影像对位装置及使用该装置的曝光机。The invention relates to a design for translational transfer of a photographic lens and an alignment light source through a sliding seat arranged on a slide rail, so that the transfer process is very stable and does not shake, and particularly relates to an exposure machine target image alignment device and an exposure machine using the device.

背景技术 Background technique

如图1~图3所示,一台曝光机中通常会设置有上下两个曝光框10a、10b,而相对于对位装置20与曝光装置30交替移位,以让一曝光框10a借对位装置20进行对位程序,另一曝光框10b则由曝光装置30进行曝光程序,得以交替进行对位程序与曝光程序;然而,工件在以曝光装置30进行曝光程序前,必须先让工件借对位装置20相对底片对位,以获得较佳的曝光品质,而工件与底片间的对位精度,除了标靶辨识算法的优劣外,标靶的影像品质则是另一项重要因素。As shown in Figures 1 to 3, an exposure machine is usually provided with two exposure frames 10a, 10b, which are alternately displaced relative to the alignment device 20 and the exposure device 30, so that one exposure frame 10a is aligned The positioning device 20 performs the alignment procedure, and the other exposure frame 10b is subjected to the exposure procedure by the exposure device 30, so that the alignment procedure and the exposure procedure can be alternately performed; however, the workpiece must be borrowed before the exposure procedure is performed by the exposure device 30. The alignment device 20 is aligned relative to the film to obtain better exposure quality. In addition to the quality of the target recognition algorithm, the image quality of the target is another important factor for the alignment accuracy between the workpiece and the film.

其次,传统的曝光机标靶影像对位装置40是设置于曝光机的对位装置20上方,而该标靶影像对位装置40将一对以上的摄影镜头41及对位光源42设置于一升降移载单元43;其中,该标靶影像对位装置40于进行对位程序之前,必须令该摄影镜头41及对位光源42下降贴近置放于曝光框10a或10b的工件表面,以获致较佳的标靶影像对位品质;但由于该标靶影像对位装置40的设置位置位于整台曝光机的高处重心较高,故致使该摄影镜头41及对位光源42会于下降的过程产生严重的晃动,而产生晃动非常不利于对位程序的进行,必须等待晃动自然停止后,才得以进行对位程序,因而影响到生产速度。Secondly, the traditional exposure machine target image alignment device 40 is arranged above the alignment device 20 of the exposure machine, and the target image alignment device 40 sets more than one pair of photographic lenses 41 and alignment light sources 42 on one Lifting and transferring unit 43; wherein, the target image alignment device 40 must make the photographic lens 41 and the alignment light source 42 descend close to the workpiece surface placed on the exposure frame 10a or 10b before performing the alignment procedure, so as to obtain Better target image alignment quality; but because the target image alignment device 40 is located at the high center of gravity of the entire exposure machine, the photographic lens 41 and the alignment light source 42 will be lowered The process produces serious shaking, and the shaking is very unfavorable to the alignment process. It is necessary to wait for the shaking to stop naturally before the alignment process can be carried out, thus affecting the production speed.

再次,由于前述标靶影像对位装置40的摄影镜头41及对位光源42相对上下两个曝光框10a、10b可有不同的升降行程,两个曝光框10a、10b遂被设置于不同的高度,但不同高度的曝光框10a、10b于进行曝光程序时,会有接受到不同强度的曝光能量而造成曝光不均匀的问题。Again, because the photographing lens 41 and the alignment light source 42 of the aforementioned target image alignment device 40 can have different lifting strokes relative to the upper and lower exposure frames 10a, 10b, the two exposure frames 10a, 10b are then set at different heights , but the exposure frames 10a and 10b of different heights will receive different intensities of exposure energy during the exposure process, resulting in uneven exposure.

发明内容Contents of the invention

本发明所要解决的主要技术问题在于,克服现有技术存在的上述缺陷,而提供一种曝光机标靶影像对位装置及使用该装置的曝光机,其具有摄影镜头及对位光源于移动过程不晃动的功效,且具有令曝光机的两个曝光框接受相同强度曝光能量的功效。The main technical problem to be solved by the present invention is to overcome the above-mentioned defects in the prior art, and provide an exposure machine target image alignment device and an exposure machine using the device, which has a photographic lens and an alignment light source in the moving process It has the effect of not shaking, and has the effect of making the two exposure frames of the exposure machine receive the same intensity of exposure energy.

本发明解决其技术问题所采用的技术方案是:The technical solution adopted by the present invention to solve its technical problems is:

一种曝光机标靶影像对位装置结构特征,是将一对以上的摄影镜头及对位光源设置于一平移移载单元,而借该平移移载单元往复移载该摄影镜头及对位光源至停驻于对位装置上方的曝光框上方。The structural feature of a target image alignment device of an exposure machine is that more than one pair of photographic lenses and alignment light sources are arranged on a translational transfer unit, and the photographic lens and alignment light source are reciprocally transferred by the translational transfer unit To stop above the exposure frame above the alignment device.

前述的曝光机标靶影像对位装置,其中摄影镜头镜头前缘至置放于曝光框的工件表面的距离在50~150mm之间。In the aforementioned exposure machine target image alignment device, the distance from the front edge of the photographic lens to the surface of the workpiece placed on the exposure frame is between 50 mm and 150 mm.

前述的曝光机标靶影像对位装置,其中平移移载单元沿着该曝光框的移位走向平行设置有第一轴向滑轨,并于该第一轴向滑轨上设置有第一轴向滑座,而于该第一轴向滑座上设置有第二轴向滑轨,且于该第二轴向滑轨上设置有第二轴向滑座,该第二轴向滑座供该摄影镜头及对位光源设置。In the above-mentioned exposure machine target image alignment device, wherein the translation transfer unit is provided with a first axial slide rail parallel to the displacement direction of the exposure frame, and a first axis is provided on the first axial slide rail. to the sliding seat, and the second axial sliding seat is provided on the first axial sliding seat, and the second axial sliding seat is provided on the second axial sliding seat, and the second axial sliding seat is provided for The photographic lens and alignment light source settings.

再者,本发明的曝光机结构特征,包括有:一对位装置;一曝光装置;上、下曝光框,相对该对位装置与该曝光装置交替移位停驻;一顶升装置,将停驻状态的该下曝光框顶升至与该上曝光框同一高度;以及一标靶影像对位装置,将一对以上的摄影镜头及对位光源设置于一平移移载单元,而借该平移移载单元往复移载该摄影镜头及对位光源至停驻于该对位装置上方的曝光框上方。Furthermore, the structural features of the exposure machine of the present invention include: an alignment device; an exposure device; upper and lower exposure frames, which alternately shift and stop relative to the alignment device and the exposure device; a jacking device, which The lower exposure frame in the parked state is lifted to the same height as the upper exposure frame; and a target image alignment device is used to set more than one pair of photographic lenses and alignment light sources on a translation transfer unit, and by the The translation transfer unit reciprocates and transfers the photographic lens and alignment light source to the exposure frame above the alignment device.

此外,该摄影镜头镜头前缘至置放于曝光框的工件表面的距离在50~150mm之间。又,该平移移载单元沿着该曝光框的移位走向平行设置有第一轴向滑轨,并于该第一轴向滑轨上设置有第一轴向滑座,而于该第一轴向滑座上设置有第二轴向滑轨,且于该第二轴向滑轨上设置有第二轴向滑座,该第二轴向滑座供该摄影镜头及对位光源设置。In addition, the distance from the front edge of the photographic lens to the surface of the workpiece placed in the exposure frame is between 50mm and 150mm. Also, the translation transfer unit is provided with a first axial slide rail parallel to the displacement direction of the exposure frame, and a first axial slide seat is provided on the first axial slide rail, and a first axial slide seat is arranged on the first axial slide rail. A second axial sliding rail is arranged on the axial sliding seat, and a second axial sliding seat is arranged on the second axial sliding rail, and the second axial sliding seat is provided for the photographic lens and alignment light source.

本发明的有益效果是,其具有摄影镜头及对位光源于移动过程不晃动的功效,且具有令曝光机的两个曝光框接受相同强度曝光能量的功效。The beneficial effect of the present invention is that it has the effect of not shaking the photographic lens and the alignment light source during the moving process, and has the effect of allowing the two exposure frames of the exposure machine to receive the same intensity of exposure energy.

附图说明 Description of drawings

下面结合附图和实施例对本发明进一步说明。The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

图1是现有曝光机的动作状态说明图一。FIG. 1 is an explanatory diagram of the operating state of a conventional exposure machine.

图2是现有曝光机的动作状态说明图二。Fig. 2 is the second explanatory diagram of the operating state of the conventional exposure machine.

图3是现有曝光机的动作状态说明图三。Fig. 3 is the third explanatory diagram of the operating state of the conventional exposure machine.

图4是本发明的动作状态说明图一。Fig. 4 is an explanatory diagram 1 of the operating state of the present invention.

图5是本发明的动作状态说明图二。Fig. 5 is the second explanatory diagram of the operating state of the present invention.

图6是本发明的动作状态说明图三。Fig. 6 is an explanatory diagram 3 of the action state of the present invention.

图中标号说明:Explanation of symbols in the figure:

10a、10b曝光框10a, 10b exposure frame

20对位装置20 alignment device

30曝光装置30 exposure device

40、50标靶影像对位装置40, 50 target image alignment device

41、51摄影镜头41, 51 photography lens

42、52对位光源42, 52 alignment light source

43升降移载单元43 Lifting and transferring unit

53平移移载单元53 translation transfer unit

531第一轴向滑轨531 first axial slide rail

532a、532b第一轴向滑座532a, 532b first axial sliding seat

533a、533b第二轴向滑轨533a, 533b second axial slide rail

534a、534b第二轴向滑座534a, 534b second axial sliding seat

60顶升装置60 jacking device

具体实施方式 Detailed ways

首先,请参阅图4~图6所示,本发明的曝光机标靶影像对位装置50,是将一对以上的摄影镜头51及对位光源52设置于一平移移载单元53,该平移移载单元53往复移载该摄影镜头51及对位光源52至停驻于对位装置20上方的曝光框10a、10b上方,用以撷取标靶影像,而该摄影镜头51镜头前缘至置放于曝光框的工件表面的较佳距离约在50~150mm之间。First, please refer to FIGS. 4 to 6, the exposure machine target image alignment device 50 of the present invention is to install more than one pair of photographic lenses 51 and alignment light sources 52 on a translation transfer unit 53, the translation The transfer unit 53 reciprocally transfers the photographic lens 51 and the alignment light source 52 to the top of the exposure frames 10a, 10b parked above the alignment device 20 to capture target images, and the front edge of the photographic lens 51 reaches The preferred distance from the surface of the workpiece placed on the exposure frame is about 50-150 mm.

再者,该平移移载单元53沿着该曝光框10a、10b的移位走向平行设置有第一轴向滑轨531,并于该第一轴向滑轨531上设置有第一轴向滑座532a、532b,而于该第一轴向滑座532a、532b上设置有第二轴向滑轨533a、533b,且于该第二轴向滑轨533a、533b上设置有第二轴向滑座534a、534b,该第二轴向滑座534a、534b则供该摄影镜头51及对位光源52设置,该摄影镜头51及对位光源52随着第一轴向滑座532a、532b的滑移,而被往复移载至停驻于对位装置20上方的曝光框10a、10b上方。Furthermore, the translation transfer unit 53 is provided with a first axial slide rail 531 parallel to the displacement direction of the exposure frames 10a and 10b, and a first axial slide rail 531 is provided on the first axial slide rail 531. seat 532a, 532b, and the second axial slide rail 533a, 533b is provided on the first axial slide seat 532a, 532b, and the second axial slide rail is provided on the second axial slide rail 533a, 533b. seats 534a, 534b, and the second axial sliding seats 534a, 534b are provided for the photographic lens 51 and the alignment light source 52, and the photographic lens 51 and the alignment light source 52 slide along the first axial sliding seats 532a, 532b moved, and reciprocally transferred to above the exposure frames 10a, 10b parked above the alignment device 20 .

此外,本发明的曝光机包括有:一对位装置20;一曝光装置30;上、下曝光框10a、10b,相对该对位装置20与该曝光装置30交替移位停驻;一顶升装置60,将停驻状态的该下曝光框10b顶升至与该上曝光框10a同一高度;以及一标靶影像对位装置50,将一对以上的摄影镜头51及对位光源52设置于一平移移载单元53,而借该平移移载单元53往复移载该摄影镜头51及对位光源52至停驻于该对位装置20上方的曝光框10a、10b上方。In addition, the exposure machine of the present invention includes: a positioning device 20; an exposure device 30; upper and lower exposure frames 10a, 10b, which alternately shift and stop relative to the positioning device 20 and the exposure device 30; Device 60, lifts the lower exposure frame 10b in the parked state to the same height as the upper exposure frame 10a; A translational transfer unit 53 , and the photographic lens 51 and alignment light source 52 are reciprocally transferred by the translational transfer unit 53 to above the exposure frames 10 a , 10 b parked above the alignment device 20 .

根据上述结构,本发明的曝光机标靶影像对位装置50,是利用该平移移载单元53往复移载该摄影镜头51及对位光源52至停驻于对位装置20上方的曝光框10a、10b上方,用以撷取标靶影像,而该摄影镜头51及对位光源52借由设置于第一轴向滑轨531的第一轴向滑座532a、532b予以移载,故其移载过程非常平稳,而具有摄影镜头及对位光源于移动过程不晃动的功效。According to the above structure, the exposure machine target image alignment device 50 of the present invention uses the translation transfer unit 53 to reciprocally transfer the photographic lens 51 and the alignment light source 52 to the exposure frame 10a parked above the alignment device 20 , 10b above, used to capture the target image, and the photographic lens 51 and alignment light source 52 are transferred by the first axial sliding seats 532a, 532b arranged on the first axial sliding rail 531, so they move The loading process is very stable, and it has the effect that the camera lens and the alignment light source do not shake during the moving process.

又,因一台曝光机中通常会设置有上下两个曝光框10a、10b,为了让上下两个曝光框10a、10b具有相同的标靶影像品质,故借该顶升装置60将该下曝光框10b顶升至与该上曝光框10a同一高度,再进行撷取标靶影像及对位的程序;而此将该下曝光框10b顶升至与该上曝光框10a同一高度的动作,亦可应用于曝光程序,则具有令曝光机的两个曝光框接受相同强度曝光能量的功效。In addition, two exposure frames 10a, 10b, up and down, are usually installed in one exposure machine. In order to make the two exposure frames 10a, 10b have the same target image quality, the lower exposure The frame 10b is jacked up to the same height as the upper exposure frame 10a, and then the process of capturing the target image and alignment is carried out; and the action of lifting the lower exposure frame 10b to the same height as the upper exposure frame 10a is also It can be applied to the exposure program, and has the effect of making the two exposure frames of the exposure machine receive the same intensity of exposure energy.

以上所述,仅是本发明的较佳实施例而已,并非对本发明作任何形式上的限制,凡是依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与修饰,均仍属于本发明技术方案的范围内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention still belong to within the scope of the technical solutions of the present invention.

综上所述,本发明在结构设计、使用实用性及成本效益上,完全符合产业发展所需,且所揭示的结构亦是具有前所未有的创新构造,具有新颖性、创造性、实用性,符合有关发明专利要件的规定,故依法提起申请。In summary, the present invention fully meets the needs of industrial development in terms of structural design, practicability and cost-effectiveness, and the disclosed structure also has an unprecedented innovative structure, novelty, creativity and practicability, and meets the requirements of relevant According to the requirements of the invention patent requirements, the application is filed according to law.

Claims (6)

1.一种曝光机标靶影像对位装置,其特征在于,将一对以上的摄影镜头及对位光源设置于一平移移载单元,而借该平移移载单元往复移载该摄影镜头及对位光源至停驻于对位装置上方的曝光框上方。1. An exposure machine target image alignment device, characterized in that more than a pair of photographic lenses and alignment light sources are arranged on a translation transfer unit, and the photographic lens and the alignment unit are reciprocally transferred by the translation transfer unit The alignment light source is parked above the exposure frame above the alignment device. 2.根据权利要求1所述的曝光机标靶影像对位装置,其特征在于,所述摄影镜头镜头前缘至置放于曝光框的工件表面的距离在50~150mm之间。2 . The target image alignment device of an exposure machine according to claim 1 , wherein the distance from the front edge of the photographic lens to the surface of the workpiece placed in the exposure frame is between 50 mm and 150 mm. 3 . 3.根据权利要求1或2所述的曝光机标靶影像对位装置,其特征在于,所述平移移载单元沿着该曝光框的移位走向平行设置有第一轴向滑轨,并于该第一轴向滑轨上设置有第一轴向滑座,而于该第一轴向滑座上设置有第二轴向滑轨,且于该第二轴向滑轨上设置有第二轴向滑座,该第二轴向滑座供该摄影镜头及对位光源设置。3. The target image alignment device of an exposure machine according to claim 1 or 2, wherein the translational transfer unit is provided with a first axial slide rail parallel to the displacement direction of the exposure frame, and A first axial sliding seat is arranged on the first axial sliding rail, a second axial sliding rail is arranged on the first axial sliding seat, and a second axial sliding seat is arranged on the second axial sliding rail. Two axial sliding seats, the second axial sliding seat is provided for the photographic lens and alignment light source. 4.一种如权利要求1所述的标靶影像对位装置的曝光机,其特征在于,包括有:4. An exposure machine of a target image alignment device as claimed in claim 1, characterized in that, comprising: 一对位装置;a pair of alignment devices; 一曝光装置;an exposure device; 上、下曝光框,相对该对位装置与该曝光装置交替移位停驻;The upper and lower exposure frames are alternately shifted and parked relative to the alignment device and the exposure device; 一顶升装置,将停驻状态的该下曝光框顶升至与该上曝光框同一高度;A jacking device, which lifts the lower exposure frame in the parked state to the same height as the upper exposure frame; 一标靶影像对位装置,将一对以上的摄影镜头及对位光源设置于一平移移载单元,而借该平移移载单元往复移载该摄影镜头及对位光源至停驻于该对位装置上方的曝光框上方。A target image alignment device, which sets more than one pair of photographic lenses and alignment light sources on a translation transfer unit, and uses the translation transfer unit to reciprocally transfer the photographic lenses and alignment light sources to the pair of above the exposure frame above the bit device. 5.根据权利要求4所述的曝光机,其特征在于,所述摄影镜头镜头前缘至置放于曝光框的工件表面的距离在50~150mm之间。5 . The exposure machine according to claim 4 , wherein the distance from the front edge of the photographic lens to the surface of the workpiece placed in the exposure frame is between 50 mm and 150 mm. 6.根据权利要求4或5所述的曝光机,其特征在于,所述平移移载单元沿着该曝光框的移位走向平行设置有第一轴向滑轨,并于该第一轴向滑轨上设置有第一轴向滑座,而于该第一轴向滑座上设置有第二轴向滑轨,且于该第二轴向滑轨上设置有第二轴向滑座,该第二轴向滑座供该摄影镜头及对位光源设置。6. The exposure machine according to claim 4 or 5, characterized in that, the translational transfer unit is provided with a first axial slide rail parallel to the displacement direction of the exposure frame, and in the first axial direction A first axial slide seat is provided on the slide rail, a second axial slide rail is provided on the first axial slide seat, and a second axial slide seat is provided on the second axial slide rail, The second axial sliding seat is provided for the photographic lens and alignment light source.
CN2011101271628A 2011-05-17 2011-05-17 Exposure machine target image alignment device and exposure machine using the device Pending CN102789143A (en)

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CN106681108A (en) * 2015-11-09 2017-05-17 川宝科技股份有限公司 Target image alignment device and exposure machine with same
CN106707687A (en) * 2017-01-19 2017-05-24 广州美维电子有限公司 PCB (Printed Circuit Board) exposure method and device

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CN2578864Y (en) * 2002-10-09 2003-10-08 张鸿明 Single side solder mask exposure machine
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106681108A (en) * 2015-11-09 2017-05-17 川宝科技股份有限公司 Target image alignment device and exposure machine with same
CN106707687A (en) * 2017-01-19 2017-05-24 广州美维电子有限公司 PCB (Printed Circuit Board) exposure method and device
CN106707687B (en) * 2017-01-19 2020-05-22 广州美维电子有限公司 PCB exposure method and device

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Application publication date: 20121121